Multi-chamber assembly for handling removable epitaxial reaction units

Abstract

The present invention relates to a multi-chamber assembly for handling and storing a removable reaction unit for use in a reactor for epitaxially depositing a semiconductor film on a substrate for preventive maintenance operations. The invention also relates to a reactor assembly integrating an epitaxial reactor for depositing a semiconductor film on a substrate, and to a multi-chamber assembly described above.

Description

Technical Field

[0001] The present invention relates to the field of preventive maintenance operations of removable reaction cells for depositing semiconductor films on substrates in epitaxial reactors.

[0002] The invention also relates to the field of multi-chamber assemblies for handling and conditioning removable reaction units during preventive maintenance operations, in particular when said reaction units are used in reactors for epitaxial deposition of semiconductor films on substrates.

[0003] The invention also relates to a multi-chamber assembly for handling and adjusting removable reaction cells and substrate holders used in epitaxial reactors. Background Art

[0004] Epitaxial growth equipment used in the semiconductor industry may include a reactor containing a reaction and deposition chamber where the chemical vapor deposition process occurs. As a result of the process, parts of the chamber will experience unwanted product buildup and will need to be cleaned or replaced after multiple deposition cycles to avoid affecting the quality and performance of the epitaxial deposition.

[0005] As a result, consumable components within the reaction chamber, as well as the walls and parts that make up the reaction chamber itself, require preventive maintenance (PM) operations, which require periodic entry into the reaction chamber to remove, clean, or replace the reaction chamber and its associated components and parts.

[0006] These operations severely impact the downtime of the reactor and its output. This problem is particularly pronounced in hot-wall reactors used for depositing SiC, where maintenance operations may occur once or more a week and result in interruptions that may last for many hours.

[0007] Typically, removal, cleaning and replacement of reaction chamber related components is a time consuming process that is mostly done manually.

[0008] In general, the process requires complete cooling and purging of the reactor, undesirable exposure to air, and the simultaneous presence of one or more operators.

[0009] In the best case, the reaction chamber is of a removable type, and the reaction chamber can be pulled out of the reactor as a whole by mechanical means. However, in this type of system, the reaction unit, i.e., the confined enclosed space (or working area) where the epitaxial deposition process occurs, cannot be easily separated from the main reaction chamber, and is therefore mostly considered an integral part of the reaction chamber because it cannot be handled and moved separately.

[0010] For example, the reaction chambers described in EP1570107 and US2022411961 are formed by the assembly of a plurality of elements forming an internal enclosure housing a working area that cannot be removed individually and integrally from the rest of the other sensitive elements.

[0011] The entire reaction chamber removal process as described above has several disadvantages: access to the chamber is not automated or automatable, it requires implementation of specific and time-consuming EHS procedures, the reactor is exposed to air, and displacement (and handling) of the reaction chamber is cumbersome and requires manual intervention.

[0012] It is also noted that in some latest generation reactors, the handling of the substrate holder is carried out in an automated way and allows the substrate holder to be moved from the reactor to the third chamber or from the third chamber to the reactor, suitable for conditioning the substrate before entering the chamber and allowing its exposure to air to be minimized.

[0013] Therefore, it is desirable to design a chamber assembly for inserting and replacing the reaction unit of the reaction chamber from the reactor into a suitable enclosure to perform purge / conditioning operations without exposing the reaction unit to air and accelerating PM operations.

[0014] In addition, it is desirable to provide an automated mechanical system configured to displace the reaction units of the reaction chambers within the multi-chamber assembly to perform specific handling, conditioning and / or purging operations and reduce PM time. It is also desirable to provide a multi-chamber assembly that is suitable for cooperating with the automated handling of the substrate holder (if present) without interference.

[0015] Finally, it would be desirable to provide a reactor assembly that integrates with the chamber assembly in a fully automated manner to further reduce PM downtime, mitigate EHS issues, and provide a compact, integrated solution. Summary of the invention

[0016] An object of the present invention is to overcome the disadvantages of the prior art. More specifically, an object of the present invention is to provide a multi-chamber assembly for handling one or more removable reaction units of an epitaxial reactor for depositing semiconductor films on substrates, preferably avoiding exposure thereof to air.

[0017] Another object of the present invention is to provide a multi-chamber assembly capable of performing automated handling of removable reaction units and substrate holders.

[0018] Another object of the present invention is to provide a multi-chamber assembly suitable for connection to a reactor suitable for depositing Si, SiC and GaN films on semiconductor substrates, the reactor having a reaction chamber equipped with a removable reaction unit.

[0019] Another object of the present invention is to provide a multi-chamber assembly suitable for performing automated handling of reaction units for preventive maintenance operations with reduced downtime.

[0020] Another object of the present invention is to provide a reactor assembly integrated with a multi-chamber assembly to handle reaction units and substrate holders in a fully automated manner while providing a compact integrated solution.

[0021] The primary objectives set out above are achieved by the invention as described in the accompanying claims, which form an integral part of the present description.

[0022] Please note that the use of reference signs in the claims does not limit their scope. The sole purpose of the reference signs is to make the claims easier to understand with reference to the drawings.

[0023] This summary is provided to introduce some concepts in a simplified form. These concepts are further described in the detailed description of the example embodiments disclosed below. This summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 A simplified schematic diagram of a multi-chamber assembly according to an embodiment of the present invention is provided.

[0025] Figure 2 A simplified schematic diagram of a multi-chamber assembly according to another embodiment of the present invention is provided.

[0026] Figure 3 A simplified schematic diagram of a multi-chamber assembly according to another embodiment of the present invention is provided.

[0027] It should be understood that the elements in the drawings are shown for simplicity and clarity and are not necessarily drawn to scale. For example, the size of some elements in the drawings may have been omitted, or on the other hand, exaggerated relative to other elements to help improve the understanding of the illustrated embodiments of the present disclosure. DETAILED DESCRIPTION

[0028] This application claims priority to IT application 102024000009712 filed on April 30, 2024, the entire contents of which are incorporated herein by reference. In particular, but not exclusively, the following are incorporated by reference: claims 1-14, Figure 1-3 and the corresponding parts of the description.

[0029] This application claims priority to IT application 102023000024663 filed on November 21, 2023, the entire contents of which are incorporated herein by reference. In particular, but not exclusively, the following are incorporated by reference: claims 1-16, Figure 1-3 and the corresponding parts of the description.

[0030] Although certain embodiments and examples are disclosed below, those skilled in the art will appreciate that the invention extends beyond the specifically disclosed embodiments and / or uses of the invention and their obvious modifications and equivalents. Therefore, it is intended that the scope of the disclosed invention should not be limited by the specifically disclosed embodiments described below.

[0031] Epitaxial reactors such as those used in SiC deposition typically comprise a reaction chamber formed from one or more structural elements assembled together to create at least one enclosure defining at least one interior space or working area in which the actual deposition takes place. See, for example, EP 1570107 and US2022411961.

[0032] During PM operations, reaction chambers similar to those described in the above non-limiting examples (provided for illustrative purposes only) typically do not allow for removal and handling of the particular enclosure in which deposition occurs. The bulk reaction chamber either needs to be removed in its entirety or accessed from within to remove individual components subject to undesirable buildup.

[0033] The applicant has envisaged an alternative reaction chamber design in which the reaction and deposition processes take place in a closed working space, i.e. a removable type reaction unit which can be removed in one piece from a substantially hollow housing and adapted to cooperate with an automated handling machine, optionally provided with a specially designed end effector.

[0034] Such a reaction unit is therefore a removable component of a reaction chamber of a reactor for epitaxially depositing semiconductor films on substrates. It will be referred to hereinafter as a "removable reaction unit" or "reaction unit".

[0035] This novel design allows the reaction unit or its consumable parts to be removed and replaced in a simple manner without having to reach inside the reactor machine, or without having to move the entire main reaction chamber to the outside of the reactor machine to access its internal components and parts, thereby causing them to be undesirably exposed to the air.

[0036] The removable reaction unit of the reaction chamber may include an engagement device, such as a notch, protrusion, hook, loop or slider, which is suitable for mechanically coupling and cooperating with an end effector of a motorized mechanical system or an automated handling machine for handling in an automated manner.

[0037] According to a first aspect, the invention relates to a multi-chamber assembly for handling one or more removable reaction cells of an epitaxial reactor for depositing semiconductor films on substrates.

[0038] The multi-chamber assembly includes at least two chambers, namely a first chamber and a second chamber, and at least one transfer device that places the first chamber and the second chamber in communication with each other.

[0039] In particular, the first chamber, which may also be called "transfer chamber", comprises at least one opening suitable for transferring the reaction unit from / to the reaction chamber of the reactor.The first chamber may advantageously be connected to the reactor directly or via a closed space.

[0040] The opening may advantageously be closable, sealable and / or lockable to allow the first chamber to be isolated from the reactor, in particular to prevent gas leakage and / or to withstand a pressure difference between the two. For example, the hole may be provided with a gate valve. The first chamber may optionally be connected to a system for generating a vacuum and a system for flowing and exhausting gases.

[0041] The second chamber is designed for storing and / or handling one or more removable reaction units for PM and removal. It may also be referred to as a "unit handling chamber". It is provided with a resealable entrance, which is suitable for removal and insertion of reaction units by an operator or an automated system. After removal, the removable reaction unit can be subjected to conventional PM operations, or can be discarded at the end of its life.

[0042] The second chamber may advantageously be adapted to receive or unload the removable reaction unit from / to the first chamber via a transfer device by means of a motorized mechanical system or manually activated mechanical means.

[0043] Due to its storage capacity, the second chamber allows replacement of the reaction unit for PM operation to be performed in a more efficient manner. As will be discussed below, the second chamber may optionally be conditioned, allowing further preparation of the reaction unit for PM or for entry into the reactor for operation.

[0044] As can be inferred from the above, the term "chamber" refers to a housing surrounding a cavity and optionally provided with a sealable hole / opening.

[0045] The above-described multi-chamber assembly allows the removable reaction unit of the epitaxial reactor to be transported without exposing the epitaxial reactor to air. This can significantly reduce PM maintenance time.

[0046] Furthermore, the multi-chamber assembly described above may allow for automated handling of the reaction unit for preventive maintenance operations, thus positively impacting the efficiency of the process.

[0047] It should be understood that the reaction unit is the working area of ​​the reactor, suitable for epitaxially depositing semiconductor films on substrates. The substrate can be positioned on a substrate holder and stored in a receiving area of ​​the reaction unit. The substrate holder is a device that provides support for the substrate.

[0048] According to a preferred embodiment, the multi-chamber assembly according to the present invention may include a motorized mechanical system including at least one inter-chamber actuator. The inter-chamber actuator may be configured to grab a removable reaction unit and displace the removable reaction unit from a first chamber to a second chamber via a transfer device, and / or vice versa.

[0049] The term "actuator" refers to a part of a device or machine that allows it to achieve physical movement: it can be used to convert electrical, mechanical, pneumatic or hydraulic input into linear or rotary motion, or a sequential combination of the two.

[0050] The motorized mechanical system described above allows the reaction unit to be moved within the multi-chamber assembly without requiring physical movement or presence of an operator. Alternatively, it can be remotely controlled by a digital processing device, either by cable or wirelessly, such as a computer.

[0051] In a non-limiting example, the motorized mechanical system may include a linear actuator provided with an end effector. The end effector may be adapted to mechanically couple with the removable reaction unit to grasp it and displace it by moving from an extended position to a retracted position and vice versa.

[0052] The end effector may be a gripper, such as a rod, a prong, a fork, a spade, or a combination thereof.

[0053] To bear the weight of the reaction unit, the end effector may be a metal or ceramic material, such as aluminum or silicon carbide (in oxide or nitride form), or titanium, stainless steel, and alloys thereof.

[0054] According to another embodiment, the transfer device includes at least one transfer hole, the first chamber is arranged to be connected with the second chamber. It can also include a transfer gate valve suitable for opening and closing the transfer hole. It should be understood that the transfer hole should be designed to allow the reaction unit to pass through alone and / or be connected to the motorized mechanical system (if present).

[0055] The first chamber and the second chamber may be separated by a partition plate common to the two chambers, and the transfer hole may be a through hole of a suitable size formed in the partition plate.

[0056] Alternatively, the two chambers may not be integral with each other, but may be placed adjacent to each other (e.g., stacked or side by side). In this case, the transfer hole may be a through hole through two adjacent walls of the chamber, which are arranged to be directly communicated with each other.

[0057] In general, the first and second chambers can be placed on top of each other, i.e. stacked in the vertical direction, despite the fact that they can be adjacent and / or integral with each other, or separated by other elements, as will be discussed below. This allows reducing the footprint of the transfer device and provides an advantageously compact solution.

[0058] According to various embodiments, the transfer device comprises: (i) a gap formed between a first chamber and a second chamber; (ii) at least one first transfer hole connecting the gap with the first chamber; and (iii) at least one second transfer hole connecting the gap with the second chamber.

[0059] The term "void" thus denotes a closed space separating the first chamber and the second chamber.In a non-limiting example, two walls of the housing may coincide with the walls of the first chamber and the second chamber that are opposite to each other.

[0060] The first and second holes face each other so that the removable reaction unit can be displaced between the first chamber and the second chamber through the first and second holes facing each other and a gap portion therebetween.

[0061] The adjectives "first" and "second" applied to the transfer holes are merely to distinguish the holes formed on the side facing the first chamber and the holes formed on the side facing the second chamber, respectively, and do not mean any other limitation on their number, order or position.

[0062] The transfer device further comprises at least one transfer gate valve adapted to seal the first and / or second transfer aperture.

[0063] Advantageously, each first orifice and each second orifice can be equipped with a gate valve, respectively identified as first and second transfer gate valve (thus depending on the side they face). The transfer device can comprise at least one automatic double sealing system suitable for operating said first and said second transfer gate valve independently of each other.

[0064] This design prevents the second chamber and the first chamber from contaminating each other, especially if / when the two chambers are at different pressures and / or are flushed with a specific gas substance. To this end, it may be particularly advantageous to use a double valve system comprising a first transfer gate valve and a second transfer gate valve that separately close / open the first hole and the second hole, respectively.

[0065] According to an embodiment of the present invention, the second chamber is provided with at least one shelf, which is suitable for supporting one or more removable reaction units. The second chamber may also include a single chamber automation system, which is configured to displace at least one removable reaction unit in the second chamber, and optionally also through a resealable inlet. The resealable inlet connects the second chamber to the surrounding external area of ​​the reactor. The operator can receive the reaction unit through the resealable inlet, to clean the parasitic deposits on the unit or its consumable parts, or to dispose of it.

[0066] One or more shelves, preferably 1 to 10, are used to allow the second chamber to store multiple reaction units. For example, some shelves can be used to store reaction units that should be subjected to PM, while other shelves can store ready-to-use adjustment units to immediately replace the units taken out by PM. For this reason, the shelves can be arranged at different heights according to their use. Each shelf can store more than one reaction unit, preferably 1 to 10.

[0067] The single chamber automation system may include one or more actuators adapted to displace one or more reaction units within the second chamber to place them on a shelf or remove them from the shelf. It may also allow the reaction units to be displaced to / from the outside of each shelf and multi-chamber assembly. In addition, these actuators may advantageously be adapted to collect the reaction units from the motorized mechanical system when the reaction units enter the second chamber and position the reaction units on the shelf.

[0068] In this way, the reaction unit can be transferred from the shelf of the second chamber to the first chamber and vice versa.Similar to the second chamber, the first chamber can also be equipped with one or more shelves and can be provided with its own single chamber automation system.

[0069] The actuators of a single chamber automation system, regardless of which chamber they are used in, may optionally be provided with an end effector adapted to mechanically couple to a reaction cell.

[0070] It should be understood that each shelf and actuator may be integrated or integral with each other.

[0071] Note that the weight of the reaction unit may generally be between 2-15 kg, preferably 2-10 kg, even more preferably 2.5-6 kg.

[0072] The reaction unit may present an overall box-like shape with a rectangular cross-section of 200-400 mm by 30-50 mm and extending 200-500 mm in the longitudinal direction.

[0073] Therefore, the rack should be configured to support a reaction unit having the above-mentioned size and weight.

[0074] Both the actuators of the single-chamber automation system and the inter-chamber actuators should be suitable for handling reaction units of the above-mentioned size and weight.

[0075] Both the actuators of the single-chamber automation system and the inter-chamber actuators can be designed to displace their targets in a horizontal plane (parallel to the floor supporting the transfer device) or in a vertical direction perpendicular to the horizontal plane, depending on the mutual arrangement of chambers and shelves.

[0076] In an embodiment, the multi-chamber assembly according to the invention comprises a heating system configured to heat the second chamber to a temperature of 150-500° C. For example, the heating system may be a resistive heating system.

[0077] The multi-chamber assembly may further include at least one vacuum system configured to generate a vacuum of less than 10 mbar in the second chamber. The vacuum system may also be configured to generate a vacuum of less than 1 mbar, or more preferably less than 10 mbar, in the second chamber. -3 millibar.

[0078] The second chamber may further be provided with at least one gas inlet and at least one gas outlet. The inlet and outlet allow flushing of the second chamber and the reaction unit stored therein with a suitable gas such as a purge gas. The gas inlet and outlet should be connected to a suitable gas circuit, respectively.

[0079] The optional equipment of the second chamber discussed herein, such as the heating system, the vacuum system and / or the gases / inlets and outlets, may be advantageously used to regulate the reaction unit.

[0080] The term "conditioning" refers to various operations or cycles suitable for preparing a reaction unit or component / device prior to insertion into a reactor. Additionally or alternatively, the conditioning operation or cycle may be suitable for making the reaction unit suitable for being accessed and removed from the assembly by an operator or machine to safely remove or clean the components.

[0081] For example, before removing the reaction unit, a vacuum of less than 10 mbar can be generated inside the second chamber and refilled under an inert gas such as argon, nitrogen, helium or xenon. In addition, or in place of the inert gas refill, the reaction unit can be subjected to an inert gas purge, preferably argon.

[0082] An alternative conditioning cycle suitable for carrying out on a new / cleaned reaction unit prior to insertion into the reactor may comprise a step of heating the second chamber to a temperature of 150-500° C. and carrying out a vacuum degassing step (in this case the vacuum should preferably be below 1 mbar, even more preferably below 10 -3 millibar).

[0083] According to still another embodiment, the multi-chamber assembly according to the present invention further includes a third chamber placed in communication with the first chamber through the substrate transfer hole.

[0084] The third chamber is adapted to receive or unload substrate holders from / to the first chamber through the substrate transfer aperture via motorized or manual means.

[0085] The first chamber may optionally include a gate valve adapted to seal the substrate transfer aperture.It may also include one or more substrate shelves.

[0086] The first chamber may further comprise a substrate holder opening adapted to receive a substrate holder from a reaction unit in the reactor, and vice versa. It may be equipped with one or more shelves and automation to appropriately handle and store the substrate holders.

[0087] It will be appreciated that a substrate holder is a device suitable for holding one or more semiconductor substrates upon which epitaxial film deposition occurs.

[0088] The first chamber, the second chamber, and the third chamber may each be connected to the same or different vacuum systems.

[0089] In particular, the third chamber can be a load lock chamber. It can be connected to a heating and / or cooling system and can be adapted to condition the substrate before use or removal. It should be understood that the third chamber can be further provided with an opening, a gate valve and an optional automation system for handling substrate holders or substrates and for appropriately sealing the third chamber. The handling can include any displacement of the interior of the reactor, and / or the outside surrounding area of ​​the multi-chamber assembly open to the air.

[0090] The substrate handling automation system may be equipped with an end effector adapted to mechanically couple with the substrate holder. These may advantageously be made of silicon carbide, borosilicate glass, sapphire glass or quartz to avoid contamination of the substrate.

[0091] The multi-chamber assembly including the third chamber allows handling of the substrate holders of the reaction chambers and the removable reaction units, providing a unique space efficient compact solution. In case of using an automated system the solution according to the invention does not require operator presence and / or manual intervention.

[0092] It should be understood that in the above-described embodiments, the substrate holder and the handling of the reaction unit should be arranged so as not to interfere with each other.

[0093] In a second aspect, the present invention relates to a reactor assembly for displacing and handling a reaction unit to perform preventative reactor maintenance operations.

[0094] The reactor assembly is characterized by, but not limited to: (i) a reactor for epitaxially depositing semiconductor films on a substrate, comprising a reaction chamber having a reaction unit, the reaction unit being removable as a whole from a sensitive housing; (ii) a multi-chamber assembly according to any of the embodiments described above; and (iii) an automated handler for handling the removable reaction unit.

[0095] The automated handling machine is provided with a selective handling assembly including a first end effector and a second end effector, which are respectively engaged with the removable reaction unit and the substrate holder so as not to interfere with each other.

[0096] Specifically, the first end effector is configured to mechanically couple with the removable reaction unit to displace the removable reaction unit along the longitudinal direction (x); and the second end effector is adapted to mechanically couple with the substrate holder to displace the substrate holder along the longitudinal direction.

[0097] For example, the first and / or second end effector may be a gripper, such as a rod, a prong, a fork, a spade, or a combination thereof.

[0098] To bear the weight of the reaction unit, the first end effector can be a metal or ceramic material, such as aluminum or silicon carbide in oxide or nitride form, or titanium, stainless steel and their alloys. The second end effector can be made of silicon carbide, borosilicate glass, sapphire glass or quartz to avoid substrate contamination.

[0099] Furthermore, the selective handling assembly comprises at least a first actuator adapted to displace the first and second end effectors in a longitudinal direction from an extended position to a retracted position and vice versa.

[0100] The first end effector is designed to remove or insert a removable reaction unit from or into the reactor. Advantageously, the first actuator can displace the reaction unit between a reaction chamber and a multi-chamber assembly in the reactor, preferably corresponding to the first chamber, even more preferably corresponding to the reaction unit opening.

[0101] The second end effector is adapted to remove the substrate holder from or insert it into the removable reaction unit, in particular when the reaction unit is located within a reaction chamber inside the reactor.

[0102] The presence of a reactor assembly integrating a multi-chamber assembly and an epitaxial reactor prevents exposure of the reaction unit to air during removal from and insertion into the reactor, and the presence of an automated handling device provides a fully automated process that can reduce reactor downtime by up to 70%.

[0103] The reactor may be suitable for epitaxial deposition of semiconductor films, preferably Si, SiC or GaN, on a substrate. In a non-limiting example, it may be a hot wall cross-flow reactor.

[0104] The reactor may advantageously comprise an insulation system having one or more insulation components forming the outer shell of the reaction chamber. It may also comprise a liner adapted to conduct the process gas in the reaction unit and connected thereto by releasable coupling means.

[0105] The reactor may be protected by a housing, such as a double-walled quartz tube, allowing a cooling fluid to flow in the space between its two walls. It will be apparent to one of ordinary skill in the art that other elements commonly used in reactors such as those described above may and should be present.

[0106] One or more induction coils may be located external to the reactor in order to heat the sensitive housing or reaction chamber, thereby directly or indirectly heating the reaction cell enclosed therein.

[0107] The illustrations presented herein are not meant to be actual views of any particular material, structure or equipment, but are merely idealized representations for describing embodiments of the present disclosure. Specifically, they are not intended to limit the scope of these aspects and embodiments in any way. In fact, for the sake of brevity, the traditional manufacture, connection, preparation and other functional aspects of the system may not be described in detail. In addition, the connecting lines shown in each figure are intended to represent exemplary functional relationships and / or physical connections between various elements. Many alternative or additional functional relationships or physical connections may exist in actual systems, and / or may not exist in some embodiments.

[0108] Figure 1 Schematically shown is an open view of an embodiment of a multi-chamber assembly 10 according to the invention. The multi-chamber assembly is suitable for handling and storage of removable deposition units 1000. These units are designed to be taken out in one piece from an epitaxial reactor for depositing semiconductor films on substrates.

[0109] The multi-chamber assembly includes a first chamber 100 , a second chamber 200 , and a transfer device 400 .

[0110] The first chamber has an opening 110, identifiable as a "transfer unit opening", connected or connectable to the reactor. This opening may be equipped with a gate valve and is suitable for receiving / unloading a reaction unit from / to the reaction chamber of the reactor.

[0111] Transfer device 400 is connected to the first chamber, in which case the transfer device is integrated in the first chamber, and specifically integrated in one of its walls. In the present embodiment, the transfer device is a hole in which the first chamber is arranged to be communicated with the second chamber. The hole allows the reaction unit to be displaced between the first chamber and the second chamber, and is therefore referred to as a "transfer hole". It can be opened or closed with a gate valve (not shown), referred to as a "transfer gate valve".

[0112] The second chamber 200 is designed to store and condition the reaction unit. It comprises a resealable access port 210, which is suitable for removal and insertion of the reaction unit by an operator or an automated system.

[0113] The multi-chamber assembly is provided with a motorized mechanical system 500 comprising an inter-chamber actuator adapted to grasp a removable reaction unit and displace it from a first chamber to a second chamber and / or vice versa via a transfer device.

[0114] The second chamber is provided with two shelves 252, 254 capable of supporting the reaction unit. The single chamber automation system 550 is configured to displace the reaction unit in the second chamber, and specifically grab the reaction unit from the motorized mechanical system and place it on the shelves, and vice versa. The single chamber automation system is also designed to move the reaction unit into and out of the resealable entrance 210. The entrance sets the second chamber in communication with the external environment. It allows the operator to subsequently carry the reaction unit for cleaning or disposal.

[0115] The single room automation system 550 includes two actuators, each coupled to a shelf.

[0116] The second chamber is equipped with a resistive heating system 700 configured to heat the second chamber to a temperature of 150-500° C. The second chamber also comprises an inlet 202 and an outlet 204 for flowing a selected gas. Thus, the second chamber is suitable for the regulation of the reaction unit.

[0117] The first chamber is also equipped with a shelf 152 and a single chamber automation system 555 configured to displace a reaction unit within the first chamber.

[0118] Figure 2 Another embodiment of a multi-chamber assembly 10 according to the present invention is schematically shown, which adopts Figure 1 The same open views and the same reference numerals are used for the same or equivalent functional features.

[0119] This embodiment and Figure 1 The embodiment described in is different in that the transfer device 400 is a housing defining a void 405 between the first chamber and the second chamber.

[0120] A "first transfer hole" 450, ie, a hole opening toward the first chamber and suitable for transferring the reaction unit, connects the first chamber with the gap.

[0121] A "second transfer hole" 455, i.e., a hole opening toward the second chamber and suitable for transferring the reaction unit, connects the gap to the second chamber and directly faces the first transfer hole. Because the first and second holes face each other, the reaction unit can be linearly displaced through the two holes without difficulty.

[0122] The transfer device further comprises at least one transfer gate valve 600 adapted to seal the first and second transfer holes. However, it is preferred to use one gate valve per transfer hole and to operate them independently of each other.

[0123] Figure 3 Another embodiment of a multi-chamber assembly 10 according to the present invention is schematically shown, which adopts Figure 1 and Figure 2 The same open views and the same reference numerals are used for the same or equivalent functional features.

[0124] In this embodiment, the multi-chamber assembly further comprises a third chamber 300 placed in communication with the first chamber 100 via a substrate transfer aperture 310 adapted to allow passage of a substrate holder (and any automated device configured to displace the holder, if present).

[0125] The third chamber (only a portion of which is shown here) is adapted to store and optionally condition and / or cool the substrate before it enters the reactor or after a deposition process.

[0126] Furthermore, the first chamber comprises two transfer unit openings 110, 130. These openings may each be equipped with a gate valve (not shown) and are suitable for receiving / unloading reaction units from / to the reaction chamber of the reactor. They may be connected or connectable to the epitaxial reactor.

[0127] The first chamber comprises a substrate holder opening 120 suitable for displacing a substrate holder between the multi-chamber assembly and the reactor, or an additional enclosed area connected or connectable thereto.

[0128] The first chamber also comprises two shelves 152, 154 for supporting the reaction cells. It comprises an additional shelf, the substrate holder shelf 156, which allows the placement of substrate holders before transferring them to the reactor or the third chamber.

[0129] In this embodiment, motorized mechanical system 500 includes two linear interchamber actuators.

[0130] Thus, the transfer device 400 includes a gap 405 placed between the first chamber and the second chamber, and two "first transfer holes" 450, 460 connecting the gap with the first chamber. It also includes two "second transfer holes" 455, 465 connecting the gap with the second chamber. The "first transfer holes" 450, 460 face the "second transfer holes" 455, 465.

[0131] In this case, each of the first and second holes can be equipped with a "first transfer gate valve" 610, 620 and a "second transfer gate valve" 615, 625, respectively, to seal each transfer hole individually independently of each other. To this end, it is convenient to implement at least one automatic double sealing system, which is suitable for operating these first and second transfer gate valves independently of each other.

[0132] The subject matter of the present disclosure includes all novel and nonobvious combinations and subcombinations of the various processes, systems and configurations, and other features, functions, acts, and / or properties disclosed herein, as well as any and all equivalents thereof.

[0133] In the description and claims of the present application, the word "comprise" and variations thereof, such as "comprising", do not exclude the presence of other additional elements, components or stages.

[0134] The discussion of documents, contracts, materials, devices, articles etc. is included in the text solely for the purpose of providing a background to the present invention; however, it should not be construed that such material or parts thereof constitute common general knowledge in the field relevant to the present invention before the priority date of each claim attached to this application.

Claims

1. A multi-chamber assembly (10) for transporting at least one removable reaction unit (1000) of an epitaxial reactor, comprising: - a first chamber (100) comprising at least one opening (110, 130) suitable for receiving or unloading a reaction unit from / to the epitaxial reactor; - a second chamber (200) for storing one or more removable reaction units, provided with a resealable access port (210) suitable for removal and insertion of the reaction units by an operator or an automated system; as well as - a transfer device (400) connecting the first chamber with the second chamber; The reaction unit is suitable for epitaxially depositing a semiconductor film on a substrate.

2. The multi-chamber assembly according to the preceding claim further comprises a motorized mechanical system (500), which comprises at least one inter-chamber actuator suitable for grasping the removable reaction unit and displacing the removable reaction unit from the first chamber to the second chamber via the transfer device, and / or vice versa.

3. A multi-chamber assembly according to any one of the preceding claims, wherein: The transfer device includes at least one transfer hole and at least one transfer gate valve adapted to open and close the at least one transfer hole.

4. The multi-chamber assembly according to claim 1 or 2, wherein: The transfer device comprises: - a closed gap (405) between said first chamber and said second chamber; - at least one first transfer hole (450, 460) connecting the void with the first chamber; at least one second transfer hole (455, 465) connecting the void with the second chamber and facing the at least one first transfer hole; and - At least one transfer gate valve (600) adapted to seal the first and / or second transfer orifice.

5. The multi-chamber assembly of claim 4, wherein: The at least one first hole (450, 460) and the at least one second hole (455, 465) are each equipped with a transfer gate valve (610, 620, 615, 625); the transfer device includes at least one automatic double sealing system suitable for operating each of the transfer gate valves independently of each other.

6. A multi-chamber assembly according to any one of the preceding claims, wherein: The second chamber is provided with at least one shelf (252, 254) adapted to support at least one removable reaction unit; the second chamber further comprises a single chamber automation system (550) configured to displace at least one removable reaction unit within the second chamber and optionally through the resealable access port.

7. The multi-chamber assembly according to any one of the preceding claims, further comprising a heating system (700) configured to heat the second chamber to a temperature of 150-500°C.

8. The multi-chamber assembly of claim 7, wherein: The heating system is a resistance heating system.

9. The multi-chamber assembly of any one of the preceding claims, further comprising a vacuum system configured to create a vacuum of less than 10 mbar in the second chamber.

10. The multi-chamber assembly of claim 9, wherein: The vacuum system is configured to generate less than 1 mbar, preferably less than 10 -3 mbar vacuum.

11. A multi-chamber assembly according to any one of the preceding claims, wherein: The second chamber is also provided with at least one gas inlet (202) and at least one gas outlet (204).

12. A multi-chamber assembly according to any one of the preceding claims, wherein: The motorized mechanical system includes a linear actuator provided with an end effector.

13. A multi-chamber assembly according to any one of the preceding claims, wherein: - the first chamber comprises a substrate transfer aperture (310) adapted to transfer a substrate holder supporting a substrate; - the multi-chamber assembly further comprises a third chamber (300) which is placed in communication with the first chamber through the substrate transfer hole; and - The third chamber is adapted to receive or unload substrate holders from / to the first chamber through the substrate transfer aperture via motorized or manual means.

14. A reactor assembly for displacing and transporting a reaction unit for preventive maintenance operations, comprising: - a reactor for epitaxial deposition of semiconductor films on a substrate, comprising a reaction chamber with a reaction unit which can be removed in its entirety from a sensitive housing; - A multi-chamber assembly (10) according to any one of claims 1 to 13; -Automatic handling machine for handling reaction units; Wherein, the reactor extends along the longitudinal direction (x), and the automated handling machine is provided with a selective handling assembly, the selective handling assembly comprising: - a first end effector adapted to be mechanically coupled to the reaction unit for displacing the reaction unit along the longitudinal direction (x); - a second end effector adapted to mechanically couple with the substrate holder to displace the substrate holder along the longitudinal direction (x); Therein, the selective handling assembly comprises at least a first actuator adapted to displace the first and second end effectors in a longitudinal direction from an extended position to a retracted position and vice versa; the second end effector adapted to remove the substrate holder from or insert it into a removable reaction unit; and the first end effector adapted to remove the reaction unit from or insert it into a reactor.

Images