Welding method of tantalum-titanium ring assembly, pot-shaped target material assembly and welding method of pot-shaped target material assembly

Abstract

The invention relates to a welding method of a tantalum-titanium ring assembly, a pot-shaped target material assembly and a welding method of the pot-shaped target material assembly, in particular to the technical field of metal welding, and the welding method comprises the steps that a tantalum ring and a titanium ring are assembled, then hot isostatic pressing is conducted, and the tantalum-titanium ring assembly is obtained; wherein the assembling gap between the tantalum ring and the titanium ring in the assembling body obtained through assembling is smaller than 0.2 mm; the heat preservation temperature of the hot isostatic pressing is 600-800 DEG C. According to the welding method provided by the invention, by adopting specifically designed welding process control parameters, efficient welding of the tantalum ring and the titanium ring is realized, the connection strength during subsequent welding of the flange and the pot-shaped target material is ensured, and the utilization rate of the pot-shaped target material assembly is favorably improved.

Description

Technical Field

[0001] The invention relates to the technical field of metal welding, and in particular to a welding method for a tantalum-titanium ring assembly, a pot-shaped target assembly and a welding method thereof. Background Art

[0002] The pot-shaped target is usually composed of a pot-shaped curved sputtering body and a flange that supports and fixes the sputtering process. The sputtering body is a high-purity sputtering material, and the flange is usually required to be welded to the sputtering body and have the characteristics of good machinability, not easy to deform, high strength and low cost.

[0003] For example, CN117047333A discloses a welding method for a pot-shaped target material, which comprises the following steps: (1) polishing, cleaning and drying the welding surfaces of the sputtering body and the annular flange respectively to obtain a pretreated sputtering body and a pretreated annular flange; (2) sleeve the pretreated annular flange obtained in step (1) on the outer wall of the pretreated sputtering body, and perform edge sealing on the upper and lower edges of the welding surface by argon arc welding to obtain an assembled welding assembly; (3) hot isostatic pressing diffusion welding the assembled welding assembly obtained in step (2) to obtain a pot-shaped target material.

[0004] CN114603243A discloses a welding method for a pot-shaped target material, the welding method comprising: welding the pot-shaped target material and a support member by electron beam, wherein a welding surface with a high melting point of the material is provided with a bevel; the vertical length of the bevel is 4-7mm; the height of the bevel is 0.2-0.5mm; the electron beam welding comprises a first weld, a second weld, a third weld and a fourth weld; the first weld is for welding a non-bevel welding surface; the second weld is for welding an end face 0.4-0.8mm away from the bevel; the third weld is for welding an end face 0.6-1.2mm away from the bevel; the fourth weld is for welding a gap between the pot-shaped target material and the support member.

[0005] However, due to changes in the use environment, the flange rings used for the pot-shaped targets are currently welded with dissimilar metals. Tantalum rings are introduced to improve the welding effect of the titanium flange and the pot-shaped tantalum target. However, there is still a difference in connection strength when the tantalum ring and the titanium flange are currently connected, resulting in desoldering of the titanium ring and the tantalum ring during subsequent welding of the titanium-tantalum flange and the pot-shaped target. Summary of the invention

[0006] In view of the problems existing in the prior art, the purpose of the present invention is to provide a welding method for a tantalum-titanium ring assembly, a pot-shaped target assembly and a welding method thereof, so as to solve the defect of desoldering of the titanium ring and the tantalum ring when the flange and the pot-shaped target are welded due to the poor connection strength of the tantalum-titanium ring flange assembly.

[0007] To achieve this object, the present invention adopts the following technical solutions:

[0008] In a first aspect, the present invention provides a welding method for a tantalum-titanium ring assembly, the welding method comprising:

[0009] Assembling the tantalum ring and the titanium ring, and then performing hot isostatic pressing to obtain a tantalum-titanium ring assembly;

[0010] Wherein, the assembly gap between the tantalum ring and the titanium ring in the assembly body obtained by the assembly is less than 0.2 mm; and the insulation temperature of the hot isostatic pressing is 600-800°C.

[0011] The welding method provided by the present invention realizes efficient welding of tantalum rings and titanium rings by adopting specially designed welding process control parameters, ensures the connection strength of subsequent flanges and pot-shaped targets during welding, and is beneficial to improving the efficiency of pot-shaped target assemblies.

[0012] As a preferred technical solution of the present invention, the roundness of the tantalum ring is less than 0.1 mm.

[0013] Preferably, the roundness of the titanium ring is less than 0.1 mm.

[0014] As a preferred technical solution of the present invention, the tantalum ring and / or titanium ring is ultrasonically cleaned before assembly.

[0015] As a preferred technical solution of the present invention, the medium for ultrasonic cleaning includes ketone and / or alcohol.

[0016] As a preferred technical solution of the present invention, the ultrasonic cleaning is performed at least 3 times.

[0017] Preferably, the time for a single ultrasonic cleaning is 10-15 minutes.

[0018] As a preferred technical solution of the present invention, the holding pressure of the hot isostatic pressing is 80-100 MPa.

[0019] As a preferred technical solution of the present invention, the holding time of the hot isostatic pressing is 2-3 hours.

[0020] As a preferred technical solution of the present invention, the assembly obtained by the assembly is placed in a package for degassing and then subjected to hot isostatic pressing.

[0021] Preferably, the end point of the degassing is an absolute vacuum degree ≤ 0.02Pa.

[0022] In a second aspect, the present invention provides a pot-shaped target assembly, which includes a pot-shaped target and a flange, and the flange is a tantalum-titanium ring assembly obtained by the welding method described in the first aspect.

[0023] In a third aspect, the present invention provides a welding method for the pot-shaped target assembly as described in the second aspect, the welding method comprising: welding the pot-shaped target and the flange by electron beam welding.

[0024] Compared with the prior art solutions, the present invention has the following beneficial effects:

[0025] The welding method provided by the present invention realizes efficient welding of tantalum rings and titanium rings by adopting specially designed welding process control parameters. The welding strength of the titanium ring and the tantalum ring is ≥97MPa, which ensures the connection strength of the tantalum ring and the titanium ring when the flange and the pot-shaped target are subsequently subjected to electron beam welding. After the flange and the pot-shaped target are welded, the connection strength of the tantalum ring and the titanium ring is ≥95MPa, which is beneficial to improving the efficiency of the pot-shaped target assembly. DETAILED DESCRIPTION

[0026] To better illustrate the present invention and facilitate understanding of the technical solution of the present invention, typical but non-limiting embodiments of the present invention are as follows:

[0027] This embodiment provides a welding method for a tantalum-titanium ring assembly, the welding method comprising:

[0028] Assembling the tantalum ring and the titanium ring, and then performing hot isostatic pressing to obtain a tantalum-titanium ring assembly;

[0029] Wherein, the assembly gap between the tantalum ring and the titanium ring in the assembly body obtained by the assembly is less than 0.2 mm; and the insulation temperature of the hot isostatic pressing is 600-800°C.

[0030] In the present invention, when assembling the tantalum ring and the titanium ring, the tantalum ring can be selected as the inner ring or the titanium ring can be selected as the inner ring according to the specific purpose of the tantalum-titanium ring assembly. For example, when the tantalum-titanium ring assembly is used as a flange of a tantalum pot-type target material, the tantalum ring is used as the inner ring of the tantalum-titanium ring assembly, and the titanium ring is used as the outer ring of the tantalum-titanium ring assembly. The thicknesses of the corresponding titanium ring and tantalum ring can be reasonably selected and designed according to the subsequent use.

[0031] In the present invention, the assembly gap between the tantalum ring and the titanium ring in the assembled assembly is less than 0.2 mm, for example, it can be 0.19 mm, 0.18 mm, 0.16 mm, 0.14 mm, 0.12 mm, 0.1 mm, 0.08 mm, 0.06 mm, 0.04 mm, 0.02 mm, 0.01 mm, 0.005 mm or 0.001 mm, but is not limited to the listed values, and other values ​​not listed within the range also meet the requirements.

[0032] In the present invention, the holding temperature of the hot isostatic pressing is 600-800°C, for example, it can be 600°C, 620°C, 640°C, 660°C, 680°C, 700°C, 720°C, 740°C, 760°C, 780°C or 800°C, but is not limited to the listed values, and other unlisted values ​​within the range also meet the requirements.

[0033] The roundness of the tantalum ring is less than 0.1 mm, for example, it can be 0.09 mm, 0.08 mm, 0.06 mm, 0.04 mm, 0.02 mm, 0.01 mm, 0.005 mm, 0.001 mm, 0.0001 mm or 0 mm, but is not limited to the listed values, and other values ​​not listed within the range also meet the requirements.

[0034] Among them, the roundness of the titanium ring is less than 0.1mm, for example, it can be 0.09mm, 0.08mm, 0.06mm, 0.04mm, 0.02mm, 0.01mm, 0.005mm, 0.001mm, 0.0001mm or 0mm, but it is not limited to the listed values, and other unlisted values ​​within this range also meet the requirements.

[0035] Wherein, the tantalum ring and / or titanium ring is ultrasonically cleaned before assembly.

[0036] Wherein, the medium for ultrasonic cleaning includes ketone and / or alcohol.

[0037] In the present invention, the medium used in ultrasonic cleaning can be selected from cleaning agents such as acetone, ethanol, methanol, etc.

[0038] The ultrasonic cleaning is performed at least 3 times, for example, 3 times, 4 times, 5 times, 6 times, 7 times, 8 times, 9 times or 10 times, but is not limited to the listed values, and other values ​​not listed within the range also meet the requirements.

[0039] Among them, the time of a single ultrasonic cleaning is 10-15 minutes, for example, it can be 10 minutes, 10.5 minutes, 11 minutes, 11.5 minutes, 12 minutes, 12.5 minutes, 13 minutes, 13.5 minutes, 14 minutes, 14.5 minutes or 15 minutes, but is not limited to the listed values, and other values ​​not listed in this range also meet the requirements.

[0040] In the present invention, the rings may be subjected to surface treatment such as polishing, grinding, sandblasting, etc. before assembly to remove stains on the surface of the rings, so as to ensure the final welding effect.

[0041] Among them, the holding pressure of the hot isostatic pressing is 80-100MPa, for example, it can be 80MPa, 82MPa, 84MPa, 86MPa, 88MPa, 90MPa, 92MPa, 94MPa, 96MPa, 98MPa or 100MPa, but is not limited to the listed values, and other unlisted values ​​within the range also meet the requirements.

[0042] Among them, the holding time of the hot isostatic pressing is 2-3h, for example, it can be 2h, 2.1h, 2.2h, 2.3h, 2.4h, 2.5h, 2.6h, 2.7h, 2.8h, 2.9h or 3h, but is not limited to the listed values, and other unlisted values ​​within the range also meet the requirements.

[0043] The assembly obtained by the assembly is placed in a package for degassing and then hot isostatic pressing.

[0044] In the present invention, the material of the sheath used in degassing can be selected according to actual requirements, as long as it can meet the degassing requirements of hot isostatic pressing in the art, such as using a stainless steel sheath to degas the assembly.

[0045] Among them, the endpoint of the degassing is absolute vacuum ≤ 0.02Pa, for example, it can be 0.02Pa, 0.018Pa, 0.016Pa, 0.014Pa, 0.012Pa, 0.01Pa, 0.008Pa, 0.006Pa or 0.004Pa, but is not limited to the listed values, and other unlisted values ​​within the range also meet the requirements.

[0046] Furthermore, the present embodiment provides a pot-shaped target assembly, which includes a pot-shaped target and a flange, and the flange is a tantalum-titanium ring assembly obtained by the aforementioned welding method.

[0047] When the obtained tantalum-titanium ring assembly is used as a flange welding of a pot-shaped target material, the tantalum ring is adjacent to the pot-shaped target material.

[0048] Furthermore, this embodiment provides a welding method for the aforementioned pot-shaped target assembly, specifically comprising: welding the pot-shaped target and the flange by electron beam welding.

[0049] In the present invention, the welding beam current is controlled to be 70-90 mA, the focus depth is 9-11 mm, and the welding speed is 10-15 mm / s in the electron beam welding used for welding the pot-shaped target and the flange;

[0050] In the present invention, the welding beam current in the electron beam welding used for welding the pot-shaped target and the flange is controlled to be 70-90mA, for example, it can be 70mA, 72mA, 74mA, 76mA, 78mA, 80mA, 82mA, 84mA, 86mA, 88mA or 90mA, but is not limited to the listed values, and other unlisted values ​​within the range also meet the requirements.

[0051] In the present invention, the focus depth in the electron beam welding used for welding the pot-shaped target and the flange is controlled to be 9-11mm, for example, it can be 9mm, 9.2mm, 9.4mm, 9.6mm, 9.8mm, 10mm, 10.2mm, 10.4mm, 10.6mm, 10.8mm or 11mm, but is not limited to the listed values, and other unlisted values ​​within the range also meet the requirements.

[0052] In the present invention, the welding speed in the electron beam welding used for welding the pot-shaped target and the flange is controlled to be 10-15 mm / s, for example, it can be 10 mm / s, 10.5 mm / s, 11 mm / s, 11.5 mm / s, 12 mm / s, 12.5 mm / s, 13 mm / s, 13.5 mm / s, 14 mm / s, 14.5 mm / s or 15 mm / s, etc., but is not limited to the listed values, and other values ​​not listed within the range also meet the requirements.

[0053] Further, in order to illustrate the good welding effect that can be achieved by the welding method provided by the present invention, the following practical examples are used for exemplary description, as follows:

[0054] Example 1

[0055] This embodiment provides a welding method for a tantalum-titanium ring flange assembly for a pot-shaped target, the welding method comprising:

[0056] Assembling the tantalum ring and the titanium ring, and then performing hot isostatic pressing to obtain a tantalum-titanium ring assembly;

[0057] The assembly gap between the tantalum ring and the titanium ring in the assembled body is 0.05 mm; the roundness of the tantalum ring is 0.03 mm; the roundness of the titanium ring is 0.02 mm;

[0058] The tantalum ring and / or titanium ring is ultrasonically cleaned before assembly; the medium of the ultrasonic cleaning is acetone; the ultrasonic cleaning is performed 4 times; the time of a single ultrasonic cleaning is 15 minutes;

[0059] The assembly obtained by the assembly is placed in a bag for degassing and then hot isostatic pressing; the end point of the degassing is an absolute vacuum degree of 0.0005 Pa;

[0060] The holding temperature of the hot isostatic pressing is 750° C.; the holding pressure of the hot isostatic pressing is 85 MPa; and the holding time of the hot isostatic pressing is 2.8 h.

[0061] Example 2

[0062] This embodiment provides a welding method for a tantalum-titanium ring assembly, the welding method comprising:

[0063] Assembling the tantalum ring and the titanium ring, and then performing hot isostatic pressing to obtain a tantalum-titanium ring assembly;

[0064] The assembly gap between the tantalum ring and the titanium ring in the assembled body is 0.12 mm; the roundness of the tantalum ring is 0.02 mm; the roundness of the titanium ring is 0.04 mm;

[0065] The tantalum ring and the titanium ring are ultrasonically cleaned before assembly; the medium of the ultrasonic cleaning is acetone; the ultrasonic cleaning is performed 3 times; the time of a single ultrasonic cleaning is 12 minutes;

[0066] The assembly obtained by the assembly is placed in a bag for degassing and then hot isostatic pressing; the end point of the degassing is an absolute vacuum degree of 0.02 Pa;

[0067] The holding temperature of the hot isostatic pressing is 700° C.; the holding pressure of the hot isostatic pressing is 90 MPa; and the holding time of the hot isostatic pressing is 2.5 h.

[0068] Example 3

[0069] This embodiment provides a welding method for a tantalum-titanium ring assembly, the welding method comprising:

[0070] Assembling the tantalum ring and the titanium ring, and then performing hot isostatic pressing to obtain a tantalum-titanium ring assembly;

[0071] The assembly gap between the tantalum ring and the titanium ring in the assembled body is 0.18 mm; the roundness of the tantalum ring is 0.08 mm; the roundness of the titanium ring is 0.07 mm;

[0072] The tantalum ring and the titanium ring are ultrasonically cleaned before assembly; the medium of the ultrasonic cleaning is ethanol; the ultrasonic cleaning is performed 3 times; the time of a single ultrasonic cleaning is 10 minutes;

[0073] The assembly obtained by the assembly is placed in a bag for degassing and then hot isostatic pressing; the end point of the degassing is an absolute vacuum degree of 0.02 Pa;

[0074] The holding temperature of the hot isostatic pressing is 600° C.; the holding pressure of the hot isostatic pressing is 100 MPa; and the holding time of the hot isostatic pressing is 3 hours.

[0075] Example 4

[0076] This embodiment provides a welding method for a tantalum-titanium ring assembly, the welding method comprising:

[0077] Assembling the tantalum ring and the titanium ring, and then performing hot isostatic pressing to obtain a tantalum-titanium ring assembly;

[0078] The assembly gap between the tantalum ring and the titanium ring in the assembled body is 0.16 mm; the roundness of the tantalum ring is 0.05 mm; the roundness of the titanium ring is 0.06 mm;

[0079] The tantalum ring and the titanium ring are ultrasonically cleaned before assembly; the medium of the ultrasonic cleaning is ethanol; the ultrasonic cleaning is performed 5 times; the time of a single ultrasonic cleaning is 15 minutes;

[0080] The assembly obtained by the assembly is placed in a bag for degassing and then hot isostatic pressing; the end point of the degassing is an absolute vacuum degree of 0.0008Pa;

[0081] The holding temperature of the hot isostatic pressing is 800° C.; the holding pressure of the hot isostatic pressing is 80 MPa; and the holding time of the hot isostatic pressing is 2 hours.

[0082] Example 5

[0083] The only difference from Example 1 is that the assembly gap between the tantalum ring and the titanium ring is 0.5 mm.

[0084] Example 6

[0085] The only difference from Example 1 is that the holding temperature of the hot isostatic pressing is 400°C.

[0086] Example 7

[0087] The only difference from Example 1 is that the holding temperature of the hot isostatic pressing is 200°C.

[0088] Example 8

[0089] The only difference from Example 1 is that the holding pressure of the hot isostatic pressing is 50 MPa.

[0090] Example 9

[0091] The only difference from Example 1 is that the holding time of the hot isostatic pressing is 1.5 h.

[0092] The welding strength of the tantalum-titanium ring assembly obtained in the above embodiment and the electron beam welding of the tantalum-titanium ring assembly as a flange and a pot-shaped tantalum target (welding beam current is 80 mA, focal depth is 10 mm, welding speed is 12 mm / s), the connection strength of the tantalum-titanium ring assembly after welding is shown in Table 1.

[0093] Table 1

[0094] Welding strength / MPa Connection strength after electron beam welding / MPa Example 1 103.9 100.8 Example 2 105.8 102.3 Example 3 97.6 95.4 Example 4 100.8 97.8 Example 5 85.1 46.8 Example 6 21.6 8.6 Example 7 10.3 5.3 Example 8 50.2 30.7 Example 9 65.3 35.9

[0095] As can be seen from Table 1, the welding method provided by the present invention realizes efficient welding of tantalum rings and titanium rings by adopting specially designed welding process control parameters. The welding strength of the titanium ring and the tantalum ring is ≥97MPa, which ensures the connection strength of the tantalum ring and the titanium ring during the subsequent electron beam welding of the flange and the pot-shaped target. After the flange and the pot-shaped target are welded, the connection strength of the tantalum ring and the titanium ring is ≥95MPa, which is beneficial to improving the utilization rate and service life of the pot-shaped target assembly.

[0096] The preferred embodiments of the present invention are described in detail above. However, the present invention is not limited to the specific details in the above embodiments. Within the technical concept of the present invention, a variety of simple modifications can be made to the technical solution of the present invention, and these simple modifications all belong to the protection scope of the present invention.

[0097] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, the present invention will not further describe various possible combinations.

[0098] In addition, various embodiments of the present invention may be arbitrarily combined, and as long as they do not violate the concept of the present invention, they should also be regarded as the contents disclosed by the present invention.

Claims

1. A welding method for a tantalum-titanium ring assembly, characterized in that: The welding method comprises: Assembling the tantalum ring and the titanium ring, and then performing hot isostatic pressing to obtain a tantalum-titanium ring assembly; Wherein, the assembly gap between the tantalum ring and the titanium ring in the assembly body obtained by the assembly is less than 0.2 mm; and the insulation temperature of the hot isostatic pressing is 600-800°C.

2. The welding method according to claim 1, characterized in that The roundness of the tantalum ring is less than 0.1 mm; Preferably, the roundness of the titanium ring is less than 0.1 mm.

3. The welding method according to claim 1 or 2, characterized in that: The tantalum ring and / or titanium ring is ultrasonically cleaned before assembly.

4. The welding method according to claim 3, characterized in that: The medium for ultrasonic cleaning includes ketone and / or alcohol.

5. The welding method according to claim 3 or 4, characterized in that: The ultrasonic cleaning is performed at least 3 times; Preferably, the time for a single ultrasonic cleaning is 10-15 minutes.

6. The welding method according to any one of claims 1 to 5, characterized in that: The holding pressure of the hot isostatic pressing is 80-100 MPa.

7. The welding method according to any one of claims 1 to 6, characterized in that: The holding time of the hot isostatic pressing is 2-3 hours.

8. The welding method according to any one of claims 1 to 7, characterized in that: The assembly obtained by the assembly is placed in a bag for degassing and then hot isostatic pressing; Preferably, the end point of the degassing is an absolute vacuum degree ≤ 0.02Pa.

9. A pot-shaped target assembly, characterized in that: The pot-shaped target assembly comprises a pot-shaped target and a flange, and the flange is a tantalum-titanium ring assembly obtained by the welding method according to any one of claims 1 to 8.

10. A method for welding a pot-shaped target assembly as claimed in claim 9, characterized in that: The welding method comprises: welding a pot-shaped target material and a flange by electron beam welding.