Electrochemical reactor cleaning device with automatic cleaning function and using method thereof

Abstract

The invention discloses an electrochemical reactor cleaning device with an automatic cleaning function. The electrochemical reactor cleaning device comprises a shell, a partition plate, a supporting piece, an electrochemical reaction plate, an aeration stirrer and a circulating water pump, the shell is of a hollow box body structure; the partition plate is arranged in the shell, the partition plate and the shell are matched to define a containing cavity, a through hole is formed in the top of the containing cavity, and the interior of the containing cavity is suitable for containing a cleaning agent; the supporting piece is arranged in the containing cavity, and a hole is formed in the supporting piece. The electrochemical reaction plate is arranged on the supporting piece, and the top of the electrochemical reaction plate penetrates through the through hole of the placing cavity; the aeration stirrer is arranged below the supporting piece; the circulating water pump is arranged at the bottom of one side of the shell; through the arrangement, the chemical consumption is reduced, the cleaning efficiency is improved, the cleaning effect is controlled, and the technical problems that disassembly and assembly are needed, manpower and material resources are consumed, and the cleaning efficiency is low due to the fact that the polar plate is disassembled and hoisted for chemical cleaning and then the cleaned polar plate is installed in the assembly are solved.

Description

Technical Field

[0001] The present invention relates to the technical field of water pollution treatment, and in particular to an electrochemical reactor cleaning device with automatic cleaning function and a use method thereof. Background Art

[0002] In recent years, there has been more and more research and application of electrochemical wastewater treatment technology. The strong oxidizing substances produced by electrolysis can remove most pollutants in sewage, and have a good treatment effect on difficult-to-biochemical wastewater such as high-salt and strong alkaline wastewater. Compared with traditional biochemical and physicochemical methods, the treatment effect is stable and no chemical agents need to be added.

[0003] With the application and promotion of electrochemical methods, problems encountered in the process of electrochemical wastewater treatment have gradually emerged. Plate scaling is a common problem in the process of electrochemical treatment of wastewater (especially high-salt and high-hardness wastewater). It is mainly because the wastewater treated contains Mg 2+ , Ca 2+ Scaling ions such as calcium carbonate and magnesium hydroxide will form scale on the surface of the plate during the electrochemical treatment process, thereby reducing the conductivity of the plate, reducing the treatment efficiency, increasing the operating energy consumption, and even aggravating the heating of the plate, greatly affecting production safety.

[0004] When faced with the problem of plate scaling, the common treatment method is to disassemble the plates, lift them up, perform chemical cleaning, and then install the cleaned plates back into the assembly. This ex situ cleaning method takes a long time and requires disassembly and assembly. The process is relatively cumbersome, consumes manpower and material resources, has low cleaning efficiency, and the cleaning effect is difficult to accurately determine. Summary of the invention

[0005] In view of this, the present application proposes an electrochemical reactor cleaning device and a method of using the same, which can be used for cleaning without removing the electrochemical reaction plate.

[0006] According to one aspect of the present application, there is provided an electrochemical reactor cleaning device with automatic cleaning, comprising a shell, a baffle, a support, an electrochemical reaction plate, an aeration agitator and a circulating water pump; the shell is a hollow box structure, and a water inlet and a water outlet are provided on both sides of the shell; the baffle is arranged inside the shell, and the baffle is provided in a plurality of pieces, and the plurality of baffles cooperate with the shell to enclose a placement chamber, and the top of the placement chamber is provided with a plurality of through holes, and the placement chamber is suitable for accommodating a cleaning agent; the support is arranged in the placement chamber, and the support is provided with a plurality of holes; the electrochemical reaction plate is arranged in the placement chamber, located on the support, and the top of the electrochemical reaction plate passes through the through holes of the placement chamber; the aeration agitator is arranged in the placement chamber, located below the support, and the aeration agitator is used to generate a large number of bubbles to scrub the electrochemical reaction plate; the circulating water pump is arranged inside the shell, located at the bottom of one side of the shell, and is used to circulate the cleaning agent in the shell to the inside of the placement chamber.

[0007] In a possible implementation, the electrochemical reaction plate includes a power-carrying plate and a polar plate; the power-carrying plate is arranged on the top of the polar plate, and the power-carrying plate passes through the through hole of the placement chamber and is located outside the placement chamber; the polar plate is arranged on the support member.

[0008] In one possible implementation, the aeration agitator includes an air intake main pipe and a plurality of aeration pipes; the air intake main pipe passes through one side of the shell and enters the placement chamber, and the air intake end of the air intake main pipe is suitable for connecting to an external aeration fan; the aeration pipes are arranged on the air intake main pipe, and the opening direction of the aeration pipes corresponds to the support member.

[0009] In a possible implementation, an overflow port is provided on the opposite side of the placement chamber where the placement chamber is connected to the shell, and the overflow port is located at the connection position between the power-carrying plate and the electrode plate.

[0010] In a possible implementation, a pH tester and a hardness tester are further included, wherein the pH tester and the hardness tester are both arranged inside the shell, and the positions of the pH tester and the hardness tester are not higher than the position of the water outlet of the shell.

[0011] In a possible implementation, a display is further included, and the pH tester and the hardness tester are both electrically connected to the display.

[0012] In a possible implementation, the circulating water pump is provided with a first water outlet and a second water outlet, the first water outlet is connected to the placement chamber, and the second water outlet is connected to the outside of the shell.

[0013] In a possible implementation, the water outlet of the shell is arranged above the circulating water pump and has a preset distance from the circulating water pump.

[0014] In a possible implementation, the aeration stirrer and the circulating water pump are both suitable for connection to an external motor.

[0015] A method for cleaning an electrochemical reactor, using the electrochemical reactor cleaning device with automatic cleaning as described in claims 1-9, wherein the electrochemical reaction plate comprises a power-on plate and a pole plate, the power-on plate is arranged on the top of the pole plate, and the power-on plate passes through the through hole of the placement chamber and is located outside the placement chamber, and the pole plate is arranged on the support, comprising the following steps: firstly, a cleaning liquid is introduced into the placement chamber through a water inlet; after the cleaning liquid can submerge the pole plate and enter the shell from an overflow port on the right side of the pole plate, an aeration fan is turned on, and a large amount of bubbles can be introduced into the aeration stirring device to scrub the pole plate in the placement chamber; at the same time, a circulating water pump is turned on, so that the cleaning liquid overflowing from the placement chamber into the shell can flow back into the placement chamber to continue aeration; whether the cleaning liquid needs to be supplemented and the end point of cleaning is judged by a pH tester and a hardness tester in the shell; finally, the cleaning liquid is discharged through a water outlet on the shell and a circulating water pump, and the cleaning liquid is rinsed with clean water before being put into use.

[0016] The beneficial effects of the present invention are as follows: by setting a shell, a baffle, an electrochemical reaction plate, a support, an aeration agitator and a circulating water pump, a shell is set, and the shell is a hollow box structure to form a water tank that can hold water; a baffle is set so that the baffle and the shell are enclosed to form a placement chamber; a support is set in the placement chamber, and the support divides the placement chamber into an electrolysis zone and an aeration zone; the lower part of the electrochemical reaction plate is set in the placement chamber and connected to the support; the aeration agitator is set in the aeration zone; in order to allow bubbles to contact the electrochemical reaction plate, a plurality of holes are opened on the support so that bubbles can pass through the support and contact the electrochemical reaction plate for cleaning; a circulating water pump is set so that the cleaning liquid from the placement chamber is circulated to the aeration zone for continued use. The present application reduces drug consumption, saves manpower and material resources, improves cleaning efficiency, and controls cleaning effect through the above settings. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 A specific structural diagram of an electrochemical reactor cleaning device according to an embodiment of the present application is shown. DETAILED DESCRIPTION

[0018] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.

[0019] Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar symbols throughout represent the same or similar elements or elements with the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present invention, and should not be construed as limiting the present invention.

[0020] In the description of the present invention, it is necessary to understand that the terms “center”, “longitudinal”, “lateral”, “length”, “width”, “up”, “down”, “front”, “back”, “left”, “right”, “vertical”, “horizontal”, “top”, “bottom”, “inside”, “outside”, “clockwise”, “counterclockwise”, “axial”, “radial”, “circumferential”, etc., indicating orientations or positional relationships are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention or simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention.

[0021] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0022] In the present invention, unless otherwise clearly specified and limited, the terms "install", "connect", "connect", "fix", "join", "hinge", etc. should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0023] like Figure 1As shown, the electrochemical reactor cleaning device includes a shell 100, a baffle plate 200, a support member 300, an electrochemical reaction plate 400, an aeration stirrer 500 and a circulating water pump 600; the shell 100 is a hollow box structure, and a water inlet 120 and a water outlet 130 are provided on both sides of the shell 100; the baffle plate 200 is arranged inside the shell 100, and the baffle plates 200 are provided in plurality, and the plurality of baffle plates 200 cooperate with the shell 100 to enclose a placement chamber 110, and a plurality of through holes are provided on the top of the placement chamber 110, and the placement chamber 110 is suitable for accommodating a cleaning agent; the support member 300 It is arranged in the placement chamber 110, and a plurality of holes are opened on the support 300; the electrochemical reaction plate 400 is arranged in the placement chamber 110, located on the support 300, and the top of the electrochemical reaction plate 400 passes through the through hole of the placement chamber 110; the aeration stirrer 500 is arranged in the placement chamber 110, located below the support 300, and the aeration stirrer 500 is used to generate a large number of bubbles to scrub the electrochemical reaction plate 400; the circulating water pump 600 is arranged inside the shell 100, located at the bottom of one side of the shell 100, and is used to circulate the cleaning agent in the shell 100 to the inside of the placement chamber 110.

[0024] Specifically, the specific structure of the electrochemical reactor cleaning device includes a shell 100, a baffle plate 200, a support member 300, an electrochemical reaction plate 400, an aeration stirrer 500 and a circulating water pump 600. The shell 100 is a rectangular parallelepiped structure as a whole. In order to make the shell 100 a water, the shell 100 is a hollow box structure. A water inlet 120 and a water outlet 130 are respectively provided on both sides of the shell 100. When the whole is working or cleaning, water or cleaning liquid enters through the inlet 120 and is discharged through the drainage. The opening 130 is excluded. In order to clean the electrochemical reaction plate 400 without removing the electrochemical reaction plate 400, a rectangular placement chamber 110 is provided at the lower left side and the outer wall of the shell 100 as part of the outer wall. In order to form the placement chamber 110, a baffle plate 200 is provided. The number of baffle plates 200 is multiple. According to this embodiment, the number of baffle plates 200 is two. The two baffle plates 200 and one side of the shell 100 and the bottom of the shell 100 are enclosed to form the placement chamber 110. The placement chamber 110 occupies more than 3 / 4 of the internal space of the shell 100. In order to provide support for the electrochemical reaction plate 400, a support member 300 is provided. The electrochemical reaction plate 400 is provided on the top of the support member 300, located in the electrolysis zone, and the interior of the placement chamber 110 is divided into two parts by the support member 300. The support member 300 divides the placement chamber 110 into an electrolysis zone and an aeration zone. The support plate 300 is provided at the bottom of the placement chamber 110, at a position 1 / 4 to 1 / 3 of the height of the entire placement chamber 110 from the bottom surface. The shape of the support plate 300 matches the shape of the placement chamber 110, and the surroundings of the support plate 300 fit the surroundings of the placement chamber 110.The part of the electrochemical reaction plate 400 that needs to be cleaned is placed inside the placement chamber 110. The electrochemical reaction plate 400 is cleaned in the electrolysis zone. In order to complete the cleaning of the electrochemical reaction plate 400, an aeration stirrer 500 is provided. The aeration stirrer 500 is provided below the support member 300, close to the bottom of the shell 100. The aeration stirrer 500 is laid flat on the bottom of the placement chamber 110. The size of the aeration stirrer 500 is the same as that of the support plate 300. The aeration stirrer 500 is used to generate a large number of bubbles to clean the electrochemical reaction plate 400. Cleaning the electrochemical reaction plate 400 requires a cleaning solution, and in the electrolysis zone, the aeration stirrer 500 is provided with a plurality of bubbles. The parts of the electrochemical reaction plate 400 that need to be cleaned are cleaned inside. Because the water inlet of the shell 100 is on the electrolysis area, in order to allow the aeration and stirring device 500 to aerate and contact the electrochemical reaction plate 400, a number of holes are opened on the support 300, so that bubbles can pass through the support 300 and contact the electrochemical reaction plate 400 for cleaning. In order to be able to recycle, a circulating water pump 600 is set at the lower right corner of the shell. The height of the circulating water pump 600 occupies 1 / 3 of the cover of the shell 100. Because the cleaning liquid flows from top to bottom, the water inlet end of the circulating water pump is set upward, which can better circulate the cleaning liquid into the placement chamber 110.

[0025] In one possible implementation, the electrochemical reaction plate 400 includes a power-carrying plate 410 and a pole plate 420 ; the power-carrying plate 410 is disposed on the top of the pole plate 420 , and the power-carrying plate 410 passes through the through hole of the placement chamber 110 and is located outside the placement chamber 110 ; the pole plate 420 is disposed on the support 300 .

[0026] Specifically, Figure 1 As shown, the specific structure of the electrochemical reaction plate 400 includes a power-carrying plate 410 and a pole plate 420. The portion that needs to be cleaned is the pole plate 420, so the pole plate 420 is arranged on the support 300, and there is a certain distance between the pole plate 420 and the through hole of the placement chamber 110. The power-carrying plate 410 is the portion that does not need to be cleaned, so the upper portion of the power-carrying plate 410 is arranged outside the placement chamber 110, and the lower portion of the power-carrying plate 410 passes through the through hole of the placement chamber 110 to connect with the pole plate 420.

[0027] In one possible implementation, the aeration mixer 500 includes an air intake main pipe 510 and a plurality of aeration pipes 520; the air intake main pipe 510 passes through one side of the shell 100 and enters the placement chamber 110, and the air intake end of the air intake main pipe 100 is suitable for connecting to an external aeration fan; the aeration pipes 520 are arranged on the air intake main pipe 510, and the opening direction of the aeration pipes 520 corresponds to the support member 300.

[0028] Specifically, the specific structure of the aeration agitator 500 includes an air intake main pipe 510 and a plurality of aeration pipes 520. The number of the air intake main pipes 510 is plural, and each air intake main pipe 510 is provided with a plurality of pipes 520. The size of the overall aeration agitator 500 is the same as the size of the support member 300. This arrangement is intended to generate a large number of bubbles and better clean the electrode plate 420. In order to generate bubbles, the air intake main pipe 510 passes through one side of the shell 100 and enters the placement chamber 110. The air intake end of the air intake main pipe 100 is suitable for connecting to an external aeration fan; and in order to enable the generated bubbles to move upward and fully contact the electrode plate 420 for cleaning, the opening of the aeration pipe 520 is directed toward the setting corresponding to the support member 300.

[0029] In a possible implementation, an overflow port 111 is provided on the opposite side of the connection between the placement chamber 110 and the housing 100 , and the overflow port 111 is located at the connection position between the power plate 410 and the pole plate 420 .

[0030] Specifically, Figure 1 As shown, for overall needs, an overflow port 111 needs to be opened on the placement chamber 110 to facilitate the discharge of water from the placement chamber 110, but the electrode plate 420 needs to be thoroughly cleaned, so the height of the overflow port 111 is located at the connection position between the power plate 410 and the electrode plate 420.

[0031] In a possible implementation, a pH tester 140 and a hardness meter 150 are also included. The pH tester 140 and the hardness meter 150 are both arranged inside the shell 100, and the positions of the pH tester 140 and the hardness meter 150 are not higher than the position of the water outlet 130 of the shell 100.

[0032] Specifically, because the pH of the cleaning liquid will change after multiple cycles of use, new cleaning liquid needs to be added again. In order to be able to intuitively obtain the pH value, a pH tester 140 is set inside the shell 100 to detect the pH value of the cleaning liquid. At the same time, the hardness of the electrode 420 needs to be detected. Both electrochemical reaction plates 400 need to be replaced. Therefore, a hardness meter 150 is also set inside the shell 100 to check the hardness of the electrode 420. The positions of the pH tester 140 and the hardness meter 150 are not higher than the position of the water outlet 130 of the shell 100. This is because if the positions of the pH tester 140 and the hardness meter 150 are higher than the position of the water outlet 130 of the shell 100, the pH value of the cleaning liquid cannot be detected. Moreover, the pH tester 140 and the hardness meter 150 are set side by side so that the pH value of the cleaning liquid and the hardness of the electrode 420 can be observed at the same time.

[0033] In a possible implementation, a display is further included, and the pH tester 140 and the hardness tester 150 are both electrically connected to the display.

[0034] Specifically, in order to facilitate the staff to know the pH value and the hardness value of the electrochemical reaction plate 400, a display is set on the outside of the shell 100, and the pH tester 140 and the hardness meter 150 are electrically connected to the display. The pH tester 140 and the hardness meter 150 transmit the detected pH value and the hardness of the electrochemical reaction plate 400 to the display, so that the display can display the pH value and the hardness value.

[0035] In a possible implementation, the circulating water pump 600 is provided with a first water outlet and a second water outlet, the first water outlet is connected to the placement chamber 110 , and the second water outlet is connected to the outside of the shell 100 .

[0036] Specifically, Figure 1 As shown, the circulating water pump 600 is provided to enable the cleaning liquid to be reused, so the first water outlet end of the circulating water pump 600 is connected to the aeration zone, so that the cleaning liquid re-enters the aeration zone and continues to be aerated and cleaned through the aeration agitator 500. The circulating water pump 600 also serves to drain the water after the cleaning is completed, so the circulating water pump 600 also has a second water outlet end, and the second water outlet end is connected to the outside of the shell 100 to discharge the water to the outside of the shell 100.

[0037] In a possible implementation, the water outlet 130 of the housing 100 is disposed above the circulating water pump 600 and has a preset distance from the circulating water pump 600 .

[0038] Specifically, Figure 1 As shown, the water outlet 130 of the shell 100 is set at a higher position to allow more water to flow into the entire shell 100. The position of the water outlet 130 of the shell 100 determines the overall liquid level. If the liquid level is too low, it is not convenient for the circulating water pump 600 below to operate. The water outlet 130 is set at the upper 1 / 2 position on the right side of the shell 100, which is not lower than the position height of the pH tester 140 and the hardness tester 150.

[0039] In a possible implementation, both the aeration stirrer 500 and the circulating water pump 600 are suitable for connection to an external motor.

[0040] Specifically, the aeration stirrer 500 and the circulating water pump 600 are connected to the outside, and the external motor can provide power to the aeration stirrer 500 and the circulating water pump 600, so that the whole starts to operate and clean.

[0041] In a possible implementation, a separator 700 is also included. Since there are multiple electrochemical reaction plates 400, a certain distance is required between each electrochemical reaction plate 400. The separator 700 can better separate two adjacent electrochemical reaction plates 400 for easy disassembly, replacement and maintenance.

[0042] A method for using an electrochemical reactor cleaning device comprises the following steps: firstly, a cleaning liquid is introduced into a placement chamber 110 through a water inlet 120; after the cleaning liquid can submerge an electrode plate 420 and enter a shell 100 from an overflow port 111 on the right side of the electrode plate 420, an aeration fan is turned on, a large amount of bubbles can be introduced into an aeration stirring device 500, and the electrode plate 420 in the placement chamber 110 is scrubbed; at the same time, a circulating water pump 600 is turned on, so that the cleaning liquid overflowing from the placement chamber 110 into the shell 100 can flow back into the placement chamber 110, and aeration is continued; whether the cleaning liquid needs to be supplemented and the cleaning end point are judged by a pH tester 140 and a hardness tester 150 in the shell 100; finally, the cleaning liquid is discharged through a water outlet on the shell 100 and a circulating water pump 600, and the cleaning liquid is rinsed with clean water before being put into use.

[0043] Specifically, first drain the water after work, then add the cleaning liquid, and the cleaning liquid enters the placement chamber 110 through the water inlet 120. As the cleaning liquid increases, the liquid level of the cleaning liquid becomes higher and higher, and it will overflow through the overflow port of the placement chamber 110 and enter the interior of the shell 100. At this time, power is turned on, and the aeration fan is turned on. A large number of bubbles can be introduced into the aeration stirring device 500 to scrub the plate 420 in the placement chamber 110. At the same time, the circulating water pump 600 is turned on to allow the cleaning liquid overflowing from the placement chamber 110 into the shell 100 to flow back into the placement chamber 110, and aeration is continued. The pH tester 140 and the hardness tester 150 also start testing to determine whether the cleaning liquid needs to be supplemented and the cleaning end point is completed; finally, the water is discharged through the water outlet 130 of the shell 100, and the water is also discharged through the circulating water pump 600, and then rinsed with clean water, and the entire cleaning work is completed.

[0044] When the present invention is used: first, the cleaning liquid is introduced into the placement chamber 110 through the water inlet 120; after the cleaning liquid can submerge the electrode plate 420 and enter the shell 100 from the overflow port 111 on the right side of the electrode plate 420, the aeration fan is turned on, and a large amount of bubbles can be introduced into the aeration stirring device 500 to scrub the electrode plate 420 in the placement chamber 110; at the same time, the circulating water pump 600 is turned on to allow the cleaning liquid overflowing from the placement chamber 110 into the shell 100 to flow back into the placement chamber 110 to continue aeration; the pH tester 140 and the hardness tester 150 in the shell 100 are used to determine whether the cleaning liquid needs to be supplemented and the end point of the cleaning is completed; finally, the cleaning liquid is discharged through the water outlet on the shell 100 and the circulating water pump 600, and the cleaning liquid is rinsed with clean water before being put into use.

[0045] The present application is provided with a shell 100, a baffle plate 200, a support member 300, an electrochemical reaction plate 400, an aeration agitator 500 and a circulating water pump 600. The shell 100 is provided to accommodate the baffle plate 200, the support member 300, the electrochemical reaction plate 400, the aeration agitator 500 and the circulating water pump 600. A plurality of baffle plates 200 cooperate with the shell 100 to enclose a placement chamber 110. In order to provide support for the electrochemical reaction plate 400, a support member 300 is provided. The support member 300 divides the placement chamber 110 into an electrolysis zone and an aeration zone. The aeration agitator 500 is used to generate a large number of bubbles to clean the electrochemical reaction plate 400. In order to enable the generated bubbles to move upward to contact the electrode plate 400, the aeration agitator 500 is used to generate a large number of bubbles to clean the electrochemical reaction plate 400. 20 is fully contacted for cleaning, the opening of the aeration pipe 520 is directed toward the setting corresponding to the support member 300, a pH tester 140 is also arranged inside the shell 100 to detect the pH value of the cleaning liquid, a hardness meter 150 is also arranged inside the shell 100 to check the hardness of the plate 420, and a display 400 is arranged to be able to display the pH value and the hardness value; the present application reduces drug consumption, saves manpower and material resources, improves cleaning efficiency, controls cleaning effect, and solves the problem of disassembling and lifting the plate for chemical cleaning, and then installing the cleaned plate back into the assembly. This off-site cleaning method takes a long time and requires disassembly and assembly. The process is cumbersome, consumes manpower and material resources, and has low cleaning efficiency.

[0046] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical solutions and concepts of the present invention within the scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. An electrochemical reactor cleaning device with automatic cleaning, characterized in that: It includes a shell, a baffle, a support, an electrochemical reaction plate, an aeration agitator and a circulating water pump; The shell is a hollow box structure, and a water inlet and a water outlet are provided on both sides of the shell; The baffle plate is arranged inside the shell, and the baffle plate is provided in a plurality, and the plurality of baffle plates cooperate with the shell to enclose a placement chamber, and the top of the placement chamber is provided with a plurality of through holes, and the placement chamber is suitable for containing a cleaning agent; The support member is arranged in the placement chamber, and a plurality of holes are opened on the support member; The electrochemical reaction plate is arranged in the placement chamber and is located on the support member, and the top of the electrochemical reaction plate passes through the through hole of the placement chamber; The aeration stirrer is arranged in the placement chamber and below the support member, and the aeration stirrer is used to generate a large number of bubbles to scrub the electrochemical reaction plate; The circulating water pump is arranged inside the shell, located at the bottom of one side of the shell, and is used for circulating the cleaning agent in the shell to the inside of the placement chamber.

2. The electrochemical reactor cleaning device with automatic cleaning according to claim 1, characterized in that: The electrochemical reaction plate includes a power-carrying plate and a polar plate; The power-on plate is arranged on the top of the electrode plate, and the power-on plate passes through the through hole of the placement chamber and is located outside the placement chamber; The electrode plate is arranged on the support member.

3. The electrochemical reactor cleaning device with automatic cleaning according to claim 2, characterized in that: The aeration agitator comprises an air intake main pipe and a plurality of aeration pipes; The air intake manifold passes through one side of the shell and enters the placement chamber, and the air intake end of the air intake manifold is suitable for connecting to an external aeration fan; The aeration pipe is arranged on the air intake manifold, and the opening direction of the aeration pipe corresponds to the support member.

4. The electrochemical reactor cleaning device with automatic cleaning according to claim 3, characterized in that: An overflow port is provided on the opposite side of the placement chamber where the placement chamber is connected to the shell, and the overflow port is located at the connection position between the power-carrying plate and the pole plate.

5. An electrochemical reactor cleaning device with automatic cleaning according to any one of claims 1 to 4, characterized in that: It also includes a pH tester and a hardness tester, which are both arranged inside the shell, and the positions of the pH tester and the hardness tester are not higher than the position of the water outlet of the shell.

6. The electrochemical reactor cleaning device with automatic cleaning according to claim 5, characterized in that: It also includes a display, and the pH tester and the hardness tester are both electrically connected to the display.

7. The electrochemical reactor cleaning device with automatic cleaning according to any one of claims 1 to 4, characterized in that: The circulating water pump is provided with a first water outlet and a second water outlet, wherein the first water outlet is connected to the placement chamber, and the second water outlet is connected to the outside of the shell.

8. The electrochemical reactor cleaning device with automatic cleaning according to claim 7, characterized in that: The water outlet of the shell is arranged above the circulating water pump and has a preset distance from the circulating water pump.

9. The electrochemical reactor cleaning device with automatic cleaning according to claim 8, characterized in that: The aeration stirrer and the circulating water pump are both suitable for connection with an external motor.

10. A method for cleaning an electrochemical reactor, characterized in that: Using the electrochemical reactor cleaning device with automatic cleaning according to claims 1 to 9, the electrochemical reaction plate includes a power-on plate and a pole plate, the power-on plate is arranged on the top of the pole plate, and the power-on plate passes through the through hole of the placement chamber and is located outside the placement chamber, and the pole plate is arranged on the support member, comprising the following steps: First, let the cleaning liquid enter the placement chamber through the water inlet; After the cleaning liquid can submerge the plates and enter the shell from the overflow port on the right side of the plates, turn on the aeration fan, and a large amount of bubbles can be introduced into the aeration stirring device to scrub the plates in the chamber; At the same time, the circulating water pump is turned on to allow the cleaning liquid overflowing from the placement chamber into the shell to flow back into the placement chamber to continue aeration; The pH tester and hardness tester in the shell are used to determine whether the cleaning solution needs to be replenished and the cleaning completion point; Finally, the cleaning liquid is discharged through the water outlet on the shell and the circulating water pump, and the machine is rinsed with clean water before being put into use.

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