A chemical vapor deposition multilayer coating tool and preparation method thereof

Abstract

The present invention relates to the technical field of coated tool, and provides a chemical vapor deposition multilayer coated tool and a preparation method thereof, wherein the chemical vapor deposition multilayer coated tool comprises a substrate and a multilayer coating sequentially deposited on the surface of the substrate by a chemical vapor deposition method, wherein the multilayer coating comprises (Zr, Al) y B x coating, and 1.9≤x / y≤2.2, with (Zr,Al) y B x The Al content in the coating increases gradually as the coating is deposited. The multilayer coating tool provided by the present invention has better wear resistance, toughness, oxidation resistance, bonding strength and low friction coefficient, and can be applied to cutting of materials such as titanium alloys and nickel-based high-temperature alloys.

Description

Technical Field

[0001] The invention belongs to the technical field of coated tool technology, and in particular relates to a chemical vapor deposition multi-layer coated tool and a preparation method thereof. Background Art

[0002] Materials such as titanium alloys and nickel-based high-temperature alloys have high strength. During cutting, built-up edge is easily generated on the tool surface, and the tool is severely bonded and worn. Coating the surface of the cutting tool can effectively extend the tool life. To solve these processing problems, the tool coating surface is required to be smooth, have a low friction coefficient, high coating bonding strength, good wear resistance, and good oxidation resistance. At present, most of the cutting processing of materials such as titanium alloys and nickel-based high-temperature alloys uses physical vapor deposition (PVD) coated tools. Single-layer or multi-layer PVD coatings such as TiAlN, NbN, TiB2, and ZrB2 are commonly used. They have the advantages of high hardness, high wear resistance, and low friction coefficient. However, when the coating hardness is high (such as >35GPa), the PVD coating has a large compressive stress, resulting in a low coating bonding strength, thereby reducing the service life of the cutting tool.

[0003] The deposition temperature of CVD coating for cemented carbide cutting tools is usually between 700-1050℃, which is generally higher than the deposition temperature of PVD coating (<700℃). During the deposition process of CVD coating, elements between coating and substrate and between coatings can diffuse with each other to form metallurgical bonding, so CVD coating usually has higher bonding strength than PVD coating. CVD multilayer coating TiN / TiBN / TiB2 is suitable for cutting materials such as titanium alloys and nickel-based high-temperature alloys, but in the cutting process of titanium alloys, CVDTiB2 is prone to element diffusion and aggravates wear due to the high affinity of Ti element with titanium alloy. Therefore, the preparation of a boride coating that does not contain titanium is more suitable for the cutting of titanium alloys. The temperature of the boride coating prepared by the CVD method is relatively high, usually greater than 700℃, and the radius of the boron atom is small, which makes it easier for the boron atom to diffuse into the WC-Co-based cemented carbide matrix, forming brittle phases such as W3CoB3, reducing the toughness of the tool. Summary of the invention

[0004] In order to solve the problems existing in the prior art, the main purpose of the present invention is to provide a chemical vapor deposition multi-layer coating tool and a preparation method thereof.

[0005] To solve the above technical problems, according to one aspect of the present invention, the present invention provides the following technical solutions:

[0006] A chemical vapor deposition multilayer coating tool, the tool comprises a substrate and a multilayer coating deposited on the surface of the substrate in sequence by a chemical vapor deposition method, the multilayer coating comprising (Zr, Al) y Bx coating, and 1.9≤x / y≤2.2, with (Zr,Al) y B x As the coating is deposited, the Al content in the coating gradually increases.

[0007] As a preferred embodiment of a chemical vapor deposition multilayer coating tool according to the present invention, wherein: (Zr, Al) y B x The coating is composed of ZrB2 phase and AlB2 phase, and the volume fraction of ZrB2 phase is 80-90%.

[0008] As a preferred embodiment of a chemical vapor deposition multilayer coating tool according to the present invention, wherein: (Zr, Al) y B x The coating has a columnar crystal structure and its micro-Vickers hardness reaches over 35GPa.

[0009] As a preferred embodiment of a chemical vapor deposition multilayer coating tool described in the present invention, the multilayer coating also includes (Zr, Al) deposited on the surface of the substrate. y B x The bonding layer between the coating layers is at least one of TiN, Ti, ZrN and Zr, preferably ZrN, and the thickness of the bonding layer is 0.5-2.0 μm.

[0010] As a preferred embodiment of a chemical vapor deposition multilayer coating tool according to the present invention, wherein: (Zr, Al) y B x A surface layer is deposited on the surface of the coating.

[0011] As a preferred solution of the chemical vapor deposition multilayer coating tool described in the present invention, the surface layer is at least one of ZrN and ZrCN, and the total thickness of the surface layer is 0.2-2.0 μm.

[0012] As a preferred solution of the chemical vapor deposition multi-layer coating tool described in the present invention, the total thickness of the multi-layer coating is 4.0-12.0 μm.

[0013] As a preferred solution of the chemical vapor deposition multilayer coating tool described in the present invention, the substrate is made of any one of cemented carbide, high-speed steel, metal ceramic, polycrystalline diamond, cubic boron nitride and other materials.

[0014] To solve the above technical problem, according to another aspect of the present invention, the present invention provides the following technical solution:

[0015] A method for preparing the above-mentioned chemical vapor deposition multi-layer coating tool, depositing a multi-layer coating on a substrate by chemical vapor deposition;

[0016] (Zr,Al) y B x The coating is deposited at 800-950°C and 50-200mbar using H2, ZrCl4, BCl3, AlCl3, and Ar (the purity of each gas is greater than 99.99%) as raw materials. During the deposition process, the flow rate of ZrCl4 gradually decreases, while the flow rates of other gases are fixed.

[0017] To solve the above technical problem, according to another aspect of the present invention, the present invention provides the following technical solution:

[0018] An application of the above-mentioned chemical vapor deposition multilayer coating tool in the cutting process of materials such as titanium alloy, nickel-based high-temperature alloy, etc.

[0019] The beneficial effects of the present invention are as follows:

[0020] The present invention provides a chemical vapor deposition multilayer coating tool and a preparation method thereof, the chemical vapor deposition multilayer coating tool comprises a substrate and a multilayer coating sequentially deposited on the surface of the substrate by a chemical vapor deposition method, the multilayer coating comprising (Zr, Al) y B x coating, and 1.9≤x / y≤2.2, with (Zr,Al) y B x The Al content in the coating increases gradually as the coating is deposited. The multilayer coating tool provided by the present invention has better wear resistance, toughness, oxidation resistance, bonding strength and low friction coefficient, and can be applied to cutting of materials such as titanium alloys and nickel-based high-temperature alloys. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the structures shown in these drawings without paying creative work.

[0022] Figure 1 It is a schematic cross-sectional view of a chemical vapor deposition multi-layer coating tool of the present invention.

[0023] In the figure, 100-substrate, 200-multilayer coating, 201-bonding layer, 202-(Zr,Al) y B x Coating, 203-Surface layer.

[0024] The realization of the purpose, functional features and advantages of the present invention will be further explained in conjunction with embodiments and with reference to the accompanying drawings. DETAILED DESCRIPTION

[0025] The following will be described clearly and completely in conjunction with the technical solutions in the embodiments. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0026] The present invention provides a chemical vapor deposition multilayer coating tool and a preparation method thereof. In order to reduce the diffusion of boron into the substrate as much as possible, at least one coating of TiN, ZrN, Ti, and Zr can be deposited before depositing the boride. In addition, the starting oxidation temperature of the boride coating is relatively low (usually <500°C). y B x The coating has a high oxidation resistance temperature, high wear resistance and low friction coefficient. y B x As the coating is deposited, the Al content gradually increases, which can make the coating have good internal toughness and good external wear resistance and oxidation resistance, making it suitable for turning and milling of titanium alloys and nickel-based high-temperature alloys. (Zr,Al) y B x The x / y atomic ratio of the coating is controlled at 1.9≤x / y≤2.2: When x / y<1.9, (Zr, Al) y B x There are vacancies in the coating lattice, and the coating hardness is low; when x / y>2.2, (Zr,Al) y B x Excessive free B elements in the coating will reduce the hardness of the coating; specifically, x / y can be, for example, any one of 1.9, 1.95, 2.0, 2.05, 2.1, 2.15, 2.2 or a range between any two. (Zr, Al) y B x The volume fraction of ZrB2 phase in the coating is controlled between 80-90%. When the volume fraction of ZrB2 phase is lower than 80%, (Zr,Al) y B x A high AlB2 content in the coating will result in insufficient toughness of the coating; when the volume fraction of the ZrB2 phase is higher than 90%, a low AlB2 content in the coating will result in poor oxidation resistance of the coating. Specifically, (Zr,Al) y B x The volume fraction of the ZrB2 phase in the coating can be, for example, any one of 80%, 81%, 82%, 83%, 84%, 85%, 86%, 87%, 88%, 89%, 90%, or a range between any two of them.

[0027] like Figure 1 As shown, the chemical vapor deposition multilayer coating tool of the present invention includes a substrate 100 and a multilayer coating 200 sequentially deposited on the surface of the substrate 100. The substrate 100 can be made of any one of cemented carbide, high-speed steel, metal ceramic, polycrystalline diamond, cubic boron nitride and the like. The bonding layer 201 can be at least one of Ti, TiN, Zr, ZrN and the like, preferably ZrN, and also includes (Zr, Al) y B x The coating layer 202 and the surface layer 203, the surface layer 203 is at least one of ZrN and ZrCN.

[0028] The technical solution of the present invention is further described below in conjunction with specific embodiments.

[0029] Example 1

[0030] A method for preparing a chemical vapor deposition multilayer coating tool, wherein the substrate is a WC-Co based cemented carbide, the bonding layer is ZrN, the middle layer is (Zr, Al) B2, and the surface layer is ZrN. The coatings are deposited on the substrate surface in sequence, and the total coating thickness is 7 μm. The preparation method of each layer is as follows:

[0031] (1) Bonding layer ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gas ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm;

[0032] (2) Intermediate layer (Zr,Al)B2, deposition temperature is 850℃, deposition pressure is 100mbar, reaction gases are H2, ZrCl4, BCl3, AlCl3, Ar, and the purity of each gas is greater than 99.99%; during the deposition process, the flow rate of ZrCl4 gradually decreases, and the flow rates of other gases are fixed, so that the volume fraction of ZrB2 phase in the coating decreases from 90% to 85%, and the Al content gradually increases. The deposition time is 720min and the coating thickness is 6.0μm;

[0033] (3) Surface ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gases ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm.

[0034] Example 2

[0035] A method for preparing a chemical vapor deposition multilayer coating tool, wherein the substrate is a WC-Co based cemented carbide, the bonding layer is ZrN, the middle layer is (Zr, Al) B2, and the surface layer is ZrN. The coatings are deposited on the substrate surface in sequence, and the total coating thickness is 7 μm. The preparation method of each layer is as follows:

[0036] (1) Bonding layer ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gas ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm;

[0037] (2) Intermediate layer (Zr,Al)B2, deposition temperature 850℃, deposition pressure 100mbar, reaction gases H2, ZrCl4, BCl3, AlCl3, Ar, the purity of each gas is greater than 99.99%; during the deposition process, the flow rate of ZrCl4 gradually decreased, and the flow rates of other gases were fixed, so that the volume fraction of ZrB2 phase in the coating decreased from 85% to 80%, and the Al content gradually increased. The deposition time was 720min and the coating thickness was 6.0μm;

[0038] (3) Surface ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gases ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm.

[0039] Example 3

[0040] A method for preparing a chemical vapor deposition multilayer coating tool, wherein the substrate is a WC-Co based cemented carbide, the bonding layer is ZrN, and the intermediate layer is (Zr,Al)B 1.9 , the surface layer is ZrN, and the coating is deposited on the substrate surface in sequence. The total coating thickness is 7μm. The preparation method of each layer is as follows:

[0041] (1) Bonding layer ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gas ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm;

[0042] (2) Intermediate layer (Zr,Al)B 1.9 , deposition temperature 850℃, deposition pressure 100mbar, reaction gases H2, ZrCl4, BCl3, AlCl3, Ar, the purity of each gas is greater than 99.99%; during the deposition process, the flow rate of ZrCl4 gradually decreased, and the flow rates of other gases were fixed, so that the volume fraction of ZrB2 phase in the coating decreased from 90% to 85%, the Al content gradually increased, the deposition time was 720min, and the coating thickness was 6.0μm;

[0043] (3) Surface ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gases ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm.

[0044] Example 4

[0045] A method for preparing a chemical vapor deposition multilayer coating tool, wherein the substrate is a WC-Co based cemented carbide, the bonding layer is ZrN, and the intermediate layer is (Zr,Al)B 1.9 , the surface layer is ZrN, and the coating is deposited on the substrate surface in sequence. The total coating thickness is 7μm. The preparation method of each layer is as follows:

[0046] (1) Bonding layer ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gas ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm;

[0047] (2) Intermediate layer (Zr,Al)B 1.9 , deposition temperature 850℃, deposition pressure 100mbar, reaction gases H2, ZrCl4, BCl3, AlCl3, Ar, the purity of each gas is greater than 99.99%; during the deposition process, the flow rate of ZrCl4 gradually decreased, and the flow rates of other gases were fixed, so that the volume fraction of ZrB2 phase in the coating decreased from 85% to 80%, the Al content gradually increased, the deposition time was 720min, and the coating thickness was 6.0μm;

[0048] (3) Surface ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gases ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm.

[0049] Example 5

[0050] A method for preparing a chemical vapor deposition multilayer coating tool, wherein the substrate is a WC-Co based cemented carbide, the bonding layer is ZrN, and the intermediate layer is (Zr,Al)B 2.2 , the surface layer is ZrN, and the coating is deposited on the substrate surface in sequence. The total coating thickness is 7μm. The preparation method of each layer is as follows:

[0051] (1) Bonding layer ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gas ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm;

[0052] (2) Intermediate layer (Zr,Al)B 2.2 , deposition temperature 850℃, deposition pressure 100mbar, reaction gases H2, ZrCl4, BCl3, AlCl3, Ar, the purity of each gas is greater than 99.99%; during the deposition process, the flow rate of ZrCl4 gradually decreased, and the flow rates of other gases were fixed, so that the volume fraction of ZrB2 phase in the coating decreased from 90% to 85%, the Al content gradually increased, the deposition time was 720min, and the coating thickness was 6.0μm;

[0053] (3) Surface ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gases ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm.

[0054] Example 6

[0055] A method for preparing a chemical vapor deposition multilayer coating tool, wherein the substrate is a WC-Co based cemented carbide, the bonding layer is ZrN, and the intermediate layer is (Zr,Al)B 2.2 , the surface layer is ZrN, and the coating is deposited on the substrate surface in sequence. The total coating thickness is 7μm. The preparation method of each layer is as follows:

[0056] (1) Bonding layer ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gas ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm;

[0057] (2) Intermediate layer (Zr,Al)B 2.2 , deposition temperature 850℃, deposition pressure 100mbar, reaction gases H2, ZrCl4, BCl3, AlCl3, Ar, the purity of each gas is greater than 99.99%; during the deposition process, the flow rate of ZrCl4 gradually decreased, and the flow rates of other gases were fixed, so that the volume fraction of ZrB2 phase in the coating decreased from 85% to 80%, the Al content gradually increased, the deposition time was 720min, and the coating thickness was 6.0μm;

[0058] (3) Surface ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gases ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm.

[0059] Comparative Example 1

[0060] A method for preparing a chemical vapor deposition multilayer coating tool, wherein the substrate is a WC-Co based cemented carbide, the bonding layer is ZrN, the middle layer is ZrB2, and the surface layer is ZrN. The coatings are deposited on the substrate surface in sequence, and the total coating thickness is 7 μm. The preparation methods of each layer are as follows:

[0061] (1) Bonding layer ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gas ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm;

[0062] (2) Intermediate layer ZrB2, deposition temperature 850 °C, deposition pressure 100 mbar, reaction gases H2, ZrCl4, BCl3, Ar, the purity of each gas is greater than 99.99%, deposition time 720 min, coating thickness 6.0 μm;

[0063] (3) Surface ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gases ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm.

[0064] Comparative Example 2

[0065] A method for preparing a chemical vapor deposition multilayer coating tool, wherein the substrate is a WC-Co based cemented carbide, the bonding layer is ZrN, and the intermediate layer is ZrB 1.9 , the surface layer is ZrN, and the coating is deposited on the substrate surface in sequence. The total coating thickness is 7μm. The preparation method of each layer is as follows:

[0066] (1) Bonding layer ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gas ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm;

[0067] (2) Intermediate layer ZrB 1.9 , deposition temperature 850℃, deposition pressure 100mbar, reaction gases H2, ZrCl4, BCl3, Ar, purity of each gas is greater than 99.99%, deposition time 720min, coating thickness 6.0μm;

[0068] (3) Surface ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gases ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm.

[0069] Comparative Example 3

[0070] A method for preparing a chemical vapor deposition multilayer coating tool, wherein the substrate is a WC-Co based cemented carbide, the bonding layer is ZrN, and the intermediate layer is ZrB 2.2 , the surface layer is ZrN, and the coating is deposited on the substrate surface in sequence. The total coating thickness is 7μm. The preparation method of each layer is as follows:

[0071] (1) Bonding layer ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gas ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm;

[0072] (2) Intermediate layer ZrB2.2 , deposition temperature 850℃, deposition pressure 100mbar, reaction gases H2, ZrCl4, BCl3, Ar, purity of each gas is greater than 99.99%, deposition time 720min, coating thickness 6.0μm;

[0073] (3) Surface ZrN, deposition temperature 900 °C, deposition pressure 100 mbar, reaction gases ZrCl4, N2, H2, the purity of each gas is greater than 99.99%, deposition time 60 min, coating thickness 0.5 μm.

[0074] The performance of the cutting tools prepared in the embodiments and comparative examples was tested, and the results are shown in Table 1.

[0075] Table 1

[0076]

[0077] The following tests were conducted on the processing performance of the cutting tools prepared by the embodiments of the present invention and the comparative examples, wherein:

[0078] Test condition 1 is as follows:

[0079] Processing method: milling

[0080] Material: TC18

[0081] Blade type: RPHT120408M8E-MM3

[0082] Cutting conditions: cutting speed 60m / min, feed 0.4mm / z, cutting depth 1.5mm, cutting width ae60mm, wet cutting

[0083] On the premise of no chipping, the number of tool parts processed is calculated after the tool face wear reaches 0.3 mm. The results are shown in Table 2.

[0084] Table 2

[0085]

[0086] Test condition 2 is as follows:

[0087] Processing method: continuous turning

[0088] Material: GH4169

[0089] Blade type: WNMG080408-SC3

[0090] Cutting conditions: cutting speed 60m / min, feed 0.25mm, cutting depth 1.0mm, dry cutting

[0091] Under the condition of no chipping, the cutting time after the tool life is up to 0.3 mm is calculated. The test results are shown in Table 3. The wear of the tool face after the tool is empty is measured by an OLYMPUS SZ61 optical super-depth microscope with a scale.

[0092] Table 3

[0093]

[0094] It can be seen from Tables 1-3 above that the service life of the cutting tools in the embodiments of the present invention is significantly better than that in the comparative example, and the wear resistance of the cutting tools in the embodiments of the present invention is greatly improved.

[0095] The above description is only a preferred embodiment of the present invention, and does not limit the patent scope of the present invention. All equivalent structural changes made by using the contents of the present invention specification under the inventive concept of the present invention, or directly / indirectly applied in other related technical fields are included in the patent protection scope of the present invention.

Claims

1. A chemical vapor deposition multilayer coating tool, characterized in that: The tool includes a substrate and a multi-layer coating deposited on the surface of the substrate in sequence by a chemical vapor deposition method, wherein the multi-layer coating includes (Zr, Al) y B x coating, and 1.9≤x / y≤2.2, with (Zr,Al) y B x During the deposition of the coating, the Al content in the coating gradually increases; (Zr, Al) y B x The coating is composed of ZrB2 phase and AlB2 phase.

2. The chemical vapor deposition multilayer coating tool according to claim 1, characterized in that: (Zr,Al) y B x The volume fraction of ZrB2 phase in the coating is 80-90%.

3. The chemical vapor deposition multilayer coating tool according to claim 1, characterized in that: (Zr,Al) y B x The coating has a columnar crystal structure and its micro-Vickers hardness reaches over 35GPa.

4. The chemical vapor deposition multi-layer coating tool according to claim 1, characterized in that: The multilayer coating also includes (Zr,Al) deposited on the substrate surface y B x The bonding layer between the coatings is at least one of TiN, Ti, ZrN and Zr, and the thickness of the bonding layer is 0.5-2.0 μm.

5. The chemical vapor deposition multi-layer coating tool according to claim 1, characterized in that: (Zr,Al) y B x A surface layer is deposited on the surface of the coating.

6. The chemical vapor deposition multilayer coating tool according to claim 5, characterized in that: The surface layer is at least one of ZrN and ZrCN, and the total thickness of the surface layer is 0.2-2.0 μm.

7. The chemical vapor deposition multi-layer coating tool according to claim 1, characterized in that: The total thickness of the multilayer coating is 4.0-12.0 μm.

8. The chemical vapor deposition multi-layer coating tool according to claim 1, characterized in that: The substrate is made of any one of cemented carbide, high-speed steel, metal ceramic, polycrystalline diamond and cubic boron nitride.

9. A method for preparing a chemical vapor deposition multilayer coating tool according to any one of claims 1 to 8, characterized in that: depositing a multilayer coating on a substrate by chemical vapor deposition; (Zr,Al) y B x The coating is deposited at 800-950°C and 50-200mbar using H2, ZrCl4, BCl3, AlCl3 and Ar as raw materials. During the deposition process, the flow rate of ZrCl4 gradually decreases, while the flow rates of other gases are fixed.

10. Use of the chemical vapor deposition multilayer coating tool according to any one of claims 1 to 8 in cutting titanium alloy and nickel-based high-temperature alloy materials.

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