Reaction system and cleaning method

Abstract

In a reaction system (1), a reactor (210) is provided in a sealed space covered by a blocking mechanism (111), and includes a supply port for a processed product and a discharge port for a product. The conveying device (221) conveys the object to be processed in the cylinder body in the extending direction of the cylinder body. A fluid supply pipe (204) is connected to a fluid inlet provided on the reactor and supplies a manufacturing fluid. A fluid discharge tube (206) discharges fluid within the reactor from a fluid outlet disposed on the reactor. The cleaning medium supply device (232) is branched and connected to at least one of the supply port and the fluid supply pipe, and can introduce a cleaning medium into the reactor in a cleaning step.

Description

Technical Field

[0001] The present invention relates to a reaction system and a cleaning method. Background Art

[0002] There already exists a production system that produces a desired product by stirring predetermined raw materials under a predetermined environment or the like.

[0003] For example, patent document 1 discloses the following reaction device. The reaction device includes a screw feeder body used as a pressure reaction vessel, a catalyst supply part for introducing a catalyst into the screw feeder body, and a low-level hydrocarbon supply part for introducing low-level hydrocarbons into the screw feeder body. In addition, the reaction device includes a screw for conveying the generated nanocarbon, a solid delivery part for delivering the catalyst and nanocarbon conveyed by the screw, and a gas delivery part for delivering the generated hydrogen to the outside of the feeder body.

[0004] Reference List

[0005] Patent Literature

[0006] Patent Document 1: Japanese Unexamined Patent Application Publication No. JP 2006-290682. Summary of the invention

[0007] Technical issues

[0008] In addition, in the case of using the system as described above to manufacture a highly reactive product (e.g., an electrolyte and active material for an all-solid-state lithium-ion battery), since harmful hydrogen sulfide is generated due to the reaction of moisture in the ambient air with the processed product or the product, there may be a situation in which the product is manufactured while maintaining a sealed environment by blocking at least a portion of the system from the outdoor air. In such a system, it is necessary to consider preventing outdoor air from flowing into the space on the indoor air side. On the other hand, in order to measure the amount of wear of the components constituting the reaction system or to repair and replace the components, there may be a situation in which it is necessary to perform internal cleaning of the equipment set in a sealed environment without generating harmful gases. In this case, there is a problem of ensuring work safety, for example, it is necessary to cover the entire plant or reaction system with an exhaust device, or it is necessary to wear protective equipment such as chemical protective clothing and protective masks.

[0009] The present disclosure has been made to solve such a problem, and can provide a reaction system or the like capable of preferably cleaning a reactor having a space blocked from outdoor air.

[0010] The reaction system according to the present disclosure is a reaction system capable of executing a manufacturing process of manufacturing a predetermined product from a processed product. The reaction system includes a blocking mechanism, a reactor, a conveying device, a fluid supply pipe, a fluid discharge pipe, a clean medium supply device and a recovery mechanism. The blocking mechanism is designed to block indoor air and outdoor air. The reaction system has a confined space, which includes indoor air isolated by the blocking mechanism. The reactor is a cylinder having a supply port for the processed product and a delivery port for the product. The conveying device conveys the processed product along the extension direction of the cylinder in the cylinder. The fluid supply pipe is connected to the fluid inlet arranged on the reactor and supplies the manufacturing fluid. The fluid discharge pipe discharges the fluid in the reactor from the fluid outlet arranged on the reactor. The clean medium supply device branches and is connected to at least one of the supply port or the fluid supply pipe, and a clean medium can be put into the reactor as a cleaning process. The recovery mechanism is connected to at least one of the fluid discharge pipe or the delivery port, and recovers the discharge discharged by putting the clean medium in the cleaning process.

[0011] The cleaning method according to the present disclosure is a cleaning method for a reaction system capable of executing a manufacturing process of manufacturing a predetermined product from a processed product, and the reaction system includes: a partition wall capable of blocking indoor air and outdoor air; a reactor, which is a cylinder, arranged in a sealed space covered by the partition wall, and includes a supply port for the processed product and a delivery port for the product; a conveying device, which conveys the processed product in the cylinder along the extension direction of the cylinder; a fluid supply pipe, which is connected to a fluid inlet arranged on the reactor, for supplying a manufacturing fluid; and a fluid discharge pipe, which discharges the fluid in the reactor from a fluid outlet arranged on the reactor. The above-mentioned cleaning method includes, as a cleaning process, putting a cleaning medium into the reactor from at least one of the supply port or the fluid supply pipe, and recovering the discharge discharged by putting in the cleaning medium from at least one of the fluid discharge pipe or the delivery port.

[0012] According to the present disclosure, a reaction system and the like can be provided, which are capable of cleaning a reactor preferably in a state of being blocked from outdoor air. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 is an overall configuration diagram of a reaction system according to a first embodiment;

[0014] Figure 2 is a block diagram of a reaction system according to a first embodiment;

[0015] Figure 3 is a flow chart of a manufacturing process performed by a reaction system;

[0016] Figure 4 is a flow chart of a cleaning process performed by a reaction system;

[0017] Figure 5is a view showing the flow of a process substance in a reaction system;

[0018] Figure 6 is an overall configuration diagram of a reaction system according to a second embodiment; and

[0019] Figure 7 It is an overall configuration diagram of a reaction system according to a third embodiment. DETAILED DESCRIPTION

[0020] Although the present invention will be described below by the method of the present invention, the present invention according to the claims is not limited to the following embodiments. In addition, not all the components described in the embodiments are necessary means for solving the problem. For the sake of clarity, the following description and drawings are appropriately omitted and simplified. Note that in each of the drawings, the same components are represented by the same reference numerals, and redundant descriptions are omitted when necessary.

[0021] <First Embodiment>

[0022] Will refer to Figure 1 The overall configuration of the reaction system 1 according to the present embodiment will be described. Figure 1 It is a diagram showing the overall structure of the reaction system 1. Figure 1 The reaction system 1 shown manufactures a product by subjecting the processed product to a predetermined treatment. The product manufactured by the reaction system 1 is, for example, a component for a battery, such as a solid electrolyte and a positive electrode active material for a sulfide-based all-solid-state lithium-ion secondary battery. Note that, although the predetermined treatment is not particularly limited, as long as the treatment is a means used in the process of converting the processed product into a product, the predetermined treatment is, for example, a temperature change, such as heating and cooling. The predetermined treatment is, for example, stress transfer, such as stirring, mixing, kneading and crushing. The predetermined treatment is, for example, a reaction related to the giving and receiving of electrons and free radicals. The predetermined treatment is, for example, contact with a catalyst.

[0023] In the case of manufacturing components for batteries, the reaction system 1 needs to perform each process at a predetermined temperature and in a predetermined atmosphere. The predetermined atmosphere is, for example, a dew point temperature of about minus 70 degrees Celsius. In addition, the predetermined temperature is, for example, about 20 degrees Celsius to 1000 degrees Celsius. In addition, when manufacturing components for batteries, there is a case where hydrogen sulfide is generated by the processed material or the product, or there is a case where hydrogen sulfide is supplied to the reactor. Therefore, it is desirable that the reaction system 1 performs the above-mentioned manufacturing process in an environment blocked from outdoor air.

[0024] In addition, when the reaction system 1 performs the above-mentioned manufacturing process for manufacturing the product, the reaction system 1 is designed to be able to perform a cleaning process for cleaning the interior of the reaction system 1 when the reaction system 1 does not perform the manufacturing process. The reaction system 1 performs the manufacturing process while maintaining an environment blocked from outdoor air. Therefore, when the reaction system 1 performs the cleaning process, the environment blocked from outdoor air is still maintained during the cleaning process, so that outdoor air does not flow into the indoor air side, or harmful gases generated on the indoor air side do not leak to the outdoor air side.

[0025] The reaction system 1 includes a processed material input block 100 and a processing block 200 as main components. In the manufacturing process, the reaction system 1 receives the processed material container 10 from the processed material receiving port 101 of the processed material input block 100, and inputs the processed material 10A packaged in the received processed material container 10 into the processing block 200. In addition, in the cleaning process, the reaction system 1 performs cleaning by receiving a predetermined medium for cleaning.

[0026] The processed object input block 100 comprises a processed object receiving port 101 and a processed object input port 102 in a processed object receiving space 110, and the processed object receiving space is covered by a blocking mechanism 111, and the blocking mechanism blocks indoor air and outdoor air. The blocking mechanism 111 is a structure that blocks indoor air and outdoor air in the reaction system 1, and is an implementation aspect of the blocking mechanism. Note that the blocking mechanism 111 can be, for example, a structure of a partition wall or the like, or can utilize a fluid such as an air curtain. The reaction system 1 has a confined space isolated by the blocking mechanism 111 and comprising indoor air. In the processed object receiving space 110, a mechanical arm etc. is provided, which is used to appropriately receive the processed object container 10 and the processed object 10A stored in the received processed object container 10 is put into the processing block 200.

[0027] The processed object receiving port 101 is an opening provided in the receiving portion of the processed object container 10, and the receiving portion is a space covered by a partition wall for receiving the processed object container 10. A processed object receiving door 103 is provided at the processed object receiving port 101 so as to be able to open and close. When the processed object receiving door 103 is in a closed state, the interior of the processed object input block 100 is blocked from the outdoor air.

[0028] The processed material input port 102 is an opening for inputting the processed material 10A stored in the processed material container 10 received by the processed material input block 100 into the processing block 200. A processed material input door 104 is provided at the processed material input port 102 so as to be openable and closable. When the processed material input door 104 is in a closed state, the interior of the processed material input block 100 is blocked from the processing block 200.

[0029] In the above-mentioned structure, in the treatment object input block 100, when the treatment object receives the door 103 in the open state, the treatment object inputs the door 104 in a closed state. In a similar manner, when the treatment object is input with the door 104 in the open state, the treatment object receives the door 103 in a closed state. In addition, the treatment object input block 100 also has a device (not shown) for properly sucking indoor air, or a device (not shown) for filling indoor air with inert gas etc. This makes it possible for the reaction system 1 to maintain a state of being blocked from outdoor air when the treatment object 10A is received in the treatment block 200.

[0030] In the present disclosure, blocking indoor air from outdoor air means preventing at least one substance in the amount of substances exceeding a predetermined amount of threshold value contained in the substances in the outdoor air from flowing into the space on the indoor air side. Alternatively, blocking indoor air from outdoor air means preventing at least one substance in the amount of substances exceeding a predetermined amount of threshold value contained in the substances in the indoor air from flowing out to the space on the outdoor air side. In this case, the space on the indoor air side is at least a part of the space in the reaction system, and is a space where there is a substance that can produce harmful substances when at least one substance in the amount of substances exceeding a predetermined amount of threshold value contained in the substances in the outdoor air or the cleaning medium comes into contact. In other words, the position or range of the space on the indoor air side is not particularly limited, as long as the space is a space where the above-mentioned substances exist. The space on the indoor air side can be, for example, a treated material input block 100 or can be a part of the reactor 210. Note that the space on the outdoor air side can be a space outside the reaction system 1, or can be a space that does not correspond to the space on the indoor air side in the reaction system 1 containing the blocking mechanism. Note that although the above-mentioned predetermined "amount" is not particularly limited as long as the amount is a quantity that can be quantified by a measuring device, such as the concentration, weight, volume and pressure of the substance, in the case where the substance is a gas, the amount is preferably the concentration, and more preferably the concentration at the temperature of the space undergoing the cleaning process.

[0031] In addition, the hazardous substances in the present disclosure may be interpreted as at least one of substances that may be harmful to human health, substances that may be physical hazards such as fire and ignition, substances that may be chemical hazards such as corrosion to the structure and working area of ​​the device, or substances that may be harmful to the environment such as ambient air, water quality and soil. In other words, the hazardous substances may be interpreted as substances that attract attention or issue warnings in the safety data sheet through any instructions indicating risks and harmful effects, symbol marks, etc. The hazardous substances may be, for example, substances specified by Japanese law, such as specified chemical substances, hazardous substances, and hazardous substances.

[0032] In addition, the processed object input block 100 can receive predetermined cleaning medium to replace the processed object container 10. The cleaning medium that the processed object input block 100 receives can be, for example, abrasive, beaded solids, etc., for removing the residue existing in the processed block 200, or a liquid such as a cleaning solution. Note that the above-mentioned processed object receives the valve body such as a butterfly valve or the like with door 103 and the processed object input door 104, or can be a ball valve or a gate. The processed object receives the structure that the door 103 and the processed object input door 104 need not be a valve body or a wall body or the like. In other words, the processed object receives the airflow device that the door 103 and the processed object input door 104 can, for example, use the air curtain or the like to block the inside with the outside. However, the processed object receives the form and structure that the door 103 and the processed object input door 104 are not limited to the above-mentioned design.

[0033] Subsequently, the processing block 200 will be described. The processing block 200 is a reaction device that receives the processed object 10A and produces the product 10B. The processing block 200 produces the product 10B by performing a manufacturing process that applies a stimulus to the processed object 10A under an atmosphere of a predetermined temperature, such as kneading, stirring, or pulverizing. After producing the product 10B, the processing block 200 delivers the produced product 10B from the delivery port 202.

[0034] The processing block 200 includes a supply port 201, a delivery port 202, a temperature control device 203, a reactor 210, a processing space 211, a driving device 220, and a conveying device 221 as main components. In addition, as a component for controlling the atmosphere of the processing space 211, the processing block 200 includes a fluid supply pipe 204, a supply pipe control valve 205, a fluid discharge pipe 206, and a discharge pipe control valve 207.

[0035] The supply port 201 is an entrance for receiving a predetermined material into the processing space 211 . Figure 2 Shown supply port 201 receives the processed object 10A dropped into from the processed object input port 102 of processed object input block 100.The processed object 10A received from supply port 201 is supplied to processing space 211.Note that processed object input port 102 and supply port 201 can be made of continuous partition wall.Alternatively, processed object input port 102 and supply port 201 can be connected by the mode that indoor air and outdoor air are blocked.For example, processed object input port 102 and supply port 201 can be by the O-ring formed by nitrile rubber, fluororesin or silicone resin, or the gasket formed by metal or resin is fastened, or processed object input port 102 and supply port 201 need not directly be connected, but have cylindrical shell to be placed between processed object input port 102 and supply port 201.

[0036] The processing space 211 is a processing space blocked from outdoor air by a partition wall and the reactor 210. In the processing space 211, the processing block 200 kneads, stirs, mixes, and pulverizes the processing material 10A under a predetermined environment to produce a product 10B.

[0037] The reactor 210, which is a cylindrical member extending in the horizontal direction, is the shell of the processing block 200. The cross-sectional shape of the reactor 210 is not particularly limited and may be circular, elliptical or polygonal. In addition, the cross-sectional shape of the reactor 210 may be a shape combining multiple figures.

[0038] Although the material forming the reactor 210 is not particularly limited, the material is preferably resistant to hydrogen sulfide gas generated inside, predetermined temperature changes, etc. Therefore, the components constituting the reactor 210 may be formed, for example, of alloys, ceramics, carbon, and composite materials containing two or more of them. An alloy is a metal component containing at least one of the following alloy elements as a component, such as nickel, cobalt, chromium, molybdenum, tungsten, tantalum, titanium, iron, copper, aluminum, silicon, boron, and carbon. Ceramics are ceramic components, such as: oxides, such as aluminum oxide and zirconium oxide; carbides, such as silicon carbide and titanium carbide; nitrides, such as silicon nitride and titanium nitride; and borides, such as chromium boride. In addition, carbon is a carbon component, such as crystalline graphite and fiber-reinforced graphite. At least the material inside the reactor 210 may be composed of a component containing an alloy, ceramic, or carbon.

[0039] The reactor 210 disposed in the sealed space covered by the blocking mechanism 111 is, for example, a cylinder, which includes a supply port 201 for the processed material at one end side and a delivery port 202 for the product at the other end side. The reactor 210 forms a processing space 211 inside and accommodates a conveying device 221 in the processing space 211. In addition, the reactor 210 receives the processed material from the supply port 201 on the upstream side. In addition, the reactor 210 delivers the product 10B to the outside from the delivery port 202 on the downstream side. Note that the reactor 210 may have a supply port 201 and a delivery port 202 at the end or at a position separated from the end.

[0040] Note that in the present disclosure, upstream and downstream are defined as follows. In other words, a position close to the supply port 201 when viewed from a point A at any position on the path from the supply port 201 to the delivery port 202 is defined as an upstream position, and a position close to the delivery port 202 when viewed from the point A is defined as a downstream position. In addition, the upstream side indicates the upstream direction observed from the point A, and the downstream side indicates the downstream direction observed from the point A.

[0041] The reactor 210 is covered by a temperature control device 203 in the middle part, and the interior of the reactor 210 is designed to be heated or cooled. In addition, the reactor 210 is connected to a fluid supply pipe 204 in the middle part, and when the supply pipe control valve 205 is opened, the reactor 210 receives a predetermined fluid from the fluid supply pipe 204. The predetermined fluid is, for example, an inert gas, such as nitrogen. In addition, the reactor 210 is connected to a fluid discharge pipe 206 in the middle part, and the fluid containing hydrogen sulfide gas generated in the processing space 211 is discharged to the fluid discharge pipe 206 due to the opening of the discharge pipe control valve 207.

[0042] The temperature control device 203 includes a heating device or a cooling device, and controls the temperature in the reactor 210, that is, the processing space 211. The temperature control device 203 includes a heating device so as to surround the cylindrical reactor 210 in the middle of the reactor 210. The heating device includes any heater capable of controlling the temperature, such as, for example, a sheath heater, a coil heater, and a ceramic heater. The heating device performs heating, for example, in a range from room temperature to about 1000 degrees. The temperature control device 203 can set different temperatures for each region of the middle part of the reactor 210 along the long axis direction of the conveying device 221. The temperature control device 203 can set different temperatures for each region in the vertical direction (minor axis direction) of the reactor 210.

[0043] The driving device 220 includes a motor and a driving force transmission portion that is fitted to a driving shaft protruding from the motor and drives the conveying device 221 . Figure 1 The conveying device 221 in the reactor 210 is, for example, a screw extending from one end side to the other end side of the processing space 211. One screw may be provided, or two or more screws may be provided. The conveying device 221 rotates the processed material so that the processed material can be conveyed inside the barrel of the reactor 210 along the extension direction of the barrel. The conveying device 221 is rotated by a driving device 220. The driving device 220 may, for example, control the driving direction and driving speed of the conveying device 221. Note that the shape and form of the conveying device 221 are not particularly limited. For example, the conveying device 221 is not limited to a screw that conveys the processed material by rotation, and may be a belt conveyor or a rotating drum. The conveying device 221 may be a combination of a screw and a plurality of conveying devices, such as a blower.

[0044] The fluid supply pipe 204 is connected to a fluid inlet provided on the reactor 210 and supplies a manufacturing fluid. The fluid supply pipe 204 includes a supply pipe control valve 205. The fluid supply pipe 204 supplies a predetermined fluid to the processing space 211 by opening the supply pipe control valve 205.

[0045] In addition, the fluid supply pipe 204 includes a first switching unit 231. The first switching unit 231 includes a mechanism for switching between a supply pipe control valve 205 for supplying a manufacturing fluid and a cleaning medium supply device 232 that is provided to branch into the fluid supply pipe 204. In the manufacturing process, the first switching unit 231 is provided so that the manufacturing fluid is supplied from the supply pipe control valve 205 to the processing space 211. In addition, in the cleaning process, the first switching unit 231 is provided so that the cleaning fluid is supplied from the cleaning medium supply device 232 to the processing space 211.

[0046] The cleaning medium supply device 232 supplies a cleaning fluid to the processing space 211 in the cleaning process. The cleaning medium supply device 232 includes, for example, a syringe, etc., through which a predetermined cleaning fluid can be dripped. The cleaning medium supply device 232 is preferably a device capable of supplying a predetermined amount of cleaning fluid. The cleaning medium supply device 232 is more preferably a device that can be quantitatively controlled by a control signal, etc. The cleaning medium supply device 232 can be, for example, a dispenser, a syringe, or a supply device attached with a mass flow meter. When the cleaning medium supply device 232 can supply a cleaning fluid, the cleaning medium supply device 232 can be a device different from the above. Note that the cleaning medium supply device 232 can branch and be connected to the supply port 201. In other words, the cleaning medium supply device 232 branches and is connected to at least one of the supply port 201 or the fluid supply pipe 204, and the cleaning medium can be put into the reactor as a cleaning process. Note that the "amount" of the above-mentioned cleaning fluid is not particularly limited, as long as the amount is an amount that can be quantified by a measuring device, such as concentration, volume, weight and pressure, and the amount can be, for example, a flow rate, such as milliliters per hour.

[0047] The fluid discharge pipe 206 discharges the fluid inside the reactor from the fluid outlet provided on the reactor 210. The fluid discharge pipe 206 includes a discharge pipe control valve 207. The fluid discharge pipe 206 discharges the fluid existing in the processing space 211 to the outside of the processing space 211 by opening the discharge pipe control valve 207.

[0048] The fluid discharge pipe 206 includes a second switching unit 241. The second switching unit 241 is provided on the fluid discharge pipe 206 and is used to recover the manufacturing fluid and the like in the manufacturing process and to guide the cleaned fluid discharged in the cleaning process to the fluid recovery mechanism 242. In other words, the second switching unit 241 includes a mechanism for switching between the flow path of the fluid discharge pipe 206 in the manufacturing process and the flow path of the fluid discharge pipe 206 in the cleaning process.

[0049] Fluid recovery mechanism 242 is connected to fluid discharge pipe 206 in cleaning process, and reclaims the discharge discharged into fluid discharge pipe 206 by the cleaning medium of input. Fluid recovery mechanism 242 comprises the container for accumulating the recovered fluid. In addition, fluid recovery mechanism 242 may comprise filter, separator, sedimentation tank etc., as the separator for separating the recovered fluid. In addition, fluid recovery mechanism 242 may comprise scrubber, burner, activated carbon etc., as the purifier for purifying the recovered fluid suitably.

[0050] The delivery port 202 is a delivery port for delivering a product 10B generated by subjecting the material received from the supply port 201 to a predetermined process. More specifically, the delivery port 202 delivers the product 10B in the form of pellets or slurry, for example, to the lower portion of the delivery port 202. The delivery port 202 is connected to the next process while being blocked from the outdoor air.

[0051] The delivery port 202 is connected to the third switching unit 251. The third switching unit 251 guides the cleaned waste discharged in the cleaning process to the waste recovery mechanism 252. In other words, the third switching unit 251 includes a mechanism for switching between a flow path for conveying the product 10B in the manufacturing process and a flow path for guiding the cleaned waste to the waste recovery mechanism 252 in the cleaning process.

[0052] The discharge recovery mechanism 252 is connected to the delivery port 202 in the cleaning process, and reclaims the discharge discharged to the delivery port 202 by putting into the cleaning medium. The discharge recovery mechanism 252 includes a container for the discharge recovered by gathering. In addition, the discharge recovery mechanism 252 may include a filter, a separator, a sedimentation tank, etc., as a separation device for separating the various materials included in the discharge recovered. In addition, the discharge recovery mechanism 252 may include a scrubber, a burner, activated carbon, etc., as a purification device for properly purifying the recovered fluid.

[0053] The discharge measuring device 240 is provided at the fluid discharge pipe 206. The discharge measuring device 240 measures the components of the discharge in the cleaning process. The components measured by the discharge measuring device 240 can be set according to the application of the reaction system 1. The discharge measuring device 240 may include a plurality of sensors so as to be able to measure a plurality of components.

[0054] The overall structure of the reaction system 1 has been described above. Note that the processed material input block 100 does not have to be close to or adjacent to the reactor 210. For example, a device for transporting the processed material can be provided between the processed material input block 100 and the reactor 210. The device for transporting the processed material is, for example, a pneumatic device or a belt conveyor. In this way, even when the processed material input block 100 is set at a position separated from the reactor 210, the reaction system 1 can preferably supply the processed material 10A to the reactor 210.

[0055] The following will refer to Figure 2 The functional structure of the reaction system 1 will be described. Figure 2 is a block diagram of a reaction system according to the first embodiment. The reaction system 1 includes a control device 260, which controls various components of the reaction system 1 to achieve the functions of the present disclosure.

[0056] The control device 260 controls the reaction system 1 in the manufacturing process so that the product 10B is manufactured from the processed product 10A. In addition, the control device 260 controls at least one of the temperature control device 203, the conveying device 221 and the cleaning medium supply device 232 in the cleaning process, for example, based on the amount, temperature, etc. of the substance contained in the exhaust. In the present disclosure, the "amount" of the substance contained in the exhaust is not particularly limited, as long as the amount is an amount that can be quantified by a measuring device, such as concentration, volume, weight and pressure, and the amount can be, for example, a concentration measured by a gas concentration meter, and can be expressed in units such as parts per million (ppm) and volume percentage when the exhaust is a gas.

[0057] The control device 260 includes, for example, an arithmetic device, such as a central processing unit (CPU), a graphics processing unit (GPU), or a microcontroller unit (MCU). In addition, the control device 260 includes a storage device such as a dynamic random access memory (DRAM) and a flash memory, an interface that can be communicatively connected to each component, and other peripheral circuits. The control device 260 is connected to the temperature control device 203, the drive device 220, the manufacturing fluid control device 270, the first switching part 231, the second switching part 241, the third switching part 251, the cleaning medium supply device 232, the discharge measuring device 240, and the information input / output device 280.

[0058] In the components connected to the control device 260, reference has been made to Figure 1 The temperature control device 203 , the driving device 220 , the first switching portion 231 , the second switching portion 241 , the third switching portion 251 , the cleaning medium supply device 232 , and the discharge measuring device 240 are described, and thus the description will be omitted here.

[0059] Figure 2The manufacturing fluid control device 270 shown controls the amount of manufacturing fluid supplied to the reactor 210 during the manufacturing process. The manufacturing fluid control device 270, for example, can operate the opening and closing of the supply pipe control valve 205. In addition, the manufacturing fluid control device 270 can control the operation of the pump, which pumps the manufacturing fluid to the fluid supply pipe 204. In the present disclosure, the "amount" of the manufacturing fluid is not particularly limited, as long as the amount is an amount that can be quantified by a measuring device, such as concentration, volume, weight and pressure. In the case where the manufacturing fluid is, for example, a gas, the amount can be a flow rate that can be controlled by a mass flow controller, such as liters per minute.

[0060] The exhaust measuring device 240 measures the composition of exhaust in the cleaning process and provides the measurement data to the control device 260. Note that the exhaust measuring device 240 can measure the composition and temperature of the fluid in the manufacturing process.

[0061] The information input / output device 280 includes, for example, a display device for notifying the user of various information on the reaction system 1 , and an information input device for receiving a predetermined operation from the user.

[0062] Next, we will refer to Figure 3 The outline of the production process performed by the reaction system 1 will be described. Figure 3 Flow chart of the production process performed by the reaction system 1 . Figure 3 The flowchart shown in can be regarded as indicating the processing performed by the control device 260. Figure 3 The illustrated flowchart can also be considered as an operation flow performed by a user operating the reaction system 1 .

[0063] First, the reaction system 1 controls the temperature control device 203 to adjust the temperature of the reactor 210 to a predetermined temperature (step S1 ).

[0064] Then, reaction system 1 controls production fluid control device 270 to supply production fluid to processing space 211 (step S2 ).

[0065] Then, the reaction system 1 receives the material container 10 in the material input block 100 (step S3 ). Since the material container 10 is received in the material input block 100 , the reaction system 1 supplies the material 10A stored in the material container 10 to the supply port 201 .

[0066] Then, by controlling the driving device 220 to drive the conveying device 221, the reaction system 1 conveys the processed material 10A received from the supply port 201 from the upstream side to the downstream side (step S4). After the processed material 10A is put into the reactor 210 from the supply port 201, a predetermined reaction is carried out in the processing space 211 to produce a product 10B.

[0067] Then, the reaction system 1 delivers the product 10B through the delivery port 202 (step S5). After the reaction system 1 delivers the product 10B, a series of processes are completed.

[0068] The manufacturing process performed by the reaction system 1 has been described above. Note that the reaction system 1 can continuously perform the above-mentioned process. Therefore, the reaction system 1 can continuously send out the product 10B. In addition, in the above-mentioned flow chart, the step S1 can be performed after the step S2. The step S1 and the step S2 can be performed simultaneously.

[0069] The reaction system 1 can continuously perform the above-mentioned manufacturing process in an environment blocked from outdoor air. Since the reaction system 1 performs such processing, residues and the like adhere to the reactor 210 in the reaction system 1. Therefore, the reaction system 1 temporarily stops the manufacturing process and performs a cleaning process.

[0070] Will refer to Figure 4 Describe the cleaning process. Figure 4 is a flow chart of the cleaning process performed by the reaction system. Figure 4 The flowchart shown in can be regarded as indicating the processing performed by the control device 260. Figure 4 The illustrated flowchart can also be considered as an operation flow performed by a user operating the reaction system 1 .

[0071] First, the reaction system 1 controls the temperature control device 203 to adjust the temperature of the reactor 210 (step S11).

[0072] Then, the reaction system 1 controls the driving device 220 to drive the conveying device 221 (operation S12). Note that although the purpose of driving the conveying device 221 in the cleaning process can be to convey the cleaning medium, the purpose is not limited to this. The purpose of driving the conveying device 221 in the cleaning process can be to stir the atmosphere of the cleaning medium or the cleaning medium, or to promote the cleaning by the cleaning medium. In addition, the process can skip operation S12 and enter operation S13 without driving the transport device.

[0073] Then, the reaction system 1 controls the cleaning medium supply device 232 to feed the cleaning medium into the reactor 210 (step S13 ). Alternatively, when receiving the cleaning medium from the treatment material feeding block 100 , the reaction system 1 feeds the received cleaning medium into the supply port 201 .

[0074] Then, the reaction system 1 is charged with a cleaning medium to recover the discharge material discharged to the fluid discharge pipe 206 (step S14 ).

[0075] Then, the reaction system 1 measures the composition, temperature, and amount of substances contained in the discharge by acquiring measurement data from the discharge measurement device 240 in the fluid discharge pipe 206 (step S15 ).

[0076] Then, the reaction system 1 determines whether to end the cleaning process (process S16) based on the measurement data obtained from the discharge measuring device 240. Here, the control device 260 obtains data on the input amount of the cleaning medium input by the cleaning medium supply device 232 and the composition of the discharge measured by the discharge measuring device 240, and determines whether to continue the cleaning process based on the acquired data. More specifically, the reaction system 1 can determine whether to end the cleaning process, for example, by monitoring the amount of harmful substances generated in the reactor 210 and contained in the discharge due to the cleaning process. In addition, in this case, the reaction system 1 can monitor the elapsed time of the cleaning process and make the above determination based on the relationship between the elapsed time and the amount of harmful substances. Alternatively, the reaction system 1 can only monitor the elapsed time of the cleaning process, and when enough time has passed, determine to end the cleaning process. Note that in the present disclosure, the "amount" of harmful substances contained in the discharge is not particularly limited, as long as the amount is an amount that can be quantified by a measuring device, such as concentration, volume, weight and pressure, the amount can be, for example, a concentration measured by a gas concentration meter, and can be expressed in units such as ppm and volume percentage when the discharge is a gas.

[0077] If it is determined that the cleaning step is to be terminated (step S16: Yes), the reaction system 1 terminates the cleaning step. On the other hand, if it is determined that the cleaning step is not to be terminated (step S16: No), the treatment of the reaction system 1 proceeds to step S17.

[0078] In step S17, the reaction system 1 determines whether to perform parameter adjustment (step S17). In the components that function in the cleaning process, the parameter adjustment is, for example, at least one of the temperature of the reactor 210, the driving direction or driving speed of the conveying device 221, and the input amount of the cleaning medium. In order to determine whether to perform parameter adjustment, the reaction system 1 can appropriately obtain feedback data on the temperature of the reactor 210, the driving torque or driving speed of the conveying device 221, and can refer to the feedback data.

[0079] If it is not determined that the parameter adjustment is to be performed (step S17: No), the process of the reaction system 1 returns to step S15. On the other hand, if it is determined that the parameter adjustment is to be performed (step S17: Yes), the process of the reaction system 1 proceeds to step S18.

[0080] In step S18, the reaction system 1 adjusts the parameters with reference to the determination result in step S17 (step S18). After the parameter adjustment is performed, the process of the reaction system 1 returns to step S15.

[0081] The cleaning process performed by the reaction system 1 has been described above. Here, a specific example of the cleaning process performed by the reaction system 1 will be described. For example, the reaction system 1 uses water as a cleaning medium to clean the sulfide etc. remaining in the reactor 210. In this case, the reaction system 1 sets the temperature of the reactor 210 to about 200 degrees, for example, and drives the conveying device 221 at a high speed. Then, the reaction system 1 drips water as a cleaning medium from the cleaning medium supply device 232. In this way, the state of water changes in the reactor 210 and becomes water vapor, and the water vapor is further stirred by driving the conveying device, and the water vapor can effectively contact with the remaining sulfide etc. Since the stirred water vapor contacts the sulfide etc. remaining in the reactor 210, hydrogen sulfide is generated. The fluid recovery mechanism 242 recovers the hydrogen sulfide as a harmful substance discharged to the fluid discharge pipe 206 and the water vapor discharged without reaction.

[0082] Water vapor has a relatively high reactivity and is therefore suitable for cleaning by utilizing a reaction. In addition, the volume of water vapor is greater than the volume of water and is therefore relatively easy to contact with the residues in the form of particles with a large surface area, such as sulfides, etc., remaining in the reactor 210. Therefore, even in a cleaning process that requires a large amount of water in the related art, the reaction system 1 can reduce the amount of water to be used by changing water to water vapor. In this way, the reaction system 1 can perform effective cleaning by appropriately changing the state of the cleaning medium in the reactor 210.

[0083] In this case, the reaction system 1 measures, for example, the concentration of hydrogen sulfide, etc. in the exhaust measuring device 240. As the reaction between the residual sulfide and the water vapor proceeds over time, the concentration of hydrogen sulfide measured in the exhaust measuring device 240 may become higher, and conversely, the amount of sulfide remaining in the reactor 210 may decrease. The measurement results of the concentration of the exhaust, etc. measured by the exhaust measuring device 240 in this way may be calculated, stored, machine-learned, and output by the control device 260, so that the time change of the exhaust concentration, etc. may be tracked or predicted. In addition, the control device 260 issues a control signal to at least one of the temperature control device 203, the conveying device 221, and the cleaning medium supply device 232 based on the calculation result.

[0084] More specifically, for example, when the exhaust concentration is 1 volume percent at the past time 0:00 and the exhaust concentration is 1 volume percent at the current time 0:10, the control device 260 calculates the time change of the exhaust concentration as 0. The control device 260 may display the calculation result on, for example, an operation panel.

[0085] The control device 260 can perform a process of controlling the concentration of the exhaust at a predetermined future time based on the above calculation. The control device 260 performs a calculation of optimizing the corresponding control parameters of the temperature control device 203, the conveying device 221, and the cleaning medium supply device 232 so that the exhaust concentration at the future time 0:20 is, for example, 2 volume percent. As a result, the control device 260 can, for example, send a control signal to the cleaning medium supply device 232 to double the supply amount of the cleaning fluid. Note that when the concentration of the exhaust, etc., drops below a predetermined threshold, the reaction system 1 ends the cleaning process.

[0086] Note that in the above example of the cleaning process, the reaction system 1 may receive, for example, ceramic beads as a cleaning medium from the supply port 201, or may receive a slurry containing ceramic beads from the cleaning medium supply device 232. The ceramic beads are used to collide with the inner wall of the reactor 210 to peel off the residue. In this case, the input ceramic beads are sent out to the delivery port 202 together with the residue. The discharge recovery mechanism 252 of the reaction system 1 recovers the ceramic beads and the residue sent out to the delivery port 202.

[0087] A specific example of a cleaning process performed by the reaction system 1 has been described above. Through the above design, the reaction system 1 cleans the interior of the reaction system 1 while maintaining a state of being blocked from the outdoor air. In the above design, the control device 260 may have a function related to machine learning in the cleaning process. For example, the control device 260 includes a learning model for determining cleaning conditions. More specifically, the control device 260 machine learns the relationship between the cleaning condition and the amount of harmful substances contained in the discharge, and the cleaning condition is at least one of the temperature of the reactor 210, the operating state of the conveying device 221, and the amount of the cleaning medium supplied by the cleaning medium supply device 232. The machine learning described here may be a learning model that is deeply learned using, for example, the peak value of the amount of harmful substances contained in the discharge becoming the maximum value as a reward.

[0088] The following will refer to Figure 5 The flow of materials processed by reaction system 1 is described. Figure 5 This is a diagram illustrating the flow of the process material in the reaction system. Figure 5 The manufacturing process is shown in the upper part and the cleaning process is shown in the lower part.

[0089] In the manufacturing process at the top, the reaction system 1 receives the manufacturing fluid and the processed material and reacts them in the reactor. In this way, the reaction system 1 discharges the predetermined product and the fluid after the reaction. Note that the fluid after the reaction may contain the same components as the components of the manufacturing fluid.

[0090] In the cleaning process shown in the lower part, the reaction system 1 receives the cleaning medium. The cleaning medium can be a liquid, such as the water shown in the above specific example, or it can be a gas, such as water vapor. In addition, the cleaning medium can be a solid, such as the ceramic beads shown in the above specific example, or it can be a liquid with solid particles suspended therein. The reaction system 1 receives the cleaning medium and reacts the cleaning medium with the residue remaining in the reactor. As a result, harmless substances, harmful substances and cleaning medium are discharged from the reactor. Note that harmless substances are substances that do not belong to harmful substances.

[0091] After the cleaning medium discharged from the reactor is recovered, the cleaning medium can be reused as the cleaning medium again. In addition, the harmless substances, harmful substances and cleaning medium discharged from the reactor can be recovered by a recovery mechanism. The harmless substances, harmful substances and cleaning medium recovered by the recovery mechanism are appropriately separated and purified by a separation device and a purification device.

[0092] After the harmless substances, harmful substances and cleaning media recovered by the recovery mechanism are processed by the separation device and the purification device, the cleaning media can be extracted. In this case, the extracted cleaning media is reused in the cleaning process. After the recovered harmless substances and harmful substances are processed by the separation device and the purification device, the processed material can be extracted. In this case, the extracted processed material (reprocessed material) is reused in the manufacturing process. In a similar manner, after the recovered harmless substances and harmful substances are processed by the separation device and the purification device, the manufacturing fluid can be extracted. In this case, the extracted manufacturing fluid is reused in the manufacturing process. Finally, after the recovered harmless substances and harmful substances are processed by the separation device and the purification device, the waste can be extracted. The waste is discarded as appropriate.

[0093] Regarding the above-mentioned cleaning process, various cleaning processes can be performed as follows by utilizing the various components of the reaction system 1 .

[0094] For example, the reaction system 1 receives water as a cleaning medium. The reaction system 1 decomposes the residue remaining in the reactor 210 by water. In this case, for example, the reaction system 1 can adjust the input amount of water by monitoring the internal pressure of the reactor 210. In addition, in this case, the progress of cleaning can be monitored by a discharge measuring device 240 or a temperature sensor (not shown) attached to the reactor 210, which measures the temperature change associated with the heat of solution of the residue. In addition, the gas produced by the decomposition is recovered by a fluid recovery mechanism 242. Note that the fluid recovery mechanism 242 may include a burner for burning the recovered gas. Because the burner burns the gas, the reaction system 1 can render the recovered gas harmless.

[0095] In addition, for example, the reaction system 1 can be stripped of residue by receiving water as a cleaning medium and causing vibration in the driving direction of the high-speed switching conveyor 221. In this case, for example, after the discharge recovery mechanism 252 recovers water and residue by centrifugal recovery of the discharge, the reaction system 1 can preferably separate water and residue. In such a cleaning process, the reaction system 1 can, for example, monitor the volume and weight of the residue in the recovered discharge. Such a design enables the reaction system 1 to monitor the progress of cleaning.

[0096] The reaction system 1 can receive ceramic beads as a cleaning medium. In this case, the ceramic beads peel off the residues adhering to the reactor 210. The discharge recovery mechanism 252 of the reaction system 1 recovers the ceramic beads and the peeled residues. The reaction system 1 can monitor the amount of the residues in the discharge recovery mechanism 252 by measuring, for example, volume and weight to monitor the progress of the cleaning. In addition, for example, by centrifuging the recovered discharge, the cleaning medium is separated from the residues.

[0097] The reaction system 1 may receive a catalyst that can decompose the residue as a cleaning medium. In this case, the reaction system 1 can monitor the progress of the cleaning by monitoring the exhaust gas and solids, and can separate or purify the gas, or separate or reuse the solids using the above-mentioned techniques.

[0098] The reaction system 1 can receive oxygen as a cleaning medium. In this case, the reaction system 1 can burn or oxidize the residue in the reactor 210 by increasing the temperature of the reactor 210 by the temperature control device 203. In addition, in this case, the temperature of the reactor 210 is monitored using a thermometer provided in the discharge measuring device 240. By such a design, the reaction system 1 can monitor the temperature in the reactor 210 with high responsiveness. Therefore, the reaction system 1 can safely perform the cleaning process. Note that the gas generated by combustion or oxidation can preferably be recovered by, for example, a scrubber.

[0099] The reaction system 1 may receive an inert gas as a cleaning medium. In this case, the reaction system 1 may smolder the residue remaining in the reactor 210 by heating the reactor 210 filled with the inert gas. Note that, in the case where a gas such as carbon monoxide is generated in the reactor 210 by the cleaning process, the reaction system 1 may recover the gas by the fluid recovery mechanism 242, and may render the gas harmless by burning the gas with a burner.

[0100] After the reactor 210 is heated to a relatively high temperature in advance, the reaction system 1 may receive a relatively low temperature substance such as liquid water as a cleaning medium. The reaction system 1 strips the residue from the reactor 210 by causing a thermal shock in the reactor 210. In this case, in order to prevent the degradation of the reaction system 1 itself, the reaction system 1 performs the cleaning process while monitoring the temperature change.

[0101] The reaction system 1 may receive a predetermined organic solvent as a cleaning medium. In this case, the reaction system 1 strips the residue by reacting the organic solvent with the residue. The organic solvent is recovered by the fluid recovery mechanism 242 and the discharge recovery mechanism 252. In addition, in this case, the reaction system 1 may distill the recovered organic solvent so that the organic solvent can be reused.

[0102] The reaction system 1 can receive a predetermined fibrous object as a cleaning medium. The fibrous cleaning medium entangles and transports the residue that is stripped off, for example, due to the driving of the conveying device 221. The reaction system 1 renders the residue and the fibrous cleaning medium harmless, for example, by burning, and discards them. The fibrous cleaning medium can be reused after burning, or the residue adhered to the fibrous cleaning medium can be washed with water and reused.

[0103] An example of the cleaning process has been described above. Note that the cleaning process performed by the above-described reaction system 1 is an example and is not limited to the above-described contents.

[0104] The first embodiment has been described above. According to the first embodiment, a reaction system or the like can be provided, which can clean a reactor preferably in a state where the reactor is blocked from outdoor air.

[0105] <Second Embodiment>

[0106] Will refer to Figure 6 A second embodiment will be described. Figure 6 is a diagram showing the overall configuration of the reaction system according to the second embodiment. Figure 6 In the reaction system 2 according to the present embodiment, the fluid recovery mechanism 242 further includes a reprocessing device, which includes a connected conveying path 243 so that the recovered discharge can be re-introduced into the reactor from the supply port or the fluid inlet.

[0107] The reaction system 2 according to the second embodiment has a design in which the fluid recovered by the fluid recovery mechanism 242 can be reused. The reaction system 2 includes a production fluid storage unit 208 as a component for storing the production fluid and supplying the production fluid to the fluid supply pipe 204.

[0108] In the reaction system 2, the fluid recovery mechanism 242 recovers the cleaned fluid via the second switching unit 241. The fluid recovery mechanism 242 includes a separation device that separates the recovered fluid into a manufacturing fluid and a cleaning medium. The fluid recovery mechanism 242 includes a reprocessing device that separates the recovered fluid into a cleaning medium and a manufacturing fluid.

[0109] The fluid recovery mechanism 242 supplies the cleaning fluid in the separated fluid to the cleaning medium supply device 232. The cleaning medium supply device 232 receives the cleaning medium from the fluid recovery mechanism 242 and reuses the received cleaning fluid in the cleaning process.

[0110] Fluid recovery mechanism 242 supplies the manufacturing fluid in the separated fluid to manufacturing fluid storage unit 208. Manufacturing fluid storage unit 208 reuses the manufacturing fluid received from fluid recovery mechanism 242 in the manufacturing process.

[0111] As mentioned above, in the reaction system 2 according to the second embodiment, the manufacturing fluid is produced by the residue reaction in the cleaning process with the cleaning medium and the reactor 210. Therefore, the reaction system 2 reclaims the cleaning medium and the manufacturing fluid, and then separates and reuses the manufacturing fluid. In this case, the control device 260 can control the parameters in the cleaning process by monitoring the amount of the manufacturing fluid contained in the discharge. More specifically, the control device 260 controls the temperature and the cleaning medium supply device 232 of the reactor 210 at least, so that the composition that can be reused as the manufacturing fluid can be extracted from the discharge. Therefore, according to the second embodiment, a reaction system etc. can be provided, which can preferably and effectively clean the reactor under the state of being blocked with the external air.

[0112] <Third Embodiment>

[0113] The following will refer to Figure 7 A third embodiment will be described. Figure 7 It is an overall configuration diagram of a reaction system 3 according to the third embodiment. Figure 3 The illustrated reaction system 3 includes a first reactor 210A and a second reactor 210B as reactors.

[0114] In the manufacturing process, the first reactor 210A receives the processed product from the processed product input block 100, performs a predetermined process, and delivers the intermediate product from the delivery port 202A to the supply port 201B. In the manufacturing process, the second reactor 210B receives the intermediate product from the first reactor 210A, performs a predetermined process on the received intermediate product, and delivers the product from the delivery port 202B.

[0115] The reaction system 3 includes a reprocessing device at a fluid recovery mechanism 242A provided at the first reactor 210A. The fluid recovery mechanism 242A includes a delivery path 243 connected to a cleaning medium supply device 232B provided at the second reactor 210B.

[0116] In this way, the reprocessing device connects the fluid recovery mechanism 242A connected to the first reactor 210A and the supply port or fluid inlet connected to the second reactor 210B. In this way, the reaction system 3 is designed so that in the cleaning process, the second reactor 210B receives the effluent discharged from the first reactor 210A and performs a predetermined reprocessing.

[0117] In the reaction system 3 having the above-described design, when the first reactor 210A is cleaned, the second reactor 210B reprocesses the discharged effluent. As described above, according to the third embodiment, a reaction system can be provided, which can preferably and effectively clean the reactor while being blocked from outdoor air.

[0118] The present invention has been described above with reference to the embodiments, but the present invention is not limited thereto. Various changes that can be understood by those skilled in the art can be made in the design and details of the present invention within the scope of the present invention.

[0119] This application claims priority from Japanese patent application JP 2022-095239 filed on Jun. 13, 2022, the entire contents of which are hereby incorporated by reference herein.

[0120] Industrial Applicability

[0121] The present invention is used, for example, in a reaction system for producing battery materials.

[0122] Reference numerals list

[0123] 1 Reaction system

[0124] 2 Reaction system

[0125] 3 Reaction system

[0126] 4 Reaction system

[0127] 10. Disposal container

[0128] 10A Processing

[0129] 10B Product

[0130] 100 Processing objects are put into the block

[0131] 101 Processing material receiving port

[0132] 102 Processing material input port

[0133] 103 Door for receiving processed materials

[0134] 104 Door for handling materials

[0135] 110 Processing material receiving space

[0136] 111 Blocking Agency

[0137] 200 Processing Blocks

[0138] 201 Supply port

[0139] 202 Send out

[0140] 203 Temperature control device

[0141] 204 Fluid supply pipe

[0142] 205 Supply pipe control valve

[0143] 206 Fluid discharge pipe

[0144] 107, 207 Discharge pipe control valve

[0145] 208 Manufacturing fluid storage unit

[0146] 210 Reactor

[0147] 211 Processing Space

[0148] 220 Drive unit

[0149] 221 Conveyor

[0150] 231 First switching unit

[0151] 232 Cleaning medium supply device

[0152] 240 Emissions measuring device

[0153] 241 Second switching unit

[0154] 242 Fluid Recovery Mechanism

[0155] 243 Conveyor Path

[0156] 251 Third switching unit

[0157] 252 Effluent recovery mechanism

[0158] 260 Control Device

[0159] 270 Fluid control devices for manufacturing

[0160] 280 Information input / output device.

Claims

1. A reaction system capable of executing a production process of producing a predetermined product from a processed product, the reaction system comprising: A blocking mechanism capable of blocking indoor air from outdoor air; A reactor, which is a cylindrical body including a supply port for a processed substance and a delivery port for a product; A conveying device, which conveys the processed material in the cylinder within the cylinder; a fluid supply pipe connected to a fluid inlet provided on the reactor for supplying a production fluid; a fluid discharge pipe for discharging the fluid in the reactor from a fluid outlet disposed on the reactor; as well as A cleaning medium supply device is branched and connected to at least one of the supply port or the fluid supply pipe, and is capable of injecting a cleaning medium into the reactor as a cleaning process.

2. The reaction system according to claim 1, wherein The reaction system includes a recovery mechanism connected to at least one of the fluid discharge pipe or the delivery port, and recovering at least one of the fluid or the discharge discharged by the input of the cleaning medium in the cleaning step.

3. The reaction system according to claim 2, wherein: The fluid discharge pipe further includes a switching portion that switches between a flow path for recovering the manufacturing fluid in the manufacturing process and a flow path for recovering the discharge in the cleaning process.

4. The reaction system according to claim 2, wherein: The recovery mechanism also includes a separation device for separating and recovering multiple substances.

5. The reaction system according to claim 2, wherein: The recovery mechanism further includes a reprocessing device including a conveying path connected so that the recovered effluent can be reintroduced into the reactor from the supply port or the fluid inlet.

6. The reaction system according to claim 5, wherein: The reaction system includes a first reactor as the reactor and a second reactor different from the first reactor, wherein the reprocessing device is designed to connect the recovery mechanism connected to the first reactor with the supply port or the fluid inlet connected to the second reactor, whereby the second reactor receives the effluent discharged from the first reactor and performs predetermined reprocessing.

7. The reaction system according to any one of claims 2 to 6, wherein The reaction system further comprises: a temperature control device for controlling the temperature of the reactor; an exhaust measuring device for measuring the amount of exhaust in the cleaning process; and A control device controls the cleaning process by controlling at least one of the temperature control device, the conveying device, and the cleaning medium supply device based on the measured amount of the discharge.

8. The reaction system according to claim 7, wherein: The control device determines whether to continue the cleaning process based on the amount of the cleaning medium supplied by the cleaning medium supply device and the amount of the discharge measured by the discharge measuring device.

9. The reaction system according to claim 7, wherein: The control device controls the cleaning process based on the amount of a substance contained in the effluent and that can be reused in the manufacturing process.

10. The reaction system according to claim 9, wherein: The control device controls at least the temperature of the reactor and the cleaning medium supply device so that a substance that can be reused as a production fluid can be extracted from the discharge.

11. The reaction system according to claim 7, wherein: The control device includes a learning model that determines a cleaning condition by machine learning a relationship between at least one of the cleaning conditions of the temperature of the reactor, the operating state of the conveying device, and the supply amount of the cleaning medium and the amount of the discharge.

12. A method for cleaning a reaction system, the reaction system comprising: Partition walls that separate indoor air from outdoor air; A reactor which is a cylindrical body, is disposed in the sealed space covered by the partition wall, and includes a supply port for a processed substance and a delivery port for a product; A conveying device, which conveys the processed material in the cylinder within the cylinder; a fluid supply pipe connected to a fluid inlet provided on the reactor and used for supplying a manufacturing fluid; as well as a fluid discharge pipe, which discharges the fluid in the reactor from a fluid outlet disposed on the reactor, The reaction system is capable of executing a manufacturing process of manufacturing a predetermined product from the processed product, and the cleaning method includes: As a cleaning step, a cleaning medium is introduced into the reactor from at least one of the supply port or the fluid supply pipe; as well as At least one of the fluid or the discharge generated by the input of the cleaning medium is discharged from at least one of the fluid discharge pipe or the delivery port.

13. The cleaning method according to claim 12, wherein: The cleaning method includes: recovering at least one of the fluid or the discharge discharged by inserting the cleaning medium from at least one of the fluid discharge pipe or the delivery port.

14. The cleaning method according to claim 12, wherein: The cleaning method comprises: controlling the temperature of the reactor; measuring the amount of discharge from the cleaning process; and Based on the amount of the discharge, at least one of the temperature of the reactor, the driving of the conveying device, and the input amount of the cleaning medium is controlled to perform the cleaning process.

15. The cleaning method according to any one of claims 12 to 14, wherein: The cleaning method includes: based on at least one of the composition, amount and temperature of the effluent, at least controlling the temperature of the reactor and the input amount of the cleaning medium, so that a substance that can be reused as the manufacturing fluid can be extracted from the effluent.

16. The cleaning method according to claim 12, wherein: The cleaning method includes: reintroducing at least a portion of the effluent from the supply port or the fluid inlet into the reactor for reprocessing.

17. The cleaning method according to claim 16, wherein: The reaction system includes a first reactor as the reactor and a second reactor different from the first reactor, At least a portion of the effluent discharged from the first reactor is fed into the second reactor and subjected to predetermined reprocessing.

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