Semiconductor wastewater treatment test equipment

By designing a combined structure of scraper and screw in semiconductor wastewater treatment equipment, automatic cleaning of precipitated impurities is achieved, the problem of inconvenient manual cleaning is solved, and the efficiency and effect of wastewater treatment is improved.

CN119386699AInactive Publication Date: 2025-02-07CHUNAGLIAN PURIFICATION
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Patent Information

Application Number
CN202411696355.9
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-11-25
Publication Date
2025-02-07
Estimated Expiration
Not applicable · inactive patent

AI Technical Summary

Technical Problem

After long-term use of existing semiconductor wastewater treatment equipment, precipitates will accumulate at the bottom of the equipment, which will be inconvenient to clean manually, which will affect the subsequent treatment effect.

Method used

A semiconductor wastewater treatment test equipment is designed, using a combined structure of scraper and screw. The screw is driven by a motor to drive the scraper to move along the inner wall of the treatment box, automatically clean up precipitated impurities, and realize the self-function of the scraper through the driving mechanism. Clean up and reduce manual intervention.

Benefits of technology

Automatic cleaning of sediment impurities in the treatment box is realized, reducing the inconvenience of manual cleaning and improving the efficiency and effect of wastewater treatment.

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Abstract

The invention relates to the technical field of wastewater treatment, and particularly discloses semiconductor wastewater treatment test equipment which comprises a treatment box and a first motor, a water inlet pipe is arranged on the top surface of the treatment box; a first valve is arranged on the water outlet pipe; the first motor is mounted on the outer side wall of the treatment box, and the output end of the first motor is coaxially and fixedly connected with a lead screw; the outer side wall of the lead screw is sleeved with a scraping plate. The bottom face of the scraper makes contact with the inner bottom wall of the treatment box, and the scraper is in threaded transmission fit with the lead screw. A waste discharge port is formed in the inner side wall of the bottom end of the treatment box; a second valve is arranged in the waste discharge port; a liquid conveying assembly capable of conveying treatment liquid into the treatment box is arranged on the treatment box; the screw rod can be driven to rotate by starting the first motor, the scraper blade is promoted to move and scrape sediments, so that the sediment impurities are discharged from the waste discharge port, automatic cleaning of the sediment impurities in the treatment box is realized, and the trouble of inconvenience in manual cleaning is reduced.
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Description

Technical Field

[0001] The invention relates to the technical field of wastewater treatment, in particular to a semiconductor wastewater treatment test device. Background Art

[0002] With the continuous progress and development of science and technology and society, more and more semiconductors are being used. Semiconductors refer to materials whose electrical conductivity is between that of conductors and insulators at room temperature. Semiconductors are used in integrated circuits, consumer electronics, communication systems, photovoltaic power generation, lighting and other fields. Semiconductors will produce a certain amount of wastewater in the production process. In order to reduce the pollution of wastewater to the environment, the wastewater is usually treated before being discharged.

[0003] In the prior art, when treating wastewater, a treatment liquid is usually added to the wastewater to cause the treatment liquid to react with harmful substances in the wastewater to form a precipitate to achieve wastewater purification. However, after long-term use, the treatment equipment will cause sediment accumulation at the bottom thereof, which is difficult to clean manually, thereby affecting the subsequent wastewater treatment effect. Summary of the invention

[0004] The present application provides a semiconductor wastewater treatment test equipment, which can conveniently clean the sediment impurities on the bottom wall of the equipment, reducing the inconvenience of manual cleaning of impurities.

[0005] The present application provides a semiconductor wastewater treatment test equipment, which adopts the following technical solution: A semiconductor wastewater treatment test equipment comprises a treatment box and a first motor; a water inlet pipe is arranged on the top surface of the treatment box, and a water outlet pipe is arranged on the bottom surface of the treatment box; a first valve for controlling the opening and closing of the water outlet pipe is arranged on the water outlet pipe; the first motor is installed on the outer wall of the treatment box near the bottom, and a screw rod extending into the treatment box is coaxially fixedly connected to the output end of the first motor; a scraper for slidingly cooperating with the inner wall of the treatment box is sleeved on the outer wall of the screw rod; the bottom surface of the scraper is in contact with the inner bottom wall of the treatment box, and the scraper is in threaded transmission with the screw rod; a waste outlet is opened on the inner wall of the bottom end of the treatment box; a second valve for controlling the opening and closing of the waste outlet is arranged in the waste outlet; an infusion component for conveying treatment liquid into the treatment box is arranged on the treatment box.

[0006] By adopting the above technical scheme, when the wastewater is treated, the wastewater is transported to the treatment box through the water inlet pipe, and the infusion component transports the treatment liquid to the treatment box to mix with the wastewater, so that the harmful substances in the wastewater react with the treatment liquid to generate sediment to achieve wastewater treatment, and then the treated wastewater is discharged from the water outlet pipe. When a large amount of sediment impurities adhere to the bottom wall of the treatment box, the second valve is opened and the first motor is started to drive the screw rod to rotate, so that the scraper moves along the inner wall of the treatment box and scrapes off the sediment, and the sediment impurities are discharged out of the treatment box through the waste outlet, so as to realize automatic cleaning of sediment impurities in the treatment box and reduce the inconvenience of manual cleaning, so as to better treat the wastewater.

[0007] Preferably, a cleaning plate is slidably mounted on the outer wall of the scraper; a sliding groove is provided on the side wall of the cleaning plate close to the scraper; a plug plate extending into the sliding groove is fixedly connected to the outer wall of the scraper; the plug plate is slidably matched with the inner wall of the sliding groove, and the top surface of the plug plate is connected to the inner wall of the top end of the sliding groove through a first spring; and a driving mechanism that can drive the cleaning plate to move downward in the vertical direction is provided on the scraper.

[0008] By adopting the above technical solution, when the scraper cleans the sediment impurities on the bottom wall of the processing box, the cleaning plate is driven downward by the driving mechanism. During the downward movement, the cleaning plate cleans the sediment impurities adhering to the outer wall of the scraper, thereby reducing the possibility of the sediment impurities adhering to the scraper surface due to excessive viscosity. With the cooperation of the driving mechanism and the first spring, the cleaning plate can be reciprocated up and down to realize the self-cleaning work of the scraper, thereby ensuring the scraping effect of the scraper on the sediment impurities.

[0009] Preferably, a cavity is provided in the scraper; the driving mechanism includes a rotating shaft, a gear and a slide plate; the rotating shaft is rotatably connected to the inner wall of the cavity, and the end of the rotating shaft close to the cleaning plate is fixedly connected to a cam located outside the scraper; the top surface of the cleaning plate is fixedly connected to a connecting plate; the top surface of the connecting plate is an arc surface that can contact and cooperate with the cam; the gear is coaxially fixed to the outer wall of the rotating shaft located in the cavity; the slide plate is slidably connected to the inner wall of the cavity, and a rack meshing with the gear is fixedly connected to the side wall of the slide plate close to the gear, and the slide plate divides the internal space of the cavity into a first cavity away from the side where the rotating shaft is located and a second cavity close to the side where the rotating shaft is located; a blowing and suction assembly is provided on the outside of the processing box; the blowing and suction assembly can blow and suck gas into the first cavity to prompt the slide plate to move.

[0010] By adopting the above technical solution, the blowing and suction component first blows gas into the first cavity to cause the slide plate to move toward the direction close to the rotating axis. During the movement of the slide plate, the rotating axis will drive the cam to rotate and squeeze the connecting plate through the meshing cooperation of the gear and the rack, causing the cleaning plate to move down to clean the scraper surface. Then the blowing and suction component will extract the gas in the first cavity, the slide plate drives the rack to slide back and reset, the rotating axis drives the cam to swing back, and the cleaning plate drives the connecting plate to move up and reset under the elastic force of the first spring. The blowing and suction component reciprocates by blowing and sucking gas into the first cavity to realize the reciprocating up and down movement of the cleaning plate, so as to perform reciprocating cleaning work on the outer surface of the scraper.

[0011] Preferably, the blowing and suction assembly includes an air pump; the air pump is installed on the outer side wall of the processing box, the air pump input end is fixedly connected to an air inlet pipe connected to the external environment, and the air pump output end is fixedly connected to an air outlet pipe connected to the first cavity.

[0012] By adopting the above technical solution, the pump body can be started to conveniently blow and suck gas into the first cavity through the cooperation of the air inlet pipe and the air outlet pipe, so as to cause the slide plate to move along the inner wall of the cavity.

[0013] Preferably, a sealing groove is provided on the outer wall of the slide plate; and a sealing ring tightly attached to the inner wall of the cavity is fixedly connected to the inner wall of the sealing groove.

[0014] By adopting the above technical solution, the sealing ring arranged on the inner wall of the sealing groove ensures good sealing performance at the contact point between the outer peripheral surface of the slide plate and the inner wall of the cavity, so as to drive the slide plate to move when blowing or sucking gas into the first cavity.

[0015] Preferably, the infusion assembly includes a spray pipe and a pump body; the spray pipe is fixedly connected to the inner wall of the treatment box, and a nozzle connected to the spray pipe is fixedly connected to the outer wall of the spray pipe; the pump body is installed on the outer wall of the treatment box, the input end of the pump body is fixedly connected to a liquid inlet pipe, and the output end of the pump body is fixedly connected to a liquid outlet pipe connected to the inside of the spray pipe.

[0016] By adopting the above technical solution, the liquid inlet pipe is connected to the treatment liquid to be added, and the treatment liquid is sucked by starting the pump body. The treatment liquid is transported to the spray pipe through the liquid inlet pipe and the liquid outlet pipe and then sprayed out through the nozzle, thereby conveniently realizing the work of automatically adding the treatment liquid into the treatment box and reducing the trouble of manually adding the treatment liquid.

[0017] Preferably, a second motor is installed on the outer wall of the processing box; a stirring shaft extending into the processing box is coaxially fixedly connected to the output end of the second motor; and a stirring plate is fixedly connected to the outer wall of the stirring shaft.

[0018] By adopting the above technical solution, during the mixing process of wastewater and treatment liquid, the second motor is started to drive the stirring shaft and the stirring plate to rotate, so as to promote sufficient mixing of the wastewater and the treatment liquid and improve the treatment effect of the wastewater.

[0019] Preferably, a filter screen located at the top of the spray pipe is detachably mounted on the inner side wall of the treatment box.

[0020] By adopting the above technical solution, when wastewater enters the treatment box through the water inlet pipe, the filter screen arranged in the treatment box will filter and remove impurities from the wastewater, causing larger particles in the wastewater to be separated from the liquid and blocked on the surface of the filter screen.

[0021] Preferably, a sleeve is vertically fixed to the top surface of the filter screen; a slide rod extending straight from the top of the sleeve is vertically connected to the inner wall at the bottom end of the sleeve via a second spring; the slide rod is slidably matched with the inner wall of the sleeve, and a slow flow plate is fixed to the top of the slide rod.

[0022] By adopting the above technical solution, the wastewater entering the treatment box from the water inlet pipe will fall on the slow flow plate. After being impacted by the water flow, the slow flow plate will drive the sliding rod to move down along the inner wall of the sleeve and compress the second spring, thereby converting the kinetic energy of the water flow impact into the elastic potential energy of the second spring, buffering the impact force of the water flow and reducing the possibility of damage to the filter screen due to excessive impact force of the wastewater.

[0023] Preferably, a plurality of diversion holes are provided on the slow flow plate.

[0024] By adopting the above technical solution, when wastewater impacts the slow flow plate, the diversion holes arranged on the slow flow plate will divert and evacuate the wastewater, causing the wastewater to fall in multiple streams, further reducing the impact force of the wastewater on the filter screen.

[0025] In summary, this application has the following beneficial effects: 1. When there are a lot of sediment impurities adhering to the bottom wall of the treatment box, open the second valve and start the first motor to drive the screw to rotate, so that the scraper moves along the inner wall of the treatment box and scrapes off the sediment, so that the sediment impurities are discharged out of the treatment box through the waste outlet, so as to realize the automatic cleaning of the sediment impurities in the treatment box, reduce the inconvenience of manual cleaning, and better treat the wastewater; 2. When the scraper cleans the sediment impurities on the bottom wall of the treatment box, the driving mechanism drives the cleaning plate to move downward to clean the sediment impurities adhering to the outer wall of the scraper. The driving mechanism and the first spring cooperate to realize the reciprocating up and down movement of the cleaning plate, so as to realize the self-cleaning work of the scraper and ensure the scraping effect of the scraper on the sediment impurities; 3. During the mixing process of the wastewater and the treatment liquid, the second motor is started to drive the stirring shaft to rotate, so that the stirring plate can fully stir the wastewater and the treatment liquid, so that the wastewater can be fully mixed with the treatment liquid, thereby improving the wastewater treatment effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 It is a schematic diagram of the structure of a semiconductor wastewater treatment test equipment; Figure 2 It is a schematic diagram of the internal structure of the processing box in this application; Figure 3 It is a schematic diagram of the matching structure of the sleeve, the slide bar and the slow flow plate in this application; Figure 4 It is a schematic diagram of the matching structure of the scraper, cleaning plate and driving mechanism in this application; Figure 5 It is a schematic diagram of the matching structure of the scraper and a pair of cleaning plates in the present application; Figure 6 It is a schematic diagram of the internal structure of the cavity of the scraper in this application; Figure 7 It is a schematic diagram of the matching structure of the slide plate and the rack in this application.

[0027] Description of the reference numerals: 1. treatment box; 11. water inlet pipe; 12. water outlet pipe; 13. waste outlet; 2. first motor; 21. screw rod; 22. scraper; 221. cavity; 23. cleaning plate; 231. chute; 24. plug plate; 25. first spring; 3. infusion assembly; 31. spray pipe; 311. nozzle; 32. pump body; 321. liquid inlet pipe; 322. liquid outlet pipe; 4. driving mechanism; 41. rotary Rotating shaft; 42, gear; 43, slide plate; 431, sealing groove; 432, sealing ring; 44, cam; 45, connecting plate; 46, rack; 47, blowing and suction assembly; 471, air pump; 472, air inlet pipe; 473, air outlet pipe; 5, second motor; 51, stirring shaft; 52, stirring plate; 6, filter screen; 61, sleeve; 62, second spring; 63, slide rod; 64, slow flow plate; 641, diversion hole. DETAILED DESCRIPTION

[0028] The present invention will be further described in detail below with reference to the accompanying drawings. The same components are denoted by the same reference numerals. It should be noted that the terms "front", "rear", "left", "right", "upper", "lower", "bottom" and "top" used in the following description refer to directions in the accompanying drawings, and the terms "inside" and "outside" refer to directions toward or away from the geometric center of a specific component, respectively.

[0029] The present invention discloses a semiconductor wastewater treatment test equipment, such as Figure 1 , Figure 2 and Figure 3 As shown, it includes a treatment box 1, a filter screen 6 and a slow flow plate 64. The top surface of the treatment box 1 is fixedly connected with an inlet pipe 11 connected to the inside of the treatment box 1. The filter screen 6 is detachably installed on the inner wall of the treatment box 1 near the top. A sleeve 61 is vertically fixedly connected to the position of the top surface of the filter screen 6 corresponding to the inlet pipe 11. A slide rod 63 is vertically connected to the inner wall of the bottom end of the sleeve 61 through a second spring 62. The outer wall of the slide rod 63 slides with the inner wall of the sleeve 61. The top of the slide rod 63 extends to the top of the sleeve 61. The slow flow plate 64 is fixedly connected to the end face of the slide rod 63 extending to the top of the sleeve 61. The slow flow plate 64 is in the shape of a conical disk, and a plurality of diversion holes 641 vertically penetrating the slow flow plate 64 are opened on the slow flow plate 64.

[0030] When wastewater enters the treatment box 1 through the water inlet pipe 11, the wastewater will first fall onto the slow flow plate 64 and then flow onto the surface of the filter screen 6. The filter screen 6 can perform preliminary impurity removal and filtration on the wastewater to remove large particles of impurities in the wastewater. When the wastewater hits the slow flow plate 64, the diversion hole 641 diverts the wastewater. The impact force of the water flow will cause the slow flow plate 64 to drive the slide bar 63 to move downward and compress the second spring 62, converting the impact force of the wastewater into elastic potential energy of the second spring 62. The wastewater is buffered by the cooperation of the diversion hole 641 and the second spring 62, thereby reducing the possibility of damage to the filter screen 6 caused by excessive impact of the wastewater.

[0031] like Figure 1 and Figure 2 As shown, the treatment box 1 is provided with an infusion component 3 that can transport the treatment liquid into the treatment box 1; the infusion component 3 includes a spray pipe 31 and a pump body 32, the spray pipe 31 is horizontally installed on the inner wall of the treatment box 1 near the bottom surface of the filter screen 6, and a plurality of nozzles 311 connected to the spray pipe 31 are fixedly connected to the spray pipe 31, and the plurality of nozzles 311 are evenly arranged along the length direction of the spray pipe 31, and the pump body 32 is installed on the outer wall of the treatment box 1, and the input end of the pump body 32 is fixedly connected to the liquid inlet pipe 321, and the output end of the pump body 32 is fixedly connected to the liquid outlet pipe 322, and the end of the liquid outlet pipe 322 away from the pump body 32 is fixedly connected to the end surface of the spray pipe 31 and is connected to the inside of the spray pipe 31, and the inner wall of the bottom surface of the treatment box 1 is fixedly connected to the water outlet pipe 12 connected to the inside of the treatment box 1, and the water outlet pipe 12 is provided with a first valve for controlling the opening and closing of the water outlet pipe 12.

[0032] The filtered wastewater will fall to the bottom of the treatment box 1. At this time, the pump body 32 is started to transport the treatment liquid to be added to the spray pipe 31 through the liquid inlet pipe 321 and the liquid outlet pipe 322. The treatment liquid is then sprayed out by the nozzle 311 to mix with the wastewater, so that the treatment liquid reacts with the harmful substances in the wastewater to form a precipitate to achieve wastewater purification. After the wastewater treatment is completed, the first valve is opened to discharge the wastewater.

[0033] like Figure 1 and Figure 2As shown, a second motor 5 is horizontally installed on the outer wall of the processing box 1. The second motor 5 is a brake motor. The output end of the second motor 5 is coaxially fixed with a stirring shaft 51 extending into the processing box 1. The stirring shaft 51 rotates with the inner wall of the processing box 1, and a pair of stirring plates 52 are fixed to the outer wall of the stirring shaft 51.

[0034] During the mixing process of the wastewater and the treatment liquid, the second motor 5 is started to drive the stirring shaft 51 to rotate, so that the stirring plate 52 can fully stir the wastewater and the treatment liquid, so that the wastewater can be fully mixed with the treatment liquid, thereby improving the wastewater treatment effect.

[0035] like Figure 1 and Figure 2 As shown, a first motor 2 is horizontally installed on the outer wall of the treatment box 1 near the bottom end, and a screw rod 21 extending into the treatment box 1 is coaxially fixed to the output end of the first motor 2. The screw rod 21 rotates with the inner wall of the treatment box 1, and a scraper 22 threadedly matched with the screw rod 21 is sleeved on the outer wall of the screw rod 21. The side wall of the scraper 22 slides with the side wall of the treatment box 1, and the bottom surface of the scraper 22 contacts the inner bottom wall of the treatment box 1. A pair of waste outlets 13 are opened on the inner wall of the bottom end of the treatment box 1, and the pair of waste outlets 13 are respectively located on both sides of the water outlet pipe 12, and a second valve for controlling the opening and closing of the waste outlet 13 is provided on the inner wall of each waste outlet 13.

[0036] When it is necessary to clean the sediment impurities accumulated and adhered to the bottom wall of the processing box 1, the second valve is opened and the first motor 2 is started to drive the screw 21 to rotate forward and reverse, so that the scraper 22 moves back and forth along the inner wall of the processing box 1 to scrape the impurities adhered to the bottom wall of the processing box 1, and the sediment impurities are discharged through the waste outlet 13, thereby realizing automatic cleaning of the sediment impurities and reducing the trouble of manual cleaning.

[0037] like Figure 2 , Figure 4 and Figure 5 As shown, cleaning plates 23 are vertically slidably installed on the two outer side walls of the scraper 22 away from each other, and sliding grooves 231 are provided on the side walls of the two cleaning plates 23 close to the scraper 22. The scraper 22 is fixed with a pair of plug plates 24 that extend into the two sliding grooves 231 respectively on the outer side walls close to the two cleaning plates 23. The two plug plates 24 are respectively slidably matched with the inner side walls of the two sliding grooves 231. The top surface of the plug plate 24 is connected to the inner side wall of the top end of the sliding groove 231 through a plurality of first springs 25. A driving mechanism 4 is also provided on the scraper 22, and the driving mechanism 4 can drive the two cleaning plates 23 to move downward in the vertical direction.

[0038] When the scraper 22 is scraping off the sediment impurities, the driving mechanism 4 can drive the cleaning plate 23 to move downward to clean the sediment impurities adhering to the outer wall of the scraper 22. The driving mechanism 4 and the first spring 25 cooperate to conveniently realize the reciprocating up and down movement of the cleaning plate 23, so as to realize the self-cleaning work of the scraper 22, thereby ensuring the scraping effect of the scraper 22 on the sediment impurities.

[0039] like Figure 2 , Figure 4 and Figure 6 As shown, a cavity 221 is provided inside the scraper 22 near the top, and the driving mechanism 4 includes a rotating shaft 41, a gear 42, a slide plate 43, a rack 46 and a blowing and sucking assembly 47. The rotating shaft 41 is horizontally rotatably connected to the inner wall of the cavity 221, and both ends of the rotating shaft 41 extend to the outside of the scraper 22. Both ends of the rotating shaft 41 are fixedly connected to cams 44 located at the top of the cleaning plate 23. The top surfaces of the two cleaning plates 23 are fixedly connected to connecting plates 45. The top surfaces of the connecting plates 45 are arc surfaces that contact and cooperate with the cams 44. The gear 42 is coaxially fixed to the rotating shaft 41. The rotating shaft 41 is located on the outer wall of the cavity 221, and the slide plate 43 is slidably connected to the inner wall of the cavity 221. The slide plate 43 divides the internal space of the cavity 221 into a first cavity away from the side where the rotating shaft 41 is located and a second cavity close to the side where the rotating shaft 41 is located. The rack 46 is fixed to the side wall of the slide plate 43 close to the gear 42, and the rack 46 is meshed with the gear 42. The rack 46 slides with the inner wall of the cavity 221; the blowing and suction component 47 is arranged outside the processing box 1, and the blowing and suction component 47 can blow and suck gas into the first cavity.

[0040] The blowing and suction component 47 first blows gas into the first cavity to cause the slide plate 43 to move toward the direction close to the rotating shaft 41. Under the meshing cooperation of the gear 42 and the rack 46, the rotating shaft 41 will drive the cam 44 to rotate and squeeze the connecting plate 45, causing the cleaning plate 23 to move down to clean the surface of the scraper 22. Then the blowing and suction component 47 extracts the gas in the first cavity, and the slide plate 43 drives the rack 46 to slide back and reset, and the rotating shaft 41 drives the cam 44 to swing back. The cleaning plate 23 drives the connecting plate 45 to move up and reset under the elastic force of the first spring 25. The blowing and suction component 47 reciprocates to blow and suck gas into the first cavity to realize the reciprocating up and down movement of the cleaning plate 23, so as to perform reciprocating cleaning work on the outer surface of the scraper 22.

[0041] like Figure 2 , Figure 4 and Figure 6 As shown, the blowing and suction assembly 47 includes an air pump 471, an air inlet pipe 472 and an air outlet pipe 473. The air pump 471 is installed on the outer wall of the processing box 1, one end of the air inlet pipe 472 is fixedly connected to the input end of the air pump 471, one end of the air outlet pipe 473 is fixedly connected to the output end of the air pump 471, and the other end of the air outlet pipe 473 passes through the side wall of the processing box 1 and is fixedly connected to the top surface of the scraper 22 to communicate with the first cavity.

[0042] Starting the air pump 471 can conveniently blow and suck gas into the first cavity through the cooperation of the air inlet pipe 472 and the air outlet pipe 473 , so as to enable the slide plate 43 to move along the inner wall of the cavity 221 .

[0043] like Figure 6 and Figure 7 As shown, a sealing groove 431 is provided on the outer peripheral surface of the slide plate 43 , and a sealing ring 432 tightly attached to the inner wall of the cavity 221 is fixedly connected to the inner wall of the sealing groove 431 .

[0044] The provision of the sealing ring 432 ensures good sealing performance at the contact portion between the outer peripheral surface of the slide plate 43 and the inner wall of the cavity 221 , thereby ensuring the stability of the movement of the slide plate 43 driven by wind.

[0045] Working principle: When treating wastewater, the wastewater is introduced into the treatment box 1 through the water inlet pipe 11. The wastewater entering the treatment box 1 will first fall on the slow flow plate 64. After being impacted by the water flow, the slow flow plate 64 will drive the slide bar 63 to move downward to compress the second spring 62, and convert the impact kinetic energy of the wastewater into the elastic potential energy of the second spring 62, thereby reducing the impact force of the wastewater when it falls and protecting the filter screen 6. When the wastewater flows through the filter screen 6, the filter screen 6 will filter and remove impurities from the wastewater, remove large particles of impurities in the wastewater, and the filtered wastewater will fall to the bottom of the treatment box 1. Then, the pump body 32 is started to transport the treatment liquid to be added into the spray pipe 31, and the nozzle 311 sprays the treatment liquid to mix with the wastewater. In the process of mixing the wastewater and the treatment liquid, the second motor 5 is started to drive the stirring shaft 51 to rotate, so that the stirring plate 52 can fully stir the wastewater and the treatment liquid, so that the wastewater and the treatment liquid are fully mixed, and the treatment liquid is prompted to fully react with the harmful substances in the wastewater to form a precipitate, thereby achieving purification of the wastewater. After the wastewater treatment is completed, the first valve is opened so that the treated wastewater can be discharged through the outlet pipe 12; When it is necessary to clean the sediment impurities accumulated on the bottom wall of the treatment box 1, the second valve is opened and the first motor 2 is started to drive the screw 21 to rotate forward and reversely, so that the scraper 22 moves back and forth along the inner wall of the treatment box 1 to scrape the impurities adhered to the bottom wall of the treatment box 1 and discharge the sediment impurities through the waste outlet 13, thereby realizing automatic cleaning of the sediment impurities; When the scraper 22 cleans the sediment impurities on the bottom wall of the treatment box 1, start the air pump 471 to blow gas into the first cavity first, prompting the slide plate 43 to move toward the direction close to the rotating shaft 41. Under the meshing cooperation of the gear 42 and the rack 46, the rotating shaft 41 will drive the cam 44 to squeeze the connecting plate 45, prompting the cleaning plate 23 to move down to clean the surface of the scraper 22. Then, the gas in the first cavity is extracted through the air pump 471, and the slide plate 43 drives the rack 46 to slide back and reset, and the rotating shaft 41 drives the cam 44 to swing back. The cleaning plate 23 drives the connecting plate 45 to move up and reset under the elastic force of the first spring 25. When the air pump 471 blows and sucks gas back and forth into the first cavity, the cleaning plate 23 will move up and down to clean the scraper 22 back and forth, thereby reducing the possibility of sediment impurities adhering to the outer wall of the scraper 22 and ensuring the scraping effect of the scraper 22 on the sediment impurities.

[0046] The above are all preferred embodiments of the present application, and the protection scope of the present application is not limited thereto. Therefore, any equivalent changes made according to the structure, shape, and principle of the present application should be included in the protection scope of the present application.

Claims

1. A semiconductor wastewater treatment test equipment, characterized by: The invention comprises a treatment box (1) and a first motor (2); the top surface of the treatment box (1) is provided with a water inlet pipe (11), and the bottom surface of the treatment box (1) is provided with a water outlet pipe (12); the water outlet pipe (12) is provided with a first valve for controlling the opening and closing of the water outlet pipe (12); the first motor (2) is mounted on an outer wall of the treatment box (1) near the bottom, and a screw rod (21) extending into the treatment box (1) is coaxially fixedly connected to the output end of the first motor (2); the outer wall of the screw rod (21) is The upper sleeve is provided with a scraper (22) which is slidably matched with the inner wall of the treatment box (1); the bottom surface of the scraper (22) contacts the inner bottom wall of the treatment box (1), and the scraper (22) is threadedly matched with the screw rod (21); a waste discharge port (13) is opened on the inner wall of the bottom end of the treatment box (1); a second valve for controlling the opening and closing of the waste discharge port (13) is arranged in the waste discharge port (13); and an infusion assembly (3) which can transport the treatment liquid into the treatment box (1) is arranged on the treatment box (1).

2. A semiconductor wastewater treatment test equipment according to claim 1, characterized in that: A cleaning plate (23) is slidably mounted on the outer wall of the scraper (22); a sliding groove (231) is provided on the side wall of the cleaning plate (23) close to the scraper (22); a plug plate (24) is fixedly connected to the outer wall of the scraper (22) and extends into the sliding groove (231); the plug plate (24) is slidably matched with the inner wall of the sliding groove (231), and the top surface of the plug plate (24) is connected to the inner wall of the top end of the sliding groove (231) through a first spring (25); and a driving mechanism (4) is provided on the scraper (22) for driving the cleaning plate (23) to move downward in a vertical direction.

3. A semiconductor wastewater treatment test equipment according to claim 2, characterized in that: The scraper (22) is provided with a cavity (221); the driving mechanism (4) comprises a rotating shaft (41), a gear (42) and a slide plate (43); the rotating shaft (41) is rotatably connected to the inner wall of the cavity (221); one end of the rotating shaft (41) close to the cleaning plate (23) is fixedly connected to a cam (44) located outside the scraper (22); a connecting plate (45) is fixedly connected to the top surface of the cleaning plate (23); the top surface of the connecting plate (45) is an arc surface that can contact and cooperate with the cam (44); the gear (42) is coaxially fixedly connected to the rotating shaft (41) Located on the outer wall of the cavity (221); the slide plate (43) is slidably connected to the inner wall of the cavity (221); a rack (46) meshing with the gear (42) is fixedly connected to the side wall of the slide plate (43) close to the gear (42); the slide plate (43) divides the internal space of the cavity (221) into a first cavity on the side away from the rotating shaft (41) and a second cavity on the side close to the rotating shaft (41); a blowing and suction component (47) is arranged outside the processing box (1); the blowing and suction component (47) can blow and suck gas into the first cavity to cause the slide plate (43) to move.

4. A semiconductor wastewater treatment test equipment according to claim 3, characterized in that: The blowing and suction assembly (47) comprises an air pump (471); the air pump (471) is installed on the outer wall of the processing box (1); the input end of the air pump (471) is fixedly connected to an air inlet pipe (472) connected to the external environment; the output end of the air pump (471) is fixedly connected to an air outlet pipe (473) connected to the first cavity.

5. A semiconductor wastewater treatment test equipment according to claim 3, characterized in that: A sealing groove (431) is provided on the outer wall of the slide plate (43); and a sealing ring (432) is fixedly connected to the inner wall of the sealing groove (431) and is in close contact with the inner wall of the cavity (221).

6. A semiconductor wastewater treatment test equipment according to claim 1, characterized in that: The infusion assembly (3) comprises a spray pipe (31) and a pump body (32); the spray pipe (31) is fixedly connected to the inner wall of the treatment box (1), and a nozzle (311) connected to the spray pipe (31) is fixedly connected to the outer wall of the spray pipe (31); the pump body (32) is installed on the outer wall of the treatment box (1), the input end of the pump body (32) is fixedly connected to a liquid inlet pipe (321), and the output end of the pump body (32) is fixedly connected to a liquid outlet pipe (322) connected to the inside of the spray pipe (31).

7. A semiconductor wastewater treatment test equipment according to claim 6, characterized in that: A second motor (5) is mounted on the outer wall of the processing box (1); a stirring shaft (51) extending into the processing box (1) is coaxially fixedly connected to the output end of the second motor (5); and a stirring plate (52) is fixedly connected to the outer wall of the stirring shaft (51).

8. The semiconductor wastewater treatment test equipment according to claim 6, characterized in that: A filter screen (6) located at the top of the spray pipe (31) is detachably mounted on the inner side wall of the treatment box (1).

9. A semiconductor wastewater treatment test equipment according to claim 8, characterized in that: The top surface of the filter screen (6) is vertically fixedly connected with a sleeve (61); the inner side wall of the bottom end of the sleeve (61) is vertically connected with a slide bar (63) extending from the top of the sleeve (61) via a second spring (62); the slide bar (63) is slidably matched with the inner side wall of the sleeve (61), and a slow flow plate (64) is fixedly connected to the top of the slide bar (63).

10. A semiconductor wastewater treatment test equipment according to claim 9, characterized in that: The slow flow plate (64) is provided with a plurality of flow diversion holes (641).

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