Method for inhibiting oxygen vacancy of yttrium oxide coating
By doping metal ion solution into yttrium oxide powder as a dispersion stabilizer and carrying out appropriate process treatment, the problem of oxygen vacancy in yttrium oxide powder during sand grinding is solved, and the hardness and corrosion resistance of yttrium oxide coating are achieved. Performance improvement.
Patent Information
- Application Number
- CN202411602558.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-11
- Publication Date
- 2025-02-18
AI Technical Summary
Yttrium oxide powder creates oxygen vacancy during sanding, causing its crystal form to change from cubic phase to single-climb phase during plasma spraying, reducing the corrosion resistance and hardness of the coating.
Doping metal ion solution into Y2O3 powder as a dispersion stabilizer, sand grinding, spray drying, granulation, calcining and screening to obtain a dispersion stabilizer doped with yttrium oxide powder, and finally forming yttrium oxide molten coating through plasma spraying technology layer.
Effectively inhibit the oxygen vacancy of yttrium oxide powder during sand grinding, keep the crystal form of yttrium oxide in the thermal spraying process stable in the cubic phase, thereby improving the hardness and corrosion resistance of yttrium oxide coating and extending its service life.
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Figure CN119465004A_ABST
Abstract
Description
Technical Field
[0001] The present application belongs to the technical field of coating preparation, and in particular relates to a method for inhibiting oxygen vacancies in yttrium oxide coatings. Background Art
[0002] Plasma spraying technology is a coating preparation method that heats powder particles through a high-temperature flame and sprays the powder particles onto the surface of the substrate. This method can not only effectively solidify and melt high-temperature materials, but also avoid the burning of conventional materials. Therefore, it also has the characteristics of high spraying efficiency and adhesion of different materials.
[0003] Yttrium oxide (Y2O3) powder has properties such as high melting point and low expansion, and is an important material for spray powder to prevent plasma corrosion. In recent years, yttrium oxide powder has been widely used in the electronics industry and the semiconductor industry, especially as a spray material for semiconductor etcher to prevent plasma corrosion and radiation corrosion. In the preparation process of yttrium oxide coating, since yttrium oxide powder will produce oxygen vacancies during the sand grinding process, the yttrium oxide crystal phase changes from cubic phase to monoclinic phase in the high temperature environment during plasma spraying. During rapid cooling, the yttrium oxide crystal phase cannot be restored to cubic phase, which reduces the corrosion resistance and hardness of the yttrium oxide coating and affects its service life.
[0004] In the wafer manufacturing etching process, the yttrium oxide coating is required to have strong corrosion resistance and high hardness. The monoclinic phase of yttrium oxide is an unstable phase, which will cause its performance to deteriorate and affect its service life.
[0005] Therefore, how to inhibit the generation of oxygen vacancies in yttrium oxide powder during sand grinding and stabilize the crystal form of yttrium oxide in the cubic phase during thermal spraying, thereby ensuring the hardness and other properties of the yttrium oxide coating, is a problem that needs to be solved urgently in this field. Summary of the invention
[0006] In order to solve the above technical problems, the present application provides a method for inhibiting oxygen vacancies in yttrium oxide coatings, so as to inhibit the generation of oxygen vacancies in yttrium oxide powder during sand grinding and improve the hardness and other properties of the yttrium oxide coatings.
[0007] The above application objectives of this application are achieved through the following technical solutions:
[0008] A method for inhibiting oxygen vacancies in yttrium oxide coatings comprises the following steps:
[0009] S1, sand-milling a suspension obtained by uniformly stirring a dispersion stabilizer doped with Y2O3 powder to obtain an yttrium oxide slurry doped with a dispersion stabilizer, wherein the dispersion stabilizer is a metal ion solution;
[0010] S2, spray drying the yttrium oxide slurry doped with the dispersion stabilizer obtained after sand grinding to obtain spherical yttrium oxide powder, wherein the particle size of the spherical yttrium oxide powder is controlled to be 42±3 μm;
[0011] S3, calcining the spherical yttrium oxide powder obtained after granulation at a temperature of 1500° C. to 1600° C., sieving the calcined powder to remove powders with a particle size smaller than a first particle size threshold and a particle size larger than a second particle size threshold, to obtain a dispersion stabilizer-doped yttrium oxide powder with a D50 of 35±3 μm;
[0012] S4, using plasma spraying technology to spray the dispersion stabilizer-doped yttrium oxide powder material on the substrate to form an yttrium oxide spray coating.
[0013] Preferably, in step S1, the metal ion solution contains Sr 2+ ions, and Sr 2+ The mass concentration of ions is 1×10 4 mg / kg.
[0014] Preferably, in step S1, the mass ratio of the metal ions in the dispersion stabilizer doped in the Y2O3 powder to the Y2O3 powder is 200 to 400 ppm.
[0015] Preferably, in step S1, the mass ratio of metal ions in the dispersion stabilizer doped in the Y2O3 powder to the Y2O3 powder is 300 ppm.
[0016] Preferably, in step S2, the temperature at which the spherical yttrium oxide powder obtained after granulation is calcined is 1550°C.
[0017] Preferably, in step S4, the thickness of the yttrium oxide spray coating is 180 μm to 220 μm, and the surface roughness Ra of the yttrium oxide spray coating is 5 μm to 7 μm.
[0018] Preferably, before step S4, the method further comprises:
[0019] S3', performing sandblasting on the substrate to make the surface of the substrate reach a uniform roughness, and the surface roughness Ra of the substrate is 7 μm to 8 μm.
[0020] Preferably, the method further comprises:
[0021] S5, polishing the yttrium oxide spray coating three times with diamond suspension grinding and polishing liquids with different particle sizes at room temperature, wherein the particle sizes of the diamond suspension grinding and polishing liquids for the three polishing treatments are 2.5 μm, 1.0 μm, and 0.5 μm, respectively.
[0022] Preferably, the polishing conditions for the three polishing treatments are:
[0023] The single-point pressure was 20N, the grinding time was 300s, the grinding disc speed was 300r / min, and the head speed was 50r / min.
[0024] Preferably, the substrate is stainless steel, aluminum or titanium.
[0025] The above technical solution of the present application has the following advantages compared with the prior art:
[0026] The present application involves doping a dispersion stabilizer whose component is a metal ion solution into Y2O3 powder, and sand-milling the powder to obtain an yttrium oxide slurry doped with a dispersion stabilizer, and then granulating the spherical particles of the yttrium oxide powder obtained by spray drying. The granulated yttrium oxide powder is then calcined at a high temperature to obtain a powder with a dense surface. The calcined powder is sieved to obtain a dispersion stabilizer-doped yttrium oxide powder. Finally, the dispersion stabilizer-doped yttrium oxide powder is plasma sprayed. The method can effectively inhibit the generation of oxygen vacancies in the yttrium oxide powder during the sand-milling process, and stabilize the crystal form of the yttrium oxide in the cubic phase during the thermal spraying process, thereby ensuring the hardness and other properties of the yttrium oxide coating and extending its service life. BRIEF DESCRIPTION OF THE DRAWINGS
[0027] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.
[0028] Figure 1 A schematic flow chart of a method for suppressing oxygen vacancies in an yttrium oxide coating according to an embodiment of the present application;
[0029] Figure 2 This is a graph showing the test results of electron paramagnetic resonance spectroscopy in the examples of this application. DETAILED DESCRIPTION
[0030] In order to enable those skilled in the art to better understand the technical solutions in this application, the technical solutions in the embodiments of this application will be clearly and completely described below. Obviously, the described embodiments are only part of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.
[0031] In the embodiments provided in the present application, it should be understood that the disclosed methods and systems can be implemented in other ways. The system embodiments described below are merely schematic. For example, the division of units and modules is only a logical function division. There may be other division methods in actual implementation, such as: multiple units or modules can be combined, or can be integrated into another system, or some features can be ignored, or not executed. In addition, the coupling, direct coupling, or communication connection between the components shown or discussed can be through some interfaces, indirect coupling or communication connection of devices or modules, which can be electrical, mechanical or other forms.
[0032] In addition, all functional units in the embodiments of the present application may be integrated into one processor, or each unit may be a separate device, or two or more units may be integrated into one device; each functional unit in the embodiments of the present application may be implemented in the form of hardware or in the form of hardware plus software functional units.
[0033] A person skilled in the art can understand that all or part of the steps of the following method embodiments can be completed by program instructions and related hardware. The aforementioned program instructions can be stored in a computer-readable storage medium. When the program instructions are executed, the steps of the following method embodiments are executed; and the aforementioned storage medium includes: a mobile storage device, a read-only memory (ROM), a magnetic disk or an optical disk, and other media that can store program codes.
[0034] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of this application, "multiple" and "several" mean two or more, unless otherwise clearly and specifically defined.
[0035] like Figure 1 As shown, the embodiment of the present application provides a method for suppressing oxygen vacancies in an yttrium oxide coating, and the method may include the following steps:
[0036] S1, sand-milling a suspension obtained by uniformly stirring a dispersion stabilizer doped with Y2O3 powder to obtain an yttrium oxide slurry doped with a dispersion stabilizer, wherein the dispersion stabilizer is a metal ion solution;
[0037] S2, spray drying the yttrium oxide slurry doped with a dispersion stabilizer obtained after sand grinding to obtain spherical yttrium oxide powder, wherein the particle size of the spherical yttrium oxide powder is controlled to be 42±3 μm;
[0038] S3, calcining the spherical yttrium oxide powder obtained after granulation at a temperature of 1500° C. to 1600° C., and sieving the calcined powder to remove powders with a particle size smaller than a first particle size threshold and a particle size larger than a second particle size threshold, to obtain a dispersion stabilizer-doped yttrium oxide powder with a D50 of 35±3 μm;
[0039] Specifically, in this embodiment, the first particle size threshold is 20 μm, and the second particle size threshold is 63.5 μm.
[0040] S4, using plasma spraying technology to spray dispersed stabilizer-doped yttrium oxide powder material on the substrate to form an yttrium oxide spray coating.
[0041] The method for suppressing oxygen vacancies in the yttrium oxide coating of the present embodiment is as follows: first, a dispersion stabilizer is doped into Y2O3 powder and the resulting suspension is uniformly stirred and sand-milled to obtain a dispersion stabilizer-doped yttrium oxide slurry; then, the dispersion stabilizer-doped yttrium oxide slurry obtained after sand-milling is spray-dried and granulated to obtain spherical particles of yttrium oxide powder, and the particle size of the spherical particles of yttrium oxide powder is controlled to be 42±3μm; then, the spherical particles of yttrium oxide powder obtained after granulation are calcined at a temperature of 1500°C to 1600°C, and the powder after calcination is sieved to remove powders with a particle size less than a first particle size threshold and a particle size greater than a second particle size threshold, to obtain a dispersion stabilizer-doped yttrium oxide powder with a D50 of 35±3μm; finally, a plasma spraying technique is used to spray the dispersion stabilizer-doped yttrium oxide powder material on a substrate to form an yttrium oxide spray coating.
[0042] The present application involves doping a dispersion stabilizer whose component is a metal ion solution into Y2O3 powder, and sand-milling the powder to obtain an yttrium oxide slurry doped with a dispersion stabilizer, and then granulating the spherical particles of the yttrium oxide powder obtained by spray drying. The granulated yttrium oxide powder is then calcined at a high temperature to obtain a powder with a dense surface. The calcined powder is sieved to obtain a dispersion stabilizer-doped yttrium oxide powder. Finally, the dispersion stabilizer-doped yttrium oxide powder is plasma sprayed. The method can effectively inhibit the generation of oxygen vacancies in the yttrium oxide powder during the sand-milling process, and stabilize the crystal form of the yttrium oxide in the cubic phase during the thermal spraying process, thereby ensuring the hardness and other properties of the yttrium oxide coating and extending its service life.
[0043] In one embodiment, in step S1, the metal ion solution contains Sr 2+ ions, and Sr 2+ The mass concentration of ions is 1×104mg / kg. Since the metal elements strontium and yttrium are adjacent in the periodic table and have similar properties, the Sr 2+ Ionic solution as dispersion stabilizer, Sr 2+ Ions can replace Y 3+A reaction occurs, thereby effectively inhibiting the generation of oxygen vacancies in yttrium oxide powder during the sand grinding process.
[0044] In one embodiment, in step S1, the mass ratio of metal ions in the dispersion stabilizer doped in the Y2O3 powder to the Y2O3 powder is 200-400 ppm.
[0045] In one embodiment, in step S1, the mass ratio of metal ions in the dispersion stabilizer doped in the Y2O3 powder to the Y2O3 powder is 300 ppm.
[0046] In one embodiment, in step S2, the spherical yttrium oxide powder obtained after granulation is calcined at a temperature of 1550°C.
[0047] In one embodiment, in step S4, the thickness of the yttrium oxide spray coating is 180 μm to 220 μm, and the surface roughness Ra of the yttrium oxide spray coating is 5 μm to 7 μm.
[0048] In one embodiment, before step S4, the method further comprises:
[0049] S3', sandblasting the substrate to make the surface of the substrate reach a uniform roughness, and the surface roughness Ra of the substrate is 7μm to 8μm. Before using plasma spraying technology to spray the dispersed stabilizer doped yttrium oxide powder material on the substrate, the substrate is first sandblasted to increase the adhesion of the coating on the substrate and extend the durability of the coating.
[0050] In one embodiment, the method further comprises:
[0051] S5, the yttrium oxide spray coating was polished three times at room temperature using diamond suspension polishing liquids with different particle sizes, and the particle sizes of the diamond suspension polishing liquids for the three polishing treatments were 2.5μm, 1.0μm, and 0.5μm, respectively. By polishing the yttrium oxide spray coating multiple times, and the particle sizes of the diamond suspension polishing liquids for multiple polishings are reduced successively, the polishing effect is effectively improved, and the surface roughness of the coating after polishing is reduced.
[0052] In one embodiment, the polishing conditions of the three polishing processes are:
[0053] The single-point pressure was 20N, the grinding time was 300s, the grinding disc speed was 300r / min, and the head speed was 50r / min.
[0054] In one embodiment, the substrate is stainless steel, aluminum, or titanium.
[0055] In order to better understand the advantages of the method for inhibiting oxygen vacancies in the yttrium oxide coating of the embodiment of the present application, the technical effects are demonstrated and explained in a group of comparative examples (in the comparative examples, the substrate is aluminum, the dispersion stabilizer is a metal ion solution, and the metal ion solution contains Sr 2+ The mass concentration of ions is 1×10 4 mg / kg):
[0056] Embodiment 1:
[0057] The specific process is as follows:
[0058] 1. Add pure water to Y2O3 powder and stir the resulting suspension evenly, then grind it to obtain yttrium oxide slurry;
[0059] 2. The yttrium oxide slurry obtained after sand grinding is spray-dried and granulated to obtain spherical yttrium oxide powder, and the particle size of the spherical yttrium oxide powder is controlled at 42±3 μm;
[0060] 3. Sandblast the substrate to make the surface of the substrate reach uniform roughness. The surface roughness Ra of the substrate is 7μm~8μm;
[0061] 4. The spherical yttrium oxide powder obtained after granulation is calcined at 1550°C. The calcined powder is sieved to remove powders with a particle size of less than 20 μm and a particle size of more than 63.5 μm to obtain yttrium oxide powder with a D50 of 35±3 μm;
[0062] 5. Use plasma spraying technology to spray yttrium oxide powder material on the substrate to form a yttrium oxide spray coating. The thickness of the yttrium oxide spray coating is 180 μm to 220 μm, and the surface roughness Ra of the yttrium oxide spray coating is 5 μm to 7 μm;
[0063] 6. The yttrium oxide spray coating was polished three times at room temperature using diamond suspension polishing liquids with different particle sizes. The particle sizes of the diamond suspension polishing liquids for the three polishing treatments were 2.5 μm, 1.0 μm, and 0.5 μm, respectively. The polishing conditions for the three polishing treatments were:
[0064] The single-point pressure was 20N, the grinding time was 300s, the grinding disc speed was 300r / min, and the head speed was 50r / min.
[0065] After the treatment is completed, the hardness test of the yttria sprayed coating is carried out.
[0066] Embodiment 2:
[0067] The specific process is as follows:
[0068] 1. The dispersion stabilizer is doped into the Y2O3 powder and the obtained suspension is uniformly stirred and sand-milled to obtain an yttrium oxide slurry doped with the dispersion stabilizer, wherein the metal ion Sr in the dispersion stabilizer doped in the Y2O3 powder 2+ The mass ratio to Y2O3 powder is 200ppm;
[0069] 2. The yttrium oxide slurry doped with a dispersion stabilizer obtained after sand grinding is spray dried and granulated to obtain spherical yttrium oxide powder, wherein the particle size of the spherical yttrium oxide powder is controlled to be 42±3 μm;
[0070] 3. Sandblast the substrate to make the surface of the substrate reach uniform roughness. The surface roughness Ra of the substrate is 7μm~8μm;
[0071] 4. The spherical yttrium oxide powder obtained after granulation is calcined at 1550°C. The calcined powder is sieved to remove powders with a particle size of less than 20 μm and a particle size of more than 63.5 μm to obtain yttrium oxide powder with a D50 of 35±3 μm;
[0072] 5. Plasma spraying technology is used to spray a dispersed stabilizer-doped yttrium oxide powder material on a substrate to form an yttrium oxide spray coating. The thickness of the yttrium oxide spray coating is 180 μm to 220 μm, and the surface roughness Ra of the yttrium oxide spray coating is 5 μm to 7 μm.
[0073] 6. The yttrium oxide spray coating was polished three times at room temperature using diamond suspension polishing liquids with different particle sizes. The particle sizes of the diamond suspension polishing liquids for the three polishing treatments were 2.5 μm, 1.0 μm, and 0.5 μm, respectively. The polishing conditions for the three polishing treatments were:
[0074] The single-point pressure was 20N, the grinding time was 300s, the grinding disc speed was 300r / min, and the head speed was 50r / min.
[0075] After the treatment is completed, the hardness test of the yttria sprayed coating is carried out.
[0076] Embodiment 3:
[0077] The specific process is as follows:
[0078] 1. The dispersion stabilizer is doped into the Y2O3 powder and the obtained suspension is uniformly stirred and sand-milled to obtain an yttrium oxide slurry doped with the dispersion stabilizer, wherein the metal ion Sr in the dispersion stabilizer doped in the Y2O3 powder 2+ The mass ratio to Y2O3 powder is 300ppm;
[0079] 2. The yttrium oxide slurry doped with a dispersion stabilizer obtained after sand grinding is spray dried and granulated to obtain spherical yttrium oxide powder, wherein the particle size of the spherical yttrium oxide powder is controlled to be 42±3 μm;
[0080] 3. Sandblast the substrate to make the surface of the substrate reach uniform roughness. The surface roughness Ra of the substrate is 7μm~8μm;
[0081] 4. The spherical yttrium oxide powder obtained after granulation is calcined at 1550°C. The calcined powder is sieved to remove powders with a particle size of less than 20 μm and a particle size of more than 63.5 μm to obtain yttrium oxide powder with a D50 of 35±3 μm;
[0082] 5. Plasma spraying technology is used to spray a dispersed stabilizer-doped yttrium oxide powder material on a substrate to form an yttrium oxide spray coating. The thickness of the yttrium oxide spray coating is 180 μm to 220 μm, and the surface roughness Ra of the yttrium oxide spray coating is 5 μm to 7 μm.
[0083] 6. The yttrium oxide spray coating was polished three times at room temperature using diamond suspension polishing liquids with different particle sizes. The particle sizes of the diamond suspension polishing liquids for the three polishing treatments were 2.5 μm, 1.0 μm, and 0.5 μm, respectively. The polishing conditions for the three polishing treatments were:
[0084] The single-point pressure was 20N, the grinding time was 300s, the grinding disc speed was 300r / min, and the head speed was 50r / min.
[0085] After the treatment is completed, the hardness test of the yttria sprayed coating is carried out.
[0086] Embodiment 4:
[0087] The specific process is as follows:
[0088] 1. The dispersion stabilizer is doped into the Y2O3 powder and the obtained suspension is uniformly stirred and sand-milled to obtain an yttrium oxide slurry doped with the dispersion stabilizer, wherein the metal ion Sr in the dispersion stabilizer doped in the Y2O3 powder 2+ The mass ratio to Y2O3 powder is 400ppm;
[0089] 2. The yttrium oxide slurry doped with a dispersion stabilizer obtained after sand grinding is spray dried and granulated to obtain spherical yttrium oxide powder, wherein the particle size of the spherical yttrium oxide powder is controlled to be 42±3 μm;
[0090] 3. Sandblast the substrate to make the surface of the substrate reach uniform roughness. The surface roughness Ra of the substrate is 7μm~8μm;
[0091] 4. The spherical yttrium oxide powder obtained after granulation is calcined at 1550°C. The calcined powder is sieved to remove powders with a particle size of less than 20 μm and a particle size of more than 63.5 μm to obtain yttrium oxide powder with a D50 of 35±3 μm;
[0092] 5. Plasma spraying technology is used to spray a dispersed stabilizer-doped yttrium oxide powder material on a substrate to form an yttrium oxide spray coating. The thickness of the yttrium oxide spray coating is 180 μm to 220 μm, and the surface roughness Ra of the yttrium oxide spray coating is 5 μm to 7 μm.
[0093] 6. The yttrium oxide spray coating was polished three times at room temperature using diamond suspension polishing liquids with different particle sizes. The particle sizes of the diamond suspension polishing liquids for the three polishing treatments were 2.5 μm, 1.0 μm, and 0.5 μm, respectively. The polishing conditions for the three polishing treatments were:
[0094] The single-point pressure was 20N, the grinding time was 300s, the grinding disc speed was 300r / min, and the head speed was 50r / min.
[0095] After the treatment is completed, the hardness test of the yttria sprayed coating is carried out.
[0096] In the above four embodiments, after the yttrium oxide spray coating is formed on the substrate by plasma spraying technology, the oxygen vacancy concentration of the sprayed powder is tested by electron paramagnetic resonance spectroscopy, and the oxygen vacancy concentration curve obtained is as shown in FIG. Figure 2 As shown, through Figure 2 It can be seen that with the increase of the amount of dispersion stabilizer added, the double peak intensity of the curve first decreases and then increases. The peak is weakest when the addition amount is 300 ppm, indicating that the oxygen vacancy concentration is the lowest. Compared with the doped dispersion stabilizer, the double peak intensity of the curve doped with the dispersion stabilizer is significantly reduced, indicating that the present application can effectively reduce the oxygen vacancies in the yttrium oxide powder spray coating by doping with the dispersion stabilizer.
[0097] After the treatment is completed, the hardness of the yttrium oxide spray coating is tested. The hardness of the yttrium oxide spray coating is as shown in the following table:
[0098] The experimental results comparison table of the above four embodiments is as follows
[0099]
[0100]
[0101] In the above four embodiments, embodiment 1 is a comparative example, that is, the Y2O3 powder is not doped with a dispersion stabilizer;
[0102] Examples 2 to 4 are Y2O3 powders doped with a dispersion stabilizer, but the metal ion Sr 2+ The mass ratio with Y2O3 powder is different.
[0103] By comparing the measurement results of the above four embodiments, it can be seen that, relative to Example 1, in Examples 2 to 4, a dispersion stabilizer is doped into the Y2O3 powder, and the hardness of the polished yttrium oxide sprayed coating is significantly increased, and under the experimental conditions in Example 3, the hardness of the polished yttrium oxide sprayed coating is the largest, indicating that the present application can effectively increase the hardness of the yttrium oxide sprayed coating, making the yttrium oxide sprayed coating have better performance and extending its service life.
[0104] In this specification, each embodiment is described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the embodiments can be referred to each other. For the device disclosed in the embodiment, since it corresponds to the method disclosed in the embodiment, the description is relatively simple, and the relevant parts can be referred to the method part.
[0105] Professionals may further appreciate that the units and algorithm steps of each example described in conjunction with the embodiments disclosed in this embodiment can be implemented with electronic hardware, computer software, or a combination of the two. In order to clearly illustrate the interchangeability of hardware and software, the composition and steps of each example have been generally described in terms of function in the above description. Whether these functions are performed in hardware or software depends on the specific application and design constraints of the technical solution. Professionals and technicians may use different methods to implement the described functions for each specific application, but such implementation should not be considered to be beyond the scope of this application.
[0106] The steps of the method or algorithm described in the embodiments disclosed in this embodiment can be directly implemented by hardware, software modules executed by a processor, or a combination of the two. The software module can be placed in a random access memory (RAM), a memory, a read-only memory (ROM), an electrically programmable ROM, an electrically erasable programmable ROM, a register, a hard disk, a removable disk, a CD-ROM, or any other form of storage medium known in the technical field.
[0107] The above description of the disclosed embodiments enables those skilled in the art to implement or use the present application. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined in the present embodiment may be implemented in other embodiments without departing from the spirit or scope of the present application. Therefore, the present application will not be limited to the embodiments shown in the present embodiment, but will conform to the widest scope consistent with the principles and novel features disclosed in the present embodiment.
Claims
1. A method for inhibiting oxygen vacancies in yttrium oxide coatings, characterized in that: The steps include: S1, sand-milling a suspension obtained by uniformly stirring a dispersion stabilizer doped with Y2O3 powder to obtain an yttrium oxide slurry doped with a dispersion stabilizer, wherein the dispersion stabilizer is a metal ion solution; S2, spray drying the yttrium oxide slurry doped with the dispersion stabilizer obtained after sand grinding to obtain spherical yttrium oxide powder, wherein the particle size of the spherical yttrium oxide powder is controlled to be 42±3 μm; S3, calcining the spherical yttrium oxide powder obtained after granulation at a temperature of 1500° C. to 1600° C., sieving the calcined powder to remove powders with a particle size smaller than a first particle size threshold and a particle size larger than a second particle size threshold, to obtain a dispersion stabilizer-doped yttrium oxide powder with a D50 of 35±3 μm; S4, using plasma spraying technology to spray the dispersion stabilizer-doped yttrium oxide powder material on the substrate to form an yttrium oxide spray coating.
2. The method for suppressing oxygen vacancies in yttrium oxide coating according to claim 1, characterized in that: In step S1, the metal ion solution contains Sr 2+ ions, and Sr 2+ The mass concentration of ions is 1×10 4 mg / kg.
3. The method for suppressing oxygen vacancies in yttrium oxide coating according to claim 2, characterized in that: In step S1, the mass ratio of the metal ions in the dispersion stabilizer doped in the Y2O3 powder to the Y2O3 powder is 200 to 400 ppm.
4. The method for suppressing oxygen vacancies in yttrium oxide coating according to claim 3, characterized in that: In step S1, the mass ratio of the metal ions in the dispersion stabilizer doped in the Y2O3 powder to the Y2O3 powder is 300 ppm.
5. The method for suppressing oxygen vacancies in yttrium oxide coating according to claim 1, characterized in that: In step S2, the spherical yttrium oxide powder obtained after granulation is calcined at a temperature of 1550°C.
6. The method for suppressing oxygen vacancies in yttrium oxide coating according to claim 1, characterized in that: In step S4, the thickness of the yttrium oxide spray coating is 180 μm to 220 μm, and the surface roughness Ra of the yttrium oxide spray coating is 5 μm to 7 μm.
7. The method for suppressing oxygen vacancies in yttrium oxide coating according to any one of claims 1 to 6, characterized in that: Before step S4, the method further includes: S3', performing sandblasting on the substrate to make the surface of the substrate reach a uniform roughness, and the surface roughness Ra of the substrate is 7 μm to 8 μm.
8. The method for suppressing oxygen vacancies in yttrium oxide coating according to any one of claims 1 to 6, characterized in that: Also includes: S5, polishing the yttrium oxide spray coating three times with diamond suspension grinding and polishing liquids with different particle sizes at room temperature, wherein the particle sizes of the diamond suspension grinding and polishing liquids for the three polishing treatments are 2.5 μm, 1.0 μm, and 0.5 μm, respectively.
9. The method for suppressing oxygen vacancies in yttrium oxide coating according to claim 8, characterized in that: The polishing conditions for the three polishing treatments are: The single-point pressure was 20N, the grinding time was 300s, the grinding disc speed was 300r / min, and the head speed was 50r / min.
10. The method for suppressing oxygen vacancies in yttrium oxide coating according to claim 1 or 2 or 3 or 4 or 5 or 6 or 9, characterized in that: The substrate is stainless steel, aluminum or titanium.