Workbench of ion beam etching machine

Abstract

The invention discloses a workbench of an ion beam etching machine. The workbench comprises a vacuum cavity, a motion module, a scanning trolley and a vacuumizing assembly. The vacuum cavity is connected with the vacuumizing assembly so that a high-vacuum environment can be formed in the vacuum cavity. The scanning trolley is arranged in the vacuum cavity and is used for carrying a workpiece for coating; the motion module is arranged at the outer side part of the vacuum cavity, penetrates through the side wall of the vacuum cavity and is connected with the scanning trolley so as to drive the scanning trolley to reciprocate in the vacuum cavity; an ion beam inlet is formed in the top of the vacuum cavity, a correction plate is arranged below the ion beam inlet, the scanning trolley reciprocates below the correction plate, an ion beam sequentially flows through the ion beam inlet and a notch of the correction plate and then is injected to a workpiece of the scanning trolley, and the width of the notch of the correction plate can be adjusted so as to achieve ion beam current input adjustment. The device has the characteristics of compact structure, simplicity in operation, stability in operation, high automation degree and the like, and the workpiece coating quality is remarkably improved.

Description

Technical Field

[0001] The invention belongs to the technical field of ion beam etching equipment, and in particular relates to a workbench of an ion beam etcher. Background Art

[0002] During the ion etching process, the ion beam cannot form a completely uniform beam due to the influence of flatness and verticality. Also, since the inner side of the workpiece is less disturbed, it is easy for the film thickness on the inner side of the workpiece to be greater than that on the outer side of the workpiece, affecting the product yield. In order to improve the uniformity of the coating of the workpiece, a worktable is set in the ion etching equipment, and the etching angle of the workpiece is adjusted through the worktable. At the same time, when facing complex workpieces, it is also necessary to selectively control the etching range by adjusting the inclination angle of the worktable. It can be seen that the worktable is a key component of the ion beam etching equipment.

[0003] At present, in order to achieve the purpose of controlling the beam and selectively etching the workpiece, a deflection magnetic field or electric field can be added under the ion source. At the same time, in order to improve the etching effect on the side of a complex workpiece, a rotating motor mechanism can be used to drive the worktable to turn. However, the above two methods are not only costly, but also cannot achieve beam control in different areas at the same time according to the actual film thickness on the workpiece by using a deflection magnetic field or electric field. Summary of the invention

[0004] The technical problem to be solved by the present invention is to solve the problems of ion beam current control and etching of the side of a workpiece, and to provide a workbench of an ion beam etcher with compact structure, simple operation, stable operation and high degree of automation.

[0005] To achieve the above object, the present invention can adopt the following technical solutions:

[0006] A workbench of an ion beam etcher comprises a vacuum chamber, a motion module, a scanning trolley and a vacuum pumping assembly; the vacuum chamber is connected to the vacuum pumping assembly to form a high vacuum environment inside the vacuum chamber; the scanning trolley is arranged in the vacuum chamber to carry a workpiece for coating; the motion module is arranged at the outer side of the vacuum chamber and passes through the side wall of the vacuum chamber and is connected to the scanning trolley to drive the scanning trolley to reciprocate in the vacuum chamber; an ion beam inlet is arranged at the top of the vacuum chamber, a correction plate is arranged below the ion beam inlet, the scanning trolley reciprocates below the correction plate, and the ion beam flows through the ion beam inlet and the notch of the correction plate in turn and is injected into the workpiece of the scanning trolley, and the notch width of the correction plate is adjustable to adjust the ion beam flow rate.

[0007] As a further improvement of the present invention, the scanning trolley includes a top plate and a base, the top plate is used to carry the workpiece, and the two sides of the top plate are connected to the base through adjustment plates respectively, and the adjustment plates are used to adjust the angle between the top plate and the base, thereby adjusting the coating angle of the workpiece; a pulley is provided on the side of the base, and a slide rail matching the pulley is provided at the bottom of the vacuum chamber, and the base is connected to a motion module; driven by the motion module, the base drives the top plate and the workpiece to move back and forth along the slide rail.

[0008] As a further improvement of the present invention, an arc groove is provided on the adjustment plate, and the arc groove cooperates with the fastener on the side of the top plate to achieve adjustment of the inclination angle of the top plate.

[0009] As a further improvement of the present invention, the motion module includes a drive motor and a sprocket transmission assembly, and the sprocket transmission assembly is respectively connected to the drive motor and the base. Driven by the drive motor, the sprocket transmission assembly drives the scanning trolley to move back and forth along the slide rail.

[0010] As a further improvement of the present invention, the sprocket transmission assembly includes a driving gear, a first driven gear and a second driven gear, the driving gear and the first driven gear are respectively arranged at the two ends of the side wall of the vacuum chamber, the second driven gear is arranged on the side of the base, the driving gear is respectively connected to the output end of the driving motor and the first driven gear through a chain, and the first driven gear is connected to the second driven gear through a chain; the driving motor drives the driving gear to rotate forward or reverse, and then drives the first driven gear and the second driven gear to rotate forward or reverse, so as to realize the reciprocating movement of the scanning trolley along the slide rail.

[0011] As a further improvement of the present invention, a chamber door is provided on the side of the vacuum chamber, and the workpiece enters and exits the vacuum chamber through the chamber door.

[0012] As a further improvement of the present invention, a mounting bracket is provided on the top of the inner side of the vacuum chamber, the mounting bracket faces the ion beam inlet, and the mounting bracket is used to install the correction plate.

[0013] As a further improvement of the present invention, the vacuum pumping assembly includes a vacuum pipeline, which is arranged at the bottom of the vacuum chamber and connected to an external mechanical pump to achieve vacuum pumping in the vacuum chamber to 20±2Pa.

[0014] As a further improvement of the present invention, the vacuum pumping assembly further includes a molecular pump, which is connected to the bottom of the vacuum chamber; when the mechanical pump completes vacuuming, the molecular pump continues to vacuumize the vacuum chamber.

[0015] As a further improvement of the present invention, a plug valve is provided between the molecular pump and the vacuum chamber.

[0016] As a further improvement of the present invention, a circulating cooling water channel is provided on the side wall of the vacuum chamber.

[0017] Compared with the prior art, the advantages of the present invention are:

[0018] 1. The workbench of the ion beam etcher of the present invention is achieved by arranging a scanning trolley in a vacuum chamber, and using the scanning trolley to carry the workpiece for coating; at the same time, a motion module is also arranged on the side of the vacuum chamber and connected to the scanning trolley, and the motion module is used to drive the scanning trolley to move back and forth in the vacuum chamber, thereby realizing free movement of the workpiece in the vacuum chamber and accurately controlling the coating thickness on the surface of the workpiece; further, a correction plate is arranged below the ion beam inlet at the top of the vacuum chamber, and by adjusting the width of the correction plate slot, the ion beam flow rate can be adjusted, thereby achieving the purpose of controlling the beam uniformity and improving the coating quality of the workpiece.

[0019] 2. The workbench of the ion beam etcher of the present invention is provided with an adjustment plate with an arc-shaped groove between the top plate and the base of the scanning trolley, and the top plate is tilted by changing the installation position of the top plate in the arc-shaped groove; for workpieces with special requirements, the effect of etching the side of the workpiece is achieved by tilting the scanning trolley. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is a schematic diagram of the three-dimensional structure principle of a workbench of an ion beam etcher in a specific embodiment of the present invention;

[0021] Figure 2 It is a schematic diagram of the three-dimensional structure principle of the ion beam etcher with the side panels removed from the workbench in a specific embodiment of the present invention;

[0022] Figure 3 It is a schematic diagram of the three-dimensional structure principle of the workbench of the ion beam etcher in a specific embodiment of the present invention with the top plate and the side plates removed;

[0023] Figure 4 It is a schematic diagram of the top view of the structural principle of the ion beam etcher with the top plate and the side plates removed from the workbench in a specific embodiment of the present invention;

[0024] Figure 5 A schematic diagram of the three-dimensional structure principle of the workbench of the ion beam etcher in a specific embodiment of the present invention with the top plate, side plates and correction plate removed;

[0025] Legend: 1. Vacuum chamber; 2. Motion module; 3. Drive motor; 4. Molecular pump; 5. Vacuum pipeline; 6. Gate valve; 7. Chamber door; 8. Scanning carriage; 9. Pulley; 10. Slide rail; 11. Driving gear; 12. First driven gear; 13. Second driven gear; 14. Correction plate; 15. Adjustment plate; 16. Ion beam entrance; 17. Notch; 18. Top plate; 19. Base; 20. Arc groove; 21. Mounting bracket. DETAILED DESCRIPTION

[0026] The present invention is further described below in conjunction with the accompanying drawings and specific preferred embodiments, but the protection scope of the present invention is not limited thereby.

[0027] In the description of the present invention, it should be understood that the terms "side", "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention.

[0028] In addition, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, "multiple" means two or more, unless otherwise clearly and specifically defined.

[0029] Example

[0030] like Figure 1 , Figure 3 and Figure 4As shown, the workbench of the ion beam etcher of the present invention comprises a vacuum chamber 1, a motion module 2, a scanning trolley 8 and a vacuum pumping assembly. The vacuum chamber 1 is connected to the vacuum pumping assembly to realize a high vacuum environment inside the vacuum chamber 1. The scanning trolley 8 is arranged in the vacuum chamber 1 for carrying a workpiece for coating. The motion module 2 is arranged at the outer side of the vacuum chamber 1, and penetrates the side wall of the vacuum chamber 1, and is connected to the scanning trolley 8 to drive the scanning trolley 8 to move back and forth in the vacuum chamber 1. An ion beam inlet 16 is provided at the top of the vacuum chamber 1, and a correction plate 14 is provided below the ion beam inlet 16. The scanning trolley 8 moves back and forth below the correction plate 14, and the ion beam flows through the ion beam inlet 16 and the notch 17 of the correction plate 14 in turn and is injected into the workpiece of the scanning trolley 8. In order to cope with the situation where the film thickness on the inner side of the workpiece is much higher than the film thickness on the outer side due to uneven ion beam flow, the width of the notch 17 of the correction plate 14 can be adjusted to achieve ion beam flow adjustment. After the test process, according to the actual situation, the installation position of the correction plate 14 in the vacuum chamber 1 is adjusted to adjust the area of ​​the notch 17, and the correction plate 14 is used to block the beam corresponding to the film thickness area on the workpiece, reduce the corresponding beam input, achieve the purpose of controlling the beam, and improve the uniformity of the coating.

[0031] In this embodiment, the scanning trolley 8 is arranged in the vacuum chamber 1, and the scanning trolley 8 is used to carry the workpiece for coating; at the same time, the motion module 2 is also set through the side of the vacuum chamber 1 and connected to the scanning trolley 8, and the motion module 2 is used to drive the scanning trolley 8 to move back and forth in the vacuum chamber 1, so that the workpiece can move freely in the vacuum chamber 1, and the coating thickness on the surface of the workpiece can be accurately controlled; further, a correction plate 14 is arranged below the ion beam inlet 16 at the top of the vacuum chamber 1, and the width of the slot 17 of the correction plate 14 is adjusted to adjust the ion beam flow rate, thereby achieving the purpose of controlling the beam uniformity and improving the workpiece coating quality.

[0032] like Figure 5 As shown, the scanning carriage 8 includes a top plate 18 and a base 19. The top plate 18 is used to carry the workpiece, and the top plate 18 is connected to the base 19 on both sides through the adjustment plate 15. The adjustment plate 15 is used to adjust the angle between the top plate 18 and the base 19, thereby adjusting the coating angle of the workpiece. A pulley 9 is provided on the side of the base 19, and a slide rail 10 matching the pulley 9 is provided at the bottom of the vacuum chamber 1. The base 19 is connected to the motion module 2. Driven by the motion module 2, the base 19 drives the top plate 18 and the workpiece to move back and forth along the slide rail 10.

[0033] Furthermore, an arc-shaped groove 20 is provided on the adjustment plate 15 , and the arc-shaped groove 20 cooperates with the fastening screws on the side of the top plate 18 to adjust the inclination angle of the top plate 18 .

[0034] In this embodiment, an adjustment plate 15 with an arc groove 20 is provided between the top plate 18 and the base 19 of the scanning trolley 8, and the top plate 8 is tilted by changing the installation position of the top plate 18 in the arc groove 20; for workpieces with special requirements, the top plate 8 is tilted to adjust the side wall morphology of the workpiece, and the etching range is selectively controlled to cope with the side etching of complex workpieces.

[0035] like Figure 2 As shown, the motion module 2 includes a drive motor 3 and a sprocket transmission assembly. The sprocket transmission assembly is connected to the drive motor 3 and the base 19 respectively. Under the drive of the drive motor 3, the sprocket transmission assembly drives the scanning trolley 8 to reciprocate along the slide rail 10. The sprocket transmission has the characteristics of simple structure, precise control and stable transmission, which realizes the smooth movement of the scanning trolley 8 in the vacuum chamber 10.

[0036] like Figure 2 As shown, the sprocket transmission assembly includes a driving gear 11, a first driven gear 12, and a second driven gear 13. The driving gear 11 and the first driven gear 12 are respectively arranged at the two ends of the side wall of the vacuum chamber 1, and the second driven gear 13 is arranged on the side of the base 19. The driving gear 11 is connected to the output end of the driving motor 3 and the first driven gear 12 through a chain, and the first driven gear 12 is connected to the second driven gear 13 through a chain. The driving motor 3 drives the driving gear 11 to rotate forward or reverse, thereby driving the first driven gear 12 and the second driven gear 13 to rotate forward or reverse, so as to realize the reciprocating movement of the scanning trolley 8 along the slide rail 10.

[0037] like Figure 2 As shown, a chamber door 7 is provided at the side of the vacuum chamber 1 , and the workpiece enters and exits the vacuum chamber 1 through the chamber door 7 .

[0038] like Figure 3 As shown, a mounting bracket 21 is provided on the top of the inner side of the vacuum chamber 1 , and the mounting bracket 21 faces the ion beam inlet 16 . The mounting bracket 21 is used to mount the correction plate 14 .

[0039] like Figure 1 and Figure 2 As shown, the vacuum pumping assembly includes a vacuum pipeline 5 with a control valve. The vacuum pipeline 5 is arranged at the bottom of the vacuum chamber 1 and connected to an external mechanical pump to form a mechanical pump vacuum pipeline to achieve vacuum pumping in the vacuum chamber 1 to 20±2Pa.

[0040] like Figure 1As shown, the vacuum pumping assembly also includes a molecular pump 4, which is connected to the bottom of the vacuum chamber 1; a control valve is provided at the connection between the vacuum pipeline 5 and the molecular pump 4 to form a molecular pump vacuum pipeline. When the mechanical pump completes the vacuum pumping, the molecular pump 4 continues to vacuum the vacuum chamber 1 to achieve the ultimate vacuum state inside the vacuum chamber 1. After the process is completed, the pressure is restored by introducing nitrogen gas.

[0041] Furthermore, a gate valve 6 is provided between the molecular pump 4 and the vacuum chamber 1. The gate valve 6 controls the on-off between the molecular pump 4 and the vacuum chamber 1, which is simple to operate and has high sealing reliability.

[0042] In this embodiment, a circulating cooling water channel is provided on the side wall of the vacuum chamber 1 to achieve cooling of the vacuum chamber 1 .

[0043] Although the present invention is disclosed as above with preferred embodiments, it is not intended to limit the present invention. Any technician familiar with the art can use the above disclosed methods and technical contents to make many possible changes and modifications to the technical solutions of the present invention without departing from the spirit and technical solutions of the present invention, or modify them into equivalent embodiments of equivalent changes. Therefore, any simple modification, equivalent replacement, equivalent change and modification made to the above embodiments according to the technical essence of the present invention without departing from the content of the technical solutions of the present invention still fall within the scope of protection of the technical solutions of the present invention.

Claims

1. A workbench of an ion beam etcher, characterized in that: The invention comprises a vacuum chamber (1), a motion module (2), a scanning trolley (8) and a vacuum pumping assembly; the vacuum chamber (1) is connected to the vacuum pumping assembly to form a high vacuum environment inside the vacuum chamber (1); the scanning trolley (8) is arranged in the vacuum chamber (1) to carry a workpiece for coating; the motion module (2) is arranged on the outer side of the vacuum chamber (1) and penetrates the side wall of the vacuum chamber (1) and is connected to the scanning trolley (8) to drive the scanning trolley (8) to move in the vacuum chamber (1); The invention relates to a vacuum chamber (1) for reciprocating movement in a hollow cavity (1); an ion beam inlet (16) is provided at the top of the vacuum chamber (1), a correction plate (14) is provided below the ion beam inlet (16), and the scanning carriage (8) reciprocates below the correction plate (14); the ion beam flows through the ion beam inlet (16) and the notch (17) of the correction plate (14) in sequence and is then injected onto a workpiece of the scanning carriage (8); the width of the notch (17) of the correction plate (14) is adjustable to achieve ion beam flow rate adjustment.

2. The workbench of the ion beam etcher according to claim 1, characterized in that: The scanning trolley (8) comprises a top plate (18) and a base (19), wherein the top plate (18) is used to carry a workpiece, and the top plate (18) is connected to the base (19) on both sides via adjustment plates (15), respectively, and the adjustment plates (15) are used to adjust the angle between the top plate (18) and the base (19), thereby adjusting the coating angle of the workpiece; a pulley (9) is provided on the side of the base (19), and a slide rail (10) matching the pulley (9) is provided at the bottom of the vacuum chamber (1), and the base (19) is connected to the motion module (2); driven by the motion module (2), the base (19) drives the top plate (18) and the workpiece to move back and forth along the slide rail (10).

3. The workbench of the ion beam etcher according to claim 2, characterized in that: The adjustment plate (15) is provided with an arc-shaped groove (20), and the arc-shaped groove (20) cooperates with a fastener on the side of the top plate (18) to achieve adjustment of the inclination angle of the top plate (18).

4. The workbench of the ion beam etcher according to claim 2, characterized in that: The motion module (2) comprises a drive motor (3) and a sprocket transmission assembly, wherein the sprocket transmission assembly is connected to the drive motor (3) and the base (19) respectively. When driven by the drive motor (3), the sprocket transmission assembly drives the scanning trolley (8) to move back and forth along the slide rail (10).

5. The workbench of the ion beam etcher according to claim 4, characterized in that: The sprocket transmission assembly comprises a driving gear (11), a first driven gear (12) and a second driven gear (13); the driving gear (11) and the first driven gear (12) are respectively arranged at two ends of a side wall of a vacuum chamber (1); the second driven gear (13) is arranged on a side of a base (19); the driving gear (11) is respectively connected to an output end of a driving motor (3) and the first driven gear (12) through a chain; the first driven gear (12) is connected to the second driven gear (13) through a chain; the driving motor (3) drives the driving gear (11) to rotate forward or reverse, thereby driving the first driven gear (12) and the second driven gear (13) to rotate forward or reverse, so as to realize reciprocating movement of the scanning carriage (8) along a slide rail (10).

6. The workbench of the ion beam etcher according to any one of claims 1 to 5, characterized in that: A chamber door (7) is provided on the side of the vacuum chamber (1), and a workpiece enters and exits the vacuum chamber (1) through the chamber door (7).

7. The workbench of the ion beam etcher according to any one of claims 1 to 5, characterized in that: A mounting bracket (21) is provided on the top of the inner side of the vacuum chamber (1), the mounting bracket (21) faces the ion beam inlet (16), and the mounting bracket (21) is used to mount the correction plate (14).

8. The workbench of the ion beam etcher according to any one of claims 1 to 5, characterized in that: The vacuum pumping assembly comprises a vacuum pipeline (5), which is arranged at the bottom of the vacuum chamber (1) and connected to an external mechanical pump to achieve vacuum pumping in the vacuum chamber (1) to 20±2 Pa.

9. The workbench of the ion beam etcher according to claim 8, characterized in that: The vacuum pumping assembly further comprises a molecular pump (4), and the molecular pump (4) is connected to the bottom of the vacuum chamber (1); when the mechanical pump completes vacuuming, the molecular pump (4) continues to vacuumize the vacuum chamber (1).

10. The workbench of the ion beam etcher according to claim 9, characterized in that: A plug valve (6) is provided between the molecular pump (4) and the vacuum chamber (1).

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