Air drying device

By designing an air-drying device that includes a rotating support and an air-drying assembly, the problem in the prior art of incomplete air-drying of the substrate resulting in residual water stains is solved, achieving more thorough air-drying of the parts to be air-dried and reducing residual water stains.

CN119334119APending Publication Date: 2025-01-21CHENGDU VISTAR OPTEOLECTRONICS CO LTD
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Patent Information

Application Number
CN202310896340.6
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2023-07-20
Publication Date
2025-01-21

AI Technical Summary

Technical Problem

In the prior art, when the substrate is air-dried by nozzles, water stains cannot be completely removed, and water stains are easily left, resulting in failure of the display panel.

Method used

Design an air-drying device, including a rotating support and an air-drying assembly. The air-drying assembly is composed of an air-drying nozzle and a support structure. The support structure includes a support column and a support arm. The support arm is spaced apart from the rotating support. The air-drying nozzle is provided with a slit. The slit design increases the air outlet range of the air drying nozzle.

Benefits of technology

The rotating support drives the parts to be air-dried to rotate, and uses the slit-designed air-drying nozzle to achieve more thorough air-drying of the parts to be air-dried and reduce water stains.

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Abstract

The invention discloses an air drying device. The air drying device comprises a rotary supporting piece and an air drying assembly. The rotary supporting piece is used for arranging a to-be-air-dried component. The air drying assembly comprises an air drying nozzle and a supporting structure, the supporting structure comprises a supporting column and a supporting arm, and the supporting column is arranged on the peripheral side of the rotary supporting piece. The supporting column extends towards the rotary supporting piece to form the supporting arm so that the air drying nozzle can be arranged on the supporting arm. The supporting arm and the rotary supporting piece are arranged at intervals in the first direction. The air-drying nozzle is arranged on the side, facing the rotary supporting piece, of the supporting arm, so that air outlet of the air-drying nozzle is not affected while the air-drying nozzle is supported by the supporting arm. The side, facing the rotary supporting piece, of the air drying nozzle is provided with a slit, air can be discharged towards the to-be-dried part through the slit, air drying of the to-be-dried part is achieved, the design of the slit can enlarge the air outlet range of the air drying nozzle, air drying of the to-be-dried part is more thorough, and water stain residues are reduced.
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Citation Information

Patent Citations

  • Wafer drying device

    CN208674073U

  • Substrate-treating apparatus

    JP2002033261A

  • Substrate drying apparatus, substrate drying method, and manufacturing method of substrate

    JP2007335771A

  • Cover film and display device including the same

    KR1020220117362A

  • Substrate liquid treatment apparatus and substrate liquid treatment method

    US20150318193A1