High-corrosion-resistance wear-resistant hard amorphous multilayer coating and preparation method thereof

Abstract

The invention discloses a hard amorphous multilayer coating with high corrosion resistance and wear resistance and a preparation method of the hard amorphous multilayer coating. The amorphous multilayer coating comprises a CrAl transition layer, the CrAl transition layer is deposited on the substrate, the CrN / CrAlN amorphous main body layer is deposited on the CrAl transition layer, the CrN / CrAlN amorphous main body layer is formed by alternately depositing CrN layers and CrAlN layers, and the CrN layers and the CrAlN layers are both of an amorphous structure. The amorphous multilayer coating provided by the invention has excellent corrosion resistance and high wear resistance, and also has good toughness and good bonding strength with a matrix, and the preparation process is simple to operate and easy for industrial production.

Description

Technical Field

[0001] The present invention belongs to the technical field of hard protective coatings, and in particular relates to a highly corrosion-resistant, wear-resistant, hard amorphous multilayer coating and a preparation method thereof. Background Art

[0002] With the rapid development of shipping and shipping, strengthening the surface of marine equipment through surface engineering technology is an effective way to improve its wear resistance and corrosion resistance. In recent years, CrN coating has become a potential protective coating for marine equipment due to its high hardness and excellent corrosion resistance. However, CrN coating usually grows in a columnar manner during the deposition process to form coarse columnar crystals, which seriously affects the density of the coating, causing the corrosive liquid to easily invade the coating, making the protection ineffective. In addition, the excessively high friction coefficient is also the main factor limiting the application of CrN as a wear-resistant protective coating. Regulation through doping and multilayer structure is an important direction for the development of high-performance protective coatings. Aluminum (Al) is the most common doping element, which is used to optimize the microstructure of CrN coating and improve its corrosion resistance. Aluminum spontaneously combines with oxygen in the air to form a dense oxide layer, which prevents further oxidation and corrosion of the coating. However, aluminum is soft and has poor wear resistance. The doping of aluminum in the coating cannot significantly improve the friction and wear properties of the CrN coating.

[0003] Multilayer structure regulation is a technical means to form a multilayer coating by alternately depositing different types of materials. It can combine the performance advantages of different materials, use the multilayer interface to simulate the expansion of cracks, prevent stress concentration, and achieve the simultaneous improvement of the mechanical properties and tribological properties of the coating. At present, CrN-based multilayer coatings have appeared CrN / ZrYN, CrN / CrNiN, CrAlN / TiAlN and other types of coatings. For example, patent CN2024101224253 A CrN / ZrYN nano-multilayer film coating and its preparation method discloses a CrN / ZrYN nano-multilayer film coating, and the prepared multilayer coating has both high hardness and high toughness. Patent CN201811108258.8 CrN / CrNiN nano-multilayer coating and its preparation method, nano-multilayer coating and its preparation method and application The prepared CrN / CrNiN nano-multilayer coating has the characteristics of good toughness, low surface roughness, and good corrosion resistance. Compared with a single-layer coating, the structure of a multilayer coating can improve the tribological and corrosion resistance of the coating. However, the existing technologies for CrN-based multilayer coatings are all crystalline structures, and the columnar growth mode of the coatings has not been significantly optimized. There are still deficiencies in actual use, and the corrosion resistance and friction and wear performance of the coatings still have room for improvement. Therefore, it is necessary to improve the existing coatings. Summary of the invention

[0004] In order to solve the above technical problems, the purpose of the present invention is to provide a highly corrosion-resistant, wear-resistant, hard amorphous multilayer coating and a preparation method thereof. The amorphous multilayer coating has excellent corrosion resistance and high wear resistance, as well as good toughness and good bonding strength with the substrate. The preparation process is simple to operate and is easy for industrial production.

[0005] In order to achieve the above-mentioned invention object, the technical solution adopted by the present invention is as follows:

[0006] In a first aspect of the present invention, the present invention provides a highly corrosion-resistant, wear-resistant and hard amorphous multilayer coating, comprising:

[0007] CrAl transition layer;

[0008] A CrN / CrAlN amorphous main layer is deposited on the CrAl transition layer, wherein the CrN / CrAlN amorphous main layer is formed by alternately depositing CrN layers and CrAlN layers, and both the CrN layer and the CrAlN layer are of an amorphous structure.

[0009] Preferably, in the CrN / CrAlN amorphous main layer, the innermost layer is a CrN layer, and the outermost layer is a CrAlN layer.

[0010] Preferably, the thickness of the CrN layer is 5 to 20 nm, and the thickness of the CrAlN layer is 10 to 30 nm.

[0011] Preferably, the number of the CrN layer is greater than or equal to one layer, and the number of the CrAlN layer is greater than or equal to one layer.

[0012] More preferably, the number of layers of the CrN layer and the CrAlN layer is the same.

[0013] Preferably, the total number of layers of the CrN / CrAlN amorphous main layer is 40 to 80 layers, and the total thickness of the CrN / CrAlN amorphous main layer is 1.5 to 3.0 μm.

[0014] Preferably, the CrAl transition layer is a crystalline structure or an amorphous structure, and the thickness of the CrAl transition layer is 300-500 nm.

[0015] In a second aspect of the present invention, the present invention provides a method for preparing a highly corrosion-resistant, wear-resistant and hard amorphous multilayer coating, wherein the amorphous multilayer coating is deposited on a substrate as follows:

[0016] (1) Cleaning the substrate: The polished substrate is cleaned by ultrasonic cleaning and then glow cleaning;

[0017] (2) Deposition of CrAl transition layer: In an argon atmosphere, a CrAl transition layer is deposited on the substrate by sputtering a CrAl target;

[0018] (3) Deposition of CrN / CrAlN amorphous main layer: In a mixed atmosphere of argon and nitrogen, firstly, a CrN layer is deposited by sputtering a Cr target, and then a CrAlN layer is deposited by sputtering a CrAl target; CrN layers and CrAl targets are alternately deposited to form a CrN / CrAlN amorphous main layer.

[0019] Preferably, in step (2), the deposition conditions are as follows: a vacuum degree of 0.5 to 1.0 Pa, an argon gas flow rate of 15 to 40 sccm, a substrate bias voltage of 40 to 80 V, a DC magnetron sputtering power supply is used to sputter the CrAl target, a target power of 120 to 180 W, and a deposition time of 10 to 30 minutes.

[0020] Preferably, in step (3), the deposition conditions are as follows: the vacuum degree is 0.5-1.0 Pa, the argon flow rate is 10-20 sccm, the nitrogen flow rate is 8-15 sccm, and in the mixed atmosphere of argon and nitrogen, the substrate bias is adjusted to 40-80 V, and the Cr target is firstly sputtered by using the first DC magnetron sputtering power supply; then the first DC magnetron sputtering power supply is turned off, and the CrAl target is sputtered by using the second DC magnetron sputtering power supply; and the deposition is repeated multiple times in this way to finally obtain the CrN / CrAlN amorphous main layer.

[0021] More preferably, in step (3), the target power of sputtering the Cr target is 120-180 W, and the sputtering time is 20-80 s; the target power of sputtering the CrAl target is 120-180 W, and the sputtering time is 20-80 s.

[0022] More preferably, in step (3), the total deposition time is 100 to 200 minutes.

[0023] Beneficial effects:

[0024] The CrAl transition layer of the present invention can effectively connect the substrate and the CrN / CrAlN amorphous main layer, reduce the internal stress of the system, and make the amorphous multilayer coating stably deposited on the substrate. The CrN and CrAlN layers in the CrN / CrAlN amorphous main layer are both amorphous structures, with dense microstructures and no obvious defects, which can greatly hinder the invasion of corrosive liquids. The amorphous CrN layer and the amorphous CrAlN layer are alternately deposited to form a nano multilayer structure. Due to the obstruction of the multilayer interface, the mechanical properties and friction properties of the coating as a whole can be significantly improved, and a high-hardness and high-wear-resistant coating can be obtained. The amorphous multilayer coating prepared by the present invention can be applied to substrates such as metals, hard alloys and ceramics, is easy to industrialize, and provides a new idea for the anti-corrosion problem of marine ships. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 Shown is a schematic diagram of an amorphous multilayer coating, where Figure 1(a) is the cross-sectional structure of the amorphous multilayer coating. Figure 1 (b) is the corresponding high-magnification transmission electron microscopy image. DETAILED DESCRIPTION

[0026] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the specific implementation methods of the present invention will be described below with reference to the accompanying drawings. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings and other implementation methods can be obtained based on these drawings without creative work.

[0027] The present invention provides a highly corrosion-resistant, wear-resistant and hard amorphous multilayer coating, a CrAl transition layer and a CrN / CrAlN amorphous main layer, wherein the CrAl transition layer is used to be deposited on a substrate, and the CrN / CrAlN amorphous main layer is deposited on the CrAl transition layer, and the CrN layer and the CrAlN layer are formed by alternately depositing.

[0028] In the present invention, the CrN layer and the CrAlN layer in the CrN / CrAlN amorphous main layer are both amorphous structures, with dense microstructures and no obvious defects, and can effectively hinder the invasion of corrosive liquid. The amorphous CrN layer and the amorphous CrAlN layer are alternately deposited to form a nano multilayer structure, and there is a multilayer interface barrier in the CrN / CrAlN amorphous main layer, which significantly improves the mechanical properties and friction properties of the coating.

[0029] In the present invention, the CrAl transition layer is deposited on the substrate, the substrate includes any one or more of metal, cemented carbide and ceramic, the CrAl transition layer plays the role of connecting the substrate and the CrN / CrAlN amorphous main layer, reducing the internal stress of the coating system, so that the CrN / CrAlN amorphous main layer can be stably deposited on the substrate. Preferably, the CrN layer in the CrN / CrAlN amorphous main layer is first deposited on the CrAl transition layer, the outermost layer of the CrN / CrAlN amorphous main layer is the CrAlN layer, and the layer containing aluminum elements is the outermost layer, which plays an anti-corrosion role.

[0030] The CrAl transition layer may be a crystalline structure or an amorphous structure. In the present invention, the thickness of the CrAl transition layer is 300-500 nm.

[0031] In the CrN / CrAlN amorphous main layer, the number of CrN layers is greater than or equal to one layer, the thickness of the CrN layer is 5-20nm, the number of CrAlN layers is greater than or equal to one layer, the thickness of the CrAlN layer is 10-30nm. Preferably, the number of CrN layers is the same as that of CrAlN layers.

[0032] Preferably, the total number of layers of the CrN / CrAlN amorphous main layer is 40 to 80. More preferably, the total thickness of the CrN / CrAlN amorphous main layer is 1.5 to 3.0 μm.

[0033] The present invention also provides a method for preparing a highly corrosion-resistant, wear-resistant and hard amorphous multilayer coating, which effectively controls the coating thickness through DC magnetron sputtering. The specific steps of the preparation method of the present invention are as follows:

[0034] (1) Cleaning the substrate: The polished substrate is cleaned by ultrasonic cleaning and then glow cleaning.

[0035] For example, the polished substrate is placed in an ultrasonic cleaning machine and cleaned in anhydrous ethanol and acetone using 10-30kHz ultrasonic waves for 20-40 minutes; the cleaned substrate is then placed in a multifunctional coating device for glow cleaning. The specific operation is as follows: the substrate is placed in a vacuum chamber and then vacuumed to less than 5.0×10 -4 Pa, introduce argon gas and maintain the vacuum degree at 0.5-1.0 Pa, the argon flow rate at 30-50 sccm, and at the same time adjust the substrate bias voltage to 140-180 V, turn on the ion source and sputter the substrate for 20-30 minutes.

[0036] (2) Deposition of CrAl transition layer: In an argon atmosphere, a CrAl transition layer is deposited on the substrate by sputtering a CrAl target.

[0037] Specifically, the deposition conditions of step (2) are as follows: a vacuum degree of 0.5 to 1.0 Pa, an argon gas flow rate of 15 to 40 sccm, a substrate bias voltage of 40 to 80 V, a DC magnetron sputtering power supply for sputtering the CrAl target, a target power of 120 to 180 W, and a deposition time of 10 to 30 minutes.

[0038] (3) Deposition of CrN / CrAlN amorphous main layer: In a mixed atmosphere of argon and nitrogen, firstly, a CrN layer is deposited by sputtering a Cr target, and then a CrAlN layer is deposited by sputtering a CrAl target; CrN layers and CrAl targets are alternately deposited to form a CrN / CrAlN amorphous main layer.

[0039] Specifically, the deposition conditions of step (3) are as follows: the vacuum degree is 0.5-1.0 Pa, the argon flow rate is 10-20 sccm, the nitrogen flow rate is 8-15 sccm, and in the mixed atmosphere of argon and nitrogen, the substrate bias is adjusted to 40-80 V, and the Cr target is firstly sputtered by using a first DC magnetron sputtering power supply; then the first DC magnetron sputtering power supply is turned off, and the CrAl target is sputtered by using a second DC magnetron sputtering power supply; and the deposition is repeated multiple times in this way to finally obtain a CrN / CrAlN amorphous multilayer coating.

[0040] Preferably, in step (3), the target power of sputtering the Cr target is 120-180 W, and the sputtering time is 20-80 s.

[0041] Preferably, in step (3), the target power of sputtering the CrAl target is 120-180 W, and the sputtering time is 20-80 s.

[0042] Preferably, in step (3), the total deposition time is 100 to 200 minutes.

[0043] In step (2) and step (3), the CrAl target material is composed of two elements, Cr and Al, wherein the atomic ratio of Cr to Al is 1: 1. In step (3), the purity of the Cr target is 99.99%.

[0044] It is easy to understand that the equipment used in the preparation process of the present invention is a multifunctional coating equipment, which is a conventional physical vapor deposition equipment. For example, the equipment mainly includes a vacuum chamber, a turntable, an ion source, a first DC magnetron sputtering power supply, a second DC magnetron sputtering power supply, a bias power supply, a mechanical pump, and a molecular pump, wherein the ion source, the first DC magnetron sputtering power supply and the second DC magnetron sputtering power supply are evenly arranged in the vacuum chamber, and the turntable can rotate at a uniform speed in the vacuum chamber.

[0045] The technical solution of the present invention is described in detail below with specific embodiments.

[0046] Example 1

[0047] (1) Cleaning the substrate: Place the polished stainless steel substrate in anhydrous ethanol and acetone for ultrasonic cleaning for 30 minutes at an ultrasonic power of 20kHz. After drying, install the cleaned sample on the rotating rack of the vacuum chamber, close the door of the vacuum chamber, and perform vacuum pumping. Wait until the mechanical pump and molecular pump have drawn the vacuum degree to 5.0×10 -4 When the pressure is below Pa, argon gas is introduced, the gas flow rate is set to 30 sccm, and the vacuum baffle is adjusted to maintain the vacuum degree at 0.5 Pa. At the same time, the substrate bias is set to 160 V, and the ion source is turned on to glow clean the substrate for 20 minutes.

[0048] (2) Deposition of CrAl transition layer: After the glow cleaning is completed, the ion source is turned off, the argon flow rate is set to 20 sccm, and the vacuum degree is maintained at 0.5 Pa by adjusting the vacuum baffle. At the same time, the substrate bias is set to 60 V, and the second DC magnetron sputtering power supply is turned on to deposit the CrAl transition layer. The sputtering power is 150 W and the deposition time is 20 minutes.

[0049] (3) Deposition of CrN / CrAlN amorphous main layer: After the deposition of the CrAl transition layer is completed, the second DC magnetron sputtering power supply is turned off, nitrogen is introduced, and the flow rate is set to 12sccm. At the same time, the argon flow rate is adjusted to 16sccm, and the vacuum baffle is adjusted to keep the vacuum degree at 0.5Pa. The substrate bias is kept at 60V, and the first DC magnetron sputtering power supply is turned on to sputter the Cr target to deposit the CrN layer. The sputtering power is 150W and the deposition time is 60s. Subsequently, the first DC magnetron sputtering power supply is turned off, and the second DC magnetron sputtering power supply is turned on. The other parameters remain unchanged, and the CrAlN layer is deposited. The sputtering power is 150W and the deposition time is 60s. After repeating the deposition of CrN and CrAlN layers 60 times, the CrN / CrAlN amorphous main layer is obtained, and the deposition system is turned off and cooled naturally to room temperature to finally obtain an amorphous multilayer coating.

[0050] The amorphous multilayer coating prepared in Example 1 is as follows Figure 1 As shown, Figure 1 (a) is the cross-sectional structure of the amorphous multilayer coating. The total thickness of the coating is 2.0 μm. The black part at the bottom is the stainless steel substrate. The CrAl transition layer is above the substrate, and the CrN / CrAlN amorphous main layer is above the transition layer. When the multilayer coating is partially enlarged under a high-power transmission electron microscope, its obvious amorphous structure can be seen, such as Figure 1 (b) shows that the dark black layer is the CrN amorphous layer with a thickness of 10 nm, and the light white layer is the CrAlN amorphous layer with a thickness of 15 nm. After testing, the hardness of the amorphous multilayer coating is 29.4 GPa, and its electrochemical and tribological properties are measured in 3.5% sodium chloride solution. The test results show that its corrosion current density is as low as 3.1×10 -9 A / cm -2 The wear rate is 3.1×10 -6 mm 3 / Nm.

[0051] Example 2

[0052] (1) Cleaning the substrate: Place the polished aluminum alloy substrate in anhydrous ethanol and acetone for ultrasonic cleaning for 30 minutes at an ultrasonic power of 20kHz. After drying, install the cleaned sample on the rotating rack of the vacuum chamber, close the door of the vacuum chamber, and perform vacuum pumping. Wait until the mechanical pump and molecular pump draw the vacuum degree to 5.0×10 -4 When the pressure is below Pa, argon gas is introduced, the gas flow rate is set to 30 sccm, and the vacuum baffle is adjusted to maintain the vacuum degree at 0.8 Pa. At the same time, the substrate bias is set to 160 V, and the ion source is turned on to glow clean the substrate for 20 minutes.

[0053] (2) Deposition of CrAl transition layer: After the glow cleaning is completed, the ion source is turned off, the argon flow rate is set to 18 sccm, and the vacuum degree is maintained at 0.8 Pa by adjusting the vacuum baffle. At the same time, the substrate bias is set to 60 V, and the second DC magnetron sputtering power supply is turned on to deposit the CrAl transition layer. The sputtering power is 120 W and the deposition time is 30 minutes.

[0054] (3) Deposition of CrN / CrAlN amorphous main layer: After the deposition of the CrAl transition layer is completed, the second DC magnetron sputtering power supply is turned off, nitrogen is introduced, and the flow rate is set to 15sccm. At the same time, the argon flow rate is adjusted to 15sccm, and the vacuum baffle is adjusted to keep the vacuum degree at 0.8Pa. The substrate bias is kept at 60V, and the first DC magnetron sputtering power supply is turned on to sputter the Cr target to deposit the CrN layer. The sputtering power is 120W and the deposition time is 70s. Subsequently, the first DC magnetron sputtering power supply is turned off, and the second DC magnetron sputtering power supply is turned on. The other parameters remain unchanged, and the CrAlN layer is deposited. The sputtering power is 120W and the deposition time is 70s. After repeating the deposition of CrN and CrAlN layers 70 times, the CrN / CrAlN amorphous main layer is obtained, and the deposition system is turned off and cooled naturally to room temperature to finally obtain an amorphous multilayer coating.

[0055] The amorphous multilayer coating prepared in Example 2 was tested to have a total coating thickness of 2.6 μm, a CrN single layer thickness of 12 nm, a CrAlN single layer thickness of 18 nm, a hardness of 20.8 GPa, and a corrosion current density of 1.2×10 -8 A / cm -2 The wear rate is 6.3×10 -6 mm 3 / Nm.

[0056] Example 3

[0057] (1) Cleaning the substrate: Place the polished aluminum alloy substrate in anhydrous ethanol and acetone for ultrasonic cleaning for 30 minutes at an ultrasonic power of 20kHz. After drying, install the cleaned sample on the rotating rack of the vacuum chamber, close the door of the vacuum chamber, and perform vacuum pumping. Wait until the mechanical pump and molecular pump draw the vacuum degree to 5.0×10 -4 When the pressure is below Pa, argon gas is introduced, the gas flow rate is set to 30 sccm, and the vacuum degree is maintained at 1.0 Pa by adjusting the vacuum baffle. At the same time, the substrate bias is set to 160 V, and the ion source is turned on to glow clean the substrate for 30 minutes.

[0058] (2) Deposition of CrAl transition layer: After the glow cleaning is completed, the ion source is turned off, the argon flow rate is set to 18 sccm, and the vacuum degree is maintained at 1.0 Pa by adjusting the vacuum baffle. At the same time, the substrate bias is set to 60 V, and the second DC magnetron sputtering power supply is turned on to deposit the CrAl transition layer. The sputtering power is 150 W and the deposition time is 20 minutes.

[0059] (3) Deposition of CrN / CrAlN amorphous main layer: After the deposition of the CrAl transition layer is completed, the second DC magnetron sputtering power supply is turned off, nitrogen is introduced, and the flow rate is set to 15sccm. At the same time, the argon flow rate is adjusted to 12sccm, and the vacuum baffle is adjusted to keep the vacuum degree at 1.0Pa. The substrate bias is kept at 60V, and the first DC magnetron sputtering power supply is turned on to sputter the Cr target to deposit the CrN layer. The sputtering power is 150W and the deposition time is 80s. Subsequently, the first DC magnetron sputtering power supply is turned off, and the second DC magnetron sputtering power supply is turned on. The other parameters remain unchanged, and the CrAlN layer is deposited. The sputtering power is 150W and the deposition time is 80s. After repeating the deposition of CrN and CrAlN layers 60 times, the CrN / CrAlN amorphous main layer is obtained, and the deposition system is turned off and cooled naturally to room temperature to finally obtain an amorphous multilayer coating.

[0060] The amorphous multilayer coating prepared in Example 3 was tested to have a total coating thickness of 2.8 μm, a CrN single layer thickness of 16 nm, a CrAlN single layer thickness of 23 nm, a hardness of 16.9 GPa, and a corrosion current density of 2.6×10 -8 A / cm -2 The wear rate is 9.5×10 -6 mm 3 / Nm.

[0061] Example 4

[0062] (1) Cleaning the substrate: Place the polished hard substrate in anhydrous ethanol and acetone for ultrasonic cleaning for 30 minutes at an ultrasonic power of 20kHz. After drying, install the cleaned sample on the rotating rack of the vacuum chamber, then close the door of the vacuum chamber and perform vacuum pumping. Wait until the mechanical pump and molecular pump have drawn the vacuum degree to 5.0×10 -4 When the pressure is below Pa, argon gas is introduced, the gas flow rate is set to 30 sccm, and the vacuum baffle is adjusted to maintain the vacuum degree at 0.6 Pa. At the same time, the substrate bias is set to 160 V, and the ion source is turned on to glow clean the substrate for 30 minutes.

[0063] (2) Deposition of CrAl transition layer: After the glow cleaning is completed, the ion source is turned off, the argon flow rate is set to 25 sccm, and the vacuum degree is maintained at 0.6 Pa by adjusting the vacuum baffle. At the same time, the substrate bias is set to 60 V, and the second DC magnetron sputtering power supply is turned on to deposit the CrAl transition layer. The sputtering power is 160 W and the deposition time is 10 minutes.

[0064] (3) Deposition of CrN / CrAlN amorphous main layer: After the deposition of the CrAl transition layer is completed, the second DC magnetron sputtering power supply is turned off, nitrogen is introduced, and the flow rate is set to 15sccm. At the same time, the argon flow rate is adjusted to 18sccm, and the vacuum baffle is adjusted to keep the vacuum degree at 0.6Pa. The substrate bias is kept at 60V, and the first DC magnetron sputtering power supply is turned on to sputter the Cr target to deposit the CrN layer. The sputtering power is 160W and the deposition time is 40s. Subsequently, the first DC magnetron sputtering power supply is turned off, and the second DC magnetron sputtering power supply is turned on. The other parameters remain unchanged, and the CrAlN layer is deposited. The sputtering power is 160W and the deposition time is 40s. After repeating the deposition of CrN and CrAlN layers 80 times, the CrN / CrAlN amorphous main layer is obtained, and the deposition system is turned off and naturally cooled to room temperature to finally obtain an amorphous multilayer coating.

[0065] The amorphous multilayer coating prepared in Example 4 was tested to have a total coating thickness of 2.1 μm, a CrN single layer thickness of 8 nm, a CrAlN single layer thickness of 13 nm, a hardness of CrN / CrAlN amorphous multilayer coating of 35.2 GPa, and a corrosion current density of 2.1×10 -8 A / cm -2 The wear rate is 1.6×10 -6 mm 3 / Nm.

[0066] The embodiments provided by the present invention are described in detail above. Specific examples are used herein to describe the principles and implementation methods of the present invention, and the description of the above embodiments is only used to help understand the core idea of ​​the present invention. It should be pointed out that for ordinary technicians in this technical field, without departing from the principles of the present invention, the present invention can also be improved and modified in a number of ways, and these improvements and modifications also fall within the scope of protection of the claims of the present invention.

Claims

1. A highly corrosion-resistant, wear-resistant, hard amorphous multilayer coating, characterized in that: include: CrAl transition layer; A CrN / CrAlN amorphous main layer is deposited on the CrAl transition layer, wherein the CrN / CrAlN amorphous main layer is formed by alternately depositing CrN layers and CrAlN layers, and both the CrN layer and the CrAlN layer are of an amorphous structure.

2. The highly corrosion-resistant, wear-resistant, hard amorphous multilayer coating according to claim 1, characterized in that: In the CrN / CrAlN amorphous main layer, the innermost layer is a CrN layer, and the outermost layer is a CrAlN layer.

3. The highly corrosion-resistant, wear-resistant, hard amorphous multilayer coating according to claim 1, characterized in that: The thickness of the CrN layer is 5-20 nm, and the thickness of the CrAlN layer is 10-30 nm.

4. The highly corrosion-resistant, wear-resistant, hard amorphous multilayer coating according to claim 1, characterized in that: The number of the CrN layer is greater than or equal to one layer, and the number of the CrAlN layer is greater than or equal to one layer.

5. The highly corrosion-resistant, wear-resistant, hard amorphous multilayer coating according to any one of claims 1 to 4, characterized in that: The total number of layers of the CrN / CrAlN amorphous main layer is 40 to 80 layers, and the total thickness of the CrN / CrAlN amorphous main layer is 1.5 to 3.0 μm.

6. A method for preparing a highly corrosion-resistant, wear-resistant and hard amorphous multilayer coating, characterized in that: A highly corrosion-resistant, wear-resistant and hard amorphous multilayer coating as claimed in any one of claims 1 to 5 is prepared on a substrate. The preparation method of the amorphous multilayer coating is as follows: (1) Cleaning the substrate: The polished substrate is cleaned by ultrasonic cleaning and then glow cleaning; (2) Deposition of CrAl transition layer: In an argon atmosphere, a CrAl transition layer is deposited on the substrate by sputtering a CrAl target; (3) Deposition of CrN / CrAlN amorphous main layer: In a mixed atmosphere of argon and nitrogen, a Cr target is first sputtered to form a CrN layer on the CrAl transition layer, and then a CrAlN layer is deposited by sputtering a CrAl target; CrN layers and CrAl targets are alternately deposited to form a CrN / CrAlN amorphous main layer.

7. The preparation method according to claim 6, characterized in that: In step (2), the deposition conditions are as follows: vacuum degree of 0.5-1.0 Pa, argon gas flow rate of 15-40 sccm, substrate bias voltage of 40-80 V, CrAl target sputtering by DC magnetron sputtering power supply, target power of 120-180 W, and deposition time of 10-30 minutes.

8. The preparation method according to claim 6, characterized in that: In step (3), the deposition conditions are as follows: vacuum degree of 0.5-1.0 Pa, argon flow rate of 10-20 sccm, nitrogen flow rate of 8-15 sccm, in a mixed atmosphere of argon and nitrogen, the substrate bias is adjusted to 40-80 V, and the Cr target is firstly sputtered by a first DC magnetron sputtering power supply; then the first DC magnetron sputtering power supply is turned off, and the CrAl target is sputtered by a second DC magnetron sputtering power supply; the deposition is alternately performed multiple times to finally obtain a CrN / CrAlN amorphous main layer.

9. The preparation method according to claim 7, characterized in that: In step (3), the target power of sputtering Cr target is 120-180 W, and the sputtering time is 20-80 s; the target power of sputtering CrAl target is 120-180 W, and the sputtering time is 20-80 s.

10. The preparation method according to any one of claims 6 to 9, characterized in that: In step (3), the total deposition time is 100 to 200 minutes.

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