Method, system and equipment for outputting cosine waveform high-voltage pulse to generate electron beam and medium

Abstract

The invention relates to a method, a system, equipment and a medium for outputting cosine waveform high-voltage pulses to generate electron beams, and the method comprises the following steps: selecting a direct-current high-voltage power supply and a sine-wave alternating-current high-voltage power supply, and connecting in series to obtain a high-voltage composite power supply; keeping the output amplitudes of the direct-current high-voltage power supply and the sine-wave alternating-current high-voltage power supply unchanged, adjusting the fundamental frequency of the sine-wave alternating-current high-voltage power supply according to the required pulse width, and intercepting the output of the high-voltage composite power supply through a preset time chopping window to obtain a cosine waveform high-voltage pulse; and applying the intercepted cosine waveform high-voltage pulse to an electron gun end of an electron cooling device, leading out a cosine waveform pulse electron beam bunch with variable pulse width, and cooling the ion beam bunch to be cooled in the storage ring. The device can be widely applied to the technical field of ion beam cooling.

Description

Technical Field

[0001] The present invention belongs to the technical field of ion beam cooling, and particularly relates to a method, system, device and medium for generating an electron beam by outputting a cosine waveform high-voltage pulse. Background Art

[0002] The electron cooling device enables the heavy ion storage ring to have the functions of cooling and accumulating "hot" heavy ions. The heavy ion storage ring accelerates all ions from hydrogen to uranium to high energies, providing high-quality "cold" heavy ion beams for various scientific research.

[0003] For different types of ions injected into the heavy ion storage ring, the energy of the ion beam is different, and the length of the ion beam bunch is also different. Usually, a DC electron beam is generally used for low-energy electron cooling, and a pulse electron beam train (chain) with equal amplitude and equal width and uniform distribution is generally used for high-energy electron cooling. The ion beam bunch in the heavy ion storage ring shows a typical Gaussian distribution. Ions located in the central region of the bunch and ions located in the edge region of the bunch are subjected to the same electron cooling effect, but the ions in the central region of the bunch have a relatively low temperature, and the ions in the edge region of the bunch have a relatively high temperature. Under the same conditions, the strength of the cooling effect is proportional to the density of the electron beam. Thus, the cooling time of the ions in the central region of the bunch is short, and the cooling time of the ions in the edge region of the bunch is long.

[0004] Using a longitudinally hollow electron beam can change this situation, applying a stronger electron cooling effect to the ions in the edge region of the bunch; applying a weaker electron cooling effect to the ions in the central region of the bunch, so as to achieve the purpose of controlling the longitudinal distribution of the ion beam bunch. In the electron gun of the electron cooling device, the extraction voltage and the extraction current show a linear relationship within a certain range. The higher the extraction voltage, the greater the extracted electron beam current. If a cosine waveform extraction voltage is used, a longitudinally hollow electron beam with a low central electron density and a high edge electron density can be generated.

[0005] However, as the cooling process progresses, the width of the ion beam bunch will become smaller. If the same intensity of electron beam bunch is to be used to cool ion beam bunches with different widths, it is necessary to generate electron beam bunches with different widths but the same intensity. At the same time, the width of the electron beam bunch also needs to be switched during the cooling process to achieve staged cooling. For example, a wider electron beam bunch is used in the starting stage, a shorter electron beam bunch is used in the middle stage, and an even shorter electron beam bunch is used in the final stage. How to effectively control the width of the electron beam bunch and improve the cooling efficiency is still an important direction for the development of the electron cooling technology for the full ion spectrum bunch in the heavy ion storage ring. Summary of the Invention

[0006] In view of the above problems, the object of the present invention is to provide a method, system, device and medium for generating an electron beam by outputting a cosine-wave high-voltage pulse, which can output a cosine-wave high-voltage pulse with a high-voltage pulse frequency corresponding to the cyclotron frequency of the ion beam, an unchanged amplitude, and a variable pulse width, thereby generating electron beams with different widths but the same intensity.

[0007] To achieve the above object, the present invention adopts the following technical solutions: In a first aspect, the present invention provides a method for generating an electron beam by outputting a cosine-wave high-voltage pulse, including the following steps: Select a DC high-voltage power supply and a sine-wave AC high-voltage power supply, and connect them in series to obtain a high-voltage composite power supply; Keep the output amplitudes of the DC high-voltage power supply and the sine-wave AC high-voltage power supply unchanged, adjust the fundamental frequency of the sine-wave AC high-voltage power supply according to the required pulse width, and pass the output of the high-voltage composite power supply through a preset time chopping window to intercept a cosine-wave high-voltage pulse; Apply the intercepted cosine-wave high-voltage pulse to the electron gun end of the electron cooling device to extract a cosine-wave pulsed electron beam group with a variable pulse width, and cool the ion beam group to be cooled in the storage ring.

[0008] Further, the selection of the DC high-voltage power supply and the sine-wave AC high-voltage power supply means selecting a DC high-voltage power supply and a sine-wave AC high-voltage power supply with the same peak voltage. After they are connected in series and superimposed, a high-voltage composite power supply with a minimum value of zero and a maximum value of twice the peak voltage is generated.

[0009] Further, the adjustment of the fundamental frequency of the sine-wave AC high-voltage power supply according to the required pulse width means changing its waveform frequency at twice the fundamental frequency of the sine-wave AC high-voltage power supply. n-1 times the frequency.

[0010] Further, the time chopping window Δt is set corresponding to the cyclotron frequency of the ion beam.

[0011] Further, the voltage waveform function applied to the electron gun end of the electron cooling device is:

[0012] In the formula, is the DC voltage; is the amplitude value of the sine-wave AC high voltage; is the phase of the sine-wave AC high voltage; is the initial phase of the sine-wave AC high voltage.

[0013] In a second aspect, the present invention provides a system for generating an electron beam by outputting a cosine-wave high-voltage pulse, including: A DC high-voltage power supply, a sine-wave AC high-voltage power supply, a control module, and a pulse output module; Select the DC high-voltage power supply and the sine-wave AC high-voltage power supply, and connect them in series to obtain a high-voltage composite power supply; The control module is used to adjust the fundamental frequency of the sine-wave AC high-voltage power supply according to the required pulse width while keeping the output amplitudes of the DC high-voltage power supply and the sine-wave AC high-voltage power supply unchanged, and intercept the output of the high-voltage composite power supply through a preset time chopping window to obtain a cosine-wave high-voltage pulse; The pulse output module is used to apply the intercepted cosine-wave high-voltage pulse to the electron gun end of the electron cooling device, extract a cosine-wave pulse electron bunch with a variable pulse width, and cool the ion bunch to be cooled in the storage ring.

[0014] Furthermore, the selection of the DC high-voltage power supply and the sine-wave AC high-voltage power supply refers to selecting a DC high-voltage power supply and a sine-wave AC high-voltage power supply with the same peak voltage. After being connected in series and superimposed, a high-voltage composite power supply with a minimum value of zero and a maximum value of twice the peak voltage is generated.

[0015] Furthermore, the adjustment of the fundamental frequency of the sine-wave AC high-voltage power supply according to the required pulse width means changing its waveform frequency at twice the fundamental frequency of the sine-wave AC high-voltage power supply. n-1 times the frequency.

[0016] In a third aspect, the present invention provides a computer-readable storage medium storing one or more programs, where the one or more programs include instructions that, when executed by a computing device, cause the computing device to execute the method of outputting a cosine-wave high-voltage pulse to generate an electron beam.

[0017] In a fourth aspect, the present invention provides a computing device, including: one or more processors and a memory, where the memory stores one or more programs and is configured to be executed by the one or more processors, and the one or more programs include instructions for executing the method of outputting a cosine-wave high-voltage pulse to generate an electron beam.

[0018] Due to the above technical solutions adopted by the present invention, it has the following advantages: 1. The present invention adopts the method of superimposing a DC high-voltage power supply and a sine-wave AC high-voltage power supply to output a cosine-wave high-voltage pulse by time chopping corresponding to the ion beam, and applies it to the electron gun end of the ion cooling device to extract a cosine-wave high-voltage pulse corresponding to the ion beam cyclotron frequency, with an unchanged amplitude and a variable pulse width. This combined solution reduces the power of the DC high-voltage power supply and the sine-wave high-frequency high-voltage power supply, improves safety, reduces costs, and at the same time improves the cooling efficiency.

[0019] 2. The method of the present invention is to superimpose a DC high-voltage power supply and a sine-wave AC high-voltage power supply. The DC component in the output cosine-wave high-voltage pulse keeps the electron gun in an always-on state. The cosine-wave electron beam clusters achieve the phase-space distribution matching of ion beams with multiple energies and multiple ion beam lengths, and efficiently cool the heavy ion beam.

[0020] Therefore, the present invention can be widely applied to the field of ion beam technology. Description of the Drawings

[0021] By reading the following detailed description of the preferred embodiments, various other advantages and benefits will become clear to those of ordinary skill in the art. The drawings are only for the purpose of showing the preferred embodiments and are not considered to be a limitation of the present invention. Throughout the drawings, the same reference numerals are used to represent the same components. In the drawings: Figure 1 It is a schematic diagram of the output waveform of the sine-wave AC high-voltage power supply; Figure 2 It is a flowchart of the method for generating an electron beam by outputting a cosine-wave high-voltage pulse provided in the embodiment of the present invention; Figure 3a It is a schematic diagram of the relationship between the DC high voltage U dc and time t provided in the embodiment of the present invention; Figure 3b It is a schematic diagram of the relationship between the sine-wave AC high voltage U ac and time t provided in the embodiment of the present invention; Figure 3c It is a schematic diagram of the relationship between the DC high voltage superimposed on the sine-wave AC high voltage and time t provided in the embodiment of the present invention; Figure 4 It is a schematic diagram of the intercepted cosine-wave high-voltage output waveform with equal pulse amplitudes and different pulse widths provided in the embodiment of the present invention; Figure 5 It is a schematic diagram of the cosine-wave pulse high-voltage output waveform intercepted at the electron beam frequency 1 / 2n provided in the embodiment of the present invention. Detailed Embodiments

[0022] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the drawings of the embodiments of the present invention. Obviously, the described embodiments are some, but not all, of the embodiments of the present invention. Based on the described embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art belong to the scope of protection of the present invention.

[0023] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to the present invention. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprising" and / or "including" are used in this specification, they indicate the presence of features, steps, operations, devices, components, and / or combinations thereof.

[0024] Currently, for the cooling of ion beams in storage rings, there are mainly the following two methods: One is to use multiple DC high-voltage power supplies to achieve different interval cooling modes for multiple bunches. However, this method requires multiple DC high-voltage power supplies, resulting in high costs and great difficulties in synchronous control. Moreover, when the DC electron beam interacts with the ion beam in the heavy-ion storage ring, the DC electron beam continuously acts on the ion beam, improving the beam quality, but the strong cooling force continuously generated on the ion beam causes instability of the ion beam current.

[0025] The other is to use a high-frequency sine-wave AC high-voltage power supply to modulate the DC electron beam into a pulsed electron beam bunch with a quasi-sine-wave distribution. As Figure 1 shown, since the quasi-sine-wave high-voltage output waveform needs to pass through zero within one cooling cycle, in the interval of 0 to π, the output high-voltage waveform is p1, and the electron cooling electron gun applies a positive bias voltage to extract the electron beam. In the interval of π to 2π, the output high-voltage waveform is n1, and the electron cooling electron gun applies a negative bias voltage, and no electron beam is generated. This structure of the quasi-sine high-voltage output waveform results in low electron cooling efficiency. At the same time, it is required to generate a high-frequency high-voltage sine wave capable of extracting the electron beam, which has high technical requirements and high costs for the power supply.

[0026] Based on this, in some embodiments of the present invention, a method for generating an electron beam by outputting a cosine-wave high-voltage pulse is provided. The method first superimposes a DC high-voltage power supply and a sine-wave AC high-voltage power supply with the same peak voltage, and then adjusts the fundamental frequency of the sine-wave AC high-voltage power supply to output a cosine-wave high-voltage pulse with a frequency corresponding to the cyclotron frequency of the ion beam, an unchanged amplitude, and a variable pulse width, and applies it to the electron gun end of the electron cooling device to generate electron beams with different widths but the same intensity. This combined solution of the present invention reduces the power of the DC high-voltage power supply and the sine-wave AC high-voltage power supply, improves safety, reduces costs, and at the same time improves the cooling efficiency.

[0027] Correspondingly, in some other embodiments of the present invention, a system, device, and medium for generating an electron beam by outputting a cosine-wave high-voltage pulse are provided.

[0028] Embodiment 1 As Figure 2 shown, the present invention provides a method for generating an electron beam by outputting a cosine-wave high-voltage pulse, which includes the following steps: 1) Select a DC high-voltage power supply and a sine-wave AC high-voltage power supply, and connect them in series to obtain a high-voltage composite power supply; 2) Keep the output amplitudes of the DC high-voltage power supply and the sine-wave AC high-voltage power supply unchanged. Adjust the fundamental frequency of the sine-wave AC high-voltage power supply according to the required pulse width, and pass the output of the high-voltage composite power supply through a preset time chopping window to intercept a cosine-wave high-voltage pulse; 3) Apply the intercepted cosine-wave high-voltage pulse to the electron gun terminal of the electron cooling device to extract a cosine-wave pulsed electron beam with variable pulse width, and cool the ion beam to be cooled in the storage ring.

[0029] Further, in the above step 1), as Figures 3a to 3c shown, the selected DC high-voltage power supply and sine-wave AC high-voltage power supply in this embodiment have the same peak voltage. After the two are superimposed, a high-voltage composite power supply with a minimum value of zero and a maximum value of twice the peak voltage can be generated.

[0030] Further, in the above step 2), adjusting the fundamental frequency of the sine-wave AC high-voltage power supply according to the required pulse width means changing its waveform frequency by a multiple of 2 n-1 times the fundamental frequency of the sine-wave AC high-voltage power supply, which can be the first harmonic, second harmonic, or fourth harmonic, etc.

[0031] When setting the time chopping window Δt, it needs to be set according to the ion beam cyclotron frequency, so that the frequency of the obtained cosine-wave high-voltage pulse corresponds to the ion beam cyclotron frequency, the amplitude remains unchanged, and the high-voltage pulse width is variable.

[0032] During implementation, the time chopping window can be realized by a controller and two high-voltage switches. This technology belongs to the well-known technology in the art, and the present invention will not elaborate on it further.

[0033] Specifically, as Figure 4 and Figure 5 shown, if the first harmonic scheme is adopted, the waveform is chopped and extracted every period to obtain a cosine-wave high-voltage pulse with the same amplitude as the initial pulse width; if the second harmonic scheme is adopted, the waveform is chopped and extracted every other period to obtain a cosine-wave high-voltage pulse with half of the initial pulse width and the same amplitude; if the fourth harmonic scheme is adopted, the waveform is chopped and extracted every three periods to obtain a cosine-wave high-voltage pulse with a quarter of the initial pulse width and the same amplitude; and so on.

[0034] Further, in the above step 3), the voltage waveform function applied to the electron gun terminal of the electron cooling device is:

[0035]

[0036] Wherein, is the DC voltage; is the amplitude value of the sinusoidal AC high voltage, i.e., + , is the sinusoidal AC high voltage; is the phase of the sinusoidal AC high voltage; is the initial phase of the sinusoidal AC high voltage.

[0037] Embodiment 2

[0038] The above Embodiment 1 provides a method for generating an electron beam by outputting a cosine waveform high voltage pulse. Correspondingly, this embodiment provides a system for generating an electron beam by outputting a cosine waveform high voltage pulse. The system provided in this embodiment can implement the method for generating an electron beam by outputting a cosine waveform high voltage pulse in Embodiment 1, and this system can be implemented in a software, hardware, or a combination of software and hardware manner. For example, this system can include integrated or separate functional modules or functional units to execute the corresponding steps in each method of Embodiment 1. Since the system in this embodiment is basically similar to the method embodiment, the description process in this embodiment is relatively simple, and the relevant parts can refer to the partial description of Embodiment 1. The embodiment of the system provided in this embodiment is only illustrative.

[0039] The system for generating an electron beam by outputting a cosine waveform high voltage pulse provided in this embodiment includes: a DC high voltage power supply, a sinusoidal AC high voltage power supply, a control module, and a pulse output module.

[0040] Among them, after the DC high voltage power supply and the sinusoidal AC high voltage power supply are connected in series and superimposed, a high voltage composite power supply with a minimum value of zero and a maximum value of twice the peak voltage is generated; The control module is used to adjust the fundamental frequency of the sinusoidal AC high voltage power supply according to the required pulse width while keeping the output amplitudes of the DC high voltage power supply and the sinusoidal AC high voltage power supply unchanged, and intercept the output of the high voltage composite power supply through a preset time chopping window to obtain a cosine waveform high voltage pulse; The pulse output module is used to apply the intercepted cosine waveform high voltage pulse to the electron gun end of the electron cooling device, draw out a cosine waveform pulsed electron beam group with a variable pulse width, and cool the ion beam group to be cooled in the storage ring.

[0041] Embodiment 3 This embodiment provides a processing device corresponding to the method for generating an electron beam by outputting a cosine waveform high voltage pulse provided in Embodiment 1. The processing device can be a processing device for a client, such as a mobile phone, a laptop computer, a tablet computer, a desktop computer, etc., to execute the method of Embodiment 1.

[0042] The processing device includes a processor, a memory, a communication interface, and a bus. The processor, the memory, and the communication interface are connected through the bus to complete communication with each other. The memory stores a computer program that can run on the processor. When the processor runs the computer program, it executes the method for generating an electron beam by outputting a cosine-wave high-voltage pulse provided in Embodiment 1 of the present invention.

[0043] Preferably, the memory may be a high-speed random access memory (RAM: Random Access Memory), and may also include a non-volatile memory, such as at least one disk memory.

[0044] Preferably, the processor may be a general-purpose processor of various types such as a central processing unit (CPU) or a digital signal processor (DSP), which is not limited herein.

[0045] Embodiment 4

[0046] The method for generating an electron beam by outputting a cosine-wave high-voltage pulse in Embodiment 1 of the present invention can be specifically implemented as a computer program product. The computer program product may include a computer-readable storage medium, on which computer-readable program instructions for executing the method for generating an electron beam by outputting a cosine-wave high-voltage pulse described in Embodiment 1 of the present invention are uploaded.

[0047] The computer-readable storage medium may be a tangible device that holds and stores instructions used by an instruction execution device. The computer-readable storage medium may be, for example, but not limited to, an electrical storage device, a magnetic storage device, an optical storage device, an electromagnetic storage device, a semiconductor storage device, or any combination of the above.

[0048] Those skilled in the art should understand that the embodiments of the present invention may be provided as a method, a system, or a computer program product. Therefore, the present invention may take the form of a complete hardware embodiment, a complete software embodiment, or an embodiment combining software and hardware aspects. Moreover, the present invention may take the form of a computer program product implemented on one or more computer-usable storage media (including but not limited to disk memories, CD-ROMs, optical memories, etc.) that contain computer-usable program code.

[0049] The present invention is described with reference to the flowcharts and / or block diagrams of methods, apparatuses (systems), and computer program products according to embodiments of the present invention. It should be understood that each flow and / or block in the flowcharts and / or block diagrams, as well as the combinations of flows and / or blocks in the flowcharts and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to the processors of general-purpose computers, special-purpose computers, embedded processors, or other programmable data processing devices to produce a machine, such that the instructions executed by the processors of the computer or other programmable data processing devices generate means for implementing the functions specified in the Figure 1 one or more flows and / or blocks Figure 1 one or more blocks.

[0050] These computer program instructions can also be stored in a computer-readable memory that can direct a computer or other programmable data processing device to work in a specific manner, such that the instructions stored in the computer-readable memory produce a manufactured article including instruction means for implementing the functions specified in the Figure 1 one or more flows and / or Figure 1 blocks.

[0051] These computer program instructions can also be loaded onto a computer or other programmable data processing device, such that a series of operation steps are executed on the computer or other programmable device to produce a computer-implemented process, and thus the instructions executed on the computer or other programmable device provide steps for implementing the functions specified in the Figure 1 one or more flows and / or blocks Figure 1 one or more blocks.

[0052] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and not to limit them. Although the present invention has been described in detail with reference to the above embodiments, those of ordinary skill in the art should understand that: modifications or equivalent replacements can still be made to the specific embodiments of the present invention. Any modification or equivalent replacement that does not depart from the spirit and scope of the present invention shall be covered by the protection scope of the claims of the present invention.

Claims

1. A method for generating an electron beam by outputting a high-voltage pulse with a cosine waveform, characterized in that, It includes the following steps: Select a DC high-voltage power supply and a sine-wave AC high-voltage power supply, and connect them in series to obtain a high-voltage composite power supply; Keep the output amplitudes of the DC high-voltage power supply and the sine-wave AC high-voltage power supply unchanged, adjust the fundamental frequency of the sine-wave AC high-voltage power supply according to the required pulse width, and pass the output of the high-voltage composite power supply through a preset time chopping window to intercept a cosine-wave high-voltage pulse; Apply the intercepted cosine-wave high-voltage pulse to the electron gun end of the electron cooling device to extract a cosine-wave pulsed electron beam with variable pulse width, and cool the ion beam to be cooled in the storage ring.

2. The method for generating an electron beam by outputting a cosine-wave high-voltage pulse according to claim 1, wherein The selection of the DC high-voltage power supply and the sine-wave AC high-voltage power supply refers to selecting a DC high-voltage power supply and a sine-wave AC high-voltage power supply with the same peak voltage. After they are connected in series and superimposed, a high-voltage composite power supply with a minimum value of zero and a maximum value of twice the peak voltage is generated.

3. A method for generating an electron beam by outputting a cosine-wave high-voltage pulse as claimed in claim 1, characterized in that, Adjusting the fundamental frequency of the sine-wave AC high-voltage power supply according to the required pulse width means changing its waveform frequency by doubling the fundamental frequency of the sine-wave AC high-voltage power supply n-1 times the frequency.

4. The method for generating an electron beam by outputting a cosine-wave high-voltage pulse according to claim 1, characterized in that, The time chopping window Δt is set according to the ion beam cyclotron frequency.

5. A method for generating an electron beam by outputting a high-voltage pulse with a cosine waveform, as described in claim 1, characterized in that, The voltage waveform function applied to the electron gun end of the electronic cooling device is as follows: ； Wherein, is the DC voltage; is the amplitude value of the high-voltage sine-wave AC; is the phase of the high-voltage sine-wave AC; is the initial phase of the high-voltage sine-wave AC.

6. A system for generating an electron beam by outputting a high-voltage pulse with a cosine waveform, characterized in that, It includes: A DC high-voltage power supply, a sine-wave AC high-voltage power supply, a control module, and a pulse output module; Select the DC high-voltage power supply and the sine-wave AC high-voltage power supply, and connect them in series to obtain a high-voltage composite power supply; The control module is used to adjust the fundamental frequency of the sine-wave AC high-voltage power supply according to the required pulse width while keeping the output amplitudes of the DC high-voltage power supply and the sine-wave AC high-voltage power supply unchanged, and pass the output of the high-voltage composite power supply through a preset time chopping window to intercept a cosine-wave high-voltage pulse; The pulse output module is used to apply the intercepted cosine-wave high-voltage pulse to the electron gun end of the electron cooling device to extract a cosine-wave pulsed electron beam with variable pulse width, and cool the ion beam to be cooled in the storage ring.

7. A system for generating an electron beam by outputting a high-voltage pulse with a cosine waveform, as described in claim 6, wherein The selection of the DC high-voltage power supply and the sine-wave AC high-voltage power supply refers to selecting a DC high-voltage power supply and a sine-wave AC high-voltage power supply with the same peak voltage. After they are connected in series and superimposed, a high-voltage composite power supply with a minimum value of zero and a maximum value of twice the peak voltage is generated.

8. A system for generating an electron beam by outputting a cosine waveform high-voltage pulse according to claim 6, characterized in that, The adjustment of the fundamental frequency of the sinusoidal AC high-voltage power supply according to the required pulse width means changing its waveform frequency by doubling the fundamental frequency of the sinusoidal AC high-voltage power supply. n-1 times the frequency.

9. A computer-readable storage medium storing one or more programs, characterized in that, The one or more programs include instructions that, when executed by a computing device, cause the computing device to execute any of the methods described in claims 1 to 5.

10. A computing device, characterized in that, It includes: One or more processors and a memory. The memory stores one or more programs and is configured to be executed by the one or more processors. The one or more programs include instructions for executing any of the methods described in claims 1 to 5.

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