Etching equipment

Abstract

The invention provides etching equipment. The etching equipment comprises a chamber; the base is arranged in the cavity; the dielectric window is arranged above the cavity; the heating assembly is arranged in the central area of the upper surface of the dielectric window and used for heating the central area of the dielectric window, the heating assembly comprises a circular main body, and a plurality of fan-shaped through holes distributed in the circumferential direction of the circular main body are formed in the circular main body; the base is arranged between the dielectric window and the upper edge of the cavity and comprises an edge heating piece, and the edge heating piece is used for heating the edge area of the dielectric window; the pressing plate is arranged above the heating assembly; a supporting block is arranged on the dielectric window or the pressing plate, and the supporting block is configured to penetrate through the fan-shaped through hole. Edge and center heating is achieved through the heating assembly and the edge heating piece, the uniformity of temperature control is ensured, in addition, the fan-shaped through holes are formed, the heating assembly is conveniently supported by the supporting blocks, and the heating assembly is prevented from being extruded by excessive force.

Description

Technical Field

[0001] The present invention relates to the technical field of etching equipment for semiconductor equipment, and in particular to the technical field of a heating component of etching equipment. Background Art

[0002] During the semiconductor chip processing, etching equipment, such as ICP or CCP, is required to etch grooves on the surface of the wafer.

[0003] Take the ICP etching equipment as an example. In this equipment, the coil couples the energy of the RF power supply to the plasma in the vacuum chamber through the dielectric window by electromagnetic induction. The upper surface of the dielectric window is located in the atmosphere, and the lower surface of the dielectric window is located in the chamber. The interface between the dielectric window and the chamber is the plasma generation and distribution area. The temperature of the dielectric window affects the uniformity of plasma distribution and particle deposition. At the same time, the capacitive electric field of the planar coil is strong, which will form a thick capacitive RF sheath under the dielectric window. The plasma is accelerated to high energy, and then impacts the surface of the dielectric window to cause sputtering, resulting in particle contamination and dielectric window damage.

[0004] In the prior art, the medium window is generally heated by a side heating belt or hot air. However, the side heating belt method is limited by the structure and has low heat transfer efficiency. The hot air heating method has a complex duct structure, the coil capacitive electric field effect is not improved, and the heating is uneven. In addition, even if the medium window is heated by an electric heating wire, there are problems such as loose adhesion, easy damage, and complex shielding port connection. Summary of the invention

[0005] The object of the present invention is to provide an etching device to solve the above problems.

[0006] In order to achieve the above objectives, the present invention is implemented by the following technical solutions:

[0007] The present invention provides an etching device, comprising:

[0008] Chamber;

[0009] a base, the base being disposed in the chamber;

[0010] a dielectric window, the dielectric window being disposed above the chamber;

[0011] A heating assembly, the heating assembly is arranged in the central area of ​​the upper surface of the dielectric window, and is used to heat the central area of ​​the dielectric window. The heating assembly includes a circular body, and a plurality of fan-shaped through holes arranged along the circumference of the circular body are arranged on the circular body;

[0012] A base, the base is arranged between the dielectric window and the upper edge of the chamber, the base comprises an edge heating element, and the edge heating element is used to heat the edge area of ​​the dielectric window;

[0013] A pressing plate, which is disposed above the heating assembly and is used to fix the heating assembly on the dielectric window;

[0014] Wherein, a support block is arranged on the medium window or the pressure plate, and the support block is configured to support the heating component through the fan-shaped through hole.

[0015] Optionally, the thickness D of the circular body is 1 mm<D≤5 mm.

[0016] Optionally, the thickness d of the heating layer is 0.1 mm<d≤1 mm.

[0017] Optional,

[0018] The circular body comprises:

[0019] Upper insulation layer;

[0020] A heating layer, the heating layer being arranged below the upper insulating layer;

[0021] A shielding layer, wherein the shielding layer is arranged below the heating layer;

[0022] A lower flexible heat-conducting insulating layer, wherein the lower flexible heat-conducting insulating layer is disposed below the shielding layer;

[0023] The shielding layer has a diameter greater than that of the heating layer so as to form an exposed portion at the circumferential edge of the circular body.

[0024] Optionally, the shielding layer includes at least two shielding sheets, and the shielding sheet includes a circumferentially extending portion and a radially extending portion connected to the circumferentially extending portion.

[0025] Optionally, the heating layer includes at least two heating plates, and the heating plate includes a circumferentially extending portion and a radially extending portion connected to the circumferentially extending portion.

[0026] Optionally, the number of the heating plates is 4, and the heating plates are electrically connected.

[0027] Optionally, the number of the shielding sheets is 4, and the shielding sheets are disconnected.

[0028] Optionally, the shielding plate and the heating plate have the same shape.

[0029] Optionally, the radially extending portion of the shielding sheet includes at least two long radially extending portions and at least two short radially extending portions, and the at least one short radially extending portion is disposed between the two long radially extending portions.

[0030] Optionally, the radially extending portion of the heating plate includes at least two long radially extending portions and at least two short radially extending portions, and the at least one short radially extending portion is disposed between the two long radially extending portions.

[0031] Optionally, the circumferential width of the circumferentially extending portion of the shielding plate is greater than the circumferential width of the circumferentially extending portion of the heating plate, so as to form an exposed portion at the circumferential edge of the circular body.

[0032] Optionally, the downward projection of the upper insulating layer covers the downward projections of the heating layer and the shielding layer.

[0033] Optionally, a diameter of the lower flexible thermally conductive insulating layer is greater than a diameter of the upper insulating layer.

[0034] Optionally, the upper insulating layer and the lower flexible heat-conductive insulating layer have the same shape, both of which are spoke-shaped.

[0035] Optionally, the heating layer is made of PI or PTFE.

[0036] Optionally, the base further includes a ring body and a clamping member, the outer wall of the base is provided with a transverse groove extending along the circumference of the ring body, the edge heating member is provided on the inner side of the transverse groove, and the clamping member is provided on the outer side of the transverse groove.

[0037] Optionally, the pressing element is configured to provide pressure to the edge heating element in a radial direction.

[0038] Optionally, the base further includes a fastener, and the fastener is configured to penetrate the transverse groove from the upper surface of the ring body to fix the clamping member.

[0039] Optionally, the lower end of the fastener is truncated cone-shaped, and the upper surface of the clamping member is provided with an inverted truncated cone groove that matches the lower end of the truncated cone.

[0040] Optionally, the pressing member is composed of at least two arc-shaped segments.

[0041] Optionally, the inner side wall of the pressing member is configured as an arc-shaped groove matching the shape of the edge heating member.

[0042] Optionally, a grounding member is further included, and the grounding member is pressed on the exposed portion.

[0043] Optionally, the grounding member includes a pressure ring and a support rod, the pressure ring is pressed on the upper surface of the exposed portion, and the support rod extends vertically with one end connected to the pressure ring and the other end connected to the base.

[0044] Compared with the prior art, the present invention has the following advantages:

[0045] 1. The present invention arranges a heating assembly and an edge heating element on the dielectric window, so as to evenly control the temperature of the dielectric window.

[0046] 2. The present invention provides a fan-shaped through hole to facilitate the support block to support the heating component and prevent the heating component from being squeezed by excessive force. At the same time, an exposed portion is provided to facilitate reliable grounding of the shielding layer.

[0047] 3. The heating component of the present invention has the characteristics of flexibility and ultra-thinness. The flexibility allows it to fit the dielectric window to improve heating efficiency, and the ultra-thinness saves more space. BRIEF DESCRIPTION OF THE DRAWINGS

[0048] In order to more clearly illustrate the technical solution of the present invention, the following briefly introduces the drawings required for the description. Obviously, the drawings described below are an embodiment of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative work:

[0049] Figure 1 It is a structural schematic diagram of the etching equipment of the present invention;

[0050] Figure 2 It is a schematic structural diagram of the upper part of the etching device of the present invention;

[0051] Figure 3 It is a structural schematic diagram of the base of the present invention;

[0052] Figure 4 is a cross section of the base of the present invention;

[0053] Figure 5 A top view of the pressing member of the present invention;

[0054] Figure 6 is a structural diagram of a heating assembly of the present invention;

[0055] Figure 7 is a cross-sectional view along O1-O1' of the heating assembly of the present invention;

[0056] Figure 8 is a cross-sectional view along O2-O2' of the heating assembly of the present invention;

[0057] Fig. 9 An exploded view of the heating assembly of the present invention;

[0058] Fig.10 is a schematic diagram of a heating layer of the present invention;

[0059] Fig.11 is a schematic diagram of a shielding layer of the present invention;

[0060] Fig.12It is a schematic diagram of the combination of the heating layer and the shielding layer of the present invention. DETAILED DESCRIPTION

[0061] The scheme proposed by the present invention is further described in detail below in conjunction with the accompanying drawings and specific implementation methods. According to the following description, the advantages and features of the present invention will be clearer. It should be noted that the accompanying drawings are in a very simplified form and use non-precise proportions, which are only used to conveniently and clearly assist in explaining the purpose of the implementation method of the present invention. In order to make the purposes, features and advantages of the present invention more obvious and easy to understand, please refer to the accompanying drawings. It should be noted that the structures, proportions, sizes, etc. illustrated in the accompanying drawings of this specification are only used to match the contents disclosed in the specification for people familiar with this technology to understand and read, and are not used to limit the limiting conditions for the implementation of the present invention, so they have no technical substantive significance. Any structural modification, change in proportional relationship or adjustment of size, without affecting the effects that the present invention can produce and the purposes that can be achieved, should still fall within the scope of the technical content disclosed by the present invention.

[0062] Figure 1 The structural schematic diagram of the etching device of the present invention is shown, taking ICP as an example. Figure 1 As shown, the etching device includes: a chamber 201, a base 202, a dielectric window 203, a heating component 100, a pressing plate 242 and a base 300. The chamber 201 is used to process wafers and perform etching process on the wafers. The base 202 is arranged in the chamber 201; the dielectric window 203 is arranged above the chamber 201; the heating component 100 is arranged on the upper surface of the dielectric window 203, and is used to control the temperature of the dielectric window 203; the pressing plate 242 is arranged above the heating component 100, and is used to fix the heating component on the dielectric window 203, and is also used to seal the dielectric window, that is, to seal the upper dielectric window 2031 and the lower dielectric window 2032 of the dielectric window; specifically, the heating component 100 is arranged in the central area of ​​the upper surface of the dielectric window 203, and is used to heat the central area of ​​the dielectric window. The heating component 100 includes a circular body, and a plurality of fan-shaped through holes 160 arranged along the circumference of the circular body are arranged on the circular body. The circular body is concentric with the dielectric window. Preferably, the fan-shaped through-hole is fan-shaped, and a plurality of fan-shaped through-holes 160 are arranged along the circumference to form a ring. The intervals between two adjacent fan-shaped through-holes 160 in the circumferential direction are the same, that is, they are evenly distributed in the circumferential direction. The sides of the two adjacent fan-shaped through-holes 160 are parallel.

[0063] The base 300 is disposed between the dielectric window 203 and the upper edge of the chamber 201. The base is annular and includes an edge heating element 320. The edge heating element 320 is used to heat the edge area of ​​the dielectric window. The dielectric window can uniformly control the temperature of the dielectric window through the heating assembly 100 in the central area and the edge heating element 320 at the edge.

[0064] Wherein, a support block 2033 is arranged on the dielectric window 203 or the pressure plate 242, and the support block 2033 is configured to support the heating component through the fan-shaped through hole 160. Preferably, the support block 2033 is arranged on the upper surface of the dielectric window 203 or the lower surface of the pressure plate 242, and the support block 2033 is integrally formed with the dielectric window 203 or the pressure plate 242; the shape and size of the support block 2033 are adapted to the shape and size of the fan-shaped through hole 160; further preferably, the number of the support blocks 2033 is multiple, for example, the same as the number of the fan-shaped through holes 160, and the fan-shaped through holes 160 and the support blocks are uniformly distributed along the circumference. Since the heating component 100 is very thin and has a certain degree of flexibility, it has poor pressure resistance. The support block 2033 of the present invention can well protect the heating component and prevent it from being squeezed by excessive force, and at the same time, the heating component can be well pressed on the upper surface of the dielectric window through the pressure plate, thereby improving the heat conduction efficiency.

[0065] The etching device further includes a process gas source 208, a coil 241, a coil support 204, a first plasma source 205, a second plasma source 206, a matcher 207 and a controller 209. The process gas source 208 is connected to the dielectric window 203 through a pipeline, and is used to deliver the process gas to the chamber 201. The coil is arranged above the heating assembly 100, and the coil is fixed above the chamber 201 through the coil support 204. The first plasma source 205 is connected to the coil 241 through a matcher, and is used to deliver a radio frequency signal to the coil, so as to generate plasma in the chamber 201 during the etching process. The second plasma source 206 is connected to the electrode in the base through the matcher 207, and the controller 209 is respectively connected to the first plasma source 205 and the second plasma source 206, and is used to control the first plasma source 205 and the second plasma source 206.

[0066] Figure 2 The schematic diagram of the upper structure of the etching device of the present invention is shown as follows: Figure 2As shown, optionally, the coil support 204 is in a "cross" shape, and the coil support 204 is fixed on the base 300 through a vertically extending support 244. The number of the supports can be, for example, 4, respectively arranged at the four ends of the "cross", the upper end of the support 244 is connected to the end of the "cross", and the lower end thereof is connected to the outer edge of the upper surface of the base 300. The dielectric window 203 includes an upper dielectric window 2031 and a lower dielectric window 2032. The dielectric window 203 can be, for example, circular, and the upper dielectric window 2031 and the lower dielectric window 2032 are also circular. The upper dielectric window 2031 and the lower dielectric window 2032 are concentric and stacked up and down. The diameter of the upper dielectric window is smaller than that of the lower dielectric window. The center of the upper dielectric window is provided with an air inlet area for connecting with a process gas source 208 to introduce process gas into the chamber 201.

[0067] The edge of the lower surface of the lower dielectric window 2032 is sealed and connected to the inner edge of the upper surface of the base 300, and the diameter of the circular body of the heating component 100 is the same as the diameter of the lower dielectric window 2032. The coil includes an inner coil and an outer coil that are arranged in the same plane and are concentric, and the center of the inner coil and the outer coil is the center of the dielectric window. The inner coil is arranged in the center of the dielectric window, and the outer coil is arranged at the edge of the dielectric window. The fan-shaped through hole 160 is arranged in the area between the inner coil and the outer coil. The diameter of the pressing plate 242 is slightly smaller than the minimum diameter of the outer coil. The diameter of the upper dielectric window is slightly smaller than the diameter of the pressing plate. The pressing plate 242 is fixed to the lower dielectric window by screws arranged on its edge, and the upper dielectric window 2031 and the lower dielectric window 2032 are sealed at the same time.

[0068] Figure 3-5 The schematic diagram of the structure of the base is shown in FIG. Figure 3 As shown, the base 300 also includes a ring body 310 and a pressing member 330. The ring body 310 includes an upper surface, a lower surface, an inner side wall and an outer side wall. The outer side wall of the ring body 310 is provided with a transverse groove extending along the circumference of the ring body 310. The edge heating member 320 is provided on the inner side of the transverse groove, and the pressing member 330 is provided on the outer side of the transverse groove. The pressing member 330 is configured to provide pressure to the edge heating member 320 along the radial direction, and the pressure can make the edge heating member 320 close to the transverse groove, thereby providing better heat conduction. Optionally, the edge heating member 320 is a heating wire, and the heating wire surrounds the base 300.

[0069] like Figure 4 As shown, the base 300 further includes a fastener 340, which is vertically arranged and configured to penetrate from the upper surface of the ring body 310 to the transverse groove to fix the pressing member 330. The lower end 341 of the fastener 340 is truncated cone-shaped, as shown in FIG. Figure 5 As shown, the upper surface of the pressing member 330 is provided with an inverted truncated cone groove 332 that matches the truncated cone-shaped lower end 341. The truncated cone-shaped lower end and the inverted truncated cone groove 332 can accurately position and adjust the pressing member 330 and provide radial force at the same time.

[0070] Optionally, the fastener is a bolt, the lower end 341 of the bolt is not provided with threads, and other positions of the bolt screw are provided with threads. The pressing member 330 is at least two arc segments, and the at least two arc segments are assembled into a complete ring; Figure 5 As shown, preferably, the number of the pressing members 330 is two. The inner side wall 331 of the pressing member 330 is configured as an arc groove that matches the shape of the edge heating member 320. Preferably, the cross section of the edge heating member 320 is circular, and the arc groove of the inner side wall 331 of the pressing member 330 is a semicircular arc. The cross section of the base 300 is a roughly trapezoidal shape, the lower base of the trapezoid is arranged on the upper surface, the upper base of the trapezoid is arranged on the lower surface, and the height of the trapezoid is arranged on the outer side wall.

[0071] Figure 6-8 The schematic diagram of the structure of the heating assembly of the present invention is shown as follows: Figure 6-8 As shown, the circular body of the heating assembly 100 includes: an upper insulating layer 110, a heating layer 120, a shielding layer 130 and a lower flexible thermally conductive insulating layer 140; the heating layer 120 is arranged below the upper insulating layer 110, the shielding layer 130 is arranged below the heating layer 120, and the lower flexible thermally conductive insulating layer 140 is arranged below the shielding layer 130. The diameter of the shielding layer 130 is larger than that of the heating layer, so as to form an exposed portion 151 at the circumferential edge of the circular body; Figure 7 As shown, preferably, the upper insulating layer 110 and the heating layer 120 have the same diameter, and the shielding layer 130 and the lower flexible thermally conductive insulating layer 140 have the same diameter. The exposed portion is almost formed at the edge of the entire circular body, and has a large area, so the connection between the exposed portion 151 and the grounding member 243 has a larger grounding area, and the connection is more reliable and stable.

[0072] Preferably, the thickness D of the circular body is 1mm<D≤5mm. The thickness d of the heating layer is 0.1mm<d≤1mm. The heating layer 120 is made of PI or PTFE material to achieve an ultra-thin heating layer. The lower flexible thermally conductive insulating layer 140 is silicone cloth, which has good flexibility and thermal conductivity. The flexibility can promote better fitting, thereby improving the heat conduction efficiency. The shielding layer is metal, such as aluminum. In summary, the heating component 100 has an ultra-thin feature and a certain flexibility. The flexibility can make the heating component fit better with the dielectric window and improve the heat conduction efficiency. The ultra-thinness can be more easily arranged between the dielectric window and the coil, saving space.

[0073] Fig. 9 An exploded view of the heating assembly is shown, Figure 10-12 The schematic diagram of the structure of the shielding layer and the heating layer is shown in FIG. Figure 10-12 As shown, the shielding layer 130 includes at least two shielding sheets 131. Preferably, there are four shielding sheets 131, and the four shielding sheets are assembled into a roughly circular shape on a horizontal plane. The shielding sheet 131 includes a circumferential extension portion 132 and a radial extension portion connected to the circumferential extension portion, one end of the radial extension portion is connected to the circumferential extension portion, and the other end is vacant. Optionally, the radial extension portion of the shielding sheet includes at least two long radial extension portions 134 and at least two short radial extension portions 133, and the at least one short radial extension portion 133 is arranged between the two long radial extension portions 134. Optionally, the short radial extension portions 133 and the long radial extension portions 134 are distributed at intervals, and the number of the short radial extension portions 133 is 3, and the number of the long radial extension portions 134 is 3.

[0074] The heating layer includes at least two heating plates 121. Preferably, there are four heating plates 121, and the four heating plates 121 are arranged in a roughly circular shape on a horizontal plane. The heating plate 121 includes a circumferential extension portion 122 and a radial extension portion connected to the circumferential extension portion, one end of the radial extension portion is connected to the circumferential extension portion, and the other end is left vacant. Optionally, the radial extension portion of the heating plate 121 includes at least two long radial extension portions 124 and at least two short radial extension portions 123, and the at least one short radial extension portion is arranged between the two long radial extension portions. Optionally, the short radial extension portions 133 and the long radial extension portions 134 are distributed at intervals, and the number of the short radial extension portions 133 is 3, and the number of the long radial extension portions 134 is 3.

[0075] Optionally, the shielding sheet 131 and the heating sheet 121 have the same shape. The four heating sheets are electrically connected, for example, connected in series. The four shielding sheets are disconnected (i.e., not connected) to prevent the generation of an induced circular current in the opposite direction to the coil current. The induced circular current will have a thermal effect. The shielding sheets 131 are disconnected by a disconnecting portion 152 extending along the radial direction. The disconnecting portion 152 is an equal-width gap extending along the radial direction. The equal-width gap disconnects the four shielding sheets 131 from each other. Figure 8 Due to the existence of the disconnection portion 152 , at the location of the disconnection portion 152 , in the cross-sectional view of O2 - O2 ′, the circular body only has the upper insulating layer 110 and the lower flexible thermally conductive insulating layer 140 .

[0076] like Fig.12As shown, the heating sheet 121 and the shielding sheet 131 are stacked up and down, and the circumferential extension of the heating sheet and the circumferential extension of the shielding sheet 131 overlap, the radial extension of the heating sheet 121 and the radial extension of the shielding sheet 131 overlap, and the circumferential width of the circumferential extension of the shielding sheet 131 is greater than the circumferential width of the circumferential extension of the heating sheet 121, so as to form an exposed portion 151 at the circumferential edge of the circular body, and the width of the radial extension of the heating sheet 121 and the radial extension of the shielding sheet 131 can be equal. The fan-shaped through hole 160 is formed in the fan-shaped gap between the radial extension of the heating sheet and the shielding sheet.

[0077] Further optional, such as Fig. 9 As shown, the downward projection of the upper insulating layer 110 covers the downward projection of the heating layer 120 and the shielding layer 130. The upper insulating layer 110 and the lower flexible thermally conductive insulating layer 140 have the same shape, both of which are spoke-shaped. The spoke-shaped includes an outer ring, an inner ring and spokes. The spokes extend radially, one end of the spoke is connected to the outer ring, and the other end of the spoke is connected to the inner ring. The projection of the outer ring covers the circumferential extension of the heating plate and the shielding plate. The projection of the spokes covers the radial extension of the heating plate and the shielding plate, and the vacant ends of the radial extension of the heating plate and the shielding plate extend to the projection of the inner ring. Fan-shaped through holes 160 are formed between the spokes of the spokes.

[0078] like Figure 2 As shown, the etching device also includes a grounding member 243, and the grounding member 243 is pressed on the exposed portion 151, specifically, pressed on the upper surface of the exposed portion 151. Optionally, the grounding member 243 includes a pressure ring 2432 and a support rod 2431, and the pressure ring 2432 is pressed on the upper surface of the exposed portion, and the support rod 2431 extends vertically, and one end of the support rod 2431 is connected to the outer side surface of the pressure ring, and the other end is connected to the upper surface of the base. Preferably, the pressure ring is composed of multiple ring segments, for example, four ring segments form a complete annular pressure ring.

[0079] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that the process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of more restrictions, the elements defined by the sentence "including one..." do not exclude the existence of other identical elements in the process, method, article or device including the elements. In addition, the term "connection" herein means that A and B are directly connected, or that A and B are indirectly connected, such as A and B are connected through C, or even through more components such as C and D, and A and B can be connected in one piece, or in separate pieces, or removable, or fixed. The term "optional" herein means that the technical feature can be combined or not combined with any feature in the text.

[0080] Although the content of the present invention has been described in detail through the above preferred embodiments, it should be appreciated that the above description should not be considered as a limitation of the present invention. After reading the above content, it will be apparent to those skilled in the art that various modifications and substitutions of the present invention will occur. Therefore, the protection scope of the present invention should be limited by the appended claims.

Claims

1. An etching device, characterized in that: include: Chamber; a base, the base being disposed in the chamber; a dielectric window, the dielectric window being disposed above the chamber; A heating assembly, the heating assembly is arranged in the central area of ​​the upper surface of the dielectric window, and is used to heat the central area of ​​the dielectric window. The heating assembly includes a circular body, and the circular body is provided with a plurality of fan-shaped through holes arranged along the circumference of the circular body; A base, the base is arranged between the dielectric window and the upper edge of the chamber, the base comprises an edge heating element, and the edge heating element is used to heat the edge area of ​​the dielectric window; A pressing plate, which is disposed above the heating assembly and is used to fix the heating assembly on the dielectric window; Wherein, a support block is arranged on the medium window or the pressure plate, and the support block is configured to support the heating component through the fan-shaped through hole.

2. The etching device according to claim 1, characterized in that: The thickness D of the circular body is 1 mm<D≤5 mm.

3. The etching device according to claim 1, characterized in that: The thickness d of the heating layer is 0.1 mm<d≤1 mm.

4. The etching device according to any one of claims 1, characterized in that: The circular body comprises: Upper insulation layer; A heating layer, the heating layer being arranged below the upper insulating layer; A shielding layer, wherein the shielding layer is arranged below the heating layer; A lower flexible heat-conducting insulating layer, wherein the lower flexible heat-conducting insulating layer is disposed below the shielding layer; The shielding layer has a diameter greater than that of the heating layer so as to form an exposed portion at the circumferential edge of the circular body.

5. The etching device according to claim 4, characterized in that: The shielding layer includes at least two shielding pieces, and the shielding piece includes a circumferentially extending portion and a radially extending portion connected to the circumferentially extending portion.

6. The etching device according to claim 5, characterized in that: The heating layer includes at least two heating plates, and the heating plates include a circumferentially extending portion and a radially extending portion connected to the circumferentially extending portion.

7. The etching device according to claim 6, characterized in that: The number of the heating plates is 4, and the heating plates are electrically connected.

8. The etching device according to claim 5, characterized in that: The number of the shielding sheets is 4, and the shielding sheets are disconnected.

9. The etching device according to claim 6, characterized in that: The shielding plate and the heating plate have the same shape.

10. The etching device according to claim 6, characterized in that: The radially extending portion of the shielding sheet includes at least two long radially extending portions and at least two short radially extending portions, and the at least one short radially extending portion is arranged between the two long radially extending portions.

11. The etching device according to claim 10, characterized in that: The radially extending portion of the heating plate includes at least two long radially extending portions and at least two short radially extending portions, and the at least one short radially extending portion is arranged between the two long radially extending portions.

12. The etching device according to claim 11, characterized in that: The circumferential width of the circumferentially extending portion of the shielding sheet is greater than the circumferential width of the circumferentially extending portion of the heating sheet, so as to form an exposed portion at the circumferential edge of the circular body.

13. The etching device according to claim 4, characterized in that: The downward projection of the upper insulating layer covers the downward projections of the heating layer and the shielding layer.

14. The etching device according to claim 13, characterized in that: The diameter of the lower flexible thermally conductive insulating layer is greater than the diameter of the upper insulating layer.

15. The etching device according to claim 13, characterized in that: The upper insulating layer and the lower flexible heat-conducting insulating layer have the same shape, both of which are spoke-shaped.

16. The etching device according to any one of claims 4 to 15, characterized in that: The heating layer is made of PI or PTFE.

17. The etching device according to claim 1, characterized in that: The base also includes a ring body and a clamping member. The outer wall of the base is provided with a transverse groove extending along the circumference of the ring body. The edge heating member is arranged on the inner side of the transverse groove, and the clamping member is arranged on the outer side of the transverse groove.

18. The etching device according to claim 17, characterized in that: The pressing element is configured to provide pressure to the edge heating element in a radial direction.

19. The etching device according to claim 18, characterized in that The base further includes a fastener configured to penetrate from the upper surface of the ring body to the transverse groove and fix the pressing member.

20. The etching device according to claim 19, characterized in that The lower end of the fastener is in the shape of a truncated cone, and the upper surface of the pressing member is provided with an inverted truncated cone groove that matches the lower end of the truncated cone.

21. The etching device according to claim 20, characterized in that The pressing member is composed of at least two arc-shaped segments.

22. The etching apparatus according to claim 18, characterized in that The inner side wall of the pressing member is configured as an arc-shaped groove matching the shape of the edge heating member.

23. The etching device according to claim 4, characterized in that: A grounding piece is also included, and the grounding piece is pressed on the exposed portion.

24. The etching device according to claim 23, characterized in that The grounding member comprises a pressing ring and a support rod, wherein the pressing ring is pressed on the upper surface of the exposed portion, and the support rod extends vertically, with one end connected to the pressing ring and the other end connected to the base.

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