Flexible glass cover plate and preparation method thereof, flexible screen assembly and electronic equipment

Abstract

The invention relates to the technical field of electronic equipment, in particular to a flexible glass cover plate and a preparation method thereof, a flexible screen assembly and electronic equipment. The flexible glass cover plate comprises a first main body part, a bending part and a second main body part, and the first main body part and the second main body part are connected through the bending part; the bending part comprises a first transition part, a concave platform part and a second transition part, one side of the first transition part is connected with the first main body part, the other side of the first transition part is connected with the concave platform part, one side of the second transition part is connected with the concave platform part, and the other side of the second transition part is connected with the second main body part; the thickness of the first transition part is larger and larger or gradually increased along with approaching the first main body part, and the thickness of the second transition part is larger and larger or gradually increased along with approaching the second main body part. The problem that the appearance of a product has obvious sharp edges can be avoided.

Description

Technical Field

[0001] The present application relates to the technical field of electronic equipment, and in particular to a flexible glass cover plate and a preparation method thereof, a flexible screen assembly and an electronic device. Background Art

[0002] With the development of display technology, the requirements for various performance of the screen are gradually increasing. Flexible screen components have the characteristics of being bendable and foldable, which brings convenience to people's carrying and use. Flexible glass cover is an important part of flexible screen components, so higher requirements are put forward for the bendability of flexible glass cover.

[0003] The flexible glass cover plate can be provided with a bending portion to meet the bending requirements, but some obvious edges are easily observed on the surface of the finished product of the flexible glass cover plate provided with a bending portion. In actual production, the observed edges are defined as an appearance defect - a sharp edge. The presence of obvious sharp edges is a factor that affects the exquisite appearance of the product. Summary of the invention

[0004] Based on this, the present application provides a flexible glass cover plate and a preparation method thereof, a flexible screen assembly and an electronic device to solve the problem of obvious sharp edges of the flexible glass cover plate and avoid affecting the appearance of the product.

[0005] In a first aspect, the present application provides a flexible glass cover, and its technical solution is as follows:

[0006] A flexible glass cover plate comprises: a first main body portion, a bending portion and a second main body portion, wherein the first main body portion and the second main body portion are connected via the bending portion;

[0007] The bending portion includes a first transition portion, a concave platform portion, and a second transition portion, wherein one side of the first transition portion is connected to the first main body portion, and the other side is connected to the concave platform portion, and one side of the second transition portion is connected to the concave platform portion, and the other side is connected to the second main body portion;

[0008] The thickness of the first transition portion increases or increases gradually as it approaches the first main body portion, and the thickness of the second transition portion increases or increases gradually as it approaches the second main body portion.

[0009] The second aspect of the present application provides a method for preparing a flexible glass cover, and the technical solution thereof is as follows:

[0010] A method for preparing a flexible glass cover plate comprises the following steps:

[0011] A glass substrate is provided, wherein the glass substrate has a first main body region, a bending region, and a second main body region, wherein the first main body region and the second main body region are connected via the bending region, wherein the bending region includes a first transition region, a concave platform region, and a second transition region, wherein one side of the first transition region is connected to the first main body region, and the other side is connected to the concave platform region, and one side of the second transition region is connected to the concave platform region, and the other side is connected to the second main body region;

[0012] Forming a first main coating, a first transition coating, a second transition coating, and a second main coating on the first main region, the first transition region, the second transition region, and the second main region of the glass substrate, respectively, wherein the first transition coating is connected to the first main coating, and the thickness thereof increases or increases gradually as it approaches the first main coating, and the second transition coating is connected to the second main coating, and the thickness thereof increases or increases gradually as it approaches the second main coating;

[0013] An etching process with equal etching depth is performed on each coating layer side of the glass substrate.

[0014] The third aspect of the present application provides a method for preparing a flexible glass cover, and the technical solution thereof is as follows:

[0015] A method for preparing a flexible glass cover plate comprises the following steps:

[0016] Providing a glass substrate, the glass substrate having a first main body region, a bending region, and a second main body region, wherein the first main body region and the second main body region are connected via the bending region;

[0017] The glass substrate is patterned for multiple times to form a bending portion including a first transition portion, a concave platform portion, and a second transition portion in the bending region, wherein one side of the first transition portion is connected to the first main region, and the other side is connected to the concave platform portion, and the thickness of the first transition portion increases gradually as it approaches the first main region; one side of the second transition portion is connected to the concave platform portion, and the other side is connected to the second main region, and the thickness of the second transition portion increases gradually as it approaches the second main region;

[0018] Each graphical processing independently includes one or more of the following steps:

[0019] coating a photoresist on the glass substrate to form a photoresist layer;

[0020] performing exposure processing on the photoresist layer;

[0021] Performing a developing process on the photoresist layer after the exposure process;

[0022] The glass substrate after the development process is etched.

[0023] A fourth aspect of the present application provides a flexible screen assembly, which includes a flexible display screen and the above-mentioned flexible glass cover plate or a flexible glass cover plate prepared by the above-mentioned preparation method, and the flexible glass cover plate is covered on the display surface of the flexible display screen.

[0024] A fifth aspect of the present application provides an electronic device, which includes the above-mentioned flexible screen assembly, a housing, and a circuit board;

[0025] The housing and the flexible screen assembly enclose a containing space;

[0026] The circuit board is arranged in the accommodating space.

[0027] This application has the following beneficial effects:

[0028] In the present application, a first transition portion with a gradual or gradient thickness change is provided between the concave platform portion and the first main body portion, and a second transition portion with a gradual or gradient thickness change is provided between the concave platform portion and the second main body portion, so as to gradually reduce the step difference between the first main body portion / the second main body portion and the concave platform portion, thereby avoiding the problem of obvious sharp edges in the product appearance. At the same time, compared with directly connecting the first transition portion and the second transition portion, the concave platform portion is provided in the present application, which is conducive to increasing the width of the bending zone. The increase in the width of the bending zone can improve the light and shadow problems caused by the step difference on both sides of the concave platform portion. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] In order to more clearly illustrate the technical solutions in the embodiments of the present application and to more completely understand the present application and its beneficial effects, the following is a brief introduction to the drawings required for the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present application, and those skilled in the art can obtain other drawings based on these drawings without creative work.

[0030] Figure 1 is a schematic structural diagram of a flexible glass cover according to an embodiment;

[0031] Figure 2 for Figure 1 A schematic diagram of the structure of the A-A' section;

[0032] Figure 3 is a schematic structural diagram of a cross section of a flexible glass cover according to another embodiment;

[0033] Figure 4 The present invention is a flow chart of preparing a flexible glass cover according to an embodiment of the present invention;

[0034] Figure 5 is a schematic structural diagram of a glass substrate according to an embodiment;

[0035] Figure 6is a schematic structural diagram of a glass substrate with a coating according to an embodiment;

[0036] Figure 7 is a schematic structural diagram of a glass substrate with a coating according to another embodiment;

[0037] Figure 8 A schematic diagram of the process of preparing a flexible glass cover plate for Example 1;

[0038] Fig. 9 A flow chart of preparing a flexible glass cover according to another embodiment;

[0039] Fig.10 Schematic diagram of the process of preparing a flexible glass cover plate for Example 2. DETAILED DESCRIPTION

[0040] The present application will be further described in detail below in conjunction with specific embodiments. The present application can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present application more thoroughly understood.

[0041] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art to which this application belongs. The terms used herein in the specification of this application are only for the purpose of describing specific embodiments and are not intended to limit this application.

[0042] the term

[0043] Unless otherwise specified or there is a contradiction, the terms and phrases used in this application have the following meanings:

[0044] In the present application, "multiple" means at least two, such as two, three, etc., unless otherwise clearly and specifically defined. In the present application, "several" means at least one, such as one, two, etc., unless otherwise clearly and specifically defined.

[0045] In this application, "optionally", "optional" and "optional" refer to optional, that is, to any one of the two parallel schemes of "yes" or "no". If multiple "options" appear in a technical solution, unless otherwise specified and there is no contradiction or mutual restriction, each "optional" is independent.

[0046] In this application, in the "first aspect", "second aspect", "third aspect", "fourth aspect", etc., the terms "first", "second", "third", "fourth", etc. are used only for descriptive purposes and cannot be understood as indicating or implying relative importance or quantity, nor can they be understood as implicitly indicating the importance or quantity of the indicated technical features. Moreover, "first", "second", "third", "fourth", etc. only serve the purpose of non-exhaustive enumeration and description, and it should be understood that they do not constitute a closed limitation on quantity.

[0047] In the present application, a first feature being “above” or “below” a second feature may mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being “above”, “above”, and “above” a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being “below”, “below”, and “below” a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0048] In the present application, when an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may also be an intermediate element. When an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be an intermediate element at the same time. It should also be understood that when explaining the connection relationship or positional relationship of elements, although not explicitly described, the connection relationship and positional relationship are interpreted as including an error range, which should be within the acceptable deviation range of a specific value determined by a person skilled in the art.

[0049] In this application, electronic devices may be, but are not limited to, various personal computers, laptops, smart phones, tablet computers, IoT devices, and portable wearable devices. IoT devices may be smart speakers, smart TVs, smart air conditioners, smart car devices, etc. Portable wearable devices may be smart watches, smart bracelets, head-mounted devices, etc.

[0050] In order to improve the bendability of the flexible glass cover, the industry usually grooves the bending area to form a bending portion. For example, grooves are formed by CNC processing. However, the surface roughness of the flexible glass cover produced by CNC processing is large, and micro cracks are easily generated, which affects the strength of the product. To avoid the above problems, a protective film can be applied to the non-bending area, and the bending area can be etched to form a groove. However, the etching of the protective film has obvious sharp edges, which affects the appearance of the product.

[0051] In order to solve the problem of obvious sharp edges in product appearance, the present application provides a flexible glass cover in a first aspect. In one embodiment, see Figure 1The flexible glass cover 1 includes a first main body portion 11 , a bending portion 12 and a second main body portion 13 , and the first main body portion 11 and the second main body portion 13 are connected via the bending portion 12 .

[0052] Figure 1 The structure of the A-A' section is as follows Figure 2 As shown, the bending portion 12 includes a first transition portion 121, a recessed portion 122 and a second transition portion 123. One side of the first transition portion 121 is connected to the first main body portion 11, and the other side is connected to the recessed portion 122. One side of the second transition portion 123 is connected to the recessed portion 122, and the other side is connected to the second main body portion 13.

[0053] The thickness of the first transition portion 121 increases as it approaches the first main body portion 11 .

[0054] The thickness of the second transition portion 123 increases as it approaches the second main body portion 13 .

[0055] In this embodiment, a first transition portion 121 with a gradual thickness is provided between the concave platform portion 122 and the first main body portion 11, and a second transition portion 123 with a gradual thickness is provided between the concave platform portion 122 and the second main body portion 13, so as to gradually reduce the step difference between the first main body portion 11 / the second main body portion 13 and the concave platform portion 122, thereby avoiding the problem of obvious sharp edges in the product appearance. At the same time, compared with directly connecting the first transition portion 121 and the second transition portion 123, the concave platform portion 122 is provided in this embodiment, which is conducive to increasing the width of the bending zone. The increase in the width of the bending zone can improve the light and shadow problems caused by the step difference on both sides of the concave platform portion 122.

[0056] In this embodiment, the closer to the first main body portion 11 , the greater the thickness variation of the first transition portion 121 ; the closer to the second main body portion 13 , the greater the thickness variation of the second transition portion 123 .

[0057] In another embodiment, the thickness of the first transition portion increases gradually as it approaches the first main body portion, and the thickness of the second transition portion increases gradually as it approaches the second main body portion. Figure 3The flexible glass cover plate 2 includes a first main body portion 21, a bending portion 22, and a second main body portion 23. The first main body portion 21 and the second main body portion 23 are connected through the bending portion 22. The bending portion 22 includes a first transition portion 221, a concave platform portion 222, and a second transition portion 223. One side of the first transition portion 221 is connected to the first main body portion 21, and the other side is connected to the concave platform portion 222. One side of the second transition portion 223 is connected to the concave platform portion 222, and the other side is connected to the second main body portion 23. The thickness of the first transition portion 221 increases gradually as it approaches the first main body portion 21. The thickness of the second transition portion 223 increases gradually as it approaches the second main body portion 23. By providing a first transition portion 221 with a thickness gradient change between the concave portion 222 and the first main body portion 21, and providing a second transition portion 223 with a thickness gradient change between the concave portion 222 and the second main body portion 23, the step difference between the first main body portion 21 / the second main body portion 23 and the concave portion 222 can be gradually reduced, thereby avoiding the problem of obvious sharp edges in the product appearance.

[0058] Please continue to see Figure 2 In this embodiment, the thickness of the concave platform portion 122 remains unchanged. Optionally, the thickness of the concave platform portion 122 is 30 μm to 50 μm. For example, the thickness of the concave platform portion 122 is any value in a range of any two numerical endpoint values ​​including 30 μm, 40 μm and 50 μm.

[0059] In this embodiment, the thickness of the first main body 11 remains unchanged. Optionally, the thickness of the first main body 11 is 70 μm to 220 μm. For example, the thickness of the first main body 11 is any value in any two numerical endpoint value ranges including 70 μm, 100 μm, 150 μm, 200 μm and 220 μm.

[0060] In this embodiment, the thickness of the second main body 13 remains unchanged. Optionally, the thickness of the second main body 13 is 70 μm to 220 μm. For example, the thickness of the second main body 13 is any value in any two numerical endpoint value ranges including 70 μm, 100 μm, 150 μm, 200 μm and 220 μm.

[0061] Optionally, the distance h1 between the side of the first transition portion 121 connected to the first main body portion 11 and the side connected to the concave platform portion 122 (i.e., the width of the first transition portion 121) is 10 mm to 20 mm. For example, h1 is any value in a range of any two numerical endpoint values, including 10 μm, 15 μm, and 20 μm.

[0062] Optionally, the distance h2 between the side of the concave platform 122 connected to the first transition portion 121 and the side connected to the second transition portion 123 (i.e., the width of the concave platform 122) is 15 mm to 25 mm. For example, h2 is any value in a range of any two numerical endpoint values, including 15 μm, 20 μm, and 25 μm.

[0063] Optionally, the distance h3 between the side of the second transition portion 123 connected to the concave platform 122 and the side connected to the second main body 13 (i.e., the width of the second transition portion 123) is 10 mm to 20 mm. For example, h3 is any value in a range of any two numerical endpoint values, including 10 μm, 15 μm, and 20 μm.

[0064] The second aspect of the present application provides a method for preparing a flexible glass cover. In one embodiment, see Figure 4 , the preparation method of the flexible glass cover comprises the following steps:

[0065] S11. Provide a glass substrate.

[0066] See also Figure 5 The glass substrate 3 has a first main body area 31, a bending area 32 and a second main body area 33. The first main body area 31 and the second main body area 33 are connected through the bending area 32. The bending area 32 includes a first transition area 321, a concave platform area 322 and a second transition area 323. One side of the first transition area 321 is connected to the first main body area 31, and the other side is connected to the concave platform area 322. One side of the second transition area 323 is connected to the concave platform area 322, and the other side is connected to the second main body area 33.

[0067] Optionally, the thickness of the glass substrate 3 is 70 μm to 220 μm. For example, the thickness of the glass substrate 3 is any value in any range of any two numerical endpoints including 70 μm, 100 μm, 150 μm, 200 μm and 220 μm.

[0068] In this embodiment, the glass substrate is a flat substrate, that is, the thickness of the glass substrate in the first main body region 31 , the bending region 32 and the second main body region 33 is the same.

[0069] It is understandable that the glass substrate can be cleaned, for example, by using a weak alkaline cleaning agent to clean the glass substrate, and then soaking it in plasma water at 50° C. to 60° C. for 20 to 30 minutes, and then quickly drying it.

[0070] Optionally, the main material of the glass substrate is high-alumina-silicate glass.

[0071] S12, forming a coating layer on the glass substrate 3.

[0072] In this embodiment, see Figure 6 , a first main coating 41 is formed on the first main area 31 of the glass substrate 3, a first transition coating 421 is formed on the first transition area 321 of the glass substrate 3, a second transition coating 423 is formed on the second transition area 323 of the glass substrate 3, and a second main coating 43 is formed on the second main area 33 of the glass substrate 3.

[0073] The first transition coating 421 is connected to the first main coating 41 , and the thickness thereof increases as it approaches the first main coating 41 .

[0074] The second transition coating 423 is connected to the second main coating 43 , and the thickness thereof increases as it approaches the second main coating 43 .

[0075] In other embodiments, the thickness of the first transition coating layer may increase gradually as it approaches the first main coating layer. The thickness of the second transition coating layer may increase gradually as it approaches the second main coating layer.

[0076] In this embodiment, the thickness of the first main coating layer 41 remains unchanged.

[0077] In this embodiment, the thickness of the second main coating layer 43 remains unchanged.

[0078] In another embodiment, the step of forming a concave terrace coating on the concave terrace area of ​​the glass substrate is further included. Figure 7 , a first main coating 51 is formed on the first main area 31 of the glass substrate 3, a first transition coating 521 is formed on the first transition area 321 of the glass substrate 3, a concave platform coating 522 is formed on the concave platform area 322 of the glass substrate 3, a second transition coating 523 is formed on the second transition area 323 of the glass substrate 3, and a second main coating 53 is formed on the second main area 33 of the glass substrate 3.

[0079] The first transition coating 521 is connected to the first main coating 51 , and its thickness increases as it approaches the first main coating 51 .

[0080] The second transition coating 523 is connected to the second main coating 53 , and the thickness thereof increases as it approaches the second main coating 53 .

[0081] One side of the concave platform coating 522 is connected to the first transition coating 521 , and the other side is connected to the second transition coating 523 .

[0082] In other embodiments, the thickness of the first transition coating layer may increase gradually as it approaches the first main coating layer. The thickness of the second transition coating layer may increase gradually as it approaches the second main coating layer.

[0083] In this embodiment, the thickness of the first main coating layer 51 remains unchanged.

[0084] In this embodiment, the thickness of the second main coating layer 53 remains unchanged.

[0085] In this embodiment, the thickness of the concave platform coating 522 remains unchanged.

[0086] Optionally, the distance h4 between the side of the first transition coating 521 connected to the first main coating 51 and the side connected to the concave platform coating 522 (i.e., the width of the first transition coating 521) is 10 mm to 20 mm. For example, h4 is any value in a range of any two numerical endpoint values ​​including 10 μm, 15 μm and 20 μm.

[0087] Optionally, the distance h5 between the side of the concave terrace coating 522 connected to the first transition coating 521 and the side connected to the second transition coating 523 (i.e., the width of the concave terrace coating 522) is 15 mm to 25 mm. For example, h5 is any value in a range of any two numerical endpoint values, including 15 μm, 20 μm, and 25 μm.

[0088] Optionally, the distance h6 between the side of the second transition coating 523 connected to the concave platform coating 522 and the side connected to the second main body coating 53 (i.e., the width of the second transition coating 523) is 10 mm to 20 mm. For example, h6 is any value in a range of any two numerical endpoint values ​​including 10 μm, 15 μm and 20 μm.

[0089] Optionally, the first transition coating layer may be formed on the first transition region of the glass substrate by method one or method two.

[0090] Method 1: forming a first transition coating on a first transition region of a glass substrate, comprising the following steps:

[0091] Coating a first positive photoresist on the first transition region, and drying the first positive photoresist to form a first transition photoresist layer;

[0092] Expose the first transition photoresist layer, and control the exposure energy so that the exposure thickness of the first transition photoresist layer becomes smaller or smaller in gradient as it approaches the first main region;

[0093] The first transition photoresist layer after the exposure process is developed.

[0094] The exposed portion of the positive photoresist will dissolve in the developer and be removed during the development process, while the exposed portion of the negative photoresist will not dissolve in the developer and be retained during the development process. The above method uses a positive photoresist, and after the exposure process, due to the gradual or gradient change in the exposure thickness, the thickness of the photoresist layer removed during the development process changes gradually or gradiently, forming a first transition photoresist layer with a gradual or gradient thickness.

[0095] It can be understood that the first transition photoresist layer remaining after the development process serves as the first transition coating layer.

[0096] Method 2: forming a first transition coating on a first transition region of a glass substrate, comprising the following steps:

[0097] Coating a first solidified material on the first transition region, and making the coating thickness of the first solidified material gradually increase or gradually increase as it approaches the first main region;

[0098] The first curing material is cured.

[0099] Optionally, the coating method of the first solidified material can be spraying, and the coating thickness of the first solidified material can be controlled by controlling the movement speed of the spraying device. Generally speaking, the slower the movement speed of the spraying device, the greater the coating thickness.

[0100] It can be understood that the first curing material serves as the first transition coating after being cured.

[0101] Optionally, the first curing material includes one or more of a thermosetting curing material and a light-curing curing material, and the light-curing curing material includes a positive photoresist or a negative photoresist.

[0102] When the first curing material is a positive photoresist, it is dried to form a first transition photoresist layer, which can be protected from exposure by a mask to prevent it from being removed during the development process. In this case, the first transition photoresist layer formed by drying serves as the first transition coating layer. It is also possible to use a mask without performing a mask and a development process, and the first transition photoresist layer after exposure directly serves as the first transition coating layer. When the first curing material is a negative photoresist, it is dried to form a first transition photoresist layer, which can be exposed to be left during the development process. In this case, the first transition photoresist layer left after the development process serves as the first transition coating layer. It is also possible to use a mask without performing a development process, and the first transition photoresist layer after exposure directly serves as the first transition coating layer.

[0103] When the first curable material is a photocurable material other than positive photoresist and negative photoresist, it can be photocured to form the first transition coating.

[0104] When the first curing material is a thermosetting curing material, it can be thermally cured to form the first transition coating.

[0105] Optionally, the solid content of the first solidified material is 25 wt % to 95 wt %.

[0106] It can be understood that the first transition coating layer formed in the above manner can be etched away by subsequent etching treatment.

[0107] Optionally, a second transition coating may be formed on the second transition region of the glass substrate by method one or method two.

[0108] Method 1: forming a second transition coating on the second transition region of the glass substrate, comprising the following steps:

[0109] Coating a second positive photoresist on the second transition region, and drying the layer to form a second transition photoresist layer;

[0110] Expose the second transition photoresist layer, and control the exposure energy so that the exposure thickness of the second transition photoresist layer becomes smaller or smaller in gradient as it approaches the second main body region;

[0111] The second transition photoresist layer after the exposure process is developed.

[0112] The second positive photoresist may be the same as or different from the first positive photoresist. The second transition photoresist layer remaining after the development process serves as a second transition coating layer.

[0113] Method 2: forming a second transition coating on the second transition region of the glass substrate, comprising the following steps:

[0114] Coating a second solidified material on the second transition region, and making the coating thickness of the second solidified material gradually increase or gradually increase as it approaches the second main region;

[0115] The second curing material is cured.

[0116] Optionally, the coating method of the second solidifying material may be spraying, and the coating thickness of the second solidifying material can be controlled by controlling the movement rate of the spraying equipment.

[0117] It can be understood that the second curing material serves as a second transition coating after being cured.

[0118] Optionally, the second curing material includes one or more of a thermosetting curing material and a light-curing curing material, and the light-curing curing material includes a positive photoresist or a negative photoresist.

[0119] When the second curing material is a positive photoresist, it is dried to form a second transition photoresist layer, which can be masked to avoid exposure to prevent removal during the development process. In this case, the second transition photoresist layer formed by drying serves as the second transition coating layer. It is also possible to use a mask without performing a masking process and without performing a development process, and the second transition photoresist layer after exposure directly serves as the second transition coating layer. When the second curing material is a negative photoresist, it is dried to form a second transition photoresist layer, which can be exposed to leave it during the development process. In this case, the second transition photoresist layer left after the development process serves as the second transition coating layer. It is also possible to use a mask without performing a development process and the second transition photoresist layer after exposure directly serves as the second transition coating layer.

[0120] When the second curable material is a photocurable material other than positive photoresist and negative photoresist, it can be photocured to form a second transition coating.

[0121] When the first curing material is a thermosetting curing material, it can be thermally cured to form the second transition coating.

[0122] Optionally, the solid content of the second solidified material is 25 wt % to 95 wt %.

[0123] It can be understood that the second transition coating layer formed in the above manner can be removed by etching through a subsequent etching process.

[0124] Optionally, forming a first main coating layer on the first main region of the glass substrate comprises the following steps:

[0125] Applying a third curing material on the first main body area;

[0126] The third curing material is cured.

[0127] Optionally, the coating method of the third solidifying material may be spraying, and the coating thickness of the third solidifying material can be controlled by controlling the movement rate of the spraying equipment.

[0128] Optionally, the third curing material includes one or more of a thermosetting curing material and a light-curing curing material, and the light-curing curing material includes a positive photoresist or a negative photoresist.

[0129] When the third curing material is a positive photoresist, it is dried to form a first main body photoresist layer, which can be masked to avoid exposure to avoid being removed during the development process. At this time, the first main body photoresist layer formed by drying serves as the first main body coating layer; it is also possible not to mask or perform development, and the first main body photoresist layer after exposure is directly used as the first main body coating layer. When the third curing material is a negative photoresist, it is dried to form a first main body photoresist layer, which can be exposed to be left in the development process, and the first main body photoresist layer left after the development process is the first main body coating layer; it is also possible not to perform development, and the first main body photoresist layer after exposure is directly used as the first main body coating layer.

[0130] When the third curable material is a photocurable material other than positive photoresist and negative photoresist, it can be photocured to form the first main coating layer.

[0131] When the third curing material is a thermosetting curing material, it can be thermally cured to form the first main coating layer.

[0132] Optionally, the solid content of the third solidified material is 25 wt % to 95 wt %.

[0133] It can be understood that the first main coating layer formed in the above manner can be etched away by subsequent etching treatment.

[0134] Optionally, forming a second main coating layer on the second main region of the glass substrate comprises the following steps:

[0135] Applying a fourth curing material on the second main body area;

[0136] The fourth curing material is cured.

[0137] Optionally, the coating method of the fourth solidified material may be spraying, and the coating thickness of the fourth solidified material can be controlled by controlling the movement rate of the spraying device.

[0138] Optionally, the fourth curing material includes one or more of a thermosetting curing material and a light-curing curing material, and the light-curing curing material includes a positive photoresist or a negative photoresist.

[0139] When the fourth curing material is a positive photoresist, it is dried to form a second main body photoresist layer, which can be masked to avoid exposure to avoid being removed during the development process. At this time, the second main body photoresist layer formed by drying serves as the second main body coating layer; it is also possible not to mask or perform development, and the second main body photoresist layer after exposure is directly used as the second main body coating layer. When the fourth curing material is a negative photoresist, it is dried to form a second main body photoresist layer, which can be exposed to be left in the development process, and the second main body photoresist layer left after the development process is the second main body coating layer; it is also possible not to perform development, and the second main body photoresist layer after exposure is directly used as the second main body coating layer.

[0140] When the fourth curable material is a photocurable material other than positive photoresist and negative photoresist, it can be photocured to form the second main coating layer.

[0141] When the fourth curing material is a thermosetting curing material, it can be thermally cured to form the second main coating layer.

[0142] Optionally, the solid content of the fourth solidified material is 25 wt % to 95 wt %.

[0143] It can be understood that the second main coating layer formed in the above manner can be etched away by subsequent etching treatment.

[0144] Optionally, the concave platform coating may be formed on the concave platform area of ​​the glass substrate by method one or method two.

[0145] Method 1: forming a concave platform coating on the concave platform area of ​​a glass substrate, comprising the following steps:

[0146] Coating a third positive photoresist on the concave platform area and drying it to form a concave platform photoresist layer;

[0147] performing exposure processing on the concave platform photoresist layer;

[0148] The concave platform photoresist layer after the exposure process is developed.

[0149] The third positive photoresist may be the same as or different from the first positive photoresist, and may be the same as or different from the second positive photoresist. The concave mesa photoresist layer left after the development process is used as the concave mesa coating.

[0150] Method 2: forming a concave platform coating on the concave platform area of ​​the glass substrate, comprising the following steps:

[0151] Applying a fifth curing material on the concave area;

[0152] The fifth curing material is cured.

[0153] Optionally, the coating method of the fifth solidifying material may be spraying, and the coating thickness of the fifth solidifying material can be controlled by controlling the movement rate of the spraying equipment.

[0154] It can be understood that the fifth cured material serves as the concave platform coating after being cured.

[0155] Optionally, the fifth curable material includes one or more of a thermosetting curable material and a light-curable curable material, and the light-curable curable material includes a positive photoresist or a negative photoresist.

[0156] When the fifth curing material is a positive photoresist, it is dried to form a concave platform photoresist layer, which can be masked to avoid exposure to avoid being removed during the development process. In this case, the concave platform photoresist layer formed by drying is used as the concave platform coating layer; it is also possible not to mask and not to perform development treatment, and the concave platform photoresist layer after exposure is directly used as the concave platform coating layer. When the second curing material is a negative photoresist, it is dried to form a concave platform photoresist layer, which can be exposed to be left in the development process, and the concave platform photoresist layer left after the development process is used as the concave platform coating layer; it is also possible not to perform development treatment, and the concave platform photoresist layer after exposure is directly used as the concave platform coating layer.

[0157] When the fifth curable material is a photocurable material other than positive photoresist and negative photoresist, it can be photocured to form a concave mesa coating.

[0158] When the fifth curing material is a thermosetting curing material, it can be thermally cured to form the concave platform coating.

[0159] Optionally, the solid content of the fifth solidified material is 25 wt % to 95 wt %.

[0160] It can be understood that the first mesa coating layer formed in the above manner can be etched away by subsequent etching treatment.

[0161] Optionally, the first curing material, the second curing material, the third curing material, the fourth curing material and the fifth curing material may be the same, or different, or some of them may be the same, and some of them may be different.

[0162] Optionally, the first curing material, the second curing material, the third curing material, the fourth curing material and the fifth curing material may be applied at one time or in batches.

[0163] S13, performing etching treatment with equal etching depth on each coating layer side of the glass substrate.

[0164] In this embodiment, the equal etching depth means that the etching depth of the entire surface of each coating layer side of the glass substrate is the same, that is, the thickness removed by etching is the same on the entire surface.

[0165] Optionally, the etching depth is greater than the minimum thickness of the first transition coating and the second transition coating.

[0166] Further optionally, the etching depth is no greater than the maximum thickness of the first bulk coating and the second bulk coating.

[0167] Optionally, an etching process with equal etching depth is performed on one side of each coating layer of the glass substrate, comprising the following steps:

[0168] Each coating layer side of the glass substrate is brought into contact with the etching solution.

[0169] Optionally, the etching solution is an acidic etching solution.

[0170] It is understandable that if there is still coating remaining after the etching process, the preparation method of this embodiment further includes a step of removing the remaining coating.

[0171] It can be understood that the preparation method of this embodiment includes the steps of cleaning and drying the product after the etching process.

[0172] Example 1 of the present application provides a method for preparing a flexible glass cover, wherein the first curing material, the second curing material, the third curing material, the fourth curing material and the fifth curing material are the same, and are all positive photoresists, see Figure 8 , the steps are as follows:

[0173] A positive photoresist is applied to the first main area, the first transition area, the concave platform area, the second transition area and the second main area of ​​the glass substrate 3 at one time, and dried to form a first main photoresist layer, a first transition photoresist layer, a concave platform photoresist layer, a second transition photoresist layer and a second main photoresist layer, wherein each photoresist layer has equal thickness and is continuous.

[0174] The first main photoresist layer and the second main photoresist layer are masked by using a mask plate, and one side of each photoresist layer of the glass substrate 3 is exposed, wherein the exposure energy is controlled so that the exposure thickness satisfies the following conditions: the exposure thickness of the concave platform photoresist layer is equal to the thickness of the concave platform photoresist layer, the closer to the first main area, the smaller the exposure thickness of the first transition photoresist layer, and the closer to the second main area, the smaller the exposure thickness of the second transition photoresist layer.

[0175] The glass substrate after the exposure treatment is developed to obtain a first main coating, a first transition coating, a second transition coating and a second main coating, wherein the width of the first transition coating and the second transition coating are both 15 mm, and the distance between the first transition coating and the second transition coating is 20 mm.

[0176] An acidic etching solution is used to perform etching treatment with equal etching depth on one side of each coating of the glass substrate. In this example, the etching depth is the thickness of the first main coating and the second main coating, and a flexible glass cover plate 1 is obtained. On the flexible glass cover plate 1, the width of the first transition portion and the second transition portion are both 15 mm, and the width of the concave platform portion is 20 mm.

[0177] The third aspect of the present application provides a method for preparing a flexible glass cover. In one embodiment, see Fig. 9 , the preparation method of the flexible glass cover comprises the following steps:

[0178] S21. Provide a glass substrate.

[0179] The glass substrate has a first main body area, a bending area and a second main body area, and the first main body area is connected with the second main body area through the bending area.

[0180] Optionally, the thickness of the glass substrate is 70 μm to 220 μm. For example, the thickness of the glass substrate is any value in a range of any two numerical endpoints including 70 μm, 100 μm, 150 μm, 200 μm and 220 μm.

[0181] S22, performing multiple patterning processes on the glass substrate.

[0182] Through multiple graphic processing, a bending portion including a first transition portion, a concave platform portion and a second transition portion is formed in the bending area, wherein one side of the first transition portion is connected to the first main body area, and the other side is connected to the concave platform portion, and the thickness of the first transition portion increases gradually as it approaches the first main body area; one side of the second transition portion is connected to the concave platform portion, and the other side is connected to the second main body area, and the thickness of the second transition portion increases gradually as it approaches the second main body area.

[0183] In this embodiment, each graphical processing independently includes one or more of the following steps:

[0184] coating a photoresist on the glass substrate to form a photoresist layer;

[0185] performing exposure processing on the photoresist layer;

[0186] Performing a developing process on the photoresist layer after the exposure process;

[0187] The glass substrate after the development process is etched.

[0188] It is understandable that during the first patterning process, a photoresist may be applied to form a photoresist layer, and during the subsequent patterning process, the photoresist layer formed by the first patterning process may be exposed, etc. Alternatively, during the first patterning process, the formed photoresist layer may be removed, and during the subsequent patterning process, a photoresist may be applied again to form a photoresist layer.

[0189] Optionally, the photoresist is a positive photoresist or a negative photoresist. The use methods of the positive photoresist and the negative photoresist are as described above and will not be repeated here.

[0190] After the photoresist layer is developed, the glass substrate to be etched is exposed, and the exposed glass substrate is etched. Optionally, the etching liquid for the etching is an acidic etching liquid. Through multiple patterning processes, gradient etching of the glass substrate in the bending area is achieved.

[0191] Example 2 of this application provides a method for preparing a flexible glass cover. Fig.10 , the steps are as follows:

[0192] A positive photoresist is applied to the first main area, the first transition area, the concave platform area, the second transition area and the second main area of ​​the glass substrate 3 at one time, and dried to form a first main photoresist layer, a first transition photoresist layer, a concave platform photoresist layer, a second transition photoresist layer and a second main photoresist layer, wherein each photoresist layer has equal thickness and is continuous.

[0193] The first main photoresist layer, the first transition photoresist layer, the second transition photoresist layer and the second main photoresist layer are masked by a mask plate, and one side of each photoresist layer of the glass substrate 3 is exposed. After the exposure process, each photoresist layer is developed to expose the glass substrate in the concave area.

[0194] The glass in the exposed concave area is etched with an acidic etching solution to obtain a concave portion with a width of 20 mm, thus completing the first patterning process.

[0195] The exposed area of ​​the mask is enlarged to expose a portion of the first transition photoresist layer and the second transition photoresist layer, and the second patterning process is completed through exposure, development and etching.

[0196] The exposed area of ​​the mask plate is continued to be expanded until the remaining part of the first transition photoresist layer and the second transition photoresist layer are exposed. After exposure processing, development processing and etching processing, the third graphic processing is completed to obtain a flexible glass cover plate 2. On the flexible glass cover plate 2, the thickness gradient of the first transition part and the second transition part changes, and the total width is 15 mm.

[0197] The present application also provides a comparative example 3, which provides a method for preparing a flexible glass cover, and the steps are as follows:

[0198] A glass substrate is provided. The glass substrate comprises a first main body region, a bending region and a second main body region. The first main body region and the second main body region are connected via the bending region.

[0199] The acid-resistant protective film is attached to the first main body area and the second main body area of ​​the glass substrate, exposing the glass substrate in the bending area.

[0200] The exposed glass substrate was etched with an acidic etching solution to form a concave portion with a width of 20 mm, thereby obtaining a flexible glass cover.

[0201] Comparing the flexible glass cover plates of Examples 1, 2 and 3, the sharp edge of Example 3 can be clearly observed, while the sharp edges of Examples 1 and 2 are not obvious. It can be seen that compared with laying a protective film on the non-bending area and etching the bending area to form a concave platform, the method of the present application can solve the problem of obvious sharp edges in the product appearance by forming the first transition part and the second transition part.

[0202] Through the preparation method of the flexible glass cover plate of the second aspect and the third aspect of the present application, a flexible glass cover plate product with no obvious sharp edges in appearance can be prepared, and at the same time, the light and shadow problem caused by the step difference on both sides of the concave platform can be improved.

[0203] A fourth aspect of the present application provides a flexible screen assembly. In one embodiment, the flexible screen assembly includes a flexible display screen and the above-mentioned flexible glass cover plate or a flexible glass cover plate prepared by the above-mentioned preparation method, and the flexible glass cover plate is covered on the display surface of the flexible display screen.

[0204] The flexible screen assembly of this embodiment has all the advantages of the above-mentioned flexible glass cover plate, which will not be repeated here.

[0205] A fifth aspect of the present application provides an electronic device. In one embodiment, the electronic device includes the above-mentioned flexible screen assembly, a housing, and a circuit board;

[0206] The housing and the flexible screen assembly enclose a containing space;

[0207] The circuit board is arranged in the accommodating space.

[0208] The electronic device of this embodiment has all the advantages of the above-mentioned flexible screen assembly, which will not be elaborated here.

[0209] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0210] The above-mentioned embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent of the present application shall be subject to the attached claims.

Claims

1. A flexible glass cover, characterized in that: include: A first main body portion, a bending portion, and a second main body portion, wherein the first main body portion and the second main body portion are connected via the bending portion; The bending portion includes a first transition portion, a concave platform portion, and a second transition portion, wherein one side of the first transition portion is connected to the first main body portion, and the other side is connected to the concave platform portion, and one side of the second transition portion is connected to the concave platform portion, and the other side is connected to the second main body portion; The thickness of the first transition portion increases or increases gradually as it approaches the first main body portion, and the thickness of the second transition portion increases or increases gradually as it approaches the second main body portion.

2. The flexible glass cover according to claim 1, characterized in that: One or more of the following conditions are met: (1) The thickness of the concave portion remains unchanged; (2) The thickness of the concave platform is 30 μm to 50 μm; (3) The thickness of the first main body portion remains unchanged; (4) The thickness of the first main body is 70 μm to 220 μm; (5) The thickness of the second main body portion remains unchanged; (6) The thickness of the second main body portion is 70 μm to 220 μm.

3. The flexible glass cover according to claim 1 or 2, characterized in that: One or more of the following conditions are met: (1) The distance between the side of the first transition portion connected to the first main body portion and the side connected to the concave platform portion is 10 mm to 20 mm; (2) The distance between the side of the concave portion connected to the first transition portion and the side connected to the second transition portion is 15 mm to 25 mm; (3) The distance between the side of the second transition portion connected to the concave portion and the side connected to the second main body portion is 10 mm to 20 mm.

4. A method for preparing a flexible glass cover, characterized in that: The following steps are involved: A glass substrate is provided, wherein the glass substrate has a first main body region, a bending region, and a second main body region, wherein the first main body region and the second main body region are connected via the bending region, wherein the bending region includes a first transition region, a concave platform region, and a second transition region, wherein one side of the first transition region is connected to the first main body region, and the other side is connected to the concave platform region, and one side of the second transition region is connected to the concave platform region, and the other side is connected to the second main body region; Forming a first main coating, a first transition coating, a second transition coating, and a second main coating on the first main region, the first transition region, the second transition region, and the second main region of the glass substrate, respectively, wherein the first transition coating is connected to the first main coating, and the thickness thereof increases or increases gradually as it approaches the first main coating, and the second transition coating is connected to the second main coating, and the thickness thereof increases or increases gradually as it approaches the second main coating; An etching process with equal etching depth is performed on each coating layer side of the glass substrate.

5. The method for preparing the flexible glass cover according to claim 4, characterized in that: The etching depth is greater than the smallest thickness of the first transition coating and the second transition coating.

6. The method for preparing a flexible glass cover according to claim 4, characterized in that: The etching process of equal etching depth is performed on one side of each coating layer of the glass substrate, comprising the following steps: The coating layers on the glass substrate are contacted with an etching solution.

7. The method for preparing the flexible glass cover according to claim 6, characterized in that: The etching solution is an acidic etching solution.

8. The method for preparing a flexible glass cover according to any one of claims 4 to 7, characterized in that: The following steps are also included: A concave terrace coating is formed on the concave terrace area of ​​the glass substrate, wherein one side of the concave terrace coating is connected to the first transition coating, and the other side of the concave terrace coating is connected to the second transition coating.

9. The method for preparing a flexible glass cover according to claim 8, characterized in that: One or more of the following conditions are met: (1) The thickness of the first main coating layer remains unchanged; (2) The thickness of the second main coating layer remains unchanged; (3) The thickness of the concave mesa coating remains unchanged.

10. The method for preparing a flexible glass cover according to claim 8, characterized in that: The step of forming a first transition coating on the first transition region of the glass substrate comprises the following steps: Coating a first positive photoresist on the first transition region to form a first transition photoresist layer; exposing the first transition photoresist layer, and controlling the exposure energy so that the exposure thickness of the first transition photoresist layer becomes smaller or smaller in gradient as it approaches the first main region; developing the first transition photoresist layer after the exposure process; or A first solidified material is coated on the first transition region, and the coating thickness of the first solidified material increases or increases gradually as it approaches the first main region; and the first solidified material is cured.

11. The method for preparing a flexible glass cover according to claim 10, characterized in that: The step of forming a second transition coating on the second transition region of the glass substrate comprises the following steps: Coating a second positive photoresist on the second transition region to form a second transition photoresist layer; exposing the second transition photoresist layer, and controlling the exposure energy so that the exposure thickness of the second transition photoresist layer becomes smaller or smaller in gradient as it approaches the second main region; developing the second transition photoresist layer after the exposure process; or A second solidified material is coated on the second transition area, and the coating thickness of the second solidified material increases or increases gradually as it approaches the second main body area; and the second solidified material is cured.

12. The method for preparing a flexible glass cover according to claim 11, characterized in that: One or more of the following conditions are met: (1) The step of forming a first main coating layer on the first main region of the glass substrate comprises the following steps: coating a third curing material on the first main region; curing the third curing material; (2) forming the second main coating on the second main area of ​​the glass substrate, comprising the following steps: coating a fourth curing material on the second main area; curing the fourth curing material; (3) The step of forming a concave terrace coating on the concave terrace area of ​​the glass substrate comprises the following steps: Coating a third positive photoresist on the concave platform area to form a concave platform photoresist layer; performing an exposure process on the concave platform photoresist layer; performing a development process on the concave platform photoresist layer after the exposure process; or A fifth curing material is coated on the concave platform area; and the fifth curing material is cured.

13. The method for preparing a flexible glass cover according to claim 12, characterized in that: The first solidified material, the second solidified material, the third solidified material, the fourth solidified material and the fifth solidified material meet one or more of the following conditions: (1) The first curing material, the second curing material, the third curing material, the fourth curing material and the fifth curing material each independently include one or more of a thermosetting curing material and a photocuring material, and the photocuring material includes a positive photoresist or a negative photoresist; (2) The solid contents of the first solidified material, the second solidified material, the third solidified material, the fourth solidified material and the fifth solidified material are each independently 25 wt % to 95 wt %.

14. The method for preparing a flexible glass cover according to claim 8, characterized in that: One or more of the following conditions are met: (1) The distance between the side of the first transition coating connected to the first main coating and the side connected to the concave platform coating is 10 mm to 20 mm; (2) The distance between the side of the concave platform coating connected to the first transition coating and the side connected to the second transition coating is 15 mm to 25 mm; (3) The distance between the side of the second transition coating connected to the concave platform coating and the side of the second main coating connected to the concave platform coating is 10 mm to 20 mm.

15. A method for preparing a flexible glass cover, characterized in that: The following steps are involved: Providing a glass substrate, the glass substrate having a first main body region, a bending region, and a second main body region, wherein the first main body region and the second main body region are connected via the bending region; The glass substrate is patterned for multiple times to form a bending portion including a first transition portion, a concave platform portion, and a second transition portion in the bending region, wherein one side of the first transition portion is connected to the first main region, and the other side is connected to the concave platform portion, and the thickness of the first transition portion increases gradually as it approaches the first main region; one side of the second transition portion is connected to the concave platform portion, and the other side is connected to the second main region, and the thickness of the second transition portion increases gradually as it approaches the second main region; Each graphical processing independently includes one or more of the following steps: coating a photoresist on the glass substrate to form a photoresist layer; performing exposure processing on the photoresist layer; Performing a developing process on the photoresist layer after the exposure process; The glass substrate after the development process is etched.

16. The method for preparing a flexible glass cover according to claim 15, characterized in that: The photoresist is a positive photoresist or a negative photoresist.

17. The method for preparing a flexible glass cover according to claim 15, characterized in that: The etching solution used in the etching process is an acidic etching solution.

18. The method for preparing a flexible glass cover according to any one of claims 4 to 7 and 9 to 17, characterized in that: The glass substrate has a thickness of 70 μm to 220 μm.

19. A flexible screen assembly, characterized in that: It comprises a flexible display screen and a flexible glass cover plate as described in any one of claims 1 to 3 or a flexible glass cover plate prepared by the preparation method as described in any one of claims 4 to 18, wherein the flexible glass cover plate is arranged on the display surface of the flexible display screen.

20. An electronic device, characterized in that: The flexible screen assembly, housing and circuit board according to claim 19 are included; The housing and the flexible screen assembly enclose a containing space; The circuit board is arranged in the accommodating space.

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