Waste liquid recovery equipment for metal etching processing

Abstract

The invention relates to waste liquid recovery equipment for metal etching processing in the technical field of waste etching liquid recovery. The waste liquid recovery equipment comprises a water supply device, a stirring device, a purifying device, a heating device and a gas collecting device, the water supply device is mounted on the outer wall of the recovery tank and connected with a stirring device; the stirring device is mounted on the recovery tank and is used for stirring a medium in the recovery tank; the purification device is mounted on the inner wall of the tank body; a heating device is arranged at the bottom of the purification device; the gas collecting device is mounted on the outer wall of the tank body; the etching intelligent controller is mounted on one side of the recovery tank and is provided with a main control module, an instruction module and a detection module; in the waste liquid recovery equipment for metal etching processing, the etching waste liquid is diluted through the water supply device and the stirring device, so that the corrosion speed of the etching waste liquid to the waste liquid recovery equipment for metal etching processing in the recovery process is reduced, the service life of the equipment is prolonged, and the production cost is reduced.

Description

Technical Field

[0001] The invention relates to a waste liquid recovery device, in particular to a waste liquid recovery device for metal etching processing, which is applied to the technical field of metal etching waste liquid recovery. Background Art

[0002] Metal etching, also known as photochemical metal etching, refers to the removal of the protective film of the metal etching area after exposure and development. When the metal is etched, it contacts the chemical solution, which dissolves and corrodes, forming a concave-convex or hollow-out effect. This process can be used to make printing convex and concave plates such as copper plates and zinc plates at the earliest. It is also widely used to reduce the weight of instrument panels, nameplates, and thin workpieces that are difficult to process by traditional methods. After continuous improvement and development of process equipment, it can also be used for the processing of precision metal etching products of electronic thin-film parts in the aviation, machinery, and chemical industries. Especially in semiconductor manufacturing, metal etching is an indispensable technology.

[0003] In the metal etching process, a large amount of metal etching liquid is required in the chemical etching process, and etching liquid waste is also generated in the process. The etching liquid waste contains a large amount of harmful substances, so it needs to be recycled. However, even the etching waste liquid has a strong corrosive effect. The existing etching waste liquid recovery equipment suffers from serious loss under long-term use, which greatly increases the cost of use. Therefore, it is necessary to improve the metal etching waste liquid recovery equipment to reduce the corrosion of the etching waste liquid on the recovery equipment.

[0004] The invention patent with the publication number CN115679329B discloses a metal etching processing waste liquid recovery device, including a recovery cylinder, a Y-shaped tube, an impurity removal unit, a mixing system and a recovery system; the upper part of the recovery cylinder is connected with a Y-shaped tube; the left part of the Y-shaped tube is provided with a liquid injection port; the upper part of the Y-shaped tube is provided with a discharge port; the Y-shaped tube is connected with an impurity removal unit for removing impurities in the etching waste liquid; the recovery cylinder is connected with a mixing system for compensating the concentration of the etching liquid; the recovery cylinder is connected with a recovery system for removing metal ions in the etching liquid; the recovery system is connected with the mixing system. The present invention filters out the waste chips in the etching waste liquid, dissolves the metal materials in the waste chips by acid supplementing liquid, and then dries and collects the solution in the waste chips, and also supplements the acid concentration in the etching waste liquid by acid supplementing liquid, thereby reducing the discharge of the etching waste liquid, and the rapid adsorption of metal ions by the resin column realizes the efficient recycling of metal ions, saving the company's production costs.

[0005] This method effectively improves the recovery rate of metal ions in the etching waste liquid, but it does not take into account the corrosive effect of the etching waste liquid and the acid on the device. The higher the concentration of the acid, the more serious the corrosion to the equipment, which will also shorten the life of the equipment. Although the recovery rate of metal ions is improved, the loss of equipment will still increase production costs. Summary of the invention

[0006] In view of the above-mentioned prior art, the technical problem to be solved by the present invention is that the existing metal etching waste liquid recovery equipment does not take into account the corrosive effect of etching waste liquid and acid on the device. The higher the concentration of the acid, the more serious the corrosion to the equipment, which will also shorten the life of the equipment. The loss of the equipment will greatly increase the production cost.

[0007] In order to solve the above problems, the present invention provides a waste liquid recovery device for metal etching processing, comprising a recovery tank and a water supply device, a stirring device, a purification device, a heating device, a gas collection device, and an etching intelligent controller. The recovery tank comprises a tank body, a tank top and a conduit 1, the tank top is installed on the top of the tank body, the conduit 1 is installed on the tank top, the conduit 1 is provided with two input ends, the two input ends of the conduit 1 are respectively connected to a liquid guide tube 1 and an etching waste liquid pipe, the etching waste liquid pipe is used to guide the etching waste liquid into the recovery device, and an electrolysis device is installed in the tank body; The water supply device is installed on the outer wall of the recovery tank, and the water supply device includes a pure water tank, a liquid guide tube 1 connected to the output end of the pure water tank, and the liquid guide tube 1 is connected to the catheter 1; The stirring device is installed on the recovery tank and is used to stir the medium in the recovery tank. The stirring device is connected to the electrolysis device through a liquid guide tube 3, and a solenoid valve 1 is provided on the liquid guide tube 3; The purification device is installed on the inner wall of the tank body, a liquid guide tube 4 is provided at the bottom of the purification device, a one-way valve 1 is provided at the connection between the liquid guide tube 4 and the purification device, the top of the purification device is connected with the electrolysis device through a liquid guide tube 5, a one-way valve 2 is provided at the connection between the liquid guide tube 5 and the purification device, the top of the purification device is connected with a condenser, an airflow sensor is provided at the connection between the condenser and the purification device, and a heating device is provided at the bottom of the purification device; The gas collecting device is installed on the outer wall of the tank, and the gas collecting device includes a filtering mechanism, and a gas tank connected to the filtering mechanism through a connecting pipe. The filtering mechanism is connected to the top of the electrolysis device through a gas guide pipe 1, and the gas tank is connected to the heating device through a gas guide pipe 2. A solenoid valve 2 is installed on the gas guide pipe 2, and a gas pressure sensor is arranged in the gas tank; The etching intelligent controller is installed on one side of the recovery tank. The etching intelligent controller is provided with a main control module, a command module, and a detection module. The main control module is electrically connected to the command module and the detection module respectively. The command module is electrically connected to the one-way valve, solenoid valve one, and solenoid valve two respectively. The detection module is electrically connected to the airflow sensor and the air pressure sensor respectively.

[0008] In the above-mentioned metal etching processing waste liquid recovery equipment, the etching waste liquid is diluted by a water supply device and a stirring device, so that the corrosion rate of the etching waste liquid on the metal etching processing waste liquid recovery equipment during the recovery process is reduced, the service life of the equipment is increased, and the production cost is reduced. The diluted etching waste liquid is passed into an electrolysis device to remove unnecessary substances in the etching waste liquid, and then the gas generated during the treatment process is recovered by a gas collection device, and the diluted etching waste liquid after electrolysis is purified in a purification device.

[0009] As a further improvement of the present application, the stirring device includes a stirring base, a liquid guide tube three arranged on the stirring base, a filter screen is arranged at the connection between the stirring base and the liquid guide tube three, the stirring device also includes a stirring blade arranged on the stirring base, a driving member installed on the top of the tank, a transmission shaft plugged into the stirring base, and a stirring auxiliary blade fixedly installed with the stirring blade, there are multiple groups of stirring auxiliary blades on the stirring blade, the stirring auxiliary blade is connected to a connecting rod, the end of the connecting rod is connected to the transmission shaft, the transmission shaft is plugged into the top of the tank, a transmission gear is installed on the transmission shaft, the transmission gear is meshed with a driving gear, the driving gear is installed with the output end of the driving member, and the instruction module is electrically connected to the driving member.

[0010] As a further improvement of the present application, a heating device is arranged at the bottom of the purification device, and the heating device includes an annular through pipe and an igniter installed on the annular through pipe. There are multiple igniters, the annular through pipe is connected to the second air guide pipe, and the instruction module is electrically connected to the igniter.

[0011] As a further improvement of the present application, a water pump and a solenoid valve three are provided on the liquid conduit one, the pure water tank is connected to the condensation device through the liquid conduit two, and the instruction module is electrically connected to the water pump and the solenoid valve three respectively.

[0012] As another improvement of the present application, two gas collecting devices are provided, and the gas guide tubes of each gas collecting device are connected to the electrolytic cell of the electrolytic device. The electrolytic device is installed on the inner wall of the tank body. The electrolytic device includes an electrolytic cell and an electrolytic plate arranged in the electrolytic cell. The electrolytic cell is connected to the purification device through a liquid guide tube five. A solenoid valve four is provided on the liquid guide tube five. The instruction module is electrically connected to the electrolytic plate and the solenoid valve four, respectively.

[0013] As another improvement supplement to the present application, an electrolyte replenishing device is installed on the outer wall of the tank body. The electrolyte replenishing device includes an electrolyte tank and a liquid guide tube six. The electrolyte tank is connected to the top of the electrolytic cell through the liquid guide tube six. An electromagnetic valve five is arranged on the liquid guide tube six, and the instruction module is electrically connected to the electromagnetic valve five.

[0014] As another improved supplement of the present application, a drying device is installed through the outer wall of the tank body, and the drying device includes a drying cabinet and a drying cabinet door hinged to the drying cabinet. The drying cabinet is installed with the purification device, and the drying cabinet is connected with the stirring device through conduit two. An electromagnetic valve six is ​​arranged on conduit two, and the instruction module is electrically connected to the electromagnetic valve six.

[0015] As another improvement of the present application, a condensation device is installed in the tank body, and the condensation device includes condensation area one and condensation area two. Condensation area one and condensation area two are separated by a partition. A condensation tube is provided in condensation area one. The condensation tube has two input ends, and the two input ends of the condensation tube are respectively connected to the purification device and condensation area two.

[0016] As another improvement of the present application, the condensation area two includes a transition area and a collection area, the transition area and the collection area are separated by a partition, a one-way valve three is arranged on the partition between the transition area and the collection area, the transition area is located on one side of the purification device, and the bottom of the collection area and the condensation tube are both connected to the liquid guide tube two.

[0017] In summary, the present application controls the water supply device through the etching intelligent controller to inject pure water and etching waste liquid into the recovery tank at the same time in a certain proportion, and then controls the stirring device to mix the pure water and the etching waste liquid evenly, so that the degree and speed of corrosion of the equipment during the recovery process are greatly reduced, and at the same time, the solid matter in the etching waste liquid is filtered through the filter, and the diluted and filtered etching waste liquid is passed into the electrolysis device to remove unnecessary substances in the etching waste liquid, and then the gas generated during the recovery process is recovered by the gas collection device. The degree of electrolysis of the etching waste liquid is judged by the air pressure sensor in the gas tank, and the diluted etching waste liquid after electrolysis is introduced into the purification device. A heating device is provided at the bottom of the purification device. The heating device uses the gas collected by the gas collection device to burn it, purifies the diluted etching waste liquid in the purification device, and judges the degree of purification of the etching waste liquid by the air flow sensor in the condenser. During the recovery process, the etching waste liquid is in a diluted state most of the time, so that the degree and speed of corrosion of the waste liquid recovery equipment for metal etching processing are greatly reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 A three-dimensional structural diagram of a metal etching waste liquid recovery device according to the first and second embodiments of the present application; Figure 2 A three-dimensional structural diagram of another angle of the metal etching waste liquid recovery equipment according to the first and second embodiments of the present application; Figure 3 It is a schematic cross-sectional structure diagram of a metal etching waste liquid recovery device according to the first and second embodiments of the present application; Figure 4This is a schematic diagram of the structure of the stirring device of the first and second embodiments of the present application; Figure 5 This is a schematic diagram of the structure of the purification device of the first and second embodiments of the present application; Figure 6 This is a control principle diagram of an etching intelligent controller according to the first embodiment of the present application; Figure 7 This is a schematic diagram of the structure of the condensing device of the first and second embodiments of the present application; Figure 8 This is a control schematic diagram of an etching intelligent controller according to the second embodiment of the present application.

[0019] Description of the numbers in the figure: 1. Recovery tank; 101. Tank top; 102. Tank body; 2. Conduit 1; 3. Etching waste liquid pipe; 4. Water supply device; 401. Water pump; 402. Solenoid valve 3; 403. Liquid guide tube 1; 404. Liquid guide tube 2; 405. Pure water tank; 5. Stirring device; 501. Driving member; 502. Driving gear; 503. Transmission gear; 504. Transmission shaft; 505. Stirring base; 506. Filter; 507. Stirring blade; 508. Stirring auxiliary blade; 509. Connecting rod; 510. Liquid guide tube 3; 511. Solenoid valve 1; 6. Purification device; 601. Air flow sensor; 602. Liquid guide tube 4; 603. One-way valve 1; 7. Heating device; 701. Annular pipe; 702. Ignitor; 8. Gas Collecting device; 801, filtering mechanism; 802, gas tank; 803, air pipe one; 804, air pipe two; 805, solenoid valve two; 9, electrolytic device; 901, electrolytic cell; 902, liquid pipe five; 903, solenoid valve four; 904, one-way valve two; 10, electrolyte replenishing device; 1001, liquid pipe six; 1002, electrolyte tank; 1003, solenoid valve five; 11, drying device; 1101, solenoid valve six; 1102, conduit two; 1103, drying cabinet; 1104, drying cabinet door; 12, condensing device; 1201, condensing area one; 1202, transition area; 1203, collecting area; 1204, condensing pipe; 1205, one-way valve three; 13, etching intelligent controller. DETAILED DESCRIPTION

[0020] Two implementation modes of the present application are described in detail below with reference to the accompanying drawings.

[0021] The first implementation method: Figure 1-Figure 6A waste liquid recovery device for metal etching processing is shown, including a recovery tank 1 and a water supply device 4, a stirring device 5, a purification device 6, a heating device 7, a gas collection device 8, and an etching intelligent controller 13. The recovery tank 1 includes a tank body 102, a tank top 101 and a conduit 2. The tank top 101 is installed on the top of the tank body 102, and the conduit 2 is installed on the tank top 101. The conduit 2 is provided with two input ends. The two input ends of the conduit 2 are respectively connected to a liquid guide tube 403 and an etching waste liquid pipe 3. The etching waste liquid pipe 3 is used to introduce the etching waste liquid into the recovery device. An electrolysis device 9 is installed in the tank body 102; The water supply device 4 is installed on the outer wall of the recovery tank 1, and the water supply device 4 includes a pure water tank 405, a liquid guide tube 403 connected to the output end of the pure water tank 405, and the liquid guide tube 403 is connected to the conduit 2 to send pure water into the recovery tank 1; The stirring device 5 is installed on the recovery tank 1 to stir the medium in the recovery tank 1. The stirring device 5 is connected to the electrolysis device 9 through the liquid guide tube 3 510. The liquid guide tube 3 510 is provided with a solenoid valve 1 511. The stirring device 5 stirs the etching waste liquid and the pure water evenly and then introduces them into the electrolysis device 9. The purification device 6 is installed on the inner wall of the tank body 102, and a liquid guide tube 4 602 is provided at the bottom of the purification device 6, and a one-way valve 1 603 is provided at the connection between the liquid guide tube 4 602 and the purification device 6. The top of the purification device 6 is connected with the electrolysis device 9 through the liquid guide tube 5 902, and a one-way valve 2 904 is provided at the connection between the liquid guide tube 5 902 and the purification device 6. The top of the purification device 6 is connected with the condenser 1204, and an airflow sensor 601 is provided at the connection between the condenser 1204 and the purification device 6. A heating device 7 is provided at the bottom of the purification device 6. The purification device 6 purifies the diluted etching waste liquid treated by the electrolysis device 9 so that it can be used for metal etching processing again.

[0022] The gas collecting device 8 is installed on the outer wall of the tank body 102. The gas collecting device 8 includes a filtering mechanism 801 and a gas tank 802 connected to the filtering mechanism 801 through a connecting pipe. The filtering mechanism 801 is connected to the top of the electrolysis device 9 through an air guide pipe 1 803. The gas tank 802 is connected to the heating device 7 through an air guide pipe 2 804. An electromagnetic valve 2 805 is installed on the air guide pipe 2 804. An air pressure sensor is arranged in the gas tank 802. The electrolysis device 9 will generate a variety of exhaust gases in the process of treating the diluted etching waste liquid. The gas collecting device 8 collects the exhaust gases and stores them in the gas tank 802.

[0023] The etching intelligent controller 13 is installed on one side of the recovery tank 1. The etching intelligent controller 13 is provided with a main control module, a command module, and a detection module. The main control module is electrically connected to the command module and the detection module respectively. The command module is electrically connected to the solenoid valve 1 511 and the solenoid valve 2 805 respectively. The detection module is electrically connected to the airflow sensor 601 and the air pressure sensor respectively.

[0024] Among them, the recovery tank 1 and the electrolysis device 9 are common etching waste liquid recovery equipment structures in the field, which are existing technologies well known to personnel in the field. They are not within the protection scope of the technical solution of this application, and this application will not go into details about their specific structure and working principle.

[0025] When the etching waste liquid needs to be recycled, the etching waste liquid enters the recovery tank 1 through the etching waste liquid pipe 3, a water pump 401 and a solenoid valve 3 402 are arranged on the liquid guide tube 1 403, the pure water tank 405 is connected with the condensing device 12 through the liquid guide tube 2 404, the instruction module is electrically connected with the water pump 401 and the solenoid valve 3 402 respectively, the etching intelligent controller 13 controls the solenoid valve 3 402 to open through the instruction module, and controls the water pump 401 to pump the pure water in the pure water tank 405 into the stirring device 5 through the liquid guide tube 1 403 and the conduit 1 2.

[0026] The stirring device 5 includes a stirring blade 507 arranged on a stirring base 505, a driving member 501 installed on the tank top 101, a transmission shaft 504 plugged into the stirring base 505, and a stirring auxiliary blade 508 fixedly installed with the stirring blade 507, wherein the stirring blade 507 has multiple groups of stirring auxiliary blades 508, and the stirring auxiliary blade 508 is connected with a connecting rod 509, and the end of the connecting rod 509 is connected with the transmission shaft 504, and the transmission shaft 504 is plugged into the tank top 101, and a transmission gear 503 is installed on the transmission shaft 504, and the transmission gear 503 is meshedly connected with a driving gear 502, and the driving gear 502 is installed with the output end of the driving member 501. The instruction module is electrically connected to the driving member 501. After the instruction module controls the solenoid valve 3 402 to open and introduces the etching waste liquid and pure water into the stirring device 5, the driving member 501 is controlled to move. The output end of the driving member 501 drives the driving gear 502 to rotate. While the driving gear 502 rotates, it drives the transmission gear 503 to rotate. The transmission gear 503 drives the transmission shaft 504 to rotate. The connecting rod 509 connected to the transmission shaft 504 rotates synchronously. The connecting rod 509 drives the stirring blade 507 and the stirring auxiliary blade 508 to rotate with the transmission shaft 504 as the axis. The stirring blade 507 rotates to mix the etching waste liquid and pure water in the stirring device 5 evenly.

[0027] The stirring device 5 also includes a stirring base 505 and a liquid guide tube 3 510 arranged on the stirring base 505. The stirring device 5 is connected to the electrolysis device 9 through the liquid guide tube 3 510. The liquid guide tube 3 510 is provided with an electromagnetic valve 1 511. A filter 506 is provided at the connection between the stirring base 505 and the liquid guide tube 3 510. The command module is electrically connected to the electromagnetic valve 1 511. When the etching waste liquid and pure water enter the stirring device 5, the command module controls the driving member 501 and the electromagnetic valve 1 511 to open at the same time, stirs the etching waste liquid and the pure water evenly, and makes them flow into the electrolysis device 9. There are various solid substances, precipitated substances, etc. in the etching waste liquid, which will affect the effect of the electrolysis device 9 in treating the etching waste liquid, and the filter 506 can filter out various solid substances, precipitated substances, etc. in the diluted etching waste liquid, so that they remain in the stirring device 5.

[0028] A preferred stirring blade 507 is provided with two pieces and fits the stirring base 505, the side of the stirring blade 507 is an inclined surface and is slightly wider than the filter 506, and the sides of the two stirring blades 507 are provided with gaps. When the stirring blade 507 rotates, the solid matter precipitated on the filter 506 can be scraped off. At the same time, by controlling the rotation speed of the stirring blade 507, the rate at which the diluted etching waste liquid enters the electrolysis device 9 through the liquid guide tube 3 510 can be controlled. When the rotation speed of the stirring blade 507 is faster, the number of times the side gaps of the stirring blade 507 pass through the filter 506 is more, and the rate at which the diluted etching waste liquid enters the electrolysis device 9 will increase. When the rotation speed of the stirring blade 507 is slower, the number of times the side gaps of the stirring blade 507 pass through the filter 506 is less, and the rate at which the etching waste liquid enters the electrolysis device 9 will decrease.

[0029] The electrolytic device 9 is installed on the inner wall of the tank body 102. The electrolytic device 9 includes an electrolytic cell 901 and an electrolytic plate arranged in the electrolytic cell 901. The electrolytic cell 901 is connected to the purification device 6 through a liquid guide tube 5 902. A solenoid valve 4 903 is arranged on the liquid guide tube 5 902. The instruction module is electrically connected to the electrolytic plate and the solenoid valve 4 903 respectively. After the instruction module controls the solenoid valve 1 511 to open, so that the diluted and filtered etching waste liquid enters the electrolytic device 9, the instruction module controls the electrolytic plate to start working to remove unnecessary substances in the diluted etching waste liquid. When the electrolytic device 9 processes the diluted etching waste liquid, a lot of tail gas will be generated, which needs to be collected. Since the tail gas generated by the anode and cathode of the electrolytic device 9 is different, two gas collecting devices 8 are set to collect the tail gas of the anode and cathode respectively. The gas guide tubes 1 803 of the gas collecting devices 8 are connected to the electrolytic device 9 of the electrolytic device 9. The exhaust gas enters the filtering mechanism 801 through the air guide pipe 1 803, and the filtering mechanism 801 removes impurities from the exhaust gas to obtain the required pure oxygen and hydrogen. The filtered pure oxygen and hydrogen are respectively stored in the gas tanks 802 of the two gas collecting devices 8. The detection module sends the information of the air pressure sensor to the main control module, and the main control module compares the air pressure of the gas tank 802 with the set air pressure (the main control module is preset with the set air pressure in the current state). When the electrolysis device 9 treats the diluted etching waste liquid, exhaust gas will be generated, and the air pressure formed in the gas tank 802 by the exhaust gas released by a certain amount of etching waste liquid has a certain range. When the difference between the air pressure of the gas tank 802 and the set air pressure is within the error range, the instruction module controls the electrolysis plate to stop working, and controls the solenoid valve 4 903 to open, so that the diluted etching waste liquid after treatment enters the purification device 6 along the liquid guide pipe 5 902.

[0030] Since electrolysis consumes the electrolyte in the electrolytic cell 901, and replenishing the etching waste liquid can only replenish the electrolyte at one electrode of the electrolytic cell 901, in order to keep the electrolytic device 9 working continuously, an electrolyte replenishing device 10 is provided on the outer wall of the tank body 102. The electrolyte replenishing device 10 includes an electrolyte tank 1002 and a liquid guide tube 6 1001. The electrolyte tank 1002 is connected to the top of the electrolytic cell 901 through the liquid guide tube 6 1001. The liquid guide tube 6 1001 is provided with an electromagnetic valve 5 1003. The instruction module is electrically connected to the electromagnetic valve 5 1003. The air pressure sensor sends the air pressure data detected by the gas tank 802 to the detection module. The main control module collects the air pressure data through the detection module. Compared with the set air pressure (the set air pressure in the current state is preset in the main control module), when the difference between the air pressure of the gas tank 802 and the set air pressure does not reach a certain error range, but the air pressure of the gas tank 802 increases slowly or no longer increases, it is judged that the electrolyte in the electrolytic cell 901 is insufficient. At this time, the main control module controls the stirring device 5 to inject a certain amount of etching waste liquid through the instruction module, and at the same time controls the solenoid valve five 1003 to open, and the electrolyte in the electrolyte tank 1002 is replenished into the electrolytic cell 901. When the air pressure of the gas tank 802 resumes normal growth, the instruction module controls the stirring device 5 to stop injecting the etching waste liquid, controls the solenoid valve five 1003 to close, and stops injecting the electrolyte.

[0031] A heating device 7 is provided at the bottom of the purification device 6. The heating device 7 includes an annular through-tube 701 and an igniter 702 installed on the annular through-tube 701. There are multiple igniters 702. The annular through-tube 701 is connected to the second gas guide pipe 804. The command module is electrically connected to the igniter 702. When the purification device 6 needs to be operated, the command module controls the second solenoid valve 805 to open, and the different gases collected in the two gas tanks 802 are introduced into the annular through-tube according to the set ratio (the main control module is preset with a more suitable combustion ratio of two different gases) In 701, the igniter 702 is controlled to ignite and ignite the mixed gas to heat the purification device 6 to evaporate the excess water in the diluted etching waste liquid in the purification device 6. A one-way valve 2 904 is provided at the connection between the liquid guide tube 5 902 and the purification device 6 to prevent the steam from rushing back into the electrolysis device 9 during the purification process and affecting the electrolysis device 9 in treating the etching waste liquid. When the purification device 6 completes the purification of the diluted etching waste liquid, the instruction module controls the one-way valve 1 603 to open and export the purified etching waste liquid out of the device through the liquid guide tube 4 602.

[0032] The second implementation method: Figure 1-Figure 5 and Figure 7-Figure 8A waste liquid recovery device for metal etching processing is shown. Different from the first embodiment, in the process of treating the etching waste liquid by the entire device, solid substances such as solid matter in the stirring device 5, precipitated substances, steam in the purification device 6, etc. will be produced. These by-products still have a certain recovery value. By treating and recovering them through the equipment, the cost of recovering the waste liquid for metal etching processing can be further reduced.

[0033] The drying device 11 is installed through the outer wall of the tank body 102, and the drying device 11 includes a drying cabinet 1103 and a drying cabinet door 1104 hinged to the drying cabinet 1103. The drying cabinet 1103 is connected to the stirring device 5 through the second conduit 1102. The second conduit 1102 is provided with a solenoid valve 6 1101. The instruction module is electrically connected to the solenoid valve 6 1101. After the diluted etching waste liquid in the stirring device 5 basically flows into the electrolysis device 9, the main control module controls the action of the driving member 501 through the instruction module, and the driving member 501 drives the stirring blade 507 to perform a preset action (the preset action is preset in the main control module), and rotates to a preset position (the preset position is preset in the main control module), so that the stirring blade 507 The sediment on the filter 506 can be removed and the filter 506 can be covered to prevent the liquid from flowing into the electrolysis device 9. The instruction module then controls the solenoid valve six 1101 to open, and at the same time turns on the water pump 401 and the solenoid valve three 402 to allow pure water to enter the stirring device 5, and flushes the stirring device 5, so that solid matter, precipitated matter, etc. follow the water flow along the conduit two 1102 into the drying cabinet 1103. After flushing for a period of time, the instruction module controls the water pump 401 and the solenoid valve three 402 to close, and then controls the driving member 501 to rotate the stirring blade 507 to another preset position (another preset position is preset in the main control module), so that the gap on the side of the two stirring blades 507 can completely expose the filter 506.

[0034] The drying cabinet 1103 is installed with the purification device 6. When the purification device 6 processes the diluted etching waste liquid, the drying cabinet 1103 is also heated up at the same time. With the help of the temperature of the purification device 6, the water in the drying cabinet is evaporated, so that the solid matter, precipitate, etc. are all dried, and the evaporated water vapor will return to the stirring device 5 along the conduit 2 1102, and re-condense at the tank top 101, and flow into the electrolysis device 9 through the filter 506 and the liquid guide tube 3 510. When the drying is completed, the instruction module controls the solenoid valve 6 1101 to close, and then opens the drying cabinet door 1104 to take out the dried solid matter and precipitate.

[0035] Similarly, when the purification device 6 treats the diluted etching waste liquid, a large amount of water vapor is generated. A condensing device 12 is provided to collect the vapor. The condensing device 12 includes a condensation area 1201 and a condensation area 2. The condensation area 1201 and the condensation area 2 are separated by a partition. A condensation tube 1204 is provided in the condensation area 1201. The condensation tube 1204 has two input ends. The two input ends of the condensation tube 1204 are respectively connected to the purification device 6 and the condensation area 2. The pure water tank 405 is connected to the condensing device 12 through the liquid guide tube 2 404. The purification device 6 treats the vapor generated by the etching waste liquid, condenses it through the condensation tube 1204, re-condenses the vapor, and returns to the pure water tank 405 along an input end of the liquid guide tube 2 404 connected to the condensation tube 1204.

[0036] It is worth mentioning that the condensation area 1201 is set at the bottom of the electrolytic cell 901 of the electrolysis device 9, and the condensation tube 1204 is arranged in a spiral shape in contact with the bottom of the electrolytic cell 901. When the steam runs along the condensation tube 1204, part of the heat will be transferred to the electrolyte and etching waste liquid in the electrolytic cell 901, thereby increasing their temperature and improving the electrolysis rate.

[0037] The condensation area 2 includes a transition area 1202 and a collection area 1203, and the transition area 1202 and the collection area 1203 are separated by a partition. A one-way valve 3 1205 is arranged on the partition between the transition area 1202 and the collection area 1203. The transition area 1202 is located on one side of the purification device 6. The bottom of the collection area 1203 and the condenser 1204 are both connected to the liquid guide tube 2 404. The collection area 1203 is located at the bottom of the purification device 6, and contains a heating device 7 therein. The heating device 7 is heated by the gas provided by the gas collection device 8 for the purification mechanism, and the gas tanks 802 of the two gas collection devices 8 store hydrogen and oxygen respectively, which produce pure water after mixed combustion. After the heating device 7 has been operating for a long time, a large amount of pure water and steam will be generated. The pure water condenses and gathers on the inner wall of the collection area 1203 and then flows back to the pure water tank 405 along the second liquid guide tube 404. The steam pushes open the one-way valve three 1205 after reaching a certain pressure, and enters the condenser 1204 through the transition area 1202. Some of the steam condenses into water droplets when passing through the transition area 1202 and gathers at the bottom of the transition area 1202. When the steam in the collection area 1203 reaches a certain pressure next time and pushes open the one-way valve, the pure water at the bottom of the transition area 1202 flows back to the collection area 1203 and returns to the pure water tank 405 along the second liquid guide tube 404.

[0038] In view of current practical needs, the above-mentioned implementation mode adopted in this application is not limited to the scope of protection. Various changes made within the knowledge scope of technical personnel in this field without departing from the concept of this application still fall within the scope of protection of the present invention.

Claims

1. A waste liquid recovery device for metal etching processing, comprising a recovery tank (1), the recovery tank (1) comprising a tank body (102), a tank top (101) and a conduit 1 (2), the tank top (101) being mounted on the top of the tank body (102), the conduit 1 (2) being mounted on the tank top (101), the conduit 1 (2) being provided with two input ends, the two input ends of the conduit 1 (2) being respectively connected to a liquid guide tube 1 (403) and an etching waste liquid pipe (3), the etching waste liquid pipe (3) being used to guide the etching waste liquid into the recovery device, the tank body (102) being provided with an electrolysis device (9), characterized in that: Also includes: A water supply device (4), a stirring device (5), a purification device (6), a heating device (7), a gas collecting device (8), and an etching intelligent controller (13); The water supply device (4) is installed on the outer wall of the recovery tank (1), and the water supply device (4) comprises a pure water tank (405), a liquid guide tube 1 (403) connected to the output end of the pure water tank (405), and the liquid guide tube 1 (403) is connected to the conduit 1 (2); The stirring device (5) is installed on the recovery tank (1) and is used to stir the medium in the recovery tank (1). The stirring device (5) is connected to the electrolysis device (9) through a liquid guide tube (510). A solenoid valve (511) is provided on the liquid guide tube (510). The purification device (6) is installed on the inner wall of the tank body (102), a liquid guide tube 4 (602) is provided at the bottom of the purification device (6), a one-way valve 1 (603) is provided at the connection between the liquid guide tube 4 (602) and the purification device (6), the top of the purification device (6) is connected to the electrolysis device (9) through a liquid guide tube 5 (902), a one-way valve 2 (904) is provided at the connection between the liquid guide tube 5 (902) and the purification device (6), the top of the purification device (6) is connected to the condenser (1204), an airflow sensor (601) is provided at the connection between the condenser (1204) and the purification device (6), and a heating device (7) is provided at the bottom of the purification device (6); The gas collecting device (8) is mounted on the outer wall of the tank body (102), and comprises a filtering mechanism (801), and a gas tank (802) connected to the filtering mechanism (801) via a connecting pipe, the filtering mechanism (801) being connected to the top of the electrolysis device (9) via a first gas guide pipe (803), the gas tank (802) being connected to the heating device (7) via a second gas guide pipe (804), a second solenoid valve (805) being mounted on the second gas guide pipe (804), and a gas pressure sensor being arranged in the gas tank (802); The etching intelligent controller (13) is installed on one side of the recovery tank (1), and is provided with a main control module, an instruction module, and a detection module. The main control module is electrically connected to the instruction module and the detection module respectively, the instruction module is electrically connected to the one-way valve 1 (603), the solenoid valve 1 (511), and the solenoid valve 2 (805) respectively, and the detection module is electrically connected to the airflow sensor (601) and the air pressure sensor respectively.

2. The metal etching waste liquid recovery equipment according to claim 1, characterized in that: The stirring device (5) comprises a stirring base (505), a liquid guide tube three (510) arranged on the stirring base (505), a filter screen (506) being arranged at the connection between the stirring base (505) and the liquid guide tube three (510), the stirring device (5) further comprises a stirring blade (507) arranged on the stirring base (505), a driving member (501) installed on the tank top (101), a transmission shaft (504) plugged into the stirring base (505), and a stirring auxiliary blade (508) fixedly installed on the stirring blade (507), the stirring The blade (507) is provided with a plurality of groups of auxiliary stirring blades (508), the auxiliary stirring blades (508) are connected with connecting rods (509), the end of the connecting rod (509) is connected with a transmission shaft (504), the transmission shaft (504) is plugged with the tank top (101), a transmission gear (503) is installed on the transmission shaft (504), the transmission gear (503) is meshedly connected with a driving gear (502), the driving gear (502) is installed with an output end of the driving member (501), and the instruction module is electrically connected with the driving member (501).

3. The metal etching waste liquid recovery equipment according to claim 1, characterized in that: The heating device (7) is arranged at the bottom of the purification device (6), and comprises an annular through-tube (701), an igniter (702) installed on the annular through-tube (701), a plurality of igniters (702) are provided, the annular through-tube (701) is connected to the second air guide tube (804), and the instruction module is electrically connected to the igniter (702).

4. The metal etching waste liquid recovery equipment according to claim 1, characterized in that: The first liquid guide tube (403) is provided with a water pump (401) and a third solenoid valve (402); the pure water tank (405) is connected to the condensing device (12) via the second liquid guide tube (404); and the instruction module is electrically connected to the water pump (401) and the third solenoid valve (402), respectively.

5. The metal etching waste liquid recovery equipment according to claim 1, characterized in that: The gas collecting devices (8) are provided with two gas collecting devices (8). The gas guide tubes (803) of the gas collecting devices (8) are connected to the electrolytic cell (901) of the electrolytic device (9). The electrolytic device (9) is installed on the inner wall of the tank body (102). The electrolytic device (9) comprises an electrolytic cell (901) and an electrolytic plate arranged in the electrolytic cell (901). The electrolytic cell (901) is connected to the purification device (6) via a liquid guide tube (902). A solenoid valve (903) is arranged on the liquid guide tube (902). The instruction module is electrically connected to the electrolytic plate and the solenoid valve (903) respectively.

6. The metal etching waste liquid recovery equipment according to claim 1, characterized in that: An electrolyte replenishing device (10) is installed on the outer wall of the tank body (102), and the electrolyte replenishing device (10) comprises an electrolyte tank (1002) and a liquid guide tube six (1001), the electrolyte tank (1002) is connected to the top of the electrolytic cell (901) via the liquid guide tube six (1001), a solenoid valve five (1003) is arranged on the liquid guide tube six (1001), and the instruction module is electrically connected to the solenoid valve five (1003).

7. The metal etching waste liquid recovery equipment according to claim 1, characterized in that: A drying device (11) is installed through the outer wall of the tank body (102), and the drying device (11) comprises a drying cabinet (1103) and a drying cabinet door (1104) hinged to the drying cabinet (1103). The drying cabinet (1103) is installed with the purification device (6). The drying cabinet (1103) is connected to the stirring device (5) through the second conduit (1102). The second conduit (1102) is provided with a solenoid valve six (1101), and the instruction module is electrically connected to the solenoid valve six (1101).

8. The metal etching waste liquid recovery equipment according to claim 1, characterized in that: A condensation device (12) is installed in the tank body (102), and the condensation device (12) includes a condensation area one (1201) and a condensation area two. The condensation area one (1201) and the condensation area two are separated by a partition. A condensation pipe (1204) is arranged in the condensation area one (1201), and the condensation pipe (1204) has two input ends. The two input ends of the condensation pipe (1204) are respectively connected to the purification device (6) and the condensation area two.

9. The metal etching waste liquid recovery equipment according to claim 8, characterized in that: The condensation area two includes a transition area (1202) and a collection area (1203), the transition area (1202) and the collection area (1203) are separated by a partition, and a one-way valve three (1205) is arranged on the partition between the transition area (1202) and the collection area (1203), the transition area (1202) is located on one side of the purification device (6), and the bottom of the collection area (1203) and the condensation tube (1204) are both connected to the liquid guide tube two (404).

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