Polishing powder as well as preparation method and application thereof

Abstract

The invention relates to polishing powder as well as a preparation method and application thereof. The polishing powder is prepared from the following raw materials: cerium-based oxide polishing powder, a suspension additive, a dispersing agent, a complexing agent and a defoaming agent, the dispersing agent comprises a copolymer dispersing agent. The polishing powder provided by the invention comprises the cerium-based oxide polishing powder, the suspension additive, the dispersing agent, the complexing agent and the defoaming agent, the dispersing agent forms embedded adsorption on the surfaces of particles of the polishing powder and is more firmly adsorbed on the surface of the powder, and the adsorption between the dispersing agent and the particles cannot be damaged even in water with higher conductivity; and the dispersion effect in various water qualities is not weakened, so that the universality of the polishing powder is remarkably improved. The polishing powder provided by the invention can be dispersed in different water qualities, not only is extremely high in universality, but also is free of hard precipitates and easy to stir in a use process, and is good in secondary dispersion stability.

Description

Technical Field

[0001] The invention relates to the technical field of glass polishing material preparation, and in particular to polishing powder and a preparation method and application thereof. Background Art

[0002] With the upgrading of mobile phones, the development of mobile phone glass has been promoted, and the demand for glass cover plates and protective films has increased, and the surface quality requirements have become higher and higher. Rare earth polishing materials play a very important role in high-tech industries such as modern optics and information. Cerium-based oxide polishing powder is widely used as the polishing powder with the best polishing performance. However, cerium-based oxide polishing powder has a large specific surface area, high specific surface energy, and extremely poor dispersion stability in water.

[0003] In the field of mobile phone glass cover polishing, in order to reduce costs, polishing powder is mostly provided to customers, and customers use water to mix it into slurry for use. However, the water quality used by different customers is different, which will cause the same polishing powder to have different phenomena when used by different customers. Some customers have good suspension stability and no hard precipitation when using it; some customers have poor suspension when using it; and some customers report that the suspension stability is good, but hard precipitation appears at the bottom after standing, and it cannot be stirred for secondary dispersion. Therefore, the existing polishing powder has very poor versatility for different water qualities. Most polishing powder manufacturers will change the ratio of additives according to the customer's water quality and produce different polishing powders to suit the customer, which brings great difficulties to production control.

[0004] At present, in order to improve the dispersion stability of polishing powder in water, additives such as dispersants and suspension aids are added, such as sodium hexametaphosphate and sodium polyacrylate. These dispersants have a good dispersing effect, but such dispersants are linear polymers with extremely long chain structures in aqueous solutions, which can easily form a bridge network between polishing powder particles; and the particle size of polishing powder used for glass cover plates is mostly 1-3μm. The specific gravity of this polishing powder is large, and some large particles are easy to settle, causing the bottom slurry to compact. In addition, this type of dispersant has poor adsorption capacity on the surface of polishing powder particles, and is easily affected by electrolytes in aqueous solutions and falls off from the surface of particles, dissolving evenly in the upper clear liquid, and has poor versatility. Polishing powder modified by this type of dispersant is sensitive to water quality, and the same formula cannot meet the needs of customers with different water quality.

[0005] In the prior art, polishing powder has the problems of inconsistent and poor dispersibility in different water qualities, easy sedimentation and hard precipitation after long-term storage. Therefore, how to provide a polishing powder that can be evenly dispersed in different water qualities and is not easy to settle and compact has become a problem that needs to be solved urgently. Summary of the invention

[0006] In order to solve the above technical problems, the present invention aims to provide a polishing powder and a preparation method and use thereof. The polishing powder provided by the present invention has no hard precipitation at the bottom when dispersed in different water qualities and is easy to stir, promotes secondary dispersion, and has good stability. The polishing powder used in the prior art is solved, and the polishing powder is mixed into a slurry and then stands still, and then hardens at the bottom of the barrel, making it difficult to disperse it again, which has an adverse effect on the subsequent polishing operation.

[0007] To achieve this object, the present invention adopts the following technical solutions:

[0008] In a first aspect, the present invention provides a polishing powder, wherein raw materials for preparing the polishing powder include cerium-based oxide polishing powder, a suspension aid, a dispersant, a complexing agent and a defoaming agent; and the dispersant includes a copolymer dispersant.

[0009] The polishing powder provided by the present invention comprises cerium-based oxide polishing powder, a suspension aid, a dispersant, a complexing agent and a defoaming agent, wherein the dispersant forms a mosaic adsorption on the surface of the polishing powder particles, and is more firmly adsorbed to the surface of the powder. In water with a higher conductivity, the adsorption between the dispersant and the particles will not be destroyed, and the dispersing effect in various water qualities will not be weakened, which significantly improves the versatility of the polishing powder. The copolymer dispersant selected by the present invention firstly ensures that the polishing liquid has a strong versatility. The adsorption of the copolymer dispersant on the surface of the polishing powder particles is a mosaic adsorption, and is firmly adsorbed to the surface of the powder. In water with a higher conductivity, the adsorption between the dispersant and the particles will not be destroyed, and the dispersing effect in various water qualities will not be weakened. Second, the copolymer has a comb-like structure, which is not easy to cause the phenomenon of hard precipitation at the bottom after bridging.

[0010] The suspension aid in the present invention can prevent the sedimentation of polishing powder particles; the complexing agent can soften water quality and form a stable complex with metal ions such as calcium and magnesium in water, thereby improving the chemical properties of metal ions in aqueous solution and reducing the influence of metal ions on suspension; the defoaming agent can reduce the influence of foam in the polishing powder when it is used, which leads to a decrease in polishing performance.

[0011] The polishing powder provided by the present invention can be dispersed in different water qualities, is highly versatile, has no hard precipitation during use, is easy to stir, and has good secondary dispersion stability. The present invention solves the problem that the polishing powder used in the prior art is mixed into a slurry and then solidified at the bottom of the barrel after being left to stand, making it difficult to disperse it again, which has an adverse effect on subsequent polishing operations.

[0012] The following are preferred technical solutions of the present invention, but are not intended to limit the technical solutions provided by the present invention. Through the following preferred technical solutions, the technical objectives and beneficial effects of the present invention can be better achieved and realized.

[0013] Preferably, based on the total mass of the polishing powder as 100wt%, the mass fraction of the dispersant is 0.01wt%-5wt%, for example, it can be 0.01wt%, 0.05wt%, 0.1wt%, 0.2wt%, 0.3wt%, 0.4wt%, 0.5wt%, 0.6wt%, 0.7wt%, 0.8wt%, 0.9wt%, 1wt%, 1.5wt%, 2wt%, 2.5wt%, 3wt%, 3.5wt%, 4wt%, 4.5wt% or 5wt%, but is not limited to the listed values, and other unlisted values ​​within the numerical range are equally applicable.

[0014] The dispersant added in the present invention improves the dispersion stability of the polishing powder in water, is suitable for any water quality, has excellent versatility, and is not prone to causing the phenomenon of hard precipitation at the bottom after bridging. The present invention further controls the mass fraction of the dispersant to 0.01wt%-5wt% to achieve a more excellent polishing effect. If the mass fraction of the dispersant is too high, it will cause silt that tends to become compacted at the bottom, which will cause compaction after being left for too long. If the mass fraction of the dispersant is too low, the suspension effect of the polishing powder will deteriorate.

[0015] Preferably, based on the total mass of the polishing powder as 100wt%, the mass fraction of the suspension aid is 1wt%-10wt%, for example, it can be 1wt%, 2wt%, 3wt%, 4wt%, 5wt%, 6wt%, 7wt%, 8wt%, 9wt% or 10wt%, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0016] The suspension aid added in the present invention forms a network structure in water, effectively preventing the polishing powder particles with a large specific gravity from sinking to the bottom, and plays a role in suspension assistance and anti-precipitation. The present invention further controls the mass fraction of the suspension aid to be 1wt%-10wt% to achieve a more excellent polishing effect. If the mass fraction of the suspension aid added is too high, silt tending to be compacted will be caused at the bottom, which will cause compaction after being left for too long. If the mass fraction of the suspension aid added is too low, the suspension effect of the polishing powder will deteriorate.

[0017] Preferably, based on the total mass of the polishing powder as 100wt%, the mass fraction of the complexing agent is 0.1wt%-1wt%, for example, it can be 0.1wt%, 0.2wt%, 0.3wt%, 0.4wt%, 0.5wt%, 0.6wt%, 0.7wt%, 0.8wt%, 0.9wt% or 1wt%, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0018] Preferably, based on the total mass of the polishing powder as 100wt%, the mass fraction of the defoaming agent is 0.01wt%-0.5wt%, for example, it can be 0.01wt%, 0.02wt%, 0.05wt%, 0.1wt%, 0.15wt%, 0.2wt%, 0.25wt%, 0.3wt%, 0.35wt%, 0.4wt%, 0.45wt% or 0.5wt%, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0019] Preferably, the dispersant comprises a copolymer dispersant.

[0020] Preferably, the copolymer dispersant comprises any one of poly(methyl methacrylate)-poly(ethyl acrylate) copolymer, poly(styrene-acrylic acid) copolymer, polyethylene-poly(methyl acrylate) copolymer, polystyrene-poly(ethylene glycol) copolymer or polyethylene glycol-poly(N-vinyl pyrrolidone), or a combination of at least two thereof. Typical but non-limiting combinations include a combination of poly(methyl methacrylate)-poly(ethyl acrylate) copolymer and poly(styrene-acrylic acid) copolymer, a combination of polyethylene-poly(methyl acrylate) copolymer and polystyrene-poly(ethylene glycol) copolymer, a combination of polystyrene-poly(ethylene glycol) copolymer and polyethylene glycol-poly(N-vinyl pyrrolidone), a combination of poly(methyl methacrylate)-poly(ethyl acrylate) copolymer and polyethylene-poly(methyl acrylate) copolymer, preferably poly(methyl methacrylate)-poly(ethyl acrylate) copolymer and / or poly(styrene-acrylic acid) copolymer.

[0021] The copolymer dispersant used in the present invention forms a chimeric adsorption on the surface of the polishing powder particles, and is firmly adsorbed on the surface of the powder. The adsorption between the dispersant and the particles will not be destroyed in water with high conductivity, and the dispersing effect in various water qualities will not be weakened. Compared with the currently commonly used dispersants, such as sodium hexametaphosphate, sodium polyacrylate, etc., this type of dispersant is a linear polymer with an extremely long chain structure in an aqueous solution, which can easily form a bridge network between the polishing powder particles and easily cause hard precipitation. In addition, in a suspension system with different water qualities, it is easily affected by the electrolyte in the aqueous solution and falls off from the particle surface, which is unfavorable to the dispersion effect of the polishing powder.

[0022] Preferably, the average particle size of the cerium-based oxide polishing powder is 1 μm-3 μm, for example, 1 μm, 1.5 μm, 2 μm, 2.5 μm or 3 μm, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0023] Preferably, the suspending aid comprises any one of bentonite, kaolin, attapulgite, cellulose, fumed silica, gelatin or chitosan, or a combination of at least two thereof. Typical but non-limiting combinations include a combination of bentonite and kaolin, a combination of attapulgite and cellulose, a combination of fumed silica, gelatin and chitosan, and a combination of kaolin, attapulgite and cellulose.

[0024] Preferably, the defoaming agent comprises polydimethylsiloxane and / or a silicone defoaming agent.

[0025] The organosilicon defoaming agent used in the present invention includes polyether-modified organosilicon.

[0026] The present invention adds a defoaming agent to the polishing powder, which can reduce the serious foaming caused by the stirring process of some selected dispersants, such as polyethylene glycol-poly (N-vinyl pyrrolidone). If the foam is very serious and cannot be eliminated in time, it will also affect the polishing workshop; on the other hand, since polishing brushes and polishing blankets are used in the polishing process of the glass cover plate and the protective sheet, foam will be generated in the polishing process, and the foam in the polishing process will lead to a decrease in polishing performance. Therefore, the defoaming agent is added to ensure the polishing effect.

[0027] Preferably, the complexing agent includes any one of ethylenediaminetetraacetic acid, disodium ethylenediaminetetraacetate, sodium ethylenediaminetetramethylene phosphate, polymaleic anhydride or tetrasodium glutamate oxalate, or a combination of at least two thereof. Typical but non-limiting combinations include a combination of ethylenediaminetetraacetic acid and disodium ethylenediaminetetraacetate, a combination of sodium ethylenediaminetetramethylene phosphate and polymaleic anhydride, a combination of polymaleic anhydride and tetrasodium glutamate oxalate, and a combination of ethylenediaminetetraacetic acid, disodium ethylenediaminetetraacetate and sodium ethylenediaminetetramethylene phosphate.

[0028] The addition of the complexing agent in the present invention improves the versatility and anti-hard precipitation ability of the polishing liquid. The complexing agent can form a stable complex with metal ions such as calcium and magnesium in water, thereby improving the chemical properties of the metal ions in the aqueous solution, softening the water quality, and reducing the influence of the metal ions on the suspension. The inventors have found that the complexing agent also has a certain effect on improving the polishing rate.

[0029] In a second aspect, the present invention provides a method for preparing the polishing powder according to the first aspect, the preparation method comprising the following steps:

[0030] The cerium-based oxide polishing powder, dispersant, suspension aid, complexing agent and defoaming agent are uniformly mixed according to mass ratio to obtain the polishing powder.

[0031] Preferably, the suspending aid is swollen to a colloidal state with water before use.

[0032] The main purpose of swelling the suspension aid with water to a colloidal state before use is to improve the suspension and stability of the polishing powder. After swelling in water, the suspension aid forms a colloidal state, so that the suspension aid effect can be exerted more quickly, and the cerium dioxide particles can be effectively dispersed to prevent the particles from settling and agglomerating in the polishing liquid. In addition, some suspension aids have a slow hydration rate, and will form clumps and float on the surface of the slurry when directly added to water. Dissolving them in water to a colloidal state in advance can prevent this phenomenon from occurring. This dispersion effect helps to maintain the uniformity and stability of the polishing liquid, thereby providing a more consistent polishing effect during the polishing process. In addition, the present invention can also first mix the polishing powder and the powder additive, and then add the liquid additive to the mixture.

[0033] In a third aspect, the present invention provides a use of the polishing powder as described in the first aspect, wherein the polishing powder is used in the field of polishing glass cover plates.

[0034] The polishing powder provided by the present invention can be used in the field of glass cover polishing to effectively remove impurities and pollution, and more importantly, can be applied to different water qualities, has excellent dispersibility and stability, and is highly versatile.

[0035] The numerical range described in the present invention not only includes the point values ​​listed above, but also includes any point values ​​between the above numerical ranges that are not listed. Due to space limitations and for the sake of simplicity, the present invention no longer exhaustively lists the specific point values ​​included in the range.

[0036] Compared with the prior art, the present invention has at least the following beneficial effects:

[0037] (1) The polishing powder provided by the present invention comprises cerium-based oxide polishing powder, a suspension aid, a dispersant, a complexing agent and a defoaming agent, wherein the dispersant is embedded and adsorbed on the surface of the polishing powder particles, and is more firmly adsorbed on the surface of the powder. The adsorption between the dispersant and the particles will not be destroyed in water with high conductivity, and the dispersing effect in various water qualities is not weakened, thereby significantly improving the versatility of the polishing powder.

[0038] (2) The polishing powder provided by the present invention can be dispersed in different water qualities, and is not only highly versatile, but also has no hard precipitation during use and is easy to stir, and has good secondary dispersion stability. This solves the problem that the polishing powder used in the prior art is mixed into a slurry and then left to stand, which causes a hardening at the bottom of the barrel and is difficult to disperse secondary, thus causing an adverse effect on subsequent polishing operations. The polishing powder provided by the present invention can be used in the field of glass cover polishing to effectively remove impurities and pollution, and more importantly, it can be applied to different water qualities, has excellent dispersibility and stability, and is highly versatile. DETAILED DESCRIPTION

[0039] The technical solution of the present invention is further described below by specific implementation methods. However, the following examples are only simplified examples of the present invention and do not represent or limit the scope of protection of the present invention. The scope of protection of the present invention shall be subject to the claims.

[0040] In the following examples and comparative examples, unless otherwise specified, all reagents and consumables were purchased from conventional reagent manufacturers in the field; unless otherwise specified, the experimental methods and technical means used were conventional methods and means in the field.

[0041] Example 1

[0042] The present embodiment provides a polishing powder, in which the total mass of the raw materials for preparing the polishing powder is 100wt%, the mass fraction of kaolin is 1wt%, the mass fraction of poly(methyl methacrylate)-poly(ethyl acrylate) copolymer (Hubei Changyao Biotechnology Co., Ltd.) is 0.5wt%, the mass fraction of ethylenediaminetetraacetic acid is 0.2wt%, the mass fraction of defoaming agent polydimethylsiloxane (Guangdong Zhongke Hongtai New Materials Co., Ltd.) is 0.05wt%, and the balance is cerium-based oxide polishing powder;

[0043] The method for preparing the polishing powder provided in this embodiment comprises the following steps:

[0044] The polishing powder and the suspension aid are first put into a mixer according to the mass ratio and dry-mixed evenly, and then the dispersant, the complexing agent and the defoaming agent are added in sequence and stirred. After the materials are mixed evenly, the polishing powder can be obtained.

[0045] Example 2

[0046] The present embodiment provides a polishing powder, wherein the total mass of the raw materials for preparing the polishing powder is 100wt%, the mass fraction of fumed silica is 2wt%, the mass fraction of poly(styrene-acrylic acid) copolymer (VOK, Germany) is 0.6wt%, the mass fraction of ethylenediaminetetraacetic acid is 0.4wt%, the mass fraction of defoaming agent polydimethylsiloxane (Guangdong Zhongke Hongtai New Materials Co., Ltd.) is 0.05wt%, and the balance is cerium-based oxide polishing powder;

[0047] The method for preparing the polishing powder provided in this embodiment comprises the following steps:

[0048] The polishing powder and the suspension aid are first put into a mixer according to the mass ratio and dry-mixed evenly, and then the dispersant, the complexing agent and the defoaming agent are added in sequence and stirred. After the materials are mixed evenly, the polishing powder can be obtained.

[0049] Example 3

[0050] The present embodiment provides a polishing powder, wherein the total mass of the raw materials for preparing the polishing powder is 100wt%, the mass fraction of fumed silica is 5wt%, the mass fraction of poly(styrene-acrylic acid) copolymer (VOK, Germany) is 1wt%, the mass fraction of ethylenediaminetetraacetic acid is 0.6wt%, the mass fraction of defoaming agent polydimethylsiloxane (Guangdong Zhongke Hongtai New Materials Co., Ltd.) is 0.1wt%, and the balance is cerium-based oxide polishing powder;

[0051] The method for preparing the polishing powder provided in this embodiment comprises the following steps:

[0052] The cerium-based oxide polishing powder, dispersant, suspension aid, complexing agent and defoaming agent are uniformly mixed according to mass ratio to obtain the polishing powder.

[0053] Example 4

[0054] This embodiment provides a polishing powder, which differs from Embodiment 1 only in that the mass fraction of the poly(methyl methacrylate)-poly(ethyl acrylate) copolymer in the raw material for preparing the polishing powder is 0.005wt%, and the reduced mass is proportionally distributed to the cerium-based oxide polishing powder, the suspension aid, the complexing agent and the defoaming agent, and the preparation method remains unchanged.

[0055] Example 5

[0056] This embodiment provides a polishing powder, which differs from Embodiment 1 only in that the mass fraction of the poly(methyl methacrylate)-poly(ethyl acrylate) copolymer in the raw material for preparing the polishing powder is 10wt%, the mass fractions of the cerium-based oxide polishing powder, the suspension aid, the complexing agent and the defoaming agent are reduced proportionally, and the preparation method remains unchanged.

[0057] Example 6

[0058] This embodiment provides a polishing powder, which is different from Embodiment 1 only in that the mass fraction of kaolin in the raw material for preparing the polishing powder is 0.1wt%, and the reduced mass is proportionally distributed to the cerium-based oxide polishing powder, dispersant, complexing agent and defoaming agent, and the preparation method remains unchanged.

[0059] Example 7

[0060] This embodiment provides a polishing powder, which is different from Embodiment 1 only in that the mass fraction of kaolin in the raw material for preparing the polishing powder is 20wt%, the mass fractions of cerium-based oxide polishing powder, dispersant, complexing agent and defoaming agent are reduced proportionally, and the preparation method remains unchanged.

[0061] Comparative Example 1

[0062] This comparative example provides a polishing powder, which is different from Example 1 only in that the poly(methyl methacrylate)-poly(ethyl acrylate) copolymer is replaced with an equal amount of maleic acid acrylic acid copolymer (Shandong Taihe Technology Co., Ltd.) in the raw material for preparing the polishing powder.

[0063] Comparative Example 2

[0064] This comparative example provides a polishing powder, which is different from Example 1 only in that the poly(methyl methacrylate)-poly(ethyl acrylate) copolymer is replaced by an equal amount of sodium polyacrylate (The Dow Chemical Company, USA) in the raw material for preparing the polishing powder.

[0065] Comparative Example 3

[0066] This comparative example provides a polishing powder, which is different from Example 1 only in that no complexing agent ethylenediaminetetraacetic acid is added to the raw material for preparing the polishing powder, and the excess mass fraction is distributed to kaolin, poly(methyl methacrylate)-poly(ethyl acrylate) copolymer, defoaming agent and cerium-based oxide polishing powder according to proportion.

[0067] Test method: The polishing powder prepared in the above embodiments and comparative examples was tested. The prepared polishing powder was prepared and mixed with 10μS / cm, 150μS / cm, and 300μS / cm conductivity water to form a polishing slurry with a concentration of 10wt%. The stability was tested after different periods of time. The test results are shown in Table 1 below.

[0068] Table 1

[0069]

[0070] Note: "OK" means good stability, easy dispersion and no precipitation; "hard precipitation" means it cannot be stirred at all and cannot be dispersed again.

[0071] The test results show that:

[0072] (1) It can be seen from Examples 1 to 3 that the polishing powder provided by the present invention includes cerium-based oxide polishing powder, a suspension aid, a dispersant, a complexing agent and a defoaming agent, wherein the dispersant is embedded and adsorbed on the surface of the polishing powder particles, and is more firmly adsorbed on the surface of the powder. The adsorption between the dispersant and the particles will not be destroyed in water with high conductivity, and the dispersing effect in various water qualities is not weakened, which significantly improves the versatility of the polishing powder. The polishing powder provided by the present invention is suitable for different water qualities, has excellent dispersibility and stability, and is extremely versatile. It can be dispersed in different water qualities, has no hard precipitation during use, is easy to stir, and has good secondary dispersion stability.

[0073] (2) By comparing Example 1 with Example 4-Example 5, it can be seen that the dispersant added in the present invention improves the dispersion stability of the polishing powder in water, is applicable to any water quality, has excellent versatility, and is not prone to causing the phenomenon of hard precipitation at the bottom after bridging. The present invention further controls the mass fraction of the dispersant to 0.01wt%-5wt% to achieve a more excellent polishing effect. If the mass fraction of the dispersant is too high, it will cause silt that tends to become compacted at the bottom, which will cause compaction after being left for too long. If the mass fraction of the dispersant is too low, the suspension effect of the polishing powder will deteriorate.

[0074] (3) By comparing Example 1 with Example 6-Example 7, it can be seen that the suspension aid added in the present invention forms a network structure in water, which effectively prevents the polishing powder particles with a large specific gravity from sinking to the bottom, and plays a role in assisting suspension and preventing precipitation. The present invention further controls the mass fraction of the suspension aid to be 1wt%-10wt% to achieve a better polishing effect. If the mass fraction of the suspension aid added is too high, it will cause silt that tends to compact at the bottom, which will cause compaction after being left for too long. If the mass fraction of the suspension aid added is too low, the suspension effect of the polishing powder will deteriorate.

[0075] (4) It can be seen from Example 1 and Comparative Examples 1-2 that conventional dispersants have poor versatility and can only be adjusted according to the water quality to achieve a state of good suspension and no agglomeration. Otherwise, it is easy to agglomerate at the bottom when the conductivity is low, and the suspension is very poor when the conductivity is high. After 48 hours of standing, precipitation is easy to occur, and the stability and dispersibility are poor.

[0076] (5) It can be seen from Example 1 and Comparative Example 3 that when the complexing agent is not added in the present invention, the suspending agent is likely to form a combination with metal ions such as calcium and magnesium in water and precipitate, which is not conducive to the stability of the polishing liquid and is not conducive to secondary dispersion.

[0077] In summary, the polishing powder provided by the present invention includes cerium-based oxide polishing powder, a suspension aid, a dispersant, a complexing agent and a defoaming agent, wherein the copolymer dispersant is embedded and adsorbed on the surface of the polishing powder particles, and is more firmly adsorbed on the surface of the powder. The adsorption between the dispersant and the particles will not be destroyed in water with high conductivity, and the dispersing effect in various water qualities is not weakened, which significantly improves the versatility of the polishing powder. The polishing powder provided by the present invention is suitable for different water qualities, has excellent dispersibility and stability, and is extremely versatile. It can be dispersed in different water qualities, has no hard precipitation during use, is easy to stir, and has good secondary dispersion stability.

[0078] The applicant declares that the above is only a specific implementation mode of the present invention, but the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily thought of by those skilled in the art within the technical scope disclosed by the present invention shall fall within the protection scope and disclosure scope of the present invention.

Claims

1. A polishing powder, characterized in that: The raw materials for preparing the polishing powder include cerium-based oxide polishing powder, a suspension aid, a dispersant, a complexing agent and a defoaming agent; and the dispersant includes a copolymer dispersant.

2. The polishing powder according to claim 1, characterized in that Based on the total mass of the polishing powder as 100wt%, the mass fraction of the suspension aid is 1wt%-10wt%; the mass fraction of the dispersant is 0.01wt%-5wt%, the mass fraction of the complexing agent is 0.1wt%-1wt%, the mass fraction of the defoaming agent is 0.01wt%-0.5wt%, and the remainder is cerium-based oxide polishing powder.

3. The polishing powder according to claim 1 or 2, characterized in that: The copolymer dispersant includes any one of poly(methyl methacrylate)-poly(ethyl acrylate) copolymer, poly(styrene-acrylic acid) copolymer, polyethylene-poly(methyl acrylate) copolymer, polystyrene-poly(ethylene glycol) copolymer or polyethylene glycol-poly(N-vinyl pyrrolidone) or a combination of at least two thereof.

4. The polishing powder according to claim 1, characterized in that The average particle size of the cerium-based oxide polishing powder is 1 μm-3 μm.

5. The polishing powder according to claim 1, characterized in that The suspension aid includes any one of bentonite, kaolin, attapulgite, cellulose, fumed silica, gelatin or chitosan, or a combination of at least two of them.

6. The polishing powder according to claim 1, characterized in that The complexing agent includes any one of ethylenediaminetetraacetic acid, disodium ethylenediaminetetraacetate, sodium ethylenediaminetetramethylenephosphate, polymaleic anhydride or tetrasodium glutamate oxalate, or a combination of at least two thereof.

7. The polishing powder according to claim 1, characterized in that The defoaming agent includes polydimethylsiloxane and / or an organosilicon defoaming agent.

8. A method for preparing the polishing powder according to any one of claims 1 to 7, characterized in that: The preparation method comprises the following steps: The cerium-based oxide polishing powder, the suspension aid, the dispersant, the complexing agent and the defoaming agent are uniformly mixed according to the mass ratio to obtain the polishing powder.

9. The method for preparing the polishing powder according to claim 8, characterized in that: The suspension aid is swollen into a colloidal state with water before use.

10. Use of the polishing powder according to any one of claims 1 to 7, characterized in that: The polishing powder is used in the field of glass cover plate polishing.

Images