MOCVD (Metal Organic Chemical Vapor Deposition) equipment

By setting up a filter device on the pipeline of the MOCVD equipment to filter impurities in the MO source, the problem of flowmeter being susceptible to impurities accumulation is solved, the service life of the flowmeter is extended, and the utilization rate of the equipment is improved.

CN119640232APending Publication Date: 2025-03-18JIANGXI CHANGELIGHT CO LTD
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
CN202411949922.7
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-12-27
Publication Date
2025-03-18

AI Technical Summary

Technical Problem

In MOCVD equipment, flowmeters are susceptible to the accumulation of impurities, resulting in shortening of service life, increasing consumption and frequent downtime, which seriously affects the utilization rate of the equipment.

Method used

A filter device is installed on the pipeline of the MOCVD device, located between the MO source and the flowmeter to filter impurities in the MO source and extend the service life of the flowmeter.

Benefits of technology

Through the use of the filter device, the service life of the flow meter is extended, the consumption and downtime of the flow meter are reduced, and the utilization rate of MOCVD equipment is improved.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN119640232A_ABST
    Figure CN119640232A_ABST
Patent Text Reader

Abstract

The invention provides MOCVD (Metal Organic Chemical Vapor Deposition) equipment, and relates to the technical field of semiconductors. The MOCVD equipment comprises an MO source and a reaction chamber, wherein the MO source is connected with the reaction chamber through a pipeline; a flow meter and a filtering device are arranged on the pipeline, the flow meter is arranged on the pipeline between the MO source and the reaction chamber, and the filtering device is arranged on the pipeline between the MO source and the flow meter. The filtering device is used for filtering impurities in an MO source before the impurities reach the flow meter, so that the service life of the flow meter in the MOCVD equipment is prolonged, the consumption of the flow meter is reduced, the downtime caused by frequent replacement of the flow meter is shortened, and the utilization rate of the MOCVD equipment is improved.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The present application relates to the field of semiconductor technology, and in particular to a MOCVD device. Background Art

[0002] In the process of growing GaN epitaxial wafers based on the MOCVD (Metal-organic Chemical Vapor Deposition) process, MO source is an indispensable raw material. Since the MO source itself contains certain impurities, such as large particle impurities, and some impurities remain in the pipeline between the MO source and the reaction chamber, these impurities will accumulate with the increase of the growth RUN number, blocking the flow meter between the MO source and the reaction chamber.

[0003] After replacing a flow meter, the MOCVD equipment needs to perform a pipeline venting operation (working time is about six hours), two re-Coating growths (working time is about eighteen hours), and a few-piece test (working time is about four hours) to restart the machine. Frequent replacement of flow meters requires frequent execution of the restart process, which reduces the actual mass production time of the MOCVD equipment, seriously affects the utilization rate of the MOCVD equipment, and the cost of replacing the flow meter is high. Summary of the invention

[0004] In view of the above problems, the present application provides a MOCVD device, which prolongs the service life of the flow meter in the MOCVD device, reduces the consumption of the flow meter and the downtime caused by frequent replacement of the flow meter, and improves the utilization rate of the MOCVD device. The specific solution is as follows:

[0005] In a first aspect, the present application provides a MOCVD device, the MOCVD device comprising: a MO source and a reaction chamber, wherein the MO source and the reaction chamber are connected via a pipeline;

[0006] A flow meter and a filter device are arranged on the pipeline. The flow meter is arranged on the pipeline between the MO source and the reaction chamber, and the filter device is arranged on the pipeline between the MO source and the flow meter.

[0007] Preferably, in the above MOCVD device, the pipeline comprises: a first part, a second part and a third part connected in sequence;

[0008] The connecting ends of the first part and the second part have a first angle, and the connecting ends of the second part and the third part have a second angle;

[0009] The MO source is connected to the first part, and the filtering device is arranged on the third part.

[0010] Preferably, in the above MOCVD device,

[0011] The length of the second portion ranges from 25 mm to 70 mm;

[0012] The length of the third portion ranges from 50 mm to 115 mm.

[0013] Preferably, in the above MOCVD device,

[0014] The angle range of the first angle is 90°-180°;

[0015] The second angle ranges from 90° to 180°.

[0016] Preferably, in the above MOCVD equipment, when the number of the flow meters is greater than or equal to two, the angle of the first angle and / or the angle of the second angle is less than 180°.

[0017] Preferably, in the above MOCVD equipment, the length of the pipeline between the MO source and the filtering device is shorter than the length of the pipeline between the filtering device and the flow meter.

[0018] Preferably, in the above MOCVD device, the number of the filtering devices is N, N ≥ 2, and N is a positive integer;

[0019] The N filtering devices are arranged in sequence and at intervals on the pipeline between the MO source and the flow meter.

[0020] Preferably, in the above MOCVD device, the filtering device comprises a mounting chamber and a nut assembly, and the mounting chamber has an opening;

[0021] The installation chamber is used to place the filter element;

[0022] The nut assembly is used to fix the filter element in the installation chamber through the opening.

[0023] Preferably, in the above-mentioned MOCVD equipment, the filter element is a sintered filter element.

[0024] Preferably, in the above MOCVD equipment, the filtering device is a mesh filter gasket.

[0025] By means of the above technical solution, the present application provides a MOCVD device, comprising: a MO source and a reaction chamber, wherein the MO source and the reaction chamber are connected by a pipeline; a flow meter and a filter device are arranged on the pipeline, wherein the flow meter is arranged on the pipeline between the MO source and the reaction chamber, and the filter device is arranged on the pipeline between the MO source and the flow meter. The filter device is used to filter the impurities in the MO source before they reach the flow meter, thereby extending the service life of the flow meter in the MOCVD device, reducing the consumption of the flow meter and the downtime caused by frequent replacement of the flow meter, and improving the utilization rate of the MOCVD device. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] The above and other features, advantages and aspects of the embodiments of the present disclosure will become more apparent with reference to the following detailed description in conjunction with the accompanying drawings. Throughout the accompanying drawings, the same or similar reference numerals represent the same or similar elements. It should be understood that the drawings are schematic and the originals and elements are not necessarily drawn to scale.

[0027] Figure 1 A partial structural schematic diagram of an MOCVD device provided in an embodiment of the present invention;

[0028] Figure 2 A partial structural schematic diagram of another MOCVD device provided in an embodiment of the present invention;

[0029] Figure 3 A partial structural schematic diagram of another MOCVD device provided in an embodiment of the present invention;

[0030] Figure 4 A partial structural schematic diagram of another MOCVD device provided in an embodiment of the present invention;

[0031] Figure 5 A partial structural schematic diagram of another MOCVD device provided in an embodiment of the present invention;

[0032] Figure 6 A schematic diagram of the structure of a filtering device provided by an embodiment of the present invention;

[0033] Figure 7 A schematic structural diagram of a filter element provided in an embodiment of the present invention. DETAILED DESCRIPTION

[0034] The embodiments of the present application are described below in conjunction with the drawings in the embodiments of the present application. The terms used in the implementation mode of the present application are only used to explain the specific embodiments of the present application, and are not intended to limit the present application. It is known to those skilled in the art that with the development of technology and the emergence of new scenarios, the technical solutions provided in the embodiments of the present application are also applicable to similar technical problems.

[0035] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the present invention is further described in detail below with reference to the accompanying drawings and specific embodiments.

[0036] It should be noted that the directional words appearing in the present invention are based on the relative position relationship shown in the drawings and cannot be used as an absolute limitation to the present application.

[0037] refer to Figure 1 , Figure 1 A partial structural diagram of a MOCVD device provided in an embodiment of the present invention. The MOCVD device provided in an embodiment of the present invention comprises: a MO source 11 and a reaction chamber 12 , wherein the MO source 11 and the reaction chamber 12 are connected via a pipeline 13 .

[0038] A flow meter 14 and a filter device 15 are provided on the pipeline 13 . The flow meter 14 is provided on the pipeline 13 between the MO source 11 and the reaction chamber 12 . The filter device 15 is provided on the pipeline 13 between the MO source 11 and the flow meter 14 .

[0039] Specifically, in the embodiment of the present invention, one end of the flow meter 14 is connected to the front MO source 11 through the pipeline 13, and the other end of the flow meter 14 is connected to the reaction chamber 12 of the MOCVD device through the pipeline 13, and the filtering device 15 is installed on the pipeline 13 connecting the MO source 11 and the flow meter 14. The filtering device 15 is used to filter the impurities in the MO source 11 before reaching the flow meter 14, thereby extending the service life of the flow meter 14 in the MOCVD device, reducing the consumption of the flow meter 14 and the downtime caused by frequent replacement of the flow meter 14, and improving the utilization rate of the MOCVD device.

[0040] In an optional embodiment of the present invention, reference Figure 2 , Figure 2 A partial structural diagram of another MOCVD device provided in an embodiment of the present invention; Figure 3 , Figure 3 A partial structural diagram of another MOCVD device provided in an embodiment of the present invention; Figure 4 , Figure 4 A partial structural diagram of another MOCVD device provided by an embodiment of the present invention: The pipeline 13 comprises: a first part 131, a second part 132 and a third part 133 which are connected in sequence.

[0041] The connecting end of the first part 131 and the second part 132 has a first angle, and the connecting end of the second part 132 and the third part 133 has a second angle.

[0042] The MO source 11 is connected to the first part 131 , and the filtering device 15 is disposed on the third part 133 .

[0043] Specifically, in the embodiment of the present invention, the length of the second portion 132 ranges from 25 mm to 70 mm, and exemplarily, the length of the second portion 132 may be 25 mm, 40 mm, or 70 mm, etc. The length of the third portion 133 ranges from 50 mm to 115 mm, and exemplarily, the length of the third portion 133 may be 50 mm, 94 mm, or 115 mm, etc. The first angle ranges from 90° to 180°, and exemplarily, the first angle may be 90°, 130°, or 180°, etc. The second angle ranges from 90° to 180°, and exemplarily, the second angle ranges from 90° to 180°, and exemplarily, the second angle ranges from 90°, 120°, or 180°, etc.

[0044] like Figure 2 As shown, the first angle of the connecting end of the first part 131 and the second part 132 is 180°, and the second angle of the connecting end of the second part 132 and the third part 133 is 180°.

[0045] like Figure 3 and Figure 4 As shown, a first angle between the connecting ends of the first portion 131 and the second portion 132 is 90°, and a second angle between the connecting ends of the second portion 132 and the third portion 133 is 90°.

[0046] based on Figure 3 and Figure 4 As for the structure shown, the flow direction of MO in the pipeline 13 is to first flow into the first part 131, then flow into the second part 132 extending laterally, then flow into the third part 133 extending downward, and after passing through the filter device 15 on the third part 133, flow to the flow meter 14.

[0047] based on Figure 3 and Figure 4 Compared with the structure shown Figure 2 As for the structure shown, by improving the design of the pipeline 13, a smaller space can be occupied. In other words, the gas pipes in the MOCVD equipment are complicated. Through the improvement method of the pipeline 13 of the technical solution of the present application, the filter device 15 can be installed on the pipeline 13 between the MO source 11 and the flow meter 14 in the limited space reserved for the MOCVD equipment itself without affecting other pipelines, with minimal material loss. In addition, through the improvement method of the pipeline 13 of the technical solution of the present application, sufficient space can be reserved for the filter device 15 to facilitate the subsequent maintenance or replacement of the components in the filter device 15.

[0048] Further, such as Figure 2 and Figure 3 As shown, the MOCVD apparatus includes a flow meter 14; Figure 4 As shown, the MOCVD apparatus includes two flow meters 14 .

[0049] When the number of the flow meters 14 is greater than or equal to two, the angle of the first angle and / or the angle of the second angle is less than 180°.

[0050] Specifically, in the embodiments of the present invention, Figure 4 The MOCVD device shown includes two flow meters 14, the first angle between the connecting ends of the first part 131 and the second part 132 is 90°, and the second angle between the connecting ends of the second part 132 and the third part 133 is 90°. In other words, by improving the design of the pipe 13 by bending twice, the MO flow in the pipe 13 can be buffered, so that the air flow distribution of the MO flow entering different flow meters 14 is more uniform, and the distribution of the MO source is more uniform.

[0051] In an optional embodiment of the present invention, the length of the pipeline between the MO source 11 and the filtering device 15 is shorter than the length of the pipeline between the filtering device 15 and the flow meter 14 .

[0052] Specifically, in the embodiment of the present invention, the filter device 15 is arranged at a position closer to the MO source 11, so that there is a longer pipe between the filter device 15 and the flow meter 14. Even if some impurities may pass through the filter device 15, this design will not cause the impurities passing through the filter device 15 to flow into the flow meter 14 immediately, making it likely to adhere to the longer pipe between the filter device 15 and the flow meter 14, thereby further extending the service life of the flow meter 14 in the MOCVD equipment, reducing the consumption of the flow meter 14 and the downtime caused by frequent replacement of the flow meter 14, and improving the utilization rate of the MOCVD equipment.

[0053] In an optional embodiment of the present invention, reference Figure 5 , Figure 5 A partial structural diagram of another MOCVD device provided in an embodiment of the present invention. The number of the filtering devices 15 is N, N≥2, and N is a positive integer.

[0054] The N filtering devices 15 are arranged in sequence and at intervals on the pipeline 13 between the MO source 11 and the flow meter 14 .

[0055] Specifically, in the embodiment of the present invention, N filtering devices 15 arranged in sequence are provided on the pipeline 13 between the MO source 11 and the flow meter 14 to achieve the purpose of multiple filtering of impurities in the MO source 11, thereby further extending the service life of the flow meter 14 in the MOCVD equipment, reducing the consumption of the flow meter 14 and the downtime caused by frequent replacement of the flow meter 14, and improving the utilization rate of the MOCVD equipment.

[0056] Furthermore, after one of the filter devices 15 is damaged, there are still other filter devices 15 that can work normally to filter out impurities in the MO source 11 .

[0057] It should be noted that in Figure 5 In the description, N=2 is taken as an example, that is, two filter devices 15 arranged at intervals are arranged on the pipeline 13 between the MO source 11 and the flow meter 14.

[0058] In an optional embodiment of the present invention, reference Figure 6 , Figure 6 A schematic diagram of a filter device according to an embodiment of the present invention; Figure 7 , Figure 7 The filter device 15 includes a mounting chamber 151 and a nut assembly 152, and the mounting chamber 151 has an opening.

[0059] The installation chamber 151 is used for placing the filter element 16 .

[0060] The nut assembly 152 is used to fix the filter element 16 in the installation chamber 151 through the opening. The nut assembly 152 also seals the opening of the installation chamber 151.

[0061] Specifically, in the embodiment of the present invention, the shape of the filter element 16 includes but is not limited to a cylindrical shape; the filter element 16 can be replaced by unscrewing the nut assembly 152 .

[0062] The filter element 16 includes but is not limited to a sintered filter element. In the embodiment of the present invention, the filter element is a sintered filter element as an example for description. The use of a sintered filter element can not only improve the filtering capacity of the filter device 15 but also greatly improve the life of the filter element 16, thereby maximally extending the service life of the flow meter 14 protected by it, so as to achieve the purpose of improving the utilization rate of the MOCVD equipment.

[0063] In an optional embodiment of the present invention, the filtering device 15 may also be a mesh filter gasket.

[0064] Specifically, in the embodiment of the present invention, the screen-type filter gasket has the advantages of being easy to replace and having low cost.

[0065] Obviously, a plurality of filter mesh filter gaskets arranged in sequence can also be set on the pipe 13 between the MO source 11 and the flow meter 14 to achieve the purpose of multiple filtering of impurities in the MO source 11, thereby further extending the service life of the flow meter 14 in the MOCVD equipment, reducing the consumption of the flow meter 14 and the downtime caused by frequent replacement of the flow meter 14, and improving the utilization rate of the MOCVD equipment.

[0066] The technical effects that can be achieved by the technical solution of the present application are further explained below in a comparative manner.

[0067] Technical solution 1 of this application: based on Figure 3 or Figure 4 In terms of the structure, by modifying the pipeline 13 between the MO source 11 and the flow meter 14, an additional Figure 6 The filter device 15 shown in the figure adopts a sintered filter element. In the normal mass production process of growing LEDs, the flow rate through the flow meter 14 is observed to change. It has been stable within the standard range for 13 months. Later, the flow rate decreases and fails to reach the flow rate required by the normal process. By opening the nut assembly 152 and removing the old filter element 16, the flow rate of the flow meter 14 is restored to the normal range after replacing the new filter element 16. At this time, the flow meter 14 does not need to be replaced. Only the filter element 16 needs to be replaced. A restart process is required, which is equivalent to replacing a high-cost flow meter with a low-cost filter element. At the same time, the restart frequency is reduced by 6 times compared with the following prior art solution.

[0068] Technical Solution 2 of this application: By installing a filter-type filter gasket on the pipe 13 between the MO source 11 and the flowmeter 14, in the normal mass production process of growing LEDs, observe the flow change through the flowmeter 14, which has been stable within the standard range for 1 month, and then the flow rate decreases and does not reach the flow rate required by the normal process. After replacing the new filter-type filter gasket, the flow rate of the flowmeter 14 returns to the normal range, and the flowmeter 14 is not damaged. At this time, there is no need to replace the flowmeter 14, only the filter-type filter gasket needs to be replaced, and a re-machine process is required, which is equivalent to replacing the loss of the high-cost flowmeter with the damage of the low-cost gasket.

[0069] Existing technical solution: connect the MO source 11 directly with the flow meter 14, observe the flow change through the flow meter 14 in the normal mass production process of LED growth, and keep it stable within the standard range for 2 months. Then the flow rate decreases and fails to reach the flow rate required by the normal process. At this time, the flow meter 14 is damaged. At this time, the flow meter 14 needs to be replaced, and the MOCVD equipment needs to perform a pipeline venting operation (working time of about six hours), two heavy coating growths (working time of about eighteen hours), and a few-piece test (working time of about four hours) to resume the machine process, which reduces the actual mass production time of the MOCVD equipment and seriously affects the utilization rate of the MOCVD equipment.

[0070] The above is a detailed introduction to a MOCVD device provided by the present invention. Specific examples are used in this article to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only used to help understand the method of the present invention and its core idea. At the same time, for those skilled in the art, according to the idea of ​​the present invention, there will be changes in the specific implementation methods and application scopes. In summary, the content of this specification should not be understood as limiting the present invention.

[0071] It should be noted that each embodiment in this specification is described in a progressive manner, and each embodiment focuses on the differences from other embodiments, and the same or similar parts between the embodiments can be referred to each other. For the device disclosed in the embodiment, since it corresponds to the method disclosed in the embodiment, the description is relatively simple, and the relevant parts can be referred to the method part description.

[0072] It should also be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that the process, method, article or device that includes a series of elements is inherent to the elements, or also includes elements inherent to these processes, methods, articles or devices. In the absence of further restrictions, the elements defined by the sentence "including a..." do not exclude the presence of other identical elements in the process, method, article or device that includes the elements.

[0073] The above description of the disclosed embodiments enables one skilled in the art to implement or use the present invention. Various modifications to these embodiments will be apparent to one skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention will not be limited to the embodiments shown herein, but rather to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A MOCVD device, characterized in that: The MOCVD device comprises: a MO source and a reaction chamber, wherein the MO source and the reaction chamber are connected via a pipeline; A flow meter and a filter device are arranged on the pipeline. The flow meter is arranged on the pipeline between the MO source and the reaction chamber, and the filter device is arranged on the pipeline between the MO source and the flow meter.

2. The MOCVD device according to claim 1, characterized in that: The pipeline comprises: a first part, a second part and a third part connected in sequence; The connecting ends of the first part and the second part have a first angle, and the connecting ends of the second part and the third part have a second angle; The MO source is connected to the first part, and the filtering device is arranged on the third part.

3. The MOCVD device according to claim 2, characterized in that: The length of the second portion ranges from 25 mm to 70 mm; The length of the third portion ranges from 50 mm to 115 mm.

4. The MOCVD device according to claim 2, characterized in that: The angle range of the first angle is 90°-180°; The second angle ranges from 90° to 180°.

5. The MOCVD device according to claim 2, characterized in that: When the number of the flow meters is greater than or equal to two, the angle of the first angle and / or the angle of the second angle is less than 180°.

6. The MOCVD device according to claim 1, characterized in that: The length of the pipeline between the MO source and the filtering device is shorter than the length of the pipeline between the filtering device and the flow meter.

7. The MOCVD device according to claim 1, characterized in that: The number of the filtering devices is N, N ≥ 2, and N is a positive integer; The N filtering devices are arranged in sequence and at intervals on the pipeline between the MO source and the flow meter.

8. The MOCVD device according to any one of claims 1 to 7, characterized in that: The filter device comprises a mounting chamber and a nut assembly, wherein the mounting chamber has an opening; The installation chamber is used to place the filter element; The nut assembly is used to fix the filter element in the installation chamber through the opening.

9. The MOCVD device according to claim 8, characterized in that: The filter element is a sintered filter element.

10. The MOCVD device according to any one of claims 1 to 7, characterized in that: The filtering device is a screen type filtering gasket.