The invention relates to a device (100, 200, 300) for detecting crystalline defects in an off-axis monocrystalline substrate (10), wherein the normal (2) to the surface of the substrate (10) is tilted with respect to the crystallographic growth axis (3) by a tilt angle (4), the tilt angle (4) being contained in a plane, called angle plane, perpendicular to the surface, the device (100) comprising: - at least one
detector (14, 14', 14a, 14b, 14c), - at least one illumination
light source (12) configured to illuminate the substrate (10) with an illuminating
light beam (13), the at least one illumination
light source (12) being arranged in at least one of a first position and a second position, - at least one excitation
light source (19) configured to illuminate the substrate with an excitation
light beam (20) configured to produce an emission of
photoluminescence light by the substrate (10), - imaging means (16, 17) configured to image the substrate (10) according to a
field of view on the at least one
detector(14, 14', 14a, 14b, 14c), said at least one
detector producing at least one image of the substrate (10), and -
processing means (18) configured to detect crystalline defects using said at least one image of the substrate (10), wherein the at least one illumination light source (12) and the imaging means (16, 17) are arranged in a dark-field configuration, and wherein in the first position, the at least one illumination light source (12) is arranged such that the illuminating
light beam (13) is parallel or quasi-parallel to the angle plane (4), and in the second position, the at least one illumination light source (12) is arranged such that the illuminating light beam (13) is parallel or quasi-parallel to a plane, called perpendicular plane, containing the normal (2) to the surface and being perpendicular to the angle plane. The invention also relates to a method for detecting crystalline defects in an off-axis monocrystalline substrate.