Vibration damping device, workpiece table system and photoetching machine equipment

Abstract

The invention provides a damping device, a workpiece table system and photoetching machine equipment. The damping device comprises an inner frame, a damper, an outer frame, a balance mass block and a bottom frame. A mask table, an objective lens unit and a workpiece table platform are arranged on the inner frame, and the workpiece table platform supports the workpiece table micro-motion part; an inner frame is arranged on the shock absorber; the shock absorber is arranged on the outer frame, the outer frame is further used for arranging the lighting unit, and the outer frame is used for being arranged on a foundation. The bottom frame is arranged on a foundation; a balance mass block is arranged on the bottom frame; and the balance mass block is used for arranging a workpiece table coarse moving part. According to the configuration, the dynamic stability of the photoetching machine vibration damping framework can be improved, the bearing requirement of the vibration damper is reduced, and the design difficulty and cost of the vibration damper are reduced.

Description

Technical Field

[0001] The present invention belongs to the technical field of photolithography, and in particular relates to a vibration reduction device, a workpiece stage system and photolithography equipment. Background Art

[0002] The exposure device is mainly an instrument that carries silicon wafers or glass substrates on the workpiece stage and moves synchronously with the mask stage under the objective lens to complete precise exposure. It is a complex system that integrates multiple technologies such as mechanics, electricity, light, and gas. Its strict requirements for high reliability, high precision, high speed, and high stability undoubtedly pose a great challenge to design and development. Therefore, the dynamic characteristics of the exposure device have become one of the most concerned contents of the design. The dynamic performance of the whole machine frame directly affects the three major indicators of the exposure device: the focus plane (Focus), overlay (Overlay), and the actual distribution range (Fading) of the exposure point. The evaluation indicators of the dynamic performance of the whole machine frame are mainly the frame stabilization time, residual acceleration, position stability, etc.

[0003] As exposure machines develop towards high performance and high productivity, the requirements for the vibration reduction performance of the frame, the imaging quality of the objective lens, and the motion performance of the workpiece stage are becoming increasingly higher. The driving acceleration and driving reaction force of the workpiece stage are becoming increasingly larger, and the impact on the dynamic performance of the entire machine frame is also becoming increasingly greater.

[0004] In terms of vibration reduction layout, the prior art adopts an integrated frame, and the long-stroke driving reaction force is externally drawn on one side of the workpiece stage and the mask stage. The travel guide rail is installed inside the frame, and the motor stator is installed on the reaction force bracket. The reaction force bracket is placed outside the frame. However, with the development of exposure machines, the mass and motion reaction force carried by the vibration reduction device are getting larger and larger. Simply by externalizing the motion reaction force on one side of the workpiece stage and the mask stage, the motion reaction force can only be eliminated in one direction, and the elimination capacity is limited, which can no longer meet the dynamic index requirements of the vibration reduction device of the exposure machine. In addition, the prior art adopts balanced mass technology to reduce the force transmitted to the basic frame by the workpiece stage, but because the workpiece stage is outside the frame as a whole and is not in a vibration reduction unit with the exposure system, the position stability of the workpiece stage and the objective lens unit cannot be guaranteed well. In addition, in order to compensate for the position drift of the balanced mass system frame in the X, Y and Rz directions and the fine adjustment in the Z direction, the prior art designs a correction and anti-drift device and a gravity compensation device for the workpiece stage, which makes the structural design of the workpiece stage more complicated and the synchronous control more difficult.

[0005] It should be noted that the information disclosed in the background technology section of this application is only intended to deepen the understanding of the general background technology of this application, and should not be regarded as an admission or suggestion in any form that the information constitutes prior art already known to those skilled in the art. Summary of the invention

[0006] The present invention provides a vibration reduction device, a workpiece stage system and a photolithography machine equipment to solve the above technical problems.

[0007] To solve the above technical problems, according to a first aspect of the present invention, a vibration reduction device is provided, comprising: an internal frame, a vibration absorber, an external frame, a balancing mass block and a bottom frame;

[0008] The internal frame is used to set the mask stage, objective lens unit and workpiece stage platform of the lithography equipment, and the workpiece stage platform supports the micro-movement part of the workpiece stage;

[0009] The internal frame is arranged on the vibration absorber;

[0010] The vibration absorber is arranged on the external frame, and is also used to arrange the lighting unit of the lithography machine equipment, and the external frame is used to be arranged on the foundation;

[0011] The bottom frame is used to be arranged on a foundation; the balancing mass block is arranged on the bottom frame; and the coarse motion part of the workpiece stage of the lithography equipment is arranged on the balancing mass block.

[0012] Optionally, the bottom frame is connected to the external frame so that the positions and postures of the external frame and the bottom frame remain consistent.

[0013] Optionally, a mask stage bracket is provided on the internal frame, and the mask stage bracket is used to set the mask stage. A hanging frame is provided at the bottom of the internal frame, and the workpiece stage platform is set on the hanging frame; the internal frame, the mask stage bracket and the hanging frame together form a vibration reduction unit.

[0014] Optionally, the center of mass of the vibration reduction unit is close to or consistent with the geometric center of the vibration reduction unit, and the center of mass of the vibration reduction unit is at the same height as the motor on the vibration absorber.

[0015] Optionally, the vibration reduction device further includes a vibration isolation and vibration reduction structure, and the vibration isolation and vibration reduction structure supports the bottom frame to the foundation.

[0016] Optionally, the vibration isolation and vibration reduction structure includes a plurality of airbags, and the plurality of airbags are evenly distributed at the bottom of the bottom frame.

[0017] Optionally, the balancing mass block is supported on the bottom frame by air floating, and / or the fine motion part of the workpiece stage is supported on the workpiece stage platform by air floating.

[0018] Optionally, the outer frame is supported on the foundation by a leveling device, and the leveling device is capable of leveling the outer frame and the bottom frame simultaneously.

[0019] Optionally, the leveling device includes a plurality of adjustment washers, and the plurality of adjustment washers are evenly distributed at the bottom of the external frame.

[0020] Optionally, the external frame supports the lighting unit via a lighting bracket, and the lighting bracket is used to be connected to the lighting unit via an adjustment interface, and the adjustment interface can adjust the position and posture of the lighting unit.

[0021] Optionally, the bottom frame and the external frame are connected via a positioning and mounting interface.

[0022] Optionally, the internal frame is also used to set a measuring unit of the lithography equipment, and the measuring unit is used to measure the position of the micro-motion part of the workpiece stage.

[0023] Further, according to the second aspect of the present invention, a workpiece stage system is provided, comprising a workpiece stage platform, a workpiece stage fine-motion part and a workpiece stage coarse-motion part of a lithography machine device, and also comprising any one of the vibration reduction devices described.

[0024] Furthermore, according to the third aspect of the present invention, there is also provided a lithography machine device, comprising a mask stage, an objective lens unit, a measuring unit, an illumination unit, a workpiece stage platform, a workpiece stage fine-motion part and a workpiece stage coarse-motion part, and any one of the vibration reduction devices described.

[0025] In the vibration reduction device, workpiece stage system and lithography equipment provided by the present invention, the fine-motion part of the workpiece stage and the coarse-motion part of the workpiece stage are designed in a split type, so that the objective lens unit, the mask stage and the fine-motion part of the workpiece stage are in the same vibration reduction unit, and the coarse-motion part of the workpiece stage is supported on the foundation by a balancing mass block and a bottom frame, which can reduce the reaction force of the motor acting on the internal frame. On the other hand, a balancing mass technology is also adopted to offset the driving reaction force of the coarse-motion part of the workpiece stage by a balancing mass block, further reducing the impact of the coarse-motion part of the workpiece stage on the internal frame, and ultimately reducing the residual acceleration, reducing the internal stiffness requirements for the vibration absorber, and making the low-stiffness vibration absorber have a higher transmission rate, so that the entire device is more effective in eliminating the driving reaction force of the coarse-motion part of the workpiece stage.

[0026] In the vibration reduction device, workpiece stage system and lithography equipment provided by the present invention, the lighting unit is arranged on the external frame, thereby avoiding the influence of the lighting unit on the dynamic performance of the entire device, ensuring the dynamic stability between the lighting unit and the field of view of the objective lens unit, and reducing the mass bearing of the internal frame, thereby improving the mass-to-strength ratio of the internal frame, reducing the load requirement of the vibration reducer, and reducing the difficulty and cost of vibration reducer design.

[0027] In the vibration reduction device, workpiece table system and lithography equipment provided by the present invention, preferably, the bottom frame is connected to the external frame, thereby achieving synchronous adjustment of the external frame and the bottom frame of the vibration reduction device, so that the entire vibration reduction device can remain relatively stable, greatly reducing the difficulty of integrated debugging and improving the dynamic stability of the entire device. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] The accompanying drawings are used to better understand the present invention and do not constitute an improper limitation of the present invention.

[0029] Figure 1 It is a schematic diagram of the structure of a conventional lithography machine;

[0030] Figure 2 is a cross-sectional view of a vibration reduction device provided according to an embodiment of the present invention;

[0031] Figure 3 1 is a front view schematic diagram when the centroid of the vibration reduction unit provided by an embodiment of the present invention and the motor on the vibration reduction device are at the same height level; wherein F represents the output direction of the motor on the vibration reduction device, the black dot represents the output point of the motor on the vibration reduction device, the red dot represents the geometric center of the vibration reduction unit, and the green dot represents the centroid of the vibration reduction unit;

[0032] Figure 4 It is a top view schematic diagram when the centroid and geometric center of the vibration reduction unit provided by one embodiment of the present invention are close to each other. DETAILED DESCRIPTION

[0033] In order to make the purpose, advantages and features of the present invention clearer, the present invention is further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be noted that the drawings are all in a very simplified form and are not drawn to scale, and are only used to conveniently and clearly assist in explaining the purpose of the embodiments of the present invention. In addition, the structure shown in the drawings is often a part of the actual structure. In particular, the emphasis of each drawing is different, and sometimes different scales are used.

[0034] As used in the present invention, the singular forms "one", "an" and "the" include plural objects, the term "or" is usually used to include the meaning of "and / or", the term "several" is usually used to include the meaning of "at least one", and the term "at least two" is usually used to include the meaning of "two or more". In addition, the terms "first", "second" and "third" are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first", "second" and "third" can explicitly or implicitly include one or at least two of the features. In addition, as used in the present invention, an element is arranged on another element, which usually only indicates that there is a connection, coupling, matching or transmission relationship between the two elements, and the connection, coupling, matching or transmission between the two elements can be direct or indirect through an intermediate element, and cannot be understood as indicating or implying the spatial position relationship between the two elements, that is, an element can be in any orientation such as inside, outside, above, below or one side of another element, unless the content clearly indicates otherwise. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances. The X-axis and Y-axis described in this article both represent two mutually perpendicular directions on a horizontal plane, and the Z-axis represents the vertical direction, that is, the vertical direction.

[0035] Figure 1 It is a schematic diagram of the structure of a photolithography device. Figure 1 As shown, the current conventional lithography equipment includes: an illumination unit 1, which is used to adjust the light beam 2 to a suitable illumination beam; a mask stage 3, which is used to support a mask plate 4 and enable the mask plate 4 to be accurately moved to a working position, and the mask plate 4 is used to adjust the light beam 2 to a desired pattern; a workpiece stage 5, which is used to support a substrate 6 and enable the substrate 6 to be accurately moved to a working position; and a projection objective unit 7, which is used to project the pattern of the light beam 2 onto the substrate 6.

[0036] The lighting unit 1 may include various optical elements, optomechanical components and adjustment control mechanisms to adjust and control the lighting beam 2 by means of transmission, reflection and shielding.

[0037] The mask stage 3 is used to support, clamp and fix the mask plate 4, and the fixing and clamping method can be mechanical, vacuum adsorption, etc. According to the needs of the photolithography process, the mask stage 3 can be fixed or movable, and can be independently controlled in position and posture.

[0038] The mask 4 can adjust the light beam 2 to a desired pattern. The mask 4 can be transmissive, reflective, or arranged in an array.

[0039] The workpiece stage 5 is usually used to clamp and fix the substrate 6 by vacuum adsorption. The workpiece stage 5 is usually movable and moves to a corresponding position to complete processes such as loading / unloading the substrate 6, measurement, and photolithography.

[0040] The substrate 6 usually needs to be coated with a photosensitive material so as to produce a chemical reaction with the light beam 2 to distinguish the pattern to be retained or removed. The substrate 6 can be made of a silicon wafer or a compound material.

[0041] The projection lens unit 7 (or lens unit) may include various optical elements, optomechanical components, and adjustment control mechanisms, and is used to transfer the pattern on the mask 4 to the substrate 6. The pattern on the mask 4 may be different from the pattern on the substrate 6, and the size thereof is usually reduced. The optical elements may project the pattern on the substrate 6 by transmission or reflection, and the medium between the optical elements may be air, water, or other light-transmitting medium.

[0042] The photolithography device may have two or more workpiece stages 5 to synchronously complete multiple photolithography processes; it may have multiple lighting units 1, mask plates 4, and projection lens units 7, which are spliced ​​to form a complete pattern.

[0043] The lithography equipment can have at least one of two working modes; one is a stepping mode, during pattern projection, the mask 4 and the substrate 6 remain stationary, and the light beam 2 projects the pattern onto the substrate 6 at one time; the second is a scanning mode, during the pattern projection process, the mask 4 and the substrate 6 are respectively moved by the mask stage 3 and the workpiece stage 5, and the pattern projected at each moment is a part of the complete pattern, and a complete scan forms a complete pattern.

[0044] Research has found that in conventional lithography equipment, the vibration reduction structure layout is usually an integrated structure, that is, the objective lens unit 7, the illumination unit 1, the measurement unit ( Figure 1 Not shown), the mask table 3 and the workpiece table 5 are all arranged on the shock absorber, which makes the motion reaction force act entirely on the internal frame, and the motion reaction force is all offset by the shock absorber, and the lighting unit 1 is also distributed on the internal frame, which increases the bearing mass of the internal frame, reduces the dynamic performance of the frame, and increases the bearing requirements for the shock absorber, thereby increasing the design difficulty and cost of the shock absorber.

[0045] Based on this, the present invention proposes a vibration reduction device that can be applied to lithography equipment to overcome the technical problems existing in the prior art when designing a vibration reduction structure.

[0046] Please refer to Figures 2 to 4 The vibration reduction device provided by the present invention includes an internal frame 101, a vibration absorber 102, an external frame 103, a balancing mass block 203 and a bottom frame 205.

[0047] The internal frame 101 is used to set the mask stage 401 of the lithography equipment. Optionally, the internal frame 101 is provided with a mask stage bracket 106, and the mask stage bracket 106 is used to set the mask stage 401. The internal frame 101 and the mask stage bracket 106 can be formed independently, or the internal frame 101 and the mask stage bracket 106 can be integrally formed into an integrated structure.

[0048] The internal frame 101 is also used to set a part of the workpiece stage system of the lithography equipment. Specifically, the internal frame 101 is used to set the workpiece stage platform 206 in the workpiece stage system, and the workpiece stage platform 206 directly supports the workpiece stage micro-motion part 201.

[0049] The objective lens unit 301 of the photolithography equipment is also arranged on the internal frame 101. As an option, the measuring unit 204 of the photolithography equipment is arranged on the internal frame 101, and the measuring unit 204 is used to measure the position of the work stage micro-motion part 201. The position of the work stage micro-motion part 201 is driven and controlled by the measuring unit 204, which eliminates the vibration inconsistency between the internal frame 101 and the external frame 103 and causes the motion error of the work stage, thereby ensuring the dynamic stability between the work stage micro-motion part 201, the measuring unit 204 and the objective lens unit 301. Specifically: the mask stage 401 is located above the internal frame 101, the work stage micro-motion part 201 and the work stage platform 206 are located below the internal frame 101, the measuring unit 204 is arranged around the work stage micro-motion part 201, and the objective lens unit 301 is arranged between the mask stage 401 and the work stage micro-motion part 201. Here, the work stage platform 206 provides a smooth plane, which is currently mostly made of marble, but is actually not limited to marble. As an option, the workpiece stage fine motion part 201 is suspended on the workpiece stage platform 206 in the Z direction (ie, the vertical direction) by air floating.

[0050] It should be understood that the workpiece stage in the workpiece stage system includes a workpiece stage fine motion part 201 and a workpiece stage coarse motion part 202; the main function of the workpiece stage fine motion part 201 is to carry the substrate and perform six-degree-of-freedom precise adjustment and positioning of the substrate; the workpiece stage coarse motion part 202 realizes large-stroke movement; the workpiece stage coarse motion part 202 is connected to the workpiece stage fine motion part 201, and the two can move relative to each other; the workpiece stage fine motion part 201 and the workpiece stage coarse motion part 202 are both driven by corresponding motors. Please refer to Figure 2 The side of the workpiece platform fine-motion part 201 connected to the motor mover is hung on the workpiece platform coarse-motion part 202 , and the workpiece platform coarse-motion part 202 is set on the balancing mass block 203 .

[0051] The balancing mass block 203 can offset the driving reaction force of the coarse moving part 202 of the workpiece platform, and reduce the impact and vibration of the coarse moving part 202 of the workpiece platform on the internal frame 101. Specifically, the balancing mass block 203 is arranged on the bottom frame 205; the coarse moving part 202 of the workpiece platform is arranged on the balancing mass block 203; as an option, the balancing mass block 203 is supported on the bottom frame 205 by air flotation 209, so that the air flotation isolates the balancing mass block 203 and the bottom frame 205, and realizes vibration isolation and low-friction movement; the bottom frame 205 is arranged on the foundation 501, and as a preference, the bottom frame 205 is supported on the foundation 501 by the vibration isolation and vibration reduction structure 208, and the vibration isolation and vibration reduction structure 208 supports the bottom frame 205, and also has the functions of reducing vibration, isolating vibration, and adaptively adjusting the dynamics of the external frame 103 and the bottom frame 205.

[0052] At this point, the balancing mass block 203 is equivalent to a counterweight, which can realize three-degree-of-freedom motion relative to the bottom frame 205, and the three degrees of freedom are X-direction movement, Y-direction movement and Rz-direction rotational motion. Therefore, the driving reaction force of the coarse moving part 202 of the workpiece stage can be offset by the balancing mass block 203, greatly reducing the impact of the coarse moving part 202 of the workpiece stage on the internal frame 101. It can be understood that the balancing mass block 203 is driven by a motor to move, and the offset of the balancing mass block 203 caused by the driving reaction force of the coarse moving part 202 of the workpiece stage is compensated, so that the balancing mass block 203 returns to the equilibrium position. The existence of the vibration isolation and vibration reduction structure 208 is conducive to the lithography equipment to meet the precision requirements and ensure the quality of lithography. The vibration isolation and vibration reduction structure 208 can have various implementation methods. As an option, the vibration isolation and vibration reduction structure 208 includes devices such as air bags, top screws or adjustment gaskets. In a preferred embodiment, the vibration isolation and vibration reduction structure 208 includes a plurality of airbags, at least three airbags, more preferably four airbags, which are evenly distributed at the bottom of the bottom frame 205, to achieve stable support and better vibration isolation and vibration reduction effects.

[0053] Optionally, a hanging frame 105 is provided at the bottom of the internal frame 101, and the hanging frame 105 is used to set the workpiece stage platform 206, and the hanging frame 105 is directly suspended and fixed to the bottom of the internal frame 101. The internal frame 101 and the hanging frame 105 can be independently formed and then assembled and connected, or the internal frame 101 and the hanging frame 105 are integrally formed into an integrated structure, which is not limited by the present invention. The hanging frame 105 is generally U-shaped, and the workpiece stage platform 206 and the workpiece stage micro-motion part 201 are placed in its U-shaped space. Optionally, the measuring unit 204 is also in the U-shaped space of the hanging frame 105, and is located next to the workpiece stage micro-motion part 201.

[0054] Further, the internal frame 101 is arranged on the vibration damper 102, and the vibration damper 102 is arranged on the external frame 103. At the same time, the lighting unit 302 in the lithography device is also arranged on the external frame 103. Optionally, the external frame 103 supports the lighting unit 302 through the lighting bracket 104; the lighting bracket 104 is directly fixed on the external frame 103. In this way, the vibration damper 102 and the lighting unit 302 are both arranged on the external frame 103. Among them, the external frame 103 and the lighting bracket 104 can be formed independently and assembled and connected in a suitable manner, or the external frame 103 and the lighting bracket 104 are integrally formed into an integrated structure. It should be noted that the lighting unit 302 is located above the mask stage 401, and the lighting unit 302 can adjust its position and posture relative to the external frame 103, so as to ensure the position stability between the lighting unit 302 and the objective lens unit 301. Optionally, the lighting unit 302 and the lighting bracket 104 are connected via an adjustment interface 303, which can adjust the position of the lighting unit 302 relative to the lighting bracket 104, thereby ensuring the static position requirement between the lighting unit 302 and the objective lens unit 301. There are many ways to implement the adjustment interface 303, and at least one can be selected to execute. For example, the adjustment interface 303 can be various commonly used adjustment structures, such as a jackscrew, a grinding pad, and other devices that can achieve six-degree-of-freedom adjustment.

[0055] Preferably, the outer frame 103 is connected to the bottom frame 205 so that the outer frame 103 and the bottom frame 205 can adjust the position and posture synchronously, and the position and posture of the bottom frame 205 and the outer frame 103 are kept consistent. Optionally, the bottom frame 205 is connected to the outer frame 103 via a positioning and mounting interface 207. There is no special limitation on the connection method between the outer frame 103 and the bottom frame 205, and various commonly used mechanical positioning and connection methods can be used. Optionally, the positioning and mounting interface 207 uses a positioning pin or a concave and convex structure to achieve quick connection. For example, the positioning and mounting interface 207 includes a positioning recess and a positioning protrusion, and one of the outer frame 103 and the bottom frame 205 is provided with a positioning recess, and the other is provided with a positioning protrusion that can be inserted into the positioning recess.

[0056] It can be seen that in the vibration reduction device provided by the present invention, the workpiece table fine motion part 201 is connected to the internal frame 101, and the internal frame 101 is supported by the external frame 103, and at the same time, the workpiece table coarse motion part 202 is separated from the workpiece table fine motion part 201 and is arranged on the balancing mass block 203, thereby realizing the separation of the coarse and fine motion parts of the workpiece table (that is, the workpiece table fine motion part 201 and the workpiece table coarse motion part 202 adopt a split design), so that the workpiece table movement reaction force borne by the vibration reduction unit 100 is small, and the workpiece table coarse motion part The motion reaction force of 202 can only act on the external frame 103, the balancing mass block 203 and the bottom frame 205, and is offset by the balancing mass block 203 and isolated and de-vibrated by the shock absorber 102. Such a structural design can greatly reduce the impact of the motion reaction force of the workpiece table on the internal frame 101, thereby reducing the residual acceleration and the internal stiffness requirements of the shock absorber 102, so that the low-stiffness shock absorber 102 has a higher transmission rate, and thus is more effective in eliminating the vibration of the foundation 501 and the coarse motion drive reaction force of the workpiece table.

[0057] It should also be understood that by arranging the lighting unit 302 on the external frame 103 and the coarse motion part 202 of the workpiece table on the foundation 501 through the balancing mass block 203 and the bottom frame 205, the load-bearing requirements for the shock absorber 102 are reduced, and the design difficulty and cost of the shock absorber 102 are reduced; preferably, when the bottom frame 205 is connected to the external frame 103, it helps to synchronize the external frame 103 and the bottom frame 205, so that the position and posture of the external frame 103 and the bottom frame 205 remain consistent, thereby allowing the entire vibration reduction device to remain relatively stable, greatly reducing the difficulty of integrated debugging, and improving the dynamic stability of the entire device.

[0058] In some embodiments of the present invention, the objective lens unit 301, the measuring unit 204, the mask stage 401 and the workpiece stage micro-motion part 201 are all in the vibration reduction unit 100. The vibration reduction unit 100 here can be understood as an integral structure constructed by the internal frame 101. For example, in this embodiment, the internal frame 101, the mask stage bracket 106 and the hanging frame 105 together form the vibration reduction unit 100. The entire vibration reduction unit 100 is supported by the vibration damper 102, and the weight of the entire vibration reduction unit 100 is relatively small, which is conducive to the relative stability of the positions of the objective lens unit 301, the measuring unit 204, the mask stage 401 and the workpiece stage micro-motion part 201, and the force acting on the vibration reduction unit 100 is relatively small, so that the objective lens unit 301 can present a higher imaging quality, and the vibration reduction device can maintain a higher stability. Therefore, the vibration reduction device provided by the present invention has better vibration reduction performance, higher objective lens imaging quality, and can meet the workpiece stage with higher performance requirements. Even if the driving acceleration and driving reaction force of the workpiece stage are larger, it can still achieve better vibration reduction and vibration isolation, and improve the dynamic stability of the entire lithography equipment.

[0059] Continue to refer Figure 2 Optionally, the external frame 101 is supported on the foundation 501 by a leveling device 107. The leveling device 107 can simultaneously level the external frame 103 and the bottom frame 205, specifically to achieve leveling in the Z direction (movement along the Z axis), Rx (rotation around the X axis) and Ry (rotation around the Y axis). In this way, when the external frame 103 is connected to the bottom frame 205, the vibration reduction unit 100, the lighting unit 302 and the bottom frame 205 can be synchronously adjusted by the leveling device 107. The leveling device 107 should have good vibration reduction performance, a certain vertical deflection and horizontal adjustment capability. The structure of the leveling device 107 is not limited, as long as it can level the external frame 103.

[0060] Figure 2 In the described optional implementation, the leveling device 107 includes four adjustment washers, and the four adjustment washers support the external frame 103 at the bottom of the external frame 103, and the external frame 103 is connected to the bottom frame 205; in this way, while the external frame 103 supports the lighting bracket 104 and the vibration absorber 102, the height and tilt position of the vibration reduction unit 100, the lighting unit 302 and the bottom frame 205 can be adjusted by a number of adjustment washers, and finally stable leveling is achieved to ensure the relative position relationship between the lighting unit 302 and the objective lens unit 301. However, it should be noted that the leveling device 107 includes but is not limited to adjustment washers, and other leveling structures with similar or equivalent functions can also be used, such as top screws or gaskets.

[0061] It can be seen that the vibration reduction device provided by the present invention does not need to be directly fixed to the foundation 501, but is fixed on the foundation 501 through the corresponding leveling device 107 and the vibration isolation and vibration reduction structure 208, so that the entire vibration reduction device is stabilized on the foundation 501, and the entire vibration reduction device can be simultaneously leveled inside and outside the world through the leveling device 107, so that the position relationship between the lighting unit 302, the coarse motion part 202 of the workpiece table and the vibration reduction unit 100 can remain relatively stable without changing the relative position due to machine moving, transportation, uneven ground, vibration of the foundation 501 and the external frame 103, thereby greatly reducing the difficulty of integrated adjustment and improving the dynamic stability of the frame.

[0062] As mentioned above, the lighting unit 302 is arranged on the external frame 103, rather than on the internal frame 101. Doing so can better cope with the change in the mass of the lighting system that is developing in the direction of a large field of view. It should be noted that if the lighting unit 302 is arranged on the internal frame 101, the dynamic performance of the entire vibration reduction device will be greatly affected. However, the present invention ensures the dynamic stability between the field of view of the lighting unit 302 and the objective lens unit 301 by arranging the lighting unit 302 on the external frame 103 and based on the stiffness and damping matching design of the lighting bracket 104, and also reduces the mass bearing of the internal frame 101, improves the mass-to-strength ratio of the internal frame 101, reduces the load requirement of the vibration reducer 102, and reduces the design difficulty and cost of the vibration reducer 102.

[0063] Further references Figure 3 and Figure 4 , the present invention also optimizes the height (Z direction) of the vibration absorber 102 and the mass distribution of the entire vibration absorption unit 100. Specifically, by adjusting the horizontal position and height position of the vibration absorber 102, and adjusting the mass distribution (such as the thickness and position of the rib plate) of the internal frame 101, the hanging frame 105 and the mask stage bracket 106, the center of mass (center of gravity) of the entire vibration absorption unit 100 is close to or consistent with the geometric center of the vibration absorption unit 100, and the height of the center of mass in the vibration absorption unit 100 is at the same height (Z direction height) as the motor on the vibration absorber 102. In this embodiment, the entire vibration absorption unit 100 has a relatively small moment of inertia, which can reduce the acceleration generated by the force, greatly improve the stability of vibration absorption, shorten the vibration absorption stabilization time, and make the vibration absorption effect more significant. It should be understood that the forces provided by the motor on the shock absorber 102 (i.e., the shock absorbing motor) include horizontal forces F and vertical forces F. The points of action of these forces are at the same height level as the center of mass of the shock absorbing unit 100, which can improve the shock absorbing efficiency and the shock absorbing performance.

[0064] In practice, at least three vibration absorbers 102 are evenly distributed at the bottom of the internal frame 101 for support, and each vibration absorber 102 can provide motor forces in the X direction, Y direction and Z direction for vibration reduction. Figure 4 In the described optional implementation, four vibration absorbers 102 are distributed at four corner points of the vibration reduction unit 100, and the vibration reduction effect is good.

[0065] The embodiment of the present invention further provides a workpiece stage system, which includes a workpiece stage platform 206, a workpiece stage fine motion part 201 and a workpiece stage coarse motion part 202, and on this basis, also includes a vibration reduction device provided by any embodiment of the present invention. It should be noted that in order to avoid the influence of the workpiece stage coarse motion part 202 on the internal frame 101, the workpiece stage coarse motion part 202 does not contact the hanging frame 105 and the workpiece stage platform 206, and the workpiece stage fine motion part 201 is only hung on the workpiece stage coarse motion part 202 through one side connected to the motor mover.

[0066] Based on the same inventive concept, an embodiment of the present invention further provides a lithography machine device, which, in addition to the mask stage 401, the objective lens unit 301, the measurement unit 204, the lighting unit 302, the workpiece stage platform 206, the workpiece stage fine-motion part 201 and the workpiece stage coarse-motion part 202, also includes the vibration reduction device provided by any embodiment of the present invention.

[0067] In summary, in the vibration reduction device, workpiece stage system and lithography equipment provided by the present invention, the coarse and fine movement parts of the workpiece stage are separated, and the balanced mass technology is combined for vibration reduction, thereby reducing the reaction force of the motor acting on the internal frame 101. At the same time, the lighting unit 302 is placed on the external frame 103, and the coarse movement part 202 of the workpiece stage is placed in the outside world (i.e., the foundation 501), so that the load-bearing requirements of the vibration absorber 102 are reduced, and the design difficulty and cost of the vibration absorber 102 are also reduced. In addition, the coarse movement part 202 of the workpiece stage is connected to the external frame 103, and the synchronous adjustment of the external frame 103 and the bottom frame 205 is realized, so that the entire vibration reduction device can remain relatively stable, which greatly reduces the difficulty of integrated debugging and improves dynamic stability.

[0068] In particular, in the vibration reduction device, workpiece stage system and lithography equipment provided by the present invention, by optimizing the bearing mass distribution of the vibration reduction device, not only the center of mass of the vibration reduction unit 100 can be matched with the geometric center as much as possible, but also the center of mass of the vibration reduction unit 100 can be at the same level as the height of the vibration reduction motor. These aspects are conducive to improving the stability and efficiency of vibration reduction, and further improving the vibration reduction effect.

[0069] In general, the vibration reduction device provided by the present invention is suitable for various photolithography equipment. It has the advantages of small residual acceleration, high position stability, and good vibration isolation performance. It can effectively guarantee the vibration index requirements of each subsystem, and has a short stabilization time, which can improve the productivity of the photolithography machine. Moreover, the vibration reduction device provided by the present invention has a simple structure and low difficulty in synchronous control.

[0070] Although the present invention is disclosed as above, it is not limited thereto. Those skilled in the art may make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include these modifications and variations.

Claims

1. A vibration reduction device, characterized in that: include: Inner frame, shock absorbers, outer frame, balancing mass and bottom frame; The internal frame is used to set the mask stage, objective lens unit and workpiece stage platform of the lithography equipment, and the workpiece stage platform supports the micro-movement part of the workpiece stage of the lithography equipment; The internal frame is arranged on the vibration absorber; The vibration absorber is arranged on the external frame, and is also used to arrange the lighting unit of the lithography machine equipment, and the external frame is used to be arranged on the foundation; The bottom frame is used to be arranged on a foundation; the balancing mass block is arranged on the bottom frame; The balancing mass block is used to set the coarse motion part of the workpiece stage of the photolithography equipment.

2. The vibration reduction device for photolithography equipment according to claim 1, characterized in that: The bottom frame is connected to the outer frame so that the positions and postures of the outer frame and the bottom frame are kept consistent.

3. The vibration reduction device of the lithography equipment according to claim 1 or 2, characterized in that: The internal frame is provided with a mask stage bracket, and the mask stage bracket is used to set the mask stage. The bottom of the internal frame is provided with a hanging frame, and the hanging frame is used to set the workpiece stage platform. The internal frame, the mask stage bracket and the hanging frame together form a vibration reduction unit.

4. The vibration reduction device for photolithography equipment according to claim 3, characterized in that: The center of mass of the vibration reduction unit is close to or consistent with the geometric center of the vibration reduction unit, and the center of mass of the vibration reduction unit is at the same height as the motor on the vibration absorber.

5. The vibration reduction device for photolithography equipment according to claim 1 or 2, characterized in that: A vibration isolation and vibration reduction structure is also included, and the vibration isolation and vibration reduction structure supports the bottom frame to the foundation.

6. The vibration reduction device for photolithography equipment according to claim 5, characterized in that: The vibration isolation and vibration reduction structure includes a plurality of air bags, and the plurality of air bags are evenly distributed at the bottom of the bottom frame.

7. The vibration reduction device for photolithography equipment according to claim 1 or 2, characterized in that: The balancing mass block is supported on the bottom frame by air floating, and / or the workpiece stage fine motion part is supported on the workpiece stage platform by air floating.

8. The vibration reduction device for photolithography equipment according to claim 2, characterized in that: The outer frame is supported on the foundation by a leveling device, and the leveling device can level the outer frame and the bottom frame simultaneously.

9. The vibration reduction device for photolithography equipment according to claim 8, characterized in that: The leveling device comprises a plurality of adjusting washers, and the plurality of adjusting washers are evenly distributed at the bottom of the external frame.

10. The vibration reduction device for photolithography equipment according to claim 1 or 2, characterized in that: The external frame supports the lighting unit via a lighting bracket, and the lighting bracket is used to be connected to the lighting unit via an adjustment interface, and the adjustment interface can adjust the position and posture of the lighting unit.

11. The vibration reduction device for photolithography equipment according to claim 2, characterized in that: The bottom frame and the external frame are connected via a positioning and mounting interface.

12. The vibration reduction device for photolithography equipment according to claim 1 or 2, characterized in that: The internal frame is also used to set a measuring unit of the lithography equipment, and the measuring unit is used to measure the position of the micro-motion part of the workpiece stage.

13. A workpiece stage system, comprising a workpiece stage platform, a workpiece stage fine movement part and a workpiece stage coarse movement part of a photolithography device, characterized in that: It also includes a vibration reduction device as described in any one of claims 1-12.

14. A photolithography device, comprising a mask stage, an objective lens unit, a measuring unit, an illumination unit, a workpiece stage platform, a workpiece stage fine movement part and a workpiece stage coarse movement part, characterized in that: It also includes a vibration reduction device as described in any one of claims 1-12.

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