Display device

Abstract

There is provided a display device including: a display layer; an overcoat layer disposed on the display layer and including an organic material; and an anti-reflection layer, wherein the anti-reflection layer is arranged on the outer coating layer. The anti-reflection layer includes: a first passivation layer; a first refractive layer disposed on the first passivation layer and having a first refractive index; a second refractive layer disposed on the first refractive layer and having a second refractive index; the second passivation layer is arranged on the second refraction layer; and an outer refractive layer disposed on the second passivation layer and having an outer refractive index. The first passivation layer and the second passivation layer include an oxide. The first refractive index is less than the second refractive index, and the outer refractive index is less than the first refractive index.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to and all rights arising from Korean Patent Application No. 10-2023-0089311 filed on Jul. 10, 2023, the contents of which are incorporated herein by reference in their entirety. Technical Field

[0003] The present disclosure relates to a display device. Background Art

[0004] With the development of information technology, the importance of display devices as a communication medium between users and information is becoming more prominent.

[0005] There is a need for a display device to have a structure for improving external visibility. For example, there is a need to adjust the reflectivity of external light for improving external visibility. Summary of the invention

[0006] Aspects of the present disclosure are directed to providing a display device having improved visibility by controlling external light reflectivity.

[0007] Aspects of the present disclosure are directed to providing a display device in which reliability of display quality is reconsidered.

[0008] According to an embodiment of the present disclosure, a display device includes: a display layer; an outer coating layer, the outer coating layer is disposed on the display layer and includes an organic material; and an anti-reflection layer, the anti-reflection layer is disposed on the outer coating layer. The anti-reflection layer includes a first passivation layer; a first refractive layer, the first refractive layer is disposed on the first passivation layer and has a first refractive index; a second refractive layer, the second refractive layer is disposed on the first refractive layer and has a second refractive index; a second passivation layer, the second passivation layer is disposed on the second refractive layer; and an outer refractive layer, the outer refractive layer is disposed on the second passivation layer and has an outer refractive index. The first passivation layer and the second passivation layer include an oxide. The first refractive index is less than the second refractive index, and the outer refractive index is less than the first refractive index.

[0009] According to an embodiment, one surface of the first passivation layer may contact the outer coating layer, and another surface of the first passivation layer may contact the first refractive layer. One surface of the second passivation layer may contact the second refractive layer, and another surface of the second passivation layer may contact the outer refractive layer.

[0010] According to an embodiment, an outer surface of the outer refractive layer may be exposed to the outside, so that the outer refractive layer forms an outermost structure of the display device.

[0011] According to an embodiment, the first refractive layer may include silicon oxynitride (SiO x N y The second refractive layer may include silicon nitride (SiN x ).

[0012] According to an embodiment, the outer refractive layer may include one or more of silicon dioxide, an organic material at least partially substituted with a fluorine group, an inorganic material at least partially substituted with a fluorine group, and an organic / inorganic hybrid material at least partially substituted with a fluorine group.

[0013] According to an embodiment, the first passivation layer and the second passivation layer may include silicon oxide (SiO x ).

[0014] According to an embodiment, the first refractive index may be 1.60 to 1.69, the second refractive index may be 1.70 to 2.10, and the outer refractive index may be 1.23 to 1.40.

[0015] According to an embodiment, a thickness of the second passivation layer may be smaller than a thickness of each of the first refraction layer, the second refraction layer, the first passivation layer, and the outer refraction layer.

[0016] According to an embodiment, the first refractive layer may have a thickness of 50 nanometers (nm) to 150 nm. The second refractive layer may have a thickness of 50 nm to 150 nm. The first passivation layer may have a thickness of 200 nm to 300 nm. The outer refractive layer may have a thickness of 50 nm to 150 nm. The second passivation layer may have a thickness of 20 nm to 50 nm.

[0017] According to an embodiment, when external light is applied to the display device, at least a portion of the external light can be reflected at the outer surface of the outer refraction layer or at the interface between the second passivation layer and the second refraction layer, and can be provided as first reflected light, the phase of which is reversed relative to the phase of the at least a portion of the external light, and at least another portion of the external light can be reflected at the interface between the first refraction layer and the second refraction layer or at the interface between the first passivation layer and the first refraction layer, and can be provided as second reflected light, the phase of which is maintained relative to the phase of the at least another portion of the external light.

[0018] According to an embodiment, at least a portion of the first reflected light and at least a portion of the second reflected light may be dissipated by destructive interference with each other.

[0019] According to the embodiment, the display device may further include a plurality of sub-pixels respectively forming sub-pixel regions. The anti-reflection layer may include an inorganic material so as to be formed by a deposition process, and may be disposed above the sub-pixel region.

[0020] According to an embodiment, the overcoat layer and the first passivation layer may be bonded to each other without an adhesive layer interposed therebetween.

[0021] According to the embodiment, the display device may further include a color conversion layer disposed on the display layer and including quantum dots, and a color filter layer disposed on the color conversion layer and configured to selectively transmit light of one color.

[0022] According to an embodiment, the display layer may include an organic light emitting diode ("OLED").

[0023] According to an embodiment, the overcoat layer may form a base on which the antireflection layer is disposed, such that a substrate is not disposed on the antireflection layer.

[0024] According to an embodiment, the outer coating layer may have a thickness of 3 micrometers (μm) to 10 μm.

[0025] According to an embodiment of the present disclosure, a display device includes: a display layer; an outer coating layer, the outer coating layer is disposed on the display layer and includes an organic material; and an anti-reflection layer, the anti-reflection layer is disposed on the outer coating layer. The anti-reflection layer includes a first passivation layer; a third refractive layer, the third refractive layer is disposed on the first passivation layer and has a third refractive index; a first refractive layer, the first refractive layer is disposed on the third refractive layer and has a first refractive index; a second refractive layer, the second refractive layer is disposed on the first refractive layer and has a second refractive index; a second passivation layer, the second passivation layer is disposed on the second refractive layer; and an outer refractive layer, the outer refractive layer is disposed on the second passivation layer and has an outer refractive index. The first passivation layer, the second passivation layer, and the first refractive layer include an oxide. The second refractive layer and the third refractive layer include the same material. Each of the second refractive index and the third refractive index is greater than the first refractive index, and the outer refractive index is less than the first refractive index.

[0026] According to an embodiment, the first passivation layer and the second passivation layer may include silicon oxide (SiO x The first refractive layer may include silicon oxide (SiO x The second refractive layer and the third refractive layer may include silicon nitride (SiN x ).

[0027] According to an embodiment, the first refractive index may be 1.60 to 1.69. The second refractive index and the third refractive index may each be 1.70 to 2.10.

[0028] According to an embodiment of the present disclosure, a display device having improved visibility by controlling external light reflectivity may be provided.

[0029] According to an embodiment of the present disclosure, a display device in which reliability of display quality is reconsidered can be provided. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] The above and other features of the present disclosure will become more apparent by further describing the embodiments of the present disclosure in detail with reference to the accompanying drawings, in which:

[0031] Figure 1 is a schematic plan view illustrating a display device according to the embodiment;

[0032] Figure 2 is a schematic cross-sectional view illustrating a display device according to the embodiment;

[0033] Figure 3 and Figure 4 is a schematic cross-sectional view illustrating an antireflection layer according to an embodiment;

[0034] Figure 5 and Figure 6 is a schematic cross-sectional view illustrating an anti-reflection layer according to an embodiment; and

[0035] Figure 7 and Figure 8 is a schematic cross-sectional view illustrating an anti-reflection layer according to the embodiment. DETAILED DESCRIPTION

[0036] The present disclosure can be modified in various ways and have various forms. Therefore, specific embodiments will be illustrated in the drawings and will be described in detail in the specification. However, it should be understood that the present disclosure is not intended to be limited to the specific form disclosed, and the present disclosure includes all modifications, equivalents and substitutions within the spirit and technical scope of the present disclosure.

[0037] The terms "first", "second", etc. may be used to describe various components, but the components should not be limited by the terms. The terms are only used for the purpose of distinguishing one component from another component. For example, a first component may be referred to as a second component, and similarly, a second component may also be referred to as a first component without departing from the scope of the present disclosure. In the following description, a singular expression includes a plural expression unless the context clearly dictates otherwise.

[0038] It should be understood that in the present application, the terms "comprising", "having" and the like are used to specify the presence of features, numbers, steps, operations, components, parts or combinations thereof described in the specification, but do not exclude the possibility of the pre-existence or addition of one or more other features, numbers, steps, operations, components, parts or combinations thereof. In addition, where a part of a layer, region, plate, etc. is referred to as being "on" another part, it includes not only the case where a part is "directly" "on" another part, but also the case where there are other parts between the part and the other part. In addition, in the present specification, when a part of a layer, region, plate, etc. is formed on another part, the formation direction is not limited to the upper direction, but includes forming the part on the side surface or in the lower direction. On the contrary, when a part of a layer, region, plate, etc. is formed "under" another part, this includes not only the case where a part is "directly" "under" another part, but also the case where there are further other parts between the part and the other part.

[0039] The terms used herein are only for the purpose of describing specific embodiments and are not intended to be limited. As used herein, "a", "an", "the" and "at least one" do not represent a limit on quantity, but are intended to include both the singular and the plural, unless the context clearly indicates otherwise. For example, "an element" has the same meaning as "at least one element", unless the context clearly indicates otherwise. "At least one" should not be interpreted as limiting "a" or "an". "Or" means "and / or". As used herein, the term "and / or" includes any combination and all combinations of one or more than one of the related listed items. It should be further understood that the terms "comprises" and / or "comprising" or "includes" and / or "including" when used in this specification indicate the presence of specified features, regions, integers, steps, operations, elements and / or components, but do not exclude the presence or addition of one or more than one other features, regions, integers, steps, operations, elements, components and / or groups thereof. The present disclosure relates to a display device. Hereinafter, a display device according to the embodiment is described with reference to the accompanying drawings.

[0040] Figure 1 is a schematic plan view illustrating a display device according to the embodiment.

[0041] refer to Figure 1 The display device DD may include a base layer BSL and pixels PXL disposed on the base layer BSL. Although not shown in the drawings, the display device DD may further include a driving circuit unit (eg, a scan driver and a data driver), lines, and pads for driving the pixels PXL.

[0042] The display device DD (or the base layer BSL) may include a display area DA and a non-display area NDA. The non-display area NDA may mean an area other than the display area DA. The non-display area NDA may surround at least a portion of the display area DA.

[0043] The base layer BSL may form the base surface of the display device DD. The base layer BSL may be a rigid or flexible substrate or film. For example, the base layer BSL may be a rigid substrate formed of glass or tempered glass, a flexible substrate (or film) of a plastic or metal material, or at least one insulating layer. There is no particular limitation on the material and / or physical properties of the base layer BSL. In an embodiment, the base layer BSL may be substantially transparent. Here, "substantially transparent" may mean transmitting light at a level of a predetermined transmittance or higher (e.g., 90%, 95%, 97%, etc.). In another embodiment, the base layer BSL may be translucent or opaque. In addition, according to an embodiment, the base layer BSL may contain a reflective material.

[0044] The display area DA may mean an area in which the pixels PXL are disposed. The non-display area NDA may mean an area in which the pixels PXL are not disposed. A driving circuit unit, lines, and pads connected to the pixels PXL of the display area DA may be disposed in the non-display area NDA.

[0045] According to the embodiment, the pixel PXL (or sub-pixel SPX) can be arranged according to the stripes or The structure is arranged, but not limited thereto, and various embodiments can be applied to the present disclosure.

[0046] According to the embodiment, the pixel PXL (or sub-pixel SPX) may include a first sub-pixel SPX1, a second sub-pixel SPX2, and a third sub-pixel SPX3. Each of the first sub-pixel SPX1, the second sub-pixel SPX2, and the third sub-pixel SPX3 may be a sub-pixel. At least one of the first sub-pixel SPX1, the second sub-pixel SPX2, and the third sub-pixel SPX3 may form a pixel unit capable of emitting light of various colors.

[0047] For example, each of the first sub-pixel SPX1, the second sub-pixel SPX2, and the third sub-pixel SPX3 may emit light of one color. For example, the first sub-pixel SPX1 may be a red pixel that emits red (e.g., the first color) light, the second sub-pixel SPX2 may be a green pixel that emits green (e.g., the second color) light, and the third sub-pixel SPX3 may be a blue pixel that emits blue (e.g., the third color) light. According to the embodiment, the number of the second sub-pixels SPX2 may be greater than each of the number of the first sub-pixels SPX1 and the number of the third sub-pixels SPX3. However, the colors, types, quantities, etc. of the first sub-pixels SPX1, the second sub-pixels SPX2, and the third sub-pixels SPX3 that form each pixel unit are not limited to specific examples.

[0048] Figure 2 is a schematic cross-sectional view illustrating a display device according to the embodiment.

[0049] refer to Figure 2 , the display device DD according to the embodiment may include a base layer BSL, a pixel circuit layer PCL, and a light emitting element layer LEL. Figure 2 The cross-sectional structure of the display area DA of the display device DD is shown.

[0050] The base layer BSL may form a base on which the pixel circuit layer PCL and the light emitting element layer LEL are disposed. According to the embodiment, the base layer BSL may be a glass substrate.

[0051] The pixel circuit layer PCL may be disposed on the base layer BSL. The pixel circuit layer PCL may be a layer including a pixel circuit PXC for driving the light emitting element LD. The pixel circuit layer PCL may include the base layer BSL, a conductive layer for forming the pixel circuit PXC, and an insulating layer disposed on the conductive layer.

[0052] The light emitting element layer LEL may be disposed on the pixel circuit layer PCL. According to the embodiment, the light emitting element layer LEL may include a light emitting element LD. The light emitting element LD may be an inorganic light emitting diode including an inorganic semiconductor, and the light emitting element LD may be an organic light emitting diode (OLED) including an organic material. However, the present disclosure is not limited to specific examples. According to the embodiment, the light emitting element layer LEL may be referred to as a display layer.

[0053] The light emitting element LD may be electrically connected to the pixel circuit PXC. The light emitting element LD may emit light based on an electrical signal (eg, current intensity) provided by the pixel circuit PXC.

[0054] According to the embodiment, light emitted by the light emitting element LD may pass through one or more layers and may be emitted to the outside of the display device DD. For example, the display device DD may include a color conversion layer CCL, a color filter layer CFL, and an anti-reflection layer ARS through which light may pass.

[0055] According to the embodiment, sub-pixel regions SPXA respectively corresponding to the sub-pixels SPX may be formed in the display area DA. The sub-pixel region SPXA may include a first sub-pixel region SPXA1 corresponding to the first sub-pixel SPX1, a second sub-pixel region SPXA2 corresponding to the second sub-pixel SPX2, and a third sub-pixel region SPXA3 corresponding to the third sub-pixel SPX3.

[0056] According to the embodiment, the first cover layer CPL1 may be disposed on the light emitting element layer LEL. The first cover layer CPL1 may be provided above the first to third sub-pixels SPX1, SPX2, and SPX3. The first cover layer CPL1 may cover the light emitting element layer LEL. According to the embodiment, the first cover layer CPL1 may be an inorganic layer and may include silicon nitride (SiN x ), aluminum nitride (AlN x ), titanium nitride (TiN x ), silicon oxide (SiO x ), aluminum oxide (Al x O y ), titanium oxide (TiO x ), silicon carbide oxide (SiO x C y ) and silicon oxynitride (SiO x N y ) of the group.

[0057] According to the embodiment, the block BNK and the color conversion layer CCL may be disposed on the first cover layer CPL1.

[0058] According to the embodiment, the block BNK may be disposed at a boundary between or between the first to third sub-pixel regions SPXA1, SPXA2, and SPXA3, and may define a space (or region) overlapping the first to third sub-pixel regions SPXA1, SPXA2, and SPXA3, respectively. The space defined by the block BNK may be a region in which a color conversion layer CCL may be provided. According to the embodiment, the block BNK may include an organic material. The organic material may include at least one of the group consisting of an acrylic-based resin, an epoxy-based resin, a phenolic resin, a polyamide resin, a polyimide resin, a polyester resin, a polyphenylene sulfide resin, and a benzocyclobutene. However, the present disclosure is not necessarily limited thereto.

[0059] According to the embodiment, the color conversion layer CCL may be disposed in a space surrounded by the block BNK. The color conversion layer CCL may include a first color conversion layer CCL1 disposed in the first subpixel SPX1, a second color conversion layer CCL2 disposed in the second subpixel SPX2, and a scattering layer LSL disposed in the third subpixel SPX3.

[0060] The color conversion layer CCL may be disposed on the light emitting element LD. The color conversion layer CCL may be configured to change the wavelength of light. According to the embodiment, the first to third sub-pixels SPX1, SPX2, and SPX3 may include light emitting elements LD that emit light of the same color as each other. For example, the first to third sub-pixels SPX1, SPX2, and SPX3 may include light emitting elements LD that emit light of a third color (or blue). Since the color conversion layer CCL containing color conversion particles is disposed on each of the first to third sub-pixels SPX1, SPX2, and SPX3, a full-color image may be displayed.

[0061] However, the color of light emitted by the light emitting element LD is not limited to the example described above. For convenience of description, the present disclosure is described based on an embodiment in which the light emitting element LD of each sub-pixel SPX emits blue light.

[0062] The first color conversion layer CCL1 may include first color conversion particles that convert the third color light emitted by the light emitting element LD into the first color light. For example, the first color conversion layer CCL1 may include a plurality of first quantum dots QD1 dispersed in a matrix material (eg, base resin).

[0063] According to the embodiment, when the light emitting element LD is a blue light emitting element emitting blue light and the first sub-pixel SPX1 is a red pixel, the first color conversion layer CCL1 may include a first quantum dot QD1 that converts the blue light emitted by the blue light emitting element into red light. The first quantum dot QD1 may absorb the blue light and emit red light by shifting the wavelength according to energy conversion. When the first sub-pixel SPX1 is a pixel of another color, the first color conversion layer CCL1 may include a first quantum dot QD1 corresponding to the color of the first sub-pixel SPX1.

[0064] The second color conversion layer CCL2 may include second color conversion particles that convert the third color light emitted by the light emitting element LD into the second color light. For example, the second color conversion layer CCL2 may include a plurality of second quantum dots QD2 dispersed in a matrix material (eg, base resin).

[0065] According to the embodiment, when the light emitting element LD is a blue light emitting element emitting blue light and the second sub-pixel SPX2 is a green pixel, the second color conversion layer CCL2 may include a second quantum dot QD2 that converts the blue light emitted by the blue light emitting element into green light. The second quantum dot QD2 may absorb the blue light and emit green light by shifting the wavelength according to energy conversion. When the second sub-pixel SPX2 is a pixel of another color, the second color conversion layer CCL2 may include a second quantum dot QD2 corresponding to the color of the second sub-pixel SPX2.

[0066] According to the embodiment, when blue light having a relatively short wavelength in the visible light region is incident on each of the first quantum dot QD1 and the second quantum dot QD2, the absorption coefficient of the first quantum dot QD1 and the second quantum dot QD2 can be increased. Therefore, in the end, the efficiency of light emitted by the first sub-pixel SPX1 and the second sub-pixel SPX2 can be improved, and excellent color reproducibility can be ensured. In addition, since the first to third sub-pixels SPX1, SPX2, and SPX3 are formed by using light-emitting elements LD of the same color (e.g., blue light-emitting elements), the manufacturing efficiency of the display device DD can be improved.

[0067] A scattering layer LSL may be provided to effectively use the light of the third color (or blue) emitted by the light emitting element LD. For example, when the light emitting element LD is a blue light emitting element emitting blue light and the third sub-pixel SPX3 is a blue pixel, the scattering layer LSL may include at least one type of scatterer SCT to effectively use the light emitted by the light emitting element LD. For example, the scatterer SCT of the scattering layer LSL may include various light scattering particles or light scattering materials. For example, the scatterer SCT may include silicon oxide (SiO x ) (e.g., silica beads, hollow silica, etc.), titanium oxide (TiO x ), zirconium oxide (ZrO x ), aluminum oxide (Al x O y ), indium oxide (In x O y ), zinc oxide (ZnO x ), tin oxide (SnO x ) and antimony oxide (Sb x O y ) in the group of one or more than one. However, the present disclosure is not limited thereto.

[0068] The scatterer SCT may be disposed outside the third subpixel SPX3 and may be selectively included in the first color conversion layer CCL1 or the second color conversion layer CCL2 According to the embodiment, the scatterer SCT may be omitted, and thus a scattering layer LSL including a transparent polymer may be provided.

[0069] The second cover layer CPL2 may be disposed on the color conversion layer CCL and the block BNK. The second cover layer CPL2 may be provided above the first to third sub-pixels SPX1, SPX2, and SPX3. The second cover layer CPL2 may cover the color conversion layer CCL. According to an embodiment, the second cover layer CPL2 may be an inorganic layer and may include silicon nitride (SiN x ), aluminum nitride (AlN x ), titanium nitride (TiN x ), silicon oxide (SiO x ), aluminum oxide (Al x O y ), titanium oxide (TiO x ), silicon carbide oxide (SiO x C y ) and silicon oxynitride (SiO x N y ) in the group consisting of one or more.

[0070] The optical layer OPL may be disposed on the second cover layer CPL2. The optical layer OPL may be used to recycle the light provided by the color conversion layer CCL by total reflection to improve the light extraction efficiency. To this end, the optical layer OPL may have a relatively low refractive index compared to the color conversion layer CCL. For example, the refractive index of the color conversion layer CCL may be about 1.6 to 2.0, and the refractive index of the optical layer OPL may be about 1.1 to 1.3.

[0071] The third cover layer CPL3 may be disposed on the optical layer OPL. The third cover layer CPL3 may be provided above the first to third sub-pixels SPX1, SPX2, and SPX3. The third cover layer CPL3 may cover the optical layer OPL. According to an embodiment, the third cover layer CPL3 may be an inorganic layer and may include silicon nitride (SiN x ), aluminum nitride (AlN x ), titanium nitride (TiN x ), silicon oxide (SiO x ), aluminum oxide (Al x O y ), titanium oxide (TiO x ), silicon carbide oxide (SiO x C y ) and silicon oxynitride (SiOx N y ) in the group consisting of one or more.

[0072] The light blocking layer BM and the color filter layer CFL may be disposed on the third cover layer CPL3. The color filter layer CFL may include color filters CF1, CF2, and CF3 corresponding to the colors of the sub-pixels SPX. Since the color filters CF1, CF2, and CF3 corresponding to the colors of the first to third sub-pixels SPX1, SPX2, and SPX3 are provided, a full-color image may be displayed.

[0073] The color filter layer CFL may include a first color filter CF1 disposed in the first subpixel SPX1 to selectively transmit light emitted by the first subpixel SPX1, a second color filter CF2 disposed in the second subpixel SPX2 to selectively transmit light emitted by the second subpixel SPX2, and a third color filter CF3 disposed in the third subpixel SPX3 to selectively transmit light emitted by the third subpixel SPX3.

[0074] The first color filter CF1 may overlap the first color conversion layer CCL1 in the thickness direction (e.g., the third direction DR3) of the base layer BSL. The first color filter CF1 may include a color filter material that selectively transmits light of the first color (or red). For example, when the first sub-pixel SPX1 is a red pixel, the first color filter CF1 may include a red color filter material.

[0075] The second color filter CF2 may overlap the second color conversion layer CCL2 in the thickness direction (e.g., the third direction DR3) of the base layer BSL. The second color filter CF2 may include a color filter material that selectively transmits light of the second color (or green). For example, when the second sub-pixel SPX2 is a green pixel, the second color filter CF2 may include a green color filter material.

[0076] The third color filter CF3 may overlap the scattering layer LSL in the thickness direction (e.g., the third direction DR3) of the base layer BSL. The third color filter CF3 may include a color filter material that selectively transmits light of a third color (or blue). For example, when the third sub-pixel SPX3 is a blue pixel, the third color filter CF3 may include a blue color filter material.

[0077] According to the embodiment, the light blocking layer BM may be disposed between the sub-pixel areas SPXA. The light blocking layer BM may prevent color mixing defects observed from the front surface or the side surface of the display device DD. The material of the light blocking layer BM is not particularly limited, and may be formed of various light blocking materials. For example, the light blocking layer BM may include a black matrix, or the first to third color filters CF1, CF2, and CF3 may be stacked on each other to implement the light blocking layer BM.

[0078] The overcoat layer OC may be disposed on the color filter layer CFL. The overcoat layer OC may be provided above the first to third sub-pixels SPX1, SPX2, and SPX3. The overcoat layer OC may cover the lower member including the color filter layer CFL. The overcoat layer OC may prevent moisture or air from penetrating into the lower member described above. In addition, the overcoat layer OC may protect the lower member described above from foreign substances such as dust.

[0079] According to the embodiment, the overcoat layer OC may have a strong property (eg, high hardness). Therefore, the strong property required by the display device DD can be realized without the need for an additional structure (eg, an upper substrate, etc.), and a base can be formed, and the anti-reflection layer ARS can be disposed on the base.

[0080] According to the embodiment, the overcoat layer OC may have a thickness greater than that of the anti-reflection layer ARS. For example, the overcoat layer OC may have a thickness of 3 micrometers (μm) to 10 μm. However, the present disclosure is not limited thereto.

[0081] According to the embodiment, the outer coating layer OC may have a refractive index smaller than that of the refractive layer L. The outer coating layer OC may have a refractive index greater than the outer refractive index nL of the outer refractive layer LL. For example, the outer coating layer OC may have a refractive index of 1.45 to 1.53. However, the present disclosure is not limited thereto.

[0082] According to the embodiment, the overcoat layer OC may include various materials having strong properties.

[0083] For example, the overcoat layer OC may include one or more of the compounds represented by the following Chemical Formulas 1 to 14:

[0084] [Chemical formula 1]

[0085]

[0086] [Chemical formula 2]

[0087]

[0088] [Chemical formula 3]

[0089]

[0090] [Chemical formula 4]

[0091]

[0092] [Chemical formula 5]

[0093]

[0094] [Chemical formula 6]

[0095]

[0096] [Chemical formula 7]

[0097]

[0098] [Chemical formula 8]

[0099]

[0100] [Chemical formula 9]

[0101]

[0102] [Chemical formula 10]

[0103]

[0104] [Chemical formula 11]

[0105]

[0106] [Chemical formula 12]

[0107]

[0108] [Chemical formula 13]

[0109]

[0110] [Chemical formula 14]

[0111]

[0112] [Chemical formula A]

[0113]

[0114] [Chemical formula B]

[0115]

[0116] [Chemical formula D]

[0117]

[0118] [Chemical formula E]

[0119]

[0120] [Chemical formula R1]

[0121]

[0122] [Chemical formula R2]

[0123]

[0124] [Chemical formula R3]

[0125]

[0126] In Chemical Formulae 1 to 9, "A" may be represented by Chemical Formula A, "B" may be represented by Chemical Formula B, "D" may be represented by Chemical Formula D, "E" may be represented by Chemical Formula E, and "R" may be represented by one of Chemical Formulae R1, Chemical Formulae R2, and Chemical Formulae R3. In addition, each of "a1", "a2", "b1", "e1", "d1", and "d2" may be independently defined in Chemical Formulae 1 to 9, and may be 1 or greater than 1, and may be 1 to 100 independently of one another, and may be the same as or different from one another. In addition, in Chemical Formulae R1, R2, and R3, "n" may be independently defined and may be 1 or greater than 1, and may be 1 to 100 independently of one another. In Chemical Formulae 10, 11, and 14, "n" may be independently defined and may be 1 or greater than 1, and may be 1 to 100 independently of one another.

[0127] Furthermore, "X" and "Y" are defined independently of each other and are R' or [(SiO 3 / 2 R') 4+2nR']. Here, R' can be defined independently of each other and can be an alkyl group (the number of carbon atoms: 1 to 40, for example, 1 to 30, 1 to 20, 1 to 10, or 1 to 5) selected from the group consisting of an unsubstituted or substituted alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, an alkyl group, , or 3 to 5); a heterocycloalkyl group (the number of carbon atoms: 3 to 40, for example, 3 to 30, 3 to 20, 3 to 10, or 3 to 5); an aryl group (the number of carbon atoms: 6 to 40, for example, 6 to 30, 6 to 20, or 6 to 10); a heteroaryl group (the number of carbon atoms: 3 to 40, for example, 3 to 30, 3 to 20, 3 to 10, or 3 to 5); an aralkyl group (the number of carbon atoms: 3 to 40, for example, 3 to 30, 3 to 20, 3 to 10, or 3 to 5); an aryloxy group (the number of carbon atoms: 3 to 40, for example, 3 to 30, 3 to 20, 3 to 10, or 3 to 5); and an arylthio group (the number of carbon atoms: 3 to 40, for example, 3 to 30, 3 to 20, 3 to 10, or 3 to 5).

[0128] According to the embodiment, the anti-reflection layer ARS may be provided on the outer coating layer OC. In the display device DD according to the embodiment, the anti-reflection layer ARS configured to control the reflectivity of external light may be formed at the outermost portion of the display device DD. For example, since the arrangement relationship of the layers is defined based on the refractive index of the layers, the anti-reflection layer ARS may form a structure in which external light dissipates and interferes with each other. Therefore, the reflection of external light may be reduced and the display quality may be effectively improved.

[0129] The anti-reflection layer ARS may be referred to as an “anti-reflection structure”.

[0130] The anti-reflection layer ARS may include a plurality of layers that may be formed by a deposition process. For example, as a process device for manufacturing a display device DD, an apparatus for manufacturing a layer to be formed (e.g., deposited) on a base layer BSL may be used to manufacture the anti-reflection layer ARS. In this case, since a separately manufactured film structure may not be required, process costs may be reduced and process reliability may be improved. According to an embodiment, a layer disposed on the overcoat layer OC and the overcoat layer OC may be combined with each other without an adhesive layer therebetween. For example, the overcoat layer OC and the first passivation layer PL1 may be combined with each other without inserting an adhesive layer therebetween ( Figure 5 and Figure 7 ).

[0131] The anti-reflection layer ARS may be the outermost structure of the display device DD. The anti-reflection layer ARS may include a lower surface and an upper surface. The lower surface of the anti-reflection layer ARS may contact the outer coating layer OC. The upper surface of the anti-reflection layer ARS may be exposed. The anti-reflection layer ARS may be a structure that prevents external light from being reflected, and may remove external light by controlling light information so that light information emitted by the light emitting element LD is not distorted. According to the embodiment, since the anti-reflection layer ARS is formed at the outermost part of the display device DD, the reliability of the operation of controlling light information can be ensured.

[0132] Furthermore, since the anti-reflection layer ARS may be disposed over the entire sub-pixel area SPXA, the risk that a partial configuration of the display device DD (eg, the base layer BSL including the glass substrate) is damaged and thus other configurations are scattered may be effectively prevented.

[0133] In the following, refer to Figures 3 to 7 The structure of the anti-reflection layer ARS according to the embodiment is described.

[0134] refer to Figure 3 and Figure 4 , an anti-reflection layer ARS according to an embodiment is described. Figure 3 and Figure 4 is a schematic cross-sectional view illustrating an anti-reflection layer ARS according to the embodiment. Figure 4 An aspect is schematically shown in which external light is applied to the anti-reflection layer ARS according to the embodiment, and the applied external light destructively interferes with each other and is dispersed.

[0135] According to the embodiment, the anti-reflection layer ARS may include a refraction layer L and an outer refraction layer LL.

[0136] The refraction layer L may include a plurality of inorganic layers. For example, the refraction layer L may include a first refraction layer L1 and a second refraction layer L2.

[0137] The first refraction layer L1 may be adjacent to a lower side of the anti-reflection layer ARS, and the second refraction layer L2 may be disposed between the first refraction layer L1 and the outer refraction layer LL. The first and second refraction layers L1 and L2 may physically contact each other and form an interface (ie, boundary) therebetween.

[0138] The outer refractive layer LL may be disposed on the second refractive layer L2. According to an embodiment, the outer refractive layer LL may be the outermost layer among the layers for realizing the display structure of the display device DD. For example, the upper surface of the outer refractive layer LL may be exposed. Therefore, the anti-reflection layer ARS may form the outermost (e.g., uppermost) structure of the display device DD.

[0139] Each layer included in the refractive layer L may have a refractive index. For example, the first refractive layer L1 may have a first refractive index n1. The second refractive layer L2 may have a second refractive index n2. The outer refractive layer LL may have an outer refractive index nL.

[0140] According to the embodiment, the layer having the lowest refractive index in the anti-reflection layer ARS may be formed on the outermost portion of the anti-reflection layer ARS. According to the embodiment, the refractive index of each refractive layer L may be greater than the outer refractive index nL. For example, the first refractive index n1 may be greater than the outer refractive index nL. The second refractive index n2 may be greater than the outer refractive index nL.

[0141] According to the embodiment, the first refractive index n1 may be smaller than the second refractive index n2.

[0142] According to the embodiment, the first refractive layer L1 may include silicon oxynitride (SiO x N y ). The first refractive index n1 may be 1.60 to 1.69. However, the present disclosure is not necessarily limited thereto.

[0143] According to the embodiment, the second refractive layer L2 may include silicon nitride (SiN x ). The second refractive index n2 may be 1.70 to 2.10. However, the present disclosure is not necessarily limited thereto.

[0144] According to an embodiment, the outer refractive layer LL may include silicon oxide (SiO x ) (e.g., porous and hollow silica). According to an embodiment, the outer refractive layer LL may include one or more of the group consisting of an organic material at least partially substituted with a fluorine group, an inorganic material at least partially substituted with a fluorine group, and an organic / inorganic hybrid material at least partially substituted with a fluorine group. The outer refractive index nL may be 1.23 to 1.40. However, the present disclosure is not necessarily limited thereto.

[0145] Therefore, the anti-reflection layer ARS may form a structure in which a low refractive index layer, a high refractive index layer, and a medium refractive index layer are sequentially disposed with respect to a direction in which external light is applied (eg, a direction opposite to the third direction DR3).

[0146] According to the embodiment, when external light is applied to the display device DD, at least a portion of the external light and at least another portion of the external light may destructively interfere with each other and may be dissipated.

[0147] For example, the external light OL may include first external light OL1 and second external light OL2. The first external light OL1 may be reflected at the interface (i.e., boundary) of at least some layers of the anti-reflection layer ARS and provided as first reflected light RL1. The second external light OL2 may be reflected at the interface (i.e., boundary) of at least some layers of the anti-reflection layer ARS and provided as second reflected light RL2.

[0148] The first external light OL1 may be light applied from a region having a relatively low refractive index to a region having a relatively high refractive index, and may be provided as the first reflected light RL1 after phase inversion (eg, changing a phase by half a wavelength).

[0149] For example, the first external light OL1 may include a (1_1)th external light OL1_1 and a (1_2)th external light OL1_2. The first reflected light RL1 may include a (1_1)th reflected light RL1_1 and a (1_2)th reflected light RL1_2. The (1_1)th external light OL1_1 may be reflected at an interface between the air layer A and the outer refractive layer LL, and provided as a (1_1)th reflected light RL1_1. The (1_1)th reflected light RL1_1 may be light obtained by changing a phase of the (1_1)th external light OL1_1 by half a wavelength of the (1_1)th external light OL1_1. The (1_2)th external light OL1_2 may be reflected at an interface between the outer refractive layer LL and the second refractive layer L2, and provided as a (1_2)th reflected light RL1_2. The (1_2)th reflected light RL1_2 may be light obtained by changing the phase of the (1_2)th external light OL1_2 by half the wavelength of the (1_2)th external light OL1_2.

[0150] The second external light OL2 may be light applied from an area having a relatively low refractive index to an area having a relatively high refractive index, a phase of the second external light OL2 may be maintained (eg, the phase does not change) after reflection, and the second external light OL2 may be provided as second reflected light RL2.

[0151] For example, the second external light OL2 may be reflected at an interface (ie, a boundary) between the second refraction layer L2 and the first refraction layer L1 and provided as the second reflected light RL2.

[0152] Therefore, the phase of a portion of the light reflected from the anti-reflection layer ARS to the outside may be changed, and the phase of another portion of the light reflected from the anti-reflection layer ARS to the outside may not be changed. That is, the first reflected light RL1 and the second reflected light RL2 may have opposite phases to each other (for example, phases that differ by half a wavelength), and the first reflected light RL1 and the second reflected light RL2 may destructively interfere with each other and may dissipate. Therefore, the phase of a portion of the external light OL may be maintained, the phase of another portion of the external light OL may be reversed, and thus at least a portion of the external light OL may be removed. Therefore, the external light reflectivity may be controlled, thereby realizing a display device DD having improved display quality and including excellent color perception.

[0153] refer to Figure 5 and Figure 6 , an anti-reflection layer ARS according to an embodiment is described. Figure 5 and Figure 6 is a schematic cross-sectional view illustrating an anti-reflection layer ARS according to the embodiment. Figure 6 An aspect is schematically illustrated in which external light is applied to the anti-reflection layer ARS according to the embodiment and the applied external light destructively interferes with each other and dissipates. For convenience of description, contents that may overlap with the above description are briefly described or not repeated.

[0154] The anti-reflection layer ARS according to the present embodiment is different from the anti-reflection layer ARS of the above-described embodiments in that the anti-reflection layer ARS according to the present embodiment further includes a passivation layer PL.

[0155] According to the embodiment, the anti-reflection layer ARS may further include a passivation layer PL.

[0156] According to the embodiment, the passivation layer PL may be disposed on one surface of the refractive layer L, and may be directly adjacent to the refractive layer L. As shown in FIG.

[0157] The passivation layer PL may include a first passivation layer PL1 and a second passivation layer PL2 .

[0158] The first passivation layer PL1 may be disposed between the overcoat layer OC and the refractive layer L (e.g., the first refractive layer L1). According to an embodiment, the first passivation layer PL1 may physically contact the upper surface of the overcoat layer OC. For example, one surface (e.g., the lower surface) of the first passivation layer PL1 may contact the upper surface of the cover layer OC, and the other surface of the first passivation layer PL1 may contact the lower surface of the first refractive layer L1.

[0159] The second passivation layer PL2 may be disposed between the outer refractive layer LL and the refractive layer L (e.g., the second refractive layer L2). According to an embodiment, the second passivation layer PL2 may physically contact the lower surface of the outer refractive layer LL. For example, one surface (e.g., the upper surface) of the second passivation layer PL2 may contact the lower surface of the outer refractive layer LL, and the other surface (e.g., the lower surface) of the second passivation layer PL2 may contact the upper surface of the second refractive layer L2.

[0160] The passivation layer PL may reduce the risk of the anti-reflection layer ARS being damaged by external influences. For example, the passivation layer PL may be an anti-oxidation layer for the anti-reflection layer ARS.

[0161] For example, the passivation layer PL may include an oxide. For example, the passivation layer PL may include an oxide of an inorganic element that is the same as at least a portion of the inorganic material used to form the anti-reflection layer ARS. For example, the passivation layer PL may include silicon oxide (SiO x ). However, the present disclosure is not limited thereto.

[0162] According to the embodiment, the outer coating layer OC may include an organic material having strong physical properties, and the structural stability of the anti-reflection layer ARS may be ensured. In the experiment, when the anti-reflection layer ARS including an inorganic material is directly adjacent to the organic material, there is a risk of oxidation of at least a portion of the anti-reflection layer ARS due to moisture passing through the organic material. In addition, the outer refractive layer LL may be formed at the outermost side of the display device DD, and thus external factors may reduce the reliability of the internal configuration of the anti-reflection layer ARS.

[0163] However, according to the embodiment, since the first passivation layer PL1 including oxide is patterned so as to be directly adjacent to the overcoat layer OC including an organic material, the risk of the refractive structure of the anti-reflection layer ARS being damaged may be reduced.

[0164] In addition, since the second passivation layer PL2 including oxide is patterned so as to be directly adjacent to the outer refractive layer LL (directly adjacent to the outer portion), the risk of the refractive structure of the anti-reflection layer ARS being damaged may be reduced.

[0165] Therefore, since the passivation layer PL is selectively disposed in some regions of the anti-reflection layer ARS, the fear of damage to the refractive structure due to external influence may be reduced, and the reliability of display quality of the display device DD may be improved.

[0166] According to the embodiment, the passivation layer PL may have a passivation refractive index nP smaller than the refractive index of the refractive layer L. The passivation refractive index nP may be smaller than each of the first refractive index n1 and the second refractive index n2. For example, the passivation layer PL may include silicon oxide (SiO x), and the passivation refractive index nP can be 1.40 to 1.50.

[0167] According to the anti-reflection layer ARS of this embodiment, the phase of a part of the light reflected from the anti-reflection layer ARS to the outside can be changed, the phase of another part of the light reflected from the anti-reflection layer ARS to the outside can be unchanged, and these parts of the reflected light can be dissipated due to destructive interference with each other.

[0168] According to the embodiment, the second passivation thickness 340 of the second passivation layer PL2 adjacent to the outer refractive layer LL may have a thickness smaller than that of each of the other layers, and light reflection may substantially not occur at an interface defined at one surface (e.g., upper surface) of the second passivation layer PL2.

[0169] In addition, the first passivation thickness 320 of the first passivation layer PL1 disposed on the lower side of the anti-reflection layer ARS relative to the direction in which external light is applied (i.e., the direction opposite to the third direction DR3) may have a thickness greater than that of each of the other layers, and light reflection may occur at an interface defined at one surface (e.g., the upper surface) of the first passivation layer PL1.

[0170] According to the embodiment, the first refraction layer L1 may have a first thickness 120. The second refraction layer L2 may have a second thickness 140. The outer refraction layer LL may have an outer thickness 200.

[0171] According to an embodiment, first passivation thickness 320 may be greater than each of first thickness 120, second thickness 140, and second passivation thickness 340. Second passivation thickness 340 may be less than each of first thickness 120 and second thickness 140. External thickness 200 may be substantially similar to (e.g., equal to) each of first thickness 120 and second thickness 140.

[0172] For example, the first passivation thickness 320 may be 200 nm to 300 nm. The second passivation thickness 340 may be 20 nm to 50 nm. The first thickness 120 may be 50 nm to 150 nm. The second thickness 140 may be 50 nm to 150 nm. The outer thickness 200 may be 50 nm to 150 nm. However, the present disclosure is not necessarily limited thereto.

[0173] According to the embodiment, the first external light OL1 may include a (1_1)th external light OL1_1 and a (1_2)th external light OL1_2. The first reflected light RL1 may include a (1_1)th reflected light RL1_1 and a (1_2)th reflected light RL1_2. The (1_1)th external light OL1_1 may be reflected at an interface between the air layer A and the outer refractive layer LL, and provided as a (1_1)th reflected light RL1_1. The (1_1)th reflected light RL1_1 may be light obtained by changing a phase of the (1_1)th external light OL1_1 by half a wavelength of the (1_1)th external light OL1_1. The (1_2)th external light OL1_2 may be reflected at an interface between the second passivation layer PL2 and the second refractive layer L2, and provided as a (1_2)th reflected light RL1_2. The (1_2)th reflected light RL1_2 may be light obtained by changing the phase of the (1_2)th external light OL1_2 by half the wavelength of the (1_2)th external light OL1_2.

[0174] For example, the second external light OL2 may include a (2_1)th external light OL2_1 and a (2_2)th external light OL2_2. The second reflected light RL2 may include a (2_1)th reflected light RL2_1 and a (2_2)th reflected light RL2_2. The (2_1)th external light OL2_1 may be reflected at an interface (i.e., a boundary) between the first refraction layer L1 and the second refraction layer L2, and provided as a (2_1)th reflected light RL2_1. The (2_1)th reflected light RL2_1 may be light in which a phase of the (2_1)th external light OL2_1 is maintained (e.g., not changed). The (2_2)th external light OL2_2 may be reflected at an interface between the first refraction layer L1 and the first passivation layer PL1, and provided as a (2_2)th reflected light RL2_2. The (2_2)th reflected light RL2_2 may be light in which a phase of the (2_2)th external light OL2_2 is maintained (e.g., not changed).

[0175] Therefore, the first reflected light RL1 and the second reflected light RL2 may destructively interfere with each other and may be dissipated, and a risk due to external light reflection may be reduced.

[0176] refer to Figure 7 and Figure 8 , an anti-reflection layer ARS according to an embodiment is described. Figure 7 and Figure 8 is a schematic cross-sectional view illustrating an anti-reflection layer ARS according to the embodiment. Figure 8 An aspect is schematically shown in which external light is applied to the anti-reflection layer ARS according to the embodiment and the applied external light destructively interferes with each other and dissipates. For convenience of description, contents that may overlap with the above description are briefly described or not repeated.

[0177] The anti-reflection layer ARS according to the present embodiment is different from the anti-reflection layer ARS of the above-described embodiments in that the anti-reflection layer ARS according to the present embodiment includes a third refractive layer L3.

[0178] The third refractive layer L3 may be disposed between the first refractive layer L1 and the first passivation layer PL1. One surface (e.g., the lower surface) of the third refractive layer L3 may be directly adjacent to (e.g., in contact with) the first passivation layer PL1, and the other surface (e.g., the upper surface) of the third refractive layer L3 may be directly adjacent to (e.g., in contact with) the first refractive layer L1.

[0179] The third refractive layer L3 may have a third refractive index n3. The third refractive index n3 may be greater than the passivation refractive index nP. The third refractive index n3 may be greater than the first refractive index n1. For example, the third refractive layer L3 may include silicon nitride (SiN x ), and the third refractive index n3 may be 1.70 to 2.10. However, the present disclosure is not necessarily limited thereto.

[0180] According to the embodiment, the third refractive layer L3 may include the same material as the second refractive layer L2. Therefore, a refractive structure in which a high refractive index layer, a medium refractive index layer, and a high refractive index layer are sequentially stacked may be implemented between the first passivation layer PL1 and the second passivation layer PL2.

[0181] According to the embodiment, when the third refractive layer L3 is further included, since the first refractive layer L1 inserted between the second refractive layer L2 and the third refractive layer L3 has a relatively low refractive index, the refractive structure described above can be realized, and the first refractive layer L1 can include an oxide material capable of preventing risks such as oxidation of other layers. In this case, the first refractive layer L1 can include the same silicon oxide (SiO x ).

[0182] According to the anti-reflection layer ARS of this embodiment, similarly, the phase of a part of the light reflected by the anti-reflection layer ARS to the outside can be changed, the phase of another part of the light reflected by the anti-reflection layer ARS to the outside can be not changed, and they can destructively interfere with each other and can be dissipated.

[0183] According to the embodiment, the first external light OL1 may include a (1_1)th external light OL1_1 and a (1_2)th external light OL1_2. The first reflected light RL1 may include a (1_1)th reflected light RL1_1 and a (1_2)th reflected light RL1_2. The (1_1)th external light OL1_1 may be reflected at an interface between the air layer A and the outer refractive layer LL, and provided as a (1_1)th reflected light RL1_1. The (1_1)th reflected light RL1_1 may be light obtained by changing a phase of the (1_1)th external light OL1_1 by half a wavelength of the (1_1)th external light OL1_1. The (1_2)th external light OL1_2 may be reflected at an interface (i.e., a boundary) between the second passivation layer PL2 and the second refractive layer L2, and provided as a (1_2)th reflected light RL1_2. The (1_2)th reflected light RL1_2 may be light obtained by changing the phase of the (1_2)th external light OL1_2 by half the wavelength of the (1_2)th external light OL1_2.

[0184] For example, the second external light OL2 may include a (2_1)th external light OL2_1, a (2_2)th external light OL2_2, and a (2_3)th external light OL2_3. The second reflected light RL2 may include a (2_1)th reflected light RL2_1, a (2_2)th reflected light RL2_2, and a (2_3)th reflected light RL2_3. The (2_1)th external light OL2_1 may be reflected at an interface between the first refraction layer L1 and the second refraction layer L2, and provided as a (2_1)th reflected light RL2_1. The (2_1)th reflected light RL2_1 may be light in which a phase of the (2_1)th external light OL2_1 is maintained (e.g., not changed). The (2_2)th external light OL2_2 may be reflected at an interface between the first refraction layer L1 and the third refraction layer L3, and provided as a (2_2)th reflected light RL2_2. The (2_2)th reflected light RL2_2 may be light in which the phase of the (2_2)th external light OL2_2 is maintained (e.g., not changed). The (2_3)th external light OL2_3 may be reflected at an interface (i.e., boundary) between the third refraction layer L3 and the first passivation layer PL1 and provided as the (2_3)th reflected light RL2_3. The (2_3)th reflected light RL2_3 may be light in which the phase of the (2_3)th external light OL2_3 is maintained (e.g., not changed).

[0185] Therefore, the first reflected light RL1 and the second reflected light RL2 may destructively interfere with each other and may be dissipated, and a risk due to external light reflection may be reduced.

[0186] As described above, although the present disclosure has been described with reference to the above preferred embodiments, those skilled in the art or those with common knowledge in the art will understand that various modifications and changes may be made to the present disclosure without departing from the spirit and technical field of the present disclosure to be described in the appended claims.

[0187] Therefore, the technical scope of the present disclosure should not be limited to the contents described in the specific embodiments of the specification, but should be defined by the claims.

Claims

1. A display device, comprising: Display layer; an overcoat layer disposed on the display layer and comprising an organic material; as well as an anti-reflection layer, the anti-reflection layer being disposed on the outer coating layer, The anti-reflection layer comprises: a first passivation layer; a first refractive layer, the first refractive layer being disposed on the first passivation layer and having a first refractive index; a second refractive layer, the second refractive layer being disposed on the first refractive layer and having a second refractive index; a second passivation layer, the second passivation layer being disposed on the second refractive layer; and an outer refractive layer, the outer refractive layer being disposed on the second passivation layer and having an outer refractive index, wherein the first passivation layer and the second passivation layer comprise oxide, The first refractive index is less than the second refractive index, and The outer refractive index is less than the first refractive index.

2. The display device according to claim 1, wherein a first surface of the first passivation layer contacts the outer coating layer, and a second surface of the first passivation layer opposite to the first surface contacts the first refractive layer, A first surface of the second passivation layer contacts the second refractive layer, and a second surface of the second passivation layer contacts the outer refractive layer. 3 . The display device according to claim 1 , wherein an outer surface of the outer refractive layer is exposed to the outside, so that the outer refractive layer forms an outermost structure of the display device.

4. The display device according to claim 1, wherein the first refractive layer comprises silicon oxynitride, and The second refractive layer includes silicon nitride.

5. The display device according to claim 1, wherein the outer refractive layer comprises one or more of silicon dioxide, an organic material at least partially substituted by a fluorine group, an inorganic material at least partially substituted by a fluorine group, and an organic / inorganic hybrid material at least partially substituted by a fluorine group. The display device according to claim 1 , wherein the first passivation layer and the second passivation layer include silicon oxide.

7. The display device according to claim 1, wherein the first refractive index is 1.60 to 1.69, The second refractive index is 1.70 to 2.10, and The outer refractive index is 1.23 to 1.

40. 8 . The display device of claim 1 , wherein a thickness of the second passivation layer is smaller than a thickness of each of the first refraction layer, the second refraction layer, the first passivation layer, and the outer refraction layer.

9. The display device according to claim 8, wherein the first refractive layer has a thickness of 50 nm to 150 nm, The second refractive layer has a thickness of 50 nm to 150 nm, The first passivation layer has a thickness of 200 nm to 300 nm, The outer refractive layer has a thickness of 50 nm to 150 nm, and The second passivation layer has a thickness of 20 nm to 50 nm.

10. The display device according to claim 1, wherein when external light is applied to the display device, at least a portion of the external light is reflected at an outer surface of the outer refractive layer or at an interface between the second passivation layer and the second refractive layer and provided as first reflected light whose phase is reversed relative to a phase of the at least a portion of the external light, and At least another portion of the external light is reflected at an interface between the first refraction layer and the second refraction layer or at an interface between the first passivation layer and the first refraction layer and provided as second reflected light whose phase is maintained relative to a phase of the at least another portion of the external light. 11 . The display device of claim 10 , wherein at least a portion of the first reflected light and at least a portion of the second reflected light are dissipated by destructively interfering with each other.

12. The display device according to claim 1, further comprising: a plurality of sub-pixels respectively forming sub-pixel regions, The anti-reflection layer includes an inorganic material disposed above the sub-pixel region. 13 . The display device of claim 1 , wherein the overcoat layer and the first passivation layer are bonded to each other without interposing an adhesive layer therebetween.

14. The display device according to claim 1, further comprising: a color conversion layer disposed on the display layer and comprising quantum dots; as well as A color filter layer is disposed on the color conversion layer and is configured to selectively transmit light of one color.

15. The display device according to claim 1, wherein the display layer comprises an organic light emitting diode.

16. The display device according to claim 1, wherein the overcoat layer forms a substrate and the anti-reflection layer is disposed on the substrate. 17 . The display device according to claim 16 , wherein the overcoat layer has a thickness of 3 μm to 10 μm.

18. A display device comprising: Display layer; an overcoat layer disposed on the display layer and comprising an organic material; as well as an anti-reflection layer, the anti-reflection layer being disposed on the outer coating layer, The anti-reflection layer comprises: a first passivation layer; a third refractive layer, the third refractive layer being disposed on the first passivation layer and having a third refractive index; a first refractive layer, the first refractive layer being disposed on the third refractive layer and having a first refractive index; a second refractive layer, the second refractive layer being disposed on the first refractive layer and having a second refractive index; a second passivation layer, the second passivation layer being disposed on the second refractive layer; and an outer refractive layer, the outer refractive layer being disposed on the second passivation layer and having an outer refractive index, wherein the first passivation layer, the second passivation layer and the first refractive layer comprise oxide, The second refractive layer and the third refractive layer comprise the same material, The second refractive index and the third refractive index are each greater than the first refractive index, and The outer refractive index is less than the first refractive index.

19. The display device according to claim 18, wherein the first passivation layer and the second passivation layer include silicon oxide, The first refractive layer comprises silicon oxide, and The second refractive layer and the third refractive layer include silicon nitride.

20. The display device according to claim 18, wherein the first refractive index is 1.60 to 1.69, and The second refractive index and the third refractive index are each 1.70 to 2.10.

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