Optical lens for photoetching projection and photoetching projection equipment with same

Abstract

The invention discloses an optical lens for photoetching projection and photoetching projection equipment with the same, the lens with focal power of the lens is a first lens to a tenth lens which are sequentially arranged in the direction from the object space to the image space, and the object space optical axis positions of the first lens, the third lens, the fourth lens and the fifth lens are of convex structures. The image-side optical axis position is of a concave surface structure; the second lens and the ninth lens are biconvex lenses; the object-side optical axis positions of the sixth lens, the seventh lens, the eighth lens and the tenth lens are of concave structures, and the image-side optical axis positions of the sixth lens, the seventh lens, the eighth lens and the tenth lens are of convex structures; the thicknesses of the second lens and the fifth lens meet the expression: 2.75 lt; th1 / Th2 / Th5lt; 4.1, or, 25 mmlt, 4.1, or 25 mmlt; th2, Th5 < lt >; 31 mm; the thicknesses of the ninth lens and the sixth lens meet the expression: 2.75 lt; th9 / Th6lt, Th9 / Th6lt; 4.1, or, 25 mmlt, 4.1, or 25 mmlt; th9-Th6lt, Th9-Th6lt; and the lens above can realize a good photoetching effect.

Description

Technical Field

[0001] The present invention relates to the field of photolithography, and in particular to an optical lens for photolithography projection and a photolithography projection device having the same. Background Art

[0002] With the development of projection lithography technology, the performance of projection imaging optical systems has gradually improved, and projection imaging optical systems can be applied to various fields such as circuit manufacturing. Projection lithography technology can also be used in larger areas and higher yields in semiconductors, solar cells, liquid crystals, printed circuit boards and other technical fields.

[0003] However, in the prior art, such as the US patent with the announcement number US6879383B2 (announcement date: April 12, 2005), the refractive reflective structure is adopted, the overall size is large, and the requirements for optical glass materials are very strict, especially the processing of large-diameter concave reflectors, and the detection technology requirements are very strict. It is not as advantageous as the full refractive system in terms of field of view size, working distance, installation and calibration requirements, and manufacturing cost.

[0004] The Chinese patent with patent number CN98113037.2 (announcement date: July 23, 2003) is an image-side telecentric double Gaussian optical system. Since the patent uses two bonding surfaces, in high-yield projection lithography equipment, the lens adhesive will produce a large deformation or even denaturation, resulting in reduced optical imaging performance and shortened service life of the projection lens, which does not meet the requirements of lithography technology.

[0005] In the actual production process of many substrates, the graphic size and magnification of substrates manufactured by different equipment will be slightly different. At the same time, during various physical and chemical processing processes, the substrate will have slight expansion or contraction, which will also cause changes in the size of the substrate graphic, and the graphic size changes of different substrates are also different. Therefore, in the production and manufacturing process of many substrates, especially in the process of multi-layer substrates requiring inter-layer positioning, in order to improve positioning accuracy and wiring density, it is necessary to adjust the projection magnification of the projection imaging optical system according to the actual substrate graphic size or magnification change.

[0006] The disclosure of the above background technology content is only used to assist in understanding the inventive concept and technical solution of the present invention. It does not necessarily belong to the prior art of this patent application, nor does it necessarily provide technical guidance. In the absence of clear evidence that the above content has been disclosed before the filing date of this patent application, the above background technology should not be used to evaluate the novelty and creativity of the present application. Summary of the invention

[0007] The purpose of the present invention is to provide an optical lens which is economical and has good optical properties and a large field of view, and can provide a high imaging resolution for a projection lithography projection device.

[0008] To achieve the above object, the technical solution adopted by the present invention is as follows:

[0009] An optical lens for lithographic projection, the number of lenses having a focal power in the lens is ten, which are a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a seventh lens, an eighth lens, a ninth lens and a tenth lens sequentially arranged from the object side to the image side, wherein:

[0010] The object-side optical axis positions of the first lens, the third lens, the fourth lens, and the fifth lens are convex structures, and their image-side optical axis positions are concave structures;

[0011] The object-side optical axis positions of the second lens and the ninth lens are convex structures, and their image-side optical axis positions are convex structures;

[0012] The object-side optical axis positions of the sixth lens, the seventh lens, the eighth lens, and the tenth lens are concave structures, and their image-side optical axis positions are convex structures;

[0013] The first lens and the second lens form a first lens group, which has a positive focal power; the third lens constitutes a second lens group, which has a positive focal power; the fourth lens and the fifth lens form a third lens group, which has a negative focal power; the sixth lens and the seventh lens form a fourth lens group, which has a negative focal power; the eighth lens constitutes a fifth lens group, which has a positive focal power; the ninth lens and the tenth lens form a sixth lens group, which has a positive focal power.

[0014] Further, based on any one of the foregoing technical solutions or a combination of multiple technical solutions, the focal lengths of the lens groups satisfy the following expressions:

[0015] 0.3 < F1 / L < 0.6, 0.3 < F6 / L < 0.6; if the ratio value exceeds the upper limit, it may cause the conjugate distance (the distance from the object side to the image side) to be too long, the optical lens to become longer, resulting in a bulky device. If the ratio value exceeds the lower limit, it may cause the astigmatism aberration to become larger, affecting the optical performance of the lens.

[0016] 0.15 < F2 / L < 0.5, 0.15 < F5 / L < 0.5; if the ratio value exceeds the upper limit, it may cause the astigmatism aberration to become larger, destroying the balance relationship of various aberrations of the lens. If the ratio value exceeds the lower limit, it may cause the spherical aberration, especially the high-order spherical aberration, to become larger, affecting the optical performance of the lens.

[0017] 0.1 < -F3 / L < 0.7, 0.1 < -F4 / L < 0.7; if the ratio value exceeds the upper limit, it may cause the spherical aberration and the field curvature aberration to become larger; if the ratio value exceeds the lower limit, it may cause the astigmatism aberration to become larger, resulting in a reduction in the optical performance of the lens.

[0018] Among them, F1 is the combined focal length of the first lens group, F2 is the focal length of the second lens group, F3 is the combined focal length of the third lens group, F4 is the combined focal length of the fourth lens group, F5 is the focal length of the fifth lens group, F6 is the combined focal length of the sixth lens group, and L is the distance between the object side and the image side.

[0019] Further, based on any one of the technical solutions or the combination of multiple technical solutions described above, the first lens has a negative optical power, which satisfies the following expression: 0.1<-f2 / f1<0.4, wherein f1 is the focal length of the first lens, and f2 is the focal length of the second lens; a ratio value exceeding an upper limit may cause the astigmatism aberration to become larger; a ratio value exceeding a lower limit may cause insufficient compensation of the astigmatism aberration and increased field curvature, thereby affecting the optical performance of the lens.

[0020] The fourth lens has positive focal power, and the fifth lens has negative focal power, which satisfy the following expression: 0.2<-f5 / f4<0.8, wherein f4 is the focal length of the fourth lens, and f5 is the focal length of the fifth lens; when the ratio value exceeds the upper limit, the spherical aberration and the field curvature aberration may become larger; when the ratio value exceeds the lower limit, the spherical aberration and the field curvature aberration may be insufficiently compensated, resulting in reduced optical performance of the lens.

[0021] The sixth lens has negative power, and the seventh lens has positive power, which satisfies the following expression: 0.2<-f6 / f7<0.8, wherein f6 is the focal length of the sixth lens, and f7 is the focal length of the seventh lens;

[0022] The tenth lens has negative optical power, which satisfies the following expression: 0.1<-f9 / f10<0.4, wherein f9 is the focal length of the ninth lens, and f10 is the focal length of the tenth lens.

[0023] Further, based on any one of the technical solutions or the combination of multiple technical solutions described above, the first lens and the second lens satisfy the following expression: 0.05<|(r12-r21)| / (r12+r21)<0.8, wherein r12 is the curvature radius of the image-side curved surface of the first lens, and r21 is the curvature radius of the object-side curved surface of the second lens; if the ratio value exceeds the upper limit, the astigmatism aberration and the chromatic aberration may become larger; if the ratio value exceeds the lower limit, the astigmatism aberration and the chromatic aberration may be insufficiently compensated, thereby reducing the optical performance of the lens in a wide spectral range.

[0024] The fourth lens and the fifth lens satisfy the following expression: 0.0 < |(r42 - r51)| / (r42 + r51) < 0.5, where r42 is the radius of curvature of the image-side surface of the fourth lens, and r51 is the radius of curvature of the object-side surface of the fifth lens; if the ratio value exceeds the upper limit, it may cause spherical aberration, especially higher-order spherical aberration and chromatic aberration to increase; if the ratio value exceeds the lower limit, it may result in insufficient compensation for spherical aberration, especially higher-order spherical aberration and chromatic aberration, reducing the optical performance of the lens in the wide spectral range.

[0025] The sixth lens and the seventh lens satisfy the following expression: 0.0 < |(r71 - r62)| / |(r71 + r62)| < 0.5, where r71 is the radius of curvature of the object-side surface of the seventh lens, and r62 is the radius of curvature of the image-side surface of the sixth lens; if the ratio value exceeds the upper limit, it may cause spherical aberration, especially higher-order spherical aberration and chromatic aberration to increase; if the ratio value exceeds the lower limit, it may result in insufficient compensation for spherical aberration, especially higher-order spherical aberration and chromatic aberration, reducing the optical performance of the lens in the wide spectral range.

[0026] The ninth lens and the tenth lens satisfy the following expression: 0.05 < |(r101 - r92)| / |(r101 + r92)| < 0.8, where r92 is the radius of curvature of the image-side surface of the ninth lens, and r101 is the radius of curvature of the object-side surface of the tenth lens; if the ratio value exceeds the upper limit, it may cause astigmatism and chromatic aberration to increase; if the ratio value exceeds the lower limit, it may result in insufficient compensation for astigmatism and chromatic aberration, reducing the optical performance of the lens in the wide spectral range.

[0027] Further, based on any one of the foregoing technical solutions or a combination of multiple technical solutions, the third lens satisfies the following expression: 0.65 < r31 / d31 < 1.3, where r31 is the radius of curvature of the object-side surface of the third lens, and d31 is the clear aperture of the object-side surface of the third lens; if the ratio value exceeds the upper limit, it may cause spherical aberration, especially higher-order spherical aberration to increase; if the ratio value exceeds the lower limit, it may cause astigmatism and field curvature to increase, reducing the optical performance of the lens.

[0028] The fourth lens satisfies the following expression: 0.6 < r41 / d41 < 1.2, where r41 is the radius of curvature of the object-side surface of the fourth lens, and d41 is the clear aperture of the object-side surface of the fourth lens; if the ratio value exceeds the upper limit, it may cause spherical aberration, especially higher-order spherical aberration to increase; if the ratio value exceeds the lower limit, it may cause astigmatism and field curvature to increase, reducing the optical performance of the lens.

[0029] The fifth lens satisfies the following expression: 0.68 < r52 / d52 < 1.4, where r52 is the radius of curvature of the image-side surface of the fifth lens, and d52 is the clear aperture of the image-side surface of the fifth lens; if the ratio value exceeds the upper limit, it may cause spherical aberration, especially higher-order spherical aberration and chromatic aberration, to increase; if the ratio value exceeds the lower limit, the compensation for spherical aberration, especially higher-order spherical aberration and chromatic aberration, may be insufficient, reducing the optical performance of the lens.

[0030] The sixth lens satisfies the following expression: 0.68 < r61 / d61 < 1.4, where r61 is the radius of curvature of the object-side surface of the sixth lens, and d61 is the clear aperture of the object-side surface of the sixth lens;

[0031] The seventh lens satisfies the following expression: 0.6 < r72 / d72 < 1.2, where r72 is the radius of curvature of the image-side surface of the seventh lens, and d72 is the clear aperture of the image-side surface of the seventh lens;

[0032] The eighth lens satisfies the following expression: 0.65 < r82 / d82 < 1.3, where r82 is the radius of curvature of the image-side surface of the eighth lens, and d82 is the clear aperture of the image-side surface of the eighth lens.

[0033] Further, based on any one of the foregoing technical solutions or a combination of multiple technical solutions, the optical lens for lithographic projection satisfies the following expression:

[0034] 18 < vd4 - vd5 < 50, 18 < vd7 - vd6 < 50, where vd4 is the dispersion coefficient of the fourth lens, vd5 is the dispersion coefficient of the fifth lens, vd6 is the dispersion coefficient of the sixth lens, and vd7 is the dispersion coefficient of the seventh lens. If the ratio value exceeds the upper limit, it may cause chromatic aberration, especially higher-order chromatic aberration, to increase; if the ratio value exceeds the lower limit, the compensation for chromatic aberration, especially higher-order chromatic aberration, may be insufficient, reducing the wide-spectrum optical performance of the lens.

[0035] Further, based on any one of the foregoing technical solutions or a combination of multiple technical solutions, the optical lens for lithographic projection satisfies the following expression: 0.002 < NA × Hy / L < 0.008, where NA is the image-side numerical aperture of the lens, Hy is the image height corresponding to the maximum field of view angle of the lens, and L is the distance between the object side and the image side. If the ratio value exceeds the upper limit, it may cause astigmatism and field curvature aberrations to increase, reducing the optical performance of the lens; if the ratio value exceeds the lower limit, it may cause the conjugate distance (the distance from the object side to the image side) to be too long, the optical lens to become longer, and the equipment to become bulky.

[0036] Further, in combination with any one or more of the foregoing technical solutions, the thicknesses of the second lens and the ninth lens are greater than or equal to the thicknesses of the other lenses, and the thicknesses of the fifth lens and the sixth lens are less than or equal to the thicknesses of the other lenses;

[0037] The thicknesses of the second lens and the fifth lens satisfy the expression: 2.75 < Th2 / Th5 < 4.1, or 25 < Th2 - Th5 < 31, where Th2 is the thickness of the second lens and Th5 is the thickness of the fifth lens;

[0038] The thicknesses of the ninth lens and the sixth lens satisfy the expression: 2.75 < Th9 / Th6 < 4.1, or 25 < Th9 - Th6 < 31, where Th6 is the thickness of the sixth lens and Th9 is the thickness of the ninth lens.

[0039] According to another aspect of the present invention, there is provided a lithographic projection apparatus, including a light source and an optical lens as described above. The object side position of the optical lens is configured to place an optical mask, and the image side position of the optical lens is configured to place a substrate coated with a photosensitive material to be projected.

[0040] Further, in combination with any one or more of the foregoing technical solutions, the first lens and the second lens of the optical lens form a first lens group, and the ninth lens and the tenth lens thereof form a sixth lens group;

[0041] The projection magnification of the lithographic projection apparatus is adjusted by moving the first lens group and / or the sixth lens group within a range of 2 mm along the optical axis direction.

[0042] Further, in combination with any one or more of the foregoing technical solutions, when the lithographic projection apparatus provided by the present invention performs exposure by selecting different wavelengths of the light source, after exposure and development of the photosensitive material on the substrate, the cured residual photosensitive material has different morphological characteristics.

[0043] The beneficial effects brought by the technical solutions provided by the present invention include:

[0044] a. The optical lens does not include aspherical lenses, greatly reducing the difficulty and cost of processing, detection, and alignment;

[0045] b. The optical lens does not include cemented lenses, avoiding the reduction of optical imaging performance caused by lens deformation;

[0046] c. It can effectively correct various aberrations, expand the image side field size, improve the imaging resolution, and can conveniently and effectively adjust the projection magnification. Description of the Drawings

[0047] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0048] Figure 1 A schematic diagram of the lens arrangement of the optical lens provided for the first embodiment of the present invention;

[0049] Figure 2 The aberration characteristic curve of the optical lens provided by the first embodiment of the present invention when the image height is 0 mm on the object side, wherein the abscissa PY represents the ordinate value of the light on the entrance pupil, the ordinate EY represents the offset distance between the intersection point of the light on the image plane and the ideal image point in the Y direction, the abscissa PX represents the abscissa value of the light on the entrance pupil, and the ordinate EX represents the offset distance between the intersection point of the light on the image plane and the ideal image point in the X direction;

[0050] Figure 3 The aberration characteristic curve of the optical lens provided by the first embodiment of the present invention when the object-side image height is -45 mm;

[0051] Figure 4 The aberration characteristic curve of the optical lens provided by the first embodiment of the present invention when the object side image height is -70mm;

[0052] Figure 5 The aberration characteristic curve of the optical lens provided by the first embodiment of the present invention when the object-side image height is -100mm;

[0053] Figure 6 A schematic diagram of the lens arrangement of an optical lens provided for a second embodiment of the present invention;

[0054] Figure 7 The aberration characteristic curve of the optical lens provided by the second embodiment of the present invention when the image height is 0 mm on the object side, wherein the abscissa PY represents the ordinate value of the light on the entrance pupil, the ordinate EY represents the offset distance in the Y direction between the intersection point of the light on the image plane and the ideal image point, the abscissa PX represents the abscissa value of the light on the entrance pupil, and the ordinate EX represents the offset distance in the X direction between the intersection point of the light on the image plane and the ideal image point;

[0055] Figure 8 The aberration characteristic curve of the optical lens provided by the second embodiment of the present invention when the object-side image height is -45 mm;

[0056] Fig. 9 The aberration characteristic curve of the optical lens provided by the second embodiment of the present invention when the object side image height is -70mm;

[0057] Fig.10 The aberration characteristic curve of the optical lens provided by the second embodiment of the present invention when the object-side image height is -100mm;

[0058] Fig.11 A schematic diagram of the lens arrangement of an optical lens provided in a third embodiment of the present invention;

[0059] Fig.12 The aberration characteristic curve of the optical lens provided by the third embodiment of the present invention when the image height is 0 mm on the object side, wherein the abscissa PY represents the ordinate value of the light on the entrance pupil, the ordinate EY represents the offset distance in the Y direction between the intersection point of the light on the image plane and the ideal image point, the abscissa PX represents the abscissa value of the light on the entrance pupil, and the ordinate EX represents the offset distance in the X direction between the intersection point of the light on the image plane and the ideal image point;

[0060] Fig.13 The aberration characteristic curve of the optical lens provided by the third embodiment of the present invention when the object-side image height is -45 mm;

[0061] Fig.14 The aberration characteristic curve of the optical lens provided by the third embodiment of the present invention when the object-side image height is -70 mm;

[0062] Fig.15 The aberration characteristic curve of the optical lens provided by the third embodiment of the present invention when the object-side image height is -100 mm;

[0063] Fig.16 is an aberration characteristic curve when the sixth lens group is moved 1 mm along the optical axis based on the second embodiment and the object side image height is 0 mm;

[0064] Fig.17 is an aberration characteristic curve when the object side image height is -45mm when the sixth lens group is moved 1mm along the optical axis based on the second embodiment;

[0065] Fig.18 is an aberration characteristic curve when the object side image height is -70 mm when the sixth lens group is moved 1 mm along the optical axis based on the second embodiment;

[0066] Fig.19 is an aberration characteristic curve when the sixth lens group is moved 1 mm along the optical axis based on the second embodiment and the object side image height is at -100 mm;

[0067] Fig. 20 is an aberration characteristic curve when the sixth lens group is moved 1 mm along the optical axis based on the third embodiment and the object side image height is 0 mm;

[0068] Fig.21is an aberration characteristic curve when the object side image height is -45mm when the sixth lens group is moved 1mm along the optical axis based on the third embodiment;

[0069] Fig. 22 is an aberration characteristic curve when the object side image height is -70 mm when the sixth lens group is moved 1 mm along the optical axis based on the third embodiment;

[0070] Fig.23 It is an aberration characteristic curve when the object side image height is -100mm when the sixth lens group is moved 1mm along the optical axis based on the third embodiment. DETAILED DESCRIPTION

[0071] In order to enable those skilled in the art to better understand the scheme of the present invention, the technical scheme in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present invention.

[0072] It should be noted that the terms "first", "second", etc. in the specification and claims of the present invention and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence. It should be understood that the data used in this way can be interchanged where appropriate, so that the embodiments of the present invention described herein can be implemented in an order other than those illustrated or described herein. In addition, the terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusions, for example, a process, method, device, product or equipment that includes a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or equipment.

[0073] See also Figure 1 , Figure 6 and Fig.11 , which are lens arrangement diagrams of the three embodiments, respectively, wherein symbol P1 represents the object side, P2 represents the imaging surface of the image side, L1 represents the first lens, L2 represents the second lens, L3 represents the third lens, L4 represents the fourth lens, L5 represents the fifth lens, L6 represents the sixth lens, L7 represents the seventh lens, L8 represents the eighth lens, L9 represents the ninth lens, and L10 represents the tenth lens; the lenses L1 to L10 are arranged in sequence from the object side to the imaging surface P2, and the aperture AS is arranged on the image side of the fifth lens L5, that is, on the object side of the sixth lens L6.

[0074] Figure 1 , Figure 6 , Fig.11Symbol G1 represents a first lens group consisting of a first lens L2 and a second lens L2, which has positive focal power; symbol G2 represents a second lens group consisting of a third lens, which has positive focal power; symbol G3 represents a third lens group consisting of a fourth lens L4 and a fifth lens L5, which has negative focal power; symbol G4 represents a fourth lens group consisting of a sixth lens and a seventh lens, which has negative focal power; symbol G5 represents a fifth lens group consisting of an eighth lens, which has positive focal power; symbol G6 represents a sixth lens group consisting of a ninth lens and a tenth lens, which has positive focal power.

[0075] The optical parameters in the following embodiments of the present invention include: Th2 is the thickness of the second lens, Th5 is the thickness of the fifth lens, Th6 is the thickness of the sixth lens, and Th9 is the thickness of the ninth lens; F1 is the combined focal length of the first lens group G1, F2 is the focal length of the second lens group G2 (i.e., the focal length of the third lens L3), F3 is the combined focal length of the third lens group G3, F4 is the combined focal length of the fourth lens group G4, F5 is the focal length of the fifth lens group G5 (i.e., the focal length of the eighth lens L8), F6 is the combined focal length of the sixth lens group G6, and L is the distance between the object side and the image side. f1 is the focal length of the first lens, f2 is the focal length of the second lens, f4 is the focal length of the fourth lens, f5 is the focal length of the fifth lens, f6 is the focal length of the sixth lens, f7 is the focal length of the seventh lens, f9 is the focal length of the ninth lens, and f10 is the focal length of the tenth lens; r12 is the curvature radius of the image-side curved surface of the first lens, r21 is the curvature radius of the object-side curved surface of the second lens, r42 is the curvature radius of the image-side curved surface of the fourth lens, r51 is the curvature radius of the object-side curved surface of the fifth lens, r71 is the curvature radius of the object-side curved surface of the seventh lens, and r62 is the curvature radius of the image-side curved surface of the fourth lens. The curvature radius of the image side surface of the sixth lens, r92 is the curvature radius of the image side surface of the ninth lens, r101 is the curvature radius of the object side surface of the tenth lens; r31 is the curvature radius of the object side surface of the third lens, d31 is the clear aperture of the object side surface of the third lens, r41 is the curvature radius of the object side surface of the fourth lens, d41 is the clear aperture of the object side surface of the fourth lens, r52 is the curvature radius of the image side surface of the fifth lens, d52 is the clear aperture of the image side surface of the fifth lens, r61 is the curvature radius of the object side surface of the sixth lens, d61 is The clear aperture of the object side surface of the sixth lens, r72 is the curvature radius of the image side surface of the seventh lens, d72 is the clear aperture of the image side surface of the seventh lens, r82 is the curvature radius of the image side surface of the eighth lens, d82 is the clear aperture of the image side surface of the eighth lens; vd4 is the dispersion coefficient of the fourth lens, vd5 is the dispersion coefficient of the fifth lens, vd6 is the dispersion coefficient of the sixth lens, and vd7 is the dispersion coefficient of the seventh lens; NA is the image side numerical aperture of the lens, Hy is the image height corresponding to the maximum field angle of the lens, and L is the distance between the object side and the image side.

[0076] The optical lens of the present invention satisfies the following conditions: 2.75 < Th2 / Th5 < 4.1, 2.75 < Th9 / Th6 < 4.1, or 25 mm < Th2 - Th5 < 31 mm, 25 mm < Th9 - Th6 < 31 mm;

[0077] 0.3 < F1 / L < 0.6, 0.3 < F6 / L < 0.6, 0.15 < F2 / L < 0.5, 0.15 < F5 / L < 0.5, 0.1 < -F3 / L < 0.7, 0.1 < -F4 / L < 0.7, and particularly satisfies: 0.35 < F1 / L < 0.52, 0.35 < F6 / L < 0.52, 0.19 < F2 / L < 0.39, 0.19 < F5 / L < 0.39, 0.15 < -F3 / L < 0.55, 0.15 < -F4 / L < 0.55;

[0078] 0.1 < -f2 / f1 < 0.4, 0.2 < -f5 / f4 < 0.8, 0.2 < -f6 / f7 < 0.8, 0.1 < -f9 / f10 < 0.4, and particularly satisfies: 0.16 < -f2 / f1 < 0.295, 0.22 < -f5 / f4 < 0.65, 0.22 < -f6 / f7 < 0.65, 0.16 < -f9 / f10 < 0.295;

[0079] 0.05 < |(r12 - r21)| / (r12 + r21) < 0.8, 0.05 < |(r101 - r92)| / |(r101 + r92)| < 0.8, and particularly satisfies: 0.11 < |(r12 - r21)| / (r12 + r21) < 0.65, 0.11 < |(r101 - r92)| / |(r101 + r92)| < 0.65;

[0080] 0.0 < |(r42 - r51)| / (r42 + r51) < 0.5, 0.0 < |(r71 - r62)| / |(r71 + r62)| < 0.5, and particularly satisfies: 0.0 < |(r42 - r51)| / (r42 + r51) < 0.35, 0.0 < |(r71 - r62)| / |(r71 + r62)| < 0.35;

[0081] 0.65 < r31 / d31 < 1.3, 0.6 < r41 / d41 < 1.2, 0.68 < r52 / d52 < 1.4, 0.68 < r61 / d61 < 1.4, 0.6 < r72 / d72 < 1.2, 0.65 < r82 / d82 < 1.3, and in particular, it satisfies: 0.7 < r31 / d31 < 1.15, 0.7 < r82 / d82 < 1.15, 0.6 < r41 / d41 < 0.85, 0.8 < r52 / d52 < 1, 0.8 < r61 / d61 < 1, 0.6 < r72 / d72 < 0.85;

[0082] 18 < vd4 - vd5 < 50, 18 < vd7 - vd6 < 50, and in particular, it satisfies: 20 < vd4 - vd5 < 29, 20 < vd7 - vd6 < 29;

[0083] 0.002 < NA × Hy / L < 0.008, and in particular, it satisfies: 0.003 < NA × Hy / L < 0.005.

[0084] First Embodiment

[0085] In this embodiment, an optical lens for lithographic projection is provided. The number of lenses with optical power is ten, and they are all spherical mirrors. They are the first lens, the second lens, the third lens, the fourth lens, the fifth lens, the sixth lens, the seventh lens, the eighth lens, the ninth lens, and the tenth lens arranged in sequence from the object side to the image side:

[0086] The object - side optical axis positions of the first lens, the third lens, the fourth lens, and the fifth lens have a convex structure, and their image - side optical axis positions have a concave structure;

[0087] The object - side optical axis positions of the second lens and the ninth lens have a convex structure, and their image - side optical axis positions have a convex structure;

[0088] The object - side optical axis positions of the sixth lens, the seventh lens, the eighth lens, and the tenth lens have a concave structure, and their image - side optical axis positions have a convex structure;

[0089] In a specific numerical embodiment, the optical parameters of each lens and diaphragm are shown in Table 1:

[0090] Table 1 Optical Parameter Table of the First Embodiment

[0091]

[0092] In the table, when the radius of curvature is infinite, it means that the corresponding surface is a plane.

[0093] It can be determined from Table 1 that the second lens, the third lens, the eighth lens and the ninth lens have the largest thicknesses, and the fifth lens and the sixth lens have the smallest thicknesses.

[0094] The NA of the optical lens of this embodiment is 0.04, NA is the image side numerical aperture of the lens, which is a dimensionless parameter, and its calculation formula is NA=n×sin(θ), where n is the refractive index, θ is the angle between the light and the optical axis, and the larger the NA value, the wider the angle of light that the optical system can collect or transmit, thus providing a higher resolution and a clearer image. The maximum field of view of the optical lens of this embodiment corresponds to an image height of 100mm, and the distance between the object side and the image side is 1000mm.

[0095] In a specific numerical embodiment, the calculation results of the optical parameter relationship of the lens are shown in Table 2:

[0096] Table 2 Calculation results of the lens optical parameter relationship formula of the first embodiment

[0097] (1) F1 / L 0.41 (2) -f2 / f1 0.20 (3) -f5 / f4 0.41 (4) F2 / L 0.28 (5) -F3 / L 0.25 (6) |(r12-r21)| / (r12+r21) 0.16 (7) |(r42-r51)| / (r42+r51) 0.30 (8) r31 / d31 0.74 (9) r41 / d41 0.70 (10) r52 / d52 0.86 (11) vd4-vd5 27.97 (12) NA×Hy / L 0.004

[0098] In this embodiment, the calculation value is obtained by rounding off.

[0099] Figures 2 to 5 1 and 100 mm, respectively. The solid line in the figure represents the aberration curve at a wavelength of 365 nm (i line), and the dotted line represents the aberration curve at a wavelength of 405 nm (h line). It can be seen that the MTF performances of the lens at the two wavelengths of 365 nm (i line) and 405 nm (h line) are very close, and the wide spectrum performance of the lens is good.

[0100] Second embodiment

[0101] like Figure 6 As shown, the lens arrangement sequence and the concave-convex state of each lens in this embodiment are the same as those in the first embodiment. In a specific numerical embodiment, the optical parameters of each lens and aperture are shown in Table 3:

[0102] Table 3 Optical parameters of the second embodiment

[0103]

[0104]

[0105] The curvature radius in the table is infinite, indicating that the corresponding surface is a plane.

[0106] It can be determined from Table 3 that the second lens and the ninth lens have the largest thickness, and the fifth lens and the sixth lens have the smallest thickness.

[0107] The NA of the optical lens of this embodiment is 0.04, the image height corresponding to the maximum field angle is 100 mm, and the distance between the object side and the image side is 1000 mm.

[0108] In a specific numerical embodiment, the calculation results of the optical parameter relationship of the lens are shown in Table 4:

[0109] Table 4 Calculation results of the lens optical parameter relationship formula of the second embodiment

[0110] (1) F1 / L 0.48 (2) -f2 / f1 0.269 (3) -f5 / f4 0.57 (4) F2 / L 0.32 (5) -F3 / L 0.4675 (6) |(r12-r21)| / (r12+r21) 0.53 (7) |(r42-r51)| / (r42+r51) 0.01 (8) r31 / d31 0.97 (9) r41 / d41 0.77 (10) r52 / d52 0.92 (11) vd4-vd5 24.38 (12) NA×Hy / L 0.004

[0111] In this embodiment, the calculation value is obtained by rounding off.

[0112] Figures 7 to 10 1 and 100 mm, respectively. The solid line in the figure represents the aberration curve at a wavelength of 365 nm (i line), and the dotted line represents the aberration curve at a wavelength of 405 nm (h line). It can be seen that the MTF performances of the lens at the two wavelengths of 365 nm (i line) and 405 nm (h line) are very close, and the wide spectrum performance of the lens is good.

[0113] Third embodiment

[0114] like Fig.11 As shown, in this embodiment, the lens arrangement sequence of the optical lens and the concave-convex state of the curved surface of each lens are the same as those of the first embodiment. In a specific numerical embodiment, the optical parameters of each lens and aperture are shown in Table 5:

[0115] Table 5 Optical parameters of the third embodiment

[0116]

[0117] The curvature radius in the table is infinite, indicating that the corresponding surface is a plane.

[0118] It can be determined from Table 5 that the second lens and the ninth lens have the largest thickness, and the fifth lens and the sixth lens have the smallest thickness.

[0119] The NA of the optical lens of this embodiment is 0.04, where NA is the image-side numerical aperture of the lens and is a dimensionless parameter. The image height corresponding to the maximum field angle of the optical lens is 100 mm, and the distance between the object side and the image side is 1000 mm.

[0120] In a specific numerical embodiment, the calculation results of the optical parameter relationship of the lens are shown in Table 6:

[0121] Table 6 Calculation results of the lens optical parameter relationship formula of the third embodiment

[0122] (1) F1 / L 0.42 (2) -f2 / f1 0.214 (3) -f5 / f4 0.49 (4) F2 / L 0.28 (5) -F3 / L 0.2845 (6) |(r12-r21)| / (r12+r21) 0.22 (7) |(r42-r51)| / (r42+r51) 0.24 (8) r31 / d31 0.75 (9) r41 / d41 0.77 (10) r52 / d52 0.92 (11) vd4-vd5 22.47 (12) NA×Hy / L 0.004

[0123] In this embodiment, the calculation value is obtained by rounding off.

[0124] Figures 12 to 15 1 and 100 mm, respectively. The solid line in the figure represents the aberration curve at a wavelength of 365 nm (i line), and the dotted line represents the aberration curve at a wavelength of 405 nm (h line). It can be seen that the MTF performances of the lens at the two wavelengths of 365 nm (i line) and 405 nm (h line) are very close, and the wide spectrum performance of the lens is good.

[0125] An embodiment of the present invention also provides a lithography projection device, including a light source and the optical lens as described above, wherein the object side position of the optical lens is configured to place an optical mask, and the image side position of the optical lens is configured to place a substrate coated with a photosensitive material to be projected.

[0126] The first lens and the second lens of the optical lens form a first lens group, and the ninth lens and the tenth lens form a sixth lens group; the projection magnification of the lithography projection device is adjusted by moving the first lens group and / or the sixth lens group within a range of 2 mm along the optical axis. Taking the sixth lens group of the second embodiment as an example, the projection magnification change characteristic data corresponding to the movement amount is shown in Table 7:

[0127] Table 7 The magnification change data obtained by moving the sixth lens group of the second embodiment

[0128]

[0129] Taking the movement amount as 1mm as an example, the aberration characteristic curves when the object image height is 0mm, -45mm, -70mm, and -100mm are as follows: Figures 16 to 19 As shown, it can be seen that the aberration characteristic curve changes very little when the sixth lens group moves 1mm, which can be ignored. When the first lens group is moved within a range of 2mm, the same magnification change and optical performance are also achieved.

[0130] Taking the sixth lens group of the third embodiment as an example, the projection magnification change characteristic data corresponding to its movement amount is shown in Table 8:

[0131] Table 8. Data table of magnification changes obtained by moving the sixth lens group of the third embodiment.

[0132]

[0133] Taking the movement amount as 1mm as an example, the aberration characteristic curves when the object image height is 0mm, -45mm, -70mm, and -100mm are as follows: Figure 20 to Figure 23 As shown, it can be seen that the aberration characteristic curve changes very little when the sixth lens group moves 1mm, which can be ignored. When the first lens group is moved within a range of 2mm, the same magnification change and optical performance are also achieved.

[0134] The photolithography projection device provided by the embodiment of the present invention adjusts the opening width of the photolithography area of ​​the photosensitive material on the substrate by selecting the filter wavelength range of the lens of the optical lens and selecting light sources of different wavelengths. The photolithography projection device of the present invention includes a wide-spectrum light source, a homogenizing mirror group, and a condenser mirror group, wherein the homogenizing mirror group uses a compound eye integrator or a square rod integrator for homogenization, and the homogenizing mirror group homogenizes the light beam emitted by the wide-spectrum light source, and then projects it to the mask after passing through the condenser. The mask contains the graphics to be projected and imaged, and the exit pupil position of the light beam emitted by the condenser coincides with the entrance pupil position of the projection imaging optical system, and the mask position coincides with the object position of the projection imaging optical system. The optical lens includes a wavelength selection filter, and by selecting different wavelength filters, different characteristic spectral line areas are selected, which are suitable for photosensitive materials with different characteristics, or different photosensitive glue curing sections, upper opening sections, vertical sections, and lower opening sections are constructed. Different exposure wavelengths have different depths of action on the photosensitive glue, and the upper and lower widths of the opening can be controlled, that is, the exposure wavelength can be selected to adjust the opening shape.

[0135] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0136] The above is only a specific implementation of the present application. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principles of the present application. These improvements and modifications should also be regarded as the scope of protection of the present application.

Claims

1. An optical lens for lithography projection, characterized in that: The lens has ten lenses with optical powers, which are the first lens, the second lens, the third lens, the fourth lens, the fifth lens, the sixth lens, the seventh lens, the eighth lens, the ninth lens, and the tenth lens arranged in sequence from the object side to the image side, where: The object-side optical axis positions of the first lens, the third lens, the fourth lens, and the fifth lens are convex structures, and their image-side optical axis positions are concave structures; The object-side optical axis positions of the second lens and the ninth lens are convex structures, and their image-side optical axis positions are convex structures; The object-side optical axis positions of the sixth lens, the seventh lens, the eighth lens, and the tenth lens are concave structures, and their image-side optical axis positions are convex structures; The first lens and the second lens form the first lens group, which has a positive optical power; the third lens forms the second lens group, which has a positive optical power; the fourth lens and the fifth lens form the third lens group, which has a negative optical power; the sixth lens and the seventh lens form the fourth lens group, which has a negative optical power; the eighth lens forms the fifth lens group, which has a positive optical power; the ninth lens and the tenth lens form the sixth lens group, which has a positive optical power; The focal lengths of the lens groups satisfy the following expressions: 0.3 < F1 / L < 0.6, 0.3 < F6 / L < 0.6; 0.15 < F2 / L < 0.5, 0.15 < F5 / L < 0.5; 0.1 < -F3 / L < 0.7, 0.1 < -F4 / L < 0.7; where F1 is the combined focal length of the first lens group, F2 is the focal length of the second lens group, F3 is the combined focal length of the third lens group, F4 is the combined focal length of the fourth lens group, F5 is the focal length of the fifth lens group, F6 is the combined focal length of the sixth lens group, and L is the distance between the object side and the image side.

2. The optical lens for lithography projection according to claim 1, characterized in that: The first lens has a negative optical power, which satisfies the following expression: 0.1 < -f2 / f1 < 0.4, where f1 is the focal length of the first lens and f2 is the focal length of the second lens; The fourth lens has a positive optical power, and the fifth lens has a negative optical power, which satisfies the following expression: 0.2 < -f5 / f4 < 0.8, where f4 is the focal length of the fourth lens and f5 is the focal length of the fifth lens; The sixth lens has a negative optical power, and the seventh lens has a positive optical power, which satisfies the following expression: 0.2 < -f6 / f7 < 0.8, where f6 is the focal length of the sixth lens and f7 is the focal length of the seventh lens; The tenth lens has a negative optical power, which satisfies the following expression: 0.1 < -f9 / f10 < 0.4, where f9 is the focal length of the ninth lens and f10 is the focal length of the tenth lens.

3. The optical lens for lithography projection according to claim 1, characterized in that: The first lens and the second lens satisfy the following expression: 0.05 < |(r12 - r21)| / (r12 + r21) < 0.8, where r12 is the radius of curvature of the image-side surface of the first lens and r21 is the radius of curvature of the object-side surface of the second lens; The fourth lens and the fifth lens satisfy the following expression: 0.0 < |(r42 - r51)| / (r42 + r51) < 0.5, where r42 is the radius of curvature of the image-side surface of the fourth lens, and r51 is the radius of curvature of the object-side surface of the fifth lens; The sixth lens and the seventh lens satisfy the following expression: 0.0 < |(r71 - r62)| / |(r71 + r62)| < 0.5, where r71 is the radius of curvature of the object-side surface of the seventh lens, and r62 is the radius of curvature of the image-side surface of the sixth lens; The ninth lens and the tenth lens satisfy the following expression: 0.05 < |(r101 - r92)| / |(r101 + r92)| < 0.8, where r92 is the radius of curvature of the image-side surface of the ninth lens, and r101 is the radius of curvature of the object-side surface of the tenth lens.

4. The optical lens for lithography projection according to claim 1, characterized in that: The third lens satisfies the following expression: 0.65 < r31 / d31 < 1.3, where r31 is the radius of curvature of the object-side surface of the third lens, and d31 is the clear aperture of the object-side surface of the third lens; The fourth lens satisfies the following expression: 0.6 < r41 / d41 < 1.2, where r41 is the radius of curvature of the object-side surface of the fourth lens, and d41 is the clear aperture of the object-side surface of the fourth lens; The fifth lens satisfies the following expression: 0.68 < r52 / d52 < 1.4, where r52 is the radius of curvature of the image-side surface of the fifth lens, and d52 is the clear aperture of the image-side surface of the fifth lens; The sixth lens satisfies the following expression: 0.68 < r61 / d61 < 1.4, where r61 is the radius of curvature of the object-side surface of the sixth lens, and d61 is the clear aperture of the object-side surface of the sixth lens; The seventh lens satisfies the following expression: 0.6 < r72 / d72 < 1.2, where r72 is the radius of curvature of the image-side surface of the seventh lens, and d72 is the clear aperture of the image-side surface of the seventh lens; The eighth lens satisfies the following expression: 0.65 < r82 / d82 < 1.3, where r82 is the radius of curvature of the image-side surface of the eighth lens, and d82 is the clear aperture of the image-side surface of the eighth lens.

5. The optical lens for lithography projection according to claim 1, characterized in that: It satisfies the following expression: 18 < vd4 - vd5 < 50, 18 < vd7 - vd6 < 50, where vd4 is the dispersion coefficient of the fourth lens, vd5 is the dispersion coefficient of the fifth lens, vd6 is the dispersion coefficient of the sixth lens, and vd7 is the dispersion coefficient of the seventh lens.

6. The optical lens for lithography projection according to claim 1, characterized in that: It satisfies the following expression: 0.002 < NA × Hy / L < 0.008, where NA is the image-side numerical aperture of the lens, Hy is the image height corresponding to the maximum field of view angle of the lens, and L is the distance between the object side and the image side.

7. The optical lens for lithography projection according to any one of claims 1 to 6, characterized in that: The thicknesses of the second lens and the ninth lens are greater than or equal to those of the other lenses, and the thicknesses of the fifth lens and the sixth lens are less than or equal to those of the other lenses; The thicknesses of the second lens and the fifth lens satisfy the expression: 2.75 < Th2 / Th5 < 4.1, or 25 mm < Th2 - Th5 < 31 mm, where Th2 is the thickness of the second lens and Th5 is the thickness of the fifth lens; The thicknesses of the ninth lens and the sixth lens satisfy the expression: 2.75 < Th9 / Th6 < 4.1, or 25 mm < Th9 - Th6 < 31 mm, where Th6 is the thickness of the sixth lens and Th9 is the thickness of the ninth lens.

8. A lithography projection device, characterized in that: Comprising a light source and an optical lens as described in any one of claims 1 to 7, the object side position of the optical lens is configured to place an optical mask, and the image side position of the optical lens is configured to place a substrate coated with a photosensitive material to be projected.

9. The lithographic projection apparatus according to claim 8, characterized in that: The first lens and the second lens of the optical lens form a first lens group, and its ninth lens and tenth lens form a sixth lens group; By moving the first lens group and / or the sixth lens group within a range of 2 mm along the optical axis direction to adjust the projection magnification of the lithographic projection apparatus.

10. The lithographic projection apparatus according to claim 8, characterized in that: When exposing by selecting different wavelengths of the light source, after exposure and development of the photosensitive material on the substrate, the cured residual photosensitive material has different morphological characteristics.

Images