Optical waveguide structure and preparation method thereof

Abstract

The invention discloses an optical waveguide structure and a preparation method thereof, and the optical waveguide structure comprises a rigid supporting layer, a low-refractive-index layer, a high-refractive-index layer and a resin layer. The rigid support layer has opposite first and second surfaces. The low-refractive-index layer is at least connected to the first surface, at least one low-refractive-index grating structure is arranged on the side, away from the rigid supporting layer, of the low-refractive-index layer, the high-refractive-index layer is connected to the side, away from the rigid supporting layer, of the low-refractive-index layer, and at least one high-refractive-index grating structure is arranged on the high-refractive-index layer. And the high-refractive-index grating structure and the low-refractive-index grating structure are correspondingly attached. The resin layer is arranged on the side, away from the low refractive index layer, of the high refractive index layer. The optical waveguide structure is good in rigidity, not prone to deformation, resistant to external force impact, light in weight and small in thickness.

Description

Technical Field

[0001] The present invention relates to the technical field of optical devices, and in particular to an optical waveguide structure and a preparation method thereof. Background Art

[0002] Optical waveguides are widely used in near-eye display applications such as augmented reality and mixed reality due to their thin thickness, light weight and good light transmittance.

[0003] Among the existing optical waveguide products, the optical waveguide has low rigidity and is prone to deformation when subjected to external force, resulting in deterioration of the performance of the optical waveguide. In addition, during the manufacturing process, the thickness of the optical waveguide is large, which is not conducive to the lightweight design of the structure. In other optical waveguide products, the optical waveguide has poor impact resistance, is easy to break, has poor safety, and provides poor user experience. Summary of the invention

[0004] In view of this, the present invention proposes an optical waveguide structure and a preparation method thereof, aiming to achieve that the optical waveguide structure has certain structural strength and anti-deformation performance while having a smaller thickness and lighter weight.

[0005] The optical waveguide structure proposed in the first aspect of the present invention includes: a rigid support layer having a first surface and a second surface relative to each other; a low refractive index layer, the low refractive index layer is at least connected to the first surface, and at least one low refractive index grating structure is provided on the side of the low refractive index layer away from the rigid support layer; a high refractive index layer, the high refractive index layer is connected to the side of the low refractive index layer away from the rigid support layer, and at least one high refractive index grating structure is provided on the high refractive index layer, and the high refractive index grating structure is arranged in correspondence with the low refractive index grating structure; and a resin layer, the resin layer is arranged on the side of the high refractive index layer away from the low refractive index layer.

[0006] It can be seen from the above technical solutions that the optical waveguide structure proposed in the first aspect of the present invention has a rigid support layer with sufficient rigidity and is not easily deformed after being subjected to external forces. When other structural layers use the rigid support layer as an attachment layer, the entire optical waveguide structure can have a certain structural strength and anti-deformation performance. In addition, since the low refractive index layer and the high refractive index layer have a certain refractive index difference, light is totally reflected from the high refractive index layer to the low refractive index layer and will not enter the rigid support layer, while light can be diffracted and propagated at the high refractive index grating structure, thereby allowing the light to continuously propagate between the resin layer and the high refractive index layer. Due to the cooperation between the rigid support layer and the resin layer of the present invention, the overall structure is thinner than that using multiple resin layers; compared with the use of multiple rigid support layers, the overall structure is lighter and the risk of cracking is significantly reduced.

[0007] The preparation method of the optical waveguide structure proposed in the second aspect of the present invention comprises the following steps: providing a rigid support layer; coating a low refractive index embossed adhesive on the first surface and / or the second surface of the rigid support layer for embossing and curing to form a low refractive index layer with a low refractive index grating structure; coating a high refractive index embossed adhesive on the low refractive index layer so that the high refractive index embossed adhesive completely fills the low refractive index grating structure; placing a resin layer on the side of the high refractive index embossed adhesive away from the low refractive index layer, and curing to obtain the optical waveguide structure; or first curing the high refractive index embossed adhesive, and then bonding the resin layer to the side of the high refractive index layer away from the low refractive index layer to obtain the optical waveguide structure.

[0008] The preparation method of the optical waveguide structure proposed in the second aspect of the present invention is simple in preparation method, and can form a high refractive index grating structure by using a low refractive index grating structure formed by imprinting and curing a low refractive index imprinting glue, so as to prepare a high refractive index grating structure, so that the prepared high refractive index grating structure has a high degree of fit with the low refractive index grating structure, and simplifies the connection arrangement between the low refractive index layer and the high refractive index layer. The prepared optical waveguide structure has good rigidity, is not easy to deform, is resistant to external force impact, is light in weight, and has a small thickness.

[0009] The preparation method of the optical waveguide structure proposed in the third aspect of the present invention comprises the following steps: providing a rigid support layer and cleaning the rigid support layer; coating a low refractive index embossed adhesive on the first surface or the second surface of the rigid support layer and forming a first substrate with the rigid support layer; providing a resin layer, coating a high refractive index embossed adhesive on the resin layer for embossing and curing to form a high refractive index layer with a high refractive index grating structure, the resin layer and the high refractive index layer forming a second substrate; bonding the second substrate to the first substrate in a vacuum environment and removing bubbles; curing the low refractive index embossed adhesive to obtain the optical waveguide structure.

[0010] The preparation method of the optical waveguide structure proposed in the third aspect of the present invention is simple in preparation method, has few bubbles, and has high adhesion between the layers of the structure. The high refractive index grating structure formed by the imprinting and curing of the high refractive index imprint glue can be used to form a low refractive index grating structure to prepare a low refractive index grating structure, so that the prepared low refractive index grating structure has a high degree of fit with the high refractive index grating structure, and simplifies the connection arrangement between the low refractive index layer and the high refractive index layer. The prepared optical waveguide structure has good rigidity, is not easy to deform, is resistant to external force impact, is light in weight, and has a small thickness.

[0011] It should be understood that the above general description and the following detailed description are exemplary and explanatory only and are not restrictive of the disclosure of the embodiments of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other accompanying drawings can be obtained like these accompanying drawings without paying any creative work.

[0013] Figure 1 is a schematic diagram of a colored optical waveguide structure proposed in some embodiments of the present invention;

[0014] Figure 2 is a schematic diagram of a monochromatic optical waveguide structure proposed in some embodiments of the present invention;

[0015] Figure 3 is a schematic flow chart of a method for preparing an optical waveguide structure according to some embodiments of the present invention;

[0016] Figure 4 It is a schematic diagram of the structure after each main step in the method for preparing the optical waveguide structure proposed in some embodiments of the present invention;

[0017] Figure 5 is a schematic flow chart of a method for preparing an optical waveguide structure according to some embodiments of the invention, wherein an antifouling film is also prepared on a side of the rigid support layer away from the low refractive index layer;

[0018] Figure 6 is a schematic diagram of the structure after the main steps in the method for preparing the optical waveguide structure proposed in some embodiments of the present invention, wherein an anti-fouling film is also coated on one side of the rigid support layer away from the low refractive index layer;

[0019] Figure 7 is a schematic flow chart of a method for preparing an optical waveguide structure according to some embodiments of the present invention;

[0020] Figure 8 It is a schematic diagram of the structure after each main step in the method for preparing the optical waveguide structure proposed in some embodiments of the present invention;

[0021] Fig. 9 is a schematic flow chart of a method for preparing an optical waveguide structure according to some embodiments of the present invention, wherein an anti-fouling film is also prepared on a side of the rigid support layer away from the low refractive index layer;

[0022] Fig.10 It is a schematic diagram of the structure after the main steps in the method for preparing the optical waveguide structure proposed in some embodiments of the present invention, wherein an anti-fouling film is also coated on the side of the rigid support layer away from the low refractive index layer.

[0023] Description of reference numerals:

[0024] 100. Optical waveguide structure;

[0025] 10. Rigid support layer; 11. First surface; 12. Second surface;

[0026] 20. Low refractive index layer; 21. Low refractive index grating structure; 22. Low refractive index embossed adhesive;

[0027] 30. High refractive index layer; 31. High refractive index grating structure; 32. High refractive index embossed adhesive;

[0028] 40. Resin layer;

[0029] 50. Anti-fouling film. DETAILED DESCRIPTION

[0030] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, other embodiments obtained by ordinary technicians in this field without creative work are all within the scope of protection of the present invention.

[0031] It should also be understood that the terms used in this application specification are only for the purpose of describing specific embodiments and are not intended to limit the present application. As used in this application specification and the appended claims, unless the context clearly indicates otherwise, the singular forms "a", "an" and "the" are intended to include plural forms.

[0032] It should be further understood that the term "and / or" used in the present specification and the appended claims refers to any combination and all possible combinations of one or more of the associated listed items, and includes these combinations. In the absence of conflict, the following embodiments and features in the embodiments may be combined with each other.

[0033] Existing optical waveguides cannot achieve high structural strength, thin thickness and light weight at the same time, and the finished products are easy to break and have poor safety in use.

[0034] In view of this, the optical waveguide structure 100 proposed in the present invention is as follows: Figure 1 and Figure 2 As shown, it includes: a rigid support layer 10, a low refractive index layer 20, a high refractive index layer 30 and a resin layer 40.

[0035] The rigid support layer 10 has a first surface 11 and a second surface 12. For example, the rigid support layer 10 is a plate-like object with a certain thickness, and thus has a first surface 11 (such as a bottom surface) and a second surface 12 (such as a top surface) that are sufficiently larger than the other four sides.

[0036] The low refractive index layer 20 is connected to at least the first surface 11 , that is, the low refractive index layer 20 is connected to the first surface 11 , or the low refractive index layer 20 is connected to both the first surface 11 and the second surface 12 .

[0037] At least one low refractive index grating structure 21 is provided on the side of the low refractive index layer 20 away from the rigid support layer 10. There may be one low refractive index grating structure 21, two low refractive index grating structures 21, three low refractive index grating structures 21, or more low refractive index grating structures 21. When there are multiple low refractive index grating structures 21, the multiple low refractive index grating structures 21 may be arranged at intervals or continuously.

[0038] The high refractive index layer 30 is connected to the side of the low refractive index layer 20 away from the rigid support layer 10. The high refractive index layer 30 is provided with at least one high refractive index grating structure 31, and the high refractive index grating structure 31 is arranged correspondingly and in contact with the low refractive index grating structure 21. Figure 1 As shown, when the low refractive index layer 20 is only provided on the first surface 11, only one layer of the high refractive index layer 30 is provided, that is, the high refractive index layer 30 is only provided on the low refractive index layer 20 on one side of the rigid support layer 10. Figure 2 As shown, when the low refractive index layer 20 is connected to the first surface 11 and the second surface 12 at the same time, the high refractive index layer 30 is provided in two layers, that is, the high refractive index layer 30 is provided on the low refractive index layer 20 on both sides of the rigid support layer 10 at the same time.

[0039] The resin layer 40 is disposed on the side of the high refractive index layer 30 away from the low refractive index layer 20. Figure 1 As shown, when the high refractive index layer 30 is only disposed on the low refractive index layer 20 on one side of the rigid support layer 10, the resin layer 40 is also only disposed on one layer. At this time, the optical waveguide structure 100 is a monochromatic optical waveguide, and light can propagate on one side. Figure 2 As shown, when the high refractive index layer 30 is disposed on the low refractive index layer 20 on both sides of the rigid support layer 10, two layers of resin layer 40 are also disposed accordingly. At this time, the optical waveguide structure 100 is a color optical waveguide, and light can propagate on both sides.

[0040] It can be seen from the above technical solution that the optical waveguide structure 100 proposed by the present invention, the rigid support layer 10 has sufficient rigidity and is not easily deformed after being subjected to external force. When other structural layers use the rigid support layer 10 as an attachment layer, the entire optical waveguide structure 100 can have a certain structural strength and anti-deformation performance, good impact resistance, high rigidity, and significantly reduced deformation.

[0041] Since the low refractive index layer 20 and the high refractive index layer 30 have a certain refractive index difference, the light is totally reflected when it passes from the high refractive index layer 30 to the low refractive index layer 20, that is, the light can be totally reflected inside the high refractive index layer 30, and the light will not enter the low refractive index layer 20 and the rigid support layer 10. The low refractive index layer 20 plays a role in isolating the light, isolating the light on the side facing the high refractive index layer 30, and no light propagates in the rigid support layer 10. The light can be diffracted and propagated at the high refractive index grating structure 31, and then the light can be continuously propagated between the resin layer 40 and the high refractive index layer 30.

[0042] Due to the cooperation between the rigid support layer 10 and the resin layer 40 of the present invention, the overall structure is thinner than that of a multi-layer resin layer 40; the overall structure is lighter, the weight is smaller, and the risk of cracking is significantly reduced compared to a multi-layer rigid support layer 10. The resin layer 40 of the present invention can also protect the internal high refractive index grating structure 31, effectively preventing the high refractive index grating structure 31 from being damaged, so that light can be effectively transmitted.

[0043] In the present invention, light can be incident from the resin layer 40 to the high refractive index layer 30, and then to the high refractive index grating structure 31, and then diffracted and returned to the resin layer 40 again. This propagation mode is suitable for the case where the reflective grating and the optical machine are arranged on both sides of the substrate. Light can also be incident from the high refractive index grating structure 31, and then diffracted into the resin layer 40. This propagation mode is suitable for the case where the transmissive grating and the optical machine are located on the same side of the substrate.

[0044] In some examples of the present invention, the rigid support layer 10 includes at least one of a tempered glass layer, a sapphire glass layer, a quartz layer or a rigid light-transmitting resin layer. These substances, as the rigid support layer 10, all make the optical waveguide structure 100 have sufficient structural strength and a certain rigidity, and are not easily deformed when an external force acts. And these substances have a certain light transmittance, so that the overall light transmittance of the entire optical waveguide structure 100 is high. In particular, when the tempered glass layer is used, the rigidity of the optical waveguide structure 100 can be significantly improved. When subjected to external force, the deformation of the optical waveguide structure 100 will be significantly reduced, and the impact resistance will be significantly improved. Since the low refractive index layer 20 isolates the light on the side facing the high refractive index layer 30, the light will not propagate in the tempered glass, and the propagation path of the light will not be affected by the stress inside the tempered glass.

[0045] In some specific examples, the rigid light-transmitting resin layer includes at least one of a polycarbonate layer (commonly known as PC), a polymethyl methacrylate layer (commonly known as PMMA), a polystyrene layer (commonly known as PS), an acrylonitrile-styrene copolymer layer (commonly known as AS), a polyethylene terephthalate layer (commonly known as PET), a transparent ABS resin layer or a polyamide layer (commonly known as PA). The light transmittance of these rigid light-transmitting resins is above 85%. In particular, when the polymethyl methacrylate (PMMA) layer is selected, the light transmittance is as high as 92%. When the polycarbonate (PC) layer is selected, the light transmittance is as high as 90%.

[0046] In some examples of the present invention, Figure 2 As shown, the refractive index layer 20, the high refractive index layer 30 and the resin layer 40 each include two layers, the two low refractive index layers 20 are connected to the first surface 11 and the second surface 12 respectively, the side of each low refractive index layer 20 away from the rigid support layer 10 is connected to a high refractive index layer 30, and the side of each high refractive index layer 30 away from the low refractive index layer 20 is connected to a resin layer 40. In these examples, light can be transmitted on the high refractive index layer 30 and the resin layer 40 on both sides of the two low refractive index layers 20 respectively. Compared with the prior art in which the resin layers 40 on both sides are provided with glass cover plates, the weight of the optical waveguide structure 100 is smaller and lighter, and it can withstand greater impact without cracking or breaking, thereby improving safety. The optical waveguide structure 100 in these examples constitutes a color optical waveguide.

[0047] In some examples of the present invention, Figure 1 As shown, the optical waveguide structure 100 further includes an antifouling film 50, the low refractive index layer 20 is connected to the first surface 11, and the antifouling film 50 covers the second surface 12. In these examples, light can propagate on the high refractive index layer 30 and the resin layer 40 on one side of the low refractive index layer 20 on the first surface 11, and the light will not enter the low refractive index layer 20 and the rigid support layer 10; and the antifouling film 50 located on the second surface 12 can form a certain protection on the exposed rigid support layer 10, effectively preventing the second surface 12 of the rigid support layer 10 from sticking to dust and other dirt, and keeping the surface of the optical waveguide structure 100 clean and beautiful in appearance. The optical waveguide structure 100 in these examples is a monochromatic optical waveguide.

[0048] In other examples, the low refractive index layer 20 is connected to the second surface 12, and the antifouling film 50 covers the first surface 11. Then, in these examples, light can propagate on the high refractive index layer 30 and the resin layer 40 on one side of the low refractive index layer 20 on the second surface 12, and the light will not enter the low refractive index layer 20 and the rigid support layer 10; and the antifouling film 50 located on the first surface 11 can form a certain protection on the exposed rigid support layer 10, effectively preventing the first surface 11 of the rigid support layer 10 from sticking to dust and other dirt, and keeping the surface of the optical waveguide structure 100 clean and beautiful in appearance. The optical waveguide structure 100 in these examples is a monochromatic optical waveguide.

[0049] Exemplarily, the antifouling film 50 is an AF film (Anti-Fingerprint) layer, which can effectively resist the adhesion of fingerprints and stains, and has the advantages of high transparency, high hardness, scratch resistance and chemical corrosion resistance, so as to effectively protect the exposed surface of the rigid support layer 10.

[0050] In some examples of the present invention, Figure 1 As shown, the resin layer 40 is bonded to the high refractive index layer 30. Thus, the resin layer 40 can form a surface-to-surface connection with the high refractive index layer 30. Exemplarily, a layer of OCA (Optically Clear Adhesive) glue is attached to the side of the resin layer 40 facing the high refractive index layer 30. The optical glue is colorless and transparent, and has a total light transmittance greater than 99%. It has little effect on the propagation of light, so that the light can be stably propagated between the resin layer 40 and the high refractive index layer 30. The optical bonding strength is good, so that the resin layer 40 is stably connected to the high refractive index layer 30. The optical glue can be cured at room temperature, and the bonding operation is convenient. The optical glue is not easy to yellow after long-term use, which can ensure that the part of the optical waveguide structure 100 that propagates light always remains transparent, and the light can be effectively propagated during long-term use. The optical glue has small curing shrinkage, and the resin layer 40 is not easy to warp after being bonded to the high refractive index layer 30.

[0051] In other examples, the resin layer 40 may first contact the high refractive index embossed adhesive 32 used to prepare the high refractive index layer 30 , and then when the high refractive index embossed adhesive 32 is cured, the resin layer 40 may be connected to the high refractive index layer 30 .

[0052] In some examples of the present invention, the refractive index of the low refractive index layer 20 is 1.0-1.4. For example, the refractive index of the low refractive index layer 20 is 1.0, 1.1, 1.2, 1.3, 1.4, and the like.

[0053] In some examples of the present invention, the refractive index of the high refractive index layer 30 is 1.6 to 2.0. For example, the refractive index of the high refractive index layer 30 is 1.6, 1.7, 1.8, 1.9, 2.0, etc. Then the refractive index of the high refractive index layer 30 and the low refractive index layer 20 have a certain refractive index difference, which can make the light propagate from the resin layer 40 and the high refractive index layer 30 to the low refractive index layer 20. In the process, the total reflection occurs at the interface between the high refractive index layer 30 and the low refractive index layer 20, thereby preventing the light from propagating into the low refractive index layer 20 and the rigid support layer 10.

[0054] Exemplarily, the refractive index difference between the high refractive index layer 30 and the low refractive index layer 20 is at least 0.2 and at most 1.0, as long as the light entering from the resin layer 40 and propagating through the high refractive index layer 30 to the low refractive index layer 20 can be totally reflected at the interface between the high refractive index layer 30 and the low refractive index layer 20.

[0055] In some examples of the present invention, the refractive index of the resin layer 40 is 1.6-2.0. Then, the refractive index of the resin layer 40 is substantially the same as or slightly different from the refractive index of the high refractive index layer 30, so that light can propagate along a predetermined optical path between the resin layer 40 and the high refractive index layer 30. For example, the refractive index of the resin layer 40 is 1.6, 1.7, 1.8, 1.9, 2.0, etc.

[0056] In the present invention, the high refractive index layer 30 is made of a high refractive index embossed adhesive 32 , and the low refractive index layer 20 is made of a low refractive index embossed adhesive 22 .

[0057] In some examples of the present invention, the thickness of the rigid support layer 10 is in the range of 0.2 mm to 1 mm. As a result, the low refractive index embossed adhesive 22 used to prepare the low refractive index layer 20 is attached to the rigid support layer 10, and the rigid support layer 10 can provide sufficient support to facilitate the embossing of the low refractive index embossed adhesive 22. The rigid support layer 10 is within the above-mentioned thickness range, and the final optical waveguide structure 100 has sufficient rigidity, which can effectively resist external impact and significantly reduce deformation caused by external force. For example, the thickness of the rigid support layer 10 is 0.2 mm, 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm, 0.9 mm or 1 mm, etc.

[0058] In some examples of the present invention, the thickness of the low refractive index layer 20 is in the range of 0.1 μm to 5 μm. Within the above thickness range, the low refractive index embossed adhesive 22 (see Figure 8 and Fig.10The low refractive index grating structure 21 can be quickly solidified, and the low refractive index grating structure 21 of the required size can be realized after printing, and the thickness of the final optical waveguide structure 100 can be controlled within a reasonable range, which is conducive to the design of a thinner optical waveguide structure 100. For example, the thickness of the low refractive index layer 20 is 0.1 μm, 0.3 μm, 0.5 μm, 0.7 μm, 0.9 μm, 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, etc.

[0059] In some examples of the present invention, the thickness of the high refractive index layer 30 is in the range of 0.1 μm to 10 μm. Figure 4 and Figure 6 The surface of the low refractive index layer 20 can be completely covered by the high refractive index embossed glue 32, or the low refractive index grating structure 21 can be completely filled with the high refractive index embossed glue 32. For example, the thickness of the high refractive index layer 30 is 0.1 μm, 0.2 μm, 0.3 μm, 0.5 μm, 0.8 μm, 1 μm, 2 μm, 3 μm, 5 μm, 8 μm or 10 μm, etc.

[0060] In some examples of the present invention, the thickness of the resin layer 40 ranges from 0.1 mm to 1.0 mm. The resin layer 40 can provide certain protection and support for the high refractive index layer 30, and make the overall structural strength of the optical waveguide structure 100 high, which is thinner than setting a glass cover. For example, the thickness of the resin layer 40 is 0.1 mm, 0.2 mm, 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm, 0.9 mm or 1.0 mm, etc.

[0061] An AR near-eye display device includes: an optical machine and the optical waveguide structure 100 in each of the aforementioned embodiments, the optical machine emits signal light to the optical waveguide structure 100, the optical waveguide structure 100 couples the signal light, and couples the signal light out to the human eye.

[0062] As can be seen from the above technical solution, the AR near-eye display device having the optical waveguide structure 100 of the present application emits signal light through an optical machine. When the signal light is transmitted to the optical waveguide structure 100, the light can be coupled in and out of the optical machine to transmit the light to the human eye, thereby realizing the human eye's visualization of the virtual image.

[0063] An application of an AR near-eye display device, applying the AR near-eye display device in the aforementioned example to naked-eye 3D light field display.

[0064] It can be seen from the above technical solutions that when the AR near-eye display device is used for naked-eye 3D light field display, the human eye can see clear and continuous stereoscopic images at different angles, thereby enhancing the interactive immersive experience.

[0065] The following is a description of a method for preparing the optical waveguide structure 100 according to the present invention.

[0066] According to the method for preparing the optical waveguide structure 100 proposed by the present invention, Figure 3 and Figure 4 As shown, the following steps are included:

[0067] Step S10, providing a rigid support layer 10. The material selection of the rigid support layer 10 here is as described above, and will not be repeated here.

[0068] Optionally, in step S10 , after providing the rigid support layer 10 , the method further includes step S11 of cleaning the rigid support layer 10 .

[0069] Step S20, coating the low refractive index embossing glue 22 on the first surface 11 and / or the second surface 12 of the rigid support layer 10, performing embossing and curing, to form a low refractive index layer 20 with a low refractive index grating structure 21. The molded low refractive index grating structure 21 can be used as a mold for preparing a high refractive index grating structure 31.

[0070] Step S30, coating a high refractive index embossed adhesive 32 on the low refractive index layer 20, so that the high refractive index embossed adhesive 32 completely fills the low refractive index grating structure 21. The high refractive index embossed adhesive 32 has a certain fluidity, and the high refractive index embossed adhesive 32 can automatically fill the low refractive index grating structure 21 under the action of gravity, which is convenient for subsequent further molding.

[0071] Step S40 , placing the resin layer 40 on a side of the high refractive index embossed adhesive 32 away from the low refractive index layer 20 , and curing the high refractive index embossed adhesive 32 to form the optical waveguide structure 100 .

[0072] Specifically, in step S40 , the method for preparing the optical waveguide structure 100 may be selected from one of the following steps S41 and S42 .

[0073] S41, placing the resin layer 40 on the side of the high refractive index embossed adhesive 32 away from the low refractive index layer 20, at which time the resin layer 40 can squeeze the high refractive index embossed adhesive 32 by its own gravity, so that the low refractive index grating structure 21 is filled with the high refractive index embossed adhesive 32, and the gap between the high refractive index embossed adhesive 32 and the low refractive index layer 20 is smaller and better fitted, and there are fewer bubbles between the high refractive index embossed adhesive 32 and the low refractive index layer 20. After curing, the high refractive index embossed adhesive 32 can be changed to form a connection between the high refractive index layer 30 and the low refractive index layer 20, and the low refractive index grating structure 21 can be connected to the high refractive index grating structure 31, and the high refractive index layer 30 can be connected to the resin layer 40, and finally the optical waveguide structure 100 is obtained. In these examples, the high refractive index embossed adhesive 32 is in contact with the resin layer 40 when it is still in a wet adhesive state. Then, when the high refractive index embossed adhesive 32 is subsequently cured, when the high refractive index embossed adhesive 32 becomes a high refractive index layer 30, it is automatically connected to the resin layer 40, and there is no need to apply adhesive on the resin layer 40, thereby saving the amount of adhesive. The thickness of the overall optical waveguide structure 100 is smaller than that of S42, and a process of additionally applying adhesive on the resin layer 40 is saved, so that the thickness is reduced by about 0.05 mm.

[0074] It should be noted that if Figure 4 As shown, for a monochromatic optical waveguide, step S41 only needs to be performed on one layer of low refractive index layer 20 (eg, the low refractive index layer 20 on the first surface 11 or the low refractive index layer 20 on the second surface 12), and the above steps only need to be performed once.

[0075] For the color optical waveguide, a low refractive index embossed adhesive 22 is coated on the first surface 11 of the rigid support layer 10, embossed and cured to form a low refractive index layer 20 with a low refractive index grating structure 21. A low refractive index embossed adhesive 22 is coated on the second surface 12 of the rigid support layer 10 and embossed, and the low refractive index embossed adhesive 22 is cured to form a low refractive index layer 20 with a low refractive index grating structure 21. Each of step S30 and step S41 needs to be repeated once, so that a high refractive index layer 30 and a resin layer 40 can be formed on the low refractive index layer 20 on the first surface 11 and the second surface 12, thereby realizing the preparation of a color optical waveguide.

[0076] Optionally, in another embodiment of the present application, the resin layer 40 is placed on a side of the high refractive index embossed adhesive 32 away from the low refractive index layer 20, and the high refractive index embossed adhesive 32 is cured to form the optical waveguide structure 100, which is prepared by the following method:

[0077] Step S42, curing the high refractive index embossed adhesive 32, at this time, the high refractive index embossed adhesive 32 is cured to form a high refractive index layer 30, and the high refractive index layer 30 is connected to the low refractive index layer 20, and the high refractive index grating structure 31 on the high refractive index layer 30 is also connected to the low refractive index grating structure 21. The resin layer 40 is bonded to the side of the high refractive index layer 30 away from the low refractive index layer 20 to obtain the optical waveguide structure 100. In these examples, by further bonding the resin layer 40 to the high refractive index layer 30, a complete optical waveguide structure 100 can be formed.

[0078] It should be noted that if Figure 4 As shown, for a monochromatic optical waveguide, step S42 only needs to be performed on one layer of low refractive index layer 20 (eg, the low refractive index layer 20 on the first surface 11 or the low refractive index layer 20 on the second surface 12), and the above steps only need to be performed once.

[0079] For the color optical waveguide, a low refractive index embossed adhesive 22 is coated on the first surface 11 of the rigid support layer 10, embossed and cured to form a low refractive index layer 20 with a low refractive index grating structure 21. A low refractive index embossed adhesive 22 is coated on the second surface 12 of the rigid support layer 10 and embossed, and the low refractive index embossed adhesive 22 is cured to form a low refractive index layer 20 with a low refractive index grating structure 21. Each step S30 and step S42 needs to be repeated once, and a high refractive index layer 30 and a resin layer 40 are formed on the low refractive index layer 20 on the first surface 11 and the second surface 12, thereby realizing the preparation of the color optical waveguide.

[0080] As can be seen from the above, the preparation method of the optical waveguide structure 100 proposed by the present invention is simple, and the high refractive index grating structure 31 can be formed by using the low refractive index grating structure 21 formed by imprinting and curing the low refractive index imprint glue 22, so as to prepare the high refractive index grating structure 31, so that the prepared high refractive index grating structure 31 and the low refractive index grating structure 21 can achieve good bonding, and simplify the connection arrangement between the low refractive index layer 20 and the high refractive index layer 30. The prepared optical waveguide structure 100 has good rigidity, is not easy to deform, is resistant to external force impact, is light in weight, and has a small thickness.

[0081] In the present invention, if Figure 5 As shown, the method for preparing the optical waveguide structure 100 further includes the following steps: Step S50, when the low-refractive index embossed adhesive 22 is only disposed on the first surface 11 or the second surface 12 of the rigid support layer 10, before obtaining the optical waveguide structure 100, an anti-fouling film 50 is also coated on one side of the rigid support layer 10 away from the low-refractive index layer 20. That is, for a monochromatic optical waveguide, the anti-fouling film 50 is coated on one side of the exposed rigid support layer 10.

[0082] like Figure 6As shown, in this embodiment, the low refractive index embossed adhesive 22 is only provided on the first surface 11 of the rigid support layer 10, and the antifouling film 50 is also coated on the second surface 12. The example in which the low refractive index embossed adhesive 22 is only provided on the second surface 12 of the rigid support layer 10 and the antifouling film 50 is coated on the first surface 11 is not described in detail. The material and advantages of the antifouling film 50 are as described above and are not described in detail here.

[0083] For example, the antifouling film 50 is an AF film. For curable resin AF films, the preparation is achieved by spraying followed by UV curing or heating curing. For self-limiting surface reaction AF films, the preparation is achieved by spraying or vacuum evaporation.

[0084] According to another method for preparing the optical waveguide structure 100 proposed by the present invention, Figure 7 and Figure 8 As shown, the following steps are included:

[0085] Step S100: provide a rigid support layer 10. The material selection of the rigid support layer 10 is as described above, and will not be repeated here.

[0086] Optionally, after providing the rigid support layer 10 in step S100 , the method further includes a step S110 of cleaning the rigid support layer 10 .

[0087] Step S200 , coating a low-refractive-index embossed adhesive 22 on the first surface 11 or the second surface 12 of the rigid support layer 10 and forming a first matrix with the rigid support layer 10 . At this time, the low-refractive-index embossed adhesive 22 is not cured but is in a wet adhesive state.

[0088] Step S300, providing a resin layer 40, and coating the resin layer 40 with a high refractive index embossed adhesive 32 for embossing and curing to form a high refractive index layer 30 with a high refractive index grating structure 31, and the resin layer 40 and the high refractive index layer 30 form a second matrix. At this time, the resin layer 40 provides attachment for the high refractive index embossed adhesive 32, which facilitates the embossing of the high refractive index embossed adhesive 32; the high refractive index grating structure 31 is used as an embossing mold for preparing the low refractive index grating structure 21, and when the high refractive index layer 30 with the high refractive index grating structure 31 is attached to the uncured low refractive index embossed adhesive 22, a matching structure can be formed on the low refractive index embossed adhesive 22.

[0089] Step S400, laminating the second substrate and the first substrate in a vacuum environment and removing bubbles. For example, debubbling is performed in a debubbling machine to remove bubbles that may exist during the laminating process, so that the second substrate and the first substrate are closely attached to each other without bubbles or with fewer bubbles; that is, the high refractive index layer 30 and the low refractive index embossed adhesive 22 are bonded without bubbles.

[0090] Step S500, curing the low refractive index embossed adhesive 22 to obtain the optical waveguide structure 100. The low refractive index embossed adhesive 22 after curing and the high refractive index grating structure 31 will automatically form a low refractive index grating structure 21, thereby, the low refractive index embossed adhesive 22 forms a low refractive index layer 20 with a low refractive index grating structure 21.

[0091] It should be noted that if Figure 7 As shown, for a monochromatic optical waveguide, steps S200, S300, S400 and S500 need only be performed on one side of the rigid support layer 10 (e.g., the low refractive index layer 20 on the first surface 11 or the low refractive index layer 20 on the second surface 12), and each of the above steps only needs to be performed once.

[0092] For the colored light waveguide, it is necessary to repeat steps S200, S300, S400 and S500. In addition to performing steps S200, S300, S400 and S500 on one side (such as the first surface 11) of the aforementioned rigid support layer 10, it is also necessary to perform steps S200, S300, S400 and S500 on the other side (such as the second surface 12) of the rigid support layer 10, thereby realizing the preparation of the colored light waveguide. The preparation of the colored light waveguide is not described in detail here.

[0093] As can be seen from the above, the preparation method of the optical waveguide structure 100 proposed by the present invention is simple, has few bubbles, and has a high degree of fit between the layers. The high refractive index grating structure 31 formed by the imprinting and curing of the high refractive index imprint glue 32 can be used to form the low refractive index grating structure 21, and the low refractive index grating structure 21 can be prepared, so that the prepared low refractive index grating structure 21 has a high degree of fit with the high refractive index grating structure 31, and the connection arrangement between the low refractive index layer 20 and the high refractive index layer 30 is simplified. The prepared optical waveguide structure 100 has good rigidity, is not easy to deform, is resistant to external force impact, is light in weight, and has a small thickness.

[0094] In the present invention, if Fig. 9 As shown, the method for preparing the optical waveguide structure 100 further includes the following steps:

[0095] In step S600, when the low-refractive index embossed adhesive 22 is only disposed on the first surface 11 or the second surface 12 of the rigid support layer 10, before obtaining the optical waveguide structure 100, the side of the rigid support layer 10 away from the low-refractive index layer 20 is also coated with an anti-fouling film 50. Then, when the low-refractive index embossed adhesive 22 is only disposed on the first surface 11 or the second surface 12 of the rigid support layer 10, the side of the rigid support layer 10 away from the low-refractive index layer 20 is also coated with an anti-fouling film 50. That is, for a monochromatic optical waveguide, the anti-fouling film 50 is coated on one side of the exposed rigid support layer 10.

[0096] like Fig.10 As shown, in this embodiment, the low refractive index embossed adhesive 22 is only provided on the first surface 11 of the rigid support layer 10, and the antifouling film 50 is also coated on the second surface 12. The example in which the low refractive index embossed adhesive 22 is only provided on the second surface 12 of the rigid support layer 10 and the antifouling film 50 is coated on the first surface 11 is not described in detail. The material and advantages of the antifouling film 50 are as described above and are not described in detail here.

[0097] For example, the antifouling film 50 is an AF film. For curable resin AF films, the preparation is achieved by spraying followed by UV curing or heating curing. For self-limiting surface reaction AF films, the preparation is achieved by spraying or vacuum evaporation.

[0098] The optical waveguide structure 100 and the preparation method thereof of the present invention are further described below in conjunction with specific embodiments. The following embodiments are merely exemplary descriptions of the present invention and should not be construed as limiting the present invention.

[0099] Example 1

[0100] An optical waveguide structure 100, such as Figure 1 As shown, it includes a rigid support layer 10, a low refractive index layer 20, a high refractive index layer 30, a resin layer 40 and an antifouling film 50. Among them, the rigid support layer 10 has a first surface 11 and a second surface 12 opposite to each other. The low refractive index layer 20 is at least connected to the first surface 11, and two spaced low refractive index grating structures 21 are provided on the side of the low refractive index layer 20 away from the rigid support layer 10. The high refractive index layer 30 is connected to the side of the low refractive index layer 20 away from the rigid support layer 10, and two high refractive index grating structures 31 are provided on the high refractive index layer 30, and the two high refractive index grating structures 31 are respectively correspondingly arranged with the two low refractive index grating structures 21. The resin layer 40 is arranged on the side of the high refractive index layer 30 away from the low refractive index layer 20. The antifouling film 50 covers the second surface 12.

[0101] A method for preparing an optical waveguide structure 100, combining Figure 3 and Figure 5 As shown, the following steps are included:

[0102] Step S10: providing a rigid support layer 10.

[0103] Step S20 , coating a low-refractive-index embossing adhesive 22 on the first surface 11 of the rigid support layer 10 , performing embossing and curing, and forming a low-refractive-index layer 20 with a low-refractive-index grating structure 21 .

[0104] Step S30 , coating a high refractive index embossed adhesive 32 on the low refractive index layer 20 , so that the high refractive index embossed adhesive 32 completely fills the low refractive index grating structure 21 .

[0105] Step S41 , placing the resin layer 40 on a side of the high refractive index embossed adhesive 32 away from the low refractive index layer 20 , and then curing it.

[0106] Step S50 , coating the second surface 12 of the rigid support layer 10 with an anti-fouling film 50 , and finally obtaining a monochromatic optical waveguide structure 100 .

[0107] Example 2

[0108] An optical waveguide structure 100, such as Figure 1 As shown, it includes a rigid support layer 10, a low refractive index layer 20, a high refractive index layer 30, a resin layer 40 and an antifouling film 50. Among them, the rigid support layer 10 has a first surface 11 and a second surface 12 opposite to each other. The low refractive index layer 20 is at least connected to the first surface 11, and two spaced low refractive index grating structures 21 are provided on the side of the low refractive index layer 20 away from the rigid support layer 10. The high refractive index layer 30 is connected to the side of the low refractive index layer 20 away from the rigid support layer 10, and two high refractive index grating structures 31 are provided on the high refractive index layer 30, and the two high refractive index grating structures 31 are respectively correspondingly arranged with the two low refractive index grating structures 21. The resin layer 40 is arranged on the side of the high refractive index layer 30 away from the low refractive index layer 20. The antifouling film 50 covers the second surface 12.

[0109] A method for preparing an optical waveguide structure 100, combining Figure 3 and Figure 5 As shown, the following steps are included:

[0110] Step S10: providing a rigid support layer 10.

[0111] Step S20 , coating a low-refractive-index embossing adhesive 22 on the first surface 11 of the rigid support layer 10 , performing embossing and curing, and forming a low-refractive-index layer 20 with a low-refractive-index grating structure 21 .

[0112] Step S30 , coating a high refractive index embossed adhesive 32 on the low refractive index layer 20 , so that the high refractive index embossed adhesive 32 completely fills the low refractive index grating structure 21 .

[0113] Step S42 , firstly solidify the high refractive index embossed adhesive 32 , and then the high refractive index embossed adhesive 32 is solidified to form a high refractive index layer 30 , and then the resin layer 40 is bonded to the side of the high refractive index layer 30 away from the low refractive index layer 20 .

[0114] Step S50 , coating the second surface 12 of the rigid support layer 10 with an anti-fouling film 50 , and finally obtaining a monochromatic optical waveguide structure 100 .

[0115] Example 3

[0116] An optical waveguide structure 100, such as Figure 2 As shown, it includes a rigid support layer 10, two low refractive index layers 20, two high refractive index layers 30 and two resin layers 40. The rigid support layer 10 has a first surface 11 and a second surface 12 opposite to each other. The two low refractive index layers 20 are connected to the first surface 11 and the second surface 12, and two spaced low refractive index grating structures 21 are provided on the side of the low refractive index layer 20 away from the rigid support layer 10. The two high refractive index layers 30 are respectively connected to the side of the low refractive index layer 20 away from the rigid support layer 10, and two high refractive index grating structures 31 are provided on each high refractive index layer 30, and the two high refractive index grating structures 31 on the same side are respectively correspondingly bonded to the two low refractive index grating structures 21. The two resin layers 40 are respectively provided on the side of the high refractive index layer 30 away from the low refractive index layer 20 to form a color optical waveguide.

[0117] A method for preparing an optical waveguide structure 100, referring to Figure 3 , including the following steps:

[0118] Step S10: providing a rigid support layer 10.

[0119] Step S20, coating a low-refractive index embossed adhesive 22 on the first surface 11 of the rigid support layer 10 for embossing and curing, and coating a low-refractive index embossed adhesive 22 on the second surface 12 of the rigid support layer 10 for embossing and curing, to form a low-refractive index layer 20 with a low-refractive index grating structure 21 connected to both sides of the rigid support layer 10.

[0120] Step S30 , coating a high refractive index embossed adhesive 32 on the low refractive index layer 20 on the first surface 11 , so that the high refractive index embossed adhesive 32 completely fills the low refractive index grating structure 21 .

[0121] Step S41 , placing a resin layer 40 on a side of the high refractive index embossed adhesive 32 away from the low refractive index layer 20 , and then curing it.

[0122] Step S30 , coating a high refractive index embossed adhesive 32 on the low refractive index layer 20 on the second surface 12 , so that the high refractive index embossed adhesive 32 completely fills the low refractive index grating structure 21 .

[0123] Step S41 , placing another resin layer 40 on a side of the high refractive index embossed adhesive 32 away from the low refractive index layer 20 , and then curing the resin layer 40 , thereby finally obtaining a colored optical waveguide structure 100 .

[0124] Example 4

[0125] An optical waveguide structure 100, such as Figure 2As shown, it includes a rigid support layer 10, two low refractive index layers 20, two high refractive index layers 30 and two resin layers 40. The rigid support layer 10 has a first surface 11 and a second surface 12 opposite to each other. The two low refractive index layers 20 are connected to the first surface 11 and the second surface 12, and two spaced low refractive index grating structures 21 are provided on the side of the low refractive index layer 20 away from the rigid support layer 10. The two high refractive index layers 30 are respectively connected to the side of the low refractive index layer 20 away from the rigid support layer 10, and two high refractive index grating structures 31 are provided on each high refractive index layer 30, and the two high refractive index grating structures 31 on the same side are respectively correspondingly bonded to the two low refractive index grating structures 21. The two resin layers 40 are respectively provided on the side of the high refractive index layer 30 away from the low refractive index layer 20 to form a color optical waveguide.

[0126] A method for preparing an optical waveguide structure 100, referring to Figure 3 , including the following steps:

[0127] Step S10: providing a rigid support layer 10.

[0128] Step S20, coating a low-refractive index embossed adhesive 22 on the first surface 11 of the rigid support layer 10 for embossing and curing, and coating a low-refractive index embossed adhesive 22 on the second surface 12 of the rigid support layer 10 for embossing and curing, to form a low-refractive index layer 20 with a low-refractive index grating structure 21 connected to both sides of the rigid support layer 10.

[0129] Step S30 , coating a high refractive index embossed adhesive 32 on the low refractive index layer 20 on the first surface 11 , so that the high refractive index embossed adhesive 32 completely fills the low refractive index grating structure 21 .

[0130] Step S42 , curing the high refractive index embossed adhesive 32 , where the high refractive index embossed adhesive 32 is cured to form a high refractive index layer 30 , and then bonding a resin layer 40 to a side of the high refractive index layer 30 away from the low refractive index layer 20 .

[0131] Repeat step S30 to coat the high refractive index embossed adhesive 32 on the low refractive index layer 20 on the second surface 12 , so that the high refractive index embossed adhesive 32 completely fills the low refractive index grating structure 21 .

[0132] Repeat step S42 to solidify the high refractive index embossed adhesive 32 on the low refractive index layer 20 of the second surface 12. At this time, the high refractive index embossed adhesive 32 is solidified to form another high refractive index layer 30. Then, another resin layer 40 is bonded to the side of the high refractive index layer 30 away from the low refractive index layer 20 to form a colored optical waveguide structure 100.

[0133] Example 5

[0134] An optical waveguide structure 100, such as Figure 1 As shown, it includes a rigid support layer 10, a low refractive index layer 20, a high refractive index layer 30, a resin layer 40 and an antifouling film 50. Among them, the rigid support layer 10 has a first surface 11 and a second surface 12 opposite to each other. The low refractive index layer 20 is at least connected to the first surface 11, and two spaced low refractive index grating structures 21 are provided on the side of the low refractive index layer 20 away from the rigid support layer 10. The high refractive index layer 30 is connected to the side of the low refractive index layer 20 away from the rigid support layer 10, and two high refractive index grating structures 31 are provided on the high refractive index layer 30, and the two high refractive index grating structures 31 are respectively correspondingly arranged with the two low refractive index grating structures 21. The resin layer 40 is arranged on the side of the high refractive index layer 30 away from the low refractive index layer 20. The antifouling film 50 covers the second surface 12.

[0135] A method for preparing an optical waveguide structure 100, combining Figure 7 and Fig. 9 As shown, the following steps are included:

[0136] Step S100: providing a rigid support layer 10.

[0137] Step S200 , coating a low-refractive-index embossing adhesive 22 on the first surface 11 of the rigid support layer 10 and forming a first matrix with the rigid support layer 10 .

[0138] Step S300 , providing a resin layer 40 , and coating a high refractive index embossing glue 32 on the resin layer 40 for embossing and curing to form a high refractive index layer 30 with a high refractive index grating structure 31 , wherein the resin layer 40 and the high refractive index layer 30 form a second substrate.

[0139] Step S400: Laminating the second substrate and the first substrate in a vacuum environment and removing bubbles.

[0140] Step S500 , curing the low refractive index embossing adhesive 22 .

[0141] Step S600 : coating the second surface 12 of the rigid support layer 10 with an anti-fouling film 50 , and finally obtaining a monochromatic optical waveguide structure 100 .

[0142] Example 6

[0143] An optical waveguide structure 100, such as Figure 2As shown, it includes a rigid support layer 10, two low refractive index layers 20, two high refractive index layers 30 and two resin layers 40. The rigid support layer 10 has a first surface 11 and a second surface 12 opposite to each other. The two low refractive index layers 20 are connected to the first surface 11 and the second surface 12, and two spaced low refractive index grating structures 21 are provided on the side of the low refractive index layer 20 away from the rigid support layer 10. The two high refractive index layers 30 are respectively connected to the side of the low refractive index layer 20 away from the rigid support layer 10, and two high refractive index grating structures 31 are provided on each high refractive index layer 30, and the two high refractive index grating structures 31 on the same side are respectively correspondingly bonded to the two low refractive index grating structures 21. The two resin layers 40 are respectively provided on the side of the high refractive index layer 30 away from the low refractive index layer 20 to form a color optical waveguide.

[0144] A method for preparing an optical waveguide structure 100, such as Figure 7 As shown, the following steps are included:

[0145] Step S100: providing a rigid support layer 10.

[0146] Step S200 , coating a low-refractive-index embossing adhesive 22 on the first surface 11 of the rigid support layer 10 and forming a first matrix with the rigid support layer 10 .

[0147] Step S300 , providing a resin layer 40 , and coating a high refractive index embossing glue 32 on the resin layer 40 for embossing and curing to form a high refractive index layer 30 with a high refractive index grating structure 31 , wherein the resin layer 40 and the high refractive index layer 30 form a second substrate.

[0148] Step S400: Lay the second substrate and the first substrate together in a vacuum environment and remove bubbles to form a single-sided optical waveguide.

[0149] Step S500 , curing the low refractive index embossed adhesive 22 on the first surface 11 .

[0150] Repeat step S200, coat the low-refractive-index embossed adhesive 22 on the second surface 12 of the rigid support layer 10 and combine it with the single-sided optical waveguide formed after the previous step S400 to form a new first substrate.

[0151] Repeat step S300, provide another resin layer 40, and coat the high refractive index embossing glue 32 on the resin layer 40 for embossing and curing to form another high refractive index layer 30 with a high refractive index grating structure 31. The resin layer 40 and the high refractive index layer 30 form a new second substrate.

[0152] Repeat step S400 to attach the new second substrate to the new first substrate in a vacuum environment and remove bubbles.

[0153] Repeat step S500 to solidify the low-refractive-index embossed adhesive 22 on the second surface 12 , and finally obtain a colored optical waveguide structure 100 .

[0154] The above is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can easily think of various equivalent modifications or replacements within the technical scope disclosed by the present invention, and these modifications or replacements should be included in the protection scope of the present invention. Therefore, the protection scope of the present invention shall be based on the protection scope of the claims.

Claims

1. An optical waveguide structure, characterized in that: include: a rigid support layer having opposing first and second surfaces; A low refractive index layer, wherein the low refractive index layer is at least connected to the first surface, and at least one low refractive index grating structure is provided on a side of the low refractive index layer away from the rigid support layer; A high refractive index layer, wherein the high refractive index layer is connected to a side of the low refractive index layer away from the rigid support layer, and at least one high refractive index grating structure is disposed on the high refractive index layer, and the high refractive index grating structure is correspondingly and laminated to the low refractive index grating structure; A resin layer is provided on a side of the high refractive index layer away from the low refractive index layer.

2. The optical waveguide structure according to claim 1, wherein: The rigid support layer includes at least one of a toughened glass layer, a sapphire glass layer, a quartz layer or a rigid light-transmitting resin layer.

3. The optical waveguide structure according to claim 2, wherein: The rigid light-transmitting resin layer includes at least one of a polycarbonate layer, a polymethyl methacrylate layer, a polystyrene layer, an acrylonitrile-styrene copolymer layer, a polyethylene terephthalate layer, a transparent ABS resin layer or a polyamide layer.

4. The optical waveguide structure according to claim 1, wherein: The low refractive index layer, the high refractive index layer and the resin layer each include two layers, and the two low refractive index layers are respectively connected to the first surface and the second surface; each low refractive index layer is connected to a layer of the high refractive index layer on a side away from the rigid support layer; each high refractive index layer is connected to a layer of the resin layer on a side away from the low refractive index layer.

5. The optical waveguide structure according to claim 1, wherein: It also includes an antifouling film, wherein the low refractive index layer is connected to the first surface, and the antifouling film covers the second surface; or, the low refractive index layer is connected to the second surface, and the antifouling film covers the first surface.

6. The optical waveguide structure according to claim 5, characterized in that The resin layer is bonded to the high refractive index layer.

7. The optical waveguide structure according to claim 1, wherein: The refractive index of the low refractive index layer is 1.0 to 1.4; and / or the refractive index of the high refractive index layer is 1.6 to 2.0; and / or the refractive index of the resin layer is 1.6 to 2.

0.

8. The optical waveguide structure according to claim 1, wherein: The thickness of the low refractive index layer ranges from 0.1 μm to 5 μm; and / or, the thickness of the high refractive index layer ranges from 0.1 μm to 10 μm; and / or, the thickness of the resin layer ranges from 0.1 mm to 1.0 mm; and / or, the thickness of the rigid support layer ranges from 0.2 mm to 1 mm.

9. A method for preparing an optical waveguide structure, characterized in that: The steps include: Provide a rigid support layer; Coating a low-refractive-index embossing adhesive on the first surface and / or the second surface of the rigid support layer, and then embossing and curing the adhesive to form a low-refractive-index layer with a low-refractive-index grating structure; Coating a high refractive index embossed adhesive on the low refractive index layer so that the high refractive index embossed adhesive completely fills the low refractive index grating structure; The resin layer is placed on the side of the high refractive index embossed adhesive away from the low refractive index layer and cured to obtain the optical waveguide structure; or the high refractive index embossed adhesive is first cured and then the resin layer is bonded to the side of the high refractive index layer away from the low refractive index layer to obtain the optical waveguide structure.

10. A method for preparing an optical waveguide structure, characterized in that: The steps include: Provide a rigid support layer; Coating a low-refractive-index embossed adhesive on the first surface or the second surface of the rigid support layer and forming a first matrix with the rigid support layer; Providing a resin layer, and coating a high-refractive index embossing glue on the resin layer for embossing and curing to form a high-refractive index layer with a high-refractive index grating structure, wherein the resin layer and the high-refractive index layer form a second substrate; Laminating the second substrate and the first substrate in a vacuum environment and removing bubbles; The low-refractive-index embossing adhesive is cured to obtain the optical waveguide structure.

11. The method for preparing an optical waveguide structure according to claim 9 or 10, characterized in that: After providing the rigid support layer, the rigid support layer is cleaned; and / or, When the low refractive index embossed adhesive is only disposed on the first surface or the second surface of the rigid support layer, an anti-fouling film is also coated on one side of the rigid support layer away from the low refractive index layer before obtaining the optical waveguide structure.

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