Gas-liquid mixing device and wafer cutting equipment

Abstract

The invention discloses a gas-liquid mixing device and wafer cutting equipment, the gas-liquid mixing device comprises a mixing box, a gas inlet pipeline, a first liquid inlet pipeline, a liquid outlet pipeline, a circulating pipeline and a circulating pump, the gas inlet pipeline is used for introducing gas into the mixing box, the gas comprises carbon dioxide, the first liquid inlet pipeline is used for injecting first liquid into the mixing box, the first liquid comprises high-purity water, and the circulating pump is used for injecting second liquid into the mixing box; the liquid outlet pipeline is used for discharging liquid in the mixing box, the circulating pipeline is used for enabling the liquid flowing out of the liquid outlet to flow back into the mixing box from the second liquid inlet so as to circularly stir the liquid in the mixing box, and the circulating pump is used for pumping out the liquid in the mixing box from the liquid outlet and enabling the liquid to flow to the second liquid inlet; therefore, the carbon dioxide gas and the high-purity water can be fully mixed in the mixing box and then supplied to the cut wafer, the resistivity of the high-purity water can be accurately controlled within the range of 0.1 Momega.CM to 1.0 Momega.CM, and damage of static electricity to a chip in the wafer can be reduced to the maximum extent.

Description

Technical Field

[0001] The invention relates to the technical field of semiconductor manufacturing, and in particular to a gas-liquid mixing device and wafer cutting equipment. Background Art

[0002] During the wafer cutting process, high-purity water is needed to rinse the wafer to prevent the chips in the wafer from being contaminated. However, because the resistivity of high-purity water can reach 18MΩ.CM, static electricity will be generated due to friction during the high-speed rotation and cutting of the wafer. In order to reduce the damage of static electricity to the chip, a certain proportion of carbon dioxide gas is usually added to the high-purity water to dissolve the carbon dioxide gas in the high-purity water, so as to reduce the resistivity of the high-purity water to the range of 0.1MΩ.CM-1MΩ.CM.

[0003] Current wafer cutting equipment all passes carbon dioxide gas into a pipe that provides high-purity water to dissolve the carbon dioxide gas in the high-purity water. However, due to the large amount of high-purity water used and the fast flow rate, it is difficult to ensure that the carbon dioxide gas is fully dissolved in the high-purity water, resulting in the resistivity of the high-purity water being difficult to accurately control within the range of 0.1MΩ.CM-1.0MΩ.CM. Summary of the invention

[0004] The invention discloses a gas-liquid mixing device and a wafer cutting device, which can accurately control the resistivity of high-purity water by fully dissolving carbon dioxide gas in the high-purity water.

[0005] In the first aspect, the present invention discloses a gas-liquid mixing device, comprising: a mixing box, the mixing box having an air inlet, a first liquid inlet, a second liquid inlet and a liquid outlet; an air inlet pipeline and a first switch arranged on the air inlet pipeline; the air inlet pipeline is connected to the air inlet and extends to the interior of the mixing box; the air inlet pipeline is used to introduce gas into the mixing box, the gas including carbon dioxide gas; the first switch is used to control the conduction or shutoff of the air inlet pipeline to control whether the air inlet pipeline introduces gas into the mixing box; a first liquid inlet pipeline and a second switch arranged on the first liquid inlet pipeline; the first liquid inlet pipeline is connected to the first liquid inlet; the first liquid inlet pipeline is used to inject a first liquid into the mixing box, the first liquid including high-purity water; the second switch is used to control the conduction or shutoff of the first liquid inlet pipeline , to control whether the first liquid inlet pipeline injects the first liquid into the mixing box; a liquid outlet pipeline and a third switch arranged on the liquid outlet pipeline; the liquid outlet pipeline is connected to the liquid outlet, and the liquid outlet pipeline is used to discharge the liquid in the mixing box; the third switch is used to control the conduction or shutdown of the liquid outlet pipeline to control whether the liquid outlet pipeline discharges the liquid in the mixing box; a circulation pipeline and a circulation pump arranged on the circulation pipeline; one end of the circulation pipeline is connected to the liquid outlet, and the other end of the circulation pipeline is connected to the second liquid inlet; the circulation pipeline is used to make the liquid flowing out of the liquid outlet flow back from the second liquid inlet into the mixing box to circulate and stir the liquid in the mixing box; the circulation pump is used to extract the liquid in the mixing box from the liquid outlet and make the liquid flow to the second liquid inlet.

[0006] In some embodiments of the present invention, the gas-liquid mixing device also includes a second liquid inlet pipeline and a fourth switch, the second liquid inlet pipeline is connected to the first liquid inlet, the second liquid inlet pipeline is used to inject a second liquid into the mixing box, and the second liquid includes a cleaning agent; the fourth switch is used to control the conduction or shutdown of the second liquid inlet pipeline to control whether the second liquid inlet pipeline injects the second liquid into the mixing box.

[0007] In some embodiments of the present invention, the gas-liquid mixing device also includes a first liquid level controller and a second liquid level controller arranged inside the mixing box; the first liquid level controller is arranged at the bottom of the mixing box; the first liquid level controller is used to detect whether the liquid level of the liquid in the mixing box is lower than a preset minimum liquid level, and when the liquid level of the liquid is lower than the preset minimum liquid level, the third switch is controlled to be closed; the second liquid level controller is arranged at the top of the mixing box; the second liquid level controller is used to detect whether the liquid level of the liquid in the mixing box is higher than a preset maximum liquid level, and when the liquid level of the liquid is higher than the preset maximum liquid level, the second switch is controlled to be closed.

[0008] In some embodiments of the present invention, the gas-liquid mixing device also includes a first resistivity detection component and / or a flow meter; the first resistivity detection component is arranged on the circulation pipeline, and the first resistivity detection component is used to detect the resistivity of the liquid in the circulation pipeline; the flow meter is arranged on the intake pipeline, and the flow meter is used to control the gas flow in the intake pipeline.

[0009] In some embodiments of the present invention, the gas-liquid mixing device also includes a first controller; the first controller is used to control the opening or closing of the first switch according to a preset time, or to control the opening or closing of the first switch according to the resistivity of the liquid detected by the first resistivity detection component and a preset resistivity range, so as to control the conduction or disconnection of the first liquid inlet pipeline.

[0010] In some embodiments of the present invention, the gas-liquid mixing device also includes a first pressure controller, an exhaust pipeline and a fifth switch; the exhaust pipeline is connected to the first liquid inlet; the exhaust pipeline is used to exhaust the gas in the mixing box; the fifth switch is arranged on the exhaust pipeline, and the fifth switch is used to control the conduction or shutdown of the exhaust pipeline to control whether the exhaust pipeline exhausts the gas in the mixing box; the first pressure controller is used to detect the air pressure in the mixing box, and when the air pressure in the mixing box is greater than the first preset air pressure, the fifth switch is controlled to open, and when the air pressure in the mixing box is less than the first preset air pressure, the fifth switch is controlled to close.

[0011] In some embodiments of the present invention, the gas-liquid mixing device also includes a second pressure controller, an air supply pipeline and a sixth switch; the mixing box also includes an air supply port; the air supply pipeline is connected to the air supply port; the air supply pipeline is used to supply air to the mixing box; the sixth switch is arranged on the air supply pipeline, and the sixth switch is used to control the conduction or shutdown of the air supply pipeline to control whether the air supply pipeline supplies air to the mixing box; the second pressure controller is used to detect the air pressure in the mixing box, and when the air pressure in the mixing box is less than the second preset air pressure, the sixth switch is controlled to open, and when the air pressure in the mixing box is greater than the second preset air pressure, the sixth switch is controlled to close.

[0012] In some embodiments of the present invention, the gas-liquid mixing device also includes a second resistivity detection component and a second controller; the second resistivity detection component is arranged on the liquid outlet pipeline, and the second resistivity detection component is used to detect the resistivity of the liquid in the liquid outlet pipeline; the second controller is used to control the opening or closing of the third switch according to the resistivity of the liquid detected by the second resistivity detection component and the preset resistivity, so as to control the conduction or disconnection of the liquid outlet pipeline.

[0013] In some embodiments of the present invention, the gas-liquid mixing device also includes an air disk and / or a spray head arranged inside the mixing box; the air disk is arranged at the bottom of the mixing box, and the air disk is connected to the air inlet pipeline, the air disk has a plurality of air outlet holes, and the air disk is used to evenly discharge the gas in the air inlet pipeline into the mixing box through the plurality of air outlet holes; the spray head is arranged at the top of the mixing box, and the spray head is connected to the circulation pipeline, the spray head has a plurality of liquid outlet holes, and the spray head is used to evenly discharge the liquid in the circulation pipeline into the mixing box through the plurality of liquid outlet holes.

[0014] In a second aspect, the present invention discloses a wafer cutting device, comprising a gas-liquid mixing device as described in any one of the above items.

[0015] The gas-liquid mixing device and wafer cutting equipment disclosed in the present invention include a mixing box, an air inlet pipeline and a first switch arranged on the air inlet pipeline, a first liquid inlet pipeline and a second switch arranged on the first liquid inlet pipeline, a liquid outlet pipeline and a third switch arranged on the liquid outlet pipeline, a circulation pipeline and a circulation pump arranged on the circulation pipeline, the air inlet pipeline is used to pass gas into the mixing box, the gas includes carbon dioxide gas, the first switch is used to control the conduction or shutoff of the air inlet pipeline to control whether the air inlet pipeline passes gas into the mixing box, the first liquid inlet pipeline is used to inject a first liquid into the mixing box, the first liquid includes high-purity water, the second switch is used to control the conduction or shutoff of the first liquid inlet pipeline to control whether the first liquid inlet pipeline is passed into the mixing box The first liquid is injected, and the liquid outlet pipeline is used to discharge the liquid in the mixing box. The third switch is used to control the conduction or shutdown of the liquid outlet pipeline to control whether the liquid outlet pipeline discharges the liquid in the mixing box. The circulation pipeline is used to make the liquid flowing out of the liquid outlet flow back into the mixing box from the second liquid inlet to circulate and stir the liquid in the mixing box. The circulation pump is used to extract the liquid in the mixing box from the liquid outlet and make the liquid flow to the second liquid inlet, so that the carbon dioxide gas and high-purity water can be fully mixed in the mixing box before being provided to the wafer being cut, thereby ensuring that the resistivity of the high-purity water can be accurately controlled within the range of 0.1MΩ.CM-1.0MΩ.CM, thereby minimizing the damage of static electricity to the chips in the wafer. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the background technology, the drawings required for use in the embodiments of the present invention or the background technology will be described below.

[0017] Figure 1 It is a schematic structural diagram of a gas-liquid mixing device disclosed in an embodiment of the present invention.

[0018] Figure 2This is a schematic structural diagram of another gas-liquid mixing device disclosed in an embodiment of the present invention.

[0019] Figure 3 This is a schematic structural diagram of another gas-liquid mixing device disclosed in an embodiment of the present invention.

[0020] Figure 4 This is a schematic structural diagram of another gas-liquid mixing device disclosed in an embodiment of the present invention.

[0021] Figure 5 This is a schematic structural diagram of another gas-liquid mixing device disclosed in an embodiment of the present invention.

[0022] Figure 6 This is a schematic structural diagram of another gas-liquid mixing device disclosed in an embodiment of the present invention.

[0023] Figure 7 This is a schematic structural diagram of another gas-liquid mixing device disclosed in an embodiment of the present invention.

[0024] Figure 8 This is a schematic structural diagram of another gas-liquid mixing device disclosed in an embodiment of the present invention. DETAILED DESCRIPTION

[0025] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0026] As described in the background technology, current wafer cutting equipment all passes carbon dioxide gas into a pipe that provides high-purity water to dissolve the carbon dioxide gas in the high-purity water. However, due to the large amount of high-purity water used and the fast flow rate, it is difficult to ensure that the carbon dioxide gas can be fully dissolved in the high-purity water, resulting in the resistivity of the high-purity water being difficult to accurately control within the range of 0.1MΩ.CM-1.0MΩ.CM.

[0027] Based on this, the present invention discloses a gas-liquid mixing device, which injects carbon dioxide gas and high-purity water into a container of fixed volume and circulates and stirs the liquid in the container to make the carbon dioxide gas fully dissolved in the high-purity water, thereby ensuring that the resistivity of the high-purity water is accurately controlled within the range of 0.1MΩ.CM-1.0MΩ.CM.

[0028] As an optional implementation of the content disclosed in the present invention, the embodiment of the present invention discloses a gas-liquid mixing device, such as Figure 1As shown, the gas-liquid mixing device includes a mixing box 10, an air intake pipeline 20 and a first switch 21 arranged on the air intake pipeline 20, a first liquid inlet pipeline 30 and a second switch 31 arranged on the first liquid inlet pipeline 30, a liquid outlet pipeline 40 and a third switch 41 arranged on the liquid outlet pipeline 40, and a circulation pipeline 50 and a circulation pump 51 arranged on the circulation pipeline 50.

[0029] The mixing box 10 is a container of fixed volume and has an air inlet 100 , a first liquid inlet 101 , a second liquid inlet 102 and a liquid outlet 103 .

[0030] The air intake pipeline 20 is connected to the air intake port 100 and extends to the inside of the mixing box 10. For example, the air intake pipeline 20 extends to the bottom of the mixing box 10. The air intake pipeline 20 is used to pass gas into the mixing box 10, and the gas includes carbon dioxide gas. The first switch 21 is used to control the conduction or shutoff of the air intake pipeline 20 to control whether the air intake pipeline 20 passes gas into the mixing box 10. For example, when the first switch 21 is turned on, the air intake pipeline 20 is turned on, and the air intake pipeline 20 passes gas into the mixing box 10; when the first switch 21 is turned off, the air intake pipeline 20 is shut off, and the air intake pipeline 20 no longer passes gas into the mixing box 10.

[0031] The first liquid inlet pipeline 30 is connected to the first liquid inlet port 101. The first liquid inlet pipeline 30 is used to inject a first liquid into the mixing box 10, and the first liquid includes high-purity water. The second switch 31 is used to control the conduction or shutoff of the first liquid inlet pipeline 30 to control whether the first liquid inlet pipeline 30 injects the first liquid into the mixing box 10. For example, when the second switch 31 is turned on, the first liquid inlet pipeline 30 is turned on, and the first liquid inlet pipeline 30 injects the first liquid into the mixing box 10; when the second switch 31 is turned off, the first liquid inlet pipeline 30 is shut off, and the first liquid inlet pipeline 30 no longer injects the first liquid into the mixing box 10.

[0032] The liquid outlet pipeline 40 is connected to the liquid outlet port 103. The liquid outlet pipeline 40 is used to discharge the liquid in the mixing box 10. For example, the liquid outlet pipeline 40 is used to provide the liquid in the mixing box 10 to the wafer cutting equipment, and the liquid is high-purity water with a resistivity in the range of 0.1MΩ.CM-1.0MΩ.CM. The third switch 41 is used to control the conduction or shutoff of the liquid outlet pipeline 40 to control whether the liquid outlet pipeline 40 discharges the liquid in the mixing box 10. For example, when the third switch 41 is turned on, the liquid outlet pipeline 40 is turned on, and the liquid outlet pipeline 40 discharges the liquid in the mixing box 10; when the third switch 41 is turned off, the liquid outlet pipeline 40 is shut off, and the liquid outlet pipeline 40 no longer discharges the liquid in the mixing box 10.

[0033] One end of the circulation pipeline 50 is in communication with the liquid outlet 103, and the other end of the circulation pipeline 50 is in communication with the second liquid inlet 102. The circulation pipeline 50 is used to make the liquid flowing out of the liquid outlet 103 flow back into the mixing box 10 from the second liquid inlet 102. The circulation pump 51 is used to extract the liquid in the mixing box 10 from the liquid outlet 103 and make the liquid flow to the second liquid inlet 102. It can be understood that because the second liquid inlet 102 is higher than the liquid outlet 103, the circulation pump 51 needs to provide power to make the liquid in the mixing box 10 flow from the liquid outlet 103 to the second liquid inlet 102.

[0034] In the embodiment of the present invention, carbon dioxide gas and high-purity water are injected into a container of fixed volume, namely a mixing box 10, and the liquid in the mixing box 10 is circulated and stirred so that the carbon dioxide gas can be fully dissolved in the high-purity water. This can not only ensure the uniformity of the carbon dioxide gas in the high-purity water, but also ensure that the resistivity of the high-purity water can be accurately controlled within the range of 0.1MΩ.CM-1.0MΩ.CM, thereby minimizing the damage of static electricity to the chips in the wafer.

[0035] In some embodiments of the present invention, Figure 2 As shown, the gas-liquid mixing device also includes a second liquid inlet pipeline 60 and a fourth switch 61. The second liquid inlet pipeline 60 is connected to the first liquid inlet 101. For example, the second liquid inlet pipeline 60 can be connected to the first liquid inlet 101 by being connected to the first liquid inlet pipeline 30. The second liquid inlet pipeline 60 is used to inject a second liquid into the mixing box 10, and the second liquid includes a cleaning agent, which includes a cleaning agent for cleaning wafers, generally a surfactant. The fourth switch 61 is used to control the conduction or shutoff of the second liquid inlet pipeline 60 to control whether the second liquid inlet pipeline 60 injects the second liquid into the mixing box 10. For example, when the fourth switch 61 is turned on, the second liquid inlet pipeline 60 is turned on, and the second liquid inlet pipeline 60 injects the second liquid into the mixing box 10; when the fourth switch 61 is turned off, the second liquid inlet pipeline 60 is shut off, and the second liquid inlet pipeline 60 no longer injects the second liquid into the mixing box 10.

[0036] It should be noted that a large amount of powder will be generated in the process of cutting wafers. These powders have strong adhesion. In order to completely remove the powder generated in the cutting process, a certain proportion of cleaning agent needs to be added to high-purity water to use the cleaning agent to clean the powder. At present, two devices are used to add carbon dioxide gas and cleaning agent to high-purity water respectively, resulting in high cost and large volume of wafer cutting equipment. Therefore, in some embodiments of the present invention, carbon dioxide gas and cleaning agent are added to high-purity water at the same time through the first liquid inlet pipeline 30 and the second liquid inlet pipeline 60 to reduce the cost and volume of the wafer cutting equipment.

[0037] It should also be noted that when the second liquid needs to be injected into the mixing box 10, the second liquid inlet pipeline 60 is used to inject the second liquid into the mixing box 10; when the second liquid does not need to be introduced into the mixing box 10, the second liquid inlet pipeline 60 is used to discharge the gas in the mixing box 10.

[0038] In some embodiments of the present invention, a preset dose of the second liquid is added at the entrance of the second liquid inlet pipeline 60, and then the second switch 31 and the fourth switch 61 are turned on to add the first liquid such as high-purity water and the second liquid such as a cleaning agent into the mixing box 10. When the first liquid and the second liquid are added, the second switch 31 and the fourth switch 61 are turned off. Of course, the present invention is not limited to this. In other embodiments, the first liquid and the second liquid may also be added to the mixing box 10 separately, which will not be described in detail here.

[0039] On this basis, in some embodiments of the present invention, Figure 3 As shown, the gas-liquid mixing device also includes a first liquid level controller 32 and a second liquid level controller 33 arranged inside the mixing box 10. The first liquid level controller 32 is arranged at the bottom of the mixing box 10, and the first liquid level controller 32 is used to detect whether the liquid level of the liquid in the mixing box 10 is lower than the preset minimum liquid level, and when the liquid level is lower than the preset minimum liquid level, the third switch 41 is controlled to be closed. The second liquid level controller 33 is arranged at the top of the mixing box 10, and the second liquid level controller 33 is used to detect whether the liquid level of the liquid in the mixing box 10 is higher than the preset maximum liquid level, and when the liquid level is higher than the preset maximum liquid level, the second switch 31 is controlled to be closed. Of course, the present invention is not limited to this, and in other embodiments, the opening and closing of the second switch 31 and the third switch 41 can also be controlled manually. In other embodiments, the first liquid level controller 32 is also used to control the second switch 31 and the fourth switch 61 to be opened after the third switch 41 is controlled to be closed, and the second liquid level controller 33 is also used to control the third switch 41 to be opened and the fourth switch 61 to be closed after the second switch 31 is controlled to be closed.

[0040] After the first liquid, such as high-purity water, is added, carbon dioxide gas may be introduced into the mixing box 10. In some embodiments of the present invention, Figure 4 As shown, the gas-liquid mixing device further includes a first resistivity detection component 22 and / or a flow meter 23. The first resistivity detection component 22 is disposed on the circulation pipeline 50, and the first resistivity detection component 22 is used to detect the resistivity of the liquid in the circulation pipeline 50. The flow meter 23 is disposed on the intake pipeline 20, and the flow meter 23 is used to control the gas flow in the intake pipeline 20.

[0041] On this basis, in some embodiments of the present invention, Figure 5As shown, the gas-liquid mixing device further includes a first controller 24. The first controller 24 is used to control the opening or closing of the first switch 21 according to a preset time, or to control the opening or closing of the first switch 21 according to the resistivity of the liquid detected by the first resistivity detection component 22 and a preset resistivity range, so as to control the conduction or disconnection of the first liquid inlet pipeline 30.

[0042] That is, in some embodiments of the present invention, the first controller 24 can control the preset opening time of the first switch 21 to control the first liquid inlet pipeline 30 to be turned on for a preset time to pass a preset amount of carbon dioxide gas into the mixing box 10, wherein the preset time can be determined according to the gas flow rate and the preset gas volume. In other embodiments, the first controller 24 can control the first switch 21 to be turned on when the resistivity of the liquid detected by the first resistivity detection component 22 is not within the preset resistivity range, and control the first switch 21 to be turned off when the resistivity of the liquid detected by the first resistivity detection component 22 is within the preset resistivity range. The preset resistivity range can be 0.1MΩ.CM-1.0MΩ.CM.

[0043] In some embodiments of the present invention, Figure 6 As shown, the gas-liquid mixing device also includes a first pressure controller 70, an exhaust pipeline 71 and a fifth switch 72. The exhaust pipeline 71 is connected to the first liquid inlet 101. The exhaust pipeline 71 can also be connected to other ports of the mixing box 10 to exhaust the mixing box 10, which will not be repeated here. The exhaust pipeline 71 is used to exhaust the gas in the mixing box 10. The fifth switch 72 is arranged on the exhaust pipeline 71, and the fifth switch 72 is used to control the conduction or shutoff of the exhaust pipeline 71 to control whether the exhaust pipeline 71 discharges the gas in the mixing box 10. The first pressure controller 70 is used to detect the air pressure in the mixing box 10, and when the air pressure in the mixing box 10 is greater than the first preset air pressure, the fifth switch 72 is controlled to be turned on to control the conduction of the exhaust pipeline 71 to control the exhaust pipeline 71 to discharge the gas in the mixing box 10; when the air pressure in the mixing box 10 is less than the first preset air pressure, the fifth switch 72 is controlled to be closed to control the exhaust pipeline 71 to be shut off to control the exhaust pipeline 71 to no longer discharge the gas in the mixing box 10.

[0044] In some embodiments of the present invention, Figure 6As shown, the gas-liquid mixing device further includes a second pressure controller 80, an air supply pipeline 81 and a sixth switch 82. The mixing box 10 further includes an air supply port 104. The air supply pipeline 81 is connected to the air supply port 104, and the air supply pipeline 81 is used to supply air to the mixing box 10. The sixth switch 82 is arranged on the air supply pipeline 81, and the sixth switch 82 is used to control the conduction or shutoff of the air supply pipeline 81 to control whether the air supply pipeline 81 supplies air to the mixing box 10. The second pressure controller 80 is used to detect the air pressure in the mixing box 10, and when the air pressure in the mixing box 10 is less than the second preset air pressure, the sixth switch 82 is controlled to be turned on to control the conduction of the air supply pipeline 81 to control the air supply pipeline 81 to supply air to the mixing box 10; when the air pressure in the mixing box 10 is greater than the second preset air pressure, the sixth switch 82 is controlled to be closed to control the air supply pipeline 81 to be shut off to control the air supply pipeline 81 to stop supplying air to the mixing box 10.

[0045] It should be noted that after the gas-liquid mixing device starts to provide high-purity water to the wafer cutting machine, the pressure in the mixing box 10 will decrease. When the pressure in the mixing box 10 is lower than the second preset air pressure, the sixth switch 82 of the second pressure controller 80 is turned on to control the air supply pipeline 81 to be turned on, and the air supply pipeline 81 is controlled to replenish air into the mixing box 10 to prevent negative pressure from being generated inside the mixing box 10.

[0046] In some embodiments of the present invention, Figure 7 As shown, the gas-liquid mixing device further includes a second resistivity detection component 42 and a second controller 43. The second resistivity detection component 42 is disposed on the liquid outlet pipeline 40, and the second resistivity detection component 42 is used to detect the resistivity of the liquid in the liquid outlet pipeline 40. The second controller 43 is used to control the opening or closing of the third switch 41 according to the resistivity of the liquid detected by the second resistivity detection component 42 and a preset resistivity range, so as to control the conduction or disconnection of the liquid outlet pipeline 40.

[0047] That is, when the resistivity of the liquid detected by the second resistivity detection component 42 is within the preset resistivity range, the second controller 43 controls the third switch 41 to be turned on, controls the liquid outlet pipeline 40 to be turned on, and controls the liquid outlet pipeline 40 to provide water for wafer cutting. When the resistivity of the liquid detected by the second resistivity detection component 42 is not within the preset resistivity range, the second controller 43 controls the third switch 41 to be turned off, controls the liquid outlet pipeline 40 to be turned off, and controls the liquid outlet pipeline 40 to no longer provide water for wafer cutting, so as to ensure that the water provided for wafer cutting is high-purity water that meets the process specifications.

[0048] In some embodiments of the present invention, Figure 8As shown, the gas-liquid mixing device also includes a gas disc 25 and / or a spray head 52 arranged inside the mixing box. The gas disc 25 is arranged at the bottom of the mixing box 10, and the gas disc 25 is connected to the air inlet pipeline 20. The gas disc 25 has a plurality of air outlet holes, and the gas disc 25 is used to uniformly discharge the gas in the air inlet pipeline 20 into the mixing box 10 through the plurality of air outlet holes. The spray head 52 is arranged at the top of the mixing box 10, and the spray head 52 is connected to the circulation pipeline 50. The spray head 52 has a plurality of liquid outlet holes, and the spray head 52 is used to uniformly discharge the liquid in the circulation pipeline 50 into the mixing box 10 through the plurality of liquid outlet holes.

[0049] It should be noted that the first switch 21, the second switch 31, the third switch 41, the fifth switch 72 and the sixth switch 82 in the present invention can all be solenoid valves, etc., and the first resistivity detection component 22 and the second resistivity detection component 42 can both be resistivity meters, etc.

[0050] As an optional implementation of the contents disclosed in the present invention, an embodiment of the present invention discloses a wafer cutting device, including a gas-liquid mixing device disclosed in any of the above embodiments.

[0051] The technical features of the above embodiments may be combined arbitrarily. To make the description concise, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0052] The above embodiments only express several implementation methods of this specification, and the descriptions are relatively specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be pointed out that for ordinary technicians in this field, several modifications and improvements can be made without departing from the concept of this specification, which all belong to the protection scope of this specification. Therefore, the protection scope of the patent of this specification shall be based on the attached claims.

Claims

1. A gas-liquid mixing device, characterized in that: include: A mixing box, the mixing box having an air inlet, a first liquid inlet, a second liquid inlet and a liquid outlet; An air intake pipeline and a first switch disposed on the air intake pipeline; the air intake pipeline is communicated with the air inlet and extends to the interior of the mixing box; the air intake pipeline is used to introduce gas into the mixing box, the gas including carbon dioxide gas; the first switch is used to control the on or off of the air intake pipeline, so as to control whether the air intake pipeline introduces gas into the mixing box; A first liquid inlet pipeline and a second switch disposed on the first liquid inlet pipeline; the first liquid inlet pipeline is connected to the first liquid inlet port; The first liquid inlet pipeline is used to inject a first liquid into the mixing box, and the first liquid includes high-purity water; the second switch is used to control the conduction or shutoff of the first liquid inlet pipeline to control whether the first liquid inlet pipeline injects the first liquid into the mixing box; A liquid outlet pipeline and a third switch arranged on the liquid outlet pipeline; The liquid outlet pipeline is in communication with the liquid outlet, and the liquid outlet pipeline is used to discharge the liquid in the mixing box; The third switch is used to control the on or off of the liquid outlet pipeline to control whether the liquid outlet pipeline discharges the liquid in the mixing box; A circulation pipeline and a circulation pump arranged on the circulation pipeline; one end of the circulation pipeline is connected to the liquid outlet, and the other end of the circulation pipeline is connected to the second liquid inlet; the circulation pipeline is used to make the liquid flowing out of the liquid outlet flow back into the mixing box from the second liquid inlet to circulate and stir the liquid in the mixing box; the circulation pump is used to extract the liquid in the mixing box from the liquid outlet and make the liquid flow to the second liquid inlet.

2. The gas-liquid mixing device according to claim 1, characterized in that: The gas-liquid mixing device also includes a second liquid inlet pipeline and a fourth switch. The second liquid inlet pipeline is connected to the first liquid inlet, and the second liquid inlet pipeline is used to inject a second liquid into the mixing box. The second liquid includes a cleaning agent. The fourth switch is used to control the conduction or disconnection of the second liquid inlet pipeline to control whether the second liquid inlet pipeline injects the second liquid into the mixing box.

3. The gas-liquid mixing device according to claim 2, characterized in that: The gas-liquid mixing device further comprises a first liquid level controller and a second liquid level controller disposed inside the mixing box; The first liquid level controller is arranged at the bottom of the mixing box; the first liquid level controller is used to detect whether the liquid level in the mixing box is lower than a preset minimum liquid level, and when the liquid level is lower than the preset minimum liquid level, control the third switch to be closed; The second liquid level controller is arranged on the top of the mixing box; the second liquid level controller is used to detect whether the liquid level in the mixing box is higher than the preset maximum liquid level, and control the second switch to close when the liquid level is higher than the preset maximum liquid level.

4. The gas-liquid mixing device according to claim 1, characterized in that: The gas-liquid mixing device further comprises a first resistivity detection component and / or a flow meter; The first resistivity detection component is disposed on the circulation pipeline, and the first resistivity detection component is used to detect the resistivity of the liquid in the circulation pipeline; The flow meter is arranged on the air intake pipeline, and the flow meter is used to control the gas flow in the air intake pipeline.

5. The gas-liquid mixing device according to claim 4, characterized in that: The gas-liquid mixing device also includes a first controller; The first controller is used to control the opening or closing of the first switch according to a preset time, or to control the opening or closing of the first switch according to the resistivity of the liquid detected by the first resistivity detection component and a preset resistivity range, so as to control the conduction or disconnection of the first liquid inlet pipeline.

6. The gas-liquid mixing device according to claim 1, characterized in that: The gas-liquid mixing device also includes a first pressure controller, an exhaust pipeline and a fifth switch; The exhaust pipeline is connected to the first liquid inlet; the exhaust pipeline is used to exhaust the gas in the mixing box; the fifth switch is arranged on the exhaust pipeline, and the fifth switch is used to control the conduction or shutdown of the exhaust pipeline to control whether the exhaust pipeline exhausts the gas in the mixing box; the first pressure controller is used to detect the air pressure in the mixing box, and when the air pressure in the mixing box is greater than the first preset air pressure, the fifth switch is controlled to be opened, and when the air pressure in the mixing box is less than the first preset air pressure, the fifth switch is controlled to be closed.

7. The gas-liquid mixing device according to claim 1, characterized in that: The gas-liquid mixing device further comprises a second pressure controller, an air supply pipeline and a sixth switch; the mixing box further comprises an air supply port; The air supply pipeline is connected to the air supply port; the air supply pipeline is used to supply air to the mixing box; the sixth switch is arranged on the air supply pipeline, and the sixth switch is used to control the conduction or shutoff of the air supply pipeline to control whether the air supply pipeline supplies air to the mixing box; the second pressure controller is used to detect the air pressure in the mixing box, and when the air pressure in the mixing box is less than the second preset air pressure, control the sixth switch to open, and when the air pressure in the mixing box is greater than the second preset air pressure, control the sixth switch to close.

8. The gas-liquid mixing device according to claim 1, characterized in that: The gas-liquid mixing device also includes a second resistivity detection component and a second controller; The second resistivity detection component is disposed on the liquid outlet pipeline, and the second resistivity detection component is used to detect the resistivity of the liquid in the liquid outlet pipeline; The second controller is used to control the opening or closing of the third switch according to the resistivity of the liquid detected by the second resistivity detection component and a preset resistivity, so as to control the conduction or disconnection of the liquid outlet pipeline.

9. The gas-liquid mixing device according to claim 1, characterized in that: The gas-liquid mixing device further comprises a gas disk and / or a spray head arranged inside the mixing box; The gas disc is arranged at the bottom of the mixing box, and the gas disc is communicated with the air inlet pipeline, and the gas disc has a plurality of air outlet holes, and the gas disc is used to evenly discharge the gas in the air inlet pipeline into the mixing box through the plurality of air outlet holes; The spray head is arranged on the top of the mixing box and is connected to the circulation pipeline. The spray head has a plurality of liquid outlet holes, and the spray head is used to evenly discharge the liquid in the circulation pipeline into the mixing box through the plurality of liquid outlet holes.

10. A wafer cutting device, characterized in that: It comprises the gas-liquid mixing device as described in any one of claims 1 to 9.

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