Hydraulic control cleaning system and cleaning machine

Abstract

The invention provides a hydraulic control cleaning system and a cleaning machine, and belongs to the field of silicon wafer production and processing.The hydraulic control cleaning system comprises a multi-stage water tank, a drying tank, a clear water supply liquid path, a heating water tank, a cleaning liquid supply liquid path, a drainage flow path and a water tank self-circulation flow path; the clear water supply liquid path provides hot water and cold water with the adjustable ratio, the cleaning liquid supply liquid path provides cleaning liquid of different types and proportions, and the water tank self-circulation flow path communicates with the corresponding washing tank and is used for circularly stirring the cleaning liquid in the washing tank. The silicon wafer cleaning device integrates the functions of soaking, cleaning with different detergents, temperature control, liquid supplement, stepped overflow, self-circulation and partial circulation of silicon wafer cleaning and drying, realizes segmented and efficient cleaning, and is convenient to popularize and apply in the fields of silicon wafer cleaning and the like.

Description

Technical Field

[0001] The invention belongs to the field of silicon wafer production and processing, and specifically relates to a liquid-controlled cleaning system and a cleaning machine. Background Art

[0002] During the silicon wafer preparation process, silicon mud, silicon powder and other impurities will remain on the outer surface of the cut and separated silicon wafers, which need to be cleaned. Therefore, it is common to add cleaning liquid to the cleaning tank for cleaning. However, the best cleaning effect of the cleaning liquid corresponds to a certain temperature range, and the existing cleaning equipment cannot achieve temperature control or the temperature control effect is poor.

[0003] Secondly, each cleaning tank of the existing cleaning equipment adopts the same cleaning method, which does not match the current demand for efficient cleaning. Summary of the invention

[0004] In order to overcome the deficiencies of the prior art, an object of the present invention is to provide a hydraulically controlled cleaning system and a cleaning machine, which can solve the above-mentioned problems.

[0005] Design principle: The hydraulic control system integrates temperature control, liquid replenishment, cleaning tanks with different cleaning agents, etc. to achieve segmented and efficient cleaning.

[0006] A liquid-controlled cleaning system comprises a multi-stage water tank, a drying tank, a clean water supply liquid circuit, a heating water tank, a cleaning liquid supply liquid circuit, a drainage flow circuit and a water tank self-circulation flow circuit; the multi-stage water tank comprises a soaking tank, a plurality of cleaning tanks and a plurality of washing tanks arranged side by side, and is used for multi-stage cleaning of products; the drying tank is arranged downstream of the terminal water tank of the multi-stage water tank, and dries the cleaned products; the clean water supply liquid circuit is arranged between the multi-stage water tank and the heating water tank, and is used for providing hot water and cold water with adjustable ratios to the multi-stage water tank; the cleaning liquid supply liquid circuit is used for providing cleaning liquids of different types and ratios to the washing tank and the plurality of washing tanks; the drainage flow circuit is connected to each water tank of the multi-stage water tank in a controllable manner; the water tank self-circulation flow circuit is connected to the corresponding washing tank, and is used for circulating and stirring the washing liquid in the washing tank.

[0007] Optionally, a stepped overflow design from downstream to upstream of process cleaning is adopted between adjacent water tanks with the same type of cleaning liquid, and the top of the partition between adjacent water tanks becomes lower step by step.

[0008] Optionally, the clean water supply liquid path includes a clean water supply main pipe, a hot water supply flow path connected to each water tank, and a cold water supply flow path, and the heating water tank is arranged upstream of the hot water supply flow path.

[0009] Optionally, the cleaning liquid supply circuit includes a cleaning liquid supply station, multiple cleaning liquid pipes for conveying different types of cleaning liquids, and a liquid replenishment control valve; the cleaning liquid supply station includes different types of washing liquid tanks, and the cleaning liquid pipes are controllably connected to corresponding cleaning tanks and washing tanks under the control of the liquid replenishment control valve.

[0010] Optionally, the drainage flow path includes a drainage manifold and a drainage main pipe. A drainage manifold controlled by a drainage control valve is arranged at the lower part of each water tank end plate of the multi-stage water tank, and all drainage manifolds are connected to the drainage main pipe.

[0011] Optionally, the water tank self-circulation flow path includes a self-circulation pump and a self-circulation pipe valve, and the self-circulation pipe valve is connected to the corresponding washing tank.

[0012] Optionally, the hydraulically controlled cleaning system also includes a preheating unit, which includes a preheating water inlet main pipe, a preheating water inlet transfer pipe, a heating rod, a heating barrel, a preheating connecting pipe, a preheating water outlet transfer pipe, a preheating water outlet main pipe and a preheating temperature sensor; multiple heating barrels are connected via multiple preheating connecting pipes, and each heating barrel is provided with a heating rod and a preheating temperature sensor; the preheating water inlet main pipe is connected to the lower part of the heating barrel at the upstream end via the preheating water inlet transfer pipe, and the preheating water outlet main pipe is connected to the upper part of the heating barrel at the downstream end via the preheating water outlet transfer pipe.

[0013] Optionally, the hydraulically controlled cleaning system further comprises a plurality of circulation tanks, which are used for circulating the cleaning liquid in the immersion tank and the plurality of cleaning tanks after defoaming, and the circulation supply direction includes a water tank of the same property cleaning liquid, a sheet inserting machine or a degumming machine at an upstream workstation.

[0014] Optionally, the liquid-controlled cleaning system further comprises a heat exchanger, which is disposed between the circulation tank and a water tank that circulates and supplies cleaning fluid of the same properties, and is used for heating the branch direct supply liquid circuit of the clean water supply liquid circuit.

[0015] The present invention also provides a cleaning machine, which adopts the above-mentioned liquid-controlled cleaning system.

[0016] Compared with the prior art, the beneficial effects of the present invention are: the liquid-controlled cleaning system of the present application integrates the silicon wafer cleaning and drying functions of immersion, cleaning with different detergents, temperature control, liquid replenishment, step overflow, self-circulation and partial circulation, realizes segmented and efficient cleaning, and is easy to promote and apply in the fields of silicon wafer cleaning and so on. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1-Figure 3 Schematic diagrams of different viewing angles of the liquid-controlled cleaning system of the present invention; Figure 4 A schematic diagram of a water tank self-circulating flow path connected to a washing tank; Figure 5 Schematic diagram of the preheating unit.

[0018] In the figure, 100, multi-stage water tank; 110, soaking tank; 120, cleaning tank; 130, washing tank; 200, drying tank; 300, clean water supply liquid path; 310, clean water supply main pipe; 320, hot water supply flow path; 330, cold water supply flow path; 340, branch direct supply liquid path; 400, heating water tank; 500, cleaning liquid supply circuit; 510, cleaning liquid supply station; 520, cleaning liquid pipe; 600, drainage flow path; 610, drainage manifold; 620, drainage main pipe; 700, self-circulating flow path of water tank; 710, self-circulating pump; 720, self-circulating pipe valve; 721, self-circulating water outlet pipe valve; 722, self-circulating water inlet pipe valve; 800, preheating unit; 810, preheating water inlet main pipe; 820, preheating water inlet transfer pipe; 830, heating rod; 840, heating barrel; 850, preheating connecting pipe; 860, preheating water outlet transfer pipe; 870, preheating water outlet main pipe; 880, preheating temperature sensor; 890, preheating fixing frame; 900, circulation tank; 1000. Heat exchanger; 1100. Drain pump. DETAILED DESCRIPTION

[0019] In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the technical solution in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0020] A hydraulically controlled cleaning system, see Figure 1-Figure 5 The liquid-controlled cleaning system includes a multi-stage water tank 100, a drying tank 200, a clean water supply liquid path 300, a heating water tank 400, a cleaning liquid supply liquid path 500, a drainage flow path 600 and a water tank self-circulation flow path 700.

[0021] Connection relationship: The multi-stage water tank 100 includes a soaking tank 110, a plurality of cleaning tanks 120 and a plurality of washing tanks 130 arranged side by side, which are used for multi-stage cleaning of products; the drying tank 200 is arranged downstream of the terminal tank of the multi-stage water tank 100 to dry the washed products. The clean water supply liquid path 300 is arranged between the multi-stage water tank 100 and the heating water tank 400, and is used to provide hot water and cold water with adjustable ratios to the multi-stage water tank 100. The cleaning liquid supply liquid path 500 is used to provide cleaning liquids of different types and proportions to the cleaning tank 120 and the plurality of washing tanks 130. The drainage flow path 600 is connected to each multi-stage water tank 100 in a controllable manner. The water tank self-circulation flow path 700 is connected to the corresponding washing tank 130, which is used for circulating and stirring the washing liquid in the washing tank 130.

[0022] The plurality of washing tanks 130 are used to provide the same or different cleaning liquids, and the composition and proportion of the cleaning liquids are controllably provided by the cleaning liquid supply circuit 500 .

[0023] Furthermore, a stepped overflow design from downstream to upstream of process cleaning is adopted between adjacent water tanks with the same type of cleaning liquid, and the top of the partition between adjacent water tanks becomes lower step by step.

[0024] A spray pipe is arranged on the top side of some water tanks to blow toward the other side with overflow function.

[0025] Among them, the drying tank 200 is equipped with a heating unit, such as a heating tube, a circulating fan, etc. Two adjacent tanks can share a sliding cover plate. The bottom surface of the sliding cover plate is provided with corresponding cover plate air inlets and cover plate air outlets corresponding to the circulating air outlets of the lower tank body to improve the overall circulation smoothness of the drying hot air and the drying effect on the silicon wafers.

[0026] The clean water supply path 300 includes a clean water supply main pipe 310 , a hot water supply path 320 and a cold water supply path 330 connected to each water tank, and the heating water tank 400 is disposed upstream of the hot water supply path 320 .

[0027] Among them, the cleaning liquid supply circuit 500 includes a cleaning liquid supply station 510, multiple cleaning liquid pipes 520 for conveying different types of cleaning liquids, and a liquid replenishment control valve; the cleaning liquid supply station 510 includes different types of washing liquid tanks, and the cleaning liquid pipe 520 is controllably connected to the corresponding cleaning tank 120 and the washing tank 130 under the control of the liquid replenishment control valve.

[0028] In a specific example, the cleaning liquid supply station 510 includes four cleaning liquid tanks for providing Class A cleaning liquid, Class B cleaning liquid, Class C liquid and Class D liquid, each of which is connected to the corresponding cleaning tank 120 and the washing tank 130 through a cleaning liquid pipe 520 and a liquid replenishment control valve, wherein the cleaning tank 120 is controllably connected to the cleaning liquid tank of Class A cleaning liquid or Class B cleaning liquid, and the washing tank 130 is controllably connected to the cleaning liquid tanks of Class C liquid and Class D liquid. For example, the cleaning liquid of Class A, Class B, Class C and Class D can be conventional cleaning liquids, but their matching methods and concentrations are different, such as the cleaning liquid of Class A and Class C are both alkaline liquids, but the concentration of Class C is higher or lower than that of Class A, and the cleaning liquid of Class B and Class D are both acidic liquids, but the acidity of Class D is higher or lower than that of Class B.

[0029] The drainage flow path 600 includes a drainage manifold 610 and a drainage main pipe 620 . A drainage manifold 610 controlled by a drainage control valve is arranged at the lower part of each sink end plate of the multi-stage sink 100 , and all drainage manifolds 610 are connected to the drainage main pipe 620 .

[0030] Among them, see Figure 4 The water tank self-circulation flow path 700 includes a self-circulation pump 710 and a self-circulation pipe valve 720, and the self-circulation pipe valve 720 is connected to the corresponding washing tank 130. The self-circulation pipe valve 720 includes a self-circulation water outlet pipe valve 721 and a self-circulation water inlet pipe valve 722. One end of the washing tank 130 is connected to the self-circulation water outlet pipe valve 721, and the other end of the self-circulation water outlet pipe valve 721 is connected to the self-circulation pump 710. The water outlet end of the self-circulation pump 710 is connected to the water inlet end of the self-circulation water inlet pipe valve 722, and the self-circulation water inlet pipe valve 722 is connected to the other end face of the washing tank 130.

[0031] Furthermore, the hydraulically controlled cleaning system further comprises a preheating unit 800, see Figure 5 The preheating unit 800 includes a preheating water inlet main pipe 810, a preheating water inlet transfer pipe 820, a heating rod 830, a heating barrel 840, a preheating connecting pipe 850, a preheating water outlet transfer pipe 860, a preheating water outlet main pipe 870 and a preheating temperature sensor 880.

[0032] Specifically, the plurality of heating barrels 840 are connected through the plurality of preheating connecting pipes 850, and each heating barrel 840 is provided with a heating rod 830 and a preheating temperature sensor 880. The preheating water inlet main pipe 810 is connected to the lower part of the heating barrel 840 at the upstream end through the preheating water inlet transfer pipe 820, and the preheating water outlet main pipe 870 is connected to the upper part of the heating barrel 840 at the downstream end through the preheating water outlet transfer pipe 860.

[0033] In a specific example, a plurality of the heating barrels 840 are arranged side by side at equal intervals, and a plurality of the preheating connecting pipes 850 are obliquely connected between the upper portion of the previous heating barrel 840 and the lower portion of the next or multiple downstream heating barrels 840, such as two heating barrels 840. In the figure, two preheating water inlet transfer pipes 820 are arranged on the preheating water inlet main pipe 810, and the outlet ends of the two preheating water inlet transfer pipes 820 are connected to the lower portions of the corresponding first two heating barrels 840, and two preheating water outlet transfer pipes 860 are arranged on the preheating water outlet main pipe 870, and the water inlet ends of the preheating water outlet transfer pipes 860 are connected to the upper portions of the two heating barrels 840 at the downstream end. The upper end of the first preheating connecting tube 850 is connected to the upper part of the first heating barrel 840, the upper end of the first preheating connecting tube 850 is obliquely connected to the lower part of the third heating barrel 840, and the upper end of the second preheating connecting tube 850 is obliquely connected to the lower part of the fourth heating barrel 840, arranged in sequence.

[0034] Furthermore, the preheating unit 800 also includes a preheating fixing frame 890, and the multiple heating barrels 840 are fixed to the frame of the preheating fixing frame 890 through pipe clamp supports, and the bottom of the preheating water inlet main pipe 810 and the preheating water outlet main pipe 870 are fixed to the bottom plate of the preheating fixing frame 890 through pipe clamp supports.

[0035] Furthermore, the hydraulically controlled cleaning system also includes a plurality of circulation tanks 900, which are used to circulate the cleaning liquid in the immersion tank 110 and the plurality of cleaning tanks 120 after defoaming, and the circulation supply direction includes a water tank with the same property of cleaning liquid, a sheet inserting machine or a degumming machine at an upstream workstation.

[0036] Furthermore, the hydraulically controlled cleaning system also includes a heat exchanger 1000 , which is disposed between the circulation tank 900 and a water tank that circulates and supplies cleaning fluid of the same property, and is used to heat the branch direct supply liquid path 340 of the clean water supply liquid path 300 .

[0037] Optionally, the hydraulically controlled cleaning system further includes a drainage pump 1100 , and the drainage pump 1100 is controllably disposed on the drainage main pipe 620 of the drainage flow path 600 .

[0038] In an example, each slot is described as follows.

[0039] Sink No. 0 is a soaking tank 110, sinks No. 1, 6, 9-13 are cleaning tanks 120, sinks No. 2-5, 7 and 8 are washing tanks 130, and the end overflow pipe of sink No. 0 is connected to the external circulation tank 900, and the outlet pipe of the circulation tank 900 is connected to other workstations to pump clean water thereto, such as a sheet inserter or a degumming machine. Sinks No. 2-5 are each provided with the water tank self-circulation flow path 700; sinks No. 6-9 are provided with a circulation tank 900; and sinks No. 14-15 are drying tanks 200, which provide hot air for drying. The water temperature of sinks No. 0-13 is gradually or stagedly increased from 40° to 95°. Temperature sensors are provided on sinks No. 1-13 and sinks No. 14-15.

[0040] A cleaning machine adopts the aforementioned hydraulically controlled cleaning system and is used to clean and dry silicon wafers in a basket after debonding and inserting. The cleaning and drying can be done step by step, or in batches in series or in parallel.

[0041] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A hydraulically controlled cleaning system, characterized in that: The liquid-controlled cleaning system comprises a multi-stage water tank (100), a drying tank (200), a clean water supply liquid path (300), a heating water tank (400), a cleaning liquid supply liquid path (500), a drainage flow path (600) and a water tank self-circulation flow path (700); The multi-stage water tank (100) comprises a soaking tank (110) arranged in parallel, a plurality of cleaning tanks (120) and a plurality of washing tanks (130), and is used for multi-stage cleaning of products; the drying tank (200) is arranged downstream of the terminal tank of the multi-stage water tank (100) and is used for drying the cleaned products; The clean water supply liquid path (300) is arranged between the multi-stage water tank (100) and the heating water tank (400), and is used to provide hot water and cold water with adjustable ratios to the multi-stage water tank (100); The cleaning liquid supply circuit (500) is used to provide cleaning liquids of different types and proportions to the cleaning tank (120) and the plurality of washing tanks (130); The drainage flow path (600) is controllably connected to each water tank of the multi-stage water tank (100); The water tank is connected to the corresponding washing tank (130) via the circulation flow path (700) and is used for circulating and stirring the washing liquid in the washing tank (130).

2. The hydraulically controlled cleaning system according to claim 1, characterized in that: Adjacent water tanks with the same type of cleaning liquid adopt a stepped overflow design from the downstream to the upstream of the process cleaning, and the top of the partition between the adjacent water tanks becomes lower step by step.

3. The hydraulically controlled cleaning system according to claim 1, characterized in that: The clean water supply liquid path (300) comprises a clean water supply main pipe (310), a hot water supply flow path (320) and a cold water supply flow path (330) connected to each water tank, and the heating water tank (400) is arranged upstream of the hot water supply flow path (320).

4. The hydraulically controlled cleaning system according to claim 1, characterized in that: The cleaning liquid supply circuit (500) comprises a cleaning liquid supply station (510), a plurality of cleaning liquid pipes (520) for conveying different types of cleaning liquids, and a liquid replenishment control valve; the cleaning liquid supply station (510) comprises different types of washing liquid tanks, and the cleaning liquid pipes (520) are controllably connected to corresponding cleaning tanks (120) and washing tanks (130) under the control of the liquid replenishment control valve.

5. The hydraulically controlled cleaning system according to claim 1, characterized in that: The drainage flow path (600) comprises a drainage manifold (610) and a drainage main pipe (620). A drainage manifold (610) controlled by a drainage control valve is arranged at the bottom of each water tank end plate of the multi-stage water tank (100), and all drainage manifolds (610) are connected to the drainage main pipe (620).

6. The hydraulically controlled cleaning system according to claim 1, characterized in that: The water tank self-circulation flow path (700) includes a self-circulation pump (710) and a self-circulation pipe valve (720), and the self-circulation pipe valve (720) is connected to the corresponding washing tank (130).

7. The hydraulically controlled cleaning system according to claim 1, characterized in that: The hydraulically controlled cleaning system further comprises a preheating unit (800), wherein the preheating unit (800) comprises a preheating water inlet main pipe (810), a preheating water inlet transfer pipe (820), a heating rod (830), a heating barrel (840), a preheating connecting pipe (850), a preheating water outlet transfer pipe (860), a preheating water outlet main pipe (870) and a preheating temperature sensor (880); The plurality of heating barrels (840) are connected to each other via a plurality of preheating connecting pipes (850), and each heating barrel (840) is provided with a heating rod (830) and a preheating temperature sensor (880); The preheating water inlet main pipe (810) is connected to the lower part of the heating barrel (840) at the upstream end through the preheating water inlet transfer pipe (820), and the preheating water outlet main pipe (870) is connected to the upper part of the heating barrel (840) at the downstream end through the preheating water outlet transfer pipe (860).

8. The hydraulically controlled cleaning system according to claim 1, characterized in that: The liquid-controlled cleaning system further comprises a plurality of circulation tanks (900), wherein the circulation tanks (900) are used for circulating the cleaning liquid in the soaking tank (110) and the plurality of cleaning tanks (120) after defoaming, and the circulation supply direction includes a water tank of the same property cleaning liquid, and a sheet inserting machine or a degumming machine at an upstream workstation.

9. The hydraulically controlled cleaning system according to claim 3, characterized in that: The liquid-controlled cleaning system further comprises a heat exchanger (1000), which is arranged between the circulation tank (900) and a water tank that circulates and supplies cleaning liquid of the same property, and is used for heating the branch direct supply liquid path (340) of the clean water supply liquid path (300).

10. A cleaning machine, characterized in that: The cleaning machine adopts the hydraulically controlled cleaning system described in any one of claims 1-9.

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