Substrate processing apparatus and method

Abstract

The present invention discloses a substrate processing apparatus and method, the substrate processing apparatus comprising: a chemical liquid discharge valve that discharges a chemical liquid according to a pressure value of air supplied to an air pressure input port; the pressure adjusting module is used for adjusting the pressure value of air supplied to the air pressure input port of the medicine liquid discharging valve; and a processor that adjusts the pressure value of the air by the pressure adjustment module in order to increase or decrease the discharge amount of the chemical liquid by adjusting the opening and closing of the valve according to the type or characteristic of the chemical liquid discharged through the chemical liquid discharge valve.

Description

Technical Field

[0001] The invention relates to a substrate processing device and method. Background Art

[0002] Generally, in the semiconductor manufacturing process, there is a step of applying (supplying) a chemical solution onto a substrate such as a semiconductor wafer.

[0003] For example, Korean Patent Publication No. 10-2012-0083859 (July 26, 2012) discloses a chemical solution supply system for supplying a chemical solution (eg, photoresist) onto a substrate.

[0004] In this case, the chemical liquid to be supplied to the substrate is supplied from a tank storing the chemical liquid externally to the nozzle by a pump, and the nozzle performs a process of supplying the chemical liquid to the upper portion of the substrate.

[0005] Among them, the method of supplying the chemical liquid to the substrate using a pump has disadvantages that it is difficult to adjust when supplying a small amount of chemical liquid to the substrate and it is difficult to adjust the flow of droplets. Therefore, there is a recent trend to use a suck back valve.

[0006] However, the back-sucking valve has a problem of reduced stability when discharging and back-sucking the liquid medicine, depending on the speed of the valve opening (ie, opening) and closing (ie, closing) and the type (or characteristics) of the liquid medicine.

[0007] Therefore, in order to improve the stability of discharge and back-suction of the chemical solution according to the type (or characteristics) of the chemical solution (eg, specific gravity, concentration, viscosity, etc.), it is necessary to control the opening and closing speed of the back-suction valve. Summary of the invention

[0008] According to one embodiment of the present invention, the present invention is used to solve the problem as described above. The purpose of the present invention is to provide the following substrate processing device and method, which can improve the discharge and back-suction stability of the chemical liquid according to the type or characteristics of the chemical liquid by controlling the opening and closing speed of the back-suction valve.

[0009] A substrate processing device according to one embodiment of the present invention is characterized in that it includes: a chemical liquid discharge valve, which discharges chemical liquid according to the pressure value of air supplied to an air pressure input port; a pressure regulating module, which is used to regulate the pressure value of air supplied to the air pressure input port of the chemical liquid discharge valve; and a processor, which adjusts the pressure value of the air through the pressure regulating module in order to adjust the opening and closing of the valve according to the type or characteristics of the chemical liquid discharged through the chemical liquid discharge valve so as to increase or decrease the discharge amount of the chemical liquid.

[0010] The present invention is characterized in that the liquid medicine discharge valve comprises a suck-back valve.

[0011] The present invention is characterized in that it further comprises a database storing: the type or characteristic data of the medical liquid; and a first PT parameter and a second PT parameter for adjusting the speed of increase and decrease of the discharge amount of the medical liquid.

[0012] The present invention is characterized in that the processor sets or calculates a first PT parameter for starting to discharge the medicinal liquid based on the type or characteristic data of the medicinal liquid loaded from the database, and sets or calculates a second PT parameter for stopping the discharge of the medicinal liquid based on the type or characteristic data of the medicinal liquid loaded from the database.

[0013] The present invention is characterized in that the first PT parameter is a value corresponding to the speed at which the discharge amount of the chemical liquid increases according to the air pressure-time slope SL1, and the second PT parameter is a value corresponding to the speed at which the discharge amount of the chemical liquid decreases according to the air pressure-time slope SL2.

[0014] The present invention is characterized in that the processor increases the pressure value of the air supplied to the liquid medicine discharge valve from 0 to a maximum pressure value specified based on a first PT parameter, and the liquid medicine discharge valve begins to open at the first pressure value and is in a fully open state at the second pressure value.

[0015] The present invention is characterized in that the processor reduces the pressure value of the air supplied to the liquid medicine discharge valve from a specified maximum pressure value to 0 based on a second PT parameter, and the liquid medicine discharge valve starts to close at the second pressure value and is in a fully closed state at the first pressure value.

[0016] The present invention is characterized in that the first pressure value and the second pressure value are values ​​set according to the characteristics of the valve, the first pressure value is a value greater than 0, and the second pressure value is less than the maximum pressure value.

[0017] A substrate processing method according to another embodiment of the present invention is characterized in that it includes the following steps: a processor of a control device for a chemical liquid discharge valve loads data on the type or characteristics of chemical liquid discharged through the chemical liquid discharge valve from a database; and in order to adjust the opening and closing of the valve according to the type or characteristics of the loaded chemical liquid so as to increase or decrease the discharge amount of the chemical liquid, the processor adjusts the pressure value of the air supplied to the chemical liquid discharge valve.

[0018] The present invention is characterized in that, in the step of adjusting the air pressure value, the processor adjusts the pressure value of the air supplied to the liquid medicine discharge valve based on a first PT parameter for starting discharge of the liquid medicine and a second PT parameter for stopping discharge of the liquid medicine.

[0019] The present invention is characterized in that the database stores: the type or characteristic data of the chemical liquid; and at least one of a first PT parameter and a second PT parameter for adjusting the speed of increase and decrease of the discharge amount of the chemical liquid.

[0020] The present invention is characterized in that the first PT parameter is a value corresponding to the speed at which the discharge amount of the chemical liquid increases according to the air pressure-time slope SL1, and the second PT parameter is a value corresponding to the speed at which the discharge amount of the chemical liquid decreases according to the air pressure-time slope SL2.

[0021] The present invention is characterized in that the processor increases the pressure value of the air supplied to the liquid medicine discharge valve from 0 to a maximum pressure value specified based on a first PT parameter, and the liquid medicine discharge valve begins to open at the first pressure value and is in a fully open state at the second pressure value.

[0022] The present invention is characterized in that the processor reduces the pressure value of the air supplied to the liquid medicine discharge valve from a specified maximum pressure value to 0 based on a second PT parameter, and the liquid medicine discharge valve starts to close at the second pressure value and is in a fully closed state at the first pressure value.

[0023] The present invention is characterized in that the first pressure value and the second pressure value are values ​​set according to the characteristics of the valve, the first pressure value is a value greater than 0, and the second pressure value is less than the maximum pressure value.

[0024] According to one embodiment of the present invention, the present invention can improve the stability of the discharge and back-suction of the drug solution according to the type or characteristics of the drug solution by controlling the opening and closing speed of the back-suction valve. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 FIG. 1 is an illustrative diagram showing a schematic structure of a substrate processing apparatus according to an embodiment of the present invention.

[0026] Figure 2 The flowchart is used to illustrate a substrate processing method according to an embodiment of the present invention.

[0027] Figure 3 For illustration purposes Figure 1 , an illustration of the timing at which the liquid medicine discharge valve opens and closes in response to the air pressure supplied by the pressure regulating module.

[0028] Figure 4 For illustration Figure 3 , which is a diagram illustrating an example of a liquid medicine discharge acceleration section, a liquid medicine discharge deceleration section, and a back suction section as liquid medicine discharge begins in the valve opening and closing section. DETAILED DESCRIPTION

[0029] Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings.

[0030] In this process, for the sake of clarity and convenience of explanation, the thickness of the lines shown in the figure or the size of the structural elements may be enlarged. In addition, the terms described below are defined in consideration of their functions in the present invention, which may vary according to the intention or practice of the user or operator. Therefore, the definitions of these terms should be defined according to the full text of this specification.

[0031] Figure 1 FIG. 1 is an illustrative diagram showing a schematic structure of a substrate processing apparatus according to an embodiment of the present invention.

[0032] like Figure 1 As shown, the substrate processing apparatus of this embodiment includes a chemical liquid supply module 110 , an air pressure module 120 , a pressure regulating module 130 , a processor 140 , a database 150 , and a chemical liquid discharge valve 160 (or a suck-back valve).

[0033] The chemical solution supply module 110 supplies chemical solution used in a semiconductor manufacturing process to a chemical solution supply port of the chemical solution discharge valve 160 through a chemical solution supply line.

[0034] The air pressure module 120 supplies air for controlling the liquid medicine discharge valve 160 to the pressure regulating module 130 .

[0035] The pressure regulating module 130 regulates the pressure value of air supplied by the air pressure module 120 and supplies the air to the air pressure input port of the liquid medicine discharge valve 160 .

[0036] The processor 140 may load data on the type (or characteristics) of the medical fluid discharged through the medical fluid discharge valve 160 from the database 150 .

[0037] The processor 140 may calculate (or set) a first PT parameter (a first air pressure-time parameter, which is the same as the first pressure-time parameter) for starting to discharge the liquid medicine based on the type (or characteristic) data of the liquid medicine loaded from the database 150. Figure 3 The pressure-time slope SL1 corresponds to the pressure-time slope SL1.

[0038] The processor 140 may calculate (or set) a second PT parameter (a second air pressure-time parameter, which is the same as the second air pressure-time parameter) for back suction (i.e., stopping the discharge of the liquid and back suction) based on the type (or characteristic) data of the liquid loaded from the database 150. Figure 3 The pressure-time slope SL2 corresponds to the pressure-time slope SL2).

[0039] The first PT parameter (with Figure 3 The pressure-time slope SL1 corresponds to the second PT parameter (corresponding to Figure 3The air pressure-application slope SL2) can be pre-calculated and stored in the database 150.

[0040] In this case, the first PT parameter based on the type (or characteristic) of the liquid medicine (related to the discharge amount of the liquid medicine) Figure 3 The pressure-time slope SL1 increases at a rate corresponding to the second PT parameter (corresponding to the discharge volume of the liquid according to Figure 3 The pressure-time slope SL2 (a parameter corresponding to the speed at which the pressure decreases) can be set through experiments (or tests) to a value that can maintain optimal stability when the liquid medicine is initially discharged and sucked back.

[0041] Among them, the first PT parameter (which is related to the discharge volume of the liquid according to Figure 3 The second PT parameter (corresponding to the speed at which the pressure-time slope SL1 increases) is a value corresponding to the interval in which the amount of liquid medicine discharged increases (i.e., the interval in which the amount of liquid medicine discharged increases), and the second PT parameter (corresponding to the amount of liquid medicine discharged according to Figure 3 The parameter corresponding to the speed at which the air pressure-time slope SL2 decreases) is a value corresponding to the interval of decreasing liquid medicine discharge amount (that is, the interval in which the discharge of liquid medicine is finally stopped and back-sucking is performed after the discharge amount of liquid medicine is reduced).

[0042] That is, the speed of increase and the speed of decrease of the discharge amount of the chemical liquid can be adjusted by the first PT parameter and the second PT parameter.

[0043] Furthermore, the database 150 may store in advance data on the type (or characteristics) of chemical solutions supplied in each semiconductor manufacturing process.

[0044] When the drug liquid is discharged and sucked back, the processor 140 can control the pressure regulating module 130 based on the first PT parameter and the second PT parameter (refer to Figure 3 ).

[0045] The chemical liquid discharge valve 160 supplies (applies) the chemical liquid supplied through the chemical liquid input port to the substrate (eg, wafer) through a nozzle connected to the chemical liquid output port.

[0046] The liquid medicine discharge valve 160 opens and closes according to the air pressure (ie, the air pressure) supplied by the pressure regulating module 130 to discharge the liquid medicine or to suck the liquid medicine back (ie, to suck the liquid medicine back after stopping the discharge of the liquid medicine) (see Figure 3 ).

[0047] Figure 2 The flowchart is used to illustrate a substrate processing method according to an embodiment of the present invention.

[0048] Reference Figure 2, the processor 140 loads data on the type (or characteristics) of the medical fluid discharged through the medical fluid discharge valve 160 (or the suck-back valve) from the database 150 (step S101 ).

[0049] The processor 140 calculates (or sets) a first PT parameter (corresponding to the first PT parameter) for starting to discharge the medical fluid based on the type (or characteristic) data of the medical fluid loaded from the database 150. Figure 3 The air pressure-time slope SL1 corresponds to the air pressure-time slope SL1 of the embodiment of the present invention (step S102).

[0050] The processor 140 calculates (or sets) a second PT parameter (corresponding to the second PT parameter) for the back suction of the medical fluid (i.e., back suction after stopping the discharge of the medical fluid) based on the type (or characteristic) data of the medical fluid loaded from the database 150. Figure 3 The pressure-time slope SL2 corresponds to the pressure-time slope SL2 (step S103).

[0051] Among them, the first PT parameter (with Figure 3 The pressure-time slope SL1 of the second PT parameter (corresponding to the pressure-time slope SL2 of the second PT parameter) is a value corresponding to the interval of increasing discharge volume of the liquid medicine (i.e., the interval of increasing discharge volume of the liquid medicine), and the second PT parameter (corresponding to the pressure-time slope SL1 of the second PT parameter) is a value corresponding to the interval of increasing discharge volume of the liquid medicine (i.e., the interval of increasing discharge volume of the liquid medicine). Figure 3 The pressure-time slope SL2 corresponds to the interval in which the discharge amount of the chemical liquid decreases (ie, the interval in which the discharge of the chemical liquid is finally stopped and the back suction is performed after the discharge amount of the chemical liquid decreases).

[0052] When the drug liquid is discharged and sucked back, the processor 140 may control the pressure regulating module 130 based on the first PT parameter and the second PT parameter (step S104) (refer to Figure 3 ).

[0053] Thus, the liquid medicine discharge valve 160 is opened and closed in response to the air pressure (ie, the air pressure) supplied by the pressure regulating module 130 (see Figure 3 ).

[0054] Figure 3 For illustration purposes Figure 1 , an example diagram of the time points at which the liquid medicine discharge valve 160 opens and closes in response to the air pressure supplied by the pressure regulating module 130.

[0055] Reference Figure 3 , the processor 140 increases the gas pressure supplied to the liquid discharge valve 160 through the pressure regulating module 130 from 0 (Gage Pressure) to a value based on the first PT parameter (corresponding to Figure 3 The pressure value (Set Pressure) (corresponding to the pressure-time slope SL1) Figure 3 interval ①-②).

[0056] Thus, when the air pressure supplied to the liquid medicine discharge valve 160 reaches a predetermined first pressure value, the liquid medicine discharge valve 160 in the fully closed state begins to open, and when it reaches a predetermined second pressure value, the liquid medicine discharge valve 160 is in the fully opened state.

[0057] Refer again Figure 3 The processor 140 adjusts the air pressure supplied to the liquid discharge valve 160 through the pressure regulating module 130 based on the second PT parameter (which is Figure 3 The pressure-time slope SL2 of the pressure-time slope SL2) decreases from the maximum pressure value (Set Pressure) to 0 (Gage) ( Figure 3 ③-④ interval).

[0058] Thus, when the air pressure supplied to the liquid medicine discharge valve 160 reaches the second pressure value, the liquid medicine discharge valve 160 in the fully open state begins to close, and when it reaches the first pressure value, the liquid medicine discharge valve 160 is in the fully closed state.

[0059] In this case, the first pressure value at which the liquid medicine discharge valve 160 starts to open is greater than 0 (Gage), and the second pressure value at which the liquid medicine discharge valve 160 is completely closed is less than the maximum pressure value (SetPressure) supplied by the pressure regulating module 130 .

[0060] However, the first pressure value and the second pressure value may be set according to the characteristics of the valve (eg, spring constant or internal structure).

[0061] Figure 4 For illustration Figure 3 , which is a diagram illustrating an example of a liquid medicine discharge acceleration section, a liquid medicine discharge deceleration section, and a back suction section as liquid medicine discharge begins in the valve opening and closing section.

[0062] Reference Figure 4 In the interval where the liquid medicine discharge volume increases (i.e., the interval where the liquid medicine discharge valve in a fully closed state begins to open and completes the valve fully opening to a fully open state), the liquid medicine discharge volume increases in response to the valve opening speed.

[0063] Furthermore, in the interval in which the amount of liquid medicine discharged decreases (i.e., the interval in which the liquid medicine discharge valve in a fully open state begins to close and completes the valve full closure to a fully closed state), the liquid medicine discharge amount decreases in response to the valve closing speed, and then, as the liquid medicine stops being discharged, back suction is finally performed.

[0064] As described above, the present invention has the following effect: the opening and closing speed of the liquid medicine discharge valve (ie, the suckback valve) is controlled based on the first PT parameter and the second PT parameter, thereby improving the stability of liquid medicine discharge and suckback according to the type or characteristics of the liquid medicine.

[0065] The present invention is described with reference to the embodiments shown in the drawings, but this is only for illustration, and it is understood by those skilled in the art that there may be many variations and other equivalent embodiments. Therefore, the technical protection scope of the present invention should be defined by the scope of the following claims. Moreover, for example, the implementation described in this specification can be implemented as a method or processor, a device, a software program, a data stream or a signal. Even if it is discussed only in the context of a single form of implementation (for example, discussed only as a method), the implementation of the discussed features can also be implemented in other forms (for example, a device or a program). The device can be implemented as appropriate hardware, software, firmware, etc. For example, the method can be implemented in a device such as a processor, which generally refers to a processing device including a computer, a microprocessor, an integrated circuit or a programmable logic device. The processor also includes communication devices, such as computers, collections, portable / personal information terminals (personal digital assistants: "PDAs") and other devices that facilitate information communication between end users.

Claims

1. A substrate processing device, characterized in that: include: The liquid medicine discharge valve discharges the liquid medicine according to the pressure value of the air supplied to the air pressure input port; A pressure regulating module, used for regulating the pressure value of the air supplied to the air pressure input port of the liquid medicine discharge valve; as well as The processor adjusts the pressure value of the air through the pressure regulating module in order to adjust the opening and closing of the valve according to the type or characteristics of the liquid medicine discharged through the liquid medicine discharge valve so as to increase or decrease the discharge amount of the liquid medicine.

2. The substrate processing device according to claim 1, characterized in that: The liquid medicine discharge valve includes a suck-back valve.

3. The substrate processing device according to claim 1, characterized in that: Also included is a database storing: The type or characteristic data of the liquid medicine; and The first PT parameter and the second PT parameter are used to adjust the speed of increase and decrease of the discharge amount of the liquid medicine.

4. The substrate processing device according to claim 1, characterized in that: The processor sets or calculates a first PT parameter for starting to discharge the medical fluid based on the type or characteristic data of the medical fluid loaded from the database, A second PT parameter for stopping discharge of the medical fluid is set or calculated based on the type or characteristic data of the medical fluid loaded from the database.

5. The substrate processing device according to claim 3, characterized in that: The first PT parameter is a value corresponding to the speed at which the discharge amount of the liquid medicine increases according to the pressure-time slope. The second PT parameter is a value corresponding to a speed at which the discharge amount of the chemical solution decreases according to the air pressure-time slope.

6. The substrate processing apparatus according to claim 1, wherein: The processor increases the pressure value of the air supplied to the liquid medicine discharge valve from 0 to a maximum pressure value specified based on a first PT parameter, The liquid medicine discharge valve begins to open at a first pressure value and is in a fully open state at a second pressure value.

7. The substrate processing apparatus according to claim 1, wherein: the processor reducing the pressure value of the air supplied to the liquid medicine discharge valve from a predetermined maximum pressure value to 0 based on a second PT parameter, The liquid medicine discharge valve starts to close at the second pressure value and is in a completely closed state at the first pressure value.

8. The substrate processing device according to claim 6, characterized in that: The first pressure value and the second pressure value are values ​​set according to the characteristics of the valve, the first pressure value is a value greater than 0, and the second pressure value is less than the maximum pressure value.

9. A substrate processing method, characterized in that: The steps include: The processor of the control device of the liquid medicine discharge valve loads the type or characteristic data of the liquid medicine discharged through the liquid medicine discharge valve from the database; and The processor adjusts the pressure value of the air supplied to the chemical liquid discharge valve in order to adjust the opening and closing of the valve according to the type or characteristics of the loaded chemical liquid to increase or decrease the discharge amount of the chemical liquid.

10. The substrate processing method according to claim 9, characterized in that: In the step of adjusting the pressure value of the air, the processor adjusts the pressure value of the air supplied to the medical fluid discharge valve based on a first PT parameter for starting discharge of the medical fluid and a second PT parameter for stopping discharge of the medical fluid.

11. The substrate processing method according to claim 9, characterized in that: The database stores: The type or characteristic data of the liquid medicine; and At least one of a first PT parameter and a second PT parameter for adjusting a speed of increase and a speed of decrease of the discharge amount of the chemical liquid.

12. The substrate processing method according to claim 10, characterized in that: The first PT parameter is a value corresponding to the speed at which the discharge amount of the liquid medicine increases according to the pressure-time slope. The second PT parameter is a value corresponding to a speed at which the discharge amount of the chemical solution decreases according to the air pressure-time slope.

13. The substrate processing method according to claim 9, characterized in that: The processor increases the pressure value of the air supplied to the liquid medicine discharge valve from 0 to a maximum pressure value specified based on a first PT parameter, The liquid medicine discharge valve begins to open at a first pressure value and is in a fully open state at a second pressure value.

14. The substrate processing method according to claim 9, characterized in that: the processor reducing the pressure value of the air supplied to the liquid medicine discharge valve from a predetermined maximum pressure value to 0 based on a second PT parameter, The liquid medicine discharge valve starts to close at the second pressure value and is in a completely closed state at the first pressure value.

15. The substrate processing method according to claim 13 or 14, characterized in that: The first pressure value and the second pressure value are values ​​set according to the characteristics of the valve, the first pressure value is a value greater than 0, and the second pressure value is less than the maximum pressure value.

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