Carrying device and detection equipment

Abstract

This application relates to the technical field of wafer detection, specifically to a carrying device and a detection device. The carrying device includes a carrying part and a limiting part. Among them, the carrying part has a carrying surface for carrying the object to be measured. The limiting part is connected to the carrying part and is located on the periphery of the carrying part. After the object to be measured is placed on the carrying part, the limiting part can stop the object to be measured and prevent the object to be measured from sliding relative to the carrying part. When the object to be measured is on the carrying surface of the carrying part, the suspended space can make the edge of the object to be measured in a suspended state. In this way, the place where the object to be measured contacts the edge of the carrying device receives an upward supporting force, and the suspended part of the object to be measured itself receives a downward gravity. Then, by using the fact that the supporting force and the gravity are in opposite directions and affect each other, the influence of the carrying part on the film thickness data at the edge of the object to be measured is reduced, the accuracy of the film thickness measurement data at the edge of the object to be measured is improved, and the problem of low accuracy of the film thickness measurement data at the edge of the current object to be measured is solved.

Description

Technical Field

[0001] This application relates to the technical field of wafer detection, and particularly to a carrying device and a detection device. Background Art

[0002] During the wafer processing, it is usually necessary to measure the thickness of the wafer and the thickness of the film coated on the wafer surface. Current wafer detection devices generally include a wafer carrying device and an optical detection system. The wafer carrying device is used to carry the wafer, and the optical detection system is used to measure the wafer. The optical detection system is usually fixed, while the wafer carrying device can drive the wafer to move. Usually, the wafer is fixed on the wafer carrying device by vacuum adsorption, so that the wafer will not move relative to the wafer carrying device.

[0003] Currently, after the wafer is fixed on the wafer carrying device, the film thickness measurement results at the edge of the wafer are prone to anomalies, resulting in low accuracy of the film thickness measurement data at the edge of the wafer. Summary of the Invention

[0004] This application provides a carrying device for improving the problem of low accuracy of the film thickness measurement data at the edge of the current object to be measured.

[0005] In addition, the purpose of this application is also to provide a detection device using the above carrying device.

[0006] In a first aspect, in one embodiment, a carrying device is provided. The carrying device includes:

[0007] A carrying part having a carrying surface for carrying the object to be measured;

[0008] A limiting part connected to the carrying part and located outside the carrying part; the limiting part is used to stop and limit the object to be measured;

[0009] There is a suspended space between the carrying part and the limiting part, and the suspended space is used to accommodate the part of the object to be measured that exceeds the carrying part.

[0010] Further, in one embodiment, the carrying device further includes a supporting part having a supporting surface for carrying a calibration wafer, and the supporting part is connected to the side of the limiting part away from the carrying part.

[0011] Further, in one embodiment, the carrying surface and the supporting surface are coplanar.

[0012] Further, in one embodiment, the limiting part includes a limiting base body and a stopping structure. The limiting base body is arranged between the supporting part and the carrying part, and the stopping structure is fixedly assembled on the limiting base body, and the stopping structure stops and limits the object to be measured.

[0013] Further, in one embodiment, a groove is defined between the limiting base and the supporting portion, the stop structure is disposed in the groove, and a side of the stop structure away from the bearing portion abuts against the supporting portion.

[0014] Further, in one embodiment, the top surface of the limiting base is lower than the supporting surface, and the top surface of the stop structure is higher than the supporting surface.

[0015] Further, in one embodiment, the bearing portion includes bump structures for bearing the object to be measured and forming a vacuum adsorption air channel on the bearing portion, and the vacuum adsorption air channel is used for adsorbing and fixing the object to be measured; the vacuum adsorption air channel includes a first vacuum channel and a second vacuum channel isolated from the first vacuum channel, and the bearing portion includes a first region and a second region surrounding the first region; the first region is communicated with the first vacuum channel, and the second region is communicated with the second vacuum channel to realize vacuum adsorption of objects to be measured of different sizes.

[0016] Further, in one embodiment, a receiving groove is provided on the bearing portion for receiving a manipulator for handling the object to be measured, or the bearing device further includes a lifting portion, the bearing portion surrounds the lifting portion, the lifting portion can move up and down relative to the bearing portion, and the lifting portion is used for picking up and dropping the object to be measured onto the bearing portion.

[0017] Further, in one embodiment, the bearing surface is plated with a first film layer for anti-static.

[0018] In a second aspect, in one embodiment, a detection device is provided, including a calibration device and a bearing device, and the bearing device includes:

[0019] A bearing portion having a bearing surface for bearing the object to be measured;

[0020] A limiting portion connected to the bearing portion and located at the periphery of the bearing portion; the limiting portion is used for stopping and limiting the object to be measured;

[0021] There is a suspended space between the bearing portion and the limiting portion for accommodating the part of the object to be measured exceeding the bearing portion;

[0022] A supporting portion having a supporting surface for bearing the calibration wafer, and the supporting portion is connected to a side of the limiting portion away from the bearing portion;

[0023] The calibration device includes a support substrate and a standard sheet disposed on the support substrate. The surface of the standard sheet away from the support substrate is coplanar with the surface of the object to be measured away from the bearing portion, and is used to calibrate the standard sheet to achieve the calibration of the bearing portion.

[0024] Further, in one embodiment, the bearing surface is coplanar with the support surface.

[0025] Further, in one embodiment, the limiting portion includes a limiting substrate and a stopping structure. The limiting substrate is disposed between the support portion and the bearing portion, and the stopping structure is fixedly assembled on the limiting substrate. The stopping structure stops and limits the object to be measured.

[0026] Further, in one embodiment, the limiting substrate and the support portion define a groove, the stopping structure is disposed in the groove, and one side of the stopping structure away from the bearing portion abuts against the support portion.

[0027] Further, in one embodiment, the top surface of the limiting substrate is lower than the support surface, and the top surface of the stopping structure is higher than the support surface.

[0028] Further, in one embodiment, the bearing portion includes bump structures, which are used to bear the object to be measured and form a vacuum adsorption air channel on the bearing portion. The vacuum adsorption air channel is used to adsorb and fix the object to be measured; the vacuum adsorption air channel includes a first vacuum channel and a second vacuum channel isolated from the first vacuum channel. The bearing portion includes a first region and a second region surrounding the first region; the first region is communicated with the first vacuum channel, and the second region is communicated with the second vacuum channel to achieve the vacuum adsorption of objects to be measured with different sizes.

[0029] Further, in one embodiment, a receiving groove is provided on the bearing portion, which is used to receive a manipulator for carrying the object to be measured, or the carrying device further includes a lifting portion, the bearing portion surrounds the lifting portion, the lifting portion can lift relative to the bearing portion, and the lifting portion is used to pick up and drop off the object to be measured and place the object to be measured on the bearing portion.

[0030] Further, in one embodiment, the bearing surface is coated with a first film layer, which is used for anti-static.

[0031] Further, in one embodiment, the detection device further includes a beam quality analyzer. The light-sensing surface of the beam quality analyzer is coplanar with the surface of the object to be measured away from the bearing portion, and the beam quality analyzer is used to achieve the center alignment and position monitoring of the light spot.

[0032] According to the carrying device of the above embodiment, since there is a suspended space between the carrying part and the limiting part of the carrying device, the limiting part can stop the object to be measured and prevent the object to be measured from sliding relative to the carrying part. When the object to be measured is on the carrying surface of the carrying part, the suspended space can make the edge of the object to be measured in a suspended state. In this way, an upward supporting force is applied to the place where the object to be measured contacts the edge of the carrying device, and a downward gravity is applied to the suspended part of the object to be measured itself. Then, by utilizing the fact that the supporting force and the gravity are in opposite directions and affect each other, the influence of the carrying part on the film thickness data of the edge of the object to be measured is reduced, the accuracy of the film thickness measurement data at the edge of the object to be measured is improved, and the problem of low accuracy of the film thickness measurement data at the edge of the current object to be measured is solved. Description of the Drawings

[0033] Figure 1 It is a top view of a part of the structure of the detection device in an embodiment;

[0034] Figure 2 It is a side view of the carrying part, the limiting part and the supporting part in an embodiment;

[0035] Figure 3 It is a partial cross-sectional view of the carrying part, the limiting part and the supporting part in an embodiment;

[0036] Figure 4 It is a schematic structural diagram of the calibration device in an embodiment;

[0037] Figure 5 It is a schematic structural diagram of the beam quality analyzer in an embodiment;

[0038] Figure 6 It is a schematic structural diagram of the carrying part in another embodiment (the limiting part is not shown in the figure);

[0039] Figure 7 It is a process diagram of the lifting part picking up and delivering the object to be measured in an embodiment.

[0040] List of feature names corresponding to the reference numerals in the drawings: 1. Bearing part; 11. Bearing surface; 12. Convex point structure; 13. First vacuum channel; 14. Second vacuum channel; 15. First region; 16. Second region; 17. Sealing ring; 18. First air extraction hole; 19. Second air extraction hole; 101. Fixing hole; 102. Ejector rod moving hole; 103. Accommodating groove; 2. Limiting part; 21. Top surface of the stop structure; 22. Limiting base; 221. Top surface of the limiting base; 23. Stop structure; 230. Stop block; 3. Suspended space; 4. Supporting part; 41. Supporting surface; 5. Groove; 51. Bottom wall surface of the groove; 52. First side wall surface of the groove; 53. Second side wall surface of the groove; 6. Calibration device; 61. Supporting base; 62. Standard piece; 63. First swing table; 64. First lifting table; 65. Pitching adjustment setscrew; 7. Beam quality analyzer; 71. Light-sensing surface; 72. Photosensitive film holder; 73. Second swing table; 74. Second lifting table; 75. Photosensitive film; 8. Object to be measured; 9. Standard piece; 10. Lifting part; 1001. Vacuum adsorption structure.

[0041] Explanation of the reference numerals in parentheses in the drawings: Among the reference numerals in parentheses in the drawings, the feature referred to by the reference numeral is both the feature represented by the number inside the parentheses and the feature represented by the number outside the parentheses. Detailed implementation manners

[0042] The present application will be further described in detail below in conjunction with the drawings through specific implementation manners. Similar elements in different implementation manners adopt related similar element numbers. In the following implementation manners, many detailed descriptions are provided to enable a better understanding of the present application. However, those skilled in the art can easily recognize that some of the features can be omitted in different situations, or can be replaced by other elements, materials, or methods. In some cases, some operations related to the present application are not shown or described in the specification, which is to avoid the core part of the present application being overwhelmed by excessive descriptions. For those skilled in the art, it is not necessary to describe these related operations in detail, and they can fully understand the related operations based on the descriptions in the specification and the general technical knowledge in the art.

[0043] In addition, the features, operations, or characteristics described in the specification can be combined in any appropriate manner to form various implementation manners. At the same time, the steps or actions in the method description can also be reordered or adjusted in an obvious manner by those skilled in the art. Therefore, the various sequences in the specification and drawings are only for clearly describing a certain embodiment and do not mean that they are necessary sequences, unless it is stated that a certain sequence must be followed.

[0044] The serial numbers assigned to components in this document itself, such as "first", "second", etc., are only used to distinguish the described objects and do not have any sequential or technical meaning. And the terms "connection" and "coupling" as used in this application, unless otherwise specified, both include direct connection, indirect connection, and contact connection (coupling), etc.

[0045] In the specific embodiments described, the various embodiments, without conflict, can be combined in any suitable manner. For example, different combinations of different embodiments can form different implementation manners. To avoid unnecessary repetition, the various possible combination manners of the embodiments are not described separately.

[0046] During the current film thickness measurement of a test object (such as a wafer), the test object needs to be fixed on a carrying device, and the carrying device usually uses a vacuum adsorption method to fix the test object. The test object is placed under an optical detection system for detection by the movement of the carrying device. Generally, the size of the wafer is smaller than the size of the carrying part in the carrying device to meet the requirement of vacuum adsorption tightness. Thus, there is generally no vacuum adsorption at the edge part of the wafer, and only the carrying part supports the edge of the wafer, which may cause problems such as warping at the edge of the wafer. Therefore, when detecting the test object, the film thickness data detection at the edge of the test object often shows abnormalities. To solve this problem, this application provides a carrying device that can make the edge of the test object suspended. In this way, the place where the test object contacts the edge of the carrying device receives an upward supporting force, and the suspended part of the test object itself receives a downward gravity. Then, by using the fact that the supporting force and the gravity are in opposite directions and affect each other, the influence of the carrying part on the film thickness data at the edge of the test object is reduced, and the accuracy of the data at the edge of the test object is improved. The carrying device of this application will be introduced in detail below with reference to the accompanying drawings.

[0047] Please refer to Figures 1 to 3 In one embodiment, the carrying device includes a carrying part 1 and a limiting part 2. Among them, the carrying part 1 has a carrying surface 11 for carrying the test object 8. The limiting part 2 is connected to the carrying part 1 and is located outside the carrying part 1. The limiting part 2 is used to stop and limit the test object 8. After the test object 8 is placed on the carrying part 1, the limiting part 2 can stop and limit the test object 8 to prevent the test object 8 from sliding on the carrying part 1.

[0048] There is a suspended space 3 between the bearing part 1 and the limiting part 2. The suspended space 3 is used to accommodate the part of the object to be measured 8 that extends beyond the bearing part 1. After the object to be measured 8 is placed on the bearing part 1, the edge part of the object to be measured 8 can be in the suspended space 3. In this way, an upward supporting force is exerted on the place where the object to be measured contacts the edge of the bearing device, and a downward gravity is exerted on the suspended part of the object to be measured itself. Then, by using the fact that the supporting force and the gravity are in opposite directions and affect each other, the influence of the bearing part 1 on the film thickness data at the edge of the object to be measured 8 is reduced, the accuracy of the film thickness measurement data at the edge of the object to be measured 8 is improved, and the problem of low accuracy of the film thickness measurement data at the edge of the current object to be measured 8 is improved.

[0049] Regarding the way of placing the object to be measured 8 on the bearing part 3, in one embodiment, refer to Figure 1 , a receiving groove 103 is provided on the bearing part 1. The receiving groove 103 is used to accommodate the manipulator for handling the object to be measured 8. When the object to be measured 8 needs to be placed on the bearing part 1, the manipulator fixes the object to be measured 8 by adsorption or other means and transfers the object to be measured 8 onto the bearing part 1. During this process, the manipulator gradually approaches the bearing part 1 until it enters the receiving groove 103. After the object to be measured 8 contacts the bearing surface 11 of the bearing part 1, the manipulator separates from the object to be measured 8, and then the manipulator can be withdrawn from the receiving groove 103.

[0050] In another embodiment, please refer to Figure 6 and Figure 7 , the bearing device further includes a lifting part 10. The bearing part 1 surrounds the lifting part 10. The lifting part 10 can move up and down relative to the bearing part 1. The lifting part 10 is used to pick up and drop off the object to be measured 8 and place the object to be measured 8 on the bearing part 1. In order to make the object to be measured 8 more stable on the lifting part 10, a vacuum adsorption structure 1001 is provided at the top of the lifting part 10. By evacuating the vacuum adsorption structure 1001, the object to be measured 8 can be adsorbed on the lifting part 10. When the object to be measured 8 needs to be placed on the bearing part 1, the lifting part 10 is raised so that the vacuum adsorption structure 1001 at the top of the lifting part 10 is higher than the bearing part 1. Then, the object to be measured 8 is placed on the lifting part 10 and fixed by a feeding device such as a manipulator. Then, the lifting part 10 is lowered until the object to be measured 8 is about to contact the bearing part 1. The fixation of the object to be measured 8 by the vacuum adsorption structure 1001 at the top of the lifting part 10 is released, and the lifting part 10 is continuously lowered so that the lifting part 10 is lower than the bearing surface 11 of the bearing part 1, so that the object to be measured 8 completely falls on the bearing part 1, and the picking-up and dropping-off operation of the lifting part 10 is completed.

[0051] Furthermore, in one embodiment, please refer to Figure 1 and Figure 3, the carrying device further includes a support portion 4. The support portion 4 has a support surface 41 for carrying the specimen wafer 9, and the support portion 4 is connected to the side of the limiting portion 2 away from the carrying portion 1. In this way, the specimen wafer 9 carried by the support portion 4 can be used to calibrate or measure the object to be measured 8, and the connection of the support portion 4 to the side of the limiting portion 2 away from the carrying portion 1 can make the overall structure of the carrying device more compact.

[0052] It should be noted that the suspended space accommodates the part of the object to be measured that exceeds the carrying surface, and the stop structure of the limiting portion cooperates with the suspended space to stop the part of the object to be measured that exceeds the carrying surface, so as to achieve the stable, accurate and proper placement of the object to be measured, and improve the detection efficiency and accuracy. Secondly, the coordinated cooperation of the limiting portion, the suspended space and the support portion further improves the practicability, detection accuracy and efficiency of the carrying device.

[0053] In one embodiment, please refer to Figure 3 , the carrying surface 11 and the support surface 41 are coplanar. In this way, the data volume is smaller when calibrating or measuring through the specimen wafer 9 subsequently, which is convenient for data processing. Of course, in some other embodiments, there may also be a set difference between the carrying surface 11 and the support surface 41, and when calibrating or measuring subsequently, data processing is performed on this difference.

[0054] In one embodiment, please refer to Figure 3 , the specimen wafer 9 is bonded to the support surface 41. In some other embodiments, the specimen wafer 9 can be fixed on the support portion 4 by means of vacuum adsorption. Specifically, the support portion 4 is provided with adsorption holes, and the adsorption holes are communicated with a vacuum device through an air path. By sucking the adsorption holes by the vacuum device, negative pressure is generated in the adsorption holes to adsorb and fix the specimen wafer 9. In some other embodiments, the specimen wafer 9 can also be fixed on the support portion by other feasible means, such as being fixed by a fixture or being fixed by magnetic attraction.

[0055] In one embodiment, please refer to Figure 3 , the specimen wafer 9 on the support portion 4 is a thickness specimen wafer for calibrating the thickness of the object to be measured 8. Of course, in some other embodiments, the specimen wafer 9 on the support portion 4 can also be a film thickness specimen wafer for calibrating the film thickness on the object to be measured 8.

[0056] As another application method of the specimen wafer 9 on the support portion 4, the support portion 4 moves synchronously with the carrying portion 1, and this specimen wafer 9 can also be used to calibrate the height of the carrying portion 1. For example, in one embodiment, before detecting the object to be measured 8, it is necessary to make the carrying portion 1 at a set height. At this time, the height of the specimen wafer 9 on the support portion 4 can be detected by an optical detection system, and based on this, it is judged whether the height of the carrying portion 1 meets the requirements. If it meets the requirements, the object to be measured 8 is detected. If it does not meet the requirements, the height of the carrying portion 1 is adjusted until it meets the requirements.

[0057] Specifically, in one embodiment, after the object to be measured 8 is placed on the bearing part 1, the edge part extending along the circumference of the object to be measured 8 is in a suspended state. In one embodiment, please refer to Figure 1 , the number of the limiting parts 2 is more than two, and the limiting parts 2 are arranged at intervals along the circumference of the bearing part 1. Specifically, the number of the limiting parts 2 is 4. In some other embodiments, the number of the limiting parts 2 can also be 2, 3, 5, etc.

[0058] Regarding the structure of the limiting part 2, in one embodiment, please refer to Figure 1 and Figure 3 , the limiting part 2 includes a limiting base body 22 and a stop structure 23. The limiting base body 22 is arranged between the support part 4 and the bearing part 1. The stop structure 23 is fixedly assembled on the limiting base body 22 and stops and limits the object to be measured 8. Since the stop structure 23 is fixedly assembled on the limiting base body 22, the stop structure 23 can be processed separately, and it is easier to control the dimensional accuracy of the limiting part 2. Of course, in some other embodiments, in addition to the fixed assembly method, the stop structure 23 and the limiting base body 22 can also be integrally formed.

[0059] Furthermore, in one embodiment, please refer to Figure 1 and Figure 3 , the limiting base body 22 and the support part 4 define a groove 5, and the stop structure 23 is arranged in the groove 5. The side of the stop structure 23 away from the bearing part 1 abuts against the support part 4. The groove 5 facilitates the positioning and installation of the stop structure 23. In some other embodiments, the groove 5 can also be entirely on the limiting base body 22.

[0060] In one embodiment, please refer to Figure 1 and Figure 3 , the limiting base body 22 is connected to the outer peripheral surface of the bearing part 1. In order not to interfere with the suspended part of the object to be measured 8, the top surface 221 of the limiting base body 22 is lower than the bearing surface 11.

[0061] In one embodiment, the top surface 221 of the limiting base body 22 is lower than the support surface 41, and the top surface 21 of the stop structure 23 is higher than the support surface 41. In this way, the support part 4 can provide better support for the stop structure 23, and the stop structure 23 is not easy to loosen after the object to be measured 8 touches the stop structure 23.

[0062] Specifically, in one embodiment, please refer to Figure 3, the groove 5 includes a groove bottom wall surface 51, a first groove side wall surface 52 and a second groove side wall surface 53. The first groove side wall surface 52 is opposite to the second groove side wall surface 53. Among them, the first groove side wall surface 52 is on the supporting part 4, the groove bottom wall surface 51 and the second groove side wall surface 53 are on the limiting base body 22, and the first groove side wall surface 52 is higher than the second groove side wall surface 53. The first groove side wall surface 52 abuts against the stop structure 23. Since the first groove side wall surface 52 is higher, the stopping effect on the stop structure 23 is better. In one embodiment, please refer to Figure 1 and Figure 3 , the groove 5 is a through groove extending horizontally. In some other embodiments, the groove 5 can also be in other forms other than the through groove. For example, the groove 5 further includes a third groove side wall surface, and the third groove side wall surface connects the first groove side wall surface 52 and the second groove side wall surface 53.

[0063] In one embodiment, please refer to Figure 1 and Figure 3 , the stop structure 23 is a stop block 230 embedded in the groove 5. The stop block 230 is installed in the groove 5 by interference fit. The side surface of the stop block 230 away from the bearing part 1 fits with the first groove side wall surface 52, and the side surface of the stop block 230 close to the bearing part 1 fits with the second groove side wall surface 53. By the way of embedding, the stop block 230 can be made to fit with the groove wall surface of the groove 5, so that the supporting effect of the groove 5 on the stop block 230 is better. In one embodiment, the stop block 230 is strip-shaped.

[0064] In some other embodiments, the stop structure 23 can also be fixedly assembled on the limiting base body 22 by means of bolt fixation, laser welding, snap fixation, etc. In addition to being fixedly assembled in the groove 5, the stop structure 23 can also adopt other installation methods. For example, when the stop structure 23 is bolt-fixed, it can also be directly fixed on the top plane of the limiting base body 22. Of course, in some other embodiments, the stop structure 23 can also be integrally formed with the limiting base body 22.

[0065] In one embodiment, please refer to Figure 3 , the supporting part 4 and the limiting base body 22 are integrally formed. This is convenient for the processing of the supporting part 4 and the limiting base body 22. Regarding the relationship between the bearing part 1 and the limiting part 2, in one embodiment, the bearing part 1 and the limiting base body 22 are integrally formed. Please refer to Figure 1 and Figure 3 , the limiting base body 22 is a protrusion provided on the outer peripheral surface of the bearing part 1. In some other embodiments, the limiting part 2 can also be annular and surround the outside of the bearing part 1. In some other embodiments, in addition to being integrally formed, the supporting part 4, the limiting base body 22 and the bearing part 1 can also be assembled together by means of welding, bolt fixation, etc.

[0066] The carrying part 1 fixes the object to be measured 8 by means of vacuum adsorption. In one embodiment, please refer to Figure 1 , the carrying part 1 includes bump structures 12 which are used to carry the object to be measured 8 and form a vacuum adsorption air channel on the carrying part 1, and the vacuum adsorption air channel is used to adsorb and fix the object to be measured 8. Specifically, in one embodiment, please refer to Figure 1 , the vacuum adsorption air channel includes a first vacuum channel 13 and a second vacuum channel 14 isolated from the first vacuum channel 13. The carrying part 1 includes a first area 15 and a second area 16 surrounding the first area 15; the first area 15 is communicated with the first vacuum channel 13, and the second area 16 is communicated with the second vacuum channel 14 to realize the vacuum adsorption of objects to be measured 8 with different sizes. When the size of the object to be measured 8 is large, the object to be measured 8 is placed on the first area 15 and the second area 16, and evacuating the first vacuum channel 13 and the second vacuum channel 14 can adsorb and fix the object to be measured 8. When the size of the object to be measured 8 is small, the object to be measured 8 is placed on the carrying part 1 to cover the first area 15, and at this time, evacuating the first vacuum channel 13 can fix the object to be measured 8. In one embodiment, the specimen carrier 9 is also fixed on the support part 4 by means of vacuum adsorption. The vacuum device is not only communicated with the adsorption holes on the support part 4 through an air path, but also communicated with the first vacuum channel 13 and the second vacuum channel 14 through an air path. After the vacuum device is started, it can suck the first vacuum channel 13 and the second vacuum channel 14, so that the object to be measured 8 is adsorbed and fixed on the carrying part 1.

[0067] In one embodiment, please refer to Figure 1 , there is a closed-loop sealing ring 17 between the first area 15 and the second area 16, and the isolation between the first vacuum channel 13 and the second vacuum channel 14 is realized through the sealing ring 17. In one embodiment, the carrying part 1 has a first air extraction hole 18 communicated with the first vacuum channel 13 and a second air extraction hole 19 communicated with the second vacuum channel 14.

[0068] In one embodiment, the carrying surface 11 of the carrying part 1 is plated with a first film layer, and the first film layer is used for anti-static. Specifically, in one embodiment, the first film layer is a DLC coating. The carrying part 1 is made of alumina ceramic material, and plating a DLC coating on the surface can not only realize the conductivity of the carrying part 1, eliminate the influence of static electricity on the measurement stress, but also improve the wear resistance of the carrying part 1.

[0069] In one embodiment, the object to be measured 8 is in a sheet shape. Specifically, the object to be measured 8 is a wafer. In one embodiment, the carrying device includes a driving mechanism for driving the movement of the carrying part. Specifically, in one embodiment, the carrying part 1 can move up and down, and the driving mechanism includes a lifting driving mechanism (not shown in the figure) for driving the lifting of the carrying part 1. Of course, in addition to being able to move up and down, the carrying part 1 can also perform translational motion. The carrying part 1 can translate along the first horizontal direction and the second horizontal direction, and the included angle between the first horizontal direction and the second horizontal direction is greater than 0 degrees and less than 180 degrees.

[0070] In one embodiment, please refer to Figure 1 , the carrying part 1 has a fixing hole 101 for fixing the carrying part 1 and a ejector rod moving hole 102 for the ejector rod to extend out. The fixing hole 101 is used to fix the carrying part 1. The ejector rod moving hole 102 is used for the ejector rod to extend out to lift the object to be measured 8 when needed.

[0071] In an embodiment of a detection device, please refer to Figures 1 to 5 , the detection device includes a calibration device 6 and a carrying device including a support part 4 as described in any of the above embodiments. The calibration device 6 includes a support base 61 and a standard wafer 62 provided on the support base 61. The surface of the standard wafer 62 away from the support base 61 is coplanar with the surface of the object to be measured 8 away from the carrying part 1, and is used to calibrate the calibration wafer 9 on the support part 4 to achieve the calibration of the carrying part 1. In one embodiment, the standard wafer 62 is bonded to the support base 61. In some other embodiments, the standard wafer 62 can also be installed on the support base 61 in other feasible ways, such as being fixed by a fixture, being fixed by adsorption, etc.

[0072] The calibration device 6 is installed independently of the carrying part 1. When the height of the carrying part 1 changes, the height of the calibration device 6 does not change with the height of the carrying part 1. Since the support part 4 and the carrying part 1 move synchronously, when calibrating the carrying part 1, the height of the calibration wafer 9 can be calibrated according to the height of the standard wafer 62 by the optical detection system (not shown in the figure) of the detection device. After completing the calibration of the calibration wafer 9, the calibration of the carrying part 1 is achieved.

[0073] Of course, in addition to calibrating the calibration wafer 9, the standard wafer 62 on the support base 61 can also be used to assist in detecting the object to be measured 8. For example, in one embodiment, the calibration wafer 9 on the support part 4 is used to detect the thickness of the object to be measured 8, and the standard wafer 62 on the support base 61 is used to detect the film thickness of the object to be measured 8.

[0074] In one embodiment, please refer to Figure 1 and Figure 4In order to be applicable to the objects to be tested 8 of different film thicknesses, the number of standard sheets 62 is more than two, and each standard sheet 62 corresponds to a film thickness of the object to be tested 8. Specifically, the number of standard sheets 62 can be 2, 3 or more than 4 as needed.

[0075] It should be noted that in some application scenarios, the supporting part 1 may not have the freedom to move up and down. In this case, the height of the supporting part 1 cannot be adjusted. In this way, the movement error in the height direction will not be introduced into the standard piece 9, and there is no need for the standard piece 62 to calibrate the height of the standard piece 9.

[0076] In some other embodiments, in addition to being installed independently from the bearing part 1, the calibration device 6 can also be raised and lowered synchronously with the bearing part 1. For example, the calibration device 6 is installed on the bearing part 1. This makes the structure more compact, but it will introduce too much error in the lifting and lowering movement of the bearing part 1 into the detection of the standard film 9. When the measured data is inaccurate, it is impossible to determine whether it is a problem in the measurement link or the calibration link. In contrast, in the above embodiment, the calibration device 6 and the bearing part 1 are installed independently, which can reduce or even avoid the introduction of the error in the lifting and lowering movement of the bearing part 1, and the measured data is more accurate. When the measured data is inaccurate, it is convenient to determine where the problem lies. In order to further simplify the structure, in some other embodiments, a bearing platform can be fixedly provided on the bearing part 1 instead of the calibration device, and the standard film 62 is installed on the bearing platform.

[0077] In one embodiment, please refer to Figure 1 and Figure 4 The calibration device 6 includes a first pendulum table 63 and a first lifting platform 64 for adjusting the supporting base 61. The first pendulum table 63 is installed on the first lifting platform 64. The supporting base 61 is installed on the first pendulum table 63. The first pendulum table 63 is a two-dimensional pendulum table, which can realize the pitch and yaw adjustment of the standard piece 62. The first lifting platform 64 can adjust the height of the supporting base 61 so that the upper surface of the standard piece 62 is at the same height as the upper surface of the object to be measured 8.

[0078] In one embodiment, please refer to Figure 4 When the number of standard sheets 62 is more than two, the support base 61 corresponds to the standard sheets 62 one by one. In order to facilitate the individual adjustment of the pitch angle of the calibration sheet, each support base 61 is connected with a plurality of pitch adjustment screws 65. The pitch adjustment screws 65 are threadedly connected to the support base 61 and supported on the first swing table 63 to facilitate the pitch adjustment of the support base 61. The plurality of standard sheets 62 can be leveled separately through the pitch adjustment screws 65.

[0079] When the object to be tested 8 is optically inspected, the incident and reflected light spots of the optical inspection system need to be aligned. In order to monitor and align the positions of the incident and reflected light spots of the optical inspection system, in one embodiment, please refer toFigure 1 and Figure 5 The detection device further includes a beam quality analyzer 7. The light-sensing surface 71 of the beam quality analyzer 7 is coplanar with the surface of the object to be measured 8 on the side away from the bearing portion 1. The beam quality analyzer 7 is used to achieve the center alignment and position monitoring of the light spot.

[0080] Specifically, in one embodiment, please refer to Figure 1 and Figure 5 The beam quality analyzer 7 includes a photosensitive film holder 72, a second swing table 73 and a second lifting table 74. The photosensitive film holder 72 is used to place the photosensitive film 75. The second swing table 73 can adjust the pitch and yaw angles of the photosensitive film 75 on the photosensitive film holder 72. The second lifting table 74 can adjust the height of the photosensitive film holder 72 to make the upper surface of the photosensitive film 75 flush with the upper surface of the wafer on the bearing portion 1.

[0081] Of course, in some other embodiments, the calibration device 6 and the beam quality analyzer 7 in the detection device can also adopt other feasible forms other than those listed in the above embodiments. For example, the calibration device 6 can adjust the pitch and yaw of the calibration film only through the first swing table 63, or can also adjust the pitch and yaw of the calibration film only through the pitch adjustment setscrew 65; the calibration device 6 can also have no height adjustment function; similarly, the beam quality analyzer 7 can also adjust the pitch and yaw through setscrews, or can also have no height adjustment function.

[0082] In summary, the bearing device in some embodiments of the present application can keep the edge of the object to be measured in a suspended state by setting the limiting portion and the suspended space. The suspended part of the edge of the object to be measured is subjected to an upward supporting force and a downward gravity. Then, by using the fact that the supporting force and the gravity are in opposite directions and affect each other, the detection accuracy of the film thickness at the edge of the object to be measured is improved. The detection device in some embodiments of the present application can calibrate the calibration film on the supporting portion through the calibration device, so as to achieve the calibration of the bearing portion and reduce or even avoid the motion error caused during the lifting process of the bearing portion. In addition, the detection device in some embodiments of the present application can monitor the incident light spot and the reflected light spot through the beam quality analyzer, so as to align and monitor the optical detection system of the detection device during the installation and measurement processes.

[0083] The above uses specific examples to elaborate on the present application, which is only used to help understand the present application and is not used to limit the present application. For those skilled in the technical field to which the present application belongs, according to the idea of the present application, several simple deductions, deformations or substitutions can also be made.

Claims

1. A carrying device, the carrying device is used to carry an object to be tested for detection by an optical detection system, characterized in that: include: A bearing portion, the bearing portion having a bearing surface for bearing an object to be tested; The bearing part fixes the object to be tested by vacuum adsorption; A limiting part, the limiting part is connected to the bearing part and is located at the periphery of the bearing part, and the limiting part is used to stop and limit the object to be measured; the limiting part includes a limiting base and a stopping structure arranged on the limiting base; the top surface of the stopping structure is higher than the bearing surface, so that the stopping structure stops and limits the object to be measured; The bearing part, the stop structure and the limiting base form a suspended space, and the suspended space is used to accommodate the portion of the object to be measured that exceeds the bearing part, so as to reduce the influence of the bearing part on the film thickness data of the edge of the object to be measured.

2. The carrying device according to claim 1, characterized in that: The carrying device further comprises a supporting portion, wherein the supporting portion has a supporting surface for carrying the label, and the supporting portion is connected to a side of the limiting portion away from the carrying portion.

3. The carrying device according to claim 2, characterized in that: The bearing surface is coplanar with the supporting surface.

4. The carrying device according to claim 2, characterized in that: The limiting base is arranged between the supporting part and the bearing part, and the stopping structure is fixedly assembled on the limiting base.

5. The carrying device according to claim 4, characterized in that: The limiting base and the supporting portion define a groove, the stopping structure is arranged in the groove, and a side of the stopping structure away from the bearing portion abuts against the supporting portion.

6. The carrying device according to claim 5, characterized in that: The top surface of the limiting base is lower than the supporting surface, and the top surface of the stopping structure is higher than the supporting surface.

7. The carrying device according to any one of claims 1 to 6, characterized in that: The bearing part includes a convex point structure, which is used to support the object to be tested and form a vacuum adsorption air channel on the bearing part, and the vacuum adsorption air channel is used to adsorb and fix the object to be tested; the vacuum adsorption air channel includes a first vacuum channel and a second vacuum channel isolated from the first vacuum channel, and the bearing part includes a first area and a second area surrounding the first area; the first area is connected to the first vacuum channel, and the second area is connected to the second vacuum channel to achieve vacuum adsorption of objects to be tested of different sizes.

8. The carrying device according to any one of claims 1 to 6, characterized in that: The carrying part is provided with a receiving groove, and the receiving groove is used to receive a robot arm for carrying the object to be tested, or the carrying device also includes a lifting part, and the carrying part surrounds the lifting part, and the lifting part can be lifted and lowered relative to the carrying part, and the lifting part is used to pick up and transport the object to be tested and place the object to be tested on the carrying part.

9. The carrying device according to any one of claims 1 to 6, characterized in that: The bearing surface is plated with a first film layer, and the first film layer is used for anti-static.

10. A detection device, characterized in that: It comprises a calibration device and a carrying device as described in any one of claims 2 to 6, wherein the calibration device comprises a supporting base and a standard piece arranged on the supporting base, the surface of the standard piece away from the supporting base is coplanar with the surface of the object to be measured away from the carrying part, and the calibration device is used to calibrate the standard piece to achieve calibration of the carrying part.

11. The detection device according to claim 10, characterized in that The detection device also includes a beam quality analyzer, the light-sensing surface of the beam quality analyzer is coplanar with the surface of the object to be tested on a side away from the bearing part, and the beam quality analyzer is used to achieve center alignment and position monitoring of the light spot.

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