DBD plasma reactor

Abstract

The application provides a DBD plasma reactor, which comprises a reaction tube, wherein an inner electrode connected with a high-voltage electrode is arranged in the reaction tube, an outer electrode connected with a grounding electrode is arranged outside the reaction tube, a discharge area between the inner electrode and the outer electrode is formed in the reaction tube, and the discharge area is used for generating plasma; and a reaction groove below the inner electrode is further arranged in the reaction tube, and a solid or liquid substrate is accommodated in the reaction groove, and the plasma generated in the discharge area reacts with the substrate in the reaction groove. The DBD plasma reactor can solve the problems that the existing dielectric barrier discharge plasma reactor cannot control the temperature of the reaction area and cannot realize the preparation of the plasma participating in the multiphase reaction.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of plasma reaction, more particularly, to a DBD plasma reactor. BACKGROUND

[0002] The plasma reactor is a kind of instrument and equipment that realizes chemical reaction by generating plasma and interacting with other substances. The plasma reactor has the characteristics of good fluidity, strong diffusion, fast reaction speed and low energy consumption, and can be used for the synthesis of high-purity products or special functional materials.

[0003] Dielectric barrier discharge (DBD) plasma is a kind of gas discharge phenomenon by putting insulating medium into discharge space, and the dielectric barrier discharge plasma is characterized by uniform, diffuse and stable discharge. At atmospheric pressure, this kind of gas discharge presents micro-channel discharge structure, and micro-discharge is carried out through discharge filaments in discharge space and time, each micro-discharge time is very short, and it has the characteristics of large space uniform discharge of glow discharge and high pressure operation of corona discharge.

[0004] At present, the structures of dielectric barrier discharge plasma reactors usually have planar electrode structure and coaxial electrode structure. Related research shows that increasing the volume of the discharge area of the reactor can improve the discharge effect. The planar electrode structure mainly refers to the parallel plate-plate reactor, which has the characteristics of uniform and stable discharge, but the increase of the discharge area volume of the plate-plate reactor is difficult due to the limitations of production process and insulation process. The sleeve reactor in the coaxial structure reactor can obtain a larger discharge area volume by increasing the axial and radial dimensions of the dielectric tube, and a small curvature radius of the inner electrode can obtain a larger electric field strength, which is beneficial to gas discharge. At the same time, the plate-plate reactor cannot meet the requirements of large capacity treatment due to its small discharge area volume, while the coaxial reactor can well meet the requirements of large capacity treatment due to its large discharge area volume.

[0005] However, the existing dielectric barrier discharge plasma reactor still has the following technical problems:

[0006] 1. Most of the existing dielectric barrier discharge plasma reactors cannot carry out plasma-liquid and solid reactions; 2. The existing dielectric barrier discharge plasma reactor cannot control the temperature of the reaction area, so that many organic reactions cannot be accurately controlled; 3. Most of the existing dielectric barrier discharge plasma reactors use relatively thin pipelines for reaction, which cannot carry a large amount of substrate, and the existing dielectric barrier discharge plasma reactor does not realize the cooling and temperature control of the reaction area, so that the substrate is prone to side reactions, resulting in that most of the existing technologies can only be used for analysis level experiments, and cannot realize the synthesis of a large amount of target product in preparation level.

[0007] Therefore, there is an urgent need for a preparation level plasma-liquid and solid reactor capable of precisely controlling the temperature of the reaction region. SUMMARY

[0008] In view of the above problems, the purpose of the present application is to provide a DBD plasma reactor to solve the problem that the existing dielectric barrier discharge plasma reactor cannot control the temperature of the reaction region and cannot realize the preparation level plasma and substrate reaction.

[0009] The DBD plasma reactor provided by the present application comprises a reaction tube, wherein an inner electrode connected with a high-voltage electrode is arranged in the reaction tube, an outer electrode connected with a grounding electrode is arranged outside the reaction tube, a discharge region between the inner electrode and the outer electrode is formed in the reaction tube, and the discharge region is used for generating plasma; and

[0010] A reaction tank below the inner electrode is further arranged in the reaction tube, a substrate is accommodated in the reaction tank, and the plasma generated in the discharge region reacts with the substrate.

[0011] In addition, preferably, an annular temperature control sleeve surrounding the discharge region and the reaction tank is arranged outside the reaction tube, and a conductive liquid is loaded in the annular temperature control sleeve.

[0012] In addition, preferably, the conductive liquid is connected with the grounding electrode, and the annular temperature control sleeve and the conductive liquid inside the annular temperature control sleeve jointly constitute the outer electrode.

[0013] In addition, preferably, a circulating temperature control pipe is communicated with the annular temperature control sleeve, a circulating temperature control pump is arranged on the circulating temperature control pipe, and the conductive liquid is circulated and temperature-controlled by the circulating temperature control pipe and the circulating temperature control pump.

[0014] In addition, preferably, an air inlet pipe and an air outlet pipe are further connected with the reaction tube, and a gas medium flows into the reaction tube through the air inlet pipe and flows out of the reaction tube through the air outlet pipe; and

[0015] The gas medium flowing through the discharge region generates the plasma under the action of the outer electrode and the inner electrode.

[0016] In addition, preferably, the inner electrode comprises a first conductor rod and a conductor column connected with the lower end of the first conductor rod, wherein the upper end of the first conductor rod extends to the outside of the upper end of the reaction tube and is connected with the high-voltage electrode, the annular temperature control sleeve surrounds the conductor column, and the region between the conductor column and the annular temperature control sleeve in the reaction tube forms the discharge region.

[0017] In addition, preferably, the reaction tube and the conductor column are in cylindrical structure, and the annular temperature control sleeve is in ring structure.

[0018] The reaction tube, the conductor column and the annular temperature control sleeve are coaxially arranged.

[0019] In addition, preferably, a second conductor rod is arranged on the annular temperature control sleeve, the lower part of the second conductor rod is in contact with the circulating temperature control liquid, and the upper end of the second conductor rod is connected with an external grounding electrode.

[0020] In addition, preferably, the first conductor rod and the second conductor rod are both copper rods, the conductor column is a copper column, and the reaction tube is a quartz tube.

[0021] In addition, preferably, a boss corresponding to the conductor column is arranged in the middle part of the reaction tank, and the substrate is accommodated in the gap between the reaction tank and the boss.

[0022] Compared with the prior art, the DBD plasma reactor according to the present application has the following beneficial effects:

[0023] The DBD plasma reactor provided by the present application can make the plasma generated in the discharge area flow into the reaction tank with the gas to realize the reaction between the plasma and the substrate, and a large amount of substrate can be carried in the reaction tank, and the reaction can be controlled by the temperature through the annular temperature control sleeve arranged outside the reaction area, so that the synthesis of the target product can be realized at the preparation level.

[0024] To achieve the above and related objects, one or more aspects of the application include the features that will be explained in detail below and particularly pointed out in the claims. The following description and the accompanying drawings explain certain illustrative aspects of the application in detail. However, these aspects indicate only some of the ways in which the principles of the application can be employed. In addition, the application is intended to include all such aspects and their equivalents. BRIEF DESCRIPTION OF DRAWINGS

[0025] Other objects and results of the present application will become more apparent and easy to understand through reference to the following description of the application taken in conjunction with the accompanying drawings. In the drawings:

[0026] Figure 1 The structural principle diagram of the DBD plasma reactor provided by the embodiment of the present application is shown;

[0027] Figure 2 The structural enlarged view of the reaction tank position in the DBD plasma reactor provided by the preferred embodiment of the present application is shown.

[0028] Figure 3 Fig. 4 shows a structure enlarged view of the boss position in the DBD plasma reactor provided by another preferred embodiment of the present application;

[0029] Fig. 1 shows a DBD plasma reactor provided by an embodiment of the present application, wherein the same reference numerals in all the figures indicate similar or corresponding features or functions.

[0030] The same reference numerals in all the figures indicate similar or corresponding features or functions. DETAILED DESCRIPTION

[0031] In the following description, for the purposes of explanation, numerous specific details are set forth in order to provide a thorough understanding of one or more embodiments. It is apparent, however, that the embodiments can be practiced without these specific details. In other instances, well-known structures and devices are shown in block diagram form in order to facilitate describing one or more embodiments.

[0032] In the description of the present application, it is necessary to point out that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application; the terms "first", "second", "third" are only for the purpose of description, and cannot be understood as indicating or implying relative importance; in addition, unless otherwise explicitly specified and limited, the terms "mounting", "connection", "connecting" should be understood in a broad sense, for example, can be fixed connection, can also be detachable connection, or integrally connected; can be mechanical connection, can also be electrical connection; can be directly connected, can also be indirectly connected through an intermediate medium, can be the communication inside two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0033] Figure 1 Fig. 4 shows a structure enlarged view of the boss position in the DBD plasma reactor provided by another preferred embodiment of the present application; Figure 1The DBD plasma reactor provided by the application comprises a reaction tube 1 as a reaction container, and the generation of plasma and the reaction of plasma and substrate are both carried out in the reaction tube 1. Specifically, in order to generate plasma in the inside of the reaction tube 1, an inner electrode connected with an external high-voltage electrode is arranged in the reaction tube 1, and an outer electrode connected with an external grounding electrode is arranged outside the reaction tube 1. The inner electrode is connected with the high-voltage electrode, and has a large potential difference with the outer electrode connected with the grounding electrode, so that a strong electric field is formed between the inner electrode and the outer electrode, thereby forming a discharge area between the inner electrode and the outer electrode in the reaction tube 1. The strong electric field promotes the directional high-speed movement of electrons in the discharge area. The electrons with large kinetic energy are called high-energy electrons. When the high-energy electrons collide with gas molecules of a gas medium in the discharge area, energy transfer occurs, and a part of the gas is activated to generate charged active intermediate species. The high-energy electrons and the generated charged active intermediate species jointly constitute plasma. In order to realize the controllable reaction of plasma and substrate, a reaction groove 8 is further arranged below the inner electrode in the reaction tube 1, and a substrate (liquid or solid reaction substrate) is accommodated in the reaction groove 8. The reaction groove 8 is not in the plasma generation area. The plasma generated in the discharge area contacts the substrate in the reaction groove under the action of gas flow and occurs corresponding chemical reaction (here, the essence is that the active intermediate species in the plasma reacts with the substrate in the reaction groove), thereby completing the two reactions in the inside of the reaction tube 1.

[0034] The DBD plasma reactor provided by the application can effectively increase the contact area of the reaction groove 8 and plasma and improve the preparation efficiency by designing the reaction groove 8 below the inner electrode in the reactor.

[0035] Further, Figure 2 An enlarged structure of the position of the reaction groove 8 in the DBD plasma reactor provided by the preferred embodiment of the application is shown, which is Figure 2It can be known that the DBD plasma reactor provided in the embodiment is further provided with a boss 10 corresponding to the conductor column 6 in the middle of the reaction tank 8, and the liquid substrate is contained in the gap between the reaction tank 8 and the boss 10. Through the arrangement, the substrate can be distributed around the boss 10 and aligned with the plasma generated around the conductor column 6 (i.e. the discharge area) up and down, so that the substrate can better contact the active intermediate species in the plasma generated in the upper part, the reaction area of the plasma and the substrate is more concentrated, the energy utilization rate and the production per unit time are increased, and the reaction can be carried out on a production scale. In addition, for the discharge area, an uneven electric field will be generated at the edge of the conductor column 6. Such electric field will produce an Abbe-Brown effect and generate a certain thrust, so that the substrate in the reaction tank 8 is disturbed, and the mixing effect can be achieved without magnetic particles, thereby facilitating uniform reaction. Of course, whether the boss 10 is arranged in the middle of the reaction tank 8 can be selected according to actual needs. The boss can be arranged or not arranged.

[0036] It should be noted that, during the generation of the plasma in the discharge area, a large amount of heat will be generated. In order to prevent the organic matter (i.e. the substrate in the reaction tank 8) from reacting at high temperature, in one preferred embodiment of the application, a ring-shaped temperature control sleeve 7 surrounding the discharge area and the reaction tank 8 can be arranged outside the reaction tube 1, and the ring-shaped temperature control sleeve 7 is filled with conductive liquid. The ring-shaped temperature control sleeve 7 cooperates with the conductive liquid to timely control the temperature of the discharge area and the reaction tank 8, so as to accurately and effectively control the temperature of the reaction area (the discharge area and the reaction tank 8) in the reaction tube 1, which is helpful for the selective reaction and avoids the occurrence of side reactions at high temperature.

[0037] In addition, Figure 3 The structure of the boss position in the DBD plasma reactor provided in another preferred embodiment of the application is shown in a structure enlarged view. Figure 3 In order to ensure that the conductor column 6 and the reaction tank are coaxial, the boss 10 can be arranged at the center of the reaction tank 8, and then a positioning hole 11 is arranged at the center of the upper surface of the boss 10. A positioning part is arranged at the center of the lower surface of the conductor column 6, and the positioning part is fixed in the positioning hole 11, so as to achieve the required coaxial arrangement.

[0038] Further, to realize the temperature control circulation of the conductive liquid in the annular temperature control sleeve 7, a circulating temperature control pipe 5 can be connected to the annular temperature control sleeve 7, and a circulating temperature control pump 9 is arranged on the circulating temperature control pipe 5. The conductive liquid in the circulating temperature control pipe 5 and the annular temperature control sleeve 7 can flow through the circulating temperature control pump 9 to realize the temperature control circulation of the conductive liquid. In addition, the temperature of the conductive liquid controlled by the circulating temperature control pump 9 can further accurately control the temperature of the reaction area in the reaction tube 1, so as to complete the required reaction at any specified temperature.

[0039] It should be noted that, to improve the integration of the DBD plasma reactor provided by the present application, the conductive liquid can be directly connected to the external ground electrode, so that the annular temperature control sleeve 7 (which can be made of metal) and the conductive liquid inside it together serve as the external electrode in the DBD plasma reactor provided by the present application, which can save the operation of separately manufacturing the external electrode and ingeniously reduce redundant components.

[0040] In addition, to realize the gas flow in the reaction tube 1, an inlet pipe 4 and an outlet pipe 3 are further connected to the reaction tube 1. The gas medium flows into the reaction tube 1 through the inlet pipe 4 and flows out through the outlet pipe 3, and the flow rate of the gas medium is adjusted to maintain a slight positive pressure inside the whole reaction tube 1. This facilitates the gas flow in the reaction tube 1; and the gas medium flowing through the discharge area is activated to generate charged active intermediate species under the action of high-energy electrons, and the high-energy electrons and the charged active intermediate species together constitute the plasma.

[0041] It should be noted that the gas medium serves as both a flow carrier of the plasma to drive the plasma from the discharge area to the reaction tank 8 for reaction and a reactant to collide with high-energy electrons in the discharge area to generate charged active intermediate species. The generated charged active intermediate species ultimately reacts with the liquid substrate in the reaction tank 8. For the gas medium introduced into the DBD plasma reactor provided by the present application, it can be selected according to the reaction to be performed, including but not limited to nitrogen, oxygen, helium, methane, acetylene and their mixed gases.

[0042] In a specific embodiment of the present application, to realize the manufacturing of the inner electrode, the inner electrode can include an elongated first conductor rod 2 and a short and fat conductor column 6 connected to the lower end of the first conductor rod 2. The upper end of the first conductor rod 2 extends to the outside of the upper end of the reaction tube 1 (i.e. extends to the outside of the reaction tube 1) and is connected to the high-voltage electrode. The annular temperature control sleeve 7 surrounds the conductor column 6, and the conductor column 6 serves as the main body of the inner electrode (i.e. the part corresponding to the external electrode). The area in the reaction tube 1 between the conductor column 6 and the annular temperature control sleeve 7 (which refers to the external electrode) forms the discharge area.

[0043] It should be noted that since the region between the conductor column 6 and the annular temperature control sleeve 7 forms the discharge area, in the actual manufacturing process, the size of the discharge area can be adjusted by controlling the size and position of the conductor column 6, for example, by increasing the length of the conductor column 6, the facing area of the conductor column 6 and the annular temperature control sleeve 7 can be increased, thereby increasing the size of the discharge area, and the amount of substances participating in the reaction in the discharge area per unit time can be increased.

[0044] It should be further noted that for the conductor column 6, the size of the discharge area can also be adjusted by changing the geometric shape (such as cylindrical, prismatic, etc.), surface texture (smooth, threaded, thorn-shaped, tooth-shaped, etc.), roughness, etc. of the conductor column 6, and the amount of substances participating in the reaction in the discharge area per unit time can be controlled.

[0045] In addition, in order to realize the connection of the annular temperature control sleeve 7 and the circulating temperature control liquid inside it with the external grounding electrode, a second conductor rod can be provided on the annular temperature control sleeve 7, the lower part of the second conductor rod is in direct contact with the circulating temperature control liquid, and the upper end of the second conductor rod is connected with the external grounding electrode, thereby realizing the connection of the external electrode with the grounding electrode.

[0046] It should be noted that as for the high-voltage electrode and the inner electrode, they are essentially the same component, in order for the reader to easily understand the structure of the entire DBD plasma reactor, the part outside the reaction tube 1 is referred to as the high-voltage electrode, and the part inside the reaction tube 1 is referred to as the inner electrode, but this does not affect the essence of the high-voltage electrode and the inner electrode being the same component; similarly, as for the grounding electrode and the outer electrode, they are essentially the same component, in order for the reader to easily understand the structure of the entire DBD plasma reactor, the part outside the annular temperature control sleeve 7 is referred to as the grounding electrode, and the part inside the annular temperature control sleeve 7 is referred to as the outer electrode, but this does not affect the essence of the grounding electrode and the outer electrode being the same component.

[0047] It should be noted that the DBD plasma reactor provided by the present application can be manufactured based on the structure of the existing coaxial structure electrode type plasma reactor, for example, the reaction tube 1, the conductor column 6, the first conductor rod 2 and the reaction tank 8 can be provided in a cylindrical structure, and the annular temperature control sleeve 7 can be provided in a circular ring structure; and the reaction tube 1, the conductor column 6, the first conductor rod 2, the reaction tank 8 and the annular temperature control sleeve 7 are coaxially arranged, thereby realizing the manufacture of the coaxial electrode type structure of the DBD plasma reactor provided by the present application.

[0048] In addition, in order to improve the conductivity of the whole DBD plasma reactor, the first conductor rod 2 and the second conductor rod are preferably made of copper rods, and the conductor column 6 is preferably made of a copper column; however, in actual production, the first conductor rod 2, the second conductor rod, and the conductor column 6 can be made of any other material with conductivity; in addition, in order to make the plasma discharge in the reaction tube 1 more uniform, the reaction tube 1 is made of a material with uniform dielectric constant, for example, the reaction tube 1 can be preferably a quartz tube with a certain dielectric constant.

[0049] In order to further illustrate the structure of the DBD plasma reactor provided by the present application, the following will be combined with the accompanying drawings to further illustrate the structure of the DBD plasma reactor provided by the present application. Figure 1 For further illustration of the structure, refer to Figure 1 The whole reaction tube 1 is vertically divided into three different parts, i.e. a non-reaction gas phase shell (gray), a discharge area (purple), and a reaction tank 8 (yellow). The gray area includes the non-reaction area of the reaction tube 1 and the gas inlet pipe 4 and the gas outlet pipe 3, and the gas flow rate is adjusted by external equipment to keep the system (in the reaction tube 1) at a slight positive pressure.

[0050] In addition, there needs to be a certain gap between the discharge area and the reaction tank 8, so as to effectively avoid the direct discharge of the inner electrode to the liquid substrate. In addition, the conductor column 6 in the inner electrode needs to have a discharge gap of several millimeters with the wall of the reaction tube 1, which is used to form the discharge area. There is a circulating condensation interlayer (i.e. an annular temperature control sleeve 7) around the discharge area and the reaction tank 8, the conductive liquid in the circulating condensation interlayer is driven by a circulating condensation pump and is temperature-controlled, and circulates in the circulating condensation interlayer and the circulating temperature control pipe 5, which can effectively control the temperature of the specified area and keep the constant temperature of the reaction system.

[0051] In function, the upper part of the circulating condensation sandwich has a second conductor rod in direct contact with the conductive liquid, the second conductor rod forms an approximately equipotential body with the conductive liquid, and is connected to an external grounding electrode as an external electrode. The use of the conductive liquid enables the inner electrode to discharge the circulating condensation sandwich, and reduces the resistance of the conductive liquid, avoids the potential drop generated when the current passes through the circulating condensation sandwich, thereby reducing the energy dissipation in the form of heat. Finally, it needs to be pointed out that, in order to ensure the normal progress of the reaction in the DBD plasma reactor provided by the present application, an insulating medium (for example, the quartz tube wall can provide the property of the insulating medium) needs to be arranged on the inner wall of the reaction tube 1. If there is no insulating medium (for example, a quartz plate), once discharge occurs in the reaction tube 1, the streamer will quickly expand into an arc, resulting in uneven discharge, and the air gap voltage will drop sharply, resulting in the discharge being unable to be maintained; after the insulating medium is put in, if the streamer expands, the voltage across the insulating medium will also increase, because the total voltage remains unchanged, so the air gap voltage becomes smaller, and then the current also becomes smaller, the streamer decreases and extinguishes; the arrangement of the insulating medium can avoid the occurrence of a large streamer or arc, and maintain stable discharge.

[0052] As can be seen from the above specific embodiments, the DBD plasma reactor provided by the present application at least has the following advantages:

[0053] I. A reaction tank is designed below the inner electrode, and a gas flow passage is designed, so that the gas activated by the plasma can react with the liquid.

[0054] II. A ring-shaped condensation sleeve is designed around the reaction tube, so that the temperature of the reaction area can be effectively controlled, and the reaction can be completed at any specified temperature.

[0055] III. The conductive liquid is used, and the whole formed by the ring-shaped temperature control sleeve and the conductive liquid is used as an external electrode, which ingeniously reduces redundant components.

[0056] IV. By changing the size, shape and position of the conductor column, the size of the discharge area in the reaction tube is controlled, and the amount of substances participating in the reaction per unit time is changed.

[0057] V. The reaction tank in the reaction tube is designed, and the reaction can be carried out on a preparation scale.

[0058] As described above with reference to Figures 1 to 3 The DBD plasma reactor according to the present application is described by way of example. However, those skilled in the art should understand that various improvements can be made to the DBD plasma reactor provided by the present application without departing from the content of the present application. Therefore, the protection scope of the present application should be determined by the content of the appended claims.

Claims

1. A DBD plasma reactor, characterized in that, The DBD plasma reactor comprises a reaction tube, an inner electrode connected with a high-voltage electrode is arranged in the reaction tube, an outer electrode connected with a grounding electrode is arranged outside the reaction tube, a discharge area between the inner electrode and the outer electrode is formed in the reaction tube, and the discharge area is used for generating plasma; and A reaction groove below the inner electrode is further arranged in the reaction tube, a substrate is accommodated in the reaction groove, a gap exists between the discharge area and the reaction groove, and the plasma generated in the discharge area reacts with the substrate in the reaction groove; wherein An annular temperature control sleeve surrounding the discharge area and the reaction groove is arranged outside the reaction tube, a conductive liquid is loaded in the annular temperature control sleeve, the conductive liquid is connected with the grounding electrode, and the annular temperature control sleeve and the conductive liquid inside the annular temperature control sleeve jointly constitute the outer electrode; the inner electrode comprises a first conductor rod and a conductor column connected with a lower end of the first conductor rod, an upper end of the first conductor rod extends to an outside of an upper end of the reaction tube and is connected with the high-voltage electrode, and a region between the conductor column and the annular temperature control sleeve in the reaction tube forms the discharge area; A boss corresponding to the conductor column in an up-down direction is arranged in a middle part of the reaction groove, the substrate is accommodated in a gap between the reaction groove and the boss, a positioning hole is arranged in a center position of an upper surface of the boss, and a positioning part is arranged in a center position of a lower surface of the conductor column and is fixed in the positioning hole.

2. The DBD plasma reactor of claim 1, wherein A circulating temperature control pipe is communicated with the annular temperature control sleeve, a circulating temperature control pump is arranged on the circulating temperature control pipe, and the conductive liquid is circulated and temperature-controlled by the circulating temperature control pipe and the circulating temperature control pump.

3. The DBD plasma reactor of claim 2, wherein An air inlet pipe and an air outlet pipe are further connected with the reaction tube, a gas medium flows into the reaction tube through the air inlet pipe and flows out of the reaction tube through the air outlet pipe; and The gas medium flowing through the discharge area generates the plasma under the action of the outer electrode and the inner electrode.

4. The DBD plasma reactor of claim 3, wherein The annular temperature control sleeve surrounds the conductor column.

5. The DBD plasma reactor of claim 4, wherein The reaction tube and the conductor column are both cylindrical structures, and the annular temperature control sleeve is a circular ring structure; and The reaction tube, the conductor column and the annular temperature control sleeve are coaxially arranged.

6. The DBD plasma reactor of claim 5, wherein A second conductor rod is arranged on the annular temperature control sleeve, a lower part of the second conductor rod is in contact with the conductive liquid in the annular temperature control sleeve, and an upper end of the second conductor rod is connected with an external grounding electrode.

7. The DBD plasma reactor of claim 6, wherein The first conductor rod and the second conductor rod are both copper rods, and the conductor column is a copper column; and The reaction tube is a quartz tube.

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