Display panel, display device and preparation method of display panel

Abstract

The invention discloses a display panel, a display device and a preparation method of the display panel. The display panel comprises a substrate, an isolation structure and a light emitting device layer. The first film layer, the second film layer and the third film layer are arranged to form an isolation structure, and the orthographic projection of the first film layer close to the substrate on the substrate is located in the orthographic projection of the second film layer on the substrate. The extension distances corresponding to at least two light-emitting units are different, the extension distances of the isolation structures corresponding to part of the light-emitting units are larger, and due to the fact that the peripheral sides of the first electrodes are in lap joint with the third film layers of the isolation structures, the lap joint area of the first electrodes of the corresponding light-emitting units with the larger extension distances and the third film layers of the isolation structures is larger; therefore, the overlapping impedance between the part of the first electrode and the isolation structure is reduced, and the light-emitting effect of the light-emitting unit and the use performance of the display panel are improved.

Description

Technical Field

[0001] The present application relates to the field of display, and in particular to a display panel, a display device and a method for manufacturing a display panel. Background Art

[0002] Organic Light Emitting Diode (OLED) and flat panel display devices based on technologies such as Light Emitting Diode (LED) have been widely used in various consumer electronic products such as mobile phones, televisions, laptops, desktop computers, etc. due to their advantages such as high image quality, power saving, thin body and wide application range, becoming the mainstream in display devices.

[0003] However, the performance of current OLED display products needs to be improved. Summary of the invention

[0004] The embodiments of the present application provide a display panel, a display device and a method for manufacturing a display panel, aiming to improve the performance of the display panel.

[0005] A first aspect of the present application provides a display panel, which includes: a substrate; an isolation structure located on the substrate, the isolation structure enclosing a plurality of isolation openings, the isolation structure including a first film layer, a second film layer located on the side of the first film layer away from the substrate, and a third film layer located on the side of the first film layer facing the substrate, the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the second film layer on the substrate, and the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the third film layer on the substrate; a light-emitting device layer located on the substrate, the light-emitting device layer including a plurality of light-emitting units, at least part of the light-emitting units being located in the isolation openings, wherein the distance between the orthographic projection of an edge of the first film layer close to the light-emitting unit on the substrate and the orthographic projection of an edge of the third film layer close to the same light-emitting unit on the substrate is an extension distance, and there are at least two light-emitting units with different corresponding extension distances.

[0006] According to an implementation of the first aspect of the present application, the material of the third film layer includes at least one of titanium nitride, titanium, and molybdenum nitride.

[0007] According to any of the aforementioned embodiments of the first aspect of the present application, a plurality of light-emitting units with the same light-emitting color have the same corresponding extension distances.

[0008] According to any of the aforementioned embodiments of the first aspect of the present application, the extension distance is a dimension of the third film layer protruding beyond the first film layer in a direction toward the isolation opening.

[0009] According to any of the aforementioned embodiments of the first aspect of the present application, the light-emitting unit includes a first light-emitting unit and a second light-emitting unit, the extension distance corresponding to the first light-emitting unit is the first distance, the extension distance corresponding to the second light-emitting unit is the second distance, and the first distance is less than or equal to the second distance.

[0010] According to any of the aforementioned embodiments of the first aspect of the present application, the first light-emitting unit and the second light-emitting unit emit different colors of light.

[0011] According to any of the aforementioned embodiments of the first aspect of the present application, the light-emitting unit also includes a third light-emitting unit, the extension distance corresponding to the third light-emitting unit is a third distance, and the second distance is less than or equal to the third distance.

[0012] According to any of the aforementioned embodiments of the first aspect of the present application, the light emitting colors of the first light emitting unit, the second light emitting unit and the third light emitting unit are different; and at least two of the first distance, the second distance and the third distance are different.

[0013] According to any of the aforementioned embodiments of the first aspect of the present application, the light-emitting unit includes: a light-emitting portion and a first electrode, the first electrode is located on a side of the light-emitting portion away from the substrate, and the first electrode is electrically connected to the isolation structure.

[0014] According to any of the aforementioned embodiments of the first aspect of the present application, in the same light-emitting unit, the orthographic projection of the light-emitting portion on the substrate is located within the orthographic projection of each first electrode on the substrate.

[0015] According to any of the aforementioned embodiments of the first aspect of the present application, the light-emitting portion and the isolation structure are spaced apart.

[0016] According to any of the aforementioned embodiments of the first aspect of the present application, the first electrode and the third film layer are electrically connected.

[0017] According to any of the aforementioned embodiments of the first aspect of the present application, in the same light-emitting unit, the orthographic projection area of ​​the light-emitting portion on the substrate is smaller than the orthographic projection area of ​​the first electrode on the substrate.

[0018] According to any of the aforementioned embodiments of the first aspect of the present application, the area covered by the first electrode on the third film layer is the overlapping area, and there are at least two light-emitting units whose first electrodes have different overlapping areas.

[0019] According to any of the aforementioned embodiments of the first aspect of the present application, the overlapping areas corresponding to multiple light-emitting units with the same light-emitting color are the same.

[0020] According to any of the aforementioned embodiments of the first aspect of the present application, the light-emitting unit includes a first light-emitting unit and a second light-emitting unit, the overlapping area corresponding to the first light-emitting unit is a first area, the overlapping area corresponding to the second light-emitting unit is a second area, and the first area is less than or equal to the second area.

[0021] According to any of the aforementioned embodiments of the first aspect of the present application, the light emitting colors of the first light emitting unit and the second light emitting unit are different, and at least two of the first area, the second area and the third area are different.

[0022] According to any of the aforementioned embodiments of the first aspect of the present application, the light-emitting unit further includes a third light-emitting unit, the overlapping area corresponding to the third light-emitting unit is a third area, and the second area is less than or equal to the third area.

[0023] According to any of the aforementioned embodiments of the first aspect of the present application, the light emitting colors of the first light emitting unit, the second light emitting unit and the third light emitting unit are different.

[0024] According to any of the aforementioned embodiments of the first aspect of the present application, the width of the overlapping part of the orthographic projection of the first electrode on the substrate and the orthographic projection of the third film layer on the substrate is the first overlap width, and there are at least two light-emitting units whose first electrodes correspond to different first overlap widths.

[0025] According to any of the aforementioned embodiments of the first aspect of the present application, the first overlap widths corresponding to multiple light-emitting units with the same light-emitting color are the same.

[0026] According to any of the aforementioned embodiments of the first aspect of the present application, the light-emitting unit includes a first light-emitting unit and a second light-emitting unit, the first overlap width corresponding to the first light-emitting unit is the first width, the first overlap width corresponding to the second light-emitting unit is the second width, and the first width is less than or equal to the second width.

[0027] According to any of the aforementioned embodiments of the first aspect of the present application, the light-emitting unit further includes a third light-emitting unit, the first overlap width corresponding to the third light-emitting unit is a third width, and the second width is less than or equal to the third width.

[0028] According to any of the aforementioned embodiments of the first aspect of the present application, at least two of the first width, the second width and the third width are different.

[0029] According to any of the aforementioned embodiments of the first aspect of the present application, there are at least two light-emitting units where the first electrodes have different second overlapping widths with the adjacent first film layers.

[0030] According to any of the aforementioned embodiments of the first aspect of the present application, the second overlap width corresponding to the first light-emitting unit is greater than or equal to the second overlap width corresponding to the second light-emitting unit; the second overlap width corresponding to the second light-emitting unit is greater than or equal to the second overlap width corresponding to the third light-emitting unit; at least two of the second overlap width corresponding to the first light-emitting unit, the second overlap width corresponding to the second light-emitting unit, and the second overlap width corresponding to the third light-emitting unit are different; or, the first electrodes of a portion of the light-emitting units overlap with the first film layer adjacent to them, and the first electrodes of another portion of the light-emitting units are spaced apart from the first film layer adjacent to them.

[0031] According to any of the aforementioned embodiments of the first aspect of the present application, the first overlap width is the dimension of the overlapping portion along the direction of the orthographic projection of the side wall of the third film layer toward the isolation opening on the substrate pointing to the orthographic projection of the side wall of the first film layer toward the isolation opening on the substrate.

[0032] According to any of the aforementioned embodiments of the first aspect of the present application, the second overlap width is the dimension of the overlap portion of the edge of the first electrode and the first film layer in a direction away from the surface of the third film layer away from the substrate. According to any of the aforementioned embodiments of the first aspect of the present application, the distance between the orthographic projection of the edge of the third film layer on the substrate close to the light-emitting unit and the orthographic projection of the edge of the second film layer close to the same light-emitting unit on the substrate is the protrusion length, and the protrusion length corresponding to each light-emitting unit is the same.

[0033] According to any of the aforementioned embodiments of the first aspect of the present application, the distance between the orthographic projection of the edge of the first film layer close to the light-emitting unit on the side away from the substrate and the orthographic projection of the edge of the second film layer close to the same light-emitting unit on the substrate is the first extension length, and the first extension length is greater than or equal to 0.4 μm and less than or equal to 0.8 μm.

[0034] According to any of the aforementioned embodiments of the first aspect of the present application, the distance between the orthographic projection of the edge of the first film layer close to the light-emitting unit on the side close to the substrate and the orthographic projection of the edge of the second film layer close to the same light-emitting unit on the substrate is the second extension length; there are at least two light-emitting units with different second extension lengths.

[0035] According to any of the aforementioned embodiments of the first aspect of the present application, the second extension lengths corresponding to multiple light-emitting units with the same luminous color are the same.

[0036] According to any of the aforementioned embodiments of the first aspect of the present application, the light-emitting unit includes a first light-emitting unit and a second light-emitting unit, the second extension length corresponding to the first light-emitting unit is the first length, the second extension length corresponding to the second light-emitting unit is the second length, and the first length is less than or equal to the second length.

[0037] According to any of the aforementioned embodiments of the first aspect of the present application, the light-emitting unit also includes a third light-emitting unit, the second extension length corresponding to the third light-emitting unit is a third length, and the second length is less than or equal to the third length.

[0038] According to any of the aforementioned embodiments of the first aspect of the present application, the orthographic projection area of ​​the first film layer on the substrate is smaller than the orthographic projection area of ​​the second film layer on the substrate, and the orthographic projection area of ​​the first film layer on the substrate is smaller than the orthographic projection area of ​​the third film layer on the substrate.

[0039] According to any of the aforementioned embodiments of the first aspect of the present application, the orthographic projection area of ​​the first film layer on the substrate is smaller than the orthographic projection area of ​​the second film layer on the substrate, and the orthographic projection area of ​​the first film layer on the substrate is smaller than the orthographic projection area of ​​the third film layer on the substrate.

[0040] According to any of the aforementioned embodiments of the first aspect of the present application, an orthographic projection area of ​​the third film layer on the substrate is smaller than an orthographic projection area of ​​the second film layer on the substrate.

[0041] According to any of the aforementioned embodiments of the first aspect of the present application, the second extension length is a dimension of the second film layer protruding from the first film layer in a direction toward the isolation opening.

[0042] According to any of the aforementioned embodiments of the first aspect of the present application, the display panel also includes: a pixel definition layer located on the substrate, the pixel definition layer includes a pixel defining portion and a pixel opening formed by the pixel defining portion, and the pixel opening and the isolation opening are arranged in communication.

[0043] According to any of the aforementioned implementations of the first aspect of the present application, the isolation structure is located on a side of the pixel defining portion facing away from the substrate.

[0044] According to any of the aforementioned embodiments of the first aspect of the present application, the light-emitting unit includes a second electrode, the second electrode is located between the substrate and the pixel definition layer, and at least a portion of the second electrode is exposed by the pixel opening.

[0045] According to any of the aforementioned embodiments of the first aspect of the present application, the display panel further includes: a first encapsulation layer located on the side of the light-emitting unit away from the substrate, and the first encapsulation layer includes multiple encapsulation parts located on the side of the corresponding light-emitting unit away from the substrate.

[0046] According to any of the aforementioned embodiments of the first aspect of the present application, light-emitting units with different luminous colors correspond to different packaging parts.

[0047] According to any of the aforementioned embodiments of the first aspect of the present application, the material of the first encapsulation layer includes an inorganic material.

[0048] According to any of the aforementioned implementations of the first aspect of the present application, the display panel further includes: a second encapsulation layer located on a side of the first encapsulation layer away from the substrate; and a third encapsulation layer located on a side of the second encapsulation layer away from the substrate.

[0049] According to any of the aforementioned embodiments of the first aspect of the present application, the material of the second encapsulation layer includes an organic material.

[0050] According to any of the aforementioned embodiments of the first aspect of the present application, the material of the third encapsulation layer includes an inorganic material.

[0051] According to any of the aforementioned embodiments of the first aspect of the present application, the second film layer includes a conductive material or an insulating material.

[0052] According to any of the aforementioned embodiments of the first aspect of the present application, the first film layer and the second film layer both include metal materials, and the materials of the first film layer and the second film layer are different.

[0053] According to a second aspect of the present application, there is provided a display panel, which comprises: a substrate; an isolation structure located on the substrate, the isolation structure enclosing a plurality of isolation openings, the isolation structure comprising a first film layer, a second film layer located on the side of the first film layer away from the substrate, and a third film layer located on the first film layer facing the substrate, the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the second film layer on the substrate, and the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the third film layer on the substrate; a light-emitting device layer located on the substrate, the light-emitting device layer comprising a plurality of light-emitting units, at least part of the light-emitting units being located within the isolation openings; the light-emitting units comprising a light-emitting portion and a first electrode; the first electrode being located on the side of the light-emitting portion away from the substrate, the first electrode being electrically connected to the third film layer; wherein an area of ​​the third film layer covered by the first electrode is an overlap area, and at least two light-emitting units have different overlap areas corresponding to the first electrodes, and / or a width of an overlapping portion of an orthographic projection of the first electrode on the substrate and an orthographic projection of the third film layer on the substrate is a first overlap width, and at least two light-emitting units have different first overlap widths corresponding to the first electrodes.

[0054] An embodiment of a third aspect of the present application provides a display device, which includes a display panel according to any of the above embodiments.

[0055] An embodiment of a fourth aspect of the present application provides a method for preparing a display panel, the method comprising:

[0056] An isolation structure is prepared on the substrate, the isolation structure encloses a plurality of isolation openings, the isolation structure includes a first film layer, a second film layer located on a side of the first film layer away from the substrate, and a third film layer located on a side of the first film layer facing the substrate, the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the second film layer on the substrate, and the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the third film layer on the substrate;

[0057] At least a partial film layer of a light-emitting device layer is prepared on a substrate, wherein the light-emitting device layer includes a plurality of light-emitting units, and the distance between the orthographic projection of an edge of the first film layer close to the light-emitting unit on the substrate and the orthographic projection of an edge of the third film layer close to the same light-emitting unit on the substrate is an extended distance, and there are at least two light-emitting units with different corresponding extended distances.

[0058] According to an implementation of the third aspect of the present application, in the step of preparing an isolation structure on a substrate, the method further includes:

[0059] Preparing an isolation material layer on the substrate, the isolation material layer comprising a third material layer, a first material layer, and a second material layer stacked in sequence in a direction away from the substrate;

[0060] Preparing a first barrier layer having a plurality of first openings on a side of the isolation material layer facing away from the substrate;

[0061] The isolation material layer is patterned through the first opening so that the second material layer forms a second film layer having a second opening; the second opening is a part of the isolation opening;

[0062] The first material layer is patterned through the second opening to form a first film layer, and the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the second film layer on the substrate.

[0063] According to any of the aforementioned embodiments of the third aspect of the present application, in the step of patterning the isolation material layer through the first opening to form the second film layer, the second material layer and a portion of the first material layer exposed by the first opening are removed.

[0064] According to any of the aforementioned embodiments of the third aspect of the present application, in the step of patterning the isolation material layer through the first opening to form a second film layer, a dry etching process is selected to pattern the isolation material layer through the first opening so that the second material layer forms a second film layer having a second opening.

[0065] According to any of the aforementioned embodiments of the third aspect of the present application, in the step of patterning the first material layer through the second opening to form the first film layer, a wet etching process is selected to pattern the first material layer through the second opening to form the first film layer.

[0066] According to any of the aforementioned embodiments of the third aspect of the present application, the material of the first barrier layer includes photoresist.

[0067] According to any of the aforementioned embodiments of the third aspect of the present application, the etching resistance of the third material layer to the chemical solution used in the wet etching process is greater than the etching resistance of the first material layer to the chemical solution used in the wet etching process.

[0068] According to any of the aforementioned embodiments of the third aspect of the present application, after the step of patterning the first material layer through the second opening to form the first film layer, the method further includes:

[0069] The third material layer is patterned through the first opening to form a third film layer.

[0070] According to any of the aforementioned embodiments of the third aspect of the present application, in the step of patterning the third material layer through the first opening, a dry etching process is selected to pattern the third material layer through the first opening to form a third film layer.

[0071] According to any of the aforementioned embodiments of the third aspect of the present application, after the step of patterning the third material layer through the first opening to form the third film layer, the method further includes:

[0072] The first film layer is patterned so that the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the third film layer on the substrate; the orthographic projection area of ​​the first film layer on the substrate is smaller than the orthographic projection area of ​​the third film layer on the substrate.

[0073] According to any of the aforementioned embodiments of the third aspect of the present application, in the step of patterning the first film layer so that the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the third film layer on the substrate, a wet etching process is selected to pattern the first film layer.

[0074] According to any of the aforementioned embodiments of the third aspect of the present application, the isolation opening includes a first isolation opening and a second isolation opening, and in the step of preparing at least a portion of the film layer of the light-emitting device layer on the substrate, the method further includes:

[0075] Sequentially preparing a first light-emitting material layer, a first electrode material layer and a first packaging material layer on a substrate;

[0076] The first light-emitting material layer, the first electrode material layer and the first packaging material layer are patterned to form a light-emitting portion of a first light-emitting unit corresponding to the first isolation opening, a first electrode and a first packaging portion located on a side of the first light-emitting unit away from the substrate.

[0077] According to any of the aforementioned embodiments of the third aspect of the present application, after the step of forming a light-emitting portion of a first light-emitting unit corresponding to the first isolation opening, a first electrode, and a first packaging portion located on a side of the first light-emitting unit away from the substrate, the method further includes:

[0078] Sequentially preparing a second light-emitting material layer, a second electrode material layer, and a second packaging material layer on the substrate;

[0079] The second light emitting material layer, the second electrode material layer and the second packaging material layer are patterned to form a light emitting portion of a second light emitting unit corresponding to the second isolation opening, a first electrode and a second packaging portion located on a side of the second light emitting unit away from the substrate.

[0080] According to any of the aforementioned embodiments of the third aspect of the present application, the extension distance corresponding to the first light-emitting unit is the first distance, the extension distance corresponding to the second light-emitting unit is the second distance, and the first distance is smaller than the second distance.

[0081] According to any of the aforementioned embodiments of the third aspect of the present application, the isolation opening further includes a third isolation opening, and after the step of forming a light-emitting portion of a second light-emitting unit corresponding to the second isolation opening, a first electrode, and a second packaging portion located on a side of the second light-emitting unit away from the substrate, the method further includes:

[0082] sequentially preparing a third light emitting material layer, a third electrode material layer and a third packaging material layer on the substrate;

[0083] The third light emitting material layer, the third electrode material layer and the third packaging material layer are patterned to form a light emitting portion of a third light emitting unit corresponding to the third isolation opening, a first electrode and a third packaging portion located on a side of the third light emitting unit away from the substrate.

[0084] According to any of the aforementioned embodiments of the third aspect of the present application, in the step of patterning the first light-emitting material layer, the first electrode material layer and the first encapsulation material layer, the method further comprises:

[0085] Performing dry etching on the first packaging material layer to form a first packaging part;

[0086] The first electrode material layer is wet-etched to form a first electrode of the first light-emitting unit.

[0087] According to any of the aforementioned embodiments of the third aspect of the present application, in the step of patterning the second light-emitting material layer, the second electrode material layer, and the second encapsulation material layer, the method further includes:

[0088] performing dry etching on the second packaging material layer to form a second packaging part;

[0089] The second electrode material layer is wet-etched to form the first electrode of the second light-emitting unit.

[0090] According to any of the aforementioned embodiments of the third aspect of the present application, in the step of patterning the third light-emitting material layer, the third electrode material layer and the third encapsulation material layer, the method further comprises:

[0091] performing dry etching on the third packaging material layer to form a third packaging part;

[0092] The third electrode material layer is wet-etched to form the first electrode of the third light-emitting unit.

[0093] According to any of the aforementioned embodiments of the third aspect of the present application, the extension distance corresponding to the third light-emitting unit is the third distance, and the second distance is smaller than the third distance.

[0094] According to the display panel of the embodiment of the present application, the display panel includes a substrate, an isolation structure and a light-emitting device layer. The first film layer, the second film layer and the third film layer are arranged to form an isolation structure, the orthographic projection of the first film layer arranged close to the substrate on the substrate is located within the orthographic projection of the second film layer on the substrate, the area of ​​the second film layer is larger than the area of ​​the first film layer, and the second film layer covers the surface of the first film layer close to the second film layer, and at this time, the first film layer is recessed relative to the second film layer in the direction away from the isolation opening. When preparing the light-emitting material layer in the light-emitting device layer, the light-emitting material layer in the light-emitting device layer has a large drop at the edge of the isolation structure, and the first film layer is concavely arranged relative to the second film layer, and the light-emitting material layer is difficult to connect at the edge of the isolation structure, so it breaks, and the light-emitting material layer breaks to form mutually disconnected light-emitting parts, thereby reducing the crosstalk of carriers in the light-emitting material layer, improving the display effect of the display panel, and the preparation of the light-emitting unit does not require the use of a precision mask plate, which can reduce the development and use of precision masks and reduce the preparation cost. The extension distances corresponding to at least two light-emitting units are different, and the extension distance of the isolation structure corresponding to some light-emitting units is larger. Since the peripheral side of the first electrode overlaps with the third film layer of the isolation structure, the overlapping area between the first electrode of the light-emitting unit with a larger extension distance and the third film layer of the isolation structure is larger, thereby reducing the overlapping impedance between the part of the first electrode and the isolation structure, thereby improving the light-emitting effect of the light-emitting unit and the performance of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0095] Other features, objects and advantages of the present application will become more apparent by reading the following detailed description of non-limiting embodiments with reference to the accompanying drawings, in which the same or similar reference numerals represent the same or similar features and the accompanying drawings are not drawn to scale.

[0096] Figure 1 is a partial cross-sectional view of a display panel provided in an embodiment of the present application;

[0097] Figure 2 is a partial cross-sectional view of a display panel provided by another embodiment;

[0098] Figure 3 is a partial cross-sectional view of a display panel provided by yet another embodiment;

[0099] Figure 4 is a partial cross-sectional view of a display panel provided in yet another embodiment;

[0100] Figure 5 is a partial cross-sectional view of a display panel provided by yet another embodiment;

[0101] Figure 6 is a partial cross-sectional view of a display panel provided by yet another embodiment;

[0102] Figure 7is a partial cross-sectional view of a display panel provided by yet another embodiment;

[0103] Figure 8 is a partial cross-sectional view of a display panel provided by yet another embodiment;

[0104] Fig. 9 is a partial cross-sectional view of a display panel provided by yet another embodiment;

[0105] Fig.10 is a partial cross-sectional view of a display panel provided by yet another embodiment;

[0106] Fig.11 is a partial cross-sectional view of a display panel provided by yet another embodiment;

[0107] Fig.12 It is a schematic flow chart of a method for preparing a display panel provided in an embodiment of the present application;

[0108] Figures 13 to 22 This is a diagram of a preparation process of a display panel provided in an embodiment of the present application.

[0109] Description of reference numerals:

[0110] 10. Display panel;

[0111] 100. Substrate;

[0112] 200, isolation structure; 210, first film layer; 220, second film layer; 221, second opening; 230, third film layer; 240, isolation opening; 241, first isolation opening; 242, second isolation opening; 243, third isolation opening;

[0113] 300, light emitting device layer; 310, light emitting unit; 311, first light emitting unit; 312, second light emitting unit; 313, third light emitting unit;

[0114] 400, light emitting unit; 410, first electrode;

[0115] 500, pixel definition layer; 510, pixel definition portion; 520, pixel opening; 530, second electrode;

[0116] 600, a first barrier layer; 610, a first opening;

[0117] 700, a first encapsulation layer; 710, a second encapsulation layer; 720, a third encapsulation layer;

[0118] D0, extension distance; D1, first distance; D2, second distance; D3, third distance;

[0119] d0, first overlap width; d1, first width; d2, second width; d3, third width;

[0120] d4, second overlap width;

[0121] H0, protrusion length;

[0122] L0, first extension length;

[0123] L1, first length; L2, second length; L3, third length. DETAILED DESCRIPTION

[0124] The features and exemplary embodiments of various aspects of the present application will be described in detail below. In order to make the purpose, technical solutions and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only configured to explain the present application and are not configured to limit the present application. For those skilled in the art, the present application can be implemented without the need for some of these specific details. The following description of the embodiments is only to provide a better understanding of the present application by illustrating the examples of the present application.

[0125] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the statement "include..." do not exclude the presence of other identical elements in the process, method, article or device including the elements.

[0126] It should be understood that when describing the structure of a component, when a layer or a region is referred to as being "on" or "over" another layer or another region, it may mean that it is directly on the other layer or another region, or that other layers or regions are included between it and the other layer or another region. Moreover, if the component is turned over, the layer or a region will be "below" or "beneath" another layer or another region.

[0127] Embodiments of the present application provide a display panel, a display device, and a method for manufacturing a display panel. Embodiments of the display panel, the display device, and the method for manufacturing a display panel are described below in conjunction with the accompanying drawings.

[0128] An embodiment of the present application provides a display panel, which may be an organic light emitting diode (OLED) display panel.

[0129] See also Figure 1 , Figure 1 It is a partial cross-sectional view of a display panel provided in an embodiment of the present application.

[0130] like Figure 1 As shown, a first aspect of the present application provides a display panel 10 , which includes: a substrate 100 , an isolation structure 200 and a light-emitting device layer 300 .

[0131] The isolation structure 200 is located on the substrate 100, and the isolation structure 200 encloses a plurality of isolation openings 240. The isolation structure 200 includes a first film layer 210, a second film layer 220 located on the side of the first film layer 210 away from the substrate 100, and a third film layer 230 located on the side of the first film layer 210 facing the substrate 100. The orthographic projection of the first film layer 210 on the substrate 100 is located within the orthographic projection of the second film layer 220 on the substrate 100, and the orthographic projection of the first film layer 210 on the substrate 100 is located within the orthographic projection of the third film layer 230. The light-emitting device layer 300 is located on the substrate 100, and the light-emitting device layer 300 includes a plurality of light-emitting units 310, and at least a portion of the light-emitting units 310 is located in the isolation opening 240, wherein the distance between the edge of the first film layer 210 close to the light-emitting unit 310 in the orthographic projection of the substrate 100 and the edge of the third film layer 230 close to the same light-emitting unit 310 in the orthographic projection of the substrate 100 is the extension distance D0, and there are at least two light-emitting units 310 with different extension distances D0.

[0132] The extension distance D0 corresponding to the light emitting unit 310 refers to the extension distance D0 of the isolation structure 200 on the peripheral side of the isolation opening 240 where the light emitting unit 310 is located, that is, the extension distance D0 formed by the first film layer 210 and the third film layer 230 on the side close to the light emitting unit 310. The extension distance D0 may be the dimension of the third film layer 230 protruding from the first film layer 210 in the direction toward the isolation opening 240.

[0133] According to the display panel 10 of the embodiment of the present application, the display panel 10 includes a substrate 100, an isolation structure 200 and a light-emitting device layer 300. The first film layer 210, the second film layer 220 and the third film layer 230 are arranged to form the isolation structure 200, the orthographic projection of the first film layer 210 arranged close to the substrate 100 on the substrate 100 is located within the orthographic projection of the second film layer 220 on the substrate 100, the area of ​​the second film layer 220 is larger than the area of ​​the first film layer 210, the second film layer 220 covers the surface of the first film layer 210 close to the second film layer 220, and at this time, the first film layer 210 is recessed relative to the second film layer 220 in a direction away from the isolation opening 240. When preparing the light-emitting material layer in the light-emitting device layer 300, the light-emitting material layer in the light-emitting device layer 300 has a large drop at the edge of the isolation structure 200, and the first film layer 210 is concavely arranged relative to the second film layer 220. The light-emitting material layer in the light-emitting device layer 300 is difficult to connect at the edge of the isolation structure 200, and thus breaks. The light-emitting material layer in the light-emitting device layer 300 breaks to form light-emitting portions 400 that are disconnected from each other, thereby reducing crosstalk of carriers in the light-emitting material layer and improving the display effect of the display panel 10. In addition, the light-emitting unit 310 can be prepared without using a precision mask plate, which can reduce the development and use of precision masks and reduce preparation costs. The extension distances D0 corresponding to at least two light-emitting units 310 are different, and the extension distance D0 of the isolation structure 200 corresponding to some of the light-emitting units 310 is larger. Since the peripheral side of the first electrode 410 overlaps with the third film layer 230 of the isolation structure 200, the overlapping area between the first electrode 410 and the third film layer 230 of the isolation structure 200 of the light-emitting unit 310 corresponding to the larger extension distance D0 is larger, thereby reducing the overlapping impedance between the part of the first electrode 410 and the isolation structure 200, thereby improving the light-emitting effect of the light-emitting unit 310 and the performance of the display panel 10.

[0134] In order to obtain the first film layer 210 with a concave setting, the first film layer 210 has a faster etching rate than the second film layer 220 and the third film layer 230 during the etching process, thereby forming the concave first film layer 210. Since the etching rate of the first film layer 210 is faster, the waste generated by etching is more likely to enter other positions of the display panel 10, thereby causing adverse effects. After the third film layer 230 is set, the first film layer 210 can be well attached to the third film layer 230, and the generated etching waste falls on the third film layer 230, which is easy to clean.

[0135] There are many ways to set the substrate 100. For example, the substrate 100 may include a substrate and an array substrate arranged on the substrate. Alternatively, the substrate 100 is the substrate. Alternatively, the substrate 100 includes a buffer layer and a support plate on a side away from the substrate.

[0136] The composition, preparation, etc. of the isolation structure 200 are described in patents CN118251982A, 202410864269.8, PCT / CN2024 / 098407, PCT / CN2024 / 102783, PCT / CN2024 / 098217, PCT / CN2024 / 099419, PCT / CN2024 / 099072, and C Further description is provided in N117979755A, CN117998900A, CN117062489A, CN117580403A, CN116583155A, CN116669477A, ​​CN117396039A, CN116669480A, CN116600606A, and CN117500332A for reference.

[0137] In some optional embodiments, the material of the third film layer 230 includes at least one of titanium nitride, titanium, and molybdenum nitride.

[0138] In these optional embodiments, materials such as titanium nitride, titanium, and molybdenum nitride have good wet etching resistance. When the display panel 10 is subjected to a wet etching process, the surface of the third film layer 230 of materials such as titanium nitride, titanium, and molybdenum nitride is difficult to oxidize, and the third film layer 230 always maintains good electrical conductivity, thereby avoiding the problem that the first film layer 210 overlaps with the first electrode 410 and the surface of the first film layer 210 is oxidized, resulting in reduced electrical conductivity of the first film layer 210, excessive overlap impedance between the first electrode 410, and reduced display effect of the display panel 10. The material of the third film layer 230 can also be other wet etching resistant materials that are difficult to oxidize, thereby maintaining good electrical conductivity, so that there is a lower overlap impedance between the third film layer 230 and the first electrode 410.

[0139] In some optional embodiments, the extension distances D0 corresponding to the plurality of light emitting units 310 with the same light emitting color are the same.

[0140] In these optional embodiments, the first electrode 410 corresponding to the light-emitting units 310 with the same light-emitting color has the same overlap area with the third film layer 230 of the isolation structure 200, so that the overlap impedance between the first electrode 410 and the third film layer 230 is similar or the same, and the light-emitting units 310 with the same color have similar or the same light-emitting effect, thereby improving the display uniformity of the display panel 10. When the extension distances D0 corresponding to the light-emitting units 310 with the same color are the same, it is convenient to compare the extension distances D0 corresponding to the light-emitting units 310 with different colors.

[0141] See also Figure 2 , Figure 2 is a partial cross-sectional view of a display panel provided by another embodiment.

[0142] like Figure 2 As shown, in some optional embodiments, the light-emitting unit 310 includes a first light-emitting unit 311 and a second light-emitting unit 312, the extension distance D0 corresponding to the first light-emitting unit 311 is a first distance D1, the extension distance D0 corresponding to the second light-emitting unit 312 is a second distance D2, and the first distance D1 is less than or equal to the second distance D2.

[0143] The extension distance D0 corresponding to the first light-emitting unit 311 refers to the extension distance D0 of the isolation structure 200 on the peripheral side of the isolation opening 240 where the first light-emitting unit 311 is located, that is, the extension distance D0 formed by the first film layer 210 and the third film layer 230 on the side close to the first light-emitting unit 311. The extension distance D0 corresponding to the second light-emitting unit 312 refers to the extension distance D0 of the isolation structure 200 on the peripheral side of the isolation opening 240 where the second light-emitting unit 312 is located, that is, the extension distance D0 formed by the first film layer 210 and the third film layer 230 on the side close to the second light-emitting unit 312.

[0144] In these optional embodiments, the first distance D1 is less than or equal to the second distance D2. For example, the peripheral sides of the first electrode 410 corresponding to the first light-emitting unit 311 and the second light-emitting unit 312 overlap with the third film layer 230 of the isolation structure 200, and the extension distance D0 of the isolation structure 200 corresponding to the second light-emitting unit 312 is larger, so that the overlapping area between the first electrode 410 located in the second light-emitting unit 312 and the third film layer 230 of the isolation structure 200 is larger, thereby reducing the overlapping impedance between the part of the first electrode 410 and the isolation structure 200, thereby improving the light-emitting effect of the second light-emitting unit 312.

[0145] See also Figure 3 , Figure 3 is a partial cross-sectional view of a display panel provided by yet another embodiment.

[0146] like Figure 3 As shown, in some optional embodiments, the light emitting unit 310 further includes a third light emitting unit 313, the extension distance D0 corresponding to the third light emitting unit 313 is a third distance D3, and the second distance D2 is less than or equal to the third distance D3.

[0147] The extension distance D0 corresponding to the third light emitting unit 313 refers to the extension distance D0 of the isolation structure 200 around the isolation opening 240 where the third light emitting unit 313 is located, that is, the extension distance D0 formed by the first film layer 210 and the third film layer 230 on the side close to the third light emitting unit 313 .

[0148] In these optional embodiments, the second distance D2 is less than or equal to the third distance D3. For example, the peripheral sides of the first electrode 410 corresponding to the second light-emitting unit 312 and the third light-emitting unit 313 overlap with the third film layer 230 of the isolation structure 200, and the extension distance D0 of the isolation structure 200 corresponding to the third light-emitting unit 313 is larger, so that the overlapping area between the first electrode 410 located in the third light-emitting unit 313 and the third film layer 230 of the isolation structure 200 is larger, thereby reducing the overlapping impedance between the portion of the first electrode 410 and the isolation structure 200, thereby improving the light-emitting effect of the third light-emitting unit 313.

[0149] See also Figure 4 , Figure 4 is a partial cross-sectional view of a display panel provided in yet another embodiment.

[0150] like Figure 4 As shown, optionally, the first distance D1 is less than or equal to the second distance D2, and the second distance D2 is less than or equal to the third distance D3. At least two of the first distance D1, the second distance D2, and the third distance D3 are different.

[0151] Optionally, the first light emitting unit 311, the second light emitting unit 312, and the third light emitting unit 313 have different light emitting colors. The light emitting color of the first light emitting unit 311 may be one of red, green, and blue. The light emitting color of the second light emitting unit 312 may be one of red, green, and blue. The light emitting color of the third light emitting unit 313 may be one of red, green, and blue. For example, the first light emitting unit 311 is a red light emitting unit 310, the second light emitting unit 312 is a green light emitting unit 310, and the third light emitting unit 313 is a blue light emitting unit 310.

[0152] In some optional embodiments, the light-emitting unit includes: a light-emitting portion 400 and a first electrode 410 , the first electrode 410 is located on a side of the light-emitting portion 400 away from the substrate 100 , and the first electrode 410 (eg, a cathode) is electrically connected to the isolation structure 200 .

[0153] In these optional embodiments, the mutually spaced first electrodes 410 are electrically connected through the isolation structure 200 to form a whole-surface electrode, thereby ensuring normal light emission of the light-emitting unit 310 .

[0154] Optionally, the first distance D1, the second distance D2, and the third distance D3 are equal. When each isolation opening 240 is etched and formed separately and the corresponding light-emitting unit 310 and the encapsulation part are prepared, the first distance D1, the second distance D2, and the third distance D3 of the isolation structure 200 finally obtained can be equal. For example, the isolation opening 240 corresponding to the first light-emitting unit 311 is etched, and the light-emitting part 400, the first electrode 410, and the encapsulation part of the first light-emitting unit 311 are prepared, and then the isolation opening 240 corresponding to the second light-emitting unit 312 is etched, and the light-emitting part 400, the first electrode 410, and the encapsulation part of the second light-emitting unit 312 are prepared, and finally the isolation opening 240 corresponding to the third light-emitting unit 313 is etched, and the light-emitting part 400, the first electrode 410, and the encapsulation part of the third light-emitting unit 313 are prepared.

[0155] In some optional embodiments, in the same light-emitting unit 310 , the orthographic projection of the light-emitting portion 400 on the substrate 100 is located within the orthographic projection of each first electrode 410 on the substrate 100 .

[0156] In these optional embodiments, the orthographic projection of the light-emitting portion 400 of the light-emitting unit 310 on the substrate 100 is located within the orthographic projection of the first electrode 410 on the substrate 100, that is, the first electrode 410 is arranged to cover the light-emitting portion 400 to serve as an electrode of the light-emitting portion 400, thereby ensuring normal light emission of the light-emitting portion 400 and improving the display effect of the display panel 10.

[0157] Optionally, the light-emitting portion 400 is spaced apart from the isolation structure 200 , that is, the light-emitting units 310 are spaced apart from each other, thereby reducing the crosstalk of carriers between the light-emitting portions 400 and improving the color crosstalk problem of the light-emitting portion 400 .

[0158] Optionally, the first electrode 410 and the third film layer 230 are electrically connected, and there is a good overlapping effect between the first electrode 410 and the third film layer 230, which can avoid the problem that the first film layer 210 overlaps with the first electrode 410 and the surface of the first film layer 210 is oxidized, resulting in reduced conductivity of the first film layer 210, excessive overlapping impedance with the first electrode 410, and reduced display effect of the display panel 10.

[0159] In some optional embodiments, the area of ​​the third film layer 230 covered by the first electrode 410 is the overlapping area, and the overlapping areas corresponding to the first electrodes 410 of at least two light-emitting units 310 are different.

[0160] In these optional embodiments, the peripheral side of the first electrode 410 overlaps with the third film layer 230 of the isolation structure 200, and the overlapping area between the first electrode 410 corresponding to a part of the light-emitting unit 310 and the third film layer 230 of the isolation structure 200 is larger, thereby reducing the overlapping impedance between the part of the first electrode 410 and the isolation structure 200, thereby improving the light-emitting effect of the light-emitting unit 310 and the performance of the display panel 10.

[0161] In some optional embodiments, the overlapping areas corresponding to the plurality of light emitting units 310 with the same light emitting color are the same.

[0162] The overlapping area corresponding to the light emitting unit 310 refers to the overlapping area between the first electrode 410 of the light emitting unit 310 and the third film layer 230 .

[0163] In these optional embodiments, the first electrodes 410 corresponding to the light-emitting units 310 with the same light-emitting color have the same overlapping area with the third film layer 230 of the isolation structure 200, so that the overlapping impedance between the first electrode 410 and the third film layer 230 is similar or the same, and the light-emitting units 310 with the same color have similar or the same light-emitting effect, thereby improving the display uniformity of the display panel 10. When the overlapping areas corresponding to the light-emitting units 310 with the same color are the same, it is convenient to compare the overlapping areas corresponding to the light-emitting units 310 with different colors.

[0164] In some optional embodiments, the light-emitting unit 310 includes a first light-emitting unit 311 and a second light-emitting unit 312, the overlapping area corresponding to the first light-emitting unit 311 is a first area, the overlapping area corresponding to the second light-emitting unit 312 is a second area, and the first area is less than or equal to the second area.

[0165] The overlapping area corresponding to the first light emitting unit 311 refers to the overlapping area between the first electrode 410 of the first light emitting unit 311 and the third film layer 230 , that is, the overlapping area between the first electrode 410 of the first light emitting unit 311 and the third film layer 230 .

[0166] The overlapping area corresponding to the second light emitting unit 312 refers to the overlapping area between the first electrode 410 of the second light emitting unit 312 and the third film layer 230 .

[0167] In these optional embodiments, the first area is less than or equal to the second area. For example, the first light-emitting unit 311 and the second light-emitting unit 312 overlap the peripheral side of the first electrode 410 corresponding to the third film layer 230 of the isolation structure 200, and the overlapping area between the first electrode 410 and the third film layer 230 corresponding to the second light-emitting unit 312 is larger, so that the overlapping impedance between the part of the first electrode 410 and the isolation structure 200 is reduced, and the light-emitting effect of the second light-emitting unit 312 is improved.

[0168] In some optional embodiments, the light emitting unit 310 further includes a third light emitting unit 313, the overlap area corresponding to the third light emitting unit 313 is a third area, and the second area is less than or equal to the third area. At least two of the first area, the second area, and the third area are different.

[0169] The overlapping area corresponding to the third light emitting unit 313 refers to the overlapping area between the first electrode 410 of the third light emitting unit 313 and the third film layer 230 .

[0170] In these optional embodiments, the second area is less than or equal to the third area. For example, the peripheral sides of the first electrode 410 corresponding to the second light-emitting unit 312 and the third light-emitting unit 313 overlap with the third film layer 230 of the isolation structure 200, and the overlapping area between the first electrode 410 and the third film layer 230 corresponding to the third light-emitting unit 313 is larger, thereby reducing the overlapping impedance between the portion of the first electrode 410 and the isolation structure 200, thereby improving the light-emitting effect of the third light-emitting unit 313.

[0171] See also Figure 5 , Figure 5 is a partial cross-sectional view of a display panel provided in yet another embodiment.

[0172] like Figure 5 As shown, in some optional embodiments, the width of the overlapping portion of the orthographic projection of the first electrode 410 on the substrate 100 and the orthographic projection of the third film layer 230 on the substrate 100 is a first overlap width d0, and there are at least two light-emitting units 310 whose first electrodes 410 correspond to different first overlap widths d0.

[0173] In these optional embodiments, the peripheral side of the first electrode 410 overlaps with the third film layer 230 of the isolation structure 200, and the first electrode 410 with a larger first overlap width d0 with the third film layer 230 has a larger overlap area with the third film layer 230 of the isolation structure 200, thereby reducing the overlap impedance between this portion of the first electrode 410 and the isolation structure 200, thereby improving the light-emitting effect of the light-emitting unit 310 and the performance of the display panel 10.

[0174] In some optional embodiments, the first overlapping width d0 corresponding to a plurality of light emitting units 310 with the same light emitting color is the same.

[0175] The first overlapping width d0 corresponding to the light emitting unit 310 refers to the overlapping width d0 between the first electrode 410 of the light emitting unit 310 and the third film layer 230 .

[0176] In these optional embodiments, the first electrodes 410 corresponding to the light-emitting units 310 with the same light-emitting color have the same first overlap width d0 as the third film layer 230 of the isolation structure 200, so that the overlap impedance between the first electrode 410 and the third film layer 230 is similar or the same, and the light-emitting units 310 with the same color have similar or the same light-emitting effect, thereby improving the display uniformity of the display panel 10. When the overlap areas corresponding to the light-emitting units 310 with the same color are the same, it is convenient to compare the overlap areas corresponding to the light-emitting units 310 with different colors.

[0177] See also Figure 5 and Figure 6 , Figure 6 is a partial cross-sectional view of a display panel provided in yet another embodiment.

[0178] like Figure 6 As shown, in some optional embodiments, the light-emitting unit includes a first light-emitting unit and a second light-emitting unit, the first overlap width d0 corresponding to the first light-emitting unit is the first width d1, the first overlap width d0 corresponding to the second light-emitting unit is the second width d2, and the first width d1 is less than or equal to the second width d2.

[0179] The first overlapping width d0 corresponding to the first light emitting unit 311 refers to the overlapping width d0 between the first electrode 410 of the first light emitting unit 311 and the third film layer 230 .

[0180] The first overlapping width d0 corresponding to the second light emitting unit 312 refers to the overlapping width d0 between the first electrode 410 of the second light emitting unit 312 and the third film layer 230 .

[0181] In these optional embodiments, the first width d1 is less than or equal to the second width d2. For example, the peripheral sides of the first electrode 410 corresponding to the first light-emitting unit 311 and the second light-emitting unit 312 overlap with the third film layer 230 of the isolation structure 200, and the first overlap width d0 of the first electrode 410 and the third film layer 230 corresponding to the second light-emitting unit 312 is larger, thereby reducing the overlap impedance between the portion of the first electrode 410 and the isolation structure 200, thereby improving the light-emitting effect of the second light-emitting unit 312.

[0182] In some optional embodiments, the light emitting unit 310 further includes a third light emitting unit 313 , the first overlapping width d0 corresponding to the third light emitting unit 313 is a third width d3 , and the second width d2 is less than or equal to the third width d3 .

[0183] The first overlapping width d0 corresponding to the third light emitting unit 313 refers to the overlapping width d0 between the first electrode 410 of the third light emitting unit 313 and the third film layer 230 .

[0184] In these optional embodiments, the second width d2 is less than or equal to the third width d3. For example, the peripheral sides of the first electrode 410 corresponding to the second light-emitting unit 312 and the third light-emitting unit 313 overlap with the third film layer 230 of the isolation structure 200, and the first overlap width d0 of the first electrode 410 and the third film layer 230 corresponding to the third light-emitting unit 313 is larger, thereby reducing the overlap impedance between the portion of the first electrode 410 and the isolation structure 200, thereby improving the light-emitting effect of the third light-emitting unit 313.

[0185] Optionally, at least two of the first width d1, the second width d2 and the third width d3 are different. Figure 7 , Figure 7 is a partial cross-sectional view of a display panel provided in yet another embodiment.

[0186] like Figure 7 As shown, optionally, the distance between the orthographic projection of the edge of the third film layer 230 close to the light-emitting unit 310 on the substrate 100 and the orthographic projection of the edge of the second film layer 220 close to the same light-emitting unit 310 on the substrate 100 is a protrusion length H0, and the protrusion length H0 corresponding to each light-emitting unit 310 is the same.

[0187] See also Figure 8 , Figure 8 is a partial cross-sectional view of a display panel provided in yet another embodiment.

[0188] like Figure 8 As shown, optionally, there are at least two light-emitting units 310 where the first electrodes 410 and the adjacent first film layers 210 have different second overlapping widths d4.

[0189] Optionally, the second overlap width d4 corresponding to the first light-emitting unit 311 is greater than or equal to the second overlap width d4 corresponding to the second light-emitting unit 312; optionally, the second overlap width d4 corresponding to the second light-emitting unit 312 is greater than or equal to the second overlap width d4 corresponding to the third light-emitting unit 313; optionally, at least two of the second overlap width d4 corresponding to the first light-emitting unit 311, the second overlap width d4 corresponding to the second light-emitting unit 312, and the second overlap width d4 corresponding to the third light-emitting unit 313 are different.

[0190] Optionally, the first electrodes 410 of a portion of the light-emitting units 310 overlap with the adjacent first film layer 210, and the first electrodes 410 of another portion of the light-emitting units 310 are spaced apart from the adjacent first film layer 210. Optionally, the first overlap width d0 is a dimension of the overlapped portion along the direction in which the orthographic projection of the side wall of the third film layer 230 toward the isolation opening 240 on the substrate 100 points to the orthographic projection of the side wall of the first film layer 210 toward the isolation opening 240 on the substrate 100.

[0191] Optionally, the second overlapping width d4 is a dimension of an overlapping portion between an edge of the first electrode 410 and the first film layer 210 along a direction away from the surface of the third film layer 230 and away from the substrate 100 .

[0192] See also Fig. 9 , Fig. 9 is a partial cross-sectional view of a display panel provided in yet another embodiment.

[0193] like Fig. 9 As shown, in some optional embodiments, the distance between the orthographic projection of the edge of the first film layer 210 close to the light-emitting unit 310 on the substrate 100 and the orthographic projection of the edge of the second film layer 220 close to the same light-emitting unit 310 on the substrate 100 is the first extension length L0, and the first extension length L0 is greater than or equal to 0.4 μm and less than or equal to 0.8 μm. For example, the extension length L0 is 0.4 μm, 0.5 μm, 0.65 μm, 0.8 μm, etc.

[0194] In these optional embodiments, the first extension length L0 is greater than or equal to 0.4 μm, which can improve the problem that when preparing the film layer (light-emitting layer) where the light-emitting portion is located, the light-emitting layer falls into the isolation opening 240 after the edge of the isolation structure 200 is broken, and it is easy to overlap with the isolation structure 200, and carrier crosstalk occurs between adjacent light-emitting units 310 due to the first extension length L0 being too small. The extension length L0 is less than or equal to 0.8 μm, which can improve the problem that the second film layer 220 protrudes too much relative to the first film layer 210 toward the isolation opening 240 due to the first extension length L0 being too large, and the second film layer 220 is suspended in a large size, and the risk of the suspended part of the second film layer 220 being warped or broken during the preparation process is greater.

[0195] In some optional embodiments, the light emitting unit 310 includes a first light emitting unit 311 and a second light emitting unit 312 , and a first extension length corresponding to the first light emitting unit 311 is less than or equal to a first extension length corresponding to the second light emitting unit 312 .

[0196] In some optional embodiments, the light emitting unit 310 further includes a third light emitting unit 313 , and the first extension length corresponding to the second light emitting unit 312 is less than or equal to the first extension length corresponding to the third light emitting unit 313 .

[0197] In some optional embodiments, the distance between the orthographic projection of the edge of the first film layer 210 close to the light-emitting unit 310 on the side close to the substrate 100 and the orthographic projection of the edge of the second film layer 220 close to the same light-emitting unit 310 on the substrate 100 is the second extension length; there are at least two light-emitting units 310 whose corresponding second extension lengths are different.

[0198] In some optional embodiments, the second extension lengths corresponding to the plurality of light emitting units 310 with the same light emitting color are the same.

[0199] The second extension length corresponding to the light emitting unit 310 refers to the distance between the edge of the orthographic projection of the first film layer 210 on the substrate 100 close to the light emitting unit 310 and the edge of the orthographic projection of the second film layer 220 on the substrate 100 close to the light emitting unit 310 .

[0200] In these optional embodiments, the first electrode 410 corresponding to the light-emitting units 310 with the same light-emitting color and the third film layer 230 of the isolation structure 200 have the same second extension length, so that the overlap impedance between the first electrode 410 and the third film layer 230 is similar or the same, and the light-emitting units 310 with the same color have similar or the same light-emitting effect, thereby improving the display uniformity of the display panel 10. When the overlap areas corresponding to the light-emitting units 310 with the same color are the same, it is convenient to compare the overlap areas corresponding to the light-emitting units 310 with different colors.

[0201] See also Fig. 9 and Fig.10 , Fig.10 is a partial cross-sectional view of a display panel provided in yet another embodiment.

[0202] like Fig. 9 and Fig.10 As shown, in some optional embodiments, the light-emitting unit 310 includes a first light-emitting unit 311 and a second light-emitting unit 312, the second extension length corresponding to the first light-emitting unit 311 is a first length L1, the second extension length corresponding to the second light-emitting unit 312 is a second length L2, and the first length L1 is less than or equal to the second length L2.

[0203] In these optional embodiments, the first length L1 is less than or equal to the second length L2. For example, the first film layer 210 is concave to a different extent relative to the second film layer 220 in a direction away from the isolation opening 240. The first film layer 210 is concave to a greater extent on the side close to the second light-emitting unit 312 than on the side close to the first light-emitting unit 311. When preparing the first electrode 410, the first light-emitting unit 311 and the second light-emitting unit 312 correspond to the peripheral side of the first electrode 410 overlap with the third film layer 230 of the isolation structure 200. The first electrode 410 corresponding to the second light-emitting unit 312 can fall into a larger area on the third film layer 230, thereby reducing the overlapping impedance between the portion of the first electrode 410 and the isolation structure 200, thereby improving the light-emitting effect of the second light-emitting unit 312.

[0204] In some optional embodiments, the light emitting unit 310 further includes a third light emitting unit 313, the second extension length corresponding to the third light emitting unit 313 is a third length L3, and the second length L2 is less than or equal to the third length L3. At least two of the first length L1, the second length L2, and the third length L3 are different.

[0205] In these optional embodiments, the second length L2 is less than or equal to the third length L3. For example, the first film layer 210 is concave to a different extent relative to the second film layer 220 in a direction away from the isolation opening 240. The first film layer 210 is concave to a greater extent on the side close to the third light-emitting unit 313 than on the side close to the second light-emitting unit 312. When preparing the first electrode 410, the peripheral sides of the first electrode 410 corresponding to the second light-emitting unit 312 and the third light-emitting unit 313 overlap with the third film layer 230 of the isolation structure 200. The first electrode 410 corresponding to the third light-emitting unit 313 can fall into a larger area on the third film layer 230, thereby reducing the overlapping impedance between the portion of the first electrode 410 and the isolation structure 200, thereby improving the light-emitting effect of the third light-emitting unit 313.

[0206] Optionally, the orthographic projection area of ​​the third film layer 230 on the substrate 100 is smaller than the orthographic projection area of ​​the second film layer 220 on the substrate 100 .

[0207] Optionally, the first extension length L0 is a dimension of the second film layer 220 protruding from the first film layer 210 along a direction toward the isolation opening 240 .

[0208] Optionally, the second extension length is a dimension of the second film layer 220 protruding from the first film layer 210 along a direction toward the isolation opening 240 .

[0209] In some optional embodiments, the display panel 10 further includes: a pixel definition layer 500 located on the substrate 100, the pixel definition layer 500 includes a pixel defining portion 510 and a pixel opening 520 formed by the pixel defining portion 510, and the pixel opening 520 and the isolation opening 240 are connected to each other.

[0210] In these optional embodiments, the pixel opening 520 formed by the pixel defining portion 510 is used to define the light emitting area of ​​the display panel 10. The pixel opening 520 is connected to the isolation opening 240 to reduce the shielding of the pixel opening 520 by the isolation structure 200, thereby ensuring the light emitting effect of the display panel 10.

[0211] In some optional embodiments, the isolation structure 200 is located on a side of the pixel defining portion 510 that is away from the substrate 100. Alternatively, the pixel defining layer 500 is provided with a clearance opening, and the isolation structure 200 is located in the clearance opening.

[0212] In these optional embodiments, the isolation structure 200 is disposed on the pixel defining portion 510, and the isolation structure 200 has a large height difference equivalent to the pixel opening 520. The film layer used to form the first electrode 410 and the light-emitting portion 400 of the light-emitting unit is more easily disconnected at the isolation structure 200, thereby reducing the difficulty of manufacturing the light-emitting unit 310.

[0213] In some optional embodiments, the light emitting unit 310 includes a second electrode 530, the second electrode 530 is located between the substrate 100 and the pixel definition layer 500, and at least a portion of the second electrode 530 is exposed by the pixel opening 520. The second electrode 530 may be an anode.

[0214] In these optional embodiments, the second electrode 530 is at least partially exposed by the pixel opening 520, that is, the orthographic projection of the second electrode 530 on the substrate 100 and the orthographic projection of the pixel opening 520 on the substrate 100 at least partially overlap, so as to serve as the electrode of the light-emitting unit 310 to ensure the light emission of the light-emitting unit 310. One of the second electrode 530 and the first electrode 410 serves as the anode of the light-emitting unit 310, and the other serves as the cathode of the light-emitting unit 310. The embodiment of the present application is described by taking the second electrode 530 as the anode of the light-emitting unit 310 and the first electrode 410 as the cathode of the light-emitting unit 310 as an example.

[0215] See also Fig.11 , Fig.11 is a partial cross-sectional view of a display panel provided in yet another embodiment.

[0216] like Fig.11 As shown, in some optional embodiments, the display panel 10 further includes: a first encapsulation layer 700, located on the side of the light-emitting device layer 300 away from the substrate 100, and the first encapsulation layer 700 includes a plurality of encapsulation parts, located on the side of the corresponding light-emitting unit 310 away from the substrate 100. Optionally, light-emitting units 310 with different luminous colors correspond to different encapsulation parts.

[0217] In these optional embodiments, at least part of the encapsulation portion of the first encapsulation layer 700 is disposed within the isolation opening 240 to encapsulate the light-emitting unit 310 within the isolation opening 240 , thereby reducing the invasion of water and oxygen into the light-emitting unit 310 and increasing the service life of the light-emitting unit 310 .

[0218] Optionally, the material of the first encapsulation layer 700 includes an inorganic material. The inorganic material has good density and good barrier properties against water vapor and oxygen.

[0219] Optionally, the display panel 10 further includes: a second encapsulation layer 710 located on a side of the first encapsulation layer 700 facing away from the substrate 100 .

[0220] Optionally, the display panel 10 further includes: a third encapsulation layer 720, which is located on a side of the second encapsulation layer 710 away from the substrate 100. The display panel 10 adopts three-layer encapsulation, has good encapsulation performance, and reduces the possibility of water and oxygen intrusion.

[0221] Optionally, the material of the second encapsulation layer 710 includes an organic material.

[0222] Optionally, the material of the third encapsulation layer 720 includes inorganic material. The first encapsulation layer 700, the second encapsulation layer 710 and the third encapsulation layer 720 are respectively encapsulated with inorganic material, organic material and inorganic material to form a TFE (Thin Film Encapsulation, TFE) thin film encapsulation structure to further improve the encapsulation performance.

[0223] In some optional embodiments, the second film layer 220 includes a conductive material or an insulating material.

[0224] In these optional embodiments, the second film layer 220 includes a conductive material, for example, the second film layer 220 includes a non-metallic conductive material or a metallic conductive material. When the second film layer 220 is a non-metallic conductive material or an insulating material, the second film layer 220 is difficult to be etched during wet etching of the first film layer 210 using an etching solution, so that the first film layer 210 is more easily concavely arranged relative to the second film layer 220.

[0225] In some optional embodiments, the first film layer 210 and the second film layer 220 include metal materials, and the first film layer 210 and the second film layer 220 are made of different materials.

[0226] In these optional embodiments, when both the first film layer 210 and the second film layer 220 are made of metal materials, an etching solution may be used to wet-etch the first film layer 210. By setting the etching solution, the etching rate of the second film layer 220 can be made lower than the etching rate of the first film layer 210. Since the etching rate of the first film layer 210 is relatively high, when the etching solution is used for wet etching, even if the second film layer 220 is etched to a certain extent, the first film layer 210 is etched faster, so that the first film layer 210 is concavely arranged relative to the second film layer 220.

[0227] Optionally, the second film layer 220 is made of titanium (Ti), the first film layer 210 is made of aluminum (Al), and the third film layer 230 is made of titanium nitride (TiN) or titanium or molybdenum nitride (MoN), that is, the isolation structure 200 is a three-layer metal composite material of Ti / Al / TiN (titanium / aluminum / titanium nitride) or Ti / Al / Ti (titanium / aluminum / titanium) or Ti / Al / MoN (titanium / aluminum / molybdenum nitride). Compared with the solution in which the third film layer 230 is molybdenum, the present application can reduce the size of the second film layer 220 protruding from the first film layer 210, thereby reducing the risk of the second film layer 220 protruding too large from the first film layer 210 and warping of the second film layer 220. In the solution where the third film layer 230 is molybdenum, light-emitting units 310 of different light-emitting colors are prepared step by step. For example, in the process of preparing the light-emitting portion 400 and the first electrode 410 of the light-emitting unit 310 of the first color, when wet etching the electrode material in the isolation opening 240 corresponding to the light-emitting units 310 of other light-emitting colors, the wet etching solution will etch away the portion of the third film layer 230 protruding from the first film layer 210. Therefore, it is necessary to perform side etching on the first film layer 210 in the isolation opening 240 corresponding to the light-emitting units 310 of other light-emitting colors with a developer after etching the electrode material and the light-emitting material, so that the third film layer 230 protrudes from the first film layer 210. As a result, the size of the second film layer 220 protruding from the first film layer 210 is too large. The larger the size of the second film layer 220 protruding from the first film layer 210 at the isolation opening 240 corresponding to the light-emitting unit 310 with a later preparation order, the more prone it is to warping or lifting.

[0228] Optionally, the light emitting portion 400 includes an electron injection layer (EIL), an electron transport layer (ETL), a light emitting material layer, a hole injection layer (HIL) and a hole transport layer (HTL).

[0229] like Figures 1 to 11As shown, the second embodiment of the present application provides a display panel 10, the display panel 11 includes: a substrate 100; an isolation structure 200, located on the substrate 100, the isolation structure 200 encloses a plurality of isolation openings 240, the isolation structure 200 includes a first film layer 210, a second film layer 220 located on the side of the first film layer 210 away from the substrate 100, and a third film layer 230 located on the side of the first film layer 210 facing the substrate 100, the orthographic projection of the first film layer 210 on the substrate 100 is located within the orthographic projection of the second film layer 220 on the substrate 100, and the orthographic projection of the first film layer 210 on the substrate 100 is located within the orthographic projection of the second film layer 220 on the substrate 100. The third film layer 230 is within the orthographic projection of the substrate 100; the light-emitting device layer 300 is located on the substrate 100, and the light-emitting device layer 300 includes a plurality of light-emitting units 310, and at least part of the light-emitting unit is located in the isolation opening 240; the light-emitting unit includes a light-emitting portion 400 and a first electrode 410; the first electrode 410 is located on the side of the light-emitting portion 400 away from the substrate 100, and the first electrode 410 is electrically connected to the third film layer 230; wherein, the area covered by the first electrode 410 on the third film layer 230 is the overlap area, and there are at least two light-emitting units 310 whose corresponding overlap areas are different. And / or, the width of the overlapping part of the orthographic projection of the first electrode 410 on the substrate 100 and the orthographic projection of the third film layer 230 on the substrate 100 is the first overlap width d0, and there are at least two light-emitting units 310 whose corresponding first overlap widths d0 are different.

[0230] According to the display panel 10 of the embodiment of the present application, the display panel 10 includes a substrate 100, an isolation structure 200 and a light-emitting device layer 300. The first film layer 210, the second film layer 220 and the third film layer 230 are arranged to form the isolation structure 200, the orthographic projection of the first film layer 210 arranged close to the substrate 100 on the substrate 100 is located within the orthographic projection of the second film layer 220 on the substrate 100, the area of ​​the second film layer 220 is larger than the area of ​​the first film layer 210, the second film layer 220 covers the surface of the first film layer 210 close to the second film layer 220, and at this time, the first film layer 210 is recessed relative to the second film layer 220 in a direction away from the isolation opening 240. When preparing the light-emitting material layer and the electrode material layer in the light-emitting device layer 300, the light-emitting material layer and the electrode material layer in the light-emitting device layer 300 have a large drop at the edge of the isolation structure 200, and the first film layer 210 is concavely arranged relative to the second film layer 220. The light-emitting material layer and the electrode material layer are difficult to connect at the edge of the isolation structure 200, and thus break. The light-emitting material layer and the electrode material layer break to form a light-emitting portion 400 and a first electrode 410 that are disconnected from each other, thereby reducing crosstalk of carriers in the light-emitting material layer and improving the display effect of the display panel 10. In addition, the light-emitting unit 310 can be prepared without using a precision mask plate, which can reduce the development and use of precision masks and reduce preparation costs. The overlapping areas corresponding to at least two light-emitting units 310 are different, and the overlapping areas of the isolation structure 200 corresponding to some of the light-emitting units 310 are larger. When preparing the first electrode 410, the peripheral side of the first electrode 410 overlaps with the third film layer 230 of the isolation structure 200, and the overlapping areas of the first electrode 410 corresponding to some of the light-emitting units 310 and the third film layer 230 of the isolation structure 200 are larger, thereby reducing the overlapping impedance between the part of the first electrode 410 and the isolation structure 200, thereby improving the light-emitting effect of the light-emitting unit 310 and the performance of the display panel 10.

[0231] The structural design in this embodiment can be applied to other display panels 10 , and the specific selection can be made according to actual conditions, and this application does not impose any specific restrictions on it.

[0232] The embodiment of the third aspect of the present application further provides a display device, comprising the display panel 10 of any of the above embodiments. Since the display device provided by the embodiment of the third aspect of the present application comprises the display panel 10 of any of the above embodiments, the display device provided by the embodiment of the third aspect of the present application has the beneficial effects of the display panel 10 of any of the above embodiments, which will not be described in detail here.

[0233] The display device in the embodiments of the present application includes but is not limited to mobile phones, personal digital assistants (PDAs), tablet computers, e-books, televisions, access control systems, smart landline phones, consoles, and other devices with display functions.

[0234] See also Figures 1 to 22 , Fig.12 It is a schematic flow chart of a method for preparing a display panel provided in an embodiment of the present application; Figures 12 to 22 This is a diagram of a preparation process of a display panel provided in an embodiment of the present application.

[0235] The fourth aspect of the present application also provides a method for preparing a display panel 10. The display panel 10 may be the display panel 10 provided in any of the above embodiments. Figures 1 to 22 As shown, the preparation method comprises:

[0236] Step S01: Prepare an isolation structure on a substrate, the isolation structure encloses a plurality of isolation openings, the isolation structure includes a first film layer, a second film layer located on the side of the first film layer facing away from the substrate, and a third film layer located on the side of the first film layer facing the substrate, the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the second film layer on the substrate, and the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the third film layer on the substrate.

[0237] Step S02: Prepare at least a partial film layer of a light-emitting device layer on a substrate, wherein the light-emitting device layer includes a plurality of light-emitting units, and the distance between the orthographic projection of an edge of the first film layer close to the light-emitting unit on the substrate and the orthographic projection of an edge of the third film layer close to the same light-emitting unit on the substrate is the extended distance, and there are at least two light-emitting units with different corresponding extended distances.

[0238] According to the preparation method of the fourth aspect of the present application, an isolation structure 200 is prepared by step S01, and a first film layer 210, a second film layer 220 and a third film layer 230 are arranged to form an isolation structure 200. The orthographic projection of the first film layer 210 arranged close to the substrate 100 on the substrate 100 is located within the orthographic projection of the second film layer 220 on the substrate 100. The area of ​​the second film layer 220 is larger than the area of ​​the first film layer 210. The second film layer 220 covers the surface of the first film layer 210 close to the second film layer 220. At this time, the first film layer 210 is recessed relative to the second film layer 220 in a direction away from the isolation opening 240. The light-emitting material layer in the light-emitting device layer 300 is prepared through step S02. When preparing the light-emitting material layer, the light-emitting material layer has a large drop at the edge of the isolation structure 200, and the first film layer 210 is concavely arranged relative to the second film layer 220. The light-emitting material layer is difficult to connect at the edge of the isolation structure 200, and thus breaks. The light-emitting material layer breaks to form light-emitting parts that are disconnected from each other, thereby reducing crosstalk of carriers in the light-emitting material layer and improving the display effect of the display panel 10. In addition, the light-emitting unit 310 can be prepared without using a precision mask plate, which can reduce the development and use of precision masks and reduce preparation costs. The extension distances D0 corresponding to at least two light-emitting units 310 are different. When preparing the first electrode 410, the peripheral side of the first electrode 410 overlaps with the third film layer 230 of the isolation structure 200. The extension distance D0 of the isolation structure 200 corresponding to some light-emitting units 310 is larger, so that the overlapping area between the first electrode 410 and the third film layer 230 of the isolation structure 200 is larger, thereby reducing the overlapping impedance between the part of the first electrode 410 and the isolation structure 200, thereby improving the light-emitting effect of the light-emitting unit 310 and the performance of the display panel 10.

[0239] In some optional embodiments, in step S01, the method further includes:

[0240] An isolation material layer is prepared on the substrate 100. The isolation material layer includes a third material layer, a first material layer, and a second material layer stacked in sequence in a direction away from the substrate 100. Fig.13 ;

[0241] A first barrier layer 600 having a plurality of first openings 610 is prepared on the side of the isolation material layer facing away from the substrate 100, as shown in FIG. Fig.14 ;

[0242] The isolation material layer is patterned through the first opening 610, so that the second material layer forms a second film layer 220 having a second opening 221; the second opening 221 is a part of the isolation opening 240, see Fig.15 .

[0243] The first material layer is patterned through the second opening 221 to form a first film layer 210 , and the orthographic projection of the first film layer 210 on the substrate 100 is located within the orthographic projection of the second film layer 220 on the substrate 100 .

[0244] In these optional embodiments, a first barrier layer 600 having a first opening 610 is provided to partially cover the isolation material layer, so as to achieve etching blocking protection for the portion that does not need to be etched, and then the isolation material layer is patterned through the first opening 610, and a portion of the second material layer is removed to form a second film layer 220 having a second opening 221. After the second opening 221 is formed, the first material layer can be further patterned through the second opening 221 to form a first film layer 210, and the orthographic projection of the first film layer 210 disposed close to the substrate 100 on the substrate 100 is located within the orthographic projection of the second film layer 220 on the substrate 100, the area of ​​the second film layer 220 is larger than the area of ​​the first film layer 210, and the second film layer 220 covers the surface of the first film layer 210 close to the second film layer 220, and at this time, the first film layer 210 is recessed relative to the second film layer 220 in a direction away from the isolation opening 240. When preparing the light-emitting material layer and the electrode material layer in the light-emitting device layer 300, the light-emitting material layer and the electrode material layer have a large drop at the edge of the isolation structure 200, and the first film layer 210 is concavely arranged relative to the second film layer 220. The light-emitting material layer and the electrode material layer are difficult to connect at the edge of the isolation structure 200, and thus break. The electrode material layer breaks to form mutually disconnected first electrodes 410, and the light-emitting material layer breaks to form mutually disconnected light-emitting portions 400, thereby reducing crosstalk of carriers in the light-emitting portion 400 and improving the display effect of the display panel 10. In addition, the light-emitting unit 310 can be prepared without the use of a precision mask plate, which can reduce the development and use of precision masks and reduce preparation costs.

[0245] Optionally, in the step of patterning the isolation material layer through the first opening 610 to form the second film layer 220, the second material layer and a portion of the first material layer exposed by the first opening 610 are removed. When the second material layer is patterned, a portion of the first material layer is etched away at the same time. Fig.15 For example, a groove connected to the second opening 221 and the first opening 610 is formed on the first material layer, so that the first material layer is etched to form a depression, which is convenient for subsequent etching using a wet etching solution. For example, in this step, the first material layer is not etched through, and the groove does not penetrate the first material layer.

[0246] Optionally, in the step of patterning the isolation material layer through the first opening 610 to form the second film layer 220, a dry etching process is selected to pattern the isolation material layer through the first opening 610, so that the second material layer forms a second film layer 220 having a second opening 221. The dry etching process can better etch and remove the second material layer, thereby avoiding the second material layer from having residual residue in the first opening 610 area, which affects the subsequent etching of the first material layer.

[0247] Optionally, in the step of patterning the first material layer through the second opening 221 to form the first film layer 210, a wet etching process is selected to pattern the first material layer through the second opening 221 to form the first film layer 210. The wet etching process can better etch and remove the first material layer, so that the orthographic projection of the formed first film layer 210 on the substrate 100 can be located within the orthographic projection of the second film layer 220 on the substrate 100. Fig.16 For example, in this step, the first material layer is etched through, and the groove runs through the first material layer. For example, the orthographic projection area of ​​the first film layer 210 on the substrate 100 is smaller than the orthographic projection area of ​​the second film layer 220 on the substrate 100.

[0248] Optionally, the material of the first barrier layer 600 includes photoresist, which is easy to obtain and has a good etching barrier effect.

[0249] Optionally, the etching resistance of the third material layer to the chemical solution used in the wet etching process is greater than the etching resistance of the first material layer to the chemical solution used in the wet etching process.

[0250] In some optional embodiments, after the step of patterning the first material layer through the second opening 221 to form the first film layer 210, the method further includes:

[0251] The third material layer is patterned through the first opening 610 to form a third film layer 230. Fig.17 .

[0252] In these optional embodiments, after the first material layer is wet-etched, the third material layer is exposed from the first opening 610, and the third material layer is etched through the first opening 610 to remove the third material layer located in the first opening 610 area to form a third film layer 230, so that when the first electrode 410 is subsequently prepared, the first electrode 410 can overlap with the third film layer 230.

[0253] Optionally, in the step of patterning the third material layer through the first opening 610, a dry etching process is selected to pattern the third material layer through the first opening 610 to form a third film layer 230. Since the third material layer is a wet-etching-resistant material, the dry etching process can better etch and remove the third material layer, thereby forming the third film layer 230.

[0254] Optionally, after the step of patterning the third material layer through the first opening 610 to form the third film layer 230 , the method further includes:

[0255] The first film layer 210 is patterned so that the orthographic projection of the first film layer 210 on the substrate 100 is located within the orthographic projection of the third film layer 230 on the substrate 100; the orthographic projection area of ​​the first film layer 210 on the substrate 100 is smaller than the orthographic projection area of ​​the third film layer 230 on the substrate 100, which can be seen in Fig.18 .

[0256] In these optional embodiments, after the third film layer 230 is formed, the first film layer 210 is patterned so that the first film layer 210 shrinks inward relative to the third film layer 230 in a direction away from the isolation opening 240, and the surface of the third film layer 230 away from the substrate 100 is gradually exposed, thereby facilitating the subsequent overlap of the third film layer 230 and the first electrode 410.

[0257] Optionally, in the step of patterning the first film layer 210 so that the orthographic projection of the first film layer 210 on the substrate 100 is located within the orthographic projection of the third film layer 230 on the substrate 100, a wet etching process is selected to pattern the first film layer 210. The wet etching process can better etch and remove the first film layer 210 so that the orthographic projection of the first film layer 210 on the substrate 100 can be located within the orthographic projection of the third film layer 230 on the substrate 100.

[0258] Optionally, after patterning the first film layer 210 so that the orthographic projection of the first film layer 210 on the substrate 100 is located within the orthographic projection of the third film layer 230 on the substrate 100 , the pixel definition layer 500 is patterned to form the pixel opening 520 .

[0259] Optionally, before preparing the isolation structure 200 , the second electrode 530 may be formed.

[0260] In some optional embodiments, the isolation opening 240 includes a first isolation opening 241 and a second isolation opening 242, or the isolation opening 240 includes a first isolation opening 241, a second isolation opening 242 and a third isolation opening 243. In the step of preparing at least a portion of the film layer of the light-emitting device layer 300 on the substrate 100, the method further includes:

[0261] A first light emitting material layer, a first electrode material layer and a first packaging material layer are sequentially prepared on the substrate 100 (for example, the first light emitting material layer, the first electrode material layer and the first packaging material layer may cover the first isolation opening 241, the second isolation opening 242 and the third isolation opening 243);

[0262] The first light-emitting material layer, the first electrode material layer and the first packaging material layer are patterned to form the light-emitting portion 400 of the first light-emitting unit 311 corresponding to the first isolation opening 241, the first electrode 410 and the first packaging portion located on the side of the first light-emitting unit 311 away from the substrate 100. In this step, the first light-emitting material layer, the first electrode material layer and the first packaging material layer of the second isolation opening 242 and / or the third isolation opening 243 are etched.

[0263] In these optional embodiments, at least part of the first light-emitting unit 311 is located within the first isolation opening 241 to achieve light emission in the area of ​​the first isolation opening 241; the first electrode 410 serves as an electrode of the light-emitting portion 400 of the first light-emitting unit 311 to drive the first light-emitting unit 311 to emit light; the first encapsulation portion is located on the side of the first light-emitting unit 311 away from the substrate 100 to achieve encapsulation of the first light-emitting unit 311.

[0264] In some optional embodiments, after the step of forming the light emitting portion 400 of the first light emitting unit 311 corresponding to the first isolation opening 241, the first electrode 410, and the first packaging portion located on the side of the first light emitting unit 311 away from the substrate 100, the method further includes:

[0265] A second light emitting material layer, a second electrode material layer and a second packaging material layer are sequentially prepared on the substrate 100 (for example, the second light emitting material layer, the second electrode material layer and the second packaging material layer may cover the first isolation opening 241, the second isolation opening 242 and the third isolation opening 243);

[0266] The second light-emitting material layer, the second electrode material layer, and the second packaging material layer are patterned to form the light-emitting portion 400 of the second light-emitting unit 312 corresponding to the second isolation opening 242, the first electrode 410, and the second packaging portion located on the side of the second light-emitting unit 312 away from the substrate 100. In this step, the second light-emitting material layer, the second electrode material layer, and the second packaging material layer of the first isolation opening 241 and / or the third isolation opening 243 are etched.

[0267] In these optional embodiments, at least part of the second light-emitting unit 312 is located in the second isolation opening 242 to realize light emission in the second isolation opening 242 area; the second packaging portion is located on the side of the second light-emitting unit 312 away from the substrate 100 to realize packaging of the second light-emitting unit 312.

[0268] In some optional embodiments, the isolation opening 240 further includes a third isolation opening 243. After the step of forming the light-emitting portion 400 of the second light-emitting unit 312 corresponding to the second isolation opening 242, the first electrode 410, and the second packaging portion located on the side of the second light-emitting unit 312 away from the substrate 100, the method further includes:

[0269] Sequentially preparing a third light emitting material layer, a third electrode material layer and a third encapsulation material layer on the substrate 100 (for example, the third light emitting material layer, the third electrode material layer and the third encapsulation material layer may cover the first isolation opening 241, the second isolation opening 242 and the third isolation opening 243);

[0270] The third light-emitting material layer, the third electrode material layer and the third packaging material layer are patterned to form the light-emitting portion 400 of the third light-emitting unit 313 corresponding to the third isolation opening 243, the first electrode 410 and the third packaging portion located on the side of the third light-emitting unit 313 away from the substrate 100. In this step, the second light-emitting material layer, the second electrode material layer and the second packaging material layer of the first isolation opening 241 and / or the second isolation opening 242 are etched.

[0271] In these optional embodiments, at least part of the third light emitting unit 313 is located in the third isolation opening 243 to realize light emission in the third isolation opening 243 area; the third encapsulation portion is located on the side of the third light emitting unit 313 away from the substrate 100 to realize encapsulation of the third light emitting unit 313.

[0272] In some optional embodiments, in the step of patterning the first light emitting material layer, the first electrode material layer and the first encapsulation material layer, the method further comprises:

[0273] Performing dry etching on the first packaging material layer to form a first packaging part;

[0274] The first electrode material layer is wet-etched to form the first electrode 410 of the first light emitting unit 311 .

[0275] In these optional embodiments, the portion of the first packaging material layer except the first isolation opening 241 is removed by dry etching to form a first packaging portion located at the first isolation opening 241; the portion of the first electrode material layer except the first isolation opening 241 is removed by wet etching to form a first electrode 410 located at the first isolation opening 241. A wet etching process is adopted in this step. After the wet etching solution enters the second isolation opening 242 and the third isolation opening 243, it etches the inner wall of the first film layer 210 toward the second isolation opening 242 and the third isolation opening 243, thereby increasing the extension distance D0 of the isolation structure 200 toward the second isolation opening 242 and the third isolation opening 243.

[0276] In some optional embodiments, in the step of patterning the second light emitting material layer, the second electrode material layer and the second encapsulation material layer, the method further comprises:

[0277] performing dry etching on the second packaging material layer to form a second packaging part;

[0278] The second electrode material layer is wet-etched to form the first electrode 410 of the second light emitting unit 312 .

[0279] In these optional embodiments, the portion of the second packaging material layer other than the second isolation opening 242 is removed by dry etching to form a second packaging portion located at the second isolation opening 242; the portion of the second electrode material layer other than the second isolation opening 242 is removed by wet etching to form a first electrode 410 located at the second isolation opening 242. In this step, a wet etching process is adopted. After the wet etching solution enters the third isolation opening 243, the inner wall of the first film layer 210 toward the third isolation opening 243 is etched, thereby further increasing the extension distance D0 of the isolation structure 200 toward the third isolation opening 243. The extension distance corresponding to the first light-emitting unit is the first distance, and the extension distance corresponding to the second light-emitting unit is the second distance, and the first distance is less than the second distance. The extension distance corresponding to the third light-emitting unit is the third distance, and the second distance is less than the third distance.

[0280] In some optional embodiments, in the step of patterning the third light emitting material layer, the third electrode material layer and the third encapsulation material layer, the method further comprises:

[0281] performing dry etching on the third packaging material layer to form a third packaging part;

[0282] The third electrode material layer is wet-etched to form the first electrode 410 of the third light-emitting unit 313 .

[0283] In these optional embodiments, the third packaging material layer except the third isolation opening 243 is removed by dry etching to form a third packaging part located at the third isolation opening 243; the third electrode material layer except the third isolation opening 243 is removed by wet etching to form a first electrode 410 located at the third isolation opening 243.

[0284] Optionally, at least two of the first isolation opening 241 , the second isolation opening 242 , and the third isolation opening 243 may not be prepared at the same time.

[0285] For example, the first isolation opening 241 and the second isolation opening 242 are first prepared, and then the light-emitting portion 400, the first electrode 410 and the first packaging portion of the first light-emitting unit 311 are prepared, and then the light-emitting portion 400, the first electrode 410 and the second packaging portion of the second light-emitting unit 312 are prepared, and then the third isolation opening 243 is prepared, and then the light-emitting portion 400, the first electrode 410 and the third packaging portion of the third light-emitting unit 313 are prepared. The extension distance D0, the first overlap width d0, the first extension length, the second extension length, and the second overlap width d4 corresponding to the first light-emitting unit 311 and the second light-emitting unit 312 are different. The extension distance D0, the first overlap width d0, the first extension length, the second extension length, and the second overlap width d4 corresponding to the first light-emitting unit 311 and the third light-emitting unit 313 are the same.

[0286] For example, the first isolation opening 241 is prepared first, and then the light-emitting portion 400, the first electrode 410 and the first packaging portion of the first light-emitting unit 311 are prepared, and then the second isolation opening 242 and the third isolation opening 243 are prepared, and then the light-emitting portion 400, the first electrode 410 and the second packaging portion of the second light-emitting unit 312 are prepared, and then the light-emitting portion 400, the first electrode 410 and the third packaging portion of the third light-emitting unit 313 are prepared. The extension distance D0, the first overlap width d0, the first extension length, the second extension length, and the second overlap width d4 corresponding to the second light-emitting unit 312 and the third light-emitting unit 313 are different. The extension distance D0, the first overlap width d0, the first extension length, the second extension length, and the second overlap width d4 corresponding to the first light-emitting unit 311 and the second light-emitting unit 312 are the same.

[0287] It should be understood that the various forms of processes shown above can be used to reorder, add or delete steps. For example, the steps described in the present invention can be executed in parallel, sequentially or in different orders, as long as the desired results of the technical solution of the present invention can be achieved, and this document does not limit this.

[0288] The above specific implementations do not constitute a limitation on the protection scope of the present invention. It should be understood by those skilled in the art that various modifications, combinations, sub-combinations and substitutions can be made according to design requirements and other factors. Any modification, equivalent substitution and improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

[0289] According to the embodiments described above, these embodiments do not describe all the details in detail, nor do they limit the invention to the specific embodiments described. Obviously, many modifications and changes can be made based on the above description. This specification selects and specifically describes these embodiments in order to better explain the principles and practical applications of the present application, so that those skilled in the art can make good use of the present application and the modifications based on the present application. The present application is limited only by the claims and their full scope and equivalents.

Claims

1. A display panel, characterized in that: The display panel comprises: substrate; an isolation structure, located on the substrate, the isolation structure encloses a plurality of isolation openings, the isolation structure comprises a first film layer, a second film layer located on a side of the first film layer away from the substrate, and a third film layer located on the first film layer facing the substrate, the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the second film layer on the substrate, and the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the third film layer on the substrate; a light emitting device layer, located on the substrate, the light emitting device layer comprising a plurality of light emitting units, at least part of the light emitting units being located in the isolation opening, Among them, the distance between the orthographic projection of the edge of the first film layer close to the light-emitting unit on the substrate and the orthographic projection of the edge of the third film layer close to the same light-emitting unit on the substrate is the extended distance, and there are at least two light-emitting units whose corresponding extended distances are different.

2. The display panel according to claim 1, characterized in that: The material of the third film layer includes at least one of titanium nitride, titanium, and molybdenum nitride; Preferably, the first film layer comprises a conductive material; Preferably, the second film layer comprises a conductive material or an insulating material; Preferably, both the first film layer and the second film layer include metal materials, and the materials of the first film layer and the second film layer are different.

3. The display panel according to claim 1, characterized in that: The extension distances corresponding to the plurality of light-emitting units having the same light-emitting color are the same; Preferably, the extension distance is a dimension of the third film layer protruding from the first film layer in a direction toward the isolation opening.

4. The display panel according to claim 1, characterized in that: The light-emitting unit includes a first light-emitting unit and a second light-emitting unit, the extension distance corresponding to the first light-emitting unit is a first distance, the extension distance corresponding to the second light-emitting unit is a second distance, and the first distance is less than or equal to the second distance; Preferably, the first light-emitting unit and the second light-emitting unit emit different colors of light.

5. The display panel according to claim 4, characterized in that: The light-emitting unit further includes a third light-emitting unit, the extension distance corresponding to the third light-emitting unit is a third distance, and the second distance is less than or equal to the third distance; Preferably, the first light-emitting unit, the second light-emitting unit and the third light-emitting unit emit different colors of light; and at least two of the first distance, the second distance and the third distance are different.

6. The display panel according to claim 1, characterized in that: The light emitting unit comprises: Light-emitting part; and a first electrode, the first electrode being located at a side of the light-emitting portion away from the substrate, the first electrode being electrically connected to the isolation structure; Preferably, in the same light-emitting unit, the orthographic projection of the light-emitting portion on the substrate is located within the orthographic projection of the first electrode on the substrate; Preferably, the light emitting portion and the isolation structure are spaced apart; Preferably, the first electrode and the third film layer are electrically connected; Preferably, in the same light-emitting unit, an orthographic projection area of ​​the light-emitting portion on the substrate is smaller than an orthographic projection area of ​​the first electrode on the substrate.

7. The display panel according to claim 6, characterized in that: The area covered by the first electrode on the third film layer is the overlapping area, and the overlapping areas corresponding to the first electrodes of at least two of the light-emitting units are different; Preferably, the overlapping areas corresponding to the plurality of light-emitting units with the same light-emitting color are the same.

8. The display panel according to claim 7, characterized in that: The light-emitting unit includes a first light-emitting unit and a second light-emitting unit, the overlapping area corresponding to the first light-emitting unit is a first area, the overlapping area corresponding to the second light-emitting unit is a second area, and the first area is less than or equal to the second area; Preferably, the first light-emitting unit and the second light-emitting unit emit different colors of light.

9. The display panel according to claim 8, characterized in that: The light-emitting unit further includes a third light-emitting unit, the overlapping area corresponding to the third light-emitting unit is a third area, and the second area is less than or equal to the third area; Preferably, the first light-emitting unit, the second light-emitting unit and the third light-emitting unit emit different colors of light, and at least two of the first area, the second area and the third area are different.

10. The display panel according to claim 6, characterized in that: The width of the overlapping portion of the orthographic projection of the first electrode on the substrate and the orthographic projection of the third film layer on the substrate is a first overlapping width, and the first overlapping widths corresponding to the first electrodes of at least two of the light-emitting units are different; Preferably, the first overlapping widths corresponding to the plurality of light-emitting units having the same light-emitting color are the same; Preferably, the light emitting unit includes a first light emitting unit and a second light emitting unit, the first overlapping width corresponding to the first light emitting unit is a first width, the first overlapping width corresponding to the second light emitting unit is a second width, and the first width is less than or equal to the second width; Preferably, the light-emitting unit further includes a third light-emitting unit, the first overlapping width corresponding to the third light-emitting unit is a third width, and the second width is less than or equal to the third width; Preferably, at least two of the first width, the second width and the third width are different; Preferably, there are at least two light-emitting units whose first electrodes have different second overlapping widths with the first film layers adjacent thereto; Preferably, the second overlapping width corresponding to the first light-emitting unit is greater than or equal to the second overlapping width corresponding to the second light-emitting unit; The second overlapping width corresponding to the second light-emitting unit is greater than or equal to the second overlapping width corresponding to the third light-emitting unit; At least two of the second overlapping width corresponding to the first light-emitting unit, the second overlapping width corresponding to the second light-emitting unit, and the second overlapping width corresponding to the third light-emitting unit are different; Alternatively, the first electrodes of a portion of the light-emitting units overlap with the first film layer adjacent thereto, and the first electrodes of another portion of the light-emitting units are spaced apart from the first film layer adjacent thereto; Preferably, the first overlap width is a dimension of the overlapped portion along the direction in which the orthographic projection of the side wall of the third film layer toward the isolation opening on the substrate points to the orthographic projection of the side wall of the first film layer toward the isolation opening on the substrate; Preferably, the second overlapping width is a dimension of an overlapping portion of an edge of the first electrode and the first film layer along a direction away from the surface of the third film layer and away from the substrate.

11. The display panel according to claim 1, characterized in that: The distance between the orthographic projection of the edge of the third film layer close to the light-emitting unit on the substrate and the orthographic projection of the edge of the second film layer close to the same light-emitting unit on the substrate is the protrusion length, and the protrusion length corresponding to each light-emitting unit is the same.

12. The display panel according to claim 1, characterized in that: The distance between the orthographic projection of the edge of the first film layer close to the light-emitting unit on the side away from the substrate and the orthographic projection of the edge of the second film layer close to the same light-emitting unit on the substrate is a first extension length, which is greater than or equal to 0.4 μm and less than or equal to 0.8 μm.

13. The display panel according to claim 1, characterized in that: The distance between the orthographic projection of the edge of the first film layer close to the light-emitting unit on one side of the substrate and the orthographic projection of the edge of the second film layer close to the same light-emitting unit on the substrate is a second extension length; The second extension lengths corresponding to at least two of the light-emitting units are different; Preferably, the second extension lengths corresponding to the plurality of light-emitting units with the same light-emitting color are the same; Preferably, the light-emitting unit includes a first light-emitting unit and a second light-emitting unit, the second extension length corresponding to the first light-emitting unit is a first length, the second extension length corresponding to the second light-emitting unit is a second length, and the first length is less than or equal to the second length; Preferably, the light-emitting unit further includes a third light-emitting unit, the second extension length corresponding to the third light-emitting unit is a third length, and the second length is less than or equal to the third length; Preferably, at least two of the first length, the second length, and the third length are different; Preferably, the orthographic projection area of ​​the first film layer on the substrate is smaller than the orthographic projection area of ​​the second film layer on the substrate, and the orthographic projection area of ​​the first film layer on the substrate is smaller than the orthographic projection area of ​​the third film layer on the substrate; Preferably, the orthographic projection area of ​​the third film layer on the substrate is smaller than the orthographic projection area of ​​the second film layer on the substrate; Preferably, the second extension length is a dimension of the second film layer protruding from the first film layer along a direction toward the isolation opening.

14. The display panel according to claim 1, characterized in that: The display panel further includes: A pixel definition layer, located on the substrate, the pixel definition layer comprises a pixel definition portion and a pixel opening formed by the pixel definition portion, the pixel opening and the isolation opening are connected; Preferably, the isolation structure is located on a side of the pixel defining portion away from the substrate; Preferably, the light emitting unit comprises a second electrode, the second electrode is located between the substrate and the pixel definition layer, and at least a portion of the second electrode is exposed by the pixel opening; Preferably, the display panel further includes: A first encapsulation layer is located on a side of the light emitting unit away from the substrate, wherein the first encapsulation layer includes a plurality of encapsulation parts located on a side of the corresponding light emitting unit away from the substrate; Preferably, the light-emitting units with different light-emitting colors correspond to different packaging parts; Preferably, the material of the first encapsulation layer includes an inorganic material; Preferably, the display panel further includes: a second encapsulation layer, located on a side of the first encapsulation layer away from the substrate; a third encapsulation layer, located on a side of the second encapsulation layer away from the substrate; Preferably, the material of the second encapsulation layer includes organic material; Preferably, the material of the third encapsulation layer includes inorganic material.

15. A display panel, characterized in that: The display panel comprises: substrate; an isolation structure, located on the substrate, the isolation structure encloses a plurality of isolation openings, the isolation structure comprises a first film layer, a second film layer located on a side of the first film layer away from the substrate, and a third film layer located on the first film layer facing the substrate, the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the second film layer on the substrate, and the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the third film layer on the substrate; a light-emitting device layer, located on the substrate, the light-emitting device layer comprising a plurality of light-emitting units, at least part of the light-emitting units being located in the isolation opening; the light-emitting units comprising a light-emitting portion and a first electrode; the first electrode being located on a side of the light-emitting portion away from the substrate, the first electrode being electrically connected to the third film layer; The area covered by the first electrode on the third film layer is the overlap area, and the overlap areas corresponding to the first electrodes of at least two of the light-emitting units are different; And / or, the width of the overlapping part of the orthographic projection of the first electrode on the substrate and the orthographic projection of the third film layer on the substrate is a first overlap width, and the first overlap widths corresponding to the first electrodes of at least two of the light-emitting units are different.

16. A display device, characterized in that: A display panel comprising any one of claims 1-15.

17. A method for preparing a display panel, characterized in that: The method comprises: An isolation structure is prepared on a substrate, wherein the isolation structure encloses a plurality of isolation openings, wherein the isolation structure comprises a first film layer, a second film layer located on a side of the first film layer away from the substrate, and a third film layer located on the first film layer facing the substrate, wherein the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the second film layer on the substrate, and the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the third film layer on the substrate; At least a partial film layer of a light-emitting device layer is prepared on the substrate, and the light-emitting device layer includes a plurality of light-emitting units. The distance between the orthographic projection of an edge of the first film layer close to the light-emitting unit on the substrate and the orthographic projection of an edge of the third film layer close to the same light-emitting unit on the substrate is an extended distance, and there are at least two light-emitting units whose corresponding extended distances are different.

18. The preparation method according to claim 17, characterized in that: In the step of preparing the isolation structure on the substrate, the method further comprises: preparing an isolation material layer on the substrate, wherein the isolation material layer comprises a third material layer, the first material layer and the second material layer which are sequentially stacked in a direction away from the substrate; Preparing a first barrier layer having a plurality of first openings on a side of the isolation material layer facing away from the substrate; The isolation material layer is patterned through the first opening, so that the second material layer forms a second film layer having a second opening; the second opening is a part of the isolation opening; The first material layer is patterned through the second opening to form a first film layer, wherein the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the second film layer on the substrate; and the orthographic projection area of ​​the first film layer on the substrate is smaller than the orthographic projection area of ​​the second film layer on the substrate; Preferably, in the step of patterning the isolation material layer through the first opening to form the second film layer, the second material layer and a portion of the first material layer exposed by the first opening are removed; Preferably, in the step of patterning the isolation material layer through the first opening to form the second film layer, a dry etching process is selected to pattern the isolation material layer through the first opening, so that the second material layer forms a second film layer having a second opening; Preferably, in the step of patterning the first material layer through the second opening to form the first film layer, a wet etching process is selected to pattern the first material layer through the second opening to form the first film layer; Preferably, the material of the first barrier layer includes photoresist; Preferably, the etching resistance of the third material layer to the chemical solution used in the wet etching process is greater than the etching resistance of the first material layer to the chemical solution used in the wet etching process.

19. The preparation method according to claim 18, characterized in that: After the step of patterning the first material layer through the second opening to form a first film layer, the method further includes: Performing patterning on the third material layer through the first opening to form a third film layer; Preferably, in the step of patterning the third material layer through the first opening, a dry etching process is selected to pattern the third material layer through the first opening to form a third film layer; Preferably, after the step of patterning the third material layer through the first opening to form a third film layer, the method further comprises: The first film layer is patterned so that the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the third film layer on the substrate; and the orthographic projection area of ​​the first film layer on the substrate is smaller than the orthographic projection area of ​​the third film layer on the substrate; Preferably, in the step of patterning the first film layer so that the orthographic projection of the first film layer on the substrate is located within the orthographic projection of the third film layer on the substrate, a wet etching process is selected to pattern the first film layer.

20. The preparation method according to claim 17, characterized in that: The isolation opening includes a first isolation opening and a second isolation opening. In the step of preparing at least a portion of a film layer of a light-emitting device layer on the substrate, the method further includes: Sequentially preparing a first light-emitting material layer, a first electrode material layer and a first packaging material layer on the substrate; Performing patterning on the first light-emitting material layer, the first electrode material layer and the first packaging material layer to form a light-emitting portion of a first light-emitting unit corresponding to the first isolation opening, a first electrode and a first packaging portion located on a side of the first light-emitting unit away from the substrate; Preferably, after the step of forming a light-emitting portion of a first light-emitting unit corresponding to the first isolation opening, a first electrode, and a first packaging portion located on a side of the first light-emitting unit away from the substrate, the method further comprises: Sequentially preparing a second light-emitting material layer, a second electrode material layer, and a second packaging material layer on the substrate; Patterning the second light-emitting material layer, the second electrode material layer and the second packaging material layer to form a light-emitting portion of a second light-emitting unit corresponding to the second isolation opening, a first electrode and a second packaging portion located on a side of the second light-emitting unit away from the substrate; Preferably, the extension distance corresponding to the first light-emitting unit is a first distance, the extension distance corresponding to the second light-emitting unit is a second distance, and the first distance is smaller than the second distance; Preferably, the isolation opening further includes a third isolation opening, and after the step of forming a light-emitting portion of a second light-emitting unit corresponding to the second isolation opening, a first electrode, and a second packaging portion located on a side of the second light-emitting unit away from the substrate, the method further includes: Sequentially preparing a third light-emitting material layer, a third electrode material layer and a third packaging material layer on the substrate; Patterning the third light-emitting material layer, the third electrode material layer and the third packaging material layer to form a light-emitting portion of a third light-emitting unit corresponding to the third isolation opening, a first electrode and a third packaging portion located on a side of the third light-emitting unit away from the substrate; Preferably, in the step of patterning the first light-emitting material layer, the first electrode material layer and the first packaging material layer, the method further comprises: Performing dry etching on the first packaging material layer to form the first packaging part; wet-etching the first electrode material layer to form the first electrode of the first light-emitting unit; Preferably, in the step of patterning the second light-emitting material layer, the second electrode material layer and the second packaging material layer, the method further comprises: performing dry etching on the second packaging material layer to form the second packaging part; Wet-etching the second electrode material layer to form the first electrode of the second light-emitting unit; Preferably, in the step of patterning the third light emitting material layer, the third electrode material layer and the third encapsulation material layer, the method further comprises: Performing dry etching on the third packaging material layer to form the third packaging part; Wet-etching the third electrode material layer to form the first electrode of the third light-emitting unit; Preferably, the extension distance corresponding to the third light-emitting unit is a third distance, and the second distance is smaller than the third distance.

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