X-ray tube anode target disc, welding structure and target disc preparation method

Abstract

The invention relates to an X-ray tube anode target disc, a welding structure and a target disc preparation method. The X-ray tube anode target disc comprises graphite, metal and a welding layer used for welding the graphite and the metal. The graphite and the metal are annular, on two opposite surfaces of the graphite and the metal, one surface is provided with a convex block, and the other surface is provided with a groove matched with the convex block; the welding layer comprises a first welding area, a second welding area and a third welding area which take the axis of the target disc as the radial direction of the target disc; the first welding area, the second welding area and the third welding area are arranged in a step shape, and the second welding area is located between the protruding block and the groove. Wherein the thickness of the welding flux in the first welding area is not equal to that of the welding flux in the third welding area. According to the X-ray tube anode target disc, the porosity of the welding layer is low, the welding quality is good, the connecting strength between graphite and metal is high, the connecting stability is good, and the using working condition requirements of the X-ray tube anode target disc at the high temperature and the high rotating frequency can be effectively met.

Description

Technical Field

[0001] The present application relates to the technical field of preparation of parts for medical devices, and in particular to an anode target plate of an X-ray tube and a preparation method thereof. Background Art

[0002] X-ray tubes are used to generate X-rays and play an important role in various fields such as medical diagnosis, safety inspection and non-destructive testing. X-ray tubes include a vacuum tube and a cathode filament and an anode target plate arranged in the vacuum tube. The cathode filament is used to generate an electron beam pointing to the anode target plate, and the surface of the anode target plate converts the kinetic energy of the electron beam to the anode target plate into high-frequency electromagnetic waves, namely X-rays. The anode target plate generally includes metal and graphite made of molybdenum alloy. The metal generates X-rays when bombarded by electrons from the cathode filament, and the graphite is used for heat storage. Generally, metal and graphite are connected by brazing. However, due to the high porosity of the welding layer during the brazing process of metal and graphite, the connection strength between the two is low, resulting in poor stability of the metal and graphite connection, which is difficult to meet the requirements of the X-ray anode target plate under high temperature and high rotation frequency conditions. Summary of the invention

[0003] Based on this, it is necessary to provide an X-ray tube anode target to address the problem that the welding layer between the metal and graphite in the existing X-ray tube anode target has a high porosity, which results in low connection strength and poor connection stability between the two, making it difficult to meet the operating conditions under higher temperatures and higher rotation frequencies.

[0004] An X-ray tube anode target plate, comprising graphite, metal, and a welding layer for welding the graphite and the metal;

[0005] The graphite and the metal are in annular shape, and on two surfaces of the graphite and the metal facing each other, one surface is configured with a protrusion, and the other surface is configured with a groove matching with the protrusion;

[0006] The welding layer comprises a first welding area, a second welding area and a third welding area along the radial direction of the anode target disk of the X-ray tube with the axis of the anode target disk of the X-ray tube; the first welding area, the second welding area and the third welding area are arranged in a stepped shape, and the second welding area is located between the protrusion and the groove;

[0007] The solder thickness of the first welding area is not equal to the solder thickness of the third welding area.

[0008] In one embodiment, if the solder thickness h1 of the first welding area is less than the solder thickness h3 of the third welding area, the solder thickness h2 of the second welding area satisfies the condition:

[0009] h1<h2≤h3 or h1≤h2<h3;

[0010] If the solder thickness h1 of the first soldering area is greater than the solder thickness h3 of the third soldering area, then the solder thickness h2 of the second soldering area satisfies the condition:

[0011] h3<h2≤h1 or h3≤h2

[0012] In one embodiment, if the solder thickness h1 of the first welding area is less than the solder thickness h3 of the third welding area, the height of the upper end surface of the first welding area is higher than the height of the upper end surface of the third welding area, and the height of the lower end surface of the first welding area is higher than the height of the lower end surface of the third welding area; or

[0013] If the solder thickness h1 of the first welding area is greater than the solder thickness h3 of the third welding area, the height of the upper end surface of the first welding area is lower than the height of the upper end surface of the third welding area, and the height of the lower end surface of the first welding area is lower than the height of the lower end surface of the third welding area.

[0014] In one embodiment, a first sidewall channel is formed on the sidewall of the groove and the protrusion, and the first sidewall channel is used to conduct the first welding area and the second welding area;

[0015] A second sidewall channel is also formed on the sidewall of the groove and the protrusion, and the second sidewall channel is used to conduct the second welding area and the third welding area;

[0016] The solder thickness L1 in the first channel of the side wall is less than or equal to the solder thickness L2 in the second channel of the side wall.

[0017] The present application also provides a welding structure of an anode target plate of an X-ray tube, which can solve at least one of the above technical problems.

[0018] In one embodiment, the welding structure of the anode target of an X-ray tube includes graphite, metal and a solder block placed between the graphite and the metal, wherein the graphite and the metal are in a ring shape;

[0019] On two surfaces of the graphite and the metal facing each other, one surface is configured with a protrusion, and the other surface is configured with a groove matching with the protrusion;

[0020] The solder block is placed in the groove, and the protrusion is matched with the groove; when the protrusion is matched with the groove, a first matching area, a second matching area and a third matching area are formed from the axis to the outside along the radial direction of the graphite, and the first matching area, the second matching area and the third matching area are arranged in a stepped shape; ​

[0021] Wherein, the heights of the first matching area and the third matching area along the axial direction of the graphite are not equal.

[0022] In one embodiment, the upper end surface and / or the lower end surface of the second matching area further has a groove structure.

[0023] In one embodiment, if the height d1 of the first matching area is less than the height d2 of the third matching area, the thickness h of the solder block satisfies the condition:

[0024] d1<h≤d2 or d1≤h<d2;

[0025] If the height d1 of the first matching area is greater than the height d2 of the third matching area, the thickness h of the solder block satisfies the condition:

[0026] d2<h≤d1 or d2≤h<d1.

[0027] In one embodiment, if the height d1 of the first matching area is less than the height d2 of the third matching area, the height of the upper end surface of the first matching area is higher than the height of the upper end surface of the third matching area, and the height of the lower end surface of the first matching area is higher than the height of the lower end surface of the third matching area; or

[0028] If the height d1 of the first matching area is greater than the height d2 of the third matching area, the height of the upper end surface of the first matching area is lower than the height of the upper end surface of the third matching area, and the height of the lower end surface of the first matching area is lower than the height of the lower end surface of the third matching area.

[0029] In one of the embodiments, a first sidewall channel is formed on the sidewall of the groove and the protrusion, and the first sidewall channel is used to conduct the first matching area and the second matching area;

[0030] A second sidewall channel is also formed on the sidewall of the groove and the protrusion, and the second sidewall channel is used to conduct the second matching area and the third matching area;

[0031] The width d3 of the first channel of the side wall is less than or equal to the width d4 of the second channel of the side wall.

[0032] The present application also provides a method for preparing an anode target of an X-ray tube, which can solve at least one of the above technical problems.

[0033] In one embodiment, the method for preparing the X-ray tube anode target comprises:

[0034] On two surfaces of the graphite and the metal facing each other, a convex structure is constructed on one of the surfaces, and a groove structure matched with the convex is constructed on the other surface; when the convex and the groove are matched, a first matching area, a second matching area and a third matching area are formed from the axis to the outside along the radial direction of the graphite, and the first matching area, the second matching area and the third matching area are arranged in a stepped shape;

[0035] Placing a pre-configured solder block in the second matching area, wherein the solder block is used to weld the metal and the graphite to form an anode target of an X-ray tube;

[0036] Wherein, the first matching area and the third matching area have unequal axial heights along the graphite.

[0037] In one embodiment, the method further comprises:

[0038] The volume V of the solder block is calculated according to the volumes of the first mating area, the second mating area, and the third mating area formed by the metal and the graphite.

[0039] In one embodiment, the method further comprises:

[0040] Calculating the thickness h of the solder block according to the volume V of the solder block;

[0041] The height d1 of the first matching area and the height d2 of the third matching area are calculated according to the thickness h of the solder bump.

[0042] In one embodiment, the step of calculating the height d1 of the first matching area and the height d2 of the third matching area according to the thickness h of the solder block specifically includes:

[0043] If the height d1 of the first matching area is less than the height d2 of the third matching area, the thickness h of the solder block satisfies the condition:

[0044] d1<h≤d2 or d1≤h<d2;

[0045] If the height d1 of the first matching area is greater than the height d2 of the third matching area, the thickness h of the solder block satisfies the condition:

[0046] d2<h≤d1 or d2≤h<d1.

[0047] The above-mentioned X-ray tube anode target plate, the welding structure of the X-ray tube anode target plate and the preparation method of the X-ray tube anode target plate, because the two surfaces of the graphite and the metal facing each other, one of the surfaces is constructed with a protrusion, and the other surface is constructed with a groove matching the protrusion, the welding layer includes a first welding area, a second welding area and a third welding area along the radial direction of the X-ray tube anode target plate with the axis of the X-ray tube anode target plate, and the first welding area, the second welding area and the third welding area are arranged in a stepped manner, the second welding area is located between the protrusion and the groove, and the solder thickness of the first welding area is not equal to the solder thickness of the third welding area. Through this arrangement, when the graphite and the metal are welded, when the solder block melts in the groove and the protrusion, it can flow from the area where the second welding area is located to the areas of the first welding area and the third welding area respectively. And in this flow process, since the thickness of the welding layer on both sides is inconsistent, the time required to complete the welding of the two sides is also inconsistent, so that the gas generated during the welding process can be discharged through the side with a larger welding layer thickness after the welding is completed on the side with a smaller welding layer thickness. It can be seen that the anode target of the X-ray tube sets the thickness of the first welding zone and the third welding zone to be different, thereby forcing the gas generated during the welding process to be discharged through the side with a larger thickness of the unfinished welding layer, effectively controlling the flow direction of the gas in the solder after melting, thereby making the porosity of the entire welding layer lower, reducing the possibility of cold welding, improving the welding quality, and the connection strength between graphite and metal. The connection stability is also good, which can effectively meet the operating conditions of the anode target of the X-ray tube at higher temperatures and higher rotation frequencies. BRIEF DESCRIPTION OF THE DRAWINGS

[0048] Figure 1 A cross-sectional view of an anode target plate of an X-ray tube provided in an embodiment of the present application before welding.

[0049] Figure 2 for Figure 1 A partial cross-sectional view of an X-ray tube anode target before welding is shown.

[0050] Figure 3 for Figure 1 A partial cross-sectional view of an X-ray tube anode target after welding is shown.

[0051] Figure markings: 100-graphite; 110-bump; 111-first welding surface; 112-second welding surface; 113-third welding surface; 120-first groove structure; 200-metal; 210-groove; 211-fourth welding surface; 212-fifth welding surface; 213-sixth welding surface; 220-first channel; 230-second channel; 300-welding layer; 310-first welding area; 320-second welding area; 330-third welding area; 400-solder block; 510-first mating area; 520-second mating area; 530-third mating area. DETAILED DESCRIPTION

[0052] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without violating the connotation of the present application, so the present application is not limited by the specific embodiments disclosed below.

[0053] In the description of the present application, it should be understood that if the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. appear, the orientation or position relationship indicated by these terms is based on the orientation or position relationship shown in the accompanying drawings, which is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application.

[0054] In addition, if the terms "first" or "second" appear, these terms are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of the features. In the description of this application, if the term "plurality" appears, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0055] In this application, unless otherwise clearly specified and limited, if the terms "installed", "connected", "connected", "fixed" and the like appear, these terms should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integrated connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to the specific circumstances.

[0056] In the present application, unless otherwise clearly specified and limited, if there is a description that a first feature is "above" or "below" a second feature, etc., or similar descriptions appear, it may mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Moreover, the first feature being "above", "above" and "above" the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. The first feature being "below", "below" and "below" the second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0057] It should be noted that if an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may be a central element. If an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. If any, the terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used in this application are for illustrative purposes only and do not represent the only implementation method.

[0058] See also Figure 1 and Figure 3 , Figure 1 A cross-sectional view of an anode target plate of an X-ray tube provided by an embodiment of the present application before welding is shown. Figure 3 Shows Figure 1 A partial cross-sectional view of an X-ray tube anode target after welding is shown.

[0059] An embodiment of the present application provides an X-ray tube anode target disk, which includes graphite 100, metal 200, and a welding layer 300 for welding the graphite 100 and the metal 200; the graphite 100 and the metal 200 are annular, and on two surfaces of the graphite 100 and the metal 200 that are opposite to each other, one surface is configured with a protrusion 110, and the other surface is configured with a groove 210 that matches the protrusion 110; the welding layer 300 includes a first welding area 310, a second welding area 320 and a third welding area 330 along the radial direction of the X-ray tube anode target disk with the axis of the X-ray tube anode target disk, specifically, the axis of the X-ray tube anode target disk is Figure 1 The center of the straight line is a point on the axis p; the radial direction of the anode target of the X-ray tube is Figure 1 the first welding area 310, the second welding area 320 and the third welding area 330 are arranged in a stepped manner, the second welding area 320 is located between the bump 110 and the groove 210; wherein the solder thickness of the first welding area 310 is not equal to the solder thickness of the third welding area 330.

[0060] In the above-mentioned X-ray tube anode target, since one of the two surfaces of the graphite 100 and the metal 200 facing each other is configured with a bump 110, and the other surface is configured with a groove 210 matched with the bump 110, the welding layer 300 includes a first welding area 310, a second welding area 320 and a third welding area 330 along the radial direction of the X-ray tube anode target with the axis of the X-ray tube anode target, and the first welding area 310, the second welding area 320 and the third welding area 330 are arranged in a stepped manner, the second welding area 320 is located between the bump 110 and the groove 210, and the solder thickness of the first welding area 310 is not equal to the solder thickness of the third welding area 330. Through this arrangement, when the graphite 100 and the metal 200 are welded, when the solder block 400 melts in the groove 210 and the bump 110, it can flow from the area where the second welding area 320 is located to the areas of the first welding area 310 and the third welding area 330 respectively. In addition, during this flow process, since the thickness of the welding layers 300 on both sides is inconsistent, the time required to complete the welding on both sides is also inconsistent, so that the gas generated during the welding process can be discharged through the side with the larger thickness of the welding layer 300 where welding is not completed after the welding is completed on the side with the smaller thickness of the welding layer 300.

[0061] It can be seen that the anode target of the X-ray tube is precisely designed by setting the thickness of the first welding area 310 and the third welding area 330 to be different, thereby forcing the gas generated during the welding process to be discharged through the side of the unfinished welding layer 300 with a larger thickness, thereby effectively controlling the flow direction of the gas in the solder after melting, thereby making the porosity of the entire welding layer 300 lower, reducing the possibility of cold welding, improving the welding quality, and the connection strength between the graphite 100 and the metal 200. The connection stability is also good, which can effectively meet the operating conditions of the anode target of the X-ray tube at higher temperatures and higher rotation frequencies.

[0062] It should be noted that the groove 210 and the bump 110 that cooperate with each other on the metal 200 and the graphite 100 can be a complete annular groove 210 and annular bump 110, or a partial annular groove 210 and annular bump 110, and there is no special limitation on this.

[0063] In one specific embodiment, the metal 200 is TZM alloy (molybdenum titanium zirconium alloy). The solder of the welding layer 300 is Zr solder, or Ti solder, Ni solder, etc.

[0064] In one specific embodiment, the density of graphite 100 is 1.85 g / cm 3 .

[0065] The porosity of the welding layer 300 between the metal 200 and the graphite 100 of the X-ray anode target is less than 5%, and there is no large cold welding phenomenon. The shear strength of the connection between the metal 200 and the graphite 100 can reach 15-22MPa. The welding strength is high, and it can work normally at a temperature above 1400°C with stable performance and no cracking.

[0066] The following is a detailed description of the structure of the anode target of the X-ray tube. Figure 3 In one embodiment, if the solder thickness h1 of the first welding area 310 is less than the solder thickness h3 of the third welding area 330, the solder thickness h2 of the second welding area 320 satisfies the condition: h1<h2≤h3 or h1≤h2<h3. In another embodiment, if the solder thickness h1 of the first welding area 310 is greater than the solder thickness h3 of the third welding area 330, the solder thickness h2 of the second welding area 320 satisfies the condition: h3<h2≤h1 or h3≤h2

[0067] ​By setting the solder thickness of the first welding area 310, the second welding area 320 and the third welding area 330 to be gradually increased or gradually decreased, when the solder block 400 melts in the groove 210 and the bump 110 during the welding process of the graphite 100 and the metal 200, it can flow from the area where the second welding area 320 is located to the areas of the first welding area 310 and the third welding area 330 respectively. In addition, during this flow process, the gas generated during the welding process can pass through the second welding area 320 after the welding is completed on the side of the welding layer 300 with a smaller thickness, and finally be discharged through the side of the welding layer 300 with a larger thickness where the welding is not completed, effectively controlling the flow direction of the gas in the melted solder, thereby making the porosity of the entire welding layer 300 lower, reducing the possibility of cold welding, and improving the welding quality. The connection strength between the graphite 100 and the metal 200 is higher, and the connection stability is also better, which can effectively meet the use condition requirements of the anode target of the X-ray tube at a higher temperature and a higher rotation frequency.

[0068] See also Figure 3 In one embodiment, if the solder thickness h1 of the first welding area 310 is less than the solder thickness h3 of the third welding area 330, the solder thickness h1 of the first welding area 310 satisfies the condition: 0.1mm≤h1≤0.15mm. The solder thickness h3 of the third welding area 330 satisfies the condition: 0.2mm≤h3≤0.3mm. By setting the solder thickness h1 of the first welding area 310 and the solder thickness h3 of the third welding area 330 within the above range, the thickness of the entire welding layer 300 is maintained within a reasonable range under the condition that the solder thickness h1 of the first welding area 310 and the solder thickness h3 of the third welding area 330 are not equal, thereby making the connection strength of the graphite 100 and the metal 200 higher.

[0069] Specifically, in one embodiment, the solder thickness h1 of the first welding area 310 is 0.1 mm. In another embodiment, the solder thickness h1 of the first welding area 310 is 0.15 mm. In yet another embodiment, the solder thickness h1 of the first welding area 310 is 0.13 mm.

[0070] In one embodiment, the solder thickness h3 of the third welding area 330 is 0.2 mm. In another embodiment, the solder thickness h3 of the third welding area 330 is 0.3 mm. In another embodiment, the solder thickness h3 of the third welding area 330 is 0.25 mm.

[0071] In another embodiment, the solder thickness h1 of the first welding area 310 satisfies the condition: 0.09 mm ≤ h1 ≤ 0.14 mm. The solder thickness h3 of the third welding area 330 satisfies the condition: 0.19 mm ≤ h3 ≤ 0.29 mm.

[0072] In yet another embodiment, the solder thickness h1 of the first welding area 310 satisfies the condition: 0.11 mm≤h1≤0.16 mm. The solder thickness h3 of the third welding area 330 satisfies the condition: 0.21 mm≤h3≤0.31 mm.

[0073] In yet another embodiment, the solder thickness h1 of the first welding area 310 satisfies the condition: 0.09 mm ≤ h1 ≤ 0.17 mm. The solder thickness h3 of the third welding area 330 satisfies the condition: 0.19 mm ≤ h3 ≤ 0.31 mm.

[0074] See also Figure 3 In another embodiment, if the solder thickness h1 of the first welding area 310 is greater than the solder thickness h3 of the third welding area 330, the solder thickness h1 of the first welding area 310 satisfies the condition: 0.2mm≤h1≤0.3mm; the solder thickness h3 of the third welding area 330 satisfies the condition: 0.1mm≤h3≤0.15mm. By setting the solder thickness h1 of the first welding area 310 and the solder thickness h3 of the third welding area 330 within the above range, the thickness of the entire welding layer 300 is maintained within a reasonable range under the condition that the solder thickness h1 of the first welding area 310 and the solder thickness h3 of the third welding area 330 are not equal, thereby making the connection strength of the graphite 100 and the metal 200 higher.

[0075] Specifically, in one embodiment, the solder thickness h1 of the first welding area 310 is 0.2 mm. In another embodiment, the solder thickness h1 of the first welding area 310 is 0.3 mm. In yet another embodiment, the solder thickness h1 of the first welding area 310 is 0.25 mm.

[0076] In one embodiment, the solder thickness h3 of the third welding area 330 is 0.1 mm. In another embodiment, the solder thickness h3 of the third welding area 330 is 0.15 mm. In another embodiment, the solder thickness h3 of the third welding area 330 is 0.13 mm.

[0077] In another embodiment, the solder thickness h1 of the first welding area 310 satisfies the condition: 0.19 mm ≤ h1 ≤ 0.29 mm. The solder thickness h3 of the third welding area 330 satisfies the condition: 0.09 mm ≤ h3 ≤ 0.14 mm.

[0078] In yet another embodiment, the solder thickness h1 of the first welding area 310 satisfies the condition: 0.21 mm≤h1≤0.31 mm. The solder thickness h3 of the third welding area 330 satisfies the condition: 0.11 mm≤h3≤0.26 mm.

[0079] In yet another embodiment, the solder thickness h1 of the first welding area 310 satisfies the condition: 0.19 mm ≤ h1 ≤ 0.31 mm. The solder thickness h3 of the third welding area 330 satisfies the condition: 0.09 mm ≤ h3 ≤ 0.16 mm.

[0080] See also Figure 3 In one embodiment, if the solder thickness h1 of the first welding area 310 is less than the solder thickness h3 of the third welding area 330, the height of the upper end surface of the first welding area 310 is higher than the height of the upper end surface of the third welding area 330, and the height of the lower end surface of the first welding area 310 is higher than the height of the lower end surface of the third welding area 330. By such an arrangement, during the welding process of the graphite 100 and the metal 200, when the solder block 400 melts in the groove 210 and the bump 110, it can flow from the area where the second welding area 320 is located to the areas of the first welding area 310 and the third welding area 330 respectively. And in this flow process, since the solder thickness of the first welding area 310 is less than the solder thickness of the third welding area 330, at the same time, along Figure 3 In the yy' direction, the entire first welding area 310 is located above the third welding area 330, so that the time to complete the welding of the first welding area 310 is less than the time to complete the welding of the third welding area 330. At the same time, during the welding process, the gas generated by the first welding area 310 can pass through the second welding area 320 and finally be discharged from the lowest third welding area 330. That is to say, the gas generated during the welding process is discharged in a stepped manner from top to bottom, thereby reducing the porosity of the entire welding layer 300, reducing the possibility of cold welding, and improving the welding quality. The connection strength between the graphite 100 and the metal 200 is also high.

[0081] See also Figure 3In one embodiment, if the solder thickness h1 of the first welding area 310 is greater than the solder thickness h3 of the third welding area 330, the height of the upper end surface of the first welding area 310 is lower than the height of the upper end surface of the third welding area 330, and the height of the lower end surface of the first welding area 310 is lower than the height of the lower end surface of the third welding area 330. By such a configuration, during the welding process of the graphite 100 and the metal 200, when the solder block 400 melts in the groove 210 and the bump 110, it can flow from the area where the second welding area 320 is located to the areas of the first welding area 310 and the third welding area 330 respectively. And in this flow process, since the solder thickness of the first welding area 310 is greater than the solder thickness of the third welding area 330, at the same time, along Figure 3 In the yy' direction, the entire first welding area 310 is located below the third welding area 330, so that the time required to complete the welding of the first welding area 310 is longer than the time required to complete the welding of the third welding area 330. At the same time, during the welding process, the gas generated by the third welding area 330 can pass through the second welding area 320 and finally be discharged from the lowest first welding area 310. In other words, the gas generated during the welding process is discharged in a stepped manner from top to bottom, thereby reducing the porosity of the entire welding layer 300, reducing the possibility of producing cold welding, and improving the welding quality. The connection strength between the graphite 100 and the metal 200 is also high.

[0082] See also Figure 3 In one embodiment, a first side wall channel 220 is formed on the side wall of the groove 210 and the protrusion 110, and the first side wall channel 220 is used to conduct the first welding area 310 and the second welding area 320; a second side wall channel 230 is also formed on the side wall of the groove 210 and the protrusion 110, and the second side wall channel 230 is used to conduct the second welding area 320 and the third welding area 330; the solder thickness L1 in the first side wall channel 220 is less than or equal to the solder thickness L2 in the second side wall channel 230. By such a configuration, when the graphite 100 and the metal 200 are positioned before welding, the positioning of the two can be carried out through the narrower first side wall channel 220 close to the axial side of the anode target plate of the X-ray tube, and the positioning is more accurate.

[0083] In one embodiment, the solder thickness L1 in the first side wall channel 220 satisfies the condition: 0.1 mm ≤ L1 ≤ 0.2 mm; the solder thickness L2 in the second side wall channel 230 satisfies the condition: 0.3 mm ≤ L2 ≤ 0.4 mm. By setting the solder thickness L1 in the first side wall channel 220 and the solder thickness L2 in the second side wall channel 230 within the above range, the graphite 100 and the metal 200 can be positioned through the narrower first side wall channel 220 on the axial side of the anode target disk of the X-ray tube when positioning before welding, and the positioning is more accurate.

[0084] Specifically, in one embodiment, the solder thickness L1 in the first sidewall channel 220 is 0.1 mm. In another embodiment, the solder thickness L1 in the first sidewall channel 220 is 0.2 mm. In yet another embodiment, the solder thickness L1 in the first sidewall channel 220 is 0.15 mm.

[0085] In one embodiment, the solder thickness L2 in the second sidewall channel 230 is 0.3 mm. In another embodiment, the solder thickness L2 in the second sidewall channel 230 is 0.4 mm. In yet another embodiment, the solder thickness L2 in the second sidewall channel 230 is 0.35 mm.

[0086] In another embodiment, the solder thickness L1 in the first side wall channel 220 satisfies the condition: 0.09 mm ≤ L1 ≤ 0.19 mm; the solder thickness L2 in the second side wall channel 230 satisfies the condition: 0.29 mm ≤ L2 ≤ 0.39 mm.

[0087] In another embodiment, the solder thickness L1 in the first side wall channel 220 satisfies the condition: 0.11 mm≤L1≤0.21 mm; the solder thickness L2 in the second side wall channel 230 satisfies the condition: 0.31 mm≤L2≤0.41 mm.

[0088] In yet another embodiment, the solder thickness L1 in the first sidewall channel 220 satisfies the condition: 0.09 mm ≤ L1 ≤ 0.21 mm; and the solder thickness L2 in the second sidewall channel 230 satisfies the condition: 0.29 mm ≤ L2 ≤ 0.41 mm.

[0089] It should be noted that the solder thickness L1 in the first sidewall channel 220 and the solder thickness L2 in the second sidewall channel 230 are calculated based on the dimensional tolerance of the metal 200 and the graphite 100 .

[0090] The present application also provides a welding structure of an anode target disk of an X-ray tube, which includes graphite 100, metal 200 and a solder block 400 placed between the graphite 100 and the metal 200, wherein the graphite 100 and the metal 200 are annular; on two surfaces of the graphite 100 and the metal 200 facing each other, one surface is constructed with a protrusion 110, and the other surface is constructed with a groove 210 that matches the protrusion 110; the solder block 400 is placed in the groove 210, and the protrusion 110 matches with the groove 210; when the protrusion 110 and the groove 210 match, a first matching area 510, a second matching area 520 and a third matching area 530 are formed from the axis to the outside along the radial direction of the graphite 100, and the first matching area 510, the second matching area 520 and the third matching area 530 are arranged in a stepped shape, specifically, the axis of the graphite 100 is the same as the axis of the anode target disk of the X-ray tube, and both are Figure 1 The center of the straight line where p is located is a point on the axis p; the radial direction of the graphite 100 is Figure 1 wherein the heights of the first mating area 510 and the third mating area 530 along the axial direction of the graphite 100 are not equal, specifically, the height of the axial direction of the graphite 100 is Figure 1 and Figure 3 The yy' direction in .

[0091] When the X-ray tube anode target is prepared by the welding structure of the X-ray tube anode target, during the welding process of the graphite 100 and the metal 200, when the solder block 400 melts in the groove 210 and the protrusion 110, it can flow from the area where the second matching area 520 is located to the areas of the first matching area 510 and the third matching area 530. In addition, during the flow process, since the heights of the matching areas on both sides are inconsistent, the time required to complete the welding of the two sides is also inconsistent, so that the gas generated during the welding process can be discharged through the side with a larger height of the matching area where the welding is not completed after the welding is completed on the side with a smaller height of the matching area. It can be seen that the welding structure of the anode target of the X-ray tube is achieved by setting the heights of the first matching area 510 and the third matching area 530 to be different, thereby forcing the gas generated during the welding process to be discharged through the side of the unfinished matching area with a larger height, effectively controlling the flow direction of the solder after melting, thereby making the porosity of the entire welding layer 300 lower, reducing the possibility of cold welding, improving the welding quality, and providing a higher connection strength between the graphite 100 and the metal 200, as well as better connection stability, which can effectively meet the operating conditions of the anode target of the X-ray tube at higher temperatures and higher rotation frequencies.

[0092] See also Figure 1 and Figure 2In one embodiment, the surface of the graphite 100 facing the metal 200 is arranged with a first welding surface 111, a second welding surface 112 and a third welding surface 113 in a step-like manner from the axis to the outside in a radial direction; the surface of the metal 200 facing the graphite 100 is arranged with a fourth welding surface 211, a fifth welding surface 212 and a sixth welding surface 213 in a step-like manner from the axis to the outside in a radial direction. The first welding surface 111 is opposite to the fourth welding surface 211, the second welding surface 112 is opposite to the fifth welding surface 212, and the third welding surface 113 is opposite to the sixth welding surface 213; a first matching area 510 is formed between the first welding surface 111 and the fourth welding surface 211, a second matching area 520 is formed between the second welding surface 112 and the fifth welding surface 212, and a third matching area 530 is formed between the third welding surface 113 and the sixth welding surface 213.

[0093] See also Figure 1 and Figure 2 In one embodiment, a surface of the graphite 100 facing the metal 200 is configured with a bump 110, and a surface of the metal 200 facing the graphite 100 is configured with a groove 210. In another embodiment, a surface of the graphite 100 facing the metal 200 is configured with a groove 210, and a surface of the metal 200 facing the graphite 100 is configured with a bump 110.

[0094] It should be noted that the groove 210 and the bump 110 that cooperate with each other on the metal 200 and the graphite 100 can be a complete annular groove 210 and annular bump 110, or a partial annular groove 210 and annular bump 110, and there is no special limitation on this.

[0095] In one embodiment, a groove structure is further provided on the upper end surface of the second matching area 520, that is, the fifth welding surface 212. By providing the groove structure on the surface of the metal 200 in the second matching area 520, the bonding area between the solder of the second welding area 320 and the metal 200 is increased, thereby increasing the connection strength between the welding layer 300 and the metal 200.

[0096] See also Figure 1 and Figure 2 In another embodiment, a groove structure is further provided on the lower end surface of the second matching area 520, that is, the second welding surface 112. By providing the groove structure on the surface of the graphite 100 in the second matching area 520, the bonding area between the solder in the second welding area 320 and the graphite 100 is increased, thereby increasing the connection strength between the welding layer 300 and the graphite 100.

[0097] In one embodiment, the upper end surface and the lower end surface of the second matching area 520, that is, the fifth welding surface 212 and the second welding surface 112, are provided with groove structures. By providing the groove structures on the surface of the graphite 100 and the surface of the metal 200 in the second matching area 520, the bonding area between the solder of the second welding area 320 and the graphite 100 and the metal 200 is increased, thereby increasing the connection strength between the welding layer 300 and the graphite 100 and the metal 200.

[0098] It should be noted that the shape of the groove structure can be a triangle, a rectangle, a trapezoid, etc., and there is no special limitation on this.

[0099] In one embodiment, if the height d1 of the first matching area 510 is less than the height d2 of the third matching area 530, the thickness h of the solder block 400 satisfies the condition: d1<h≤d2 or d1≤h<d2. If the height d1 of the first matching area 510 is greater than the height d2 of the third matching area 530, the thickness h of the solder block 400 satisfies the condition: d2<h≤d1 or d2≤h<d1. By such an arrangement, after the solder melts during the welding process, the metal 200 and graphite 100 of the matching area with a lower height can be contacted first, and the metal 200 and graphite 100 of the matching area with a higher height can be contacted later, so as to facilitate the discharge of gas during the flow process of the solder block 400 after melting.

[0100] It should be noted that the height d1 of the first matching area 510 is the distance between the first welding surface 111 and the fourth welding surface 211 . The height d2 of the third matching area 530 is the distance between the third welding surface 113 and the sixth welding surface 213 .

[0101] In one embodiment, if the height d1 of the first matching area 510 is less than the height d2 of the third matching area 530, the height d1 of the first matching area 510 satisfies the condition: 0.1mm≤d1≤0.15mm; the height d2 of the third matching area 530 satisfies the condition: 0.2mm≤d2≤0.3mm. By setting the height d1 of the first matching area 510 and the height d2 of the third matching area 530 within the above range, the thickness of the welding layer 300 in the first matching area 510 and the third matching area 530 is kept within a reasonable range after the welding of the entire welding structure is completed, so that the connection strength of the graphite 100 and the metal 200 is higher.

[0102] Specifically, in one embodiment, the height d1 of the first matching area 510 is 0.1 mm. In another embodiment, the height d1 of the first matching area 510 is 0.15 mm. In yet another embodiment, the height d1 of the first matching area 510 is 0.13 mm.

[0103] In one embodiment, the height d2 of the third matching area 530 is 0.2 mm. In another embodiment, the height d2 of the third matching area 530 is 0.3 mm. In another embodiment, the height d2 of the third matching area 530 is 0.25 mm.

[0104] In another embodiment, the height d1 of the first matching area 510 satisfies the condition: 0.09 mm ≤ h1 ≤ 0.14 mm. The height d2 of the third matching area 530 satisfies the condition: 0.19 mm ≤ h3 ≤ 0.29 mm.

[0105] In another embodiment, the height d1 of the first matching area 510 satisfies the condition: 0.11 mm≤h1≤0.16 mm. The height d2 of the third matching area 530 satisfies the condition: 0.21 mm≤h3≤0.31 mm.

[0106] In yet another embodiment, the height d1 of the first matching area 510 satisfies the condition: 0.09 mm ≤ h1 ≤ 0.17 mm. The height d2 of the third matching area 530 satisfies the condition: 0.19 mm ≤ h3 ≤ 0.31 mm.

[0107] In another embodiment, if the height d1 of the first matching area 510 is greater than the height d2 of the third matching area 530, the height d1 of the first matching area 510 satisfies the condition: 0.2mm≤d1≤0.3mm; the height d2 of the third matching area 530 satisfies the condition: 0.1mm≤d2≤0.15mm. By setting the height d1 of the first matching area 510 and the height d2 of the third matching area 530 within the above range, the thickness of the welding layer 300 in the first matching area 510 and the third matching area 530 is kept within a reasonable range after the welding of the entire welding structure is completed, so that the connection strength of the graphite 100 and the metal 200 is higher.

[0108] Specifically, in one embodiment, the height d1 of the first matching area 510 is 0.2 mm. In another embodiment, the height d1 of the first matching area 510 is 0.3 mm. In yet another embodiment, the height d1 of the first matching area 510 is 0.25 mm.

[0109] In one embodiment, the height d2 of the third matching area 530 is 0.1 mm. In another embodiment, the height d2 of the third matching area 530 is 0.15 mm. In another embodiment, the height d2 of the third matching area 530 is 0.13 mm.

[0110] In another embodiment, the height d1 of the first matching area 510 satisfies the condition: 0.19 mm ≤ h1 ≤ 0.29 mm. The height d2 of the third matching area 530 satisfies the condition: 0.09 mm ≤ h3 ≤ 0.14 mm.

[0111] In another embodiment, the height d1 of the first matching area 510 satisfies the condition: 0.21 mm≤h1≤0.31 mm. The height d2 of the third matching area 530 satisfies the condition: 0.11 mm≤h3≤0.26 mm.

[0112] In yet another embodiment, the height d1 of the first matching area 510 satisfies the condition: 0.19 mm ≤ h1 ≤ 0.31 mm. The height d2 of the third matching area 530 satisfies the condition: 0.09 mm ≤ h3 ≤ 0.16 mm.

[0113] In one embodiment, if the height d1 of the first matching area 510 is less than the height d2 of the third matching area 530, the height of the upper end surface of the first matching area 510 is higher than the height of the upper end surface of the third matching area 530, and the height of the lower end surface of the first matching area 510 is higher than the height of the lower end surface of the third matching area 530. By such a configuration, during the welding process of the graphite 100 and the metal 200, when the solder block 400 melts in the groove 210 and the bump 110, it can flow from the area where the second matching area 520 is located to the areas of the first matching area 510 and the third matching area 530 respectively. And in this flow process, since the height of the first matching area 510 is less than the height of the third matching area 530, at the same time, along Figure 3 In the yy' direction, the entire first matching area 510 is located above the third matching area 530, so that the time for the solder in the first matching area 510 to complete the welding is shorter than the time for the solder in the third matching area 530 to complete the welding. At the same time, during the welding process, the gas generated in the first matching area 510 can pass through the second welding area 320 and finally be discharged from the third matching area 530 at the lowest point, that is, the gas generated during the welding process is discharged in a stepped manner from top to bottom, thereby reducing the porosity of the entire welding layer 300, reducing the possibility of cold welding, and improving the welding quality. The connection strength between the graphite 100 and the metal 200 is also high.

[0114] In another embodiment, if the height d1 of the first matching area 510 is greater than the height d2 of the third matching area 530, the height of the upper end surface of the first matching area 510 is lower than the height of the upper end surface of the third matching area 530, and the height of the lower end surface of the first matching area 510 is lower than the height of the lower end surface of the third matching area 530. By such an arrangement, during the welding process of the graphite 100 and the metal 200, when the solder block 400 melts in the groove 210 and the protrusion 110, it can flow from the area where the second matching area 520 is located to the areas of the first matching area 510 and the third matching area 530 respectively. And in this flow process, since the solder thickness of the first matching area 510 is greater than the solder thickness of the third matching area 530, at the same time, along Figure 3 In the yy' direction, the height of the entire first matching area 510 is less than the height of the third matching area 530, so that the time for the solder in the first matching area 510 to complete the welding is longer than the time for the solder in the third matching area 530 to complete the welding. At the same time, during the welding process, the gas generated in the third matching area 530 can pass through the second matching area 520 and finally be discharged from the first matching area 510 at the lowest point, that is, the gas generated during the welding process is discharged in a stepped manner from top to bottom, thereby reducing the porosity of the entire welding layer 300, reducing the possibility of cold welding, and improving the welding quality. The connection strength between the graphite 100 and the metal 200 is also high.

[0115] See also Figure 1 and Figure 2 A first side wall channel 220 is formed on the side wall of the groove 210 and the protrusion 110, and the first side wall channel 220 is used to conduct the first matching area 510 and the second matching area 520; a second side wall channel 230 is also formed on the side wall of the groove 210 and the protrusion 110, and the second side wall channel 230 is used to conduct the second matching area 520 and the third matching area 530; the width d3 of the first side wall channel 220 is less than or equal to the width d4 of the second side wall channel 230. By setting the width d3 of the first side wall channel 220 and the width d4 of the second side wall channel 230 within the above range, the present welding structure can be positioned by the narrower first side wall channel 220 close to the axial side of the anode target of the X-ray tube when positioning before welding, and the positioning is more accurate.

[0116] Specifically, in one embodiment, the width d3 of the first sidewall channel 220 is 0.1 mm. In another embodiment, the width d3 of the first sidewall channel 220 is 0.2 mm. In yet another embodiment, the width d3 of the first sidewall channel 220 is 0.15 mm.

[0117] In one embodiment, the width d4 of the second channel 230 of the side wall is 0.3 mm. In another embodiment, the width d4 of the second channel 230 of the side wall is 0.4 mm. In yet another embodiment, the width d4 of the second channel 230 of the side wall is 0.35 mm.

[0118] In another embodiment, the width d3 of the first channel 220 of the side wall meets the condition: 0.09 mm ≤ L1 ≤ 0.19 mm; the width d4 of the second channel 230 of the side wall meets the condition: 0.29 mm ≤ L2 ≤ 0.39 mm.

[0119] In another embodiment, the width d3 of the first channel 220 of the side wall meets the condition: 0.11 mm≤L1≤0.21 mm; the width d4 of the second channel 230 of the side wall meets the condition: 0.31 mm≤L2≤0.41 mm.

[0120] In yet another embodiment, the width d3 of the first channel 220 of the side wall satisfies the condition: 0.09 mm ≤ L1 ≤ 0.21 mm; and the width d4 of the second channel 230 of the side wall satisfies the condition: 0.29 mm ≤ L2 ≤ 0.41 mm.

[0121] The present application also provides a method for preparing an anode target disk of an X-ray tube, which comprises: on two surfaces of graphite 100 and metal 200 facing each other, a convex block 110 structure is constructed on one of the surfaces, and a groove 210 structure matched with the convex block 110 is constructed on the other surface; when the convex block 110 and the groove 210 are matched, a first matching area 510, a second matching area 520 and a third matching area 530 are formed from the axis to the outside along the radial direction of the graphite 100, and the first matching area 510, the second matching area 520 and the third matching area 530 are arranged in a stepped shape. Specifically, the axis of the graphite 100 is the same as the axis of the anode target disk of the X-ray tube, and both are Figure 1 The center of the straight line where p is located is a point on the axis p; the radial direction of the graphite 100 is Figure 1 The pre-configured solder block 400 is placed in the second matching area 520, and the solder block 400 is used to weld the metal 200 and the graphite 100 to form an anode target plate of an X-ray tube; wherein the axial heights of the first matching area 510 and the third matching area 530 along the graphite 100 are not equal, specifically, the axial height of the graphite 100 is Figure 1 and Figure 3 The yy' direction in .

[0122] When the anode target of an X-ray tube is prepared by the preparation method provided by the present application, during the welding process of the graphite 100 and the metal 200, when the solder block 400 melts in the groove 210 and the bump 110, it can flow from the area where the second matching area 520 is located to the areas of the first matching area 510 and the third matching area 530. In addition, during this flow process, since the heights of the matching areas on both sides are inconsistent, the time required to complete the welding of the two sides is also inconsistent, so that the gas generated during the welding process can be discharged through the side with a larger height of the matching area where the welding is not completed after the welding is completed on the side with a smaller height of the matching area. It can be seen that the preparation method sets the heights of the first matching area 510 and the third matching area 530 to be different, thereby forcing the gas generated during the welding process to be discharged through the side with a larger height of the unfinished matching area, effectively controlling the flow direction of the solder after melting, and thus making the porosity of the entire welding layer 300 lower, reducing the possibility of cold welding, improving the welding quality, and the connection strength between the graphite 100 and the metal 200. The connection stability is also good, which can effectively meet the operating conditions of the X-ray tube anode target at higher temperatures and higher rotation frequencies.

[0123] In one embodiment, the method for preparing an anode target of an X-ray tube further includes: calculating the volume V of the solder block 400 according to the volumes of the first matching area 510, the second matching area 520, and the third matching area 530 formed by the metal 200 and the graphite 100. By using the volumes of the first matching area 510, the second matching area 520, and the third matching area 530, the volume of the solder required to fill the matching areas after the solder block 400 is melted can be inferred, which is relatively simple and convenient.

[0124] Specifically, V1 is the volume of the first groove structure 120 constructed on the graphite 100; V2 is the preset volume of the first matching area 510; V3 is the preset volume of the second matching area 520, V4 is the preset volume of the third matching area 530, V is the volume of the solder block 400, and the volume V of the solder block 400 satisfies the condition: 1.05(V1+V2+V3+V4)≤V≤1.3(V1+V2+V3+V4).

[0125] Through this calculation method, the volume of the solder block 400 can be enlarged, so that the solder block 400 can be fully filled into the first matching area 510, the second matching area 520 and the third matching area 530 during the welding melting process, thereby reducing the possibility of cold solder joints.

[0126] In one embodiment, the volume V of the solder block 400 is equal to 1.05 (V1+V2+V3+V4). In another embodiment, the volume V of the block is equal to 1.3 (V1+V2+V3+V4). In yet another embodiment, the volume V of the block is equal to 1.1 (V1+V2+V3+V4).

[0127] In one embodiment, the method for preparing an anode target of an X-ray tube further includes: calculating a thickness h of the solder block 400 according to a volume V of the solder block 400 ; and calculating a height d1 of the first matching area 510 and a height d2 of the third matching area 530 according to the thickness h of the solder block 400 .

[0128] The volume of the solder block 400 is used to calculate the thickness h of the solder block 400, and the height d1 of the first matching area 510 and the height d2 of the third matching area 530 are calculated based on the thickness h of the solder block 400, so that the height of the first matching area 510, the height of the third matching area 530 and the thickness of the solder block 400 are within a reasonable range, thereby ensuring the final welding quality of the metal 200 and the graphite 100.

[0129] In one of the embodiments, the step of calculating the distance d1 between the first welding surface 111 and the fourth welding surface 211 and the distance d2 between the third welding surface 113 and the sixth welding surface 213 according to the thickness h of the solder block 400 in the method for preparing the anode target of the X-ray tube specifically includes: if the distance d1 between the first welding surface 111 and the fourth welding surface 211 is less than the distance d2 between the third welding surface 113 and the sixth welding surface 213, then the thickness h of the solder block 400 satisfies the condition: d1<h≤d2 or d1≤h<d2; if the distance d1 between the first welding surface 111 and the fourth welding surface 211 is greater than the distance d2 between the third welding surface 113 and the sixth welding surface 213, then the thickness h of the solder block 400 satisfies the condition: d2<h≤d1 or d2≤h<d1.

[0130] By such an arrangement, in the radial direction of the graphite 100, the thickness of the solder block 400 is greater than the height of the mating area on one side thereof, but less than the height of the mating area on the other side thereof, thereby effectively ensuring that when the solder block 400 melts during the welding process, the graphite 100 and the metal 200 in the mating area with a lower height can be welded first, and finally the graphite 100 and the metal 200 in the mating area with a higher height can be welded, thereby effectively controlling the flow direction of the gas in the melted solder, thereby making the porosity of the entire welding layer 300 lower, reducing the possibility of cold welding, improving the welding quality, and achieving higher connection strength and connection stability between the graphite 100 and the metal 200, which can effectively meet the operating conditions of the anode target of the X-ray tube at higher temperatures and higher rotation frequencies.

[0131] In one specific embodiment, the method for preparing the anode target of an X-ray tube further includes: before welding the graphite 100 and the metal 200, first ultrasonically cleaning the two, and after ultrasonic cleaning, placing the two in a high-temperature vacuum furnace for vacuum treatment, and then performing a brazing operation.

[0132] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0133] The above-described embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be construed as limiting the scope of the patent application. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent application shall be subject to the attached claims.

Claims

1. An X-ray tube anode target, characterized in that: The X-ray tube anode target comprises graphite (100), metal (200), and a welding layer (300) for welding the graphite (100) and the metal (200); The graphite (100) and the metal (200) are annular, and on two surfaces of the graphite (100) and the metal (200) facing each other, one surface is configured with a protrusion (110), and the other surface is configured with a groove (210) matching the protrusion (110); The welding layer (300) comprises a first welding area (310), a second welding area (320) and a third welding area (330) along the radial direction of the X-ray tube anode target disk with the axis of the X-ray tube anode target disk; the first welding area (310), the second welding area (320) and the third welding area (330) are arranged in a stepped manner, and the second welding area (320) is located between the protrusion (110) and the groove (210); Wherein, the solder thickness of the first welding area (310) is not equal to the solder thickness of the third welding area (330).

2. The X-ray tube anode target according to claim 1, characterized in that: If the solder thickness h1 of the first welding area (310) is less than the solder thickness h3 of the third welding area (330), then the solder thickness h2 of the second welding area (320) satisfies the condition: h1<h2≤h3 or h1≤h2<h3; If the solder thickness h1 of the first welding area (310) is greater than the solder thickness h3 of the third welding area (330), then the solder thickness h2 of the second welding area (320) satisfies the condition: h3<h2≤h1 or h3≤h2<h1.

3. The X-ray tube anode target according to claim 1 or 2, characterized in that: If the solder thickness h1 of the first welding area (310) is less than the solder thickness h3 of the third welding area (330), the height of the upper end surface of the first welding area (310) is higher than the height of the upper end surface of the third welding area (330), and the height of the lower end surface of the first welding area (310) is higher than the height of the lower end surface of the third welding area (330); or If the solder thickness h1 of the first welding area (310) is greater than the solder thickness h3 of the third welding area (330), the height of the upper end surface of the first welding area (310) is lower than the height of the upper end surface of the third welding area (330), and the height of the lower end surface of the first welding area (310) is lower than the height of the lower end surface of the third welding area (330).

4. The X-ray tube anode target according to claim 1, characterized in that: A first side wall channel (220) is formed on the side wall of the groove (210) and the protrusion (110), and the first side wall channel (220) is used to conduct the first welding area (310) and the second welding area (320); A second sidewall channel (230) is also formed on the sidewall of the groove (210) and the protrusion (110), and the second sidewall channel (230) is used to conduct the second welding area (320) and the third welding area (330); The solder thickness L1 in the first side wall channel (220) is less than or equal to the solder thickness L2 in the second side wall channel (230).

5. A welding structure of an anode target of an X-ray tube, characterized in that: The invention comprises graphite (100), metal (200) and a solder block (400) placed between the graphite (100) and the metal (200), wherein the graphite (100) and the metal (200) are in a ring shape; On two surfaces of the graphite (100) and the metal (200) facing each other, one surface is configured with a protrusion (110), and the other surface is configured with a groove (210) matching the protrusion (110); The solder block (400) is placed in the groove (210), and the protrusion (110) is matched with the groove (210); when the protrusion (110) and the groove (210) are matched, a first matching area (510), a second matching area (520) and a third matching area (530) are formed from the axis to the outside along the radial direction of the graphite (100), and the first matching area (510), the second matching area (520) and the third matching area (530) are arranged in a stepped manner; Wherein, the first matching area (510) and the third matching area (530) have unequal heights along the axial direction of the graphite (100).

6. The welding structure of the anode target of an X-ray tube according to claim 5, characterized in that: The upper end surface and / or the lower end surface of the second matching area (520) also has a groove structure.

7. The welding structure of the anode target of an X-ray tube according to claim 5, characterized in that: If the height d1 of the first matching area (510) is less than the height d2 of the third matching area (530), the thickness h of the solder block (400) satisfies the condition: d1<h≤d2 or d1≤h<d2; If the height d1 of the first matching area (510) is greater than the height d2 of the third matching area (530), the thickness h of the solder block (400) satisfies the condition: d2<h≤d1 or d2≤h<d1.

8. The welding structure of the anode target of an X-ray tube according to claim 5, characterized in that: If the height d1 of the first matching area (510) is smaller than the height d2 of the third matching area (530), the height of the upper end surface of the first matching area (510) is higher than the height of the upper end surface of the third matching area (530), and the height of the lower end surface of the first matching area (510) is higher than the height of the lower end surface of the third matching area (530); or If the height d1 of the first fitting area (510) is greater than the height d2 of the third fitting area (530), the height of the upper end surface of the first fitting area (510) is lower than the height of the upper end surface of the third fitting area (530), and the height of the lower end surface of the first fitting area (510) is lower than the height of the lower end surface of the third fitting area (530).

9. The welding structure of an X-ray tube anode target according to any one of claims 5 to 8, characterized in that: A first side wall channel (220) is formed on the side wall of the groove (210) and the protrusion (110), and the first side wall channel (220) is used to conduct the first matching area (510) and the second matching area (520); A second sidewall channel (230) is also formed on the sidewall of the groove (210) and the protrusion (110), and the second sidewall channel (230) is used to conduct the second matching area (520) and the third matching area (530); The width d3 of the first side wall channel (220) is less than or equal to the width d4 of the second side wall channel (230).

10. A method for preparing an anode target of an X-ray tube, characterized in that: include: On two surfaces of the graphite (100) and the metal (200) facing each other, a convex block (110) structure is constructed on one of the surfaces, and a concave groove (210) structure matching the convex block (110) is constructed on the other surface; when the convex block (110) and the concave groove (210) are matched, a first matching area (510), a second matching area (520) and a third matching area (530) are formed from the axis to the outside along the radial direction of the graphite (100); the first matching area (510), the second matching area (520) and the third matching area (530) are arranged in a stepped manner; A pre-configured solder block (400) is placed in the second matching area (520), wherein the solder block (400) is used to weld the metal (200) and the graphite (100) to form an anode target plate of an X-ray tube; Wherein, the first matching area (510) and the third matching area (530) have unequal axial heights along the graphite (100).

11. The method for preparing an anode target of an X-ray tube according to claim 10, characterized in that: The method further comprises: The volume V of the solder block (400) is calculated based on the volumes of the first matching area (510), the second matching area (520) and the third matching area (530) formed by the metal (200) and the graphite (100).

12. The method for preparing an anode target of an X-ray tube according to claim 11, characterized in that: The method further comprises: Calculating a thickness h of the solder block (400) according to a volume V of the solder block (400); The height d1 of the first matching area (510) and the height d2 of the third matching area (530) are calculated according to the thickness h of the solder block (400).

13. The method for preparing an anode target of an X-ray tube according to claim 12, characterized in that: The step of calculating the height d1 of the first matching area (510) and the height d2 of the third matching area (530) according to the thickness h of the solder block (400) specifically comprises: If the height d1 of the first matching area (510) is less than the height d2 of the third matching area (530), the thickness h of the solder block (400) satisfies the condition: d1<h≤d2 or d1≤h<d2; If the height d1 of the first matching area (510) is greater than the height d2 of the third matching area (530), the thickness h of the solder block (400) satisfies the condition: d2<h≤d1 or d2≤h<d1.

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