Display substrate, manufacturing method thereof and display panel

Abstract

The invention discloses a display substrate and a manufacturing method thereof and a display panel, and relates to the technical field of display, the display substrate comprises a substrate, a display function layer, a passivation layer and a transparent electrode layer, the display function layer is arranged on the substrate, the passivation layer is arranged on the display function layer, and the transparent electrode layer is arranged on the substrate. The transparent electrode layer is arranged on the passivation layer; wherein the passivation layer is made of silicon nitride or silicon oxide, and the transparent electrode layer is made of aminated graphene. Through the method, the conductive effect and the film layer quality of the transparent electrode layer can be effectively improved, and the performance of a display product is improved.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display substrate and a manufacturing method thereof, and a display panel. Background Art

[0002] Liquid Crystal Display (LCD) uses the change of electric field strength applied to liquid crystal molecules to change the orientation of liquid crystal molecules and control the intensity of transmitted light to display images. Generally speaking, a complete liquid crystal display panel must consist of a backlight module, a polarizer, a display substrate and a color filter substrate, as well as a layer of liquid crystal molecules filled in a box composed of two substrates. A large number of pixel electrodes are arranged on the display substrate. The voltage and on-off of the pixel electrodes are controlled by the gate connected to the horizontal scanning signal line and the source signal connected to the vertical driving signal line. The orientation of the liquid crystal molecules is controlled by the change of the electric field strength between the common electrode on the color filter substrate and the pixel electrode on the display substrate.

[0003] Indium Tin Oxides (ITO) is a transparent and conductive material. Due to its good photoelectric properties, ITO thin film is widely used in the field of liquid crystal displays and is often used as a common electrode and a pixel electrode. However, ITO materials have the following disadvantages: First, the conductivity of ITO materials is low, which can easily lead to poor product effects; second, the film thickness of ITO is relatively thick, which does not meet the market trend of thinner and lighter products; third, ITO materials are very brittle and easily damaged during industrial preparation, which can easily cause economic losses and waste of resources, and are not suitable for the development trend of future flexible touch screens; fourth, the chemical properties of ITO materials are unstable, and the heat dissipation performance is poor, so their application in high-power devices is greatly limited; fifth, ITO materials are toxic and not conducive to environmental protection. At the same time, indium is a rare element with low reserves and increasing prices, which causes waste of resources. Therefore, there is an urgent need for a transparent conductive material that can replace ITO materials. Summary of the invention

[0004] The purpose of the embodiments of the present application is to provide a display substrate and a manufacturing method thereof, and a display panel, which can improve the performance of a transparent electrode layer and a display product.

[0005] An embodiment of the present application discloses a display substrate, which includes a substrate, a display function layer, a passivation layer and a transparent electrode layer, wherein the display function layer is arranged on the substrate, the passivation layer is arranged on the display function layer, and the transparent electrode layer is arranged on the passivation layer; wherein the material of the passivation layer is silicon nitride or silicon oxide, and the material of the transparent electrode layer is amine-based graphene.

[0006] Optionally, the thickness of the transparent electrode layer is 300-500 Å.

[0007] The embodiment of the present application further discloses a method for manufacturing a display substrate, which is used to manufacture the display substrate as described above. The manufacturing method comprises the steps of:

[0008] forming a display function layer on a substrate;

[0009] forming a passivation layer made of silicon nitride or silicon oxide material on the display function layer; and

[0010] A transparent electrode layer made of amine-based graphene material is formed on the passivation layer.

[0011] Optionally, the step of forming a transparent electrode layer composed of an amine-based graphene material on the passivation layer includes:

[0012] preparing graphene oxide;

[0013] reacting graphene oxide to obtain aminated graphene;

[0014] preparing aminated graphene into an aminated graphene dispersion; and

[0015] The aminated graphene dispersion is deposited on the passivation layer to obtain a transparent electrode layer composed of aminated graphene material.

[0016] Optionally, in the step of reacting graphene oxide to obtain amine-modified graphene, the process comprises:

[0017] mixing graphene oxide, N,N-dicyclohexylcarbodiimide and ethylenediamine;

[0018] Reflux the mixture at 110-130° C. for 22-26 hours to react;

[0019] The reacted solution is washed with ethanol and water twice; and

[0020] The washed product is dried at 50-70° C. to obtain amino-synthesized graphene.

[0021] Optionally, in the step of preparing the aminated graphene into an aminated graphene dispersion, the aminated graphene is placed in an N,N-dimethylformamide solution and ultrasonically dispersed to obtain the aminated graphene dispersion.

[0022] Optionally, the concentration of the aminated graphene is 0.8-1.2 mg / mL.

[0023] Optionally, in the step of depositing the aminated graphene dispersion on the passivation layer to obtain a transparent electrode layer composed of aminated graphene material, the aminated graphene dispersion is deposited on the passivation layer by an electrochemical deposition process, and the voltage in the electrochemical deposition process is 80-100V.

[0024] Optionally, in the step of depositing the aminated graphene dispersion on the passivation layer to obtain a transparent electrode layer composed of aminated graphene material, the aminated graphene dispersion is deposited on the passivation layer by an electrochemical deposition process, and the time in the electrochemical deposition process is 110-130S.

[0025] The embodiment of the present application further discloses a display panel, which includes an opposing substrate and the display substrate as described above, wherein the opposing substrate and the display substrate are arranged in a box.

[0026] The beneficial effects of the embodiments of the present application are as follows: compared with the solution of making the transparent electrode layer from ITO material, the present proposal adopts the transparent electrode layer made from amine-modified graphene. Since the conductivity of amine-modified graphene is about 10^6S·m-1, and the conductivity of ITO is 10^4S.M-1, it can be seen that the conductivity of amine-modified graphene is much higher than that of ITO, and the transparent electrode layer prepared from amine-modified graphene has better conductivity; moreover, under the condition of satisfying the same conductivity effect, the thickness of the transparent electrode layer prepared from amine-modified graphene is smaller, which is conducive to reducing the thickness of the film and the product. thickness; secondly, since the transparent electrode layer and the passivation layer are bonded together, and the material of the passivation layer is silicon nitride or silicon oxide, and the material of the transparent electrode layer is amino-modified graphene, the atoms in the amino-modified graphene can produce a greater binding force with the atoms in silicon nitride or silicon oxide, thereby improving the adhesion between the transparent electrode layer and the passivation layer, preventing the edge warping problem after the transparent electrode layer is formed, and can also meet the use requirements of the flexible touch screen; in addition, the chemical properties of amino-modified graphene are unstable, non-toxic, and easy to prepare, which can greatly meet market demand and has extremely high market competitiveness. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] The included drawings are used to provide a further understanding of the embodiments of the present application, which constitute a part of the specification, are used to illustrate the implementation methods of the present application, and together with the text description, explain the principles of the present application. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work. In the drawings:

[0028] Figure 1 is a schematic diagram of a display panel provided in an embodiment of the present application;

[0029] Figure 2 is a schematic diagram of a display substrate provided in an embodiment of the present application;

[0030] Figure 3 is a schematic diagram of another display substrate provided in an embodiment of the present application;

[0031] Figure 4 is a flow chart of a method for manufacturing a display substrate provided in an embodiment of the present application;

[0032] Figure 5 This is a flow chart of preparing a transparent electrode layer provided in an embodiment of the present application;

[0033] Figure 6 This is a flow chart of preparing amino-based graphene provided in an embodiment of the present application.

[0034] Among them, 10, display panel; 100, display substrate; 110, substrate; 120, display function layer; 121, switch array layer; 122, color resistance layer; 130, passivation layer; 140, transparent electrode layer; 200, opposing substrate. DETAILED DESCRIPTION

[0035] It should be understood that the terms used herein, the specific structures and functional details disclosed are only for describing specific embodiments and are representative, but the present application can be implemented in many alternative forms and should not be construed as being limited to only the embodiments described herein.

[0036] In addition, unless otherwise clearly specified or limited, "connected" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be internally connected between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0037] like Figure 1 As shown, the embodiment of the present application provides a display panel, the display panel 10 is a liquid crystal panel, the display panel 10 includes an opposing substrate 200, a display substrate 100 and a liquid crystal layer, the opposing substrate 200 and the display substrate 100 are arranged in a box, and the liquid crystal layer is filled between the opposing substrate 200 and the display substrate 100. Of course, the display panel 10 can also be an OLED panel, in which case the opposing substrate 200 is a packaging cover.

[0038] As an embodiment of a display substrate, Figure 2As shown, the display substrate 100 includes a substrate 110, a display function layer 120, a passivation layer 130 and a transparent electrode layer 140, wherein the display function layer 120 is disposed on the substrate 110, the passivation layer 130 is disposed on the display function layer 120, and the transparent electrode layer 140 is disposed on the passivation layer 130. The display substrate 100 is an array substrate, the display function layer 120 is a switch array layer 121 including active switches arranged in an array, the passivation layer 130 covers the switch array layer 121, the transparent electrode layer 140 is a pixel electrode, and the transparent electrode layer 140 is connected to the source and drain in the switch array layer 121 through the via holes on the passivation layer 130.

[0039] As another embodiment of the display substrate, Figure 3 As shown, the display substrate 100 includes a substrate 110, a display function layer 120, a passivation layer 130 and a transparent electrode layer 140, wherein the display function layer 120 is disposed on the substrate 110, the passivation layer 130 is disposed on the display function layer 120, and the transparent electrode layer 140 is disposed on the passivation layer 130. The display substrate 100 is a color film substrate, the display function layer 120 is a color resist layer 122, the passivation layer 130 covers the color resist layer 122, and the passivation layer 130 can also be understood as a flat layer, and the transparent electrode layer 140 is a common electrode disposed on the passivation layer 130.

[0040] In the embodiment of the present application, the material of the passivation layer 130 is silicon nitride or silicon oxide, and the material of the transparent electrode layer 140 is amine-modified graphene, and its molecular formula is NH2-GO.

[0041] Compared with the solution of making a transparent electrode layer from ITO material, this proposal uses amino-modified graphene to make the transparent electrode layer 140. Since the conductivity of amino-modified graphene is about 10^6S·m-1, and the conductivity of ITO is 10^4S.M-1, it can be seen that the conductivity of amino-modified graphene is much higher than that of ITO. The transparent electrode layer 140 prepared from amino-modified graphene has a better conductive effect.

[0042] Moreover, under the condition of satisfying the same conductive effect, the thickness of the transparent electrode layer 140 prepared by the amino-based graphene is smaller, which is beneficial to reduce the thickness of the film and the product.

[0043] Secondly, since the transparent electrode layer 140 and the passivation layer 130 are bonded together, and the material of the passivation layer 130 is silicon nitride or silicon oxide, silicon nitride can be further used because silicon nitride molecules have nitrogen-silicon bonds, and the material of the transparent electrode layer 140 is amino-based graphene, and the amino-based graphene molecules have nitrogen-carbon bonds and nitrogen-hydrogen bonds. The silicon nitride molecules and the amino-based graphene molecules contain the same atoms, so that the atoms between the passivation layer 130 and the transparent electrode layer 140 are easily atomically bonded, so that the atoms in the amino-based graphene can generate a greater binding force with the atoms in the silicon nitride, thereby improving the adhesion between the transparent electrode layer 140 and the passivation layer 130, and the contact area between the transparent electrode layer 140 and the passivation layer 130 is larger, which prevents the edge warping problem of the transparent electrode layer 140 after film formation, thereby improving the film quality of the transparent electrode layer 140. And due to the good adhesion between the transparent electrode layer 140 and the passivation layer 130, in the flexible touch screen, the transparent electrode layer 140 and the passivation layer 130 can maintain a good adhesion effect when being bent and are not easy to fall off, thereby meeting the use requirements of the flexible touch screen.

[0044] In addition, the chemical properties of amino-modified graphene are unstable, non-toxic, easy to prepare, and have a wide range of material sources. In addition, the transparency, conductivity, and ductility of amino-modified graphene are better than those of ITO materials. This shows that amino-modified graphene is a very suitable material to replace ITO, which can greatly meet market demand and has extremely high market competitiveness.

[0045] In the embodiment of the present application, the thickness of the transparent electrode layer 140 is 300-500A. Since the thickness of the pixel electrode on the array substrate in the current panel industry is about 500-700A, and since the conductivity of ITO is about 10^4S.M-1 and the conductivity of amine-modified graphene is about 10^6S.M-1, under the condition of achieving the same conductive effect, the thickness of the transparent electrode layer 140 composed of amine-modified graphene can be 300-500A, thereby greatly reducing the thickness of the transparent electrode layer 140.

[0046] Correspondingly, such as Figure 4 As shown, the embodiment of the present application also discloses a method for manufacturing a display substrate, which is used to manufacture the display substrate shown above, and the manufacturing method comprises the steps of:

[0047] S1: forming a display function layer on a substrate;

[0048] S2: forming a passivation layer made of silicon nitride or silicon oxide material on the display function layer;

[0049] S3: forming a transparent electrode layer made of amine-based graphene material on the passivation layer.

[0050] It should be noted that in step S1, when the display substrate is an array substrate, the display function layer is a switch array layer; when the display substrate is a color film substrate, the display function layer is a color resist layer; but the difference is that the thickness and shape of the passivation layer in S2 need to be set accordingly according to the corresponding substrate type; similarly, the thickness, shape and connection of the transparent electrode layer in S3 also need to be set accordingly according to the corresponding substrate type.

[0051] like Figure 5 As shown, in step S3, an aminated graphene dispersion is first prepared, and then the aminated graphene dispersion is deposited on the passivation layer by a chemical deposition process. The specific process for preparing the aminated graphene dispersion includes the following steps:

[0052] S31: preparing graphene oxide;

[0053] S32: reacting graphene oxide to obtain amino-modified graphene;

[0054] S33: preparing the aminated graphene into an aminated graphene dispersion;

[0055] S34: depositing the amino-based graphene dispersion on the passivation layer to obtain a transparent electrode layer composed of the amino-based graphene material.

[0056] In step S31, the embodiment of the present application prepares graphene oxide (GO) by an improved Hummers method. Since this method is relatively mature in the industry, specific details can be found in patents CN105502370B and CN102153075A, which will not be described in detail here.

[0057] like Figure 6 As shown, in step S32, the specific steps of preparing amine-based graphene include:

[0058] S321: mixing graphene oxide, N,N-dicyclohexylcarbodiimide and ethylenediamine;

[0059] S322: reflux the mixture at 110-130° C. for 22-26 hours to react;

[0060] S323: washing the product after the reaction with ethanol and secondary water;

[0061] S324: Drying the washed product at 50-70° C. to obtain amino-synthesized graphene.

[0062] Specifically, in step S321, the graphene oxide prepared in S31 is placed in a round-bottom flask together with N,N-dicyclohexylcarbodiimide (DCC) and ethylenediamine and mixed. In step S322, the above mixture is refluxed at 110-130°C for 22-26 hours for reaction, and can be further refluxed at 120°C for 24 hours. It should be noted that in step S323, secondary water refers to water that is boiled twice in one step. In step S324, the washed product is vacuum dried at 50-70°C to obtain amino graphene (GN) to ensure the stability and purity of the obtained amino graphene.

[0063] Step S33 is a step for preparing an aminated graphene dispersion. Specifically, the aminated graphene prepared in step S32 is first placed in an N,N-dimethylformamide (DMF) solution, and then ultrasonically dispersed. The aminated graphene is peeled off into an aminated graphene dispersion by the shear force of the ultrasonic wave, thereby obtaining an aminated graphene dispersion.

[0064] Finally, in step S34, the amino-based graphene dispersion prepared in step S33 is deposited on the passivation layer through an electrochemical deposition process to form a transparent electrode layer composed of amino-based graphene material.

[0065] In the above method for preparing a transparent electrode layer, the source of the amine-based graphene material is simple and the cost is low. The operation method of the entire production process is simple and the production process is stable, so that a high-quality and low-cost transparent electrode layer can be prepared. Moreover, the entire process does not require high temperature, has low requirements for equipment, and has no requirements for the catalyst layer, which is suitable for batch use.

[0066] In addition, the following table is a table of parameters in the preparation process of the transparent electrode layer. As shown in the following table, in the process of preparing the transparent electrode layer, whether it is the concentration of the amino-based graphene in the preparation process or the parameters of the electrochemical deposition in the preparation process of the transparent electrode layer, it will affect the quality of the final transparent electrode layer. The quality of the transparent electrode layer is specifically expressed by the uniformity of the film thickness and the refractive index.

[0067]

[0068]

[0069] Among them, the film thickness uniformity represents the thickness uniformity U% of the transparent electrode layer, and its formula is U%=(film thickness max-film thickness min) / 2film thickness average value, that is, the ratio of the difference between the maximum thickness and the minimum thickness of the transparent electrode layer to twice the average film thickness value; when the film thickness uniformity is smaller, it means that the difference between the maximum thickness and the minimum thickness of the transparent electrode layer is smaller, that is, the uniform effect of the transparent electrode layer is better; when the film thickness uniformity is greater, the uniform effect of the transparent electrode layer is worse.

[0070] The refractive index indicates the degree of refraction of the backlight after passing through the transparent electrode layer. When the refractive index is smaller, it means that the angle of deviation of the backlight through the transparent electrode layer is smaller, which means that the adhesion effect between the transparent electrode layer and the passivation layer is better and the transparent electrode layer is tighter; when the refractive index is larger, it means that the angle of deviation of the backlight through the transparent electrode layer is larger, which means that the adhesion effect between the transparent electrode layer and the passivation layer is worse.

[0071] It can be seen from this that the smaller the uniformity of the film thickness of the transparent electrode layer is, the better, and the smaller the refractive index of the transparent electrode layer is, the better.

[0072] By comparing comparison group 1, comparison group 5 and comparison group 6, it can be found that, under the condition of ensuring that other parameters remain unchanged, in the process of preparing aminated graphene, that is, when the concentration of aminated graphene is increased from 0.5 mg / mL to 1 mg / mL when the aminated graphene is placed in N,N-dimethylformamide solution, the film thickness uniformity of the transparent electrode layer decreases from 30% to 20%, and the refractive index of the transparent electrode layer decreases from 1.35 to 1.33, that is, the film quality of the transparent electrode layer when the concentration of aminated graphene in the N,N-dimethylformamide solution is 1 mg / mL is higher than the film quality of the transparent electrode layer when the concentration of aminated graphene in the N,N-dimethylformamide solution is 0.5 mg / mL. When the concentration of aminated graphene in N,N-dimethylformamide solution increases from 1 mg / mL to 2 mg / mL, the uniformity of the thickness of the transparent electrode layer decreases from 20% to 50%, and the refractive index of the transparent electrode layer decreases from 1.33 to 1.42, that is, the film quality of the transparent electrode layer when the concentration of aminated graphene in N,N-dimethylformamide solution is 1 mg / mL is higher than the film quality of the transparent electrode layer when the concentration of aminated graphene in N,N-dimethylformamide solution is 2 mg / mL. It can be seen that the higher the concentration of aminated graphene in N,N-dimethylformamide solution, the better the effect is. At this time, both the uniformity of the thickness of the transparent electrode layer and the refractive index of the transparent electrode layer are at the best level. In addition, after testing, it was found that when the concentration of amino-modified graphene is 0.8-1.2 mg / mL, the film quality of the transparent electrode layer can also be guaranteed. Beyond this range, the film quality of the transparent electrode layer will be significantly reduced.

[0073] By comparing the comparison group 1 and the comparison group 2, it can be found that, under the condition that other parameters remain unchanged, in the process of preparing the transparent electrode layer, when the transparent electrode layer is prepared in the electrochemical process of the amino-based graphene dispersion at a voltage of 90V and reduced to the transparent electrode layer prepared in the electrochemical process at a voltage of 30V, the uniformity of the film thickness of the transparent electrode layer increases from 20% to 50%, and the refractive index of the transparent electrode layer decreases from 1.33 to 1.40. It can be seen that the film quality effect obtained when the voltage of the transparent electrode layer is 90V during preparation is significantly better than the film quality effect obtained when the voltage is 30V. In addition, after testing, it is found that the film quality of the transparent electrode layer can be guaranteed when the voltage of the electrochemical deposition process during preparation is 80-100V, and the film quality of the transparent electrode layer will be significantly reduced if it exceeds this range.

[0074] By comparing the comparison group 1, the comparison group 3 and the comparison group 4, it can be found that, under the condition that other parameters remain unchanged, in the process of preparing the transparent electrode layer by the electrochemical deposition process, when the electrochemical process time increases from 60s to 120s, the uniformity of the film thickness of the transparent electrode layer decreases from 45% to 20%, and the refractive index of the transparent electrode layer decreases from 1.38 to 1.33, that is, the film quality of the transparent electrode layer obtained when the electrochemical process time is 120s is significantly better than the film quality of the transparent electrode layer obtained when the electrochemical process time is 60s. When the electrochemical process time increases from 120s to 180s, the uniformity of the film thickness of the transparent electrode layer increases from 20% to 55%, and the refractive index of the transparent electrode layer increases from 1.33 to 1.43, that is, the film quality of the transparent electrode layer obtained when the electrochemical process time is 120s is significantly better than the film quality of the transparent electrode layer obtained when the electrochemical process time is 180s. It can be seen that the higher the electrochemical process time, the better the effect is. At 120s, both the thickness uniformity and the refractive index of the transparent electrode layer are at the best level. In addition, after testing, it was found that the time of the electrochemical deposition process of the transparent electrode layer during preparation is 110-130S, which can also ensure the film quality of the transparent electrode layer. Beyond this range, the film quality of the transparent electrode layer will be significantly reduced.

[0075] When the aminated graphene is placed in an N,N-dimethylformamide solution with a concentration of 1 mg / mL, and the voltage in the electrochemical deposition process of the transparent electrode layer during preparation is 90 V and the time is 120 S, the obtained transparent electrode layer has the best film quality effect. At this time, the film of the transparent electrode layer is relatively uniform everywhere, and the transparent electrode layer and the passivation layer are relatively close, so a high-quality transparent electrode layer can be produced, and a display substrate, display panel and display product with good performance can be obtained.

[0076] It should be noted that the limitations on the various steps involved in this solution are not considered to limit the order of the steps without affecting the implementation of the specific solution. The steps written in front can be executed first, or later, or even simultaneously. The solutions of different implementation embodiments can be combined and applied without conflict. As long as this solution can be implemented, it should be regarded as belonging to the scope of protection of this application.

[0077] The above content is a further detailed description of the present application in combination with specific optional implementation methods, and it cannot be determined that the specific implementation of the present application is limited to these descriptions. For ordinary technicians in the technical field to which the present application belongs, several simple deductions or substitutions can be made without departing from the concept of the present application, which should be deemed to fall within the scope of protection of the present application.

Claims

1. A display substrate, characterized in that: include: substrate; A display function layer is arranged on the substrate; A passivation layer, disposed on the display function layer; A transparent electrode layer is disposed on the passivation layer; Wherein, the material of the passivation layer is silicon nitride or silicon oxide, and the material of the transparent electrode layer is amine-based graphene.

2. The display substrate according to claim 1, wherein: The thickness of the transparent electrode layer is 300-500 Å.

3. A method for manufacturing a display substrate, used for manufacturing the display substrate according to any one of claims 1 to 2, characterized in that: Includes steps: forming a display function layer on a substrate; forming a passivation layer made of silicon nitride or silicon oxide material on the display function layer; and A transparent electrode layer made of amine-based graphene material is formed on the passivation layer.

4. The method for manufacturing a display substrate according to claim 3, wherein: The step of forming a transparent electrode layer composed of an amine-based graphene material on the passivation layer comprises: preparing graphene oxide; reacting graphene oxide to obtain aminated graphene; preparing aminated graphene into an aminated graphene dispersion; and The aminated graphene dispersion is deposited on the passivation layer to obtain a transparent electrode layer composed of aminated graphene material.

5. The method for manufacturing a display substrate according to claim 4, wherein: The step of reacting graphene oxide to obtain amino-grouped graphene includes: mixing graphene oxide, N,N-dicyclohexylcarbodiimide and ethylenediamine; Reflux the mixture at 110-130° C. for 22-26 hours to react; The product after the reaction is washed with ethanol and secondary water; and The washed product is dried at 50-70° C. to obtain amino-synthesized graphene.

6. The method for manufacturing a display substrate according to claim 4, wherein: In the step of preparing the aminated graphene into an aminated graphene dispersion, the aminated graphene is placed in an N,N-dimethylformamide solution and ultrasonically dispersed to obtain an aminated graphene dispersion.

7. The method for manufacturing a display substrate according to claim 6, wherein: The concentration of aminated graphene is 0.8-1.2 mg / mL.

8. The method for manufacturing a display substrate according to claim 4, wherein: In the step of depositing the aminated graphene dispersion on the passivation layer to obtain a transparent electrode layer composed of aminated graphene material, the aminated graphene dispersion is deposited on the passivation layer by an electrochemical deposition process, and the voltage in the electrochemical deposition process is 80-100V.

9. The method for manufacturing a display substrate according to claim 4, wherein: In the step of depositing the aminated graphene dispersion on the passivation layer to obtain a transparent electrode layer composed of aminated graphene material, the aminated graphene dispersion is deposited on the passivation layer by an electrochemical deposition process, and the time in the electrochemical deposition process is 110-130S.

10. A display panel, characterized in that: It comprises an opposing substrate and the display substrate according to any one of claims 1 to 2, wherein the opposing substrate and the display substrate are arranged in a box.

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