Rotary reciprocating type photovoltaic silicon wafer cleaning equipment

Abstract

The invention discloses rotary reciprocating type photovoltaic silicon wafer cleaning equipment, and relates to the technical field of photovoltaic silicon wafer cleaning, the rotary reciprocating type photovoltaic silicon wafer cleaning equipment comprises a cleaning box, two conveying assemblies are arranged in an inner cavity of the cleaning box, and a flushing assembly is arranged in the inner cavity of the cleaning box. According to the rotary reciprocating type photovoltaic silicon wafer cleaning equipment, through cooperative use of the reciprocating mechanism and the rotating mechanism, the conveying rod is driven by the rotating mechanism to rotate, and when photovoltaic silicon wafers are placed on the conveying rod to be conveyed, the photovoltaic silicon wafers can move by a certain distance in the direction of the reciprocating mechanism and then move by a certain distance in the reverse direction; due to the fact that the number of teeth of one half gear is large and the number of teeth of the other half gear is small, the forward moving distance of the photovoltaic silicon wafer is larger than the reverse moving distance, and when the photovoltaic silicon wafer is located between the two cleaning sponges, the photovoltaic silicon wafer can be cleaned through reciprocating motion of the cleaning sponges. Therefore, the effect of cleaning the same place of the photovoltaic silicon wafer for multiple times is achieved.

Description

Technical Field

[0001] The invention relates to the technical field of photovoltaic silicon wafer cleaning, and in particular to a rotary reciprocating photovoltaic silicon wafer cleaning device. Background Art

[0002] Photovoltaic silicon wafers are high-purity flaky silicon formed by slicing, polishing, cleaning and other processes on silicon rods. They are the core raw material for photovoltaic cells and are also important semiconductor materials. They have the characteristics of high-efficiency conversion, long life and low attenuation rate, and are a key material for manufacturing solar cells.

[0003] In the prior art, cleaning equipment is usually used to clean photovoltaic silicon wafers. Although a wiping structure is provided in some existing cleaning equipment, when the photovoltaic silicon wafer passes through the wiping structure, the wiping structure mostly wipes the same place on the photovoltaic silicon wafer once, which is not convenient for multiple reciprocating wiping of the photovoltaic silicon wafer, resulting in poor cleaning effect of the photovoltaic silicon wafer.

[0004] Combining the above problems, we will find that it is difficult to avoid the above problems at the same time when using the existing cleaning equipment on the market, and even if it can be solved, it needs to be solved with the cooperation of external tools, which makes it impossible to achieve the desired effect. Therefore, we propose a rotary reciprocating photovoltaic silicon wafer cleaning equipment. Summary of the invention

[0005] The purpose of the present invention is to provide a rotary reciprocating photovoltaic silicon wafer cleaning device to solve the problems raised in the above background technology.

[0006] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a rotary reciprocating photovoltaic silicon wafer cleaning device, comprising a cleaning box, the inner cavity of the cleaning box is provided with two groups of conveying components, the inner cavity of the cleaning box is provided with a flushing component, the flushing component is used to rinse the photovoltaic silicon wafers, the conveying component comprises a conveying rod rotatably connected to the inner cavity of the cleaning box, the number of the conveying rods is several, one end of the conveying rod passes through the outside of the cleaning box and is fixedly connected with a double-groove transmission shaft, two adjacent double-groove transmission shafts are connected by belt drive, a reciprocating mechanism is provided between the opposite sides of the two conveying components, the reciprocating mechanism is used to wipe the photovoltaic silicon wafers, one side of the cleaning box is provided with a rotating mechanism used in conjunction with the conveying component, the rotating mechanism is used to drive the conveying rod, and the other side of the cleaning box is provided with a feeding mechanism used in conjunction with the reciprocating mechanism, the feeding mechanism is used to apply cleaning agent to the surface of the photovoltaic silicon wafer.

[0007] Preferably, the reciprocating mechanism includes a fixed frame fixedly connected to the inner wall of the cleaning box, the number of the fixed frames is two, the inner cavity of the fixed frame is slidably connected with a sliding plate, the two opposite sides of the fixed frames are fixedly connected with a cleaning sponge, the inner cavity of the fixed frame is slidably connected with two guide rods, the two opposite sides of the guide rods are fixedly connected to the sliding plate, the opposite sides of the two guide rods pass through the fixed frame and extend to the inner cavity of the cleaning box, the surface of the guide rod is slidably connected to the inner cavity of the cleaning box, one end of one of the guide rods is fixedly connected to a first spring, one end of the first spring is fixedly connected to the inner wall of the cleaning box, the inner wall of the cleaning box is rotatably connected with a rotating rod, the surface of the rotating rod is fixedly connected with a cam, the number of the cams is two, and the surface of the cam is in contact with one end of the guide rod.

[0008] Preferably, the rotating mechanism includes a fixed frame fixedly connected to one side of the cleaning box, the inner cavity of the fixed frame is rotatably connected to two first gears, the two first gears are meshed with each other, and one side of the two first gears is fixedly connected to a half gear, wherein one end of the two conveying rods passes through the outside of the cleaning box and is fixedly connected to the second gear, and a third gear is meshed and connected between the opposite sides of the two second gears, one side of the third gear is rotatably connected to the inner cavity of the cleaning box, and the other side of the third gear is fixedly connected to a fourth gear, the fourth gear is located between the two half gears, and the fourth gear is meshed with the half gears, and one side of the fixed frame is fixedly connected to a first motor, and the output end of the first motor passes through the inner cavity of the fixed frame and is fixedly connected to one side of one of the first gears.

[0009] Preferably, a rotating rod is fixedly connected to one side of the third gear, the surface of the rotating rod is rotatably connected to the inner wall of the cleaning box, the surface of the rotating rod is fixedly connected to the first bevel gear, one end of the rotating rod is fixedly connected to the second bevel gear, and the first bevel gear is meshed with the second bevel gear.

[0010] Preferably, the flushing assembly includes a fixed pipe fixedly connected to one side of the cleaning box, a water pump is provided on one side of the fixed pipe, the output end of the water pump is fixedly connected to the surface of the fixed pipe, the inner cavity of the cleaning box is provided with two groups of connecting components, the connecting component includes two fixed shells fixedly connected to the inner cavity of the cleaning box, the two fixed shells are fixedly connected to nozzles on opposite sides, and the number of the nozzles is several, one side of the fixed shell is fixedly connected to a connecting pipe, one end of the connecting pipe passes through the outside of the cleaning box and is fixedly connected to the surface of the fixed pipe.

[0011] Preferably, four support rods are fixedly connected to the top of the cleaning box, and the tops of the four support rods are commonly fixedly connected to a support plate, and the top of the support plate is fixedly connected to a hydraulic telescopic rod, and the telescopic end of the hydraulic telescopic rod passes through the support plate and is fixedly connected to a movable plate, and the inner cavity of the movable plate is rotatably connected to a pressure roller used in conjunction with a conveying rod, and the number of the pressure rollers is several.

[0012] Preferably, the feeding mechanism includes a mounting plate fixedly connected to one side of the cleaning box, one side of the mounting plate is fixedly connected to a mounting rod, one end of the mounting rod is fixedly connected to a mounting cylinder, the inner cavity of the mounting cylinder is slidably connected to a piston block, one side of the piston block is fixedly connected to an adjusting rod, the surface of the adjusting rod is slidably connected to the inner cavity of the mounting cylinder, the top of the support plate is fixedly connected to a liquid storage tank, the number of the liquid storage tanks is two, the surface of the mounting cylinder is fixedly connected to a first one-way valve, one end of the first one-way valve is fixedly connected to a first long tube, one end of the two first long tubes are respectively fixedly connected to one side of the two liquid storage tanks, the surface of the mounting cylinder is also fixedly connected to two second one-way valves, one end of the second one-way valve is fixedly connected to a second long tube, one end of the two second long tubes both penetrate to the inner wall of the cleaning box and are respectively communicated with two fixed frames, the inner wall of the fixed frame is provided with a liquid outlet, the number of the liquid outlet holes is several, and the liquid outlet hole is communicated with the mounting cylinder through the fixed frame, the second long tube and the second one-way valve.

[0013] Preferably, one end of the adjusting rod is fixedly connected to a short rod, and one side of the short rod is slidably connected to a toothed plate, one side of one of the double-groove transmission shafts is fixedly connected to a fifth gear used in conjunction with the toothed plate, the top of the cleaning box is slidably connected to a sliding rod, there are two sliding rods, and a pressure rod is commonly fixedly connected to the tops of the two sliding rods, one side of the movable plate is fixedly connected to an extrusion block used in conjunction with the pressure rod, one side of the pressure rod is slidably connected to an L-shaped rod, there are two L-shaped rods, and one end of each of the two L-shaped rods is fixedly connected to the toothed plate.

[0014] Preferably, the surface movable sleeve of the sliding rod is provided with a second spring, one end of the second spring is fixedly connected to the pressure rod, and the other end of the second spring is fixedly connected to the top of the cleaning box, and the surface movable sleeve of the adjusting rod is provided with a third spring, one end of the third spring is fixedly connected to the mounting tube, and the other end of the third spring is fixedly connected to the surface of the short rod.

[0015] Preferably, a sealing ring is fixedly connected to the inner wall of the mounting tube, and the inner wall of the sealing ring is in close contact with the surface of the adjusting rod.

[0016] Compared with the prior art, the present invention has the following beneficial effects: The present invention arranges a reciprocating mechanism and a rotating mechanism for coordinated use. The rotating mechanism drives the conveying rod to rotate. When the photovoltaic silicon wafer is placed on the conveying rod for conveying, the photovoltaic silicon wafer will move a certain distance in the direction of the reciprocating mechanism and then move a certain distance in the reverse direction. Since one half gear has a larger number of teeth and the other half gear has a smaller number of teeth, the forward movement distance of the photovoltaic silicon wafer is greater than the reverse movement distance. When the photovoltaic silicon wafer is located between two cleaning sponges, the reciprocating motion of the cleaning sponges will clean the photovoltaic silicon wafer. Combined with the forward movement of the photovoltaic silicon wafer for a certain distance and then the reverse movement of the photovoltaic silicon wafer for a certain distance, the effect of multiple cleaning of the same place on the photovoltaic silicon wafer can be achieved.

[0017] The present invention sets a feeding mechanism so that when the conveying rod is rotated, the fifth gear rotates synchronously. The cooperation between the fifth gear and the toothed plate drives the piston block to move in the inner cavity of the mounting cylinder, so that the piston block squeezes the detergent into the second long tube through the second one-way valve and discharges it from the liquid outlet, so that the detergent is smeared on the top and bottom of the photovoltaic silicon wafer, further improving the cleaning effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a schematic diagram of the overall structure of the present invention; Figure 2 It is a schematic diagram of the structure of the cleaning box, the mounting plate and the conveying rod of the present invention; Figure 3 It is a schematic diagram of the structure of the conveying rod, the fixing tube and the fixing shell of the present invention; Figure 4 It is a structural schematic diagram of the fixed frame, the sliding plate and the conveying rod of the present invention; Figure 5 is an exploded schematic diagram of the first gear, the second gear and the fourth gear of the present invention; Figure 6 It is a structural schematic diagram of the movable plate, the pressure rod, the mounting tube and the first long tube of the present invention; Figure 7 It is a cross-sectional schematic diagram of the installation tube of the present invention; Figure 8 It is an exploded schematic diagram of the fixed frame and the sliding plate of the present invention.

[0019] In the figure: 1, cleaning box; 2, conveying assembly; 201, conveying rod; 202, double-groove transmission shaft; 203, belt; 3, flushing assembly; 301, fixed pipe; 302, water pump; 303, fixed shell; 304, nozzle; 305, connecting pipe; 4, reciprocating mechanism; 401, fixed frame; 402, sliding plate; 403, cleaning sponge; 404, guide rod; 405, first spring; 406, rotating rod; 407, cam; 5, rotating mechanism; 501, fixed frame; 502, first gear; 503, half gear; 504, second gear; 505, third gear; 506, fourth gear; 507, first motor; 508, rotating rod; 509, The first bevel gear; 510, the second bevel gear; 6, the feeding mechanism; 601, the mounting plate; 602, the mounting rod; 603, the mounting cylinder; 604, the piston block; 605, the adjusting rod; 606, the liquid storage tank; 607, the first one-way valve; 608, the first long tube; 609, the second one-way valve; 610, the second long tube; 611, the liquid outlet; 612, the short rod; 613, the tooth plate; 614, the fifth gear; 615, the sliding rod; 616, the pressure rod; 617, the extrusion block; 618, the L-shaped rod; 619, the second spring; 620, the third spring; 621, the sealing ring; 7, the support rod; 8, the support plate; 9, the hydraulic telescopic rod; 10, the moving plate; 11, the pressure roller. DETAILED DESCRIPTION

[0020] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0021] Example 1: Please refer to Figure 1-Figure 8The present invention provides a technical solution: a rotary reciprocating photovoltaic silicon wafer cleaning device, comprising a cleaning box 1, the inner cavity of the cleaning box 1 is provided with two groups of conveying components 2, the inner cavity of the cleaning box 1 is provided with a flushing component 3, the flushing component 3 is used to flush the photovoltaic silicon wafer, the conveying component 2 comprises a conveying rod 201 rotatably connected to the inner cavity of the cleaning box 1, the number of the conveying rods 201 is several, one end of the conveying rod 201 passes through the outside of the cleaning box 1 and is fixedly connected with a double-groove transmission shaft 202, the two adjacent double-groove transmission shafts 202 are connected by a belt 203, and the two conveying components 2 are connected on opposite sides. A reciprocating mechanism 4 is provided, and the reciprocating mechanism 4 is used to wipe the photovoltaic silicon wafers. A rotating mechanism 5 used in conjunction with the conveying component 2 is provided on one side of the cleaning box 1, and the rotating mechanism 5 is used to drive the conveying rod 201. A feeding mechanism 6 used in conjunction with the reciprocating mechanism 4 is provided on the other side of the cleaning box 1, and the feeding mechanism 6 is used to apply cleaning agent to the surface of the photovoltaic silicon wafers. By setting up a plurality of double-groove transmission shafts 202 and belts 203 for use in conjunction, when one of the conveying rods 201 is rotated, the conveying rods 201 of the same group can be driven to rotate, thereby achieving the effect of conveying the photovoltaic silicon wafers.

[0022] The reciprocating mechanism 4 includes a fixed frame 401 fixedly connected to the inner wall of the cleaning box 1, the number of the fixed frames 401 is two, the inner cavity of the fixed frame 401 is slidably connected to a sliding plate 402, the opposite sides of the two fixed frames 401 are fixedly connected to a cleaning sponge 403, the inner cavity of the fixed frame 401 is slidably connected to two guide rods 404, the opposite sides of the two guide rods 404 are fixedly connected to the sliding plate 402, the opposite sides of the two guide rods 404 penetrate the fixed frame 401 and extend to the inner cavity of the cleaning box 1, the surface of the guide rod 404 is slidably connected to the inner cavity of the cleaning box 1, one end of one of the guide rods 404 is fixedly connected to a first spring 405, and one end of the first spring 405 is fixedly connected to the inner wall of the cleaning box 1 The inner wall of the cleaning box 1 is rotatably connected with a rotating rod 406, and a cam 407 is fixedly connected to the surface of the rotating rod 406. There are two cams 407, and the surface of the cam 407 contacts one end of the guide rod 404. By setting a reciprocating mechanism 4, when the photovoltaic silicon wafer is located between the two cleaning sponges 403, the cam 407 is rotated so that the cam 407 squeezes the guide rod 404, so that the guide rod 404 drives the sliding plate 402 to move in the inner cavity of the fixed frame 401, and then the force deformation of the first spring 405 is used to make the guide rod 404 keep in contact with the cam 407, so that the sliding plate 402 drives the cleaning sponge 403 to reciprocate, thereby achieving the effect of multiple cleaning of the photovoltaic silicon wafer.

[0023] The specific implementation of this embodiment is as follows: two fixed frames 401 are located between two groups of conveying components 2, wherein the surface fixed sleeve of the conveying rod 201 is provided with multiple fixed rings, and the photovoltaic silicon wafer is placed between two adjacent fixed rings so that the bottom of the photovoltaic silicon wafer is flush with the top of the fixed frame 401 below. When the photovoltaic silicon wafer is located between the two cleaning sponges 403, the rotation of the cam 407 will squeeze the guide rod 404, so that the guide rod 404 drives the sliding plate 402 to move in the inner cavity of the fixed frame 401, and then the force deformation of the first spring 405 is used to keep the guide rod 404 in contact with the cam 407, so that the sliding plate 402 drives the cleaning sponge 403 to move back and forth, thereby achieving the effect of multiple cleaning of the photovoltaic silicon wafer.

[0024] Example 2: Please refer to Figure 1-Figure 8 The present invention provides a technical solution: a rotary reciprocating photovoltaic silicon wafer cleaning device. The present invention makes corresponding improvements to the technical problems mentioned in the background technology.

[0025] The rotating mechanism 5 includes a fixed frame 501 fixedly connected to one side of the cleaning box 1, and the inner cavity of the fixed frame 501 is rotatably connected to two first gears 502, the two first gears 502 are meshed with each other, and one side of the two first gears 502 is fixedly connected to a half gear 503, wherein one end of the two conveying rods 201 passes through the outside of the cleaning box 1 and is fixedly connected to a second gear 504, and a third gear 505 is meshed and connected between the opposite sides of the two second gears 504, one side of the third gear 505 is rotatably connected to the inner cavity of the cleaning box 1, and the other side of the third gear 505 is fixedly connected to a fourth gear 506, the fourth gear 506 is located between the two half gears 503, and the fourth gear 506 is meshed with the half gear 503, and one side of the fixed frame 501 is fixedly connected to a first motor 507, and the output end of the first motor 507 passes through the fixed The inner cavity of the frame 501 is fixedly connected to one side of one of the first gears 502. By setting the rotating mechanism 5, when the conveying rod 201 is driven, the first motor 507 is started by using an external control switch, and the first gear 502 is driven to rotate through the output end of the first motor 507, so that one of the first gears 502 drives the half gear 503 with more teeth to rotate forward, and the other first gear 502 drives the half gear 503 with fewer teeth to rotate reversely, so that the fourth gear 506 rotates a certain angle first and then rotates reversely, and then through the rotation of the fourth gear 506, the two second gears 504 rotate in the same direction, thereby achieving the effect of driving the conveying rod 201, so that the photovoltaic silicon wafer moves forward for a distance and then moves reversely for a distance, wherein the forward movement distance of the photovoltaic silicon wafer is greater than the reverse movement distance.

[0026] A rotating rod 508 is fixedly connected to one side of the third gear 505, and the surface of the rotating rod 508 is rotatably connected to the inner wall of the cleaning box 1. The surface of the rotating rod 508 is fixedly connected to the first bevel gear 509, and one end of the rotating rod 406 is fixedly connected to the second bevel gear 510, and the first bevel gear 509 is meshed with the second bevel gear 510. By setting the rotating rod 508, the first bevel gear 509 and the second bevel gear 510 for coordinated use, since the number of teeth of the first bevel gear 509 is greater than the number of teeth of the second bevel gear 510, when the third gear 505 is rotated, the rotating rod 508 will be driven to rotate rapidly, thereby causing the first bevel gear 509 to rotate. Since the first bevel gear 509 is meshed with the second bevel gear 510, the effect of driving the second bevel gear 510 to rotate is achieved. The rotation of the second bevel gear 510 will drive the rotating rod 406 and the cam 407 to rotate, thereby achieving the effect of driving the cam 407 to rotate.

[0027] The flushing assembly 3 includes a fixed pipe 301 fixedly connected to one side of the cleaning box 1, a water pump 302 is provided on one side of the fixed pipe 301, and the output end of the water pump 302 is fixedly connected to the surface of the fixed pipe 301. The inner cavity of the cleaning box 1 is provided with two sets of connecting components, and the connecting components include two fixed shells 303 fixedly connected to the inner cavity of the cleaning box 1. The two fixed shells 303 are fixedly connected to the nozzles 304 on the opposite sides. The number of nozzles 304 is several. One side of the fixed shell 303 is fixedly connected to a connecting pipe 305, and one end of the connecting pipe 305 passes through the cleaning box 1. The outside of the box 1 is fixedly connected to the surface of the fixed pipe 301. By setting the flushing component 3, the input end of the water pump 302 is connected to the external water storage device. The water pump 302 is started to transport the water in the external water storage device to the inner cavity of the fixed pipe 301, and is transported to the fixed shell 303 through the connecting pipe 305, and is sprayed out from the nozzle 304. The nozzle 304 on the lower fixed shell 303 is located between the two conveying rods 201, so that the nozzle 304 on the lower fixed shell 303 can spray on the bottom of the photovoltaic silicon wafer, thereby achieving the effect of spraying the photovoltaic silicon wafer.

[0028] Four support rods 7 are fixedly connected to the top of the cleaning box 1, and a support plate 8 is fixedly connected to the top of the four support rods 7. A hydraulic telescopic rod 9 is fixedly connected to the top of the support plate 8. The telescopic end of the hydraulic telescopic rod 9 penetrates the support plate 8 and is fixedly connected to a movable plate 10. The inner cavity of the movable plate 10 is rotatably connected to a pressure roller 11 used in conjunction with the conveying rod 201. The number of the pressure rollers 11 is several. By setting the support rods 7, the support plates 8, the hydraulic telescopic rods 9 and the pressure rollers 11 for coordinated use, when the photovoltaic silicon wafer moves to the bottom of the pressure rollers 11, the hydraulic telescopic rods 9 are started by an external control switch, so that the movable plate 10 drives the pressure rollers 11 to move downward, so that the photovoltaic silicon wafer is located between the conveying rod 201 and the pressure rollers 11, increasing the friction between the photovoltaic silicon wafer and the conveying rod 201. The friction is greater than the friction generated by the cleaning sponge 403 on the photovoltaic silicon wafer, so that the photovoltaic silicon wafer can pass through between the two cleaning sponges 403, avoiding the photovoltaic silicon wafer from being unable to move when the cleaning sponge 403 wipes the photovoltaic silicon wafer.

[0029] The specific implementation of this embodiment is as follows: when driving the conveying rod 201, the first motor 507 is started by using an external control switch, and the first gear 502 is driven to rotate through the output end of the first motor 507, so that one of the first gears 502 drives the half gear 503 with more teeth to rotate forward, and the other first gear 502 drives the half gear 503 with fewer teeth to rotate reversely, so that the fourth gear 506 rotates a certain angle first and then rotates reversely, and then the rotation of the fourth gear 506 makes the two second gears 504 rotate in the same direction, thereby achieving the effect of driving the conveying rod 201, so that the photovoltaic silicon wafer moves forward for a distance and then moves to the next position. Move in the opposite direction for a distance, wherein the forward movement distance of the photovoltaic silicon wafer is greater than the reverse movement distance. When the third gear 505 is rotated, the rotating rod 508 will be driven to rotate rapidly, thereby causing the first bevel gear 509 to rotate. Since the first bevel gear 509 is meshed with the second bevel gear 510, the second bevel gear 510 is driven to rotate. The rotation of the second bevel gear 510 will drive the rotating rod 406 and the cam 407 to rotate, thereby driving the cam 407 to rotate, causing the cleaning sponge 403 to reciprocate to clean the photovoltaic silicon wafer, thereby achieving the effect of cleaning the same place of the photovoltaic silicon wafer multiple times.

[0030] Example 3: Please refer to Figure 1-Figure 8 The present invention provides a technical solution: a rotary reciprocating photovoltaic silicon wafer cleaning device. The present invention makes corresponding improvements to the technical problems mentioned in the background technology.

[0031] The feeding mechanism 6 includes a mounting plate 601 fixedly connected to one side of the cleaning box 1, a mounting rod 602 is fixedly connected to one side of the mounting plate 601, one end of the mounting rod 602 is fixedly connected to a mounting cylinder 603, the inner cavity of the mounting cylinder 603 is slidably connected to a piston block 604, one side of the piston block 604 is fixedly connected to an adjusting rod 605, the surface of the adjusting rod 605 is slidably connected to the inner cavity of the mounting cylinder 603, the top of the support plate 8 is fixedly connected to a liquid storage tank 606, the number of liquid storage tanks 606 is two, the surface of the mounting cylinder 603 is fixedly connected to a first one-way valve 607, one end of the first one-way valve 607 is fixedly connected to a first long tube 608, one end of the two first long tubes 608 is fixedly connected to one side of the two liquid storage tanks 606, and the surface of the mounting cylinder 603 is also fixedly connected to There are two second one-way valves 609, one end of the second one-way valve 609 is fixedly connected to the second long tube 610, one end of the two second long tubes 610 both penetrate the inner wall of the cleaning box 1 and are respectively communicated with the two fixed frames 401, the inner wall of the fixed frame 401 is provided with liquid outlet holes 611, the number of liquid outlet holes 611 is several, the liquid outlet holes 611 are communicated with the mounting cylinder 603 through the fixed frame 401, the second long tube 610 and the second one-way valve 609, and the feeding mechanism 6 is set to move the piston block 604 in the inner cavity of the mounting cylinder 603, so that the piston block 604 squeezes the detergent into the second long tube 610 through the second one-way valve 609 and discharges it from the liquid outlet holes 611, so that the detergent is smeared on the top and bottom of the photovoltaic silicon wafer, further increasing the cleaning effect.

[0032] One end of the adjusting rod 605 is fixedly connected to a short rod 612, and one side of the short rod 612 is slidably connected to a toothed plate 613, one side of one of the double-groove transmission shafts 202 is fixedly connected to a fifth gear 614 used in conjunction with the toothed plate 613, the top of the cleaning box 1 is slidably connected to a sliding rod 615, the number of which is two, and the tops of the two sliding rods 615 are commonly fixedly connected to a pressure rod 616, one side of the movable plate 10 is fixedly connected to an extrusion block 617 used in conjunction with the pressure rod 616, one side of the pressure rod 616 is slidably connected to an L-shaped rod 618, the number of which is two, and one end of the two L-shaped rods 618 is fixedly connected to the toothed plate 613, by setting the short rod 612, the toothed plate 613, the fifth gear 614 and the pressure rod 616 for use, when the hydraulic telescopic rod 9 drives the movable plate 10 to move downward, it will drive the extrusion block 617 to move downward The pressing rod 616 is moved in a row, so that the extrusion block 617 squeezes the pressing rod 616, so that the pressing rod 616 moves downward. When the pressing rod 616 moves downward, it will drive the L-shaped rod 618 and the toothed plate 613 to move downward, so that the toothed plate 613 is meshed with the fifth gear 614. When the double-groove transmission shaft 202 rotates, it will drive the fifth gear 614 to rotate, so that the short rod 612 and the adjusting rod 605 move back and forth, thereby achieving the effect of moving the piston block 604. Among them, when the end of the toothed plate 613 is in a state of canceling the meshing with the fifth gear 614, the fifth gear 614 rotates in the reverse direction, which can drive the toothed plate 613 to move in the reverse direction. When the fifth gear 614 rotates forward, the toothed plate 613 can move to a state of canceling the meshing with the fifth gear 614, thereby achieving the effect of reciprocating the short rod 612, the adjusting rod 605 and the piston block 604.

[0033] The surface movable sleeve of the sliding rod 615 is provided with a second spring 619, one end of the second spring 619 is fixedly connected to the pressure rod 616, and the other end of the second spring 619 is fixedly connected to the top of the cleaning box 1. The surface movable sleeve of the adjusting rod 605 is provided with a third spring 620, one end of the third spring 620 is fixedly connected to the mounting cylinder 603, and the other end of the third spring 620 is fixedly connected to the surface of the short rod 612. By arranging the second spring 619 and the third spring 620, when the extrusion block 617 squeezes the pressure rod 616 downward, the second spring 619 will be deformed by force. When the extrusion of the pressure rod 616 is cancelled, the force deformation of the second spring 619 will drive the pressure rod 616 to reset, and after the pressure rod 616 is reset, it will drive the tooth plate 613 and the L-shaped rod 618 to move upward, so that the tooth plate 613 cancels the meshing with the fifth gear 614. At this time, the force deformation of the third spring 620 will drive the short rod 612 and the adjusting rod 605 to reset.

[0034] The inner wall of the mounting tube 603 is fixedly connected with a sealing ring 621, and the inner wall of the sealing ring 621 is in close contact with the surface of the adjusting rod 605. By setting the sealing ring 621, the sealing ring 621 is in close contact with the adjusting rod 605, thereby increasing the sealing between the adjusting rod 605 and the mounting tube 603 to prevent leakage of the cleaning liquid.

[0035] The specific implementation of this embodiment is as follows: when the hydraulic telescopic rod 9 drives the moving plate 10 to move downward, it will drive the extrusion block 617 to move downward, so that the extrusion block 617 squeezes the pressure rod 616, so that the pressure rod 616 moves downward, and when the pressure rod 616 moves downward, it will drive the L-shaped rod 618 and the toothed plate 613 to move downward, so that the toothed plate 613 is meshed with the fifth gear 614, and when the double-groove transmission shaft 202 rotates, it will drive the fifth gear 614 to rotate, so that the short rod 612 and the adjusting rod 605 move back and forth, thereby achieving the effect of moving the piston block 604, and the piston block 604 is installed in the inner part of the cylinder 603. When the cavity moves, the piston block 604 squeezes the detergent into the second long tube 610 through one of the second one-way valves 609, and then transports it to the liquid outlet 611 through the fixed frame 401 and discharges it from the liquid outlet 611. At this time, the detergent will be sucked into the inner cavity of the mounting cylinder 603 from the liquid storage tank 606, the first long tube 608 and the first one-way valve 607, so as to achieve the effect of continuously infusing the cleaning sponge 403, so that the detergent is smeared on the top and bottom of the photovoltaic silicon wafer, further increasing the cleaning effect. It should be noted that the first one-way valve 607 for transporting the detergent to the mounting cylinder 603 and the second one-way valve 609 for discharging the detergent from the mounting cylinder 603 are not on the same vertical line.

[0036] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0037] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A rotary reciprocating photovoltaic silicon wafer cleaning device, comprising a cleaning box (1), the inner cavity of the cleaning box (1) being provided with two groups of conveying components (2), the inner cavity of the cleaning box (1) being provided with a flushing component (3), the flushing component (3) being used for flushing the photovoltaic silicon wafer, the conveying component (2) comprising a conveying rod (201) rotatably connected to the inner cavity of the cleaning box (1), the number of the conveying rods (201) being several, and characterized in that: A reciprocating mechanism (4) is provided between opposite sides of the two conveying assemblies (2), and the reciprocating mechanism (4) is used to wipe the photovoltaic silicon wafers. A rotating mechanism (5) used in conjunction with the conveying assemblies (2) is provided on one side of the cleaning box (1); The reciprocating mechanism (4) comprises a fixed frame (401) fixedly connected to the inner wall of the cleaning box (1), the number of the fixed frames (401) being two, the inner cavity of the fixed frame (401) being slidably connected to a sliding plate (402), and the two opposite sides of the two fixed frames (401) being fixedly connected to a cleaning sponge (403); The rotating mechanism (5) comprises a fixing frame (501) fixedly connected to one side of the cleaning box (1); the inner cavity of the fixing frame (501) is rotatably connected to two first gears (502); the two first gears (502) are meshed with each other; one side of the two first gears (502) is fixedly connected to a half gear (503); one end of the two conveying rods (201) passes through the outside of the cleaning box (1) and is fixedly connected to a second gear (504); a third gear (505) is meshedly connected between opposite sides of the two second gears (504); one side of the third gear (505) is rotatably connected to the inner cavity of the cleaning box (1); and the other side of the third gear (505) is fixedly connected to a fourth gear (506).

2. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 1, characterized in that: The inner cavity of the fixed frame (401) is slidably connected to two guide rods (404), and opposite sides of the two guide rods (404) are fixedly connected to the sliding plate (402). The opposite sides of the two guide rods (404) penetrate the fixed frame (401) and extend to the inner cavity of the cleaning box (1). The surfaces of the guide rods (404) are slidably connected to the inner cavity of the cleaning box (1). One end of one of the guide rods (404) is fixedly connected to a first spring (405), and one end of the first spring (405) is fixedly connected to the inner wall of the cleaning box (1). The inner wall of the cleaning box (1) is rotatably connected to a rotating rod (406), and the surface of the rotating rod (406) is fixedly connected to a cam (407). There are two cams (407), and the surface of the cam (407) contacts one end of the guide rod (404).

3. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 2, characterized in that: The rotating mechanism (5) is used to drive the conveying rod (201). The other side of the cleaning box (1) is provided with a feeding mechanism (6) used in conjunction with the reciprocating mechanism (4). The feeding mechanism (6) is used to apply a cleaning agent to the surface of the photovoltaic silicon wafer. One end of the conveying rod (201) passes through the outside of the cleaning box (1) and is fixedly connected to a double-grooved transmission shaft (202). Two adjacent double-grooved transmission shafts (202) are connected by a belt (203). The fourth gear (506) is located between the two half gears (503). The fourth gear (506) is meshed with the half gears (503). One side of the fixed frame (501) is fixedly connected to a first motor (507). The output end of the first motor (507) passes through the inner cavity of the fixed frame (501) and is fixedly connected to one side of one of the first gears (502).

4. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 3, characterized in that: A rotating rod (508) is fixedly connected to one side of the third gear (505); the surface of the rotating rod (508) is rotatably connected to the inner wall of the cleaning box (1); the surface of the rotating rod (508) is fixedly connected to a first bevel gear (509); one end of the rotating rod (406) is fixedly connected to a second bevel gear (510); the first bevel gear (509) is meshed with the second bevel gear (510).

5. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 1, characterized in that: The flushing assembly (3) comprises a fixed pipe (301) fixedly connected to one side of the cleaning box (1); a water pump (302) is provided on one side of the fixed pipe (301); an output end of the water pump (302) is fixedly connected to the surface of the fixed pipe (301); the inner cavity of the cleaning box (1) is provided with two groups of connecting assemblies; the connecting assemblies comprise two fixed shells (303) fixedly connected to the inner cavity of the cleaning box (1); opposite sides of the two fixed shells (303) are fixedly connected to nozzles (304); the number of the nozzles (304) is several; one side of the fixed shell (303) is fixedly connected to a connecting pipe (305); one end of the connecting pipe (305) passes through the outside of the cleaning box (1) and is fixedly connected to the surface of the fixed pipe (301).

6. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 3, characterized in that: The top of the cleaning box (1) is fixedly connected to four support rods (7), the tops of the four support rods (7) are commonly fixedly connected to a support plate (8), the top of the support plate (8) is fixedly connected to a hydraulic telescopic rod (9), the telescopic end of the hydraulic telescopic rod (9) passes through the support plate (8) and is fixedly connected to a movable plate (10), the inner cavity of the movable plate (10) is rotatably connected to a pressure roller (11) used in conjunction with the conveying rod (201), and the number of the pressure rollers (11) is multiple.

7. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 6, characterized in that: The feeding mechanism (6) comprises a mounting plate (601) fixedly connected to one side of the cleaning box (1); a mounting rod (602) is fixedly connected to one side of the mounting plate (601); one end of the mounting rod (602) is fixedly connected to a mounting cylinder (603); an inner cavity of the mounting cylinder (603) is slidably connected to a piston block (604); one side of the piston block (604) is fixedly connected to an adjusting rod (605); a surface of the adjusting rod (605) is slidably connected to the inner cavity of the mounting cylinder (603); a top of the support plate (8) is fixedly connected to a liquid storage tank (606); the number of the liquid storage tanks (606) is two; a surface of the mounting cylinder (603) is fixedly connected to a first one-way valve (607); one end of the first one-way valve (607) is fixedly connected to the inner cavity of the mounting cylinder (603); The ends of the two first long tubes (608) are fixedly connected to one side of the two liquid storage tanks (606), respectively. The surface of the mounting tube (603) is also fixedly connected to two second one-way valves (609), one end of the second one-way valve (609) is fixedly connected to a second long tube (610), one end of the two second long tubes (610) both penetrate the inner wall of the cleaning box (1) and are respectively connected to the two fixed frames (401), the inner wall of the fixed frame (401) is provided with a plurality of liquid outlet holes (611), and the liquid outlet holes (611) are connected to the mounting tube (603) through the fixed frame (401), the second long tubes (610) and the second one-way valve (609).

8. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 7, characterized in that: One end of the adjusting rod (605) is fixedly connected to a short rod (612), and one side of the short rod (612) is slidably connected to a toothed plate (613), one side of one of the double-groove transmission shafts (202) is fixedly connected to a fifth gear (614) used in conjunction with the toothed plate (613), the top of the cleaning box (1) is slidably connected to a sliding rod (615), the number of the sliding rods (615) is two, and the tops of the two sliding rods (615) are commonly fixedly connected to a pressure rod (616), one side of the movable plate (10) is fixedly connected to an extrusion block (617) used in conjunction with the pressure rod (616), one side of the pressure rod (616) is slidably connected to an L-shaped rod (618), the number of the L-shaped rods (618) is two, and one end of each of the two L-shaped rods (618) is fixedly connected to the toothed plate (613).

9. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 8, characterized in that: The movable sleeve on the surface of the sliding rod (615) is provided with a second spring (619), one end of which is fixedly connected to the pressure rod (616), and the other end of which is fixedly connected to the top of the cleaning box (1). The movable sleeve on the surface of the adjusting rod (605) is provided with a third spring (620), one end of which is fixedly connected to the mounting tube (603), and the other end of which is fixedly connected to the surface of the short rod (612).

10. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 7, characterized in that: A sealing ring (621) is fixedly connected to the inner wall of the installation cylinder (603), and the inner wall of the sealing ring (621) is in close contact with the surface of the adjustment rod (605).

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