High-UV-resistant anti-fingerprint agent as well as preparation method and application thereof

Abstract

The invention discloses an anti-fingerprint agent with high UV resistance, a preparation method and application thereof. The anti-fingerprint agent has a structure as shown in a formula I: # imgabs0 #. The preparation method comprises the following steps: preparing an intermediate I from perfluoropolyether acyl fluoride and a UV absorbent and an intermediate II from diisocyanate and hydroxyl siloxane in a chemical bonding manner to obtain the anti-fingerprint agent. The waterproof and oleophobic coating disclosed by the invention can effectively form a compact cross-linked network on a base material, can effectively resist water and oil, and has excellent UV resistance, fingerprint resistance, high wear resistance and good light transmittance. Meanwhile, the preparation method effectively relieves many defects caused by the problems of solubility and the like, is simple and easy to implement, high in reaction rate, mild in condition and beneficial to large-scale production.

Description

Technical Field

[0001] The present invention relates to the field of anti-fingerprint agents, and particularly to a high UV-resistant anti-fingerprint agent, a preparation method thereof, and uses thereof. Background Art

[0002] Consumer electronic products, mainly including smart phones, PCs, tablet computers, wearable devices, VR, etc., have long penetrated into all aspects of our daily lives. People's performance requirements for touch-type electronic displays are also gradually increasing. Not only do they need the screen to have excellent performance, but also the glass surface should have good smoothness to improve the user experience. Therefore, it is necessary to perform anti-fingerprint and wear-resistant treatments on it. Currently, there are many anti-fingerprint oil coating products on the market, which can endow the touch screen with a good water-repellent and oil-repellent layer, and are not easily damaged when wiping its surface, and have good wear-resistant performance.

[0003] However, during long-term outdoor use, the coating is exposed to strong ultraviolet light, and complex photochemical reactions occur, resulting in the formation of new functional groups or the breakage of cross-linked macromolecules, thereby having a negative impact on its chemical composition and physical properties, and further causing surface changes (such as cracking, blistering or delamination) and the deterioration of the decoration and protection of the coating. In addition, due to insufficient durability under long-term sunlight or ultraviolet irradiation, the anti-fingerprint structure is damaged, the anti-fouling and anti-fingerprint performance disappears, the surface is not smooth, and the user experience also decreases. Therefore, it is necessary to add an anti-ultraviolet agent to the anti-fingerprint oil to improve the anti-ultraviolet performance of the coating.

[0004] In the current process, usually by adding a UV absorption reagent to the anti-fingerprint agent, a mixed UV-resistant anti-fingerprint agent is obtained. Patent CN 118165644 A and Patent CN 112226120 A are both based on this idea. However, due to the problem of different solubilities between the AF agent (silicon fluoride substances) and the small molecule UV-resistant agent, problems such as a decrease in light transmittance and easy film layer peeling caused by uneven dissolution often occur during use, seriously affecting its service life and at the same time, the user experience will also decrease. Therefore, developing an anti-fingerprint agent that can effectively solve the above problems and has high UV resistance, wear resistance, anti-fingerprint, and high optical activity is an important topic in the field of electronic consumer product displays. Summary of the Invention

[0005] The main object of the present invention is to propose a novel high UV-resistant anti-fingerprint agent, a preparation method thereof, and applications thereof, aiming to solve various defects caused by problems such as solubility, and to solve the problems that the coatings of existing touch-type electronic displays cannot withstand ultraviolet irradiation and are easily contaminated by skin oils, sweat, etc.

[0006] To achieve the above object, the present invention provides an anti-fingerprint agent with high UV resistance, which is characterized in that the anti-fingerprint agent has a structure as shown in Formula I:

[0007]

[0008] Wherein, Rf is perfluoropolyether, and its structural formula is CF 3 O(CF 3 CFCF 2 O) n (CF 2 O) m CF 2 -; n and m are integers ≥ 0, and n and m are not simultaneously equal to zero;

[0009] R 1 is a dihydroxy or diamino UV absorber, R 1 is

[0010]

[0011] R 2 is the main structure of diisocyanate, R 2 is,

[0012]

[0013] R 3 is the main structure of hydroxy siloxane, R 3 is

[0014]

[0015] Furthermore, it is characterized in that n = 22 and m = 18.

[0016] The present invention also provides a preparation method of the anti-fingerprint agent with high UV resistance, which is characterized by including the following preparation steps:

[0017] S1. Weigh perfluoropolyether acyl fluoride, UV absorber, the first solvent and acid-binding agent into a reactor, carry out a substitution reaction under a nitrogen atmosphere, and after the reaction is completed, purify it by a chromatographic column to obtain intermediate I;

[0018] S2. Weigh diisocyanate, siloxane and the second solvent into a reactor, carry out a first esterification reaction in an ice-water bath under a nitrogen atmosphere, and then carry out rotary evaporation purification to obtain intermediate II;

[0019] The steps of S1 and S2 are not in a sequential order;

[0020] S3. Weigh intermediate Ⅰ, intermediate Ⅱ, and the third solvent into a reactor, and carry out the second esterification reaction in an ice-water bath under a nitrogen atmosphere. After the reaction is completed, purify it using a chromatographic column to obtain a high UV-resistant fingerprint-resistant agent.

[0021] Furthermore, in the step S1, the molecular weight of the perfluoropolyether acyl fluoride is 1000 - 10000. This molecular weight will affect the hydrophobic angle and wear resistance of the coating.

[0022] Optionally, the ultraviolet absorber is at least one of the ultraviolet absorbers containing dihydroxy and diamino groups.

[0023] Furthermore, in the step S1, the molar ratio of the perfluoropolyether acyl fluoride to the ultraviolet absorber is 1:1 - 1.2;

[0024] Furthermore, in the step S2, the diisocyanate is at least one of toluene diisocyanate, isophorone diisocyanate, diphenylmethane diisocyanate, 4,4 - diisocyanatodicyclohexylmethane, and hexamethylene diisocyanate.

[0025] Furthermore, in the step S2, the siloxane is any one of the following:

[0026]

[0027] Optionally, the molar ratio of the diisocyanate to the siloxane is 1:0.5 - 1.

[0028] Furthermore, in the step S3, the molar ratio of intermediate Ⅰ to intermediate Ⅱ is 1:1 - 1.2.

[0029] Furthermore, the first solvent, the second solvent, and the third solvent are all selected from at least one of acetone, tetrahydrofuran, and n-butane.

[0030] The present invention also protects the use of the high UV-resistant fingerprint-resistant agent prepared by the preparation method for the coating of a mobile phone or tablet computer screen.

[0031] The key technology of the present invention lies in the reaction of the unsaturated carbonyl group in perfluoropolyether acyl fluoride with one molecule of hydroxyl / amino group in the dihydroxy / diamino ultraviolet absorber to generate a UV-resistant perfluoropolyether linked by ester / amide groups. One molecule of hydroxyl / amino group still remains in the UV-resistant perfluoropolyether molecule, which can further bond with other functional functional groups. Then, the reaction of the isocyanate group of diisocyanate with the hydroxyl group of hydroxy siloxane generates a siloxane containing one molecule of isocyanate group. The function of S2 in the present invention is to graft the siloxane onto the UV-resistant perfluoropolyether molecule to endow it with more excellent adhesion, anti-fingerprint, friction resistance and other properties. Finally, the reaction of the hydroxyl / amino group in the UV-resistant perfluoropolyether with the isocyanate group in the above siloxane generates a siloxane-grafted UV-resistant perfluoropolyether - a novel high UV-resistant anti-fingerprint agent.

[0032] The beneficial effects of the present invention are as follows:

[0033] (1) In the technical solution provided by the present invention, different from the traditional UV-resistant anti-fingerprint agent obtained by mixing (directly adding small molecule UV-resistant agents), the present invention uses perfluoropolyether acyl fluoride, dihydroxy or diamino ultraviolet absorber, diisocyanate and siloxane as raw materials, and reacts through acyl fluoride bonds and isocyanate bonds with the dihydroxy or diamino ultraviolet absorber to obtain a novel high UV-resistant anti-fingerprint agent prepared by chemical bonding. The novel high UV-resistant anti-fingerprint agent effectively avoids problems such as low light transmittance and easy film layer shedding caused by different solubilities. After acting on the substrate surface, it can form a dense cross-linked network. While ensuring high light transmittance, the presence of functional groups such as perfluoropolyether, UV absorber, and siloxane can provide an effective waterproof and oil-repellent effect for the film layer, and endow it with long-term UV resistance, anti-fingerprint, high wear resistance and other properties, meeting the requirements of outdoor use.

[0034] (2) The preparation method provided by the present invention is simple and easy to operate, has a high reaction rate, and mild conditions, effectively improving production efficiency and being conducive to large-scale production. The novel high UV-resistant anti-fingerprint agent prepared has more persistent and excellent properties on the substrate surface compared with similar products. In addition, the perfluoropolyether compound used shows good environmental friendliness compared with the traditional perfluoroalkyl compound. Description of the Drawings

[0035] Figure 1 is the nuclear magnetic resonance hydrogen spectrum of the UV-resistant anti-fingerprint agent prepared in Example 1. Detailed Embodiments

[0036] Embodiments of the present invention will be described in detail below. Examples of the embodiments are shown in the accompanying drawings, where the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the accompanying drawings are exemplary and are intended to explain the present invention, and should not be construed as limiting the present invention. For those technical or conditions not specified in the embodiments, they shall be carried out according to the techniques or conditions described in the literature in this field or according to the product specifications. For the reagents or instruments whose manufacturers are not specified, they are all conventional products that can be obtained through commercial purchase.

[0037] Example 1: Preparation of a novel highly UV-resistant anti-fingerprint agent

[0038] S1. Weigh perfluoropolyether acyl fluoride (n = 22, m = 18) with a molecular weight of 5022 and 4,4'-dihydroxybenzophenone in a molar ratio of 1:1.2, as well as the solvent tetrahydrofuran and the acid-binding agent triethylamine in a reactor, and carry out a substitution reaction under a nitrogen atmosphere. After the reaction is completed, purification is carried out using a chromatographic column to obtain Intermediate I;

[0039] S2. Weigh isophorone diisocyanate and hydroxymethyltriethoxysilane in a molar ratio of 1:0.7, as well as the solvent tetrahydrofuran in a reactor, and carry out Esterification Reaction I in an ice-water bath under a nitrogen atmosphere for 7 h, and then carry out rotary evaporation for purification to obtain Intermediate II;

[0040] The steps S1 and S2 are not in a sequential order; they can also be carried out simultaneously;

[0041] S3. Weigh Intermediate I and Intermediate II in a molar ratio of 1:1.2, as well as the solvent tetrahydrofuran in a reactor, and carry out Esterification Reaction II in an ice-water bath under a nitrogen atmosphere for 6 h, and carry out purification using a chromatographic column to obtain a highly UV-resistant anti-fingerprint agent.

[0042] The novel highly UV-resistant anti-fingerprint agent prepared in Example 1 is used for substrate coating (plasma treatment for 3 min, voltage 65 - 68 V, current 2.5 - 3 A; electron gun preheating power 10% - 15%, silicon plating 12 nm, turntable rotation 99.9%, evaporation of A:B:C three-stage voltage ratio is 20.5%:22.1%:22.1%). After completion, tests on the initial water contact angle, resistance to rubber friction, resistance to steel wool friction, resistance to UV irradiation, etc. of the substrate surface are carried out, and the results are shown in Table 1.

[0043] Example 2: Preparation of a novel highly UV-resistant anti-fingerprint agent

[0044] S1. Weigh perfluoropolyether acyl fluoride with a molecular weight of 5022 (n = 22, m = 18) and 2,2'-dihydroxy-4,4'-dimethoxybenzophenone with a molar ratio of 1:1.2, as well as the solvent tetrahydrofuran and the acid-binding agent triethylamine in a reactor, and carry out a substitution reaction under a nitrogen atmosphere. After the reaction is completed, purification is carried out using a chromatographic column to obtain intermediate I;

[0045] S2. Weigh hexamethylene diisocyanate and hydroxyethyltriethoxysilane with a molar ratio of 1:0.7, as well as the solvent tetrahydrofuran in a reactor, and carry out esterification reaction I in an ice-water bath under a nitrogen atmosphere for 8 hours, and then carry out rotary evaporation for purification to obtain intermediate II;

[0046] The steps of S1 and S2 are not in a sequential order; they can also be carried out simultaneously;

[0047] S3. Weigh intermediate I and intermediate II with a molar ratio of 1:1.1, as well as the solvent tetrahydrofuran in a reactor, and carry out esterification reaction II in an ice-water bath under a nitrogen atmosphere for 5 hours, and purification is carried out using a chromatographic column to obtain a high UV-resistant anti-fingerprint agent.

[0048] The novel high UV-resistant anti-fingerprint agent prepared in Example 2 is used for substrate coating (plasma treatment for 3 minutes, voltage 65 - 68V, current 2.5 - 3A; electron gun preheating power 10% - 15%, silicon plating 12nm, turntable rotation 99.9%, evaporation of A:B:C three-stage voltage ratio is 20.5%:22.1%:22.1%). After completion, tests on the initial water contact angle, resistance to rubber friction, resistance to steel wool friction, resistance to UV irradiation, etc. of the substrate surface are carried out, and the results are shown in Table 1.

[0049] Example 3: Preparation of a novel high UV-resistant anti-fingerprint agent

[0050] S1. Weigh perfluoropolyether acyl fluoride with a molecular weight of 2502 (n = 10, m = 10) and 2,2'-dihydroxy-4-methoxybenzophenone with a molar ratio of 1:1.1, as well as the solvent acetone and the acid-binding agent triethylamine in a reactor, and carry out a substitution reaction under a nitrogen atmosphere. After the reaction is completed, purification is carried out using a chromatographic column to obtain intermediate I;

[0051] S2. Weigh toluene diisocyanate and hydroxymethyltriethoxysilane with a molar ratio of 1:0.8, as well as the solvent acetone in a reactor, and carry out esterification reaction I in an ice-water bath under a nitrogen atmosphere for 6 hours, and then carry out rotary evaporation for purification to obtain intermediate II;

[0052] The steps of S1 and S2 are not in a sequential order; they can also be carried out simultaneously;

[0053] S3. Weigh intermediate I and intermediate II with a molar ratio of 1:1.2, as well as the solvent acetone, into a reactor. Under an ice-water bath and in a nitrogen atmosphere, carry out esterification reaction II for 6 hours. Purify using a chromatographic column to obtain an anti-fingerprint agent with high UV resistance.

[0054] Apply the novel anti-fingerprint agent with high UV resistance prepared in Example 3 to the substrate coating (plasma treatment for 3 minutes, voltage 65 - 68V, current 2.5 - 3A; electron gun preheating power 10% - 15%, silicon plating 12nm, turntable rotation 99.9%, voltage ratio of three-stage evaporation coating A:B:C is 20.5%:22.1%:22.1%). After completion, conduct tests on the properties such as the initial water contact angle, resistance to rubber friction, resistance to steel wool friction, and resistance to UV irradiation of the substrate surface. The results are shown in Table 1.

[0055] Example 4: Preparation of a novel anti-fingerprint agent with high UV resistance

[0056] S1. Weigh perfluoropolyether acyl fluoride with a molecular weight of 7508 (n = 33, m = 28) and 2,2′-methylenebis[6-(2H-benzotriazol-2-yl)-4-tert-octylphenol] with a molar ratio of 1:1, as well as the solvent n-butane and the acid-binding agent triethylamine into a reactor. Under a nitrogen atmosphere, carry out a substitution reaction. After the reaction ends, purify using a chromatographic column to obtain intermediate I;

[0057] S2. Weigh isophorone diisocyanate and hydroxypropyltrimethoxysilane with a molar ratio of 1:0.8, as well as the solvent n-butane into a reactor. Under an ice-water bath and in a nitrogen atmosphere, carry out esterification reaction I for 7 hours, and then carry out rotary evaporation purification to obtain intermediate II;

[0058] The steps S1 and S2 are not in a sequential order; they can also be carried out simultaneously;

[0059] S3. Weigh intermediate I and intermediate II with a molar ratio of 1:1.1, as well as the solvent n-butane into a reactor. Under an ice-water bath and in a nitrogen atmosphere, carry out esterification reaction II for 6 hours. Purify using a chromatographic column to obtain an anti-fingerprint agent with high UV resistance.

[0060] Apply the novel anti-fingerprint agent with high UV resistance prepared in Example 4 to the substrate coating (plasma treatment for 3 minutes, voltage 65 - 68V, current 2.5 - 3A; electron gun preheating power 10% - 15%, silicon plating 12nm, turntable rotation 99.9%, voltage ratio of three-stage evaporation coating A:B:C is 20.5%:22.1%:22.1%). After completion, conduct tests on the properties such as the initial water contact angle, resistance to rubber friction, resistance to steel wool friction, and resistance to UV irradiation of the substrate surface. The results are shown in Table 1.

[0061] Comparative Example 1:

[0062] Compared with Example 1, the difference is that the 4,4′-dihydroxybenzophenone ultraviolet absorber is replaced with ethylene glycol, and other preparation steps and conditions are the same.

[0063] The novel high UV-resistant anti-fingerprint agent prepared in Comparative Example 1 was used for substrate coating (plasma treatment for 3 min, voltage 65 - 68 V, current 2.5 - 3 A; electron gun preheating power 10% - 15%, silicon plating 12 nm, turntable rotation 99.9%, evaporation coating A:B:C three-stage voltage ratio 20.5%:22.1%:22.1%). After completion, tests on properties such as the initial water contact angle, resistance to rubber friction, resistance to steel wool friction, and resistance to UV irradiation of the substrate surface were carried out, and the results are shown in Table 1.

[0064] Comparative Example 2:

[0065] Compared with Example 1, the difference is that instead of performing step S2, after obtaining intermediate I, it is directly reacted with isophorone diisocyanate, and other preparation steps and conditions are the same.

[0066] The novel high UV-resistant anti-fingerprint agent prepared in Comparative Example 2 was used for substrate coating (plasma treatment for 3 min, voltage 65 - 68 V, current 2.5 - 3 A; electron gun preheating power 10% - 15%, silicon plating 12 nm, turntable rotation 99.9%, evaporation coating A:B:C three-stage voltage ratio 20.5%:22.1%:22.1%). After completion, tests on properties such as the initial water contact angle, resistance to rubber friction, resistance to steel wool friction, and resistance to UV irradiation of the substrate surface were carried out, and the results are shown in Table 1.

[0067] Comparative Example 3:

[0068] Compared with Example 1, the difference is that the perfluoropolyether acyl fluoride with a molecular weight of 5022 is replaced with perfluoropolyether acyl fluoride with a molecular weight of 646 (n = 2, m = 2), and other preparation steps and conditions are the same.

[0069] The novel high UV-resistant anti-fingerprint agent prepared in Comparative Example 3 was used for substrate coating (plasma treatment for 3 min, voltage 65 - 68 V, current 2.5 - 3 A; electron gun preheating power 10% - 15%, silicon plating 12 nm, turntable rotation 99.9%, evaporation coating A:B:C three-stage voltage ratio 20.5%:22.1%:22.1%). After completion, tests on properties such as the initial water contact angle, resistance to rubber friction, resistance to steel wool friction, and resistance to UV irradiation of the substrate surface were carried out, and the results are shown in Table 1.

[0070] Comparative Example 4

[0071] Compared with Example 1, the difference lies in that on the basis of Comparative Example 1, an equal proportion of 4,4'-dihydroxybenzophenone (in Example 1) is added to the finally obtained fingerprint-resistant agent, and other preparation steps and conditions are the same.

[0072] The novel high UV-resistant fingerprint-resistant agent prepared in Comparative Example 3 is used for substrate coating (plasma treatment for 3 min, voltage 65 - 68 V, current 2.5 - 3 A; electron gun preheating power 10% - 15%, silicon plating 12 nm, turntable rotation 99.9%, evaporation coating A:B:C three-stage voltage ratio is 20.5%:22.1%:22.1%). After completion, tests on performance such as the initial water contact angle, resistance to rubber friction, resistance to steel wool friction, and resistance to UV irradiation of the substrate surface are carried out, and the results are shown in Table 1.

[0073] Table 1 Performance table of the film layer surface

[0074]

[0075] Contact angle test method: The contact angle of water on the film surface is measured by a JGW-360a type contact angle meter. The test liquid volume is 2 μL, the test environment is 24 ± 1 °C, and the relative humidity is 45 ± 1%. The water contact angle is measured at 3 points, and the average value is taken.

[0076] Rubber abrasion resistance test method: The rubber abrasion resistance test is measured by a ZJ-339-GSR type wear tester. The coated substrate is fixed on the tester, the pressure is set to 1000 g, the set stroke is 40 mm, the speed is 40 cycles / min, and the friction is 5000 times. After completion, the test result of the water contact angle on the film surface is recorded.

[0077] Steel wool abrasion resistance test method: The steel wool abrasion resistance test is measured by a ZJ-339-GSR type wear tester. The coated substrate is fixed on the tester, the rubber model is MUNBANGSAWOO, the pressure is set to 1000 g, the set stroke is 40 mm, the speed is 40 cycles / min, and the friction is 8000 times. After completion, the test result of the water contact angle on the film surface is recorded.

[0078] Weather resistance test method: The test is carried out with reference to "GB / T 14522 - 2008". The test result is based on the film layer not being powdered, blistered, cracked, or peeled off, and the longest UV exposure time is recorded.

[0079] Light transmittance test method: The light transmittance is measured by a TH-110 type light transmittance and haze meter. The coated substrate is placed on the test platform, and the HOLD key of the instrument is pressed. After the instrument passes self-calibration, the test can start, and the test result is recorded.

[0080] As can be seen from the data in Table 1, after the novel high UV-resistant and fingerprint-resistant agent prepared by the technical solutions (Examples 1-4) of the present invention acts on the substrate, the water contact angle on its surface is about 110°, showing good hydrophobic performance. The hydrophobic performance of Comparative Examples 2-4 is poor. In addition, after the QUVB test, no phenomena such as blooming, blistering, cracking, and peeling occurred on the film layer on the substrate surface even after 1000 h, indicating that the fingerprint-resistant agent has extremely strong UV resistance and can meet the requirements of long-term outdoor use. The UV irradiation resistance time of Comparative Example 1 is less than 500 h, the UV irradiation resistance times of Comparative Examples 2 and 4 are less than 800 h, and the light transmittance of Comparative Example 4 is also very poor at only 87%. At the same time, after rubbing with a rubber or steel wool, the change in the water contact angle on the substrate surface is ≤5°, which fully demonstrates the excellent friction resistance of the fingerprint-resistant agent.

[0081] In summary, the novel high UV-resistant and fingerprint-resistant agent prepared by the present invention effectively alleviates many defects caused by problems such as solubility through chemical bonding, can effectively form strong chemical bonds on the glass surface and bind tightly, improves the hardness of the coating, and further enhances the wear resistance of the coating. The modified perfluoropolyether compound in the fingerprint-resistant agent has a free radical scavenging group or an ultraviolet absorbing group in the molecule, further improving the weather resistance of the coating. The coating provided by the present invention is suitable for forming a surface treatment layer on various substrates, especially the surface of optical components requiring permeability, to meet the requirements of long-term outdoor use. Moreover, the preparation method of the compound of the present invention has a simple process, is easy to operate and implement.

[0082] Although the embodiments of the present invention have been shown and described above, it can be understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Those of ordinary skill in the art can make changes, modifications, substitutions, and variations to the above embodiments within the scope of the present invention without departing from the principle and purpose of the present invention.

Claims

1. A highly UV-resistant anti-fingerprint agent, characterized in that: The anti-fingerprint agent has a structure as shown in Formula I: Among them, Rf is perfluoropolyether, and its structural formula is CF3O (CF3CFCF2O) n (CF2O) m CF2-; n, m are integers ≥ 0, and n and m are not equal to zero at the same time; R1 is a dihydroxy or diamino UV absorber, R1 is R2 is the main structure of diisocyanate, R2 is, R3 is the main structure of hydroxysiloxane, R3 is 2. The highly UV-resistant anti-fingerprint agent according to claim 1, characterized in that: Said n=22, m=18.

3. The method for preparing the highly UV-resistant anti-fingerprint agent according to claim 1, characterized in that: The method comprises the following preparation steps: S1, weighing perfluoropolyether acyl fluoride, ultraviolet absorber, first solvent and acid binding agent in a reactor, carrying out substitution reaction under nitrogen atmosphere, and purifying by chromatographic column after the reaction to obtain intermediate I; S2, weighing diisocyanate, siloxane and the second solvent into a reactor, carrying out a first esterification reaction in an ice-water bath under a nitrogen atmosphere, and then purifying by rotary evaporation to obtain intermediate II; The steps S1 and S2 are in no particular order; S3. Weigh the intermediate I, intermediate II and the third solvent into a reactor, and carry out a second esterification reaction in an ice-water bath under a nitrogen atmosphere. After the reaction, purify the mixture using a chromatographic column to obtain an anti-fingerprint agent with high UV resistance.

4. The preparation method according to claim 3, characterized in that: In the step S1, the molecular weight of the perfluoropolyether acyl fluoride is 1000 to 10000; Optionally, the ultraviolet absorber is at least one of a dihydroxyl-containing and a diamino-containing ultraviolet absorber.

5. The preparation method according to claim 3, characterized in that: In the step S1, the molar ratio of the perfluoropolyether acyl fluoride to the ultraviolet absorber is 1:1 to 1.

2.

6. The preparation method according to claim 3, characterized in that: In the step S2, the diisocyanate is at least one of toluene diisocyanate, isophorone diisocyanate, diphenylmethane diisocyanate, 4,4-diisocyanate dicyclohexylmethane, and hexamethylene diisocyanate.

7. The preparation method according to claim 3, characterized in that: In the step S2, the siloxane is any one of the following: Optionally, the molar ratio of the diisocyanate to the siloxane is 1:0.5-1.

8. The preparation method according to claim 3, characterized in that: In the step S3, the molar ratio of intermediate I to intermediate II is 1:1 to 1.

2.

9. The preparation method according to claim 3, characterized in that: The first solvent, the second solvent and the third solvent are all selected from at least one of acetone, tetrahydrofuran and n-butane.

10. Use of the highly UV-resistant anti-fingerprint agent prepared by the preparation method according to any one of claims 1 to 9 for coating of mobile phone or tablet computer screens.

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