Preparation device and preparation process of white carbon black

Abstract

The invention discloses a preparation device and a preparation process of white carbon black, and relates to the technical field of white carbon black preparation. The white carbon black preparation device comprises a magnetic separation part, a chemical cleaning part with an opening in the top and a separation part, a powder conveying structure is arranged on the surface of the magnetic separation part, the magnetic separation part is further provided with a magnetic separation area state monitoring module, and the magnetic separation area state monitoring module is used for obtaining operation data of a magnetic separation area. Transmitting the operation data to a data processing center, and judging whether the operation of the magnetic separation area is normal or not by the data processing center; a particle uniform mixing structure is arranged in the chemical cleaning part, a cleaning state monitoring module is further arranged in the chemical cleaning part, an annular screen is fixedly connected to the inner side wall of the separation part, and a filter screen is further fixedly connected to an outlet of the separation part. Especially chemical purification and magnetic separation purification cause poor purification effect.

Description

Technical Field

[0001] The present invention relates to the technical field of silica preparation, and specifically to a silica preparation device and its preparation process. Background Art

[0002] During the production process of silica, various pipelines and furnaces will introduce impurities, and sometimes these impurities will enter the finished silica. In severe cases, sludge will be formed. Although the silica content in this sludge is relatively high, in order to ensure the quality of silica, it has to be discarded, resulting in a large waste of silica resources.

[0003] The Chinese utility model patent with the publication number CN209128045U discloses a purification device for silica sludge, including a sludge tank, which is connected to a first water washing tank through a pipeline, the first water washing tank is connected to a second water washing tank through a pipeline, the second water washing tank is connected to a filter press through a pipeline, a drying and flash evaporation device is arranged on one side of the filter press, a pulverizer is arranged on one side of the drying and flash evaporation device, and a packaging machine is arranged on one side of the pulverizer. The filter press is connected to the drying and flash evaporation device, the drying and flash evaporation device is connected to the pulverizer, and the pulverizer is connected to the packaging machine through conveyors. The present invention cleans the silica sludge through two water washing tanks, roughly filters the silica sludge through a first filter screen, and finely filters the silica suspension through a second filter screen, effectively removing some impurities that do not undergo chemical reactions and improving the purity of silica.

[0004] However, the existing technology has the problem that it is inconvenient to perform multiple purifications, especially chemical purification and magnetic separation purification, resulting in poor purification effects. Summary of the Invention

[0005] Aiming at the deficiencies of the existing technology, the present invention provides a silica preparation device and its preparation process, which solves the problem that the existing technology is inconvenient to perform multiple purifications, especially chemical purification and magnetic separation purification, resulting in poor purification effects.

[0006] To achieve the above objectives, the present invention is realized through the following technical solutions: A silica preparation device and its preparation process, including a preparation tank, the preparation tank includes a magnetic separation part, a chemical cleaning part with an opening at the top, and a separation part, the magnetic separation part is fixedly connected to the bottom of the chemical cleaning part, and the separation part is fixedly connected to the bottom of the chemical cleaning part;

[0007] A powder conveying structure is arranged on the surface of the magnetic separation part. The powder conveying structure is used to convey silica white powder into the interior of the magnetic separation part, and magnetic separation is carried out by a magnetic substance cleaning component arranged inside the magnetic separation part to screen out magnetic substances in the silica white powder. The powder conveying structure is also used to convey the silica white powder from which magnetic substances have been screened to an external slurry preparation device; A magnetic separation area status monitoring module is also arranged on the magnetic separation part. The magnetic separation area status monitoring module is used to obtain the operation data of the magnetic separation area and transmit the operation data to a data processing center, and the data processing center determines whether the magnetic separation area operates normally;

[0008] A particle mixing structure is arranged inside the chemical cleaning part. A first drain valve is fixedly connected to the bottom of the chemical cleaning part. The outlet of the first drain valve is communicated with the interior of the chemical cleaning part. A sampling pipe is arranged inside the chemical cleaning part. The output end of the sampling pipe is connected to a slurry parameter monitoring module. The slurry parameter monitoring module is used to obtain slurry parameters and transmit the slurry parameters to a data processing center, and the data processing center determines the slurry chemical treatment solution according to the slurry parameters; A cleaning status monitoring module is also arranged inside the chemical cleaning part. The cleaning status monitoring module is used to monitor whether the internal status of the chemical cleaning part is normal when the slurry is chemically cleaned; A second drain valve is fixedly connected to the bottom of the magnetic separation part. The outlet of the second drain valve is communicated with the separation part. An annular screen is fixedly connected to the inner side wall of the separation part, and a filter screen is also fixedly connected at the outlet of the separation part.

[0009] Further, the particle mixing structure includes a driving motor, a rotating pipe, and stirring rods fixedly connected to the rotating pipe. The driving motor is fixedly connected to the top of the chemical cleaning part. The end of the output shaft of the driving motor movably penetrates the top of the chemical cleaning part and is fixedly connected to one end of the rotating pipe. The other end of the rotating pipe is movably connected to the bottom of the chemical cleaning part; A liquid blowing pipe is fixedly connected inside the rotating pipe. The liquid outlet of the liquid blowing pipe is arranged at the bottom of the rotating pipe and extends to the outside of the rotating pipe. A liquid pumping pump fixedly connected to the liquid inlet of the liquid blowing pipe is fixedly connected to the top of the rotating pipe. The liquid inlet end of the liquid pumping pump is provided with a liquid pumping structure.

[0010] Further, the liquid pumping structure includes a liquid pumping pipe. The liquid pumping pipe is fixedly connected to the end of the stirring rod. One end of the liquid pumping pipe is fixedly connected to a storage frame. The end of the storage frame away from the liquid pumping pipe is fixedly connected to the liquid inlet end of the liquid pumping pump. A filter screen is arranged at the connection between the storage frame and the liquid inlet end of the liquid pumping pump. Leakage holes are formed in the bottom of the storage frame. A hole plate is also movably connected to the bottom of the storage frame. The hole plate is fixedly connected to an electric push rod, and the electric push rod is fixedly connected to the rotating pipe.

[0011] Furthermore, the powder conveying structure includes a powder blowing pipe. One end of the powder blowing pipe is connected to the horizontal pipe through a first electromagnetic valve. The horizontal pipe fixedly penetrates the magnetic separation part and extends into the interior of the magnetic separation part. A second electromagnetic valve is fixedly connected to the surface of the horizontal pipe. A through column is fixedly connected to the bottom of the rotating pipe. The through column is connected to the bottom of the chemical cleaning part through a sealed bearing. The bottom of the through column extends into the interior of the magnetic separation part. A conveying pipe is fixedly connected to the bottom of the through column. A third electromagnetic valve is fixedly connected to the surface of the conveying pipe through an extension pipe. The extension pipe is communicated with the interior of the conveying pipe. The conveying pipe is movably connected to the magnetic separation part through a sealed bearing. One end of the conveying pipe away from the extension pipe penetrates the magnetic separation part and the filter screen. An air extraction pump and an air supply pump are respectively fixedly connected to the end of the conveying pipe.

[0012] Furthermore, the magnetic substance cleaning component includes multiple groups of electromagnetic structures. Each group of electromagnetic structures includes multiple electromagnets fixedly and evenly arrayed on the surface of the conveying pipe. Two electromagnets in adjacent two groups of electromagnetic structures are staggeredly distributed. The magnetic substance cleaning component further includes a connecting rod. An electromagnetic column is fixedly connected to the surface of the connecting rod.

[0013] Furthermore, the magnetic separation area state monitoring module includes a magnetic force detector and a wind force detector. The magnetic force detector and the wind force detector are both arrayed inside the magnetic separation part. The slurry parameter monitoring module includes a laser particle size analyzer, X-ray fluorescence spectrometry, a pH meter, and a conductivity meter. The laser particle size analyzer is used to obtain the particle size distribution of silica in the slurry. The X-ray fluorescence spectrometry is used to obtain the types and contents of impurities in the slurry. The pH meter is used to obtain the pH value of the slurry. The conductivity meter is used to obtain the conductivity of the slurry. An infrared spectrometer and a rotational viscometer are also included. The infrared spectrum is used to obtain the content of silanol groups on the surface of silica. The rotational viscometer is used to obtain the viscosity of the slurry. The cleaning state monitoring module includes a temperature sensor and a gas content detector. The temperature sensor and the gas content detector are both arrayed inside the chemical cleaning part.

[0014] A preparation process of silica, used for the above-mentioned silica preparation device, includes the following steps: Start the equipment. The magnetic separation area state monitoring module obtains the magnetic separation operation data of the magnetic separation part. The data processing center analyzes the magnetic separation operation data to judge whether the operation state of the magnetic separation area is normal. If it is not normal, stop the machine for inspection. The operation data includes the magnetic force distribution sFc and the gas flow velocity distribution sVc. If it is normal, the silica powder containing silica is introduced into the interior of the magnetic separation part through the powder blowing pipe in the powder conveying structure. The magnetic substance cleaning component filters and purifies the magnetic column impurities. After the filtration is completed, the magnetic impurities are discharged through the horizontal pipe.

[0015] Inject slurry into the interior of the chemical cleaning section. Before chemical purification, monitor the parameters of the slurry through a slurry parameter monitoring module to obtain slurry parameters, where the slurry parameters include slurry cleaning characteristic parameters and anti-agglomeration parameters. The slurry cleaning characteristic parameters include the particle size distribution sLc of silica white, the content sZ of various impurities a , the pH value sP of the slurry, the conductivity sD of the slurry, the specific surface area sB of silica white. The anti-agglomeration parameters include the particle size distribution of silica white, the specific surface area of silica white, the pH value of the slurry, the content of surface silanol groups on silica white, the ionic strength, and the viscosity of the slurry. a is the type number of impurities;

[0016] The data processing center matches the pickling solution parameters and the caustic washing solution parameters based on the slurry cleaning characteristic parameters, and matches the anti-agglomeration solution parameters based on the anti-agglomeration parameters; prepare the pickling solution and the caustic washing solution based on the pickling solution parameters and the caustic washing solution parameters, and prepare the anti-agglomeration solution based on the anti-agglomeration solution parameters;

[0017] Chemically clean and purify the slurry based on the pickling solution, the caustic washing solution, and the anti-agglomeration solution to obtain the slurry after chemical cleaning and purification. During the process of chemical cleaning and purification, the cleaning state monitoring module obtains cleaning state data, and the data processing center judges whether the cleaning process is abnormal based on the cleaning state data. The cleaning state data includes the temperature distribution stc and the gas content data sQ b , b is the type number of gases;

[0018] Discharge the slurry after chemical cleaning and purification into the magnetic separation section for secondary magnetic separation and purification; after secondary magnetic separation and purification, discharge it into the separation section for impurity separation and purification.

[0019] Furthermore, the data processing center analyzes the magnetic separation operation data to judge whether the operation state of the magnetic separation area is normal, including the following steps: obtain the operation reference data stored in the database, where the operation reference data includes the magnetic force reference distribution cFc and the gas flow rate reference distribution cVc; obtain the operation evaluation coefficient yp based on the operation data and the operation reference data:

[0020] yp = σ(sFc, cFc) + σ(sVc, cVc)

[0021] where σ(sFc, cFc) is the similarity function of sFc and cFc, and σ(sVc, cVc) is the similarity function of sVc and cVc;

[0022] If the operation evaluation coefficient yp is greater than the operation evaluation threshold stored in the database, the operation state of the magnetic separation area is abnormal, otherwise it is normal.

[0023] Further, based on the slurry cleaning characteristic parameters, the pickling solution parameters and the caustic washing solution parameters are matched, including the following steps: Obtain the various slurry cleaning characteristic calibration parameters stored in the database. The slurry cleaning characteristic calibration parameters include the first silica white particle size calibration distribution cLc i , the calibration content cZ of various impurities ia , the first slurry calibration pH value cP i , the slurry calibration conductivity cD i , the first silica white calibration specific surface area cB i , where i is the number of the slurry cleaning characteristic calibration parameters; Compare the slurry cleaning characteristic parameters with each slurry cleaning characteristic calibration parameter to obtain each slurry cleaning characteristic comparison coefficient Tb i :

[0024]

[0025] where σ(sLc, cLc i ) is the similarity function of sLc and cLc i , and A is the total number of impurity types;

[0026] Determine the minimum slurry cleaning characteristic comparison coefficient, and obtain the pickling solution parameters and the caustic washing solution parameters corresponding to the slurry cleaning characteristic calibration parameter corresponding to this slurry cleaning characteristic comparison coefficient in the database;

[0027] Based on the anti-agglomeration parameters, the anti-agglomeration solution parameters are matched, including the following steps: Obtain the various anti-agglomeration calibration parameters stored in the database. The anti-agglomeration calibration parameters include the second silica white particle size calibration distribution clc j , the second silica white calibration specific surface area cb j , the second slurry calibration pH value cp j , the calibration content cG of the silicon hydroxyl groups on the silica white surface j , the ion calibration strength cQ j , and the slurry calibration viscosity cN j , where j is the number of the anti-agglomeration calibration parameters; Compare the anti-agglomeration parameters with each anti-agglomeration calibration parameter to obtain each anti-agglomeration comparison coefficient Jb j :

[0028] Jb j =σ(sLc, clc j )+|sP - cp j |+|sG - cG j |+|sB - cb j |+|sQ - cQ j |+|sN - cN j |

[0029] Determine the minimum anti-aggregation ratio coefficient, and obtain the anti-aggregation solution parameters corresponding to the anti-aggregation calibration parameters corresponding to this anti-aggregation ratio coefficient in the database.

[0030] Further, determine whether the cleaning process is abnormal based on the cleaning status data, including the following steps: Obtain the cleaning status calibration data stored in the database, and the cleaning status calibration data includes the temperature calibration distribution ctc and the gas content calibration data cQ b ; Obtain the cleaning status operation evaluation coefficient xp based on the cleaning status data and the cleaning status calibration data:

[0031]

[0032] Among them, σ(stc, ctc) is the similarity function of stc and ctc, and B is the total number of gas types;

[0033] If the cleaning status operation evaluation coefficient xp is greater than the cleaning status operation evaluation threshold stored in the database, the cleaning status operation status is abnormal, otherwise it is normal.

[0034] The present invention has the following beneficial effects:

[0035] (1). For the preparation device of this silica, by setting the chemical cleaning part, the magnetic separation part and the separation part, multiple purifications of the silica are realized, and the corresponding cleaning solution can be matched according to the characteristics of the silica to achieve an effective chemical reaction, thereby improving the purification effect.

[0036] (2). For the preparation process of this silica, the characteristics of the silica slurry and the operation status of the equipment can be learned, so that different preparation schemes can be effectively formulated for various different silica slurries to achieve effective purification.

[0037] Of course, it is not necessary for any product implementing the present invention to simultaneously achieve all the above-mentioned advantages. Description of the Drawings

[0038] Figure 1 It is the overall structure schematic diagram of the preparation device of the silica of the present invention.

[0039] Figure 2 It is the internal structure schematic diagram of the preparation tank of the preparation device of the silica of the present invention.

[0040] Figure 3 It is the internal structure schematic diagram of the rotating tube of the preparation device of the silica of the present invention.

[0041] Figure 4 It is the internal structure schematic diagram of the storage frame of the preparation device of the silica of the present invention.

[0042] Figure 5This is a schematic structural diagram of the orifice plate of the preparation device of the silica white of the present invention.

[0043] Figure 6 This is a schematic structural diagram of the second solenoid valve of the preparation device of the silica white of the present invention.

[0044] Figure 7 This is a process flow chart of the preparation of silica white of the present invention.

[0045] In the figure, 1 is a preparation tank; 101 is a magnetic separation part; 102 is a chemical cleaning part; 103 is a separation part; 2 is a first drain valve; 3 is a sampling pipe; 4 is a second drain valve; 5 is an annular sieve; 6 is a filter screen; 7 is a drive motor; 8 is a rotating pipe; 9 is a stirring rod; 10 is a liquid blowing pipe; 11 is a liquid pumping pump; 12 is a liquid pumping pipe; 13 is a storage frame; 14 is a leakage hole; 15 is an orifice plate; 16 is an electric push rod; 17 is a powder blowing pipe; 18 is a first solenoid valve; 19 is a horizontal pipe; 20 is a second solenoid valve; 21 is a through column; 22 is a conveying pipe; 23 is an extension pipe; 24 is a third solenoid valve; 25 is an air extraction pump; 26 is an air supply pump; 27 is an electromagnet; 28 is a connecting rod; 29 is an electromagnetic column; 30 is a magnetic force detector; 31 is a wind force detector. Detailed implementation manners

[0046] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0047] In the description of the present invention, it should be understood that the terms "opening", "upper", "lower", "thickness", "top", "middle", "length", "inner", "periphery", etc. indicating orientation or positional relationships are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the components or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the present invention.

[0048] Please refer to Figures 1-6 , an embodiment of the present invention provides a technical solution: a preparation device for silica white and its preparation process, including a preparation tank 1, the preparation tank 1 includes a magnetic separation part 101, a chemical cleaning part 102 with an opening at the top and a separation part 103, the magnetic separation part 101 is fixedly connected to the bottom of the chemical cleaning part 102, and the separation part 103 is fixedly connected to the bottom of the chemical cleaning part 102;

[0049] A powder conveying structure is arranged on the surface of the magnetic separation unit 101. The powder conveying structure is used to convey the silica white powder into the interior of the magnetic separation unit 101, and magnetic separation is carried out by a magnetic substance cleaning component arranged inside the magnetic separation unit 101 to screen out the magnetic substances in the silica white powder. The powder conveying structure is also used to convey the silica white powder from which the magnetic substances have been screened out to an external slurry preparation device; a magnetic separation area status monitoring module is also arranged on the magnetic separation unit 101. The magnetic separation area status monitoring module is used to obtain the operation data of the magnetic separation area and convey the operation data to a data processing center, and the data processing center determines whether the magnetic separation area operates normally;

[0050] A particle mixing structure is arranged inside the chemical cleaning unit 102. A first drain valve 2 is fixedly connected to the bottom of the chemical cleaning unit 102. The outlet of the first drain valve 2 is communicated with the interior of the chemical cleaning unit 102. A sampling pipe 3 is arranged inside the chemical cleaning unit 102. The output end of the sampling pipe 3 is connected to a slurry parameter monitoring module. The slurry parameter monitoring module is used to obtain the slurry parameters and convey the slurry parameters to a data processing center, and the data processing center determines the slurry chemical treatment solution according to the slurry parameters; a cleaning status monitoring module is also arranged inside the chemical cleaning unit 102. The cleaning status monitoring module is used to monitor whether the internal status of the chemical cleaning unit 102 is normal when the slurry is chemically cleaned; a second drain valve 4 is fixedly connected to the bottom of the magnetic separation unit 101. The outlet of the second drain valve 4 is communicated with the separation unit 103. An annular screen 5 is fixedly connected to the inner side wall of the separation unit 103. A filter screen 6 is also fixedly connected at the outlet of the separation unit 103.

[0051] After the second drain valve 4 is opened, the solution after magnetic separation and purification flows along the inside of the separation unit 103. The annular screen 5 and the filter screen 6 can screen out the remaining large particle impurities and retain them inside the separation unit 103 to achieve the last step of purification.

[0052] Specifically, the particle mixing structure includes a driving motor 7, a rotating pipe 8, and stirring rods 9 fixedly connected to the rotating pipe 8. The driving motor 7 is fixedly connected to the top of the chemical cleaning unit 102. The end of the output shaft of the driving motor 7 movably penetrates the top of the chemical cleaning unit 102 and is fixedly connected to one end of the rotating pipe 8. The other end of the rotating pipe 8 is movably connected to the bottom of the chemical cleaning unit 102; a liquid blowing pipe 10 is fixedly connected inside the rotating pipe 8. The liquid outlet of the liquid blowing pipe 10 is arranged at the bottom of the rotating pipe 8 and extends to the outside of the rotating pipe 8. A liquid pumping pump 11 fixedly connected to the liquid inlet of the liquid blowing pipe 10 is fixedly connected to the top of the rotating pipe 8. The liquid inlet end of the liquid pumping pump 11 is provided with a liquid pumping structure.

[0053] Specifically, the liquid extraction structure includes a liquid extraction pipe 12, which is fixedly connected to the end of the stirring rod 9. One end of the liquid extraction pipe 12 is fixedly connected to the storage frame 13. The end of the storage frame 13 away from the liquid extraction pipe 12 is fixedly connected to the liquid inlet end of the liquid extraction pump 11. A filter screen is provided at the connection between the storage frame 13 and the liquid inlet end of the liquid extraction pump 11. A material leakage hole 14 is opened at the bottom of the storage frame 13. A hole plate 15 is also movably connected to the bottom of the storage frame 13. The hole plate 15 is fixedly connected to the electric push rod 16, and the electric push rod 16 is fixedly connected to the rotating pipe 8.

[0054] In this implementation, after injecting the slurry into the chemical cleaning section 102, the prepared acidic solution is then injected into the chemical cleaning section 102. The drive motor 7 is started to drive the rotation of the rotating pipe 8, and then the stirring rod 9 rotates, realizing the full mixing of the slurry and the pickling solution. Since the impurities have a certain gravity, they will settle naturally. The liquid extraction pump 11 is started to extract liquid through the liquid extraction pipe 12. The liquid extraction pipe 12 sucks the particles at the bottom of the chemical cleaning section 102 into the storage frame 13. The liquid enters the liquid extraction pump 11 through the filter screen and is discharged through the liquid blowing pipe 10, blowing the particles towards the liquid extraction pipe 12.

[0055] After a period of time, the electric push rod 16 drives the hole plate 15 to move, so that the holes on the hole plate 15 correspond to the material leakage holes 14, allowing the filtered particles to fall and mix with the solution again, realizing stirring and pickling. After pickling, alkali washing is carried out, and an anti-agglomeration solution is added during pickling and alkali washing to prevent agglomeration.

[0056] Specifically, the powder conveying structure includes a powder blowing pipe 17. One end of the powder blowing pipe 17 is connected to the horizontal pipe 19 through the first electromagnetic valve 18. The horizontal pipe 19 fixedly penetrates through the magnetic separation section 101 and extends into the magnetic separation section 101. A second electromagnetic valve 20 is fixedly connected to the surface of the horizontal pipe 19. A through column 21 is fixedly connected to the bottom of the rotating pipe 8. The through column 21 is connected to the bottom of the chemical cleaning section 102 through a sealed bearing. The bottom of the through column 21 extends into the magnetic separation section 101. A conveying pipe 22 is fixedly connected to the bottom of the through column 21. A third electromagnetic valve 24 is fixedly connected to the surface of the conveying pipe 22 through an extension pipe. The extension pipe 23 is communicated with the inside of the conveying pipe 22. The conveying pipe 22 is movably connected to the magnetic separation section 101 through a sealed bearing. The end of the conveying pipe 22 away from the extension pipe 23 penetrates through the magnetic separation section 101 and the filter screen 6. An air extraction pump 25 and an air supply pump 26 are respectively fixedly connected to the ends of the conveying pipe 22.

[0057] In addition, a suction pipe can also be provided on the conveying pipe 22 through a fourth electromagnetic valve. After the large particle impurities are retained on the annular screen 5 and the filter screen 6 in the separation section 103, the fourth electromagnetic valve is opened, and hot air is sent in through the air supply pump 26 to dry the impurities, and then the impurities can be sucked away through the air extraction pump 25.

[0058] Specifically, the magnetic substance cleaning component includes multiple groups of electromagnetic structures. Each group of electromagnetic structures includes multiple electromagnets 27 fixedly and evenly arrayed on the surface of the conveying pipe 22. The two electromagnets 27 in adjacent two groups of electromagnetic structures are staggeredly distributed. The magnetic substance cleaning component further includes a connecting rod 28, and an electromagnetic column 29 is fixedly connected to the surface of the connecting rod 28.

[0059] In this embodiment, when the first solenoid valve 18 is opened and multiple second solenoid valves 20 on the horizontal pipe 19 are all opened, the silica white powder can enter the interior of the magnetic separation part 101 through the powder blowing pipe 17, the first solenoid valve 18, and the second solenoid valves 20. Additionally, the driving motor 7 is also started synchronously. The conveying pipe 22 is driven to rotate through the rotating pipe 8 and the penetrating column 21. The air extraction pump 25 at the bottom of the conveying pipe 22 is started, and at the same time, the third solenoid valve 24 on the extension pipe 23 is started, so as to realize air flow, and further make the silica white powder flow. The electromagnets 27 are energized to generate magnetic force, which can adsorb magnetic impurities in the silica white powder, thereby achieving the purification effect.

[0060] After the purification is completed, in order to discharge the magnetic impurities, the air supply pump 26 is started, air is sent into the interior of the magnetic separation part 101 through the conveying pipe 22, and at the same time, the electromagnets are powered off and the first solenoid valve 18 is closed, and the magnetic impurities are discharged through the horizontal pipe 19.

[0061] In addition, after the first drain valve 2 is opened, the solutions after pickling and alkali washing enter the interior of the magnetic separation part 101, the electromagnets 27 are energized, and magnetic separation is performed again for secondary magnetic separation and purification.

[0062] Specifically, the magnetic separation area state monitoring module includes a magnetic force detector 30 and a wind force detector 31. The magnetic force detector 30 and the wind force detector 31 are both arrayed inside the magnetic separation part 101; the slurry parameter monitoring module includes a laser particle size analyzer, X-ray fluorescence spectrometry, a pH meter, and a conductivity meter. The laser particle size analyzer is used to obtain the particle size distribution of silica white in the slurry, the X-ray fluorescence spectrometry is used to obtain the types and contents of impurities in the slurry, the pH meter is used to obtain the pH value of the slurry, and the conductivity meter is used to obtain the conductivity of the slurry; it also includes an infrared spectrometer and a rotational viscometer. The infrared spectrum is used to obtain the content of silanol groups on the surface of silica white, and the rotational viscometer is used to obtain the viscosity of the slurry; the cleaning state monitoring module includes a temperature sensor and a gas content detector. The temperature sensor and the gas content detector are both arrayed inside the chemical cleaning part 102.

[0063] In this embodiment, by obtaining these parameters, the characteristics of the silica white slurry and the operating state of the equipment can be learned, so that different preparation schemes can be effectively formulated for various different silica white slurries to achieve effective purification.

[0064] A preparation process for silica white, which is used for the above-mentioned preparation device for silica white, such asFigure 7 As shown, it includes the following steps: start the device, the magnetic separation area status monitoring module obtains the magnetic separation operation data of the magnetic separation unit 101, and the data processing center analyzes the magnetic separation operation data to determine whether the operation status of the magnetic separation area is normal. If it is not normal, stop for inspection. The operation data includes the magnetic force distribution sFc and the gas flow rate distribution sVc;

[0065] Obtain the operation reference data stored in the database. The operation reference data includes the magnetic force reference distribution cFc and the gas flow rate reference distribution cVc; Obtain the operation evaluation coefficient yp based on the operation data and the operation reference data:

[0066] yp = σ(sFc, cFc) + σ(sVc, cVc)

[0067] where σ(sFc, cFc) is the similarity function of sFc and cFc, and σ(sVc, cVc) is the similarity function of sVc and cVc. The similarity function can be the Euclidean distance or the cosine similarity, and the same is true for the similarity function in the following text;

[0068] If the operation evaluation coefficient yp is greater than the operation evaluation threshold stored in the database, the operation status of the magnetic separation area is abnormal, otherwise it is normal. Through the operation evaluation coefficient yp, the magnetic force distribution and the air flow rate inside the magnetic separation unit 101 can be determined to be uniform, so as to better filter magnetic impurities.

[0069] If it is normal, the silica white powder containing silica white is introduced into the inside of the magnetic separation unit 101 through the powder blowing pipe 17 in the powder conveying structure. The magnetic substance cleaning component filters and purifies the magnetic column impurities, and after the filtration is completed, the magnetic impurities are discharged through the horizontal pipe 19.

[0070] The specific process is that the powder blowing pipe 17 is connected to the external powder blowing structure, then the first solenoid valve 18 is opened, and multiple second solenoid valves 20 on the horizontal pipe 19 are all opened. The silica white powder can enter the inside of the magnetic separation unit 101 through the powder blowing pipe 17, the first solenoid valve 18 and the second solenoid valves 20. In addition, the drive motor 7 is also started synchronously. The conveying pipe 22 is driven to rotate through the rotating pipe 8 and the through column 21. The air extraction pump 25 at the bottom of the conveying pipe 22 is started, and at the same time the third solenoid valve 24 on the extension pipe 23 is started, so that air flow can be realized, and then the silica white powder can flow. The electromagnet 27 is energized to generate magnetic force, which can adsorb the magnetic impurities in the silica white powder, so as to achieve the purification effect.

[0071] After the purification is completed, in order to discharge the magnetic impurities, the air supply pump 26 is started, air is sent into the inside of the magnetic separation unit 101 through the conveying pipe 22, at the same time the electromagnet is powered off, the first solenoid valve 18 is closed, and the magnetic impurities are discharged through the horizontal pipe 19.

[0072] Inject slurry into the interior of the chemical cleaning section 102. Before chemical purification, monitor the parameters of the slurry through the slurry parameter monitoring module to obtain slurry parameters. The slurry parameters include slurry cleaning characteristic parameters and anti-agglomeration parameters. The slurry cleaning characteristic parameters include the particle size distribution sLc of precipitated silica, the content sZ of various impurities a , the slurry pH value sP, the slurry conductivity sD, the specific surface area sB of precipitated silica. The anti-agglomeration parameters include the particle size distribution of precipitated silica, the specific surface area of precipitated silica, the slurry pH value, the content of surface silanol groups on precipitated silica, the ionic strength, and the slurry viscosity. a is the type number of impurities;

[0073] The data processing center matches the pickling solution parameters and the caustic washing solution parameters based on the slurry cleaning characteristic parameters;

[0074] Obtain the determined parameters of each slurry cleaning characteristic stored in the database. The determined parameters of slurry cleaning characteristics include the first determined particle size distribution cLc of precipitated silica i , the determined content cZ of various impurities ia , the first determined pH value cP of the slurry i , the determined conductivity cD of the slurry i , the first determined specific surface area cB of precipitated silica i , i is the number of the determined parameters of slurry cleaning characteristics; Compare the slurry cleaning characteristic parameters with each determined parameter of slurry cleaning characteristics to obtain each slurry cleaning characteristic comparison coefficient Tb i :

[0075]

[0076] Among them, σ(sLc, cLc i ) is the similarity function of sLc and cLc i , and A is the total number of impurity types;

[0077] Determine the minimum slurry cleaning characteristic comparison coefficient, and obtain the pickling solution parameters and caustic washing solution parameters corresponding to the determined parameters of slurry cleaning characteristics corresponding to this slurry cleaning characteristic comparison coefficient in the database.

[0078] Sample through the sampling tube 3. The slurry parameter monitoring module tests the slurry, and the parameter characteristics of the solution containing precipitated silica can be obtained. Then, the corresponding pickling solution parameters and caustic washing solution parameters are matched according to the parameter characteristics of the solution, and thus pickling and caustic washing are effectively carried out to remove acidic impurities and alkaline impurities.

[0079] Match the anti-agglomeration solution parameters based on the anti-agglomeration parameters;

[0080] Obtain the determined parameters of each anti-agglomeration stored in the database. The determined anti-agglomeration parameters include the second determined particle size distribution clc of precipitated silica j, the specific surface area cb of the second precipitated silica for reference j , the pH value cp of the second slurry for reference j , the content cG of silicon hydroxyl groups on the surface of precipitated silica for reference j , the ionic strength cQ for reference j and the viscosity cN of the slurry for reference j , where j is the number of the reference parameter for anti - agglomeration; compare the anti - agglomeration parameter with each reference anti - agglomeration parameter to obtain the anti - agglomeration comparison coefficient Jb for each j :

[0081] Jb j = σ(sLc,clc j ) + |sP - cp j | + |sG - cG j | + |sB - cb j | + sQ - cQ j | + |sN - cN j |

[0082] Determine the minimum anti - agglomeration comparison coefficient, and obtain the anti - agglomeration solution parameters corresponding to the anti - agglomeration reference parameter with this anti - agglomeration comparison coefficient in the database.

[0083] Since precipitated silica is prone to agglomeration during the treatment process, it is necessary to add anti - agglomeration substances during the treatment process, so as to prevent precipitated silica from agglomerating to form larger particles, which are sieved out in the separation section 103, reducing the yield of precipitated silica.

[0084] Prepare pickling solution and alkali - washing solution based on pickling solution parameters and alkali - washing solution parameters, and prepare anti - agglomeration solution based on anti - agglomeration solution parameters;

[0085] Chemically clean and purify the slurry based on the pickling solution, alkali - washing solution and anti - agglomeration solution to obtain the slurry after chemical cleaning and purification. During the process of chemical cleaning and purification, the cleaning status monitoring module obtains cleaning status data, and the data processing center judges whether the cleaning process is abnormal based on the cleaning status data. The cleaning status data includes temperature distribution stc and gas content data sQ b , where b is the number of gas types;

[0086] Obtain the reference cleaning status data stored in the database. The reference cleaning status data includes reference temperature distribution ctc and reference gas content data cQ b ; Obtain the cleaning status operation evaluation coefficient xp based on the cleaning status data and the reference cleaning status data:

[0087]

[0088] Among them, σ(stc,ctc) is the similarity function of stc and ctc, and B is the total number of gas types;

[0089] If the cleaning status operation evaluation coefficient xp is greater than the cleaning status operation evaluation threshold stored in the database, the cleaning status operation is abnormal; otherwise, the operation is normal.

[0090] The chemically cleaned and purified slurry is discharged into the magnetic separation section 101 for secondary magnetic separation and purification; after the secondary magnetic separation and purification, it is discharged into the separation section 103 for impurity separation and purification.

[0091] It should be noted that in this document, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the term "comprising", "including" or any other variant thereof is intended to cover non-exclusive inclusion, so that a process, method, article or device comprising a series of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article or device.

[0092] The preferred embodiments of the present invention disclosed above are only used to help explain the present invention. The preferred embodiments do not describe all the details in detail, nor do they limit the invention to the specific embodiments described. Obviously, many modifications and variations can be made according to the content of this specification. These embodiments are selected and specifically described in this specification to better explain the principles and practical applications of the present invention, so that those skilled in the art can understand and utilize the present invention well. The present invention is only limited by the claims and their full scope and equivalents.

Claims

1. A preparation device for white carbon black, comprising a preparation box (1), characterized in that: The preparation box (1) comprises a magnetic separation section (101), a chemical cleaning section (102) having an opening at the top, and a separation section (103), wherein the magnetic separation section (101) is fixedly connected to the bottom of the chemical cleaning section (102), and the separation section (103) is fixedly connected to the bottom of the chemical cleaning section (102); The surface of the magnetic separation section (101) is provided with a powder conveying structure, and the powder conveying structure is used to convey the white carbon black powder to the inside of the magnetic separation section (101), and to perform magnetic separation through a magnetic material cleaning component arranged inside the magnetic separation section (101), so as to screen out the magnetic material in the white carbon black powder, and the powder conveying structure is also used to convey the white carbon black powder from which the magnetic material has been screened out to an external slurry preparation device; The magnetic separation section (101) is also provided with a magnetic separation area status monitoring module, which is used to obtain operation data of the magnetic separation area and transmit the operation data to a data processing center, and the data processing center determines whether the operation of the magnetic separation area is normal; The chemical cleaning section (102) is provided with a particle mixing structure inside, the bottom of the chemical cleaning section (102) is fixedly connected with a first drain valve (2), the outlet of the first drain valve (2) is communicated with the inside of the chemical cleaning section (102), the chemical cleaning section (102) is provided with a sampling tube (3), the output end of the sampling tube (3) is connected with a slurry parameter monitoring module, the slurry parameter monitoring module is used to obtain slurry parameters and transmit the slurry parameters to a data processing center, and the data processing center determines the slurry chemical treatment solution according to the slurry parameters; A cleaning state monitoring module is also provided inside the chemical cleaning section (102), and the cleaning state monitoring module is used to monitor whether the internal state of the chemical cleaning section (102) is normal when the slurry is chemically cleaned; A second liquid discharge valve (4) is fixedly connected to the bottom of the magnetic separation section (101); an outlet of the second liquid discharge valve (4) is connected to the separation section (103); an annular screen (5) is fixedly connected to the inner wall of the separation section (103); and a filter screen (6) is also fixedly connected to the outlet of the separation section (103).

2. The device for preparing white carbon black according to claim 1, characterized in that: The particle mixing structure comprises a driving motor (7), a rotating tube (8) and a stirring rod (9) fixedly connected to the rotating tube (8); the driving motor (7) is fixedly connected to the top of the chemical cleaning section (102); the end of the output shaft of the driving motor (7) movably passes through the top of the chemical cleaning section (102) and is fixedly connected to one end of the rotating tube (8); and the other end of the rotating tube (8) is movably connected to the bottom of the chemical cleaning section (102); A liquid blowing pipe (10) is fixedly connected to the interior of the rotating tube (8); a liquid outlet of the liquid blowing pipe (10) is arranged at the bottom of the rotating tube (8) and extends to the outside of the rotating tube (8); a liquid extraction pump (11) is fixedly connected to the liquid inlet of the liquid blowing pipe (10) at the top of the rotating tube (8); and a liquid extraction structure is arranged at the liquid inlet end of the liquid extraction pump (11).

3. A preparation device for white carbon black according to claim 2, characterized in that: The liquid extraction structure comprises a liquid extraction tube (12), wherein the liquid extraction tube (12) is fixedly connected to the end of the stirring rod (9), one end of the liquid extraction tube (12) is fixedly connected to a material storage frame (13), one end of the material storage frame (13) away from the liquid extraction tube (12) is fixedly connected to the liquid inlet end of the liquid extraction pump (11), a filter screen is provided at the connection between the material storage frame (13) and the liquid inlet end of the liquid extraction pump (11), a material leakage hole (14) is provided at the bottom of the material storage frame (13), and a perforated plate (15) is movably connected to the bottom of the material storage frame (13), the perforated plate (15) is fixedly connected to an electric push rod (16), and the electric push rod (16) is fixedly connected to a rotating tube (8).

4. The device for preparing white carbon black according to claim 2, characterized in that: The powder conveying structure comprises a powder blowing pipe (17), one end of the powder blowing pipe (17) is connected to a transverse pipe (19) via a first electromagnetic valve (18), the transverse pipe (19) is fixedly passed through the magnetic separation part (101) and extends to the inside of the magnetic separation part (101), and a second electromagnetic valve (20) is fixedly connected to the surface of the transverse pipe (19); The bottom of the rotating tube (8) is fixedly connected to a through column (21), the through column (21) is connected to the bottom of the chemical cleaning section (102) via a sealed bearing, the bottom of the through column (21) extends to the inside of the magnetic separation section (101), the bottom of the through column (21) is fixedly connected to a delivery pipe (22), the surface of the delivery pipe (22) is fixedly connected to a third solenoid valve (24) via an extension pipe (23), and the extension pipe (23) is in communication with the inside of the delivery pipe (22); The delivery pipe (22) is movably connected to the magnetic separation part (101) via a sealed bearing; one end of the delivery pipe (22) away from the extension pipe (23) passes through the magnetic separation part (101) and the filter screen (6); and the ends of the delivery pipe (22) are respectively fixedly connected to an air extraction pump (25) and an air delivery pump (26).

5. The device for preparing white carbon black according to claim 4, characterized in that: The magnetic material cleaning component comprises a plurality of groups of electromagnetic structures, each group of electromagnetic structures comprises a plurality of electromagnets (27) uniformly fixed in an array around the surface of a conveying pipe (22), and the two electromagnets (27) in two adjacent groups of electromagnetic structures are staggered. The magnetic material cleaning component also comprises a connecting rod (28), and an electromagnetic column (29) is fixedly connected to the surface of the connecting rod (28).

6. The device for preparing white carbon black according to claim 1, characterized in that: The magnetic separation area state monitoring module comprises a magnetic detector (30) and a wind detector (31), and the magnetic detector (30) and the wind detector (31) are both arranged in an array inside the magnetic separation part (101); The slurry parameter monitoring module includes a laser particle size analyzer, an X-ray fluorescence spectrometer, a pH meter and a conductivity meter. The laser particle size analyzer is used to obtain the particle size distribution of white carbon in the slurry, the X-ray fluorescence spectrometer is used to obtain the type and content of impurities in the slurry, the pH meter is used to obtain the pH value of the slurry, and the conductivity meter is used to obtain the conductivity of the slurry; It also includes an infrared spectrometer and a rotational viscometer, wherein the infrared spectrometer is used to obtain the silanol content on the surface of white carbon black, and the rotational viscometer is used to obtain the viscosity of the slurry; The cleaning state monitoring module comprises a temperature sensor and a gas content detector, and the temperature sensor and the gas content detector are both arranged in an array inside the chemical cleaning section (102).

7. A process for preparing white carbon black, used in a device for preparing white carbon black according to any one of claims 1 to 6, characterized in that: The following steps are involved: The equipment is started, and a magnetic separation area state monitoring module obtains magnetic separation operation data of the magnetic separation part (101). The data processing center analyzes the magnetic separation operation data to determine whether the operation state of the magnetic separation area is normal. If it is not normal, the equipment is shut down for inspection. The operation data includes magnetic force distribution sFc and gas flow velocity distribution sVc. If normal, the white carbon black powder containing white carbon black is introduced into the interior of the magnetic separation part (101) through the powder blowing pipe (17) in the powder conveying structure, and the magnetic material cleaning component filters and purifies the magnetic column impurities. After the filtration is completed, the magnetic impurities are discharged through the horizontal pipe (19); Slurry is injected into the chemical cleaning part (102). Before chemical purification, the slurry is monitored by a slurry parameter monitoring module to obtain slurry parameters, wherein the slurry parameters include slurry cleaning characteristic parameters and anti-agglomeration parameters. The slurry cleaning characteristic parameters include the particle size distribution of white carbon black sLc, the content of various impurities sZ a , slurry pH value sP, slurry conductivity sD, white carbon black specific surface area sB, the anti-agglomeration parameters include white carbon black particle size distribution, white carbon black specific surface area, slurry pH value, white carbon black surface silanol content, ionic strength and slurry viscosity, a is the type number of impurities; The data processing center matches the parameters of the acid washing solution and the alkaline washing solution based on the slurry washing characteristic parameters, and matches the parameters of the anti-agglomeration solution based on the anti-agglomeration parameters; A pickling solution and an alkaline washing solution are prepared based on the pickling solution parameters and the alkaline washing solution parameters, and an anti-agglomeration solution is prepared based on the anti-agglomeration solution parameters; The slurry is chemically cleaned and purified based on the acid cleaning solution, the alkaline cleaning solution and the anti-agglomeration solution to obtain the chemically cleaned and purified slurry. During the chemical cleaning and purification process, the cleaning state monitoring module obtains the cleaning state data. The data processing center determines whether the cleaning process is abnormal based on the cleaning state data. The cleaning state data includes the temperature distribution stc and the gas content data sQ. b , b is the number of the gas type; The slurry after chemical cleaning and purification is discharged into the magnetic separation section (101) for secondary magnetic separation and purification; After secondary magnetic separation and purification, it is discharged into the separation section (103) for impurity separation and purification.

8. A process for preparing white carbon black according to claim 7, characterized in that: The data processing center analyzes the magnetic separation operation data to determine whether the operation status of the magnetic separation area is normal, including the following steps: Acquire the operation parameter data stored in the database, wherein the operation parameter data includes the magnetic parameter distribution cFc and the gas flow rate parameter distribution cVc; Based on the operation data and operation parameter data, the operation evaluation coefficient yp is obtained: yp=σ(sFc,cFc)+σ(sVc,cVc) Where σ(sFc,cFc) is the similarity function between sFc and cFc, and σ(sVc,cVc) is the similarity function between sVc and cVc; If the operation evaluation coefficient yp is greater than the operation evaluation threshold stored in the database, the operation status of the magnetic separation area is abnormal, otherwise the operation is normal.

9. The process for preparing white carbon black according to claim 7, characterized in that: Matching the parameters of the pickling solution and the parameters of the alkaline washing solution based on the slurry cleaning characteristic parameters includes the following steps: Obtain the slurry cleaning characteristic parameters stored in the database, wherein the slurry cleaning characteristic parameters include the first white carbon black particle size parameter distribution cLc i , the parameter content of various impurities cZ ia , the first slurry pH value cP i 、Slurry parameter conductivity cD i , the first white carbon black specific surface area cB i , i is the number of the characteristic parameter of slurry cleaning; Compare the slurry cleaning characteristic parameters with the slurry cleaning characteristic parameter parameters to obtain the slurry cleaning characteristic comparison coefficient Tb i : Among them, σ(sLc,cLc i ) is sLc and cLc i Similarity function, A is the total number of impurity types; Determine the minimum slurry cleaning characteristic comparison coefficient, and obtain the acid cleaning solution parameters and alkaline cleaning solution parameters corresponding to the slurry cleaning characteristic comparison coefficient in the database; Matching the anti-agglomeration solution parameters based on the anti-agglomeration parameters includes the following steps: Obtain various anti-agglomeration parameters stored in the database, wherein the anti-agglomeration parameters include the second silica particle size distribution parameter clc j , the second white carbon black reference specific surface area cb j , the second slurry pH value cp j , Silane hydroxyl content cG on the surface of white carbon black j 、Ion parameter intensity cQ j and slurry viscosity cN j , j is the number of the anti-agglomeration parameter; Compare the anti-agglomeration parameters with the anti-agglomeration parameters to obtain the anti-agglomeration comparison coefficient Jb j : Jb j =σ(sLc,clc j )+|sP-cp j |+|sG-cG j |+|sB-cb j |+|sQ-cQ j |+|sN-cN j | Determine the minimum anti-agglomeration comparison coefficient, and obtain the anti-agglomeration solution parameters corresponding to the anti-agglomeration parameter setting parameters corresponding to the anti-agglomeration comparison coefficient in the database.

10. The process for preparing white carbon black according to claim 7, characterized in that: Judging whether the cleaning process is abnormal based on the cleaning status data includes the following steps: Acquire the cleaning state parameter data stored in the database, wherein the cleaning state parameter data includes the temperature parameter distribution ctc and the gas content parameter data cQ b ; Based on the cleaning state data and cleaning state parameter data, the cleaning state operation evaluation coefficient xp is obtained: Among them, σ(stc,ctc) is the similarity function of stc and ctc, and B is the total number of gas types; If the cleaning state operation evaluation coefficient xp is greater than the cleaning state operation evaluation threshold stored in the database, the cleaning state operation status is abnormal, otherwise the operation is normal.

Images