A layout pattern matching method, device, equipment and storage medium

Abstract

The present invention relates to the field of integrated circuit manufacturing, and in particular to a layout pattern matching method, device, equipment and storage medium, which receives a target pattern and a layout to be matched; searches and matches the target pattern in the layout to be matched according to a preset geometric feature matching condition to obtain a geometric matching pattern; obtains a corresponding target spatial domain image and a matching spatial domain image; obtains a matching frequency domain image corresponding to each of the geometric matching patterns and a target frequency domain image corresponding to the target pattern; respectively calculates the difference value between each matching frequency domain image and the target frequency domain image; determines whether the diffraction information difference value of each of the geometric matching patterns exceeds a preset first threshold; and determines a geometric matching pattern whose diffraction information difference value does not exceed the first threshold as a lithography matching pattern. The present invention matches the lithography imaging feature of the geometric matching pattern, improves the pattern matching precision and matching accuracy, and increases practicality.

Description

Technical Field

[0001] The present invention relates to the field of integrated circuit manufacturing, and in particular to a layout pattern matching method, device, equipment and storage medium. Background Art

[0002] Pattern matching technology refers to finding a pattern that matches the target pattern on a new layout, and is widely used in the design and manufacturing of large-scale integrated circuits. Pattern matching technology mainly relies on the extraction, search and matching of pattern geometric features, that is, based on the geometric features such as line width, spacing, topological relationship, etc. of the polygons contained in the target pattern, to find completely consistent or similar patterns on the new layout. For example, for a known hotspot layout, pattern matching technology can be used to find the same or similar patterns in the new chip design layout, so as to optimize the design in advance to avoid defects in subsequent chip manufacturing. Figure 1-1 and Figure 1-2 is an example of pattern matching, in Figure 1-2 You can find and Figure 1-1 Completely consistent graphic combination.

[0003] However, since patterns with similar geometric features may not necessarily have similar process features in chip manufacturing, existing pattern matching technologies based entirely on geometric features have certain limitations. For example, a pattern with similar geometric features to a hotspot pattern in a photolithography process is not a hotspot after photolithography. In other words, current pattern matching technology cannot guarantee that the matched pattern has similar photolithography imaging features, and may give redundant pattern matching results, resulting in low accuracy and versatility of current pattern matching.

[0004] Therefore, how to ensure the geometric similarity of the matched patterns while further ensuring the lithography imaging characteristics of the matched patterns is an urgent problem to be solved by those skilled in the art. Summary of the invention

[0005] The purpose of the present invention is to provide a layout pattern matching method, device, equipment and storage medium to solve the problem in the prior art that the layout pattern matching results cannot guarantee the matching of lithography imaging features, resulting in low pattern matching precision, poor accuracy and poor practicality.

[0006] In order to solve the above technical problems, the present invention provides a layout pattern matching method, comprising:

[0007] Receiving a target pattern and a layout to be matched;

[0008] According to a preset geometric feature matching condition, searching and matching the target pattern in the to-be-matched layout to obtain a geometric matching pattern;

[0009] Rasterizing the geometric matching pattern to obtain a corresponding matching airspace image; rasterizing the target pattern to obtain a corresponding target airspace image;

[0010] Performing Fourier transformation on the matching spatial domain image to obtain matching frequency domain images corresponding to each of the geometric matching patterns; performing Fourier transformation on the target spatial domain image to obtain a target frequency domain image corresponding to the target pattern;

[0011] respectively calculating the difference values ​​between each of the matching frequency domain images and the target frequency domain image as the diffraction information difference values ​​of the geometric matching patterns corresponding to each of the matching frequency domain images;

[0012] Determining whether the diffraction information difference value of each of the geometric matching patterns exceeds a preset first threshold;

[0013] A geometric matching pattern whose corresponding diffraction information difference value does not exceed the first threshold is determined as a lithography matching pattern of the target pattern.

[0014] Optionally, in the layout pattern matching method, before respectively calculating the difference values ​​between each of the matching frequency domain images and the target frequency domain image, the method further includes:

[0015] The signals in the matching frequency domain image and the target frequency domain image whose frequencies are lower than a preset cutoff frequency are filtered out.

[0016] Optionally, in the layout pattern matching method, before respectively calculating the difference values ​​between each of the matching frequency domain images and the target frequency domain image, the method further includes:

[0017] In the matching frequency domain image and the target frequency domain image, signals whose intensities are lower than a preset intensity threshold are filtered out.

[0018] Optionally, in the layout pattern matching method, after filtering out signals with intensities lower than a preset intensity threshold in the matching frequency domain image and the target frequency domain image, the method further includes:

[0019] The signal strengths of all points whose signal strengths are not zero in the matching frequency domain image and the target frequency domain image are reassigned to the same target strength constant value; the target strength constant value is non-zero.

[0020] Optionally, in the layout pattern matching method, respectively calculating the difference values ​​between each of the matching frequency domain images and the target frequency domain image as the diffraction information difference value of the geometric matching pattern corresponding to each of the matching frequency domain images includes:

[0021] The difference value between each matching frequency domain image and the target frequency domain image is calculated by the following formula as the diffraction information difference value of the geometric matching pattern corresponding to each matching frequency domain image:

[0022] ;

[0023] Among them, M p (f x ,f y ) is the pth matching frequency domain image, M 0 (f x ,f y ) is the target frequency domain image, and D is the diffraction information difference value of the geometric matching pattern corresponding to the pth matching frequency domain image.

[0024] A layout pattern matching device, comprising:

[0025] A receiving module, used for receiving a target pattern and a layout to be matched;

[0026] A geometric search module, used to search and match the target pattern in the to-be-matched layout according to a preset geometric feature matching condition, to obtain a geometric matching pattern;

[0027] A rasterization module, used to rasterize the geometric matching pattern to obtain a corresponding matching airspace image; and to rasterize the target pattern to obtain a corresponding target airspace image;

[0028] A Fourier transform module is used to perform Fourier transform on the matching spatial domain image to obtain matching frequency domain images corresponding to each of the geometric matching patterns; and to perform Fourier transform on the target spatial domain image to obtain a target frequency domain image corresponding to the target pattern;

[0029] A difference module, used to calculate the difference values ​​between each of the matching frequency domain images and the target frequency domain image, as the diffraction information difference values ​​of the geometric matching patterns corresponding to each of the matching frequency domain images;

[0030] A judging module, used to judge whether the diffraction information difference value of each of the geometric matching patterns exceeds a preset first threshold;

[0031] The matching determination module is used to determine the geometric matching pattern whose corresponding diffraction information difference value does not exceed the first threshold as the lithography matching pattern of the target pattern.

[0032] Optionally, in the layout pattern matching device, the Fourier transform module further includes:

[0033] The low-frequency filtering unit is used to filter out signals with frequencies lower than a preset cutoff frequency in the matching frequency domain image and the target frequency domain image.

[0034] Optionally, in the layout pattern matching device, the Fourier transform module further includes:

[0035] The intensity filtering unit is used to filter out signals whose intensities are lower than a preset intensity threshold in the matching frequency domain image and the target frequency domain image.

[0036] A layout pattern matching device, comprising:

[0037] Memory for storing computer programs;

[0038] A processor is used to implement the steps of any of the above-mentioned layout pattern matching methods when executing the computer program.

[0039] A computer-readable storage medium having a computer program stored thereon, wherein the computer program, when executed by a processor, implements the steps of any of the above-described layout pattern matching methods.

[0040] The layout pattern matching method provided by the present invention receives a target pattern and a layout to be matched; searches and matches the target pattern in the layout to be matched according to a preset geometric feature matching condition to obtain a geometric matching pattern; rasterizes the geometric matching pattern to obtain a corresponding matching spatial domain image; rasterizes the target pattern to obtain a corresponding target spatial domain image; performs Fourier transformation on the matching spatial domain image to obtain a matching frequency domain image corresponding to each of the geometric matching patterns; performs Fourier transformation on the target spatial domain image to obtain a target frequency domain image corresponding to the target pattern; calculates the difference value between each of the matching frequency domain images and the target frequency domain image respectively as the diffraction information difference value of the geometric matching pattern corresponding to each of the matching frequency domain images; determines whether the diffraction information difference value of each of the geometric matching patterns exceeds a preset first threshold; and determines the geometric matching pattern whose corresponding diffraction information difference value does not exceed the first threshold as the lithography matching pattern of the target pattern. On the basis of geometric feature matching, the present invention further matches the geometric matching pattern obtained by geometric feature matching in terms of lithography imaging features, that is, the matching frequency domain image corresponding to the geometric matching pattern is compared with the target frequency domain image corresponding to the target pattern. Since the frequency domain image itself corresponds to the diffraction pattern of the pattern, it reflects the important characteristics of the lithography imaging of the pattern. Therefore, by comparing the difference values ​​of the frequency domain images, the lithography matching pattern whose lithography imaging characteristics also match the target pattern can be screened out, which greatly improves the pattern matching precision and matching accuracy, and at the same time increases the practicality of the layout pattern matching method in the present invention. The present invention also provides a layout pattern matching device, equipment and storage medium with the above-mentioned beneficial effects. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] In order to more clearly illustrate the embodiments of the present invention or the technical solutions of the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0042] Figure 1-1 A schematic diagram of a target pattern in a specific implementation of the pattern matching method;

[0043] Figure 1-2 A schematic diagram of a layout area including a target pattern in a specific implementation of a pattern matching method;

[0044] Figure 2 A schematic flow chart of a specific implementation of the layout pattern matching method provided by the present invention;

[0045] Figure 3A target pattern and a corresponding geometric matching pattern of a specific implementation mode of the layout pattern matching method provided by the present invention;

[0046] Figure 4-1 A schematic diagram of a matching frequency domain image or a target frequency domain image of a specific implementation of the layout pattern matching method provided by the present invention;

[0047] Figure 4-2 A schematic diagram of a matching frequency domain image or a target frequency domain image according to another specific implementation of the layout pattern matching method provided by the present invention;

[0048] Figure 5 A schematic structural diagram of a specific implementation of the layout pattern matching device provided by the present invention.

[0049] In the figure, it includes 100-receiving module, 200-geometric search module, 300-gridding module, 400-Fourier transform module, 500-difference module, 600-judgment module, and 700-matching determination module. DETAILED DESCRIPTION

[0050] In order to enable those skilled in the art to better understand the scheme of the present invention, the present invention is further described in detail below in conjunction with the accompanying drawings and specific implementation methods. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0051] The core of the present invention is to provide a layout pattern matching method, a flow chart of a specific implementation method thereof is as follows: Figure 2 As shown, it is called specific implementation mode 1, including:

[0052] S101: receiving a target pattern and a layout to be matched.

[0053] S102: searching and matching the target pattern in the to-be-matched layout according to preset geometric feature matching conditions to obtain a geometric matching pattern.

[0054] The search for geometric matching patterns in this step can be achieved through pattern matching methods in related technologies, such as fuzzy matching. Fuzzy matching can allow a certain geometric feature to vary within a certain range, such as the line width of a certain graphic can float within a certain range, or a certain edge of a certain polygon can move within a certain range. In many application fields, fuzzy matching is more widely used. For example, for a known hot spot pattern, it is generally hoped to find all patterns that are similar to the pattern (corresponding to the target pattern) on the new design layout (corresponding to the layout to be matched) that may cause potential defects, rather than just finding patterns that are exactly the same as the known hot spot.

[0055] For reference Figure 3 , assuming that the target pattern is composed of three quasi-one-dimensional graphics with equal line width (W) and spacing (S), its geometric feature matching condition is defined as the vertical edge can move left and right for a distance not exceeding L. Based on the geometric feature matching condition defined above, a search is performed on the to-be-matched layout to obtain the geometric matching pattern, Figure 3 Patterns (b) to (h) in FIG. 1 are examples of geometric matching patterns corresponding to the target pattern shown in pattern (a) and the corresponding geometric feature matching conditions.

[0056] Of course, different geometric feature matching conditions can be preset for different target patterns, or the same geometric feature matching condition can be set for multiple target patterns. The specific selection can be made according to the actual situation, and the present invention will not be elaborated here.

[0057] S103: rasterizing the geometric matching pattern to obtain a corresponding matching spatial domain image; rasterizing the target pattern to obtain a corresponding target spatial domain image.

[0058] The target pattern and the geometric matching pattern are rasterized to obtain the corresponding spatial domain image, that is, the image in the spatial domain. The so-called rasterization is to select a square area containing all the graphics in the pattern and divide it into N*N grids. If a grid is filled with graphics, it is assigned a value of 1; if there is no graphics in a grid, it is assigned a value of 0; if a grid is partially filled with graphics, it is assigned a value according to the filling ratio, so that the graphics are converted into images.

[0059] S104: Performing Fourier transformation on the matching spatial domain image to obtain matching frequency domain images corresponding to each of the geometric matching patterns; performing Fourier transformation on the target spatial domain image to obtain a target frequency domain image corresponding to the target pattern.

[0060] In this step, the frequency domain images of the target pattern and the geometric matching pattern are calculated. The conversion from the spatial domain image to the frequency domain image is completed by Fourier transform. Moreover, since the difference between each matching frequency domain image and the target frequency domain image needs to be calculated in the subsequent steps, after obtaining the matching frequency domain image and the target frequency domain image in this step, the DC components (the point where the frequency is equal to 0) of these frequency domain images can be moved to the center of the image to facilitate the subsequent comparison of the difference between the frequency domain images. Figure 4-1 , Figure 4-1 That is Figure 3 The target frequency domain image corresponding to the target pattern shown in pattern (a) in FIG. 1 , wherein there are three bright spot areas along the X-axis, which correspond to the zeroth order (center position), positive first order and negative first order diffraction patterns of the target pattern lithography imaging.

[0061] S105: Calculate the difference values ​​between each of the matching frequency domain images and the target frequency domain image respectively as the diffraction information difference values ​​of the geometric matching patterns corresponding to each of the matching frequency domain images.

[0062] As a specific implementation, this step includes:

[0063] The difference value between each matching frequency domain image and the target frequency domain image is calculated by the following formula (1) as the diffraction information difference value of the geometric matching pattern corresponding to each matching frequency domain image:

[0064] ; (1)

[0065] Among them, M p (f x ,f y ) is the pth matching frequency domain image, M 0 (f x ,f y ) is the target frequency domain image, and D is the diffraction information difference value of the geometric matching pattern corresponding to the pth matching frequency domain image.

[0066] According to the theory of photolithography, for a mask image m(x,y), for a vertically incident light source, its diffraction image in the far field is the Fourier transform of m(x,y), which is M(fx,fy) in formula (1). Therefore, the frequency domain image of the pattern obtained here, that is, the diffraction pattern of the pattern, reflects the important characteristics of the photolithography imaging of the pattern.

[0067] S106: Determine whether the diffraction information difference value of each of the geometric matching patterns exceeds a preset first threshold.

[0068] S107: Determine a geometric matching pattern whose corresponding diffraction information difference value does not exceed the first threshold as a lithography matching pattern of the target pattern.

[0069] for Figure 3 The frequency domain image difference value calculated according to formula (1) for the geometric matching pattern and the target pattern is shown in Table 1. It can be seen that although Figure 3 Patterns (b) to (h) have similar geometric features to the target pattern (a), but their differences in the corresponding frequency domain images that are most relevant to lithography imaging are different. Patterns (e) and (f) have the largest differences in frequency domain images from the target pattern, which means that their lithography imaging features are most different from the target pattern.

[0070] Table 1

[0071] b c d e f g h Difference 10 10 22 102 102 22 14

[0072] Assuming that the first threshold is 20, only pattern (b), pattern (c) and pattern (h) are patterns that match the target pattern shown in pattern (a) in both geometric features and lithography imaging features, that is, they are lithography matching patterns of the target pattern.

[0073] As a preferred implementation, before respectively calculating the difference values ​​between each of the matching frequency domain images and the target frequency domain image, the method further includes:

[0074] The signals in the matching frequency domain image and the target frequency domain image whose frequencies are lower than a preset cutoff frequency are filtered out.

[0075] In other words, the matching frequency domain image and the target frequency domain image are processed by the following formula (2):

[0076] ; (2)

[0077] Among them, M(f x ,f y ) is the matching frequency domain image or the target frequency domain image in (f x ,f y ), f c The cutoff frequency is the original value of the low-frequency signal at and near the frequency of 0 (the near refers to the position where the frequency is lower than the cutoff frequency) is discarded and reassigned to 0. This is because the DC component in the frequency domain (the position where the frequency is 0) does not contribute to the photolithography imaging, and the components at the position near the DC component also contribute less to the photolithography imaging. Therefore, directly discarding it can simplify the matching frequency domain image and the target frequency domain image, and reduce the amount of calculation required for the subsequent calculation of the diffraction information difference value.

[0078] As a preferred implementation, before respectively calculating the difference values ​​between each of the matching frequency domain images and the target frequency domain image, the method further includes:

[0079] In the matching frequency domain image and the target frequency domain image, signals whose intensities are lower than a preset intensity threshold are filtered out.

[0080] In other words, the matching frequency domain image and the target frequency domain image are processed by the following formula (3):

[0081] ; (3)

[0082] Among them, M(f x ,f y ) is the matching frequency domain image or the target frequency domain image in (f x ,f y ), T r is the intensity threshold, that is, only the main diffraction pattern most relevant to lithography imaging is considered, that is, the part with higher intensity in the frequency domain image, and the part with insufficient intensity can be directly discarded and reassigned to 0, which can further simplify the matching frequency domain image and the target frequency domain image and reduce the amount of calculation required for subsequent calculation of the diffraction information difference value.

[0083] Furthermore, after filtering out signals with intensities lower than a preset intensity threshold in the matching frequency domain image and the target frequency domain image, the method further includes:

[0084] The signal strengths of all points whose signal strengths are not zero in the matching frequency domain image and the target frequency domain image are reassigned to the same target strength constant value; the target strength constant value is non-zero.

[0085] In other words, the matching frequency domain image and the target frequency domain image are processed by the following formula (4):

[0086] ; (4)

[0087] Among them, M(f x ,f y ) is the matching frequency domain image or the target frequency domain image in (f x ,f y ), T ris the intensity threshold, that is, after filtering out the positions with insufficient intensity by formula (3), all the remaining positions are assigned the same value (the target intensity constant), eliminating the light and dark differences between the positions with different intensities in the matching frequency domain image and the target frequency domain image, increasing the contrast, making the edge of the image more obvious, and reducing the amount of calculation required for the subsequent calculation of the diffraction information difference value. Of course, in formula (4), all the positions that meet the intensity threshold are assigned a value of 1, that is, the target intensity constant in formula (4) is 1. In actual operation, other target intensity constants can be selected, and the present invention is not limited here.

[0088] Of course, the matching frequency domain image and the target frequency domain image can also be processed by equation (1), equation (2), and equation (3). Please refer to Figure 4-2 , Figure 4-1 The frequency domain image of the target pattern in can be obtained after processing by equations (1), (2) and (3): Figure 4-2 The image in .

[0089] The layout pattern matching method provided by the present invention receives a target pattern and a layout to be matched; searches and matches the target pattern in the layout to be matched according to a preset geometric feature matching condition to obtain a geometric matching pattern; rasterizes the geometric matching pattern to obtain a corresponding matching spatial domain image; rasterizes the target pattern to obtain a corresponding target spatial domain image; performs Fourier transformation on the matching spatial domain image to obtain a matching frequency domain image corresponding to each of the geometric matching patterns; performs Fourier transformation on the target spatial domain image to obtain a target frequency domain image corresponding to the target pattern; calculates the difference value between each of the matching frequency domain images and the target frequency domain image respectively as the diffraction information difference value of the geometric matching pattern corresponding to each of the matching frequency domain images; determines whether the diffraction information difference value of each of the geometric matching patterns exceeds a preset first threshold; and determines the geometric matching pattern whose corresponding diffraction information difference value does not exceed the first threshold as the lithography matching pattern of the target pattern. On the basis of geometric feature matching, the present invention further matches the lithography imaging features of the geometric matching patterns obtained by the geometric feature matching, that is, compares the matching frequency domain image corresponding to the geometric matching pattern with the target frequency domain image corresponding to the target pattern. Since the frequency domain image itself corresponds to the diffraction pattern of the pattern, it reflects the important characteristics of the lithography imaging of the pattern. Therefore, by comparing the difference values ​​of the frequency domain images, the lithography matching patterns whose lithography imaging features also match the target pattern can be screened out, which greatly improves the pattern matching precision and matching accuracy, and at the same time increases the practicality of the layout pattern matching method in the present invention.

[0090] The following is an introduction to a layout pattern matching device provided in an embodiment of the present invention. The layout pattern matching device described below and the layout pattern matching method described above can be referenced to each other.

[0091] Figure 5 The structural block diagram of the layout pattern matching device provided by the embodiment of the present invention is shown in FIG. Figure 5 The layout pattern matching device may include:

[0092] A receiving module 100 is used to receive a target pattern and a layout to be matched;

[0093] A geometric search module 200 is used to search and match the target pattern in the to-be-matched layout according to a preset geometric feature matching condition to obtain a geometric matching pattern;

[0094] The rasterization module 300 is used to rasterize the geometric matching pattern to obtain a corresponding matching airspace image; and to rasterize the target pattern to obtain a corresponding target airspace image;

[0095] The Fourier transform module 400 is used to perform Fourier transform on the matching spatial domain image to obtain matching frequency domain images corresponding to each of the geometric matching patterns; perform Fourier transform on the target spatial domain image to obtain a target frequency domain image corresponding to the target pattern;

[0096] A difference module 500 is used to calculate the difference values ​​between each of the matching frequency domain images and the target frequency domain image, as the diffraction information difference values ​​of the geometric matching patterns corresponding to each of the matching frequency domain images;

[0097] A judging module 600 is used to judge whether the diffraction information difference value of each of the geometric matching patterns exceeds a preset first threshold;

[0098] The matching determination module 700 is used to determine a geometric matching pattern whose corresponding diffraction information difference value does not exceed the first threshold as a lithography matching pattern of the target pattern.

[0099] As a preferred implementation, the Fourier transform module 400 further includes:

[0100] The low-frequency filtering unit is used to filter out signals with frequencies lower than a preset cutoff frequency in the matching frequency domain image and the target frequency domain image.

[0101] As a preferred implementation, the Fourier transform module 400 further includes:

[0102] The intensity filtering unit is used to filter out signals whose intensities are lower than a preset intensity threshold in the matching frequency domain image and the target frequency domain image.

[0103] As a preferred implementation, the Fourier transform module 400 further includes:

[0104] The intensity assignment unit is used to reassign the signal strengths of all points whose signal strengths are not zero in the matching frequency domain image and the target frequency domain image to the same target intensity constant; the target intensity constant is non-zero.

[0105] As a preferred implementation, the difference module 500 includes:

[0106] The difference formula unit is used to calculate the difference value between each of the matching frequency domain images and the target frequency domain image by the following formula as the diffraction information difference value of the geometric matching pattern corresponding to each of the matching frequency domain images:

[0107] ;

[0108] Among them, M p (f x , f y ) is the pth matching frequency domain image, M p (f x , f y ) is the target frequency domain image, and D is the diffraction information difference value of the geometric matching pattern corresponding to the pth matching frequency domain image.

[0109] The layout pattern matching device provided by the present invention includes a receiving module 100, which is used to receive a target pattern and a layout to be matched; a geometric search module 200, which is used to search and match the target pattern in the layout to be matched according to a preset geometric feature matching condition to obtain a geometric matching pattern; a rasterization module 300, which is used to rasterize the geometric matching pattern to obtain a corresponding matching airspace image; rasterize the target pattern to obtain a corresponding target airspace image; and a Fourier transform module 400, which is used to perform Fourier transform on the matching airspace image to obtain a matching image corresponding to each of the geometric matching patterns. frequency domain image; performing Fourier transform on the target spatial domain image to obtain a target frequency domain image corresponding to the target pattern; a difference module 500, used to respectively calculate the difference values ​​between each of the matching frequency domain images and the target frequency domain image as the diffraction information difference values ​​of the geometric matching patterns corresponding to each of the matching frequency domain images; a judgment module 600, used to judge whether the diffraction information difference values ​​of each of the geometric matching patterns exceed a preset first threshold; a matching determination module 700, used to determine the geometric matching pattern whose corresponding diffraction information difference value does not exceed the first threshold as the lithography matching pattern of the target pattern. On the basis of geometric feature matching, the present invention further matches the lithography imaging features of the geometric matching patterns obtained by the geometric feature matching, that is, compares the matching frequency domain image corresponding to the geometric matching pattern with the target frequency domain image corresponding to the target pattern. Since the frequency domain image itself corresponds to the diffraction pattern of the pattern, it reflects the important characteristics of the lithography imaging of the pattern. Therefore, by comparing the difference values ​​of the frequency domain images, the lithography matching patterns whose lithography imaging features also match the target pattern can be screened out, which greatly improves the pattern matching precision and matching accuracy, and at the same time increases the practicality of the layout pattern matching method in the present invention.

[0110] The layout pattern matching device of this embodiment is used to implement the aforementioned layout pattern matching method. Therefore, the specific implementation method of the layout pattern matching device can be seen in the embodiment part of the layout pattern matching method in the previous text. For example, the receiving module 100, the geometric search module 200, the rasterization module 300, the Fourier transform module 400, the difference module 500, the judgment module 600, and the matching determination module 700 are respectively used to implement steps S101, S102, S103, S104, S105, S106 and S107 in the above-mentioned layout pattern matching method. Therefore, its specific implementation method can refer to the description of the corresponding each part of the embodiment, which will not be repeated here.

[0111] The present invention also provides a layout pattern matching device, comprising:

[0112] Memory for storing computer programs;

[0113] A processor is used to implement the steps of the layout pattern matching method as described in any one of the above when executing the computer program. The layout pattern matching method provided by the present invention receives a target pattern and a layout to be matched; searches and matches the target pattern in the layout to be matched according to a preset geometric feature matching condition to obtain a geometric matching pattern; rasterizes the geometric matching pattern to obtain a corresponding matching spatial domain image; rasterizes the target pattern to obtain a corresponding target spatial domain image; performs Fourier transformation on the matching spatial domain image to obtain a matching frequency domain image corresponding to each of the geometric matching patterns; performs Fourier transformation on the target spatial domain image to obtain a target frequency domain image corresponding to the target pattern; calculates the difference value between each of the matching frequency domain images and the target frequency domain image respectively as the diffraction information difference value of the geometric matching pattern corresponding to each of the matching frequency domain images; determines whether the diffraction information difference value of each of the geometric matching patterns exceeds a preset first threshold; and determines the geometric matching pattern whose corresponding diffraction information difference value does not exceed the first threshold as the lithography matching pattern of the target pattern. On the basis of geometric feature matching, the present invention further matches the lithography imaging features of the geometric matching patterns obtained by the geometric feature matching, that is, compares the matching frequency domain image corresponding to the geometric matching pattern with the target frequency domain image corresponding to the target pattern. Since the frequency domain image itself corresponds to the diffraction pattern of the pattern, it reflects the important characteristics of the lithography imaging of the pattern. Therefore, by comparing the difference values ​​of the frequency domain images, the lithography matching patterns whose lithography imaging features also match the target pattern can be screened out, which greatly improves the pattern matching precision and matching accuracy, and at the same time increases the practicality of the layout pattern matching method in the present invention.

[0114] The present invention also provides a computer-readable storage medium, on which a computer program is stored, and when the computer program is executed by a processor, the steps of the layout pattern matching method described in any one of the above are implemented. The layout pattern matching method provided by the present invention receives a target pattern and a layout to be matched; searches and matches the target pattern in the layout to be matched according to a preset geometric feature matching condition to obtain a geometric matching pattern; rasterizes the geometric matching pattern to obtain a corresponding matching spatial domain image; rasterizes the target pattern to obtain a corresponding target spatial domain image; performs Fourier transformation on the matching spatial domain image to obtain a matching frequency domain image corresponding to each of the geometric matching patterns; performs Fourier transformation on the target spatial domain image to obtain a target frequency domain image corresponding to the target pattern; calculates the difference value between each of the matching frequency domain images and the target frequency domain image, respectively, as the diffraction information difference value of the geometric matching pattern corresponding to each of the matching frequency domain images; determines whether the diffraction information difference value of each of the geometric matching patterns exceeds a preset first threshold; and determines the geometric matching pattern whose corresponding diffraction information difference value does not exceed the first threshold as the lithography matching pattern of the target pattern. On the basis of geometric feature matching, the present invention further matches the lithography imaging features of the geometric matching patterns obtained by the geometric feature matching, that is, compares the matching frequency domain image corresponding to the geometric matching pattern with the target frequency domain image corresponding to the target pattern. Since the frequency domain image itself corresponds to the diffraction pattern of the pattern, it reflects the important characteristics of the lithography imaging of the pattern. Therefore, by comparing the difference values ​​of the frequency domain images, the lithography matching patterns whose lithography imaging features also match the target pattern can be screened out, which greatly improves the pattern matching precision and matching accuracy, and at the same time increases the practicality of the layout pattern matching method in the present invention.

[0115] In this specification, each embodiment is described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the embodiments can be referred to each other. For the device disclosed in the embodiment, since it corresponds to the method disclosed in the embodiment, the description is relatively simple, and the relevant parts can be referred to the method part.

[0116] It should be noted that, in this specification, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "comprise", "include" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, an element defined by the statement "comprises a ..." does not exclude the presence of other identical elements in the process, method, article or device including the element.

[0117] Professionals may further appreciate that the units and algorithm steps of each example described in conjunction with the embodiments disclosed herein can be implemented in electronic hardware, computer software, or a combination of the two. In order to clearly illustrate the interchangeability of hardware and software, the composition and steps of each example have been generally described in the above description according to function. Whether these functions are performed in hardware or software depends on the specific application and design constraints of the technical solution. Professionals and technicians may use different methods to implement the described functions for each specific application, but such implementation should not be considered to be beyond the scope of the present invention.

[0118] The steps of the method or algorithm described in conjunction with the embodiments disclosed herein may be implemented directly using hardware, a software module executed by a processor, or a combination of the two. The software module may be placed in a random access memory (RAM), a memory, a read-only memory (ROM), an electrically programmable ROM, an electrically erasable programmable ROM, a register, a hard disk, a removable disk, a CD-ROM, or any other form of storage medium known in the art.

[0119] The above is a detailed introduction to the layout pattern matching method, device, equipment and storage medium provided by the present invention. Specific examples are used herein to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only used to help understand the method of the present invention and its core idea. It should be pointed out that for ordinary technicians in this technical field, without departing from the principles of the present invention, the present invention can also be improved and modified, and these improvements and modifications also fall within the scope of protection of the present invention.

Claims

1. A layout pattern matching method, characterized in that: include: Receiving a target pattern and a layout to be matched; According to a preset geometric feature matching condition, searching and matching the target pattern in the to-be-matched layout to obtain a geometric matching pattern; Rasterizing the geometric matching pattern to obtain a corresponding matching spatial domain image; Rasterizing the target pattern to obtain a corresponding target airspace image; Performing Fourier transform on the matching spatial domain image to obtain matching frequency domain images corresponding to each of the geometric matching patterns; Performing Fourier transform on the target spatial domain image to obtain a target frequency domain image corresponding to the target pattern; The target frequency domain image includes a plurality of bright spot areas, and the bright spot areas respectively correspond to a zero-order diffraction pattern, a positive first-order diffraction pattern, and a negative first-order diffraction pattern of the photolithography imaging of the target pattern; respectively calculating the difference values ​​between each of the matching frequency domain images and the target frequency domain image as the diffraction information difference values ​​of the geometric matching patterns corresponding to each of the matching frequency domain images; Determining whether the diffraction information difference value of each of the geometric matching patterns exceeds a preset first threshold; A geometric matching pattern whose corresponding diffraction information difference value does not exceed the first threshold is determined as a lithography matching pattern of the target pattern.

2. The layout pattern matching method according to claim 1, characterized in that: Before respectively calculating the difference values ​​between each of the matching frequency domain images and the target frequency domain image, the method further includes: The signals in the matching frequency domain image and the target frequency domain image whose frequencies are lower than a preset cutoff frequency are filtered out.

3. The layout pattern matching method according to claim 1, characterized in that: Before respectively calculating the difference values ​​between each of the matching frequency domain images and the target frequency domain image, the method further includes: The signals in the matching frequency domain image and the target frequency domain image whose intensities are lower than a preset intensity threshold are filtered out.

4. The layout pattern matching method according to claim 3, characterized in that: After filtering out signals with intensities lower than a preset intensity threshold in the matching frequency domain image and the target frequency domain image, the method further includes: The signal strengths of all points whose signal strengths are not zero in the matching frequency domain image and the target frequency domain image are reassigned to the same target strength constant value; the target strength constant value is non-zero.

5. The layout pattern matching method according to claim 1, characterized in that: Calculating the difference values ​​between each of the matching frequency domain images and the target frequency domain image respectively as the diffraction information difference values ​​of the geometric matching patterns corresponding to each of the matching frequency domain images includes: The difference value between each matching frequency domain image and the target frequency domain image is calculated by the following formula as the diffraction information difference value of the geometric matching pattern corresponding to each matching frequency domain image: ； Among them, M p (f x ,f y ) is the pth matching frequency domain image, M0(f x ,f y ) is the target frequency domain image, and D is the diffraction information difference value of the geometric matching pattern corresponding to the pth matching frequency domain image.

6. A layout pattern matching device, characterized in that: include: A receiving module, used for receiving a target pattern and a layout to be matched; A geometric search module, used to search and match the target pattern in the to-be-matched layout according to a preset geometric feature matching condition, to obtain a geometric matching pattern; A rasterization module, used for rasterizing the geometric matching pattern to obtain a corresponding matching spatial domain image; Rasterizing the target pattern to obtain a corresponding target airspace image; A Fourier transform module, used for performing Fourier transform on the matching spatial domain image to obtain a matching frequency domain image corresponding to each of the geometric matching patterns; Performing Fourier transform on the target spatial domain image to obtain a target frequency domain image corresponding to the target pattern; The target frequency domain image includes a plurality of bright spot areas, and the bright spot areas respectively correspond to a zero-order diffraction pattern, a positive first-order diffraction pattern, and a negative first-order diffraction pattern of the photolithography imaging of the target pattern; A difference module, used to calculate the difference values ​​between each of the matching frequency domain images and the target frequency domain image, as the diffraction information difference values ​​of the geometric matching patterns corresponding to each of the matching frequency domain images; A judging module, used to judge whether the diffraction information difference value of each of the geometric matching patterns exceeds a preset first threshold; The matching determination module is used to determine the geometric matching pattern whose corresponding diffraction information difference value does not exceed the first threshold as the lithography matching pattern of the target pattern.

7. The layout pattern matching device according to claim 6, characterized in that: The Fourier transform module further includes: The low-frequency filtering unit is used to filter out signals with frequencies lower than a preset cutoff frequency in the matching frequency domain image and the target frequency domain image.

8. The layout pattern matching device according to claim 6, characterized in that: The Fourier transform module further includes: The intensity filtering unit is used to filter out signals whose intensities are lower than a preset intensity threshold in the matching frequency domain image and the target frequency domain image.

9. A layout pattern matching device, characterized in that: include: Memory for storing computer programs; A processor, configured to implement the steps of the layout pattern matching method as described in any one of claims 1 to 5 when executing the computer program.

10. A computer-readable storage medium, characterized in that: The computer-readable storage medium stores a computer program, and when the computer program is executed by a processor, the steps of the layout pattern matching method according to any one of claims 1 to 5 are implemented.

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