Detection attachment, detection device and method for detecting shear force of layered structure

Abstract

The invention is applicable to the field of shear force detection of layered structures, and provides a detection accessory, a detection device and a detection method for shear force of a layered structure. The detection additional part is used for assisting in microscopic shear force detection of the layered structure and comprises a first additional layer covering the layered structure and a second additional layer covering the side, away from the layered structure, of the first additional layer, and the length of the second additional layer in the shear direction of the layered structure is smaller than that of the first additional layer. According to the detection accessory, the detection device and the detection method for the shear force of the layered structure, the accuracy of detection of the microscopic shear force of the layered structure can be effectively improved.

Description

Technical Field

[0001] The present application belongs to the field of shear force detection of layered structures, and in particular, relates to a detection attachment, a detection device and a method for detecting shear force of a layered structure. Background Art

[0002] Van der Waals layered materials / layered structures have rapidly become a frontier field internationally due to their excellent mechanical, thermal and electrical properties, and have shown great application potential in the fields of nanocomposites, flexible electronic devices, and microelectromechanical systems (MEMS). Mechanical property testing is essential for understanding the microstructure of materials, improving material quality, and maximizing material potential. Due to the typical characteristics of layered materials that are strong in-plane and weak out-of-plane, interface-dominated deformation mechanisms and mechanical responses are a major focus of layered material mechanics research. Accurately detecting the shear strength of materials is one of the important criteria for evaluating the growth quality and internal defects of layered materials, and has a very important reference value for material research and device design applications.

[0003] At present, the shear performance test of layered materials has the following problems: traditional shear equipment such as universal testing machines are suitable for macroscopic bulk materials. Currently, only very few two-dimensional materials can grow to macroscopic sizes, and the material selection is limited. In addition, after the material grows to the macroscopic level, the internal structure is complex, with multiple single crystal domains and grain boundaries. The macroscopic shear test can only reflect the overall mechanical properties of the material, making it difficult to understand the intrinsic properties of the material, which is not conducive to guiding the growth and application of layered materials. Some existing microscopic shear mechanical property test methods also have limitations. For example, Raman spectroscopy characterization is only applicable to very few layers of materials. The probe based on the AFM system will directly contact the surface of the material, and the uneven stress field will cause the shear strength test to be low. Summary of the invention

[0004] The purpose of the present application is to overcome the deficiencies of the above-mentioned prior art and to provide a detection attachment, a detection device and a method for detecting shear force of a layered structure, which aims to improve the accuracy of detecting microscopic shear force of a layered structure.

[0005] The present application provides a detection accessory for assisting in the microscopic shear force detection of a layered structure, comprising a first additional layer covering the layered structure, and a second additional layer covering the side of the first additional layer facing away from the layered structure, wherein the length of the second additional layer along the shear direction of the layered structure is shorter than that of the first additional layer.

[0006] Optionally, the first additional layer completely covers the upper surface of the layered structure; the first additional layer and the layered structure have the same length in the shear direction.

[0007] Optionally, the second additional layer has a thickness of 1.0-5.0 um.

[0008] Optionally, the second additional layer and the first additional layer are made of different materials.

[0009] Optionally, the first additional layer is a titanium aluminum film; and the second additional layer is an aluminum film.

[0010] The present application provides a detection device, comprising:

[0011] A stage, on which the layered structure is placed, and the layered structure is covered with the above-mentioned detection attachment;

[0012] The detection component comprises a probe and a force sensor, wherein the probe is used to apply a shear force to the second additional layer, and the force sensor is used to detect the shear force.

[0013] The present application provides a method for detecting shear force of a layered structure, comprising:

[0014] preparing a layered structure to be tested;

[0015] Prepare the additional part: cover the layered structure with the additional part, wherein the additional part is the detection additional part as described above;

[0016] Detection: placing the layered structure on a carrier, applying lateral force to the second additional layer through a probe with a force sensor, and obtaining shear force information from the force sensor.

[0017] Optionally, there are multiple additional parts, and after the step of preparing the additional parts, it also includes etching: etching the part of the layered structure not covered by the first additional layer to obtain multiple independent substructures; the detection step is: placing the substructure on a carrier, applying lateral force to the second additional layer of the substructure through a probe with a force sensor, and obtaining shear force information from the force sensor.

[0018] Optionally, the preparing the layered structure to be detected includes: mechanically cleaving natural graphite to obtain a graphite thin layer, and the graphite thin layer is the layered structure to be detected.

[0019] Optionally, the step of preparing the layered structure to be inspected further comprises: roughening the surface of the layered structure to be coated; and the step of preparing the additional layer comprises: covering the surface of the layered structure to be coated with the additional component.

[0020] The detection attachment provided by the present application, as well as the detection device based on the detection attachment and the detection method of the shear force of the layered structure, can be applicable to the shear strength detection of the layered structure with smaller size and are simple to operate. The layered structure is covered with a detection attachment. The second additional layer of the detection attachment carries the concentrated load applied by the probe, and then disperses the concentrated load to the layered structure through the first additional layer. Compared with the square mask, the attachment improves the out-of-plane stiffness of the material of the layered structure and improves the bending resistance. At the same time, the attachment converts the concentrated load into a dispersed load or even a uniformly distributed load, thereby adjusting the stress distribution, and there is no other mechanical behavior such as crack extension that damages the shear strength performance. The shear strength of the test is not related to the size, the measurement can reflect the intrinsic mechanical properties of the material, and the test results are accurate and effective. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0022] Figure 1 Schematic diagram of shear force test of layered structure in the embodiment of the present application;

[0023] Figure 2 is the shear force versus displacement graph for the square mask sample;

[0024] Figure 3 yes Figure 2 Deformation image of the sample in the figure;

[0025] Figure 4 is a comparison diagram of the shear strength and size relationship between the square mask sample and the L-shaped sample in this embodiment;

[0026] Figure 5 is a finite element force analysis comparison diagram of a square mask sample and an L-shaped sample in this embodiment;

[0027] Figure 6 is a graph showing the relationship between sample size and shear strength calculated by finite element simulation for a square mask sample and an L-shaped sample in this embodiment;

[0028] Figure 7 is a comparison chart of the shear strength of various graphite samples in this embodiment;

[0029] Figure 8 It is a schematic diagram of the processing flow of detecting additional parts in the embodiment of the present application.

[0030] Description of Figure Numbers:

[0031] 11. Carrier; 21. Microscope; 31. Force sensor; 32. Probe; 41. Accessories; 42. Layered structure. DETAILED DESCRIPTION

[0032] In order to make the purpose, technical solution and advantages of the present application more clearly understood, the present application is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and are not used to limit the present application.

[0033] In addition, in the description of the present application, “plurality” means two or more than two, unless otherwise clearly and specifically defined.

[0034] It should also be noted that the directional terms such as left, right, up and down in the embodiments of the present application are merely relative concepts or are based on the normal use status of the product, and should not be considered as restrictive.

[0035] Embodiment 1

[0036] Please refer to Figure 1 This embodiment provides a detection accessory 41 and a method for detecting microscopic shear force of a layered structure 42 based on the accessory 41.

[0037] In this embodiment, the layered structure 42 may be a layered structure 42 formed by stacking and growing two-dimensional materials such as graphene, boron nitride, molybdenum disulfide (MoS2), tungsten disulfide (WS2), molybdenum diselenide (MoSe2), and tungsten diselenide (WSe2). It may also be a layered structure 42 such as highly oriented pyrolytic graphite and natural graphite.

[0038] The sample thickness required for the experimental measurement is very thin. In the experiment, the thickly grown sample can be cleaved and the first layer of structure of about 3-5um can be torn off for processing and measurement. Of course, the first layer of structure is composed of multiple two-dimensional structural layers. The microscopic shear force detection involved in this embodiment is the detection of the shear force required for the relative lateral movement between the two-dimensional structural layers.

[0039] If shear force is applied directly to the layered structure, the shear force is a concentrated load that acts directly on the surface of the material. On the one hand, the uneven stress field can easily lead to a low shear strength test. On the other hand, the layered structure is easily bent under force, further affecting the accuracy of the test results.

[0040] Specifically, there are usually two failure modes in the shear failure process of the layered structure 42 material, type I fracture mode "opening type" (normal) and type II fracture mode "shear type" (transverse). Only when type II fracture mode occurs is it a uniform shear failure and accurate shear strength can be measured.

[0041] After a concentrated load is applied to the tip, the stress needs to be transferred to the graphite below through the interface. If the stress is not evenly distributed in the horizontal direction, it will cause bending deformation of the interface, resulting in the existence of a Type I fracture mode "opening type", making the measurement results inaccurate.

[0042] In order to improve the bending resistance of the layered structure, those skilled in the art cover the outer layer of the layered structure with a mask, which is a thin film layer with a square cross section (hereinafter referred to as a square mask for ease of description). This setting effectively improves the bending resistance of the layered structure.

[0043] Please refer to Figure 2 , Figure 2 It is a shear test based on a square mask design, that is, a square mask is attached to the layered structure / sample, and the probe 32 pushes the square mask to perform a microscopic shear test on the sample. Figure 2 In the figure, the horizontal axis is the real-time moving distance of the probe 32, and the vertical axis is the real-time shear force detected by the sample. The BC stage is the loading stage, and the sample undergoes shear elastic deformation. The interface of the sample is damaged in the CD stage and cracks in a short time, and then it continues to damage in the DE stage, and the cracks continue to expand along the normal direction (type I fracture mode) and the transverse direction (type II shear mode).

[0044] Figure 3 This is the sample image of the square mask sample after the shear test. Figure 3 The cracks in Figure 2 The crack shape in the DE stage. It can be seen from the figure that the sample has both mode I fracture mode and mode II shear mode during the test.

[0045] It is found through experiments that when the shear strength of a sample with a square mask attached is measured, the shear strength measurement result is related to its size. In other words, the size of the square mask / sample will affect the shear strength result.

[0046] Please refer to Figure 4 , the horizontal axis is the lateral length of the sample, and the vertical axis is the shear strength. For the square mask sample, we made samples with mask thickness of 200nm (square-200), 500nm (square-500) and 1000nm (square-1000). The experiment found that as the size of the sample / square mask increased, the shear strength of the sample decreased. Therefore, the measured shear strength is not an intrinsic property of the material.

[0047] After in-depth research and multiple tests, it was found that when the square mask is changed to an L-shaped or inverted T-shaped mask, the measured shear strength does not change with the size of the sample. In other words, the measured shear strength is the inherent shear strength of the material, which is the intrinsic property of the material. After further theoretical analysis and quantitative testing, the specific structure of the mask is optimized and designed to form the detection attachment 41 to be protected by the invention, as well as a method for performing microscopic shear force detection on a layered structure 42 based on the attachment 41.

[0048] Please refer to Figure 1 The detection additional part (hereinafter referred to as additional part 41 for the sake of simplicity) includes a first additional layer covering the upper surface of the layered structure 42, and a second additional layer covering the side of the first additional layer away from the layered structure 42, and the length of the second additional layer along the shear direction of the layered structure 42 is smaller than that of the first additional layer.

[0049] The additional member 41 is covered on the layered structure 42. During the test, the probe 32 applies a shear force to the second additional layer until a lateral movement occurs between the two-dimensional structural layers of the layered structure 42. The shear strength of the layered structure 42 is calculated by measuring and reading the magnitude of the reaction force (force sensor 31) received by the probe 32.

[0050] In this embodiment, the additional member 41 is a double-layer structure (a first additional layer and a second additional layer), the lower layer / first additional layer is covered on the layered structure 42 to be detected, and the upper layer / second additional layer protrudes to provide a point of action of the shear force. Taking the layered structure 42 to be detected as a rectangular parallelepiped as an example, the additional member 41 is covered on the upper surface of the layered structure 42, and its cross section along the length direction is L-shaped or inverted T-shaped, forming a right angle between the upper surface of the first additional layer and the side surface of the second additional layer, and the probe 32 acts on the vertical side of the right angle, that is, the side surface of the second additional layer. Figure 1 In the illustrated structure, the attachment 41 is L-shaped.

[0051] Undoubtedly, the adhesion force between the first additional layer and the layered structure 42, and the adhesion force between the second additional layer and the first additional layer are both greater than the van der Waals force between the two-dimensional structural layers in the layered structure 42, so that when the probe 32 applies a shear force to the second additional layer, relative lateral movement occurs between the two-dimensional structural layers, while no relative movement occurs between the first additional layer, the second additional layer and the topmost layer of the layered structure 42.

[0052] Please refer to Figure 4 Taking the L-shaped mask as an example, a mask with an L-shaped cross-section was covered on the layered structure 42 / sample, and the shear force was measured. It was found that the shear strength of the samples covered with the L-shaped mask was stable at around 62 MPa, with sample sizes ranging from 0 to 6 um. It can be seen that the shear strength of the L-shaped mask samples does not change with the sample size, indicating that the inherent shear strength is measured.

[0053] Please refer to Figure 5 , based on the square mask sample and the L-shaped sample, a finite element model was established. (i) is the force analysis of the square mask sample. The circle is the position where the needle tip applies lateral force. The different shades of color in the surface represent the stress concentration at the interface. In practice, the inventor made models with square mask thicknesses of 200nm, 500nm, and 1000nm. The force analysis of the finite element model is basically as follows: Figure 5 (i) shows that stress concentration exists at the interface. (ii) shows the stress analysis of the L-shaped sample. Compared with the square sample, the stress distribution at the interface is more uniform. It can be seen that the additional part 41 provided in this embodiment has a stronger ability to resist bending deformation than the square mask design. At the same time, the location where the concentrated load is applied is farther from the damage interface, and the stress distribution at the location where the stress is transferred farther away will be more uniform.

[0054] Please refer to Figure 6 According to the correlation between sample size and shear strength calculated by finite element method, it can be found that the shear strength of the square sample gradually increases as the sample size decreases, indicating that the test result of the mask sample has a size effect, not an intrinsic characteristic of the sample. However, the shear strength of the L-shaped sample theoretically calculated has no size effect. In other words, the shear strength is the intrinsic mechanical property of the sample. That is, by using the additional part 41 provided in this embodiment to perform a microscopic shear force test, the test structure can reflect the intrinsic mechanical properties of the layered material and is used to detect and evaluate the growth quality of the single crystal material.

[0055] Please refer to Figure 7 We used this structural design to compare the single crystal quality of highly oriented pyrolytic graphite, natural graphite, and high-quality single crystal graphite grown in this laboratory. The experiment found that the shear strength test results of the grown high-quality single crystal graphite were the highest and most stable, indicating that the material growth quality was the highest, while the test results of highly oriented pyrolytic graphite and natural graphite were low, which is consistent with the fact that these two materials are not perfect single crystal materials due to the presence of polycrystalline domains inside. Therefore, this experiment can confirm that the microscopic shear force test using the attachment 41 provided in this embodiment can evaluate the quality of the grown material from a mechanical perspective with high accuracy.

[0056] From the above, the additional component 41 provided in this embodiment and the method for detecting the microscopic shear force of the layered structure 42 based on the additional component 41 are as follows: a first additional layer is covered on the layered structure 42, and then a second additional layer is covered on the first additional layer, and the length of the second additional layer along the shear direction of the layered structure 42 is smaller than that of the first additional layer. The second additional layer carries the concentrated load applied by the probe 32, and then disperses the concentrated load to the layered structure 42 through the first additional layer. Compared with the square mask, the additional component 41 improves the out-of-plane stiffness of the material of the layered structure 42 and improves the bending resistance. At the same time, the additional component 41 converts the concentrated load into a dispersed load or even a uniformly distributed load, thereby adjusting the stress distribution, and there is no other mechanical behavior such as crack extension that damages the shear strength performance. The shear strength of the test is not related to the size, and the measurement results are the intrinsic properties of the material, and the test results are accurate and effective.

[0057] In another embodiment of the present application, please refer to Figure 1 , the first additional layer completely covers the upper surface of the layered structure 42. This arrangement can effectively ensure that the entire upper surface of the layered structure 42 is a stress-bearing surface, thereby ensuring the uniform distribution of stress to the greatest extent.

[0058] In another embodiment of the present application, please refer to Figure 1 , the first additional layer does not cover the side of the layered structure 42, so that the side of the layered structure 42 is completely exposed.

[0059] The first additional layer does not cover the side of the layered structure 42. In other words, there is no first additional layer adhered to the side. It can be understood that when the first additional layer material is adhered to the side, the adhered portion will increase the resistance to lateral movement between the two-dimensional structure layers of the layered material, thereby affecting the accuracy of detection. In this embodiment, there is no first additional layer on the side, thereby avoiding the above situation and ensuring the accuracy of detection.

[0060] In another embodiment of the present application, the first additional layer and the layered structure 42 have the same length in the shear direction.

[0061] Please refer to Figure 1 The first additional layer and the layered structure 42 are arranged with equal length in the shear direction to ensure that the first additional layer completely covers the upper surface of the layered structure 42 and does not exceed the first additional layer, so as to avoid the influence of the extra first additional layer adhering to the side on the detection. In conjunction with the following text, this structural feature is realized by etching the layered structure 42 after the additional member 41 is covered, and the operation method is simple, effective, and economical.

[0062] In another embodiment of the present application, the thickness of the first additional layer is 0.1-0.5 um, and the thickness of the second additional layer is 1.0-5.0 um.

[0063] The layered structure 42 to be tested is very thin, with a thickness of approximately 3-5 um. The first additional layer is a coating, and its thickness is 0.1-0.5 um, ensuring that the upper surface of the layered structure 42 is completely covered. If the thickness of the second additional layer is too thin, it will be detrimental to the resistance and pushing operation of the probe 32, while if it is too thick, it will be detrimental to processing. After many tests, the thickness of the second additional layer is 1.0-5.0 um, which can have a good processing effect and test operation effect. Those skilled in the art may specifically set the thickness of the second additional layer to 1um, 1.1um, 1.2um, 1.3um, 1.5um, 1.56um, 1.8um, 2um, 2.3um, 2.5um, 2.6um, 2.8um, 3.0um, 3.2um, 3.6um, 3.7um, 3.9um, 4.0um, 4.1um, 4.34um, 4.4um, 4.5um, 4.7um, 4.8um, 5.0um, etc., but no limitation is made here.

[0064] In another embodiment of the present application, the first additional layer and / or the second additional film is a metal film. After multiple tests, the metal film has a high bonding effect with the layered structure 42. For graphene, after tests, the titanium aluminum film and graphene have good compatibility. When the titanium aluminum film is plated on the graphene by electron beam, the bonding force between the two is much greater than the van der Waals force between the two-dimensional structure layers of the graphene. The processing and test requirements of the first additional component 41 are met.

[0065] In another embodiment of the present application, the second additional layer and the first additional layer are made of different materials, so as to ensure that the first additional layer and the second additional layer can be independently shaped by etching and have different lengths and thicknesses. Preferably, the first additional layer is a titanium aluminum film, and the second additional layer is an aluminum film.

[0066] Embodiment 2

[0067] Please refer to Figure 1 The present embodiment provides a detection device for detecting the microscopic shear force of a layered structure 42 , including a stage and a detection assembly. The detection assembly includes a probe 32 and a force sensor 31 , and the force sensor 31 can measure the force applied to the probe 32 .

[0068] The specific detection operation is as follows: the layered structure 42 covered with the additional part 41 is placed on the stage, the probe 32 is moved to contact the second additional layer of the additional part 41 and applies lateral force / shear force to the second additional layer. At this time, the force sensor 31 can read the reaction force of the probe 32 to detect the magnitude of the shear force.

[0069] It should be noted that during the test, the stage 11 can be movably arranged so as to transfer the layered structure 42 to be tested from the loading station to the testing station. At the testing station, a lateral load is generally applied to the layered structure 42 / second additional layer to be tested by lateral movement of the probe 32 (the stage 11 is stationary). In other embodiments, the probe 32 can also be arranged to be stationary while the stage 11 moves relative to the probe 32, which can also achieve the effect of applying a lateral load to the layered structure 42 / second additional layer to be tested.

[0070] The detection device provided in this embodiment can be used to detect the shear force of a small-sized layered structure 42. During operation, it is only necessary to control the probe 32 and read the shear force obtained by the force sensor 31. The measurement method is simple.

[0071] In another embodiment, the detection device further includes an imaging component for observing and analyzing the shear interface information of the layered structure 42. Figure 1 , the imaging component includes a microscope 21. Figure 3 This is a square mask sample image under a microscope 21. Through the image, the deformation of the sample can be observed and the shear interface information of the sample can be analyzed.

[0072] Embodiment 3

[0073] Please refer to Figure 1 This embodiment provides a method for detecting shear force of a layered structure, comprising the following steps:

[0074] A layered structure 42 is prepared to be inspected.

[0075] Prepare the additional component 41: Cover the layered structure 42 with the additional component 41. For the specific structure of the additional component 41, please refer to the first embodiment.

[0076] Detection: The layered structure 42 is placed on the carrier 11 , and a lateral force is applied to the second additional layer through a probe 32 with a force sensor 31 , and shear force information is obtained from the force sensor 31 .

[0077] The core of the shear force detection method provided in this embodiment is to cover the layered structure 42 with a double-layer mask / additional component 41. During detection, the probe 32 acts on the uppermost layer / second additional layer of the mask. Under this setting, the second additional layer bears the concentrated load applied by the probe 32, and then disperses the concentrated load to the layered structure 42 through the first additional layer. On the one hand, the additional component 41 improves the material out-of-plane stiffness of the layered structure 42 and enhances its deformation resistance. On the other hand, the additional component 41 converts the concentrated load into a dispersed load or even a uniformly distributed load, thereby adjusting the stress distribution, effectively avoiding cracks in the layered structure 42, and improving the accuracy of the microscopic shear force detection of the layered structure 42.

[0078] In another embodiment of the present application, please refer to Figure 8 Preparing the layered structure 42 to be detected includes: mechanically cleaving natural graphite to obtain a graphite thin layer, and the graphite thin layer is the layered structure 42 to be detected.

[0079] The solution provided in this embodiment can be applied to the detection of natural graphite. Natural graphite has a relatively thick size, and it is mechanically cleaved to tear off the thinner first layer structure / single crystal graphite layer for experiment. It can be understood that the first layer structure / single crystal graphite layer contains multiple single-layer graphite sheets / graphene.

[0080] Preferably, before preparing the additional component 41, the surface to be coated / upper surface of the layered structure 42 is roughened. This arrangement can effectively improve the bonding strength of the contact surface between the layered structure 42 and the additional component 41.

[0081] In this embodiment, the steps for preparing the additional component 41 are specifically as follows: coating, exposing, and developing the layered structure 42 / graphite thin layer to obtain an L1 layer photolithography pattern, then coating a metal film, and then stripping off the photoresist to obtain the desired first additional layer; then coating, exposing, and developing it to obtain an L2 layer photolithography pattern, then coating a metal film, and then stripping off the photoresist to obtain the desired second additional layer.

[0082] In another embodiment, there are multiple additional parts 41. After the step of preparing the additional part 41, it also includes etching: etching the part of the layered structure 42 not covered by the first additional layer to obtain multiple independent substructures; the detection step is: placing the substructure on the carrier 11, applying lateral force to the second additional layer of the substructure through the probe 32 with the force sensor 31, and obtaining shear force information from the force sensor 31.

[0083] A plurality of additional parts 41 are covered on the layered structure 42, and then the layered structure 42 is divided by etching to form a plurality of substructures with additional parts 41. It can be understood that one substructure carries one additional part 41, and the upper surface of one substructure is equal in length to the first additional layer thereon. On the one hand, this arrangement can form a plurality of substructures for detection at one time, thereby improving efficiency. On the other hand, etching is performed after the preparation of the additional part 41, which can effectively ensure that the first additional part 41 and the upper surface of the substructure are equal in length, thereby ensuring that the side of the substructure is clean and flat, and there is no adhesion of the first additional part 41 or other materials, so as to ensure the detection quality.

[0084] Combined with Figure 8 Taking natural graphite as an example, the preparation process of the additional component 41 is described in detail as follows:

[0085] 1. Mechanically cleave natural graphite to obtain a graphite thin layer / layer structure 42 with a wrinkle-free flat area of ​​several hundred micrometers to millimeters, release it onto a flat substrate such as silicon or quartz using a thermal release tape, and adhere it to the substrate through van der Waals forces.

[0086] 2. The graphite thin layer / layered structure 42 adhered to the substrate is placed in an RIE etching machine and bombarded with oxygen ion plasma for 3 minutes to roughen the graphite surface.

[0087] 3. The graphite thin layer / layered structure 42 on the substrate is coated with glue, exposed, and developed to obtain the L1 layer photolithography pattern.

[0088] 4. The metal film is plated by electron beam or magnetron, and the photoresist is stripped by lift-off process to obtain the required L1 thin metal pattern, that is, the first additional layer; the metal film is preferably a titanium aluminum film.

[0089] 5. The base layer and the L1 thin metal pattern thereon are coated with glue, exposed, and developed to obtain the L2 layer photolithography pattern.

[0090] 6. Use electron beam or magnetron plating to deposit an L2 metal film, and use the lift-off process to peel off the photoresist to obtain the required L2 thick metal pattern, i.e., the second additional layer; the L2 metal film is above 1 um; the metal film is preferably an aluminum film.

[0091] 7. Place the graphite thin layer / layered structure 42 on the substrate into a RIE etching machine, and use the metal pattern of the L1 layer / the first additional layer as a hard mask to etch the graphite thin layer / additional part 41 into a plurality of substructures.

[0092] The above description is only a preferred embodiment of the present application and is not intended to limit the present application. Any modifications, equivalent substitutions or improvements made within the spirit and principles of the present application should be included in the protection scope of the present application.

Claims

1. A detection accessory for assisting the microscopic shear force detection of a layered structure, characterized in that: It comprises a first additional layer covering the layered structure, and a second additional layer covering the first additional layer on a side away from the layered structure, wherein the length of the second additional layer along the shear direction of the layered structure is shorter than that of the first additional layer.

2. The detection attachment according to claim 1, characterized in that: The first additional layer completely covers the upper surface of the layered structure; the first additional layer and the layered structure have the same length in the shear direction.

3. The detection attachment according to claim 1, characterized in that: The thickness of the second additional layer is 1.0-5.0 um.

4. The detection attachment according to any one of claims 1 to 3, characterized in that: The second additional layer and the first additional layer are made of different materials.

5. The detection attachment according to claim 4, characterized in that: The first additional layer is a titanium aluminum film; the second additional layer is an aluminum film.

6. A detection device, characterized in that: include: A stage, on which the layered structure is placed, and the layered structure is covered with the detection attachment according to any one of claims 1 to 5; The detection component includes a probe and a force sensor, wherein the probe is used to apply a shear force to the second additional layer, and the force sensor is used to detect the shear force.

7. A method for detecting shear force of a layered structure, characterized in that: include: preparing a layered structure to be tested; Prepare the additional part: cover the layered structure with the additional part, wherein the additional part is the detection additional part according to any one of claims 1 to 5; Detection: placing the layered structure on a carrier, applying lateral force to the second additional layer through a probe with a force sensor, and obtaining shear force information from the force sensor.

8. The method for detecting shear force of a layered structure according to claim 7, characterized in that: There are a plurality of additional parts, and after the step of preparing the additional parts, etching is further included: etching the part of the layered structure not covered by the first additional layer to obtain a plurality of independent substructures; The detection step is: placing the substructure on a carrier, applying lateral force to the second additional layer of the substructure through a probe with a force sensor, and obtaining shear force information from the force sensor.

9. The method for detecting shear force of a layered structure according to claim 7, characterized in that: The preparation of the layered structure to be detected includes: mechanically cleaving natural graphite to obtain a graphite thin layer, and the graphite thin layer is the layered structure to be detected.

10. The method for detecting shear force of a layered structure according to claim 9, characterized in that: The step of preparing the layered structure to be inspected further comprises: roughening the surface of the layered structure to be coated; and the step of preparing the additional layer comprises: covering the surface of the layered structure to be coated with the additional component.

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