Method for detecting hot spots through contour line deformation mode
Through the contour deformation method, the contour lines in the image are expanded or reduced, and the contact points are defined as hot spots, which solves the problem of inaccurate hot spot detection in the prior art, and realizes accurate hot spot detection in one-dimensional and two-dimensional graphics .
Patent Information
- Application Number
- CN202411546914.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-31
- Publication Date
- 2025-02-14
AI Technical Summary
In the prior art, it is impossible to correctly obtain accurate hot spot locations, especially in hot spot detection in two-dimensional graphics areas.
Detecting hot spots through contour deformation method. The specific steps include providing an image that needs to be detected by hot spots, extracting the contour lines of the figure, and expanding or shrinking the two adjacent contour lines, defining the points in contact between the two adjacent contour lines as Hot topics.
It effectively solves the problem that hot spots cannot be effectively marked in SEM diagrams, avoids artificial errors, and can accurately detect hot spot locations in one-dimensional and two-dimensional graphics.
Smart Images

Figure CN119438235A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the field of semiconductor technology, and in particular to a method for detecting hot spots by means of contour line deformation. Background Art
[0002] At present, the detection of hot spots (hot spots) will be based on the model simulation results of OPC (optical proximity correction) to locate the hot spots. Taking the following figure as an example, the hot spot position will be highlighted in the area based on the results of OPC simulation. However, these OPC highlighted hot spots often do not match the data on the wafer. The hot spot position cannot be characterized in a very intuitive way. Most of them are now judged by human observation, which will cause errors between people.
[0003] Software can also be used to find CD (critical dimension) outliers by measuring the entire image. However, some hot spots are not necessarily in the 1D (one-dimensional graphics) area. It is difficult to measure these 2D (two-dimensional graphics) areas, and it is impossible to correctly determine the exact hot spot location.
[0004] In order to solve the above problems, it is necessary to propose a new method to detect hot spots by deforming contour lines. Summary of the invention
[0005] In view of the above-mentioned shortcomings of the prior art, an object of the present invention is to provide a method for detecting hot spots by means of contour deformation, so as to solve the problem that the accurate hot spot position cannot be correctly obtained in the prior art.
[0006] To achieve the above-mentioned and other related purposes, the present invention provides a method for detecting hot spots by deforming contour lines, comprising:
[0007] Step 1: Provide an image to be detected for hot spots and extract contour lines from the graphics therein;
[0008] Step 2: for all the contour lines, expand or shrink two adjacent contour lines, and define the point where the two adjacent contour lines touch as a hotspot.
[0009] Preferably, the image that needs to be subjected to hot spot detection in step 1 is a detection image after development.
[0010] Preferably, in step 1, the post-development detection image is obtained according to a model simulation result of optical proximity correction.
[0011] Preferably, in step one, the post-development detection image is obtained according to the actual development result of the product.
[0012] Preferably, the graphics in step one include line graphics and two-dimensional graphics.
[0013] Preferably, the method of expanding the two adjacent contour lines in step 2 comprises: selecting two adjacent contour lines having a spacing greater than a preset distance; respectively selecting expansion points and expansion coefficients of the two contour lines; and expanding the two contour lines.
[0014] Preferably, the method of expanding the two adjacent contour lines in step 2 comprises: selecting the two adjacent contour lines having overlapping parts; selecting the reduction points and reduction coefficients of the two contour lines respectively; and reducing the two contour lines.
[0015] As described above, the method of detecting hot spots by deforming contour lines of the present invention has the following beneficial effects:
[0016] The present invention solves the problem that hot spots cannot be effectively marked in SEM (electron microscope) images. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] Figure 1 Shown is a schematic diagram of a method for detecting hot spots of the present invention;
[0018] Figure 2 It is a schematic diagram showing hot spot expansion detection of two adjacent contour lines according to the present invention;
[0019] Figure 3 Shown is a schematic diagram of detecting hot spots by shrinking two adjacent contour lines according to the present invention;
[0020] Figure 4 Shown is a schematic diagram of detecting hot spots for two-dimensional graphics according to the present invention. DETAILED DESCRIPTION
[0021] The following describes the embodiments of the present invention through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and the details in this specification can also be modified or changed in various ways based on different viewpoints and applications without departing from the spirit of the present invention.
[0022] See also Figure 1 The present invention provides a method for detecting hot spots by deforming contour lines, comprising:
[0023] Step 1: Provide an image to be detected for hot spots and extract contour lines from the graphics therein;
[0024] In some embodiments, the image to be subjected to hot spot detection in step 1 is a post-development detection image.
[0025] In some embodiments, in step 1, a post-development detection image is obtained according to a model simulation result of optical proximity correction.
[0026] In some embodiments, in step 1, a post-development detection image is obtained based on the actual development result of the product.
[0027] In some embodiments, the graphics in step one include line graphics and two-dimensional graphics.
[0028] Step 2: For all contour lines, expand or shrink two adjacent contour lines, and define the point where two adjacent contour lines touch as a hotspot. By expanding or shrinking, deformation in two directions can be achieved, such as graphic problems caused by too small spacing or too small line graphics.
[0029] In some embodiments, see Figure 2 The method for expanding two adjacent contour lines in step 2 includes: selecting two adjacent contour lines with a spacing greater than a preset distance; selecting expansion points and expansion coefficients of the two contour lines respectively; and expanding the two contour lines.
[0030] The contour line expansion method can be used as a more intuitive failure graph judgment standard to avoid human errors.
[0031] The contour expansion method can not only highlight the failure of one-dimensional graphics, such as the unhealthy one-dimensional graphics caused by roughness. It can also be effectively implemented for two-dimensional graphics, such as Figure 4 The oblique graphics shown are invalid.
[0032] In some embodiments, see Figure 3 The method for expanding two adjacent contour lines in step 2 includes: selecting two adjacent contour lines with overlapping parts; selecting reduction points and reduction coefficients of the two contour lines respectively; and reducing the two contour lines.
[0033] It should be noted that the illustrations provided in this embodiment are only used to illustrate the basic concept of the present invention in a schematic manner. Therefore, the drawings only show components related to the present invention rather than being drawn according to the number, shape and size of components in actual implementation. In actual implementation, the type, quantity and proportion of each component may be changed arbitrarily, and the component layout may also be more complicated.
[0034] In summary, the present invention solves the problem that hot spots cannot be effectively marked in SEM (electron microscope) images. Therefore, the present invention effectively overcomes various shortcomings in the prior art and has high industrial utilization value.
[0035] The above embodiments are merely illustrative of the principles and effects of the present invention, and are not intended to limit the present invention. Anyone familiar with the art may modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by a person of ordinary skill in the art without departing from the spirit and technical concept disclosed by the present invention shall still be covered by the claims of the present invention.
Claims
1. A method for detecting hot spots by contour deformation, characterized in that: At least: Step 1: Provide an image to be detected for hot spots and extract contour lines from the graphics therein; Step 2: for all the contour lines, expand or shrink two adjacent contour lines, and define the point where the two adjacent contour lines touch as a hotspot.
2. The method for detecting hot spots by contour deformation according to claim 1, characterized in that: The image that needs to be detected for hot spots in step 1 is a detection image after development.
3. The method for detecting hot spots by contour deformation according to claim 2, characterized in that: In step 1, the post-development detection image is obtained according to the model simulation result of the optical proximity correction.
4. The method for detecting hot spots by contour deformation according to claim 2, characterized in that: In step one, the post-development detection image is obtained according to the actual development result of the product.
5. The method for detecting hot spots by contour deformation according to claim 1, characterized in that: The graphics in step one include line graphics and two-dimensional graphics.
6. The method for detecting hot spots by contour deformation according to claim 1, characterized in that: The method for expanding the two adjacent contour lines in step 2 includes: selecting two adjacent contour lines with a spacing greater than a preset distance; selecting expansion points and expansion coefficients of the two contour lines respectively; and expanding the two contour lines.
7. The method for detecting hot spots by contour deformation according to claim 1, characterized in that: The method for expanding the two adjacent contour lines in step 2 includes: selecting the two adjacent contour lines having overlapping parts; selecting the reduction points and reduction coefficients of the two contour lines respectively; and reducing the two contour lines.
Citation Information
Patent Citations
Layout design photolithographic technology friendliness detection method
CN103645611A
Defect detection method for photolithographic process graph
CN103645612A
Photoetching defect hot spot graph identification method and graph structure
CN114764215A
Layout correction method for improving metal layer process window
CN115268207A
Method and device for detecting photoetching hot spot position
CN116382039A