Micro super capacitor photoetching processing equipment

Abstract

The invention relates to the technical field of capacitor processing equipment, and discloses micro super capacitor photoetching processing equipment which comprises a mounting plate, a rectangular table fixedly connected to the top of the mounting plate and a drying assembly arranged in the rectangular table, and the drying assembly comprises a first motor fixedly connected to the outer wall of the rectangular table; the output end of the first motor is fixedly connected with a lead screw, the lead screw movably penetrates through the outer wall of the rectangular table and extends into the rectangular table, the other end of the lead screw is rotationally connected with the inner wall of the rectangular table, the outer wall of the lead screw is in threaded connection with a sleeving block, and the top of the sleeving block is fixedly connected with a vertical plate; and the side wall of the top of the vertical plate is fixedly connected with an L-shaped plate, the side wall of the L-shaped plate is fixedly connected with a second motor, through the arrangement of the drying assembly, rotation of a circular plate can be achieved, so that rotation of the capacitor body in the drying process is achieved, and the drying effect of the capacitor body is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of capacitor processing equipment, in particular to a micro-supercapacitor photolithography processing equipment. Background Art

[0002] Supercapacitor is a physical secondary power source with super storage capacity and can provide strong pulse power. It is developed based on the electrochemical double-layer theory, so it is also called double-layer capacitor. Photolithography is a major process in the production of planar transistors and integrated circuits. It is a processing technology that makes holes in the mask on the surface of the semiconductor wafer to allow localized diffusion of impurities. The quality of the wafer is directly related to the quality of the finished integrated circuit. Before photolithography, the wafer must be cleaned and dried. The purpose of cleaning the wafer is to remove pollutants and particles, reduce pinholes and other defects, and improve the adhesion of the photoresist. After the wafer has been processed through different processes, its surface has been seriously contaminated. The contaminated wafer can be used again after cleaning.

[0003] According to a chip lithography processing equipment and chip processing technology proposed by Chinese patent CN112687581B, the device is equipped with two drying mechanisms and respectively arranged at the internal upper end and the internal lower end of the main shell, so as to dry the two wet sides of the chip cleaned by the spraying mechanism. By arranging a heating pipe inside the wide air duct and an air baffle inside the air outlet shell, the heated hot air can dry the chip more efficiently, and the wind baffle can buffer the wind to avoid direct blowing of hot air and damage to the chip.

[0004] However, there may be some shortcomings in this patent. In this device, after cleaning the chip, it dries the chip during the process of transferring the chip. During the chip transfer process, since the device can only dry the upper and lower ends of the chip, it is difficult to dry the inside of the chip. The lithography effect is easily affected by the moisture inside the chip. For this reason, we propose a micro supercapacitor lithography processing equipment. Summary of the invention

[0005] The purpose of the present invention is to provide a micro-supercapacitor photolithography processing device to solve the problems raised in the above background technology.

[0006] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a micro-supercapacitor lithography processing equipment, comprising a mounting plate, a rectangular table fixedly connected to the top of the mounting plate, and a drying component arranged inside the rectangular table, wherein the drying component comprises a first motor fixedly connected to the outer wall of the rectangular table, the output end of the first motor is fixedly connected to a lead screw, the lead screw movably penetrates the outer wall of the rectangular table and extends to the inside of the rectangular table, the other end of the lead screw is rotatably connected to the inner wall of the rectangular table, the outer wall of the lead screw is threadedly connected to a socket block, and the top of the socket block is fixedly connected to A vertical plate is connected, the top side wall of the vertical plate is fixedly connected to an L-shaped plate, the side wall of the L-shaped plate is fixedly connected to a second motor, the output end of the second motor is fixedly connected to a first output shaft, the first output shaft movably passes through the outer wall of the L-shaped plate and extends to the inside of the L-shaped plate, the other end of the first output shaft is fixedly connected to a circular plate, the side wall of the circular plate is fixedly connected to a U-shaped horizontal block, the top inner wall of the U-shaped horizontal block is threadedly connected to a screw, the top outer wall of the screw is fixedly connected to an adjustment block, the bottom of the screw is rotatably connected to a rubber block, and the bottom of the rubber block slides A capacitor body is connected, and a drying component is set. After the capacitor body is cleaned, it needs to be dried. In order to avoid uneven drying of the capacitor body, it needs to be dried in all directions. At this time, the operator can put the capacitor body into the U-shaped horizontal block, and then rotate the adjusting block to cause the rubber block to move during the rotation of the screw. After the two rubber blocks are relatively close and squeeze the capacitor body, the capacitor body is fixed. At this time, the operator can start the first motor and the second motor. During the start-up of the first motor, the screw will rotate. After the screw rotates, the sleeve block will move along its outer wall, thereby causing the capacitor body to move laterally with the sleeve block, and the vertical plate will move laterally with the L-shaped plate, thereby achieving uniform drying during the movement of the capacitor body. After the second motor is started, it will rotate with the first output shaft, causing the circular plate to rotate, thereby realizing the rotation of the capacitor body, which is convenient for achieving all-round drying of the capacitor body and improving the drying effect of the capacitor body.

[0007] Preferably, the drying component also includes a slide groove provided on the side wall of the circular plate, the inner wall of the slide groove is fixedly connected to a first spring, the other end of the first spring is fixedly connected to a slider, the outer wall of the slider is slidably connected to the inner wall of the vertical plate, the side wall of the slider is rotatably connected to a rotating rod through a bearing, the outer wall of the rotating rod is fixedly connected to a cleaning roller, the outer wall of the cleaning roller is slidably connected to the surface of the capacitor body, the cleaning roller is squeezed during the rotation of the capacitor body, causing the cleaning roller to rub against the surface of the capacitor body, thereby cleaning the surface of the capacitor body, the slider and the first spring are used to limit the cleaning roller, so that the cleaning roller can move during the rotation of the capacitor body, so that the capacitor body can rotate smoothly within a certain range.

[0008] Preferably, the drying component also includes a top plate fixedly connected to the top of the rectangular table, the outer wall of the rectangular table is fixedly connected to a hot air box, the outer wall of the hot air box is connected to a mainstream pipe, the outer wall of the mainstream pipe is fixedly connected to a fixed block, the side wall of the fixed block is fixedly connected to the outer wall of the rectangular table, the other end of the mainstream pipe is connected to a shunt pipe, the outer wall of the shunt pipe is fixedly connected to the inner wall of the rectangular table, the other end of the shunt pipe is connected to an exhaust head, the exhaust head is located on the side of the capacitor body, when the capacitor body needs to be dried, the operator turns on the hot air box to cause the hot air inside the hot air box to pass through the mainstream pipe and discharge the hot air into the inside of the shunt pipe, and causes the hot air to be discharged through the exhaust head, thereby achieving heating and drying of the capacitor body.

[0009] Preferably, a photolithography component is also provided on the top of the rectangular platform, and the photolithography component includes a U-shaped vertical plate fixedly connected to the top right side of the rectangular platform, the inner wall of the U-shaped vertical plate is fixedly connected to a third motor, the output end of the third motor is fixedly connected to a second output shaft, the outer wall of the other end of the second output shaft is fixedly connected to a gear, the bottom of the gear is meshed with a rack, the side wall of the rack is fixedly connected to a limit block, the outer wall of the limit block is slidably connected to the side inner wall of the U-shaped vertical plate, the other end of the limit block is fixedly connected to a rectangular block, the side wall of the rectangular block is fixedly connected to a second spring, the other end of the second spring is fixedly connected to the outer wall of the U-shaped vertical plate, the bottom of the rack is fixedly connected to a cylinder, the output end of the cylinder is fixedly connected to the photolithography machine housing, the A photolithography head is fixedly connected to the bottom of the photolithography machine housing. By setting up a photolithography component, after the capacitor body is dried, the capacitor body will be transferred to the bottom of the photolithography head as the sleeve block moves. When the capacitor body needs to be photolithographically processed, the operator can turn on the cylinder to prompt the output end of the cylinder to push the photolithography machine housing downward, and realize photolithography processing on the capacitor body through the photolithography head. When it is necessary to adjust the photolithography position of the capacitor body, the operator can turn on the third motor to prompt the second output shaft to rotate. During the rotation of the second output shaft, the gear will rotate and mesh with the rack. Under the action of the limit block limiting the rack, the rack will move, thereby facilitating the adjustment of the photolithography position of the capacitor body by the photolithography head.

[0010] Preferably, a support leg is fixedly connected to the bottom of the mounting plate, and there are four support legs. The four support legs are equal in size and fixedly connected to the four corners of the bottom of the mounting plate at equal distances. By providing four support legs, the mounting plate can be easily supported.

[0011] Preferably, the outer wall of the slider is matched with the inner wall of the slide groove, and the side wall of the slider is fixedly connected to one end of the first spring. By providing the first spring, it is convenient to limit the slider and promote the slider to slide smoothly inside the slide groove.

[0012] Preferably, there are two rubber blocks, the two rubber blocks are equal in size, and the two rubber blocks are symmetrically distributed along the center plane of the capacitor body. By providing the rubber blocks, it is convenient to clamp and fix the capacitor body, and the surface of the capacitor body can be avoided from being clamped by the rubber blocks.

[0013] Preferably, there are multiple exhaust heads, which are divided into two groups. The two groups of exhaust heads are symmetrically distributed on both sides of the capacitor body along the center plane of the top plate. By setting multiple exhaust heads, uniform heating and drying of the capacitor body can be achieved.

[0014] The present invention provides a micro-supercapacitor photolithography processing device. The micro-supercapacitor photolithography processing device has the following beneficial effects:

[0015] (1) The micro-supercapacitor photolithography processing equipment is provided with a drying component. After the capacitor body is cleaned, it needs to be dried. In order to avoid uneven drying of the capacitor body, it needs to be dried in all directions. At this time, the operator can put the capacitor body into the U-shaped horizontal block, and then rotate the adjustment block to cause the screw to move with the rubber block during the rotation. After the two rubber blocks are relatively close and squeeze the capacitor body, the capacitor body is fixed. At this time, the operator can start the first motor and the second motor. During the start-up of the first motor, the screw will rotate. After the screw rotates, it will move the sleeve block along its outer wall, thereby causing the capacitor body to move horizontally with the sleeve block, and causing the vertical plate to move horizontally with the L-shaped plate, thereby realizing the movement of the capacitor body. During the process of drying, the first output shaft is rotated and the circular plate is rotated after the second motor is started, so that the capacitor body is rotated, which is convenient for drying the capacitor body in all directions and improving the drying effect of the capacitor body. During the rotation of the capacitor body, the cleaning roller is squeezed to cause the cleaning roller to rub against the surface of the capacitor body, so as to clean the surface of the capacitor body. The cleaning roller is limited by the slider and the first spring, so that the cleaning roller can move during the rotation of the capacitor body, so that the capacitor body can rotate smoothly within a certain range. When it is necessary to dry the capacitor body, the operator turns on the hot air box to cause the hot air inside the hot air box to pass through the main pipe and discharge the hot air into the inside of the shunt pipe, so that the hot air is discharged through the exhaust head, so as to heat and dry the capacitor body.

[0016] (2) The micro-supercapacitor photolithography processing equipment is provided with a photolithography component. After the capacitor body is dried, the capacitor body is transferred to the bottom of the photolithography head as the sleeve block moves. When the capacitor body needs to be photolithographically processed, the operator can turn on the cylinder to cause the output end of the cylinder to push the photolithography machine housing downward, and realize the photolithography processing of the capacitor body through the photolithography head. When the photolithography position of the capacitor body needs to be adjusted, the operator can turn on the third motor to cause the second output shaft to rotate. During the rotation of the second output shaft, the gear will rotate and mesh with the rack. Under the action of the limit block limiting the rack, the rack will move, thereby facilitating the adjustment of the photolithography position of the capacitor body by the photolithography head. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic diagram of the three-dimensional structure of the present invention;

[0018] Figure 2 is a cross-sectional view of the present invention;

[0019] Figure 3 It is a structural schematic diagram of the drying component in the present invention;

[0020] Figure 4 It is a partial structural schematic diagram of the drying component in the present invention;

[0021] Figure 5 It is a schematic diagram of the side structure of the drying component in the present invention;

[0022] Figure 6 for Figure 4 A partial enlarged view of the middle A;

[0023] Figure 7 This is a schematic diagram of the structure of the cleaning roller inside the drying assembly of the present invention;

[0024] Figure 8 It is a schematic diagram of the structure of the photolithography component in the present invention.

[0025] In the figure: 1, mounting plate; 2, supporting leg; 3, rectangular table; 41, drying assembly; 411, first motor; 412, screw rod; 413, sleeve block; 414, vertical plate; 415, L-shaped plate; 416, second motor; 417, first output shaft; 418, round plate; 419, U-shaped horizontal block; 4110, screw rod; 4111, adjustment block; 4112, rubber block; 4113, capacitor body; 4114, slide groove; 4115, first spring; 4116, slider; 411 7. Rotating rod; 4118. Cleaning roller; 4119. Top plate; 4120. Hot air box; 4121. Main flow pipe; 4122. Fixed block; 4123. Diverter pipe; 4124. Exhaust head; 42. Photolithography assembly; 421. U-shaped vertical plate; 422. Third motor; 423. Second output shaft; 424. Gear; 425. Rack; 426. Limit block; 427. Rectangular block; 428. Second spring; 429. Cylinder; 4210. Photolithography machine housing; 4211. Photolithography head. DETAILED DESCRIPTION

[0026] In order to have a clearer understanding of the technical features, purposes and effects of the present invention, specific embodiments of the present invention are now described with reference to the accompanying drawings.

[0027] A preferred embodiment of a micro-supercapacitor photolithography processing device provided by the present invention is as follows: Figures 1 to 8As shown: A micro-supercapacitor lithography processing equipment includes a mounting plate 1, a rectangular table 3 fixedly connected to the top of the mounting plate 1, and a drying component 41 arranged inside the rectangular table 3, the drying component 41 includes a first motor 411 fixedly connected to the outer wall of the rectangular table 3, the output end of the first motor 411 is fixedly connected to a screw rod 412, the screw rod 412 movably penetrates the outer wall of the rectangular table 3 and extends to the inside of the rectangular table 3, the other end of the screw rod 412 is rotatably connected to the inner wall of the rectangular table 3, the outer wall of the screw rod 412 is threadedly connected to a socket block 413, the top of the socket block 413 is fixedly connected to a vertical plate 414, the top side wall of the vertical plate 414 is fixedly connected to an L-shaped plate 415, and the L-shaped plate 416 is fixedly connected to the outer wall of the vertical plate 416. The side wall of the L-shaped plate 415 is fixedly connected to a second motor 416, the output end of the second motor 416 is fixedly connected to a first output shaft 417, the first output shaft 417 movably penetrates the outer wall of the L-shaped plate 415 and extends to the inside of the L-shaped plate 415, the other end of the first output shaft 417 is fixedly connected to a circular plate 418, the side wall of the circular plate 418 is fixedly connected to a U-shaped horizontal block 419, the top inner wall of the U-shaped horizontal block 419 is threadedly connected to a screw rod 4110, the top outer wall of the screw rod 4110 is fixedly connected to an adjusting block 4111, the bottom of the screw rod 4110 is rotatably connected to a rubber block 4112, the bottom of the rubber block 4112 is slidably connected to a capacitor body 4113, by setting a drying component 41, After the capacitor body 4113 is cleaned, it needs to be dried. In order to avoid uneven drying of the capacitor body 4113, it needs to be dried in all directions. At this time, the operator can put the capacitor body 4113 into the U-shaped horizontal block 419, and then rotate the adjustment block 4111 to cause the screw 4110 to rotate and move the rubber block 4112. After the two rubber blocks 4112 are relatively close and squeeze the capacitor body 4113, the capacitor body 4113 is fixed. At this time, the operator can turn on the first motor 411 and the second motor 416. During the start-up process of 411, the screw rod 412 will rotate, and after the screw rod 412 rotates, it will move along its outer wall with the socket block 413, thereby prompting the capacitor body 4113 to move laterally with the socket block 413, and prompting the vertical plate 414 to move laterally with the L-shaped plate 415, so as to achieve uniform drying of the capacitor body 4113 during the movement. After the second motor 416 is started, it will rotate with the first output shaft 417, prompting the circular plate 418 to rotate, thereby realizing the rotation of the capacitor body 4113, facilitating the all-round drying of the capacitor body 4113, and improving the drying effect of the capacitor body 4113.

[0028] The drying assembly 41 also includes a slide groove 4114 provided on the side wall of the circular plate 418, the inner wall of the slide groove 4114 is fixedly connected to a first spring 4115, the other end of the first spring 4115 is fixedly connected to a slider 4116, the outer wall of the slider 4116 is slidably connected to the inner wall of the vertical plate 414, the side wall of the slider 4116 is rotatably connected to a rotating rod 4117 through a bearing, the outer wall of the rotating rod 4117 is fixedly connected to a cleaning roller 4118, and the outer wall of the cleaning roller 4118 is slidably connected to the surface of the capacitor body 4113 During the rotation of the capacitor body 4113, the cleaning roller 4118 is squeezed, causing the cleaning roller 4118 to rub against the surface of the capacitor body 4113, thereby cleaning the surface of the capacitor body 4113. The slider 4116 and the first spring 4115 are used to limit the cleaning roller 4118, so that the cleaning roller 4118 can move during the rotation of the capacitor body 4113, thereby causing the capacitor body 4113 to rotate smoothly within a certain range.

[0029] The drying assembly 41 also includes a top plate 4119 fixedly connected to the top of the rectangular platform 3, the outer wall of the rectangular platform 3 is fixedly connected to a hot air box 4120, the outer wall of the hot air box 4120 is connected to a main flow pipe 4121, the outer wall of the main flow pipe 4121 is fixedly connected to a fixed block 4122, the side wall of the fixed block 4122 is fixedly connected to the outer wall of the rectangular platform 3, the other end of the main flow pipe 4121 is connected to a shunt pipe 4123, the outer wall of the shunt pipe 4123 is fixed to the inner wall of the rectangular platform 3 The other end of the shunt pipe 4123 is connected to an exhaust head 4124, which is located on the side of the capacitor body 4113. When the capacitor body 4113 needs to be dried, the operator turns on the hot air box 4120 to cause the hot air inside the hot air box 4120 to pass through the mainstream pipe 4121 and discharge the hot air into the shunt pipe 4123, and then causes the hot air to be discharged through the exhaust head 4124, thereby heating and drying the capacitor body 4113.

[0030] A preferred embodiment of a micro-supercapacitor photolithography processing device provided by the present invention is as follows: Figures 1 to 8As shown: a photolithography assembly 42 is also arranged on the top of the rectangular platform 3, and the photolithography assembly 42 includes a U-shaped vertical plate 421 fixedly connected to the top of the right side of the rectangular platform 3, and a third motor 422 is fixedly connected to the inner wall of the U-shaped vertical plate 421, and a second output shaft 423 is fixedly connected to the output end of the third motor 422, and a gear 424 is fixedly connected to the outer wall of the other end of the second output shaft 423, and a rack 425 is meshed at the bottom of the gear 424, and a limit block 426 is fixedly connected to the side wall of the rack 425 The outer wall of the limit block 426 is slidably connected to the inner wall of the side of the U-shaped vertical plate 421, the other end of the limit block 426 is fixedly connected to a rectangular block 427, the side wall of the rectangular block 427 is fixedly connected to a second spring 428, the other end of the second spring 428 is fixedly connected to the outer wall of the U-shaped vertical plate 421, the bottom of the rack 425 is fixedly connected to a cylinder 429, the output end of the cylinder 429 is fixedly connected to a photolithography machine housing 4210, and the bottom of the photolithography machine housing 4210 is fixedly connected to a photolithography machine housing 4210. The engraving head 4211 is provided with a photolithography component 42. After the drying of the capacitor body 4113 is completed, the capacitor body 4113 will be transferred to the bottom of the photolithography head 4211 as the sleeve block 413 moves. When the capacitor body 4113 needs to be photolithographically processed, the operator can turn on the cylinder 429 to prompt the output end of the cylinder 429 to push the photolithography machine housing 4210 downward, and realize the photolithography of the capacitor body 4113 through the photolithography head 4211. When it is necessary to adjust the photolithography position of the capacitor body 4113, the operator can turn on the third motor 422 to prompt the second output shaft 423 to rotate. During the rotation of the second output shaft 423, the gear 424 will be prompted to rotate and mesh with the rack 425. Under the action of the limit block 426 limiting the rack 425, the rack 425 will move, thereby facilitating the adjustment of the photolithography position of the capacitor body 4113 by the photolithography head 4211.

[0031] Furthermore, a support leg 2 is fixedly connected to the bottom of the mounting plate 1. There are four support legs 2. The four support legs 2 are equal in size and are fixedly connected to the four corners of the bottom of the mounting plate 1 at equal distances. By providing four support legs 2, the mounting plate 1 can be easily supported.

[0032] Furthermore, the outer wall of the slider 4116 is adapted to the inner wall of the slide groove 4114, and the side wall of the slider 4116 is fixedly connected to one end of the first spring 4115. By setting the first spring 4115, it is convenient to limit the slider 4116, so that the slider 4116 can slide smoothly inside the slide groove 4114.

[0033] Furthermore, there are two rubber blocks 4112, the two rubber blocks 4112 are equal in size, and the two rubber blocks 4112 are symmetrically distributed along the center plane of the capacitor body 4113. By setting the rubber blocks 4112, it is convenient to clamp and fix the capacitor body 4113, and the rubber blocks 4112 can avoid clamping the surface of the capacitor body 4113.

[0034] In addition, there are multiple exhaust heads 4124, and the multiple exhaust heads 4124 are divided into two groups. The two groups of exhaust heads 4124 are symmetrically distributed on both sides of the capacitor body 4113 along the center plane of the top plate 4119. By setting multiple exhaust heads 4124, the capacitor body 4113 can be evenly heated and dried.

[0035] Working principle: After the capacitor body 4113 is cleaned, it needs to be dried. In order to avoid uneven drying of the capacitor body 4113, it needs to be dried in all directions. At this time, the operator can put the capacitor body 4113 into the U-shaped horizontal block 419, and then rotate the adjustment block 4111 to cause the screw 4110 to rotate and move the rubber block 4112. After the two rubber blocks 4112 are relatively close and squeeze the capacitor body 4113, the capacitor body 4113 is fixed. At this time, the operator can turn on the first motor 411 and the second motor 416. During the start-up of the first motor 411, the screw rod 412 will rotate, and after the screw rod 412 rotates, the sleeve block 413 will move along its outer wall, thereby prompting the capacitor body 4113 to move laterally along with the sleeve block 413, prompting the vertical plate 414 to move laterally with the L-shaped plate 415, thereby achieving uniform drying of the capacitor body 4113 during the movement. After the second motor 416 is started, the first output shaft 417 will rotate, prompting the circular plate 418 to rotate, thereby achieving the rotation of the capacitor body 4113, facilitating the omnidirectional drying of the capacitor body 4113, and improving the drying effect of the capacitor body 4113;

[0036] During the rotation of the capacitor body 4113, the cleaning roller 4118 is squeezed, causing the cleaning roller 4118 to rub against the surface of the capacitor body 4113, thereby cleaning the surface of the capacitor body 4113. The slider 4116 and the first spring 4115 are used to limit the cleaning roller 4118, so that the cleaning roller 4118 can move during the rotation of the capacitor body 4113, thereby causing the capacitor body 4113 to rotate smoothly within a certain range.

[0037] When the capacitor body 4113 needs to be dried, the operator turns on the hot air box 4120, causing the hot air inside the hot air box 4120 to pass through the main pipe 4121 and discharge the hot air into the inside of the branch pipe 4123, causing the hot air to be discharged through the exhaust head 4124, thereby achieving heating and drying of the capacitor body 4113;

[0038] After the capacitor body 4113 is dried, the capacitor body 4113 is transferred to the bottom of the photolithography head 4211 as the sleeve block 413 moves. When the capacitor body 4113 needs to be photolithographically processed, the operator can turn on the cylinder 429 to prompt the output end of the cylinder 429 to push the photolithography machine housing 4210 downward, and realize the photolithography processing of the capacitor body 4113 through the photolithography head 4211. When it is necessary to adjust the photolithography position of the capacitor body 4113, the operator can turn on the third motor 422 to prompt the second output shaft 423 to rotate. During the rotation of the second output shaft 423, the gear 424 will be driven to rotate and mesh with the rack 425. Under the action of the limit block 426 limiting the rack 425, the rack 425 will move, thereby facilitating the adjustment of the photolithography position of the capacitor body 4113 by the photolithography head 4211.

[0039] The above description is only an illustrative specific implementation mode of the present invention and is not intended to limit the scope of the present invention. Any equivalent changes and modifications made by any technician in the field without departing from the concept and principle of the present invention should fall within the scope of protection of the present invention. It should also be noted that the various components of the present invention are not limited to the above-mentioned overall application. The various technical features described in the specification of the present invention can be selected one by one or multiple ones can be selected and used in combination according to actual needs. Therefore, the present invention should naturally cover other combinations and specific applications related to the invention point of this case.

Claims

1. A micro-supercapacitor photolithography processing device, comprising a mounting plate (1), a rectangular table (3) fixedly connected to the top of the mounting plate (1), and a drying component (41) arranged inside the rectangular table (3), characterized in that: The drying component (41) comprises a first motor (411) fixedly connected to the outer wall of the rectangular platform (3); the output end of the first motor (411) is fixedly connected to a screw rod (412); the screw rod (412) movably penetrates the outer wall of the rectangular platform (3) and extends to the interior of the rectangular platform (3); the other end of the screw rod (412) is rotatably connected to the inner wall of the rectangular platform (3); the outer wall of the screw rod (412) is threadedly connected to a sleeve block (413); the top of the sleeve block (413) is fixedly connected to a vertical plate (414); the top side wall of the vertical plate (414) is fixedly connected to an L-shaped plate (415); the side wall of the L-shaped plate (415) is fixedly connected to a second motor (416); the second motor The output end of (416) is fixedly connected to a first output shaft (417), the first output shaft (417) movably passes through the outer wall of the L-shaped plate (415) and extends to the inside of the L-shaped plate (415), the other end of the first output shaft (417) is fixedly connected to a circular plate (418), the side wall of the circular plate (418) is fixedly connected to a U-shaped horizontal block (419), the top inner wall of the U-shaped horizontal block (419) is threadedly connected to a screw rod (4110), the top outer wall of the screw rod (4110) is fixedly connected to an adjustment block (4111), the bottom of the screw rod (4110) is rotatably connected to a rubber block (4112), and the bottom of the rubber block (4112) is slidably connected to a capacitor body (4113).

2. A micro supercapacitor photolithography processing equipment according to claim 1, characterized in that: The drying component (41) also includes a slide groove (4114) opened on the side wall of the circular plate (418), the inner wall of the slide groove (4114) is fixedly connected to a first spring (4115), the other end of the first spring (4115) is fixedly connected to a slider (4116), the outer wall of the slider (4116) is slidably connected to the inner wall of the vertical plate (414), the side wall of the slider (4116) is rotatably connected to a rotating rod (4117) through a bearing, the outer wall of the rotating rod (4117) is fixedly connected to a cleaning roller (4118), and the outer wall of the cleaning roller (4118) is slidably connected to the surface of the capacitor body (4113).

3. The micro-supercapacitor photolithography processing equipment according to claim 1, characterized in that: The drying component (41) further comprises a top plate (4119) fixedly connected to the top of the rectangular platform (3); the outer wall of the rectangular platform (3) is fixedly connected to a hot air box (4120); the outer wall of the hot air box (4120) is connected to a main flow pipe (4121); the outer wall of the main flow pipe (4121) is fixedly connected to a fixed block (4122); the side wall of the fixed block (4122) is fixedly connected to the outer wall of the rectangular platform (3); the other end of the main flow pipe (4121) is connected to a shunt pipe (4123); the outer wall of the shunt pipe (4123) is fixedly connected to the inner wall of the rectangular platform (3); the other end of the shunt pipe (4123) is connected to an exhaust head (4124); the exhaust head (4124) is located on the side of the capacitor body (4113).

4. The micro-supercapacitor photolithography processing equipment according to claim 1, characterized in that: A photolithography assembly (42) is also arranged on the top of the rectangular platform (3), and the photolithography assembly (42) comprises a U-shaped vertical plate (421) fixedly connected to the top of the right side of the rectangular platform (3), the inner wall of the U-shaped vertical plate (421) is fixedly connected to a third motor (422), the output end of the third motor (422) is fixedly connected to a second output shaft (423), the outer wall of the other end of the second output shaft (423) is fixedly connected to a gear (424), the bottom of the gear (424) is meshed with a rack (425), the side wall of the rack (425) is fixedly connected to a limit block (426), and the limit block (426) is fixedly connected to the side wall of the rack (425). The outer wall of the limit block (426) is slidably connected to the inner wall of the side of the U-shaped vertical plate (421); the other end of the limit block (426) is fixedly connected to a rectangular block (427); the side wall of the rectangular block (427) is fixedly connected to a second spring (428); the other end of the second spring (428) is fixedly connected to the outer wall of the U-shaped vertical plate (421); the bottom of the rack (425) is fixedly connected to a cylinder (429); the output end of the cylinder (429) is fixedly connected to a photolithography machine housing (4210); and the bottom of the photolithography machine housing (4210) is fixedly connected to a photolithography head (4211).

5. The micro-supercapacitor photolithography processing equipment according to claim 1, characterized in that: The bottom of the mounting plate (1) is fixedly connected with a support leg (2), the number of the support legs (2) is four, the four support legs (2) are equal in size, and the four support legs (2) are equidistantly fixedly connected to the four corners of the bottom of the mounting plate (1).

6. The micro-supercapacitor photolithography processing equipment according to claim 2, characterized in that: The outer wall of the slider (4116) is matched with the inner wall of the slide groove (4114), and the side wall of the slider (4116) is fixedly connected to one end of the first spring (4115).

7. The micro-supercapacitor photolithography processing equipment according to claim 1, characterized in that: There are two rubber blocks (4112), the two rubber blocks (4112) are equal in size, and the two rubber blocks (4112) are symmetrically distributed along the central plane of the capacitor body (4113).

8. The micro-supercapacitor photolithography processing equipment according to claim 3, characterized in that: There are multiple exhaust heads (4124), and the multiple exhaust heads (4124) are divided into two groups. The two groups of exhaust heads (4124) are symmetrically distributed on both sides of the capacitor body (4113) along the center plane of the top plate (4119).

Images