Tail gas treatment system of boron diffusion equipment, control method and boron diffusion equipment

By using pulse control valves and controllers in the exhaust gas treatment system for rapid pulse process, the liquid seal of liquid adsorption solvent is damaged, and the problems of increased evacuation resistance and air flow disturbance caused by liquid seal are solved, and the service life of the diaphragm is extended.

CN119713883APending Publication Date: 2025-03-28TRINA SOLAR CO LTD
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Patent Information

Application Number
CN202510050282.4
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-01-13
Publication Date
2025-03-28

AI Technical Summary

Technical Problem

In the prior art, liquid adsorption solvents are prone to form liquid seals during exhaust gas treatment, resulting in an increase in evacuation resistance, airflow disturbance affects the normal operation of the boron expansion equipment, and shortens the service life of the diaphragm pump diaphragm.

Method used

By setting up a pulse control valve and controller in the exhaust gas treatment system, a clean gas source is used to perform a rapid pulse process, which increases the liquid level fluctuation of the liquid adsorption solvent and destroys the liquid seal of the overflow tube by the liquid adsorption solvent.

Benefits of technology

It reduces the evacuation resistance of the exhaust gas treatment system, reduces the impact of airflow disturbance on the boron expansion industry, and extends the service life of the diaphragm pump diaphragm.

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Abstract

The invention discloses a tail gas treatment system of boron diffusion equipment, a control method and the boron diffusion equipment, and belongs to the field of tail gas treatment. The tail gas treatment system comprises a filtering device group, a pulse control valve and a controller; the filtering device group comprises at least one filtering device, a liquid adsorption solvent is contained in a filtering container of the filtering device, an air inlet pipe of the filtering device extends into the liquid adsorption solvent, an inlet of the filtering device group is used for being connected with the main air inlet, at least one filtering device is provided with an overflow pipe, and an outlet pipe of the filtering device group extends into the overflow pipe; an outlet pipe of the filtering device group is used for being connected with a main exhaust port; the pulse control valve is connected between the inlet of the filtering device group and the clean air source; and the controller is connected with the pulse control valve and is configured to control the pulse control valve to intermittently start and stop before the boron diffusion equipment runs so as to damage the liquid seal of the overflow pipe. The problem that liquid seal is generated in the process of treating the tail gas by adopting a liquid adsorption solvent can be effectively solved.
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Description

Technical Field

[0001] The present application belongs to the technical field of tail gas treatment, and in particular, relates to a tail gas treatment system, a control method and a boron expansion device of a boron expansion device. Background Art

[0002] During the operation of the boron expansion equipment, the tail gas generated by the vacuum furnace usually contains solid particles, harmful gases and other substances that need to be treated. In order to protect the environment and reduce tail gas pollution, these tail gases need to be effectively treated.

[0003] Traditional exhaust gas treatment methods usually use liquid adsorption solvents to absorb harmful substances in the exhaust gas, but liquid adsorption solvents can easily form liquid seals on connecting pipes, which can easily lead to a sudden increase in resistance during the subsequent vacuuming process. The air flow disturbance will affect the normal operation of the boron expansion equipment and the service life of the diaphragm pump diaphragm, so it needs to be improved. Summary of the invention

[0004] The present application aims to solve at least one of the technical problems existing in the prior art. To this end, the present application proposes a tail gas treatment system, a control method and a tail gas treatment device of a boron expansion device, which can effectively solve the problem of liquid sealing in the process of treating tail gas with a liquid adsorption solvent.

[0005] In a first aspect, the present application provides a tail gas treatment system for a boron expansion device, the tail gas treatment system having a main air inlet and a main air outlet, the main air inlet being suitable for being connected to a gas outlet of a vacuum furnace of the boron expansion device, the tail gas treatment system comprising:

[0006] A filter device group, comprising at least one filter device, wherein a liquid adsorption solvent is contained in a filter container of the filter device, an air inlet pipe of the filter device extends into the liquid adsorption solvent, an inlet of the filter device group is used to be connected to the main air inlet, at least one filter device is provided with an overflow pipe, an outlet pipe of the filter device group extends into the overflow pipe, and the outlet pipe of the filter device group is used to be connected to the main air outlet;

[0007] A pulse control valve connected between the inlet of the filter device group and the clean air source;

[0008] A controller is connected to the pulse control valve and is configured to control the intermittent start and stop of the pulse control valve before the boron expansion device is operated.

[0009] According to the exhaust gas treatment system of the present application, a pulse control valve and a controller are set, and the pulse control valve and the controller work together. The controller is configured to control the intermittent start and stop of the pulse control valve before the operation of the borax expansion equipment, so that a fast pulse process can be performed using a clean gas source, thereby increasing the liquid level fluctuation of the liquid adsorption solvent in the filter container, and then destroying the liquid seal of the liquid adsorption solvent on the overflow pipe, thereby reducing the evacuation resistance of the exhaust gas treatment system, reducing the impact of airflow disturbances on the borax expansion industry, and increasing the service life of the diaphragm of the diaphragm pump.

[0010] According to one embodiment of the present application, the controller is configured to control the pulse control valve to start and stop intermittently within a target duration.

[0011] According to an embodiment of the present application, the invention further comprises: a first control valve and a second control valve, wherein the first control valve is arranged between the clean air source and the pulse control valve, and the second control valve is arranged between the filter device group and the exhaust main port;

[0012] The controller is configured to control the pulse control valve to start and stop intermittently when the first control valve and the second control valve are opened.

[0013] According to one embodiment of the present application, it also includes:

[0014] A bypass pipeline, both ends of which are respectively connected to the inlet of the filter device group and the outlet of the filter device group, and is provided with a third control valve.

[0015] According to one embodiment of the present application, it also includes:

[0016] a fourth control valve, the fourth control valve being adapted to be arranged between an outlet of a liquid supply device and an inlet of the filter device group, the liquid supply device being used to provide the liquid adsorption solvent;

[0017] a fifth control valve, the fifth control valve being arranged between the gas outlet of the vacuum furnace of the boron expansion equipment and the inlet of the filter device group;

[0018] A sixth control valve is suitable for being arranged between the waste liquid collecting device and the inlet of the filtering device group.

[0019] According to one embodiment of the present application, the filter device group includes a plurality of the filter devices connected in series.

[0020] According to one embodiment of the present application, it further includes: a cooler, the cooler being arranged between the gas outlet of the vacuum furnace of the boron expansion equipment and the inlet of the filter device group; and / or,

[0021] A protector is arranged between the gas outlet of the vacuum furnace of the boron expansion equipment and the inlet of the filter device group.

[0022] In a second aspect, the present application provides a control method for an exhaust gas treatment system of a boron expansion device, which is applied to an exhaust gas treatment system of a boron expansion device described in any of the above embodiments, comprising:

[0023] Get the first input;

[0024] Based on the first input, the pulse control valve is controlled to start and stop intermittently before the boron expansion device is operated to destroy the liquid seal of the overflow pipe.

[0025] According to the control method of the exhaust gas treatment system provided in the embodiment of the present application, a pulse control valve and a controller are set, and the pulse control valve and the controller work together. The controller is configured to control the intermittent start and stop of the pulse control valve before the operation of the borax expansion equipment, so that a fast pulse process can be performed using a clean gas source, thereby increasing the liquid level fluctuation of the liquid adsorption solvent in the filter container, and then destroying the liquid seal of the liquid adsorption solvent on the overflow pipe, thereby reducing the evacuation resistance of the exhaust gas treatment system, reducing the impact of air flow disturbances on the borax expansion industry, and increasing the service life of the diaphragm of the diaphragm pump.

[0026] According to one embodiment of the present application, before controlling the pulse control valve to start and stop intermittently to destroy the liquid seal of the overflow pipe, the method includes:

[0027] Based on the first input, a first control valve and a second control valve are opened.

[0028] According to one embodiment of the present application, before the boron expansion device is operated, the pulse control valve is controlled to start and stop intermittently to destroy the liquid seal of the overflow pipe, including:

[0029] The pulse control valve is controlled to start and stop intermittently within a target duration.

[0030] According to one embodiment of the present application, controlling the pulse control valve to start and stop intermittently within a target duration includes:

[0031] The pulse control valve is controlled to operate at a target duty cycle within the target time period.

[0032] In a third aspect, the present application provides a boron expansion device, comprising:

[0033] Vacuum furnace;

[0034] The tail gas treatment system of the boron expansion equipment described in any of the above embodiments, wherein the air inlet of the tail gas treatment system is connected to the air outlet of the vacuum furnace.

[0035] According to the boron expansion equipment provided by the present application, a tail gas treatment system is provided, and the tail gas treatment system is provided with a pulse control valve and a controller. The pulse control valve and the controller work together, and the controller is configured to control the intermittent start and stop of the pulse control valve before the operation of the boron expansion equipment, so that a clean gas source can be used to perform a rapid pulse process, thereby increasing the liquid level fluctuation of the liquid adsorption solvent in the filter container, and then destroying the liquid seal of the liquid adsorption solvent on the overflow pipe, thereby reducing the evacuation resistance of the tail gas treatment system, reducing the impact of air flow disturbance on the boron expansion industry, and increasing the service life of the diaphragm of the diaphragm pump.

[0036] Additional aspects and advantages of the present application will be given in part in the description below, and in part will become apparent from the description below, or will be learned through the practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] The above and / or additional aspects and advantages of the present application will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0038] Figure 1 is a schematic diagram of the structure of the exhaust gas treatment system provided in an embodiment of the present application;

[0039] Figure 2 It is a flow chart of a control method of an exhaust gas treatment system provided in an embodiment of the present application.

[0040] Reference numerals:

[0041] Vacuum furnace 1, filter container 2, air inlet pipe 3, overflow pipe 4, pulse control valve 5, fourth control valve 6, second control valve 7, third control valve 8, fifth control valve 9, first control valve 10, sixth control valve 11, pump body 12, cooler 13, protector 14, clean air source 15, bypass pipe 16. DETAILED DESCRIPTION

[0042] The embodiments of the present application are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application, and cannot be understood as limiting the present application.

[0043] Reference below Figure 1 and Figure 2 The exhaust gas treatment system, control method and boron expansion device of the boron expansion device according to the embodiments of the present application are described.

[0044] The tail gas treatment system of the boron expansion equipment in the embodiment of the present application has a main air inlet and a main air outlet, and the main air inlet is suitable for being connected to the air outlet of the vacuum furnace 1 of the boron expansion equipment.

[0045] The exhaust gas treatment system has an air inlet connected to the exhaust port of the vacuum furnace 1 of the boron expansion equipment, and the exhaust gas treatment system is used to treat the exhaust gas discharged from the exhaust port of the vacuum furnace 1 so that the exhaust gas meets the emission standards. The exhaust port of the exhaust gas treatment system is suitable for being connected to the tail pipe or the outside world to discharge the treated exhaust gas.

[0046] like Figure 1 As shown, the tail gas treatment system of the embodiment of the present application includes: a filter device group, a pulse control valve 5 and a controller. The filter device group is used to adsorb and remove harmful gases and particulate matter in the tail gas generated by the boron expansion equipment. The pulse control valve 5 and the controller work together to destroy the liquid seal of the overflow pipe 4 in the filter device, reduce the liquid seal phenomenon of the overflow pipe 4 after the water supply, and reduce the vacuum resistance.

[0047] The filter device group includes at least one filter device, the filter container 2 of the filter device is filled with a liquid adsorption solvent, the air inlet pipe 3 of the filter device extends into the liquid adsorption solvent, the inlet of the filter device group is used to be connected to the main air inlet, at least one filter device is provided with an overflow pipe 4, the outlet pipe of the filter device group extends into the overflow pipe 4, and the outlet pipe of the filter device group is used to be connected to the main exhaust port.

[0048] Among them, the filter device group may include one or more filter devices. When there are multiple filter devices, multiple filter devices can be connected in series to improve the filtering effect, or multiple filter devices can be connected in parallel to perform targeted treatment on exhaust gas containing different pollutants to improve the treatment effect.

[0049] The inlet of the filter device group is used to be connected to the main air inlet, and the filter device group is used to treat the exhaust gas discharged from the main air inlet so that the exhaust gas meets the emission standards. The outlet pipe of the filter device group is used to be connected to the main exhaust port, and is used to discharge the treated exhaust gas into the main exhaust port for discharge.

[0050] The filter container 2 of each filter device contains a liquid adsorption solvent, and the air inlet pipe 3 of the filter device extends into the liquid adsorption solvent. The gas and solid impurities in the tail gas are absorbed and settled by the liquid adsorption solvent, and the tail gas temperature is reduced by the liquid adsorption solvent.

[0051] The liquid adsorption solvent can be water or other acid-base solutions, which can be determined according to the type of adsorbate in the tail gas.

[0052] At least one filtering device is provided with an overflow pipe 4, which is used to maintain the liquid level of the liquid adsorption solvent in the filtering container 2 and to discharge the excess liquid adsorption solvent to the next filtering container 2 or a waste liquid collector.

[0053] The overflow pipe may be arranged in each filter device, or the overflow pipe may be arranged in each filter device except the tail filter device, and the tail filter device is used to collect the liquid adsorption solvent discharged from other filter devices.

[0054] The outlet pipe of the filter device group extends into the overflow pipe 4, and the port of the outlet pipe of the filter device group is located in the overflow pipe 4. The distance from the port of the outlet pipe of the filter device group to the liquid surface of the liquid adsorption solvent is smaller than the distance from the port of the overflow pipe 4 to the liquid surface of the liquid adsorption solvent. This can reduce the phenomenon of the outlet pipe of the filter device group being liquid-sealed, thereby allowing the exhaust gas to be smoothly discharged from the outlet pipe of the filter device group.

[0055] The pulse control valve 5 is connected between the inlet of the filter device group and the clean air source 15; the controller is connected to the pulse control valve 5, and the controller is configured to control the pulse control valve 5 to start and stop intermittently before the boron expansion equipment is operated to destroy the liquid seal of the overflow pipe 4.

[0056] The clean gas source 15 may be CDA compressed gas, such as compressed dry air.

[0057] The pulse control valve 5 can be a solenoid valve. Before the boron expansion equipment is operated, the controller can control the pulse control valve 5 to start and stop intermittently, so as to use the clean gas source 15 to perform a rapid pulse process, thereby destroying the liquid seal of the overflow pipe 4 by the liquid adsorption solvent by increasing the liquid level fluctuation.

[0058] The controller can control the pulse control valve 5 to open at the same time interval or at different time intervals, so as to realize a fast pulse process using the clean gas source 15 .

[0059] Exemplarily, the interval duration of the start and stop of the control valve can be 0.3s to 1s. For example, the controller can control the pulse control valve 5 to open every 0.3s, 0.5s, 0.8s, 0.9s or 1s, that is, the pulse control valve 5 is opened at intervals of the same length; or, the controller can control the pulse control valve 5 to open at intervals of different lengths, for example, the interval between the first opening and the second opening is 0.3s, and the interval between the second opening and the third opening is 0.5s.

[0060] Before the boron expansion device is turned on, the pulse control valve 5 and the controller work together to destroy the liquid seal of the overflow pipe 4 first, and the tail gas generated after the boron expansion device is turned on can be smoothly extracted, thereby improving the working stability of the boron expansion device.

[0061] In the related art, in the scheme of filtering the exhaust gas with a liquid liquid adsorption solvent, because of the structure of multiple filter containers in series, during the process of adding water to the filter container, a liquid seal will occur at the bottom of the overflow pipe. The overflow pipe liquid seal will cause a sudden increase in resistance during the subsequent vacuuming process, causing air flow disturbances that affect the expansion industry and also affect the service life of the diaphragm of the diaphragm pump.

[0062] According to the exhaust gas treatment system provided in the embodiment of the present application, a pulse control valve 5 and a controller are set, and the pulse control valve 5 and the controller work in coordination. The controller is configured to control the intermittent start and stop of the pulse control valve 5 before the operation of the borax expansion equipment, so that a fast pulse process can be performed using the clean gas source 15, thereby increasing the liquid level fluctuation of the liquid adsorption solvent in the filter container 2, thereby destroying the liquid seal of the liquid adsorption solvent on the overflow pipe 4, thereby reducing the evacuation resistance of the exhaust gas treatment system, reducing the impact of air flow disturbances on the borax expansion industry, and increasing the service life of the diaphragm of the diaphragm pump.

[0063] In some embodiments, Figure 1 As shown, the filter device group includes multiple filter devices connected in series. Through the synergistic effect of the multiple filter devices, the overall filtration efficiency of the filter device group can be improved to ensure cleaner gas output. At the same time, the filter devices connected in series can serve as backups for each other. If one of the multiple filter devices fails, the other filter devices can still provide a certain degree of filtration.

[0064] Exemplarily, the types of liquid adsorption solvents in multiple filter devices may be the same, so as to facilitate unified liquid supply and achieve filtering effects on one or several specific pollutants at the same time.

[0065] For example, the types of liquid adsorption solvents in the multiple filter devices may be different, so as to remove particles of different sizes or different types of pollutants.

[0066] In some embodiments, the liquid adsorption solvent is water.

[0067] In this embodiment, liquid water is used to react chemically with the boron expansion waste gas to filter out pollutants such as B2O3 and residual BCL3 generated during the boron expansion equipment process to the maximum extent, so that the pollutants cannot reach the diaphragm pump and the rear-end tail pipe, thereby reducing the problem of B2O3 deposition on the diaphragm and the tail pipe, and reducing the maintenance cycle and maintenance cost.

[0068] In some embodiments, Figure 1As shown, the exhaust gas treatment system also includes: a first control valve 10 and a second control valve 7, the first control valve 10 is arranged between the clean gas source 15 and the pulse control valve 5, and the second control valve 7 is arranged between the outlet of the filter device group and the exhaust main port; the controller is configured to control the intermittent start and stop of the pulse control valve 5 when the first control valve 10 and the second control valve 7 are opened.

[0069] The first control valve 10 and the second control valve 7 may be solenoid valves.

[0070] In this embodiment, the first control valve 10 is used to control the on-off of the connecting pipeline between the clean gas source 15 and the pulse control valve 5, and the second control valve 7 is used to control the on-off of the connecting pipeline between the filter device group and the exhaust main port. The pulse control valve 5 can control the on-off of the connecting pipeline between the clean gas source 15 and the filter device group when the first control valve 10 is opened.

[0071] When the first control valve 10 and the second control valve 7 are both open, the pulse control valve 5 is opened to connect the clean gas source 15 with the exhaust main port, and the clean gas can be discharged in sequence through the first control valve 10, the pulse control valve 5, the filter device group and the second control valve 7. The clean gas can quickly pulse the liquid adsorption solvent. The pulse control valve 5 is closed to stop the clean gas pulse, so that the clean gas can disturb the liquid adsorption solvent in the filter container 2.

[0072] When the first control valve 10 is open and the second control valve 7 is closed, the gas passage path between the clean gas source 15 and the exhaust main port is disconnected, and the opening of the pulse control valve 5 will connect the clean gas source 15 with the filter device group. The clean gas will cause a slight disturbance to the liquid adsorption solvent in the filter container 2, which can destroy the liquid seal of the liquid adsorption solvent on the overflow pipe 4 to a certain extent.

[0073] When the first control valve 10 is closed and the second control valve 7 is opened, the gas passage path between the clean gas source 15 and the exhaust main port is disconnected, and the opening of the pulse control valve 5 has no effect on the connection between the clean gas source 15 and the exhaust main port, and will not cause disturbance to the liquid adsorption solvent in the filter container 2.

[0074] When the first control valve 10 and the second control valve 7 are both closed, the opening and closing of the pulse control valve 5 has no effect on the communication between the clean gas source 15 and the exhaust main port.

[0075] In some embodiments, Figure 1 As shown, the controller is configured to control the pulse control valve 5 to start and stop intermittently within the target time period.

[0076] Among them, the target duration is a preset pulse duration, and the target duration can be 1s to 10s, for example, 1s, 1.2s, 1.5s, 2s, 4s, 7s, 8s or 10s.

[0077] The duration of a single pulse of the clean air source 15 is the target duration, and the duration that the pulse control valve 5 is opened within the target duration is the pulse ventilation duration.

[0078] For example, the controller may control the pulse control valve 5 to be repeatedly opened and closed intermittently within 5 seconds before the boron expansion device is operated to break the liquid seal of the overflow pipe 4.

[0079] For example, the controller may control the pulse control valve 5 to be repeatedly opened and closed intermittently within 6 seconds before the boron expansion device is operated to break the liquid seal of the overflow pipe 4.

[0080] In this embodiment, by setting the duration of the cyclic start and stop of the pulse control valve 5, it is possible to achieve a better effect of breaking the liquid seal and shorten the delay time for the boron expansion equipment to start running.

[0081] In some embodiments, Figure 1 As shown, the controller is configured to control the pulse control valve 5 to operate at a target duty cycle within a target duration.

[0082] The target duty cycle is the ratio of the total duration of the pulse control valve 5 being open to the target duration.

[0083] In some embodiments, the target duty cycle is a set value, and the target duty cycle m satisfies: 30%≤m<100%, or may be 40%≤m<60%.

[0084] For example, the target duty cycle m may be 30%, 35%, 40%, 50%, 65%, 75%, 80% or 90%.

[0085] In this embodiment, the ratio of the time taken for the pulse control valve 5 to be opened to the target duration is the target duty cycle. Before the boron expansion equipment is operated, the controller controls the pulse control valve 5 to be opened according to the target duty cycle, which can not only form a fast pulse through the pulse control valve 5 to achieve the effect of destroying the liquid seal of the overflow pipe 4, but also reduce energy consumption and save costs.

[0086] Table 1 is the experimental data of the target duty cycle. The following is an explanation of the value of the target duty cycle m based on multiple groups of experimental data in Table 1.

[0087] As shown in Table 1, the pulse ventilation duration is the opening duration of the pulse control valve 5 in a single pulse duration, the duty cycle is the ratio of the pulse ventilation duration to the single pulse duration, and the target duty cycle = pulse ventilation duration / single pulse duration. The height difference is the difference between the initial height of the liquid level and the height after the liquid level impact of the same filter container. The initial height of the liquid level and the height after the liquid level impact are test parameters of the same filter container 2. Exemplarily, they can be test parameters of the filter container labeled W2 or test parameters of the filter container labeled W3.

[0088] It should be noted that as long as there is a height difference between the initial height of the liquid level in the filter container and the height after the liquid level impact, the pulse control valve 5 has a damaging effect on the liquid seal of the overflow pipe 4. The greater the height difference between the initial height of the liquid level in the filter container and the height after the liquid level impact, the better the damaging effect of the pulse control valve 5 on the liquid seal of the overflow pipe 4.

[0089] As shown in Table 1, this experiment conducted 4 experimental groups with different single pulse durations and pulse ventilation durations. Each experimental group included 4 groups of embodiment groups with different duty cycles and 1 group of comparative groups. One group of embodiment groups with a duty cycle included 2 experimental data with the same duty cycle. The 2 experimental data with the same duty cycle can be averaged to obtain the mean height difference corresponding to the same duty cycle. One group of comparative groups with a duty cycle included 2 experimental data with the same duty cycle. The 2 experimental data with the same duty cycle can be averaged to obtain the mean height difference corresponding to the same duty cycle. The 4 groups of embodiment groups with different duty cycles and the 1 comparative group all met the trend that the average height difference with the same duty cycle increased monotonically with the increase of the duty cycle of the pulse control valve 5.

[0090] Based on energy consumption considerations and taking into account the damaging effect of the rapid pulse formed by the pulse control valve 5 on the liquid seal of the overflow pipe 4, the average height difference H of the same duty cycle can satisfy: H>7mm, that is, the target duty cycle m can satisfy: 30%≤m<100%.

[0091] Table 1 Target duty cycle experimental data

[0092]

[0093]

[0094] In some embodiments, Figure 1 As shown, the exhaust gas treatment system further includes: a bypass pipe 16 , both ends of which are respectively connected to the inlet and the outlet of the filter device group, and a third control valve 8 is provided.

[0095] The two ends of the bypass pipe 16 are connected to the inlet of the filter group and the outlet of the filter group to form an optional flow path. The third control valve 8 is installed on the bypass pipe 16, and the third control valve 8 is used to control the connection and disconnection of the bypass pipe 16. When the system detects that the exhaust gas does not contain toxic gases such as B2O3 and BCL3, the third control valve 8 is opened, and the exhaust gas enters the bypass pipe 16 and is quickly discharged to the exhaust main port, reducing the exhaust resistance, extending the service life of the diaphragm, and quickly exhausting the gas to complete the entire exhaust treatment work; when the system detects that the exhaust gas contains toxic gases such as B2O3 and BCL3, the third control valve 8 is closed, and the exhaust gas is discharged to the exhaust main port after passing through the filter group in sequence.

[0096] In this embodiment, when the first control valve 10, the second control valve 7 and the third control valve 8 are all opened, the pulse control valve 5 is opened to connect the clean gas source 15 with the exhaust main port, and the clean gas can be discharged in sequence through the first control valve 10, the third control valve 8, the pulse control valve 5, the filter device group and the second control valve 7, and the clean gas can quickly pulse the liquid adsorption solvent. The pulse control valve 5 is closed to stop the clean gas pulse, so that the clean gas can disturb the liquid adsorption solvent in the filter container 2.

[0097] In some embodiments, Figure 1 As shown, the tail gas treatment system further includes: a fifth control valve 9, which is arranged between the gas outlet of the vacuum furnace 1 of the boron expansion equipment and the inlet of the filter device group.

[0098] The fifth control valve 9 may be a solenoid valve. The fifth control valve 9 is used to control the connection and disconnection of the pipeline between the vacuum furnace 1 of the boron expansion equipment and the inlet of the filter device group.

[0099] In some embodiments, the tail gas treatment system further includes: a fourth control valve 6, which is suitable for being arranged between the outlet of the liquid supplier and the inlet of the filter device group, and the liquid supplier is used to provide the liquid adsorption solvent.

[0100] The fourth control valve 6 may be a solenoid valve and is used to control the connection and disconnection of the pipeline between the liquid supplier and the inlet of the filter device group.

[0101] The fourth control valve 6 may be connected to a controller, and the controller may control the fourth control valve 6 to open, so as to control the liquid supplier to provide the liquid adsorption solvent to the filter container 2, thereby improving the automation level of the tail gas treatment system.

[0102] In some embodiments, Figure 1 As shown, the tail gas treatment system further includes: a sixth control valve 11, which is suitable for being arranged between the waste liquid collection device and the inlet of the filter device group.

[0103] The sixth control valve 11 may be a solenoid valve. The sixth control valve 11 is used to control the connection and disconnection of the pipeline between the waste liquid collection device and the inlet of the filter device group.

[0104] The sixth control valve 11 can be connected to the controller, and the controller can control the sixth control valve 11 to open to control the waste liquid that absorbs toxic gases such as B2O3 and BCL3 to be discharged from the filter container 2 to the waste liquid collection device, thereby improving the degree of automation of the exhaust gas treatment system.

[0105] The waste liquid collection device is used to collect the saturated liquid adsorption solvent that absorbs pollutants in the waste gas.

[0106] In some embodiments, Figure 1 As shown, the exhaust gas treatment system further includes: a pump body 12, and the pump body 12 is connected to the outlet of the filter device group.

[0107] Among them, the pump body 12 can be a diaphragm pump, which is arranged at the outlet of the filter device group. The pump body 12 is used to evacuate the filter device group to accelerate the exhaust gas flow rate of the exhaust gas treatment system and improve the filtration efficiency. The gas discharged from the outlet of the filter device group passes through the pump body 12 and enters the exhaust main port.

[0108] In some embodiments, Figure 1 As shown, the exhaust gas treatment system also includes: a cooler 13 and a protector 14, the cooler 13 is arranged between the air outlet of the vacuum furnace 1 of the boron expansion equipment and the inlet of the filter device group, and the protector 14 is arranged between the air outlet of the vacuum furnace 1 of the boron expansion equipment and the inlet of the filter device group.

[0109] The cooler 13 may be a bottle container.

[0110] In this embodiment, the exhaust gas first enters the cooler 13, and the exhaust gas is firstly cooled and condensed from bottom to top in the cooler 13. Under the influence of its own gravity, the exhaust gas crystallizes and deposits the super-large particles of B2O3 to the bottom of the cooler 13 to achieve preliminary treatment.

[0111] Wherein, the protector 14 can be a protection bottle or a protection tank, such as Figure 1 As shown, the guard 14 is a container labeled W1.

[0112] In this embodiment, a space that can accommodate exhaust gas or liquid adsorption solvent is formed in the protective device 14. The protective device 14 is arranged between the filter device group and the gas outlet of the vacuum furnace 1 of the boron expansion equipment, which can play a role in accumulating exhaust gas and equalizing the pressure. At the same time, when the liquid adsorption solvent flows back into the filter device, the protective device 14 can accommodate the backflowing liquid adsorption solvent, play a protective role, and improve the installability of the exhaust gas treatment device.

[0113] In some embodiments, Figure 1 As shown, the protector 14 can be arranged between the outlet of the cooler 13 and the inlet of the filter device group, and the protector 14 can play a protective effect on the cooler 13.

[0114] In some embodiments, the tail gas treatment system further includes a cooler 13, which is disposed between the gas outlet of the vacuum furnace 1 of the boron expansion equipment and the inlet of the filter device group.

[0115] The tail gas first enters the cooler 13, where it is initially cooled and condensed from bottom to top. Under the influence of its own gravity, the tail gas crystallizes and deposits the oversized B2O3 particles to the bottom of the cooler 13 to achieve preliminary treatment.

[0116] Exemplarily, the cooler 13 may be a bottle container.

[0117] In some embodiments, Figure 1 As shown, the tail gas treatment system further includes a protector 14, which is arranged between the gas outlet of the vacuum furnace 1 of the boron expansion equipment and the inlet of the filter device group.

[0118] The protector 14 may be a protection bottle or a protection tank.

[0119] In this embodiment, a space that can accommodate exhaust gas or liquid adsorption solvent is formed in the protective device 14. The protective device 14 is arranged between the filter device group and the gas outlet of the vacuum furnace 1 of the boron expansion equipment, which can play a role in accumulating exhaust gas and equalizing the pressure. At the same time, when the liquid adsorption solvent flows back into the filter device, the protective device 14 can accommodate the backflowing liquid adsorption solvent, play a protective role, and improve the installability of the exhaust gas treatment device.

[0120] like Figure 1 As shown, a complete exhaust gas treatment process is used below to illustrate the working process of the exhaust gas treatment system provided in the embodiment of the present application.

[0121] The process of adding and draining water in the tail gas treatment system: when adding water, first, open the fourth control valve 6, the pulse control valve 5 and the second control valve 7, and the liquid adsorption solvent passes through the fourth control valve 6 and the pulse control valve 5 in turn and enters the connected filter container 2 labeled W2, the filter container 2 labeled W3 and the filter container 2 labeled W4 through the pipeline. When the liquid level of the liquid adsorption solvent reaches the set height, the controller detects the water level signal, closes the fourth control valve 6, the pulse control valve 5 and the second control valve 7, and completes the water addition; when draining water, open the first control valve 10 and the sixth control valve 11, and the CDA compressed gas first presses out the waste water in the filter container 2 labeled W4 and enters the filter container 2 labeled W3 and the filter container 2 labeled W2 through the air inlet pipe 3, and finally is discharged from the sixth control valve 11 through the air inlet pipe 3 of the filter container 2 labeled W2, completing the acid discharge. The above two processes constitute the complete water addition and drainage action of the filter device group provided in the embodiment of the present application.

[0122] After the filling and drainage is completed, open the first control valve 10, the third control valve 8 and the second control valve 7, and then control the pulse control valve 5 to start and stop intermittently within the target time, and use CDA pulse gas to open the liquid seal of the overflow pipe 4 in the filter container 2 labeled W2 and the filter container 2 labeled W3.

[0123] The tail exhaust gas treatment process of the boron expansion system: after the exhaust gas is discharged from the vacuum furnace 1, it is initially cooled and condensed by the cooler 13, and then enters the filter container 2 labeled W1 for secondary cooling, and then enters the filter device group through the fifth control valve 9. At this time, the controller will judge whether to go through the bypass pipeline 16 or the filter device group according to whether the exhaust gas contains harmful gases such as B2O3 and BCL3. When it is detected that the exhaust gas contains harmful gases such as B2O3 and BCL3, the third control valve 8 remains in a closed state. After the exhaust gas absorbs the harmful gases after multiple reactions of the filter container 2 labeled W2, the filter container 2 labeled W3 and the filter container 2 labeled W4, the residual exhaust gas is discharged after reaching the pump body 12 through the second control valve 7; on the contrary, when no harmful gases such as B2O3 and BCL3 are detected in the exhaust gas, the pulse control valve 5, the third control valve 8 and the second control valve 7 are opened, and the exhaust gas is directly discharged after reaching the pump body 12 through the third control valve 8.

[0124] like Figure 2 As shown, an embodiment of the present application further provides a control method for an exhaust gas treatment system of a boron expansion device, which is applied to an exhaust gas treatment system of a boron expansion device in any of the above embodiments, and includes: step 210 and step 220.

[0125] Step 210, obtaining a first input.

[0126] In this embodiment, the first input may be an instruction from a staff member to start the boron expansion device. After the controller receives the instruction to start the boron expansion device, the exhaust gas treatment system of the boron expansion device is controlled to run first.

[0127] Step 220 , based on the first input, before the boron expansion device is operated, the pulse control valve 5 is controlled to start and stop intermittently to destroy the liquid seal of the overflow pipe 4 .

[0128] The pulse control valve 5 can be a solenoid valve. Before the boron expansion equipment is operated, the controller can control the pulse control valve 5 to start and stop intermittently, so as to use the clean gas source 15 to perform a rapid pulse process, thereby destroying the liquid seal of the overflow pipe 4 by the liquid adsorption solvent by increasing the liquid level fluctuation.

[0129] The controller can control the pulse control valve 5 to open at the same time interval or at different time intervals, so as to realize a fast pulse process using the clean gas source 15 .

[0130] Exemplarily, the interval duration of the start and stop of the control valve can be 0.3s to 1s. For example, the controller can control the pulse control valve 5 to open every 0.3s, 0.5s, 0.8s, 0.9s or 1s, that is, the pulse control valve 5 is opened at intervals of the same length; or, the controller can control the pulse control valve 5 to open at intervals of different lengths, for example, the interval between the first opening and the second opening is 0.3s, and the interval between the second opening and the third opening is 0.5s.

[0131] Before the boron expansion device is turned on, the pulse control valve 5 and the controller work together to destroy the liquid seal of the overflow pipe 4 first, and the tail gas generated after the boron expansion device is turned on can be smoothly extracted, thereby improving the working stability of the boron expansion device.

[0132] In the related art, in the filtration scheme using liquid liquid adsorption solvent, because of the structure of multiple filter containers in series, during the process of adding water to the filter container, a liquid seal will occur at the bottom of the overflow pipe. The overflow pipe liquid seal will cause a sudden increase in resistance during the subsequent vacuuming process, causing air flow disturbances that affect the expansion industry and also affect the service life of the diaphragm pump diaphragm.

[0133] According to the control method of the exhaust gas treatment system of the borax equipment provided in the embodiment of the present application, by setting a pulse control valve 5 and a controller, the pulse control valve 5 and the controller work together, and the controller is configured to control the intermittent start and stop of the pulse control valve 5 before the borax equipment is operated, so that a fast pulse process can be performed using the clean gas source 15, thereby increasing the liquid level fluctuation of the liquid adsorption solvent in the filter container 2, and then destroying the liquid seal of the liquid adsorption solvent on the overflow pipe 4, thereby reducing the evacuation resistance of the exhaust gas treatment system, reducing the impact of air flow disturbance on the borax industry, and increasing the service life of the diaphragm of the diaphragm pump.

[0134] In some embodiments, before step 220, controlling the pulse control valve 5 to start and stop intermittently to destroy the liquid seal of the overflow pipe 4, includes: opening the first control valve 10 and the second control valve 7 based on the first input.

[0135] In this step, the controller controls the first control valve 10 and the second control valve 7 to open first, and then controls the pulse control valve 5 to start and stop intermittently.

[0136] The first control valve 10 is arranged between the clean air source 15 and the pulse control valve 5, and the second control valve 7 is arranged between the filter device group and the exhaust main port.

[0137] The first control valve 10 and the second control valve 7 may be solenoid valves.

[0138] In this embodiment, the first control valve 10 is used to control the on-off of the connecting pipeline between the clean gas source 15 and the pulse control valve 5, and the second control valve 7 is used to control the on-off of the connecting pipeline between the filter device group and the exhaust main port. The pulse control valve 5 can control the on-off of the connecting pipeline between the clean gas source 15 and the filter device group when the first control valve 10 is opened.

[0139] When the first control valve 10 and the second control valve 7 are both open, the pulse control valve 5 is opened to connect the clean gas source 15 with the exhaust main port, and the clean gas can be discharged in sequence through the first control valve 10, the pulse control valve 5, the filter device group and the second control valve 7. The clean gas can quickly pulse the liquid adsorption solvent. The pulse control valve 5 is closed to stop the clean gas pulse, so that the clean gas can disturb the liquid adsorption solvent in the filter container 2.

[0140] When the first control valve 10 is open and the second control valve 7 is closed, the gas passage path between the clean gas source 15 and the exhaust main port is disconnected, and the opening of the pulse control valve 5 will connect the clean gas source 15 with the filter device group. The clean gas will cause a slight disturbance to the liquid adsorption solvent in the filter container 2, which can destroy the liquid seal of the liquid adsorption solvent on the overflow pipe 4 to a certain extent.

[0141] When the first control valve 10 is closed and the second control valve 7 is opened, the gas passage path between the clean gas source 15 and the exhaust main port is disconnected, and the opening of the pulse control valve 5 has no effect on the connection between the clean gas source 15 and the exhaust main port, and will not cause disturbance to the liquid adsorption solvent in the filter container 2.

[0142] When the first control valve 10 and the second control valve 7 are both closed, the opening and closing of the pulse control valve 5 has no effect on the communication between the clean gas source 15 and the exhaust main port.

[0143] In some embodiments, step 220, before the boron expansion equipment is operated, the pulse control valve 5 is controlled to start and stop intermittently to destroy the liquid seal of the overflow pipe 4, including: controlling the pulse control valve 5 to start and stop intermittently within a target time length.

[0144] The target duration is a preset duration, which determines the duration of the cyclic start and stop of the pulse control valve 5. The target duration may be 3s to 10s, such as 3s, 4s, 7s, 8s or 10s.

[0145] For example, the controller may control the pulse control valve 5 to be repeatedly opened and closed intermittently within 5 seconds before the boron expansion device is operated to break the liquid seal of the overflow pipe 4.

[0146] For example, the controller may control the pulse control valve 5 to be repeatedly opened and closed intermittently within 6 seconds before the boron expansion device is operated to break the liquid seal of the overflow pipe 4.

[0147] In this embodiment, by setting the duration of the cyclic start and stop of the pulse control valve 5, it is possible to achieve a better effect of breaking the liquid seal and shorten the delay time for the boron expansion equipment to start running.

[0148] In some embodiments, step 220, controlling the pulse control valve 5 to start and stop intermittently within a target duration, includes: controlling the pulse control valve 5 to operate at a target duty cycle within the target duration.

[0149] Among them, the target duty cycle is a set value, and the target duty cycle m satisfies: 30%≤m<100%. For example, the target duty cycle m can be 30%, 35%, 40%, 50%, 65%, 75% or 80%.

[0150] In this embodiment, before the boron expansion equipment is operated, the controller controls the pulse control valve 5 to set the target duty cycle according to the ratio of the opening time to the target duration, which can not only meet the pulse control valve 5 to form a rapid pulse to destroy the liquid seal of the overflow pipe 4, but also reduce energy consumption and save costs.

[0151] An embodiment of the present application also provides a boron expansion device, comprising: a vacuum furnace 1 and an exhaust gas treatment system of the boron expansion device in any of the above embodiments, wherein the air inlet of the exhaust gas treatment system is connected to the air outlet of the vacuum furnace 1.

[0152] According to the boron expansion equipment provided in the embodiment of the present application, a tail gas treatment system is set up, and the tail gas treatment system is provided with a pulse control valve 5 and a controller. The pulse control valve 5 and the controller work together, and the controller is configured to control the pulse control valve 5 to start and stop intermittently before the boron expansion equipment is operated, so that a clean gas source 15 can be used to perform a rapid pulse process, thereby increasing the liquid level fluctuation of the liquid adsorption solvent in the filter container 2, and then destroying the liquid seal of the liquid adsorption solvent on the overflow pipe 4, thereby reducing the evacuation resistance of the tail gas treatment system, reducing the impact of air flow disturbance on the boron expansion industry, and increasing the service life of the diaphragm of the diaphragm pump.

[0153] The terms "first", "second", etc. in the specification and claims of the present application are used to distinguish similar objects, and are not used to describe a specific order or sequence. It should be understood that the data used in this way can be interchangeable under appropriate circumstances, so that the embodiments of the present application can be implemented in an order other than those illustrated or described here, and the objects distinguished by "first", "second", etc. are generally of one type, and the number of objects is not limited. For example, the first object can be one or more. In addition, "and / or" in the specification and claims represents at least one of the connected objects, and the character " / " generally indicates that the objects associated with each other are in an "or" relationship.

[0154] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0155] In the description of this application, "first feature" or "second feature" may include one or more of the features.

[0156] In the description of the present application, “plurality” means two or more.

[0157] In the description of the present application, a first feature being “on” or “under” a second feature may include that the first and second features are directly in contact with each other, or may include that the first and second features are not in direct contact with each other but are in contact with each other via another feature therebetween.

[0158] In the description of the present application, “above”, “over” and “above” a first feature to a second feature includes the first feature being directly above and obliquely above the second feature, or simply means that the first feature is horizontally higher than the second feature.

[0159] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in any one or more embodiments or examples in a suitable manner.

[0160] Although the embodiments of the present application have been shown and described, those skilled in the art will appreciate that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present application, and that the scope of the present application is defined by the claims and their equivalents.

Claims

1. A tail gas treatment system for a boron expansion device, characterized in that: The tail gas treatment system has an air intake main port and an air exhaust main port, wherein the air intake main port is suitable for being connected to the air outlet of the vacuum furnace of the boron expansion equipment, and the tail gas treatment system comprises: A filter device group, comprising at least one filter device, wherein a liquid adsorption solvent is contained in a filter container of the filter device, an air inlet pipe of the filter device extends into the liquid adsorption solvent, an inlet of the filter device group is used to be connected to the main air inlet, at least one filter device is provided with an overflow pipe, an outlet pipe of the filter device group extends into the overflow pipe, and the outlet pipe of the filter device group is used to be connected to the main air outlet; A pulse control valve connected between the inlet of the filter device group and the clean air source; A controller is connected to the pulse control valve and is configured to control the intermittent start and stop of the pulse control valve before the boron expansion device is operated.

2. The tail gas treatment system of the boron expansion equipment according to claim 1, characterized in that: The controller is configured to control the pulse control valve to start and stop intermittently within a target duration.

3. The tail gas treatment system of the boron expansion equipment according to claim 1, characterized in that: Also includes: a first control valve and a second control valve, wherein the first control valve is arranged between the clean air source and the pulse control valve, and the second control valve is arranged between the filter device group and the exhaust main port; The controller is configured to control the pulse control valve to start and stop intermittently when the first control valve and the second control valve are opened.

4. The tail gas treatment system of the boron expansion equipment according to claim 1, characterized in that: Also includes: A bypass pipeline, both ends of which are respectively connected to the inlet of the filter device group and the outlet of the filter device group, and is provided with a third control valve.

5. The tail gas treatment system of the boron expansion equipment according to claim 1, characterized in that: Also includes: a fourth control valve, the fourth control valve being adapted to be arranged between an outlet of a liquid supply device and an inlet of the filter device group, the liquid supply device being used to provide the liquid adsorption solvent; a fifth control valve, the fifth control valve being arranged between the gas outlet of the vacuum furnace of the boron expansion equipment and the inlet of the filter device group; A sixth control valve is suitable for being arranged between the waste liquid collecting device and the inlet of the filtering device group.

6. The tail gas treatment system of the boron expansion equipment according to any one of claims 1 to 5, characterized in that: The filter device group includes a plurality of the filter devices connected in series.

7. The tail gas treatment system of the boron expansion equipment according to any one of claims 1 to 5, characterized in that: Also includes: A cooler, the cooler being arranged between the gas outlet of the vacuum furnace of the boron expansion equipment and the inlet of the filter device group; and / or, A protector is arranged between the gas outlet of the vacuum furnace of the boron expansion equipment and the inlet of the filter device group.

8. A control method for an exhaust gas treatment system of a boron expansion device, applied to an exhaust gas treatment system of a boron expansion device according to any one of claims 1 to 7, characterized in that: include: Get the first input; Based on the first input, the pulse control valve is controlled to start and stop intermittently before the boron expansion device is operated to destroy the liquid seal of the overflow pipe.

9. The control method of the tail gas treatment system of the boron expansion equipment according to claim 8, characterized in that: Before controlling the pulse control valve to start and stop intermittently to destroy the liquid seal of the overflow pipe, the method includes: Based on the first input, a first control valve and a second control valve are opened.

10. The control method of the tail gas treatment system of the boron expansion equipment according to claim 8, characterized in that: The intermittent start and stop of the pulse control valve is controlled before the boron expansion equipment is operated to destroy the liquid seal of the overflow pipe, including: The pulse control valve is controlled to start and stop intermittently within a target duration.

11. The control method of the tail gas treatment system of the boron expansion equipment according to claim 10, characterized in that: The intermittent start and stop of the pulse control valve is controlled within the target time period, including: The pulse control valve is controlled to operate at a target duty cycle within the target time period.

12. A boron expansion device, characterized in that: include: Vacuum furnace; The tail gas treatment system of the boron expansion equipment according to any one of claims 1 to 7, wherein the air inlet of the tail gas treatment system is connected to the air outlet of the vacuum furnace.