A gas phase deposition fluidized bed for continuous preparation of reactants

Abstract

The present invention discloses a gas phase deposition fluidized bed for continuously preparing reactants, comprising two groups of deposition boxes and one group of coating boxes, and the two groups of the deposition boxes are arranged on both sides of the coating box, air inlet pipes are installed at both ends of the top of the deposition box, a first discharge pipe with a valve is installed at the bottom of the deposition box, a gas mixing mechanism is arranged at the inner upper end of the deposition box, and a deposition mechanism is arranged at the inner lower end of the deposition box. The present invention can drive the fan blades to rotate by high-speed gas injection through the air inlet pipe, thereby driving the rotation of the first rotating rod. During the rotation process, the first rotating rod controls the first stirring frame to stir and mix the gas inside the stirring chamber, and when the first rotating rod rotates to drive the gas flow, it also drives the second rotating rod to rotate, thereby causing the second stirring frame to stir, further enhancing the stirring and mixing effect, realizing the function of non-powered control of the rotation of the first rotating rod, saving energy, and reducing costs.

Description

Technical Field

[0001] The invention relates to the technical field of vapor deposition fluidized beds, in particular to a vapor deposition fluidized bed for continuously preparing reactants. Background Art

[0002] Vapor deposition technology is a technology that uses physical and chemical processes occurring in the gas phase to change the surface composition of the workpiece and form a metal or compound coating with special properties on the surface. Vapor deposition is one of the technologies for mold surface strengthening and has been widely used in surface hardening treatment of various molds.

[0003] The production process of silicon-carbon negative electrode materials is divided into two parts, namely silicon deposition and carbon coating. The product produced by silicon deposition needs to be carbon-coated. However, the silicon deposition process generally takes 4-6 hours, while the carbon coating stage generally takes 2 hours. The time difference will greatly reduce the overall efficiency and make it impossible to continuously prepare reactants.

[0004] Therefore, it is necessary to provide a vapor deposition fluidized bed for continuously preparing reactants to solve the above technical problems. Summary of the invention

[0005] The purpose of the present invention is to provide a vapor deposition fluidized bed for continuously preparing reactants to solve the problems existing in the above-mentioned background technology. The technical solution of the present invention provides a solution that is significantly different from the prior art in order to solve the technical problem that the prior art solution is too single.

[0006] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a gas phase deposition fluidized bed for continuously preparing reactants, comprising two groups of deposition boxes and one group of coating boxes, and the two groups of deposition boxes are arranged on both sides of the coating box, air inlet pipes are installed at both ends of the top of the deposition box, a first discharge pipe with a valve is installed at the bottom of the deposition box, a gas mixing mechanism is provided at the inner upper end of the deposition box, a deposition mechanism is provided at the inner lower end of the deposition box, a coating mechanism is provided on the inner side of the coating box, and a second discharge pipe with a valve is installed at the bottom center of the coating box.

[0007] Preferably, the deposition box is composed of a stirring chamber and a deposition chamber, and the stirring chamber is arranged at the top of the deposition chamber, and the gas mixing mechanism includes a first rotating rod rotatably connected to the inner center of the stirring chamber, and the outer wall of the first rotating rod is equidistantly installed with a first stirring frame from top to bottom, and the center of the first stirring frame adjacent to the upper and lower parts is rotatably connected with a second rotating rod, and the outer wall of the second rotating rod is equidistantly installed with a second stirring frame.

[0008] Preferably, a fixing sleeve is sleeved on the top of the outer wall of the first rotating rod, and fan blades are mounted at equal angles on the outer wall of the fixing sleeve.

[0009] Preferably, first one-way pipes penetrating into the inner side of the deposition chamber are installed at both ends of the bottom of the stirring chamber, the deposition mechanism includes a partition plate arranged at the inner center of the deposition chamber, a second one-way pipe is penetrating into the inner center of the partition plate, a grid plate is arranged at the inner bottom of the deposition chamber, and a transport pipe penetrating into the inner side of the coating box is installed at the bottom of the first discharge pipe.

[0010] Preferably, the coating box is composed of a reaction chamber and a recovery chamber, and the recovery chamber is arranged at the top of the reaction chamber, the coating mechanism includes a heating tube installed on the inside of the reaction chamber, a circular plate is installed on the inner bottom of the recovery chamber, and the top of the circular plate is penetrated by a through hole with a gradually increasing diameter, filter plates are equidistantly arranged on the inner top of the recovery chamber, a fan is arranged on the top of the recovery chamber, the bottom of the fan is connected to a connecting pipe that penetrates to the inside of the recovery chamber, the top of the fan is connected to an arc pipe, the end of the arc pipe is connected to a tee fixed at the outer bottom of the reaction chamber, and one end of the tee is connected to a conveying pipe.

[0011] Preferably, the upper and lower ends of the heating tube are in a truncated cone structure, and the through hole is in a symmetrical structure with the inner bottom of the recovery chamber.

[0012] Preferably, the top of the circular plate is penetrated at an equal angle to an arc-shaped channel inside the through hole.

[0013] Preferably, a connecting pipe whose opening and closing is controlled by a solenoid valve is installed at one end of the coating box, and a collecting box is installed at the front end surface of the coating box.

[0014] Compared with the prior art, the present invention has the following beneficial effects: The present invention can drive the fan blades to rotate by injecting gas at high speed through the inlet pipe, thereby driving the first rotating rod to rotate. During the rotation process, the first rotating rod controls the first stirring frame to stir and mix the gas in the stirring chamber. When the first rotating rod drives the gas flow during the rotation process, it also drives the second rotating rod to rotate, thereby causing the second stirring frame to stir, further enhancing the stirring and mixing effect, realizing the function of controlling the rotation of the first rotating rod without power, saving energy, and reducing costs. The catalyst is placed inside the grid plate provided in the present invention, and then the stirred and mixed gas is continuously transported to the top of the partition plate through the first one-way pipe for accumulation, and then enters the bottom of the partition plate through the second one-way pipe to contact with the catalyst for reaction to generate products. When the mixed gas completely enters the interior of the deposition box, an inert gas is introduced behind to squeeze the mixed gas to the bottom of the partition plate for reaction, and then enters the coating box through the first discharge pipe for coating. In addition, by providing two groups of deposition boxes, the product deposited in each deposition box can be reduced, thereby shortening the reaction time, making the deposition time and the coating time close to each other, and then the products generated by the two groups of deposition boxes are transported together to the coating box for coating, and the next group of deposition is carried out synchronously during the coating process. After the deposition is completed, the coating work is just completed and the next group of coating is carried out. The reciprocating use realizes continuous production and improves work efficiency. In the present invention, when the products generated by the two deposition boxes are transported to the interior of the coating box, the reaction gas is intermittently blown in through the conveying pipe, and then the gas will blow the products upward, and the products will enter the heating tube for transportation. The temperature inside the heating tube is relatively high, and the reaction gas will react to generate carbon coating on the surface of the product. Then, when the product is blown to the inside of the through hole, the space increases instantly, and the force exerted on the product decreases. The coated product will fall to the bottom, and the uncoated product will enter the inside of the recovery chamber. Then, the filter plate is arranged to adsorb impurities in the gas, and the product will fall again. Then, the fan is arranged to transport the unreacted reaction gas through the arc pipe to the bottom of the coating box for recycling. The repeated work makes the surface of the product completely coated. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 A perspective view of the present invention; Figure 2 It is a front view structural schematic diagram of the present invention; Figure 3 is a three-dimensional cross-sectional view of a sedimentation box of the present invention; Figure 4 is a three-dimensional diagram of the gas mixing mechanism of the present invention; Figure 5 It is a three-dimensional cross-sectional view of the coating box of the present invention.

[0016] In the figure: 1. deposition box; 2. coating box; 3. air inlet pipe; 4. first discharge pipe; 5. gas mixing mechanism; 501. first rotating rod; 502. first stirring frame; 503. second rotating rod; 504. second stirring frame; 6. deposition mechanism; 601. partition plate; 602. second one-way pipe; 603. grid plate; 604. transport pipe; 7. coating mechanism; 701. heating pipe; 702. circular plate; 703. through hole; 704. filter plate; 705. fan; 706. connecting pipe; 707. arc pipe; 708. tee; 709. transport pipe; 8. second discharge pipe; 9. fixing sleeve; 10. fan blade; 11. first one-way pipe; 12. arc channel; 13. connecting pipe; 14. collecting box. DETAILED DESCRIPTION

[0017] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0018] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inside", "outside" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings, which are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", and "third" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance. In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", and "set" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be directly connected, or indirectly connected through an intermediate medium, or it can be the internal connection of two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances. The following is an explanation of an embodiment of the present invention based on the overall structure of the present invention.

[0019] Please refer to the figure, a gas phase deposition fluidized bed for continuously preparing reactants includes two groups of deposition boxes 1 and one group of coating boxes 2, and the two groups of deposition boxes 1 are arranged on both sides of the coating box 2, air inlet pipes 3 are installed at both ends of the top of the deposition box 1, a first discharge pipe 4 with a valve is installed at the bottom of the deposition box 1, a gas mixing mechanism 5 is installed at the upper end of the inner side of the deposition box 1, a deposition mechanism 6 is installed at the lower end of the inner side of the deposition box 1, a coating mechanism 7 is installed on the inner side of the coating box 2, and a second discharge pipe 8 with a valve is installed at the bottom center of the coating box 2.

[0020] As shown in the figure, the deposition box 1 is composed of a stirring chamber and a deposition chamber, and the stirring chamber is arranged on the top of the deposition chamber, and the gas mixing mechanism 5 includes a first rotating rod 501 rotatably connected to the inner center of the stirring chamber, and the outer wall of the first rotating rod 501 is equidistantly installed with first stirring frames 502 from top to bottom, and the centers of the upper and lower adjacent first stirring frames 502 are rotatably connected with second rotating rods 503, and the outer walls of the second rotating rods 503 are equidistantly arranged with second stirring frames 504. The arranged first rotating rod 501 controls the first stirring frame 502 to stir and mix the gas inside the stirring chamber during the rotation process, and when the first rotating rod 501 rotates to drive the gas flow, it will also drive the second rotating rod 503 to rotate, thereby causing the second stirring frame 504 to stir, thereby further enhancing the stirring and mixing effect.

[0021] As shown in the figure, a fixed sleeve 9 is sleeved on the top of the outer wall of the first rotating rod 501, and fan blades 10 are installed at equal angles on the outer wall of the fixed sleeve 9. The fan blades 10 can be driven to rotate by high-speed gas injection through the set air intake pipe 3, thereby driving the rotation of the first rotating rod 501, realizing the function of non-powered control of the rotation of the first rotating rod 501, saving energy and reducing costs.

[0022] As shown in the figure, the first one-way pipes 11 that penetrate into the inside of the deposition chamber are installed at both ends of the bottom of the stirring chamber, the deposition mechanism 6 includes a partition plate 601 arranged at the inner center of the deposition chamber, and the inner center of the partition plate 601 is penetrated by a second one-way pipe 602, and the inner bottom of the deposition chamber is provided with a mesh plate 603, and the bottom of the first discharge pipe 4 is provided with a transport pipe 604 that penetrates into the inner side of the coating box 2, and a catalyst is placed inside the grid plate 603, and then the stirred mixed gas will be continuously transported to the top of the partition plate 601 through the first one-way pipe 11 for accumulation, and then enter the bottom of the partition plate 601 through the second one-way pipe 602 to contact with the catalyst to react and generate products, when the mixed gas completely enters the interior of the deposition box 1, an inert gas is introduced behind to squeeze the mixed gas to the bottom of the partition plate 601 for reaction, and then enter the coating box 2 through the first discharge pipe 4 for coating.

[0023] As shown in the figure, the coating box 2 is composed of a reaction chamber and a recovery chamber, and the recovery chamber is arranged at the top of the reaction chamber, the coating mechanism 7 includes a heating tube 701 installed inside the reaction chamber, a circular plate 702 is installed at the inner bottom of the recovery chamber, and a through hole 703 with a gradually increasing diameter is opened on the top of the circular plate 702, filter plates 704 are equidistantly arranged on the inner top of the recovery chamber, a fan 705 is arranged on the top of the recovery chamber, the bottom of the fan 705 is connected to a connecting pipe 706 that penetrates to the inner side of the recovery chamber, the top of the fan 705 is connected to an arc pipe 707, the end of the arc pipe 707 is connected to a tee 708 fixed at the bottom of the outer side of the reaction chamber, and one end of the tee 708 is connected to a conveying pipe 709. When the products generated by the two deposition boxes 1 are transported When it reaches the inside of the coating box 2, the reaction gas is intermittently blown in through the conveying pipe 709, and then the gas will blow the product upwards, and the product will enter the heating tube 701 for transportation. The temperature inside the heating tube 701 is relatively high, and the reaction gas will react to generate carbon coated on the surface of the product. Then when the product is blown to the inside of the through hole 703, the space increases instantly, and the force on the product decreases. The coated product will fall to the bottom, and the uncoated product will enter the inside of the recovery chamber. Then the filter plate 704 is set to adsorb impurities in the gas, and the product will fall again. Then the fan 705 is set to transport the unreacted reaction gas through the arc pipe 707 to the bottom of the coating box 2 for recycling. The repeated work makes the surface of the product completely coated.

[0024] As shown in the figure, the upper and lower ends of the heating tube 701 are in a truncated cone structure, and the through hole 703 is symmetrical with the inner bottom of the recovery chamber. The upper and lower ends of the heating tube 701 are in a truncated cone structure to facilitate the transportation of the product.

[0025] As shown in the figure, the top of the circular plate 702 is penetrated at an equal angle to the arc-shaped channel 12 inside the through hole 703. The arc-shaped channel 12 is provided to facilitate the recovery of the product.

[0026] As shown in the figure, a connecting pipe 13 whose opening and closing is controlled by a solenoid valve is installed at one end of the coating box 2, and a collecting box 14 is installed on the front end face of the coating box 2. After the coating is completed, inert gas is input through the connecting pipe 13 to squeeze the remaining reaction gas into the collecting box 14 for recovery.

[0027] Working principle: When in use, the fan blades 10 can be driven to rotate by high-speed gas injection through the inlet pipe 3, thereby driving the first rotating rod 501 to rotate. During the rotation process, the first rotating rod 501 controls the first stirring frame 502 to stir and mix the gas inside the stirring chamber. When the first rotating rod 501 rotates to drive the gas flow, it will also drive the second rotating rod 503 to rotate, thereby causing the second stirring frame 504 to stir, further enhancing the stirring and mixing effect, realizing the non-powered control of the rotation of the first rotating rod 501, saving energy and reducing costs. Function, a catalyst is placed inside the grid plate 603, and then the stirred mixed gas will be continuously transported to the top of the partition plate 601 through the first one-way pipe 11 for accumulation, and then enter the bottom of the partition plate 601 through the second one-way pipe 602 to contact with the catalyst to react and generate products. When the mixed gas completely enters the interior of the deposition box 1, an inert gas is introduced behind to squeeze the mixed gas to the bottom of the partition plate 601 for reaction, and then enter the coating box 2 through the first discharge pipe 4 for coating, and by providing two sets of deposition boxes, the deposition rate of each deposition box can be reduced. The products of the two deposition boxes 1 are transported to the coating box 2, thereby reducing the reaction time and making the deposition time close to the coating time. The products produced by the two deposition boxes are then transported together to the coating box for coating. During the coating process, the next deposition is carried out simultaneously. After the deposition is completed, the coating work is just completed and the next coating is carried out. The reciprocating use realizes continuous production and improves work efficiency. When the products produced by the two deposition boxes 1 are transported to the coating box 2, the reaction gas is intermittently blown in through the conveying pipe 709, and then the gas will blow the products upward, and the products will enter the heating tube 701 for During transportation, the temperature inside the heating tube 701 is relatively high, and the reaction gas will react to generate carbon coating on the surface of the product. When the product is blown to the inside of the through hole 703, the space will increase instantly, and the force on the product will decrease. The coated product will fall to the bottom, and the uncoated product will enter the inside of the recovery chamber. Then the filter plate 704 will adsorb the impurities in the gas, and the product will fall again. Then the fan 705 will transport the unreacted reaction gas to the bottom of the coating box 2 through the arc pipe 707 for recycling. The repeated operation will completely coat the surface of the product.

[0028] It will be apparent to those skilled in the art that the invention is not limited to the details of the exemplary embodiments described above and that the invention can be implemented in other specific forms without departing from the spirit or essential features of the invention. Therefore, the embodiments should be considered exemplary and non-limiting in all respects, and the scope of the invention is defined by the appended claims rather than the foregoing description, and it is intended that all variations falling within the meaning and scope of the equivalent elements of the claims be included in the invention. Any reference numeral in a claim should not be considered as limiting the claim to which it relates.

Claims

1. A gas phase deposition fluidized bed for continuously preparing reactants, comprising two groups of deposition boxes (1) and one group of coating boxes (2), wherein the two groups of deposition boxes (1) are arranged on both sides of the coating box (2), characterized in that: Air inlet pipes (3) are installed at both ends of the top of the sedimentation box (1), a first discharge pipe (4) with a valve is installed at the bottom of the sedimentation box (1), a gas mixing mechanism (5) is provided at the inner upper end of the sedimentation box (1), a sedimentation mechanism (6) is provided at the inner lower end of the sedimentation box (1), a coating mechanism (7) is provided on the inner side of the coating box (2), and a second discharge pipe (8) with a valve is installed at the bottom center of the coating box (2).

2. A vapor deposition fluidized bed for continuously preparing reactants according to claim 1, characterized in that: The deposition box (1) is composed of a stirring chamber and a deposition chamber, and the stirring chamber is arranged at the top of the deposition chamber. The gas mixing mechanism (5) includes a first rotating rod (501) rotatably connected to the center of the inner side of the stirring chamber, and the outer wall of the first rotating rod (501) is equidistantly installed with first stirring frames (502) from top to bottom, and the center of the first stirring frames (502) adjacent to each other above and below are rotatably connected with second rotating rods (503), and the outer wall of the second rotating rod (503) is equidistantly installed with second stirring frames (504).

3. A vapor deposition fluidized bed for continuously preparing reactants according to claim 2, characterized in that: A fixing sleeve (9) is sleeved on the top of the outer wall of the first rotating rod (501), and fan blades (10) are mounted at equal angles on the outer wall of the fixing sleeve (9).

4. A vapor deposition fluidized bed for continuously preparing reactants according to claim 2, characterized in that: The two ends of the bottom of the stirring chamber are provided with a first one-way pipe (11) penetrating into the inner side of the deposition chamber. The deposition mechanism (6) comprises a partition plate (601) arranged at the inner center of the deposition chamber. A second one-way pipe (602) is penetrating through the inner center of the partition plate (601). A grid plate (603) is provided at the inner bottom of the deposition chamber. A transport pipe (604) penetrating into the inner side of the coating box (2) is provided at the bottom of the first discharge pipe (4).

5. A vapor deposition fluidized bed for continuously preparing reactants according to claim 1, characterized in that: The coating box (2) is composed of a reaction chamber and a recovery chamber, and the recovery chamber is arranged at the top of the reaction chamber. The coating mechanism (7) includes a heating tube (701) installed inside the reaction chamber. A circular plate (702) is installed at the bottom of the inner side of the recovery chamber, and a through hole (703) with a gradually increasing diameter is opened through the top of the circular plate (702). Filter plates (704) are equidistantly arranged at the top of the inner side of the recovery chamber. A fan (705) is arranged at the top of the recovery chamber. The bottom of the fan (705) is connected to a connecting pipe (706) that penetrates to the inside of the recovery chamber. The top of the fan (705) is connected to an arc-shaped pipe (707). The end of the arc-shaped pipe (707) is connected to a tee (708) fixed at the bottom of the outer side of the reaction chamber. One end of the tee (708) is connected to a conveying pipe (709).

6. A vapor deposition fluidized bed for continuously preparing reactants according to claim 5, characterized in that: The upper and lower ends of the heating tube (701) are in a truncated cone structure, and the through hole (703) is in a symmetrical structure with the inner bottom of the recovery chamber.

7. A vapor deposition fluidized bed for continuously preparing reactants according to claim 5, characterized in that: The top of the circular plate (702) is penetrated at an equal angle to an arc-shaped channel (12) inside the through hole (703).

8. A vapor deposition fluidized bed for continuously preparing reactants according to claim 1, characterized in that: A connecting pipe (13) whose opening and closing is controlled by a solenoid valve is installed at one end of the coating box (2), and a collecting box (14) is installed at the front end surface of the coating box (2).

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