Cleaning device for processing upper electrode plate of CVD (Chemical Vapor Deposition) reaction chamber

Abstract

The invention relates to the technical field of upper electrode plate processing, in particular to a cleaning device for processing an upper electrode plate of a CVD (chemical vapor deposition) reaction chamber, which comprises a triangular support frame with two inclined sides, a to-be-cleaned aluminum plate is placed on the inclined surface of one side of the triangular support frame, and a cleaning device for cleaning the to-be-cleaned aluminum plate is arranged on one side of the outside of the triangular support frame. The cleaning device performs high-pressure water flushing along the surface of the to-be-cleaned aluminum plate in an S-shaped path to clean aluminum skimmings in holes in the surface of the aluminum plate; the cleaning device comprises an outer fixing frame, and side fixing frames are symmetrically and fixedly connected to the front side and the rear side of the outer fixing frame, high-speed cleaning and purging of aluminum scraps in a hole groove in the machining process of the upper electrode plate of the CVD reaction cavity can be achieved through the cleaning device, and compared with traditional manual cleaning, the cleaning treatment efficiency is improved, and the cleaning efficiency is improved. And aluminum scrap residues in the holes are reduced, and the product treatment efficiency and quality are further improved through a cleaning and purging mode.

Description

Technical Field

[0001] The present invention relates to the technical field of upper electrode plate processing, in particular to a cleaning device for processing the upper electrode plate of a CVD reaction chamber. Background Art

[0002] In the CVD (chemical vapor deposition) process, drilling the top electrode and cleaning the aluminum chips from the holes are key steps in the design of process stability, film quality, and equipment reliability. The specific reasons are as follows: 1. The core purpose of upper electrode drilling The top electrode is one of the core components of the CVD reaction chamber (especially in plasma-enhanced CVD, or PECVD). Its hole design mainly serves the following process requirements: 1. Achieve uniform distribution of reaction gas The CVD process requires that reactive gases (such as silane and ammonia) form a stable and uniform concentration field on the surface of a substrate (such as a wafer). The holes in the top electrode serve as gas pathways, uniformly introducing gas from the top of the chamber. By properly designing the number, diameter, and distribution density of holes, the gas is guided into either laminar or turbulent flow, ensuring uniform coverage of the substrate surface (typically located at the bottom electrode).

[0003] If the gas distribution is uneven, it will lead to differences in reaction rates in different areas of the substrate, directly causing problems such as uneven film thickness and composition deviation (such as fluctuations in doping concentration), seriously affecting device performance (such as the electrical consistency of semiconductor chips).

[0004] 2. Optimize the morphology and stability of plasma In PECVD, the top electrode is often used as the application end of radio frequency (RF) energy, forming an electric field with the bottom electrode to excite the plasma. The hole design can adjust the electric field distribution: Reduce the reflection and loss of RF energy, making the plasma more concentrated and more uniform in the center of the chamber; Avoid the "edge effect" caused by excessively strong edge electric fields (such as the film at the edge of the substrate being too thick or too thin), while suppressing abnormal fluctuations in the plasma "sheath" to ensure the stability of the reaction.

[0005] 3. Auxiliary chamber pressure and temperature control Some holes can be used as pressure balance channels, working with the vacuum pump to adjust the vacuum level in the chamber to ensure that the reaction proceeds in a stable pressure environment; For upper electrodes that require temperature control (such as designs with built-in cooling water channels), the holes can assist in heat diffusion, avoiding electrode deformation or uneven chamber temperature caused by local overheating, and indirectly ensuring the consistency of substrate temperature.

[0006] 2. The necessity of cleaning aluminum chips in the hole The upper electrode is mostly made of aluminum alloy (which has advantages in electrical conductivity, thermal conductivity, and cost). Aluminum chips will inevitably remain during the drilling process. If not thoroughly cleaned, it will cause multiple damages to the process: 1. Prevent aluminum chips from contaminating the film and reduce the defect rate CVD has a very low tolerance for impurities (especially in semiconductor manufacturing, where micron-sized particles can cause device failure). If aluminum chips remain in the hole, they may fall off during the process due to airflow impact, vibration, or plasma bombardment, directly: Falling onto the substrate surface, it forms “particle defects”, leading to abnormal local thickness of the film or failure of insulation / conductivity; Mixed into the plasma, it participates in chemical reactions to generate heterogeneous phases (such as aluminum compounds) and changes the composition of the film (for example, the mixing of aluminum impurities into the silicon oxide film will lead to abnormal dielectric constant).

[0007] 2. Avoid hole clogging and ensure process stability If aluminum chips accumulate in the hole, they will reduce or even block the gas passage, destroying the original airflow design: This results in uneven gas distribution and film thickness deviation; Changing the pressure field and plasma morphology in the chamber causes fluctuations in process parameters (such as deposition rate and film stress), affecting batch-to-batch consistency.

[0008] 3. Protect electrodes and chamber equipment to extend service life Residual aluminum chips may react abnormally in a radio frequency electric field or high temperature environment (such as aluminum being oxidized by plasma to form Al2O3), forming hard deposits attached to the hole wall, which may cause the following in the long term: The electrode structure is corroded or damaged, reducing its conductivity and RF energy coupling efficiency; Subsequent cleaning becomes more difficult, and electrodes may even need to be replaced in advance, increasing equipment maintenance costs.

[0009] However, in the prior art, aluminum chips in the holes of the upper electrode plate are generally cleaned manually by using a spray gun or a water chamber for flushing. Due to the large number of holes, the manual cleaning method is not thorough, and a small amount of aluminum chips still remain, which affects subsequent processing and reduces product quality. Summary of the Invention

[0010] The purpose of the present invention is to provide a cleaning device for processing the upper electrode plate of a CVD reaction chamber. The present application can realize high-speed cleaning and purging of aluminum chips in the hole grooves during the processing of the upper electrode plate of the CVD reaction chamber through the cleaning device. Compared with traditional manual cleaning, it not only improves the cleaning process efficiency and reduces the residual aluminum chips in the hole, but also the cleaning and purging mode further improves the product processing efficiency and quality, so as to solve the problems raised in the above background technology.

[0011] To achieve the above objectives, the present invention provides the following technical solutions: a cleaning device for processing an upper electrode plate of a CVD reaction chamber, comprising a triangular support frame with inclined sides, an aluminum plate to be cleaned being placed on the inclined surface of one side of the triangular support frame, and a cleaning device for cleaning the aluminum plate to be cleaned being provided on the outer side of the triangular support frame. The cleaning device flushes the surface of the aluminum plate to be cleaned with high-pressure water in an S-shaped path to remove aluminum chips in the holes on the surface of the aluminum plate; The cleaning device includes an external fixing frame, and side fixing frames are symmetrically fixedly connected to the front and rear sides of the external fixing frame. The tilt design of the side fixing frames is consistent with the tilt angle of the aluminum plate after being placed on the triangular support frame. A crossbeam body is movably connected between the two side fixing frames. A lateral adjustment structure is provided between the crossbeam body and the side fixing frames. A cleaning structure is movably connected to the outer side of the beam body. The cleaning structure is driven by the lateral adjustment structure to move laterally along the beam body to clean the aluminum plate to be cleaned. The top of the external fixator is provided with a height driving structure, which drives the lateral adjustment structure, the beam body and the cleaning structure to adjust the height up and down; The cleaning structure comprises a sliding seat movably connected to the beam body, a fixed block fixed on the sliding seat, and a nozzle and a high-pressure nozzle connected and fixed on the fixed block.

[0012] Preferably, the beam body is designed in an I-shaped structure, the slide is slidably connected to the beam body and cannot be detached, and a conveyor chain is provided on the side of the beam body and one of the side fixing frames away from the aluminum plate, and cables, water pipes and air pipes are provided in the conveyor chain.

[0013] Preferably, there are several nozzles fixed on the fixed block at equal distances, and the outside of the nozzles is sleeved with a rubber tube.

[0014] Preferably, the height driving structure includes an L-shaped mounting frame fixed on the top of the external fixing frame, diagonal support frames are fixed on both sides of the mounting frame, the bottom of the diagonal support frame is connected and fixed to the external fixing frame, the bottom of the mounting frame is fixedly connected to a transmission box 1, and a servo motor fixedly connected to the mounting frame is provided on one side of the transmission box 1.

[0015] Preferably, one side of the transmission box one is rotatably connected with a connecting shaft, one end of the connecting shaft extends to the interior of the transmission box one, and the other end of the connecting shaft is fixed to the output shaft of the servo motor, and one end of the connecting shaft in the transmission box one is fixed with a bevel gear one, and the transmission box one is rotatably connected with a shaft rod one, and both ends of the shaft rod one are fixedly connected with a transmission shaft, and the transmission shaft passes through the transmission box one and extends to the outside of the transmission box one and is rotatably connected to the transmission box one, and the external sleeve of the shaft rod one is fixed with a bevel gear two, and the bevel gear one is meshed with the bevel gear two.

[0016] Preferably, the lateral adjustment structure includes a transmission box 2 fixed at both ends of the beam body, the transmission box 2 is movably connected to the side fixing frame, the transmission box 2 is internally rotatably connected to the second sprocket, and movable slots are provided on both sides of the connection between the transmission box 2 and the beam body, the second sprockets in the transmission box 2 on both sides are externally connected to the second chain belt, and the second chain belt extends through the movable slot and is distributed on both sides of the beam body, the slide is fixed to the second chain belt, the upper end face of the second sprocket is fixed with the shaft rod 2, the upper end face of the transmission box 2 is fixedly connected to the motor, and the output end of the motor is fixed to the shaft rod 2.

[0017] Preferably, a transmission box three is fixedly connected to the top of the side fixing frame, a first sprocket is rotatably connected to the transmission box three, the external transmission of the first sprocket is connected to the first chain belt, the first sprocket is fixed to one end of the transmission shaft, and one side of the transmission box two is fixed to the first chain belt, and the transmission structure of the transmission box two and the first chain belt is the same as the transmission structure of the slide seat and the second chain belt.

[0018] Preferably, a slide rail is slidably connected to the center of the lower end surface of the triangular support frame, and rollers are fixed on both sides of the lower end surface of the triangular support frame.

[0019] Compared with the prior art, the present invention has the following beneficial effects: The present application uses a cleaning device to achieve high-speed cleaning and purging of aluminum chips in the holes and grooves during the processing of the upper electrode plate of the CVD reaction chamber. Compared with traditional manual cleaning, it not only improves the cleaning process efficiency and reduces the residual aluminum chips in the holes, but also the cleaning and purging mode further improves the product processing efficiency and quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the specific embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0021] Figure 1 It is an overall structural view of the present invention; Figure 2 It is a front view of the overall structure of the present invention; Figure 3 An exploded view of the lateral adjustment structure and the cleaning structure of the present invention; Figure 4 A structural view of the height drive structure of the present invention; Figure 5 A top view of the height driving structure of the present invention; Figure 6 A cross-sectional view of a transmission box 1 of the present invention; Figure 7 It is a cross-sectional view of the transmission box three of the present invention.

[0022] Description of reference numerals: 1. Triangular support frame; 2. Aluminum plate; 3. External fixing frame; 4. Side fixing frame; 5. Beam body; 6. Height drive structure; 61. Mounting frame; 62. Servo motor; 63. Transmission box 1; 64. Transmission shaft; 65. Diagonal support frame; 66. Connecting shaft; 67. Bevel gear 1; 68. Bevel gear 2; 69. Shaft rod 1; 7. Lateral adjustment structure; 71. Transmission box 2; 72. Second chain belt; 73. Second sprocket; 74. Shaft rod 2; 75. Movable notch; 8. Cleaning structure; 81. Slide seat; 82. Fixed block; 83. Nozzle; 84. Rubber tube; 85. High-pressure nozzle; 9. First sprocket; 91. Transmission box 3; 92. First chain belt; 11. Roller; 12. Slide rail. DETAILED DESCRIPTION

[0023] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0024] See also Figures 1 to 7 , the present invention provides a technical solution: A cleaning device for processing the upper electrode plate of a CVD reaction chamber includes a triangular support frame 1 with inclined sides. An aluminum plate 2 to be cleaned is placed on the inclined surface of one side of the triangular support frame 1. A cleaning device for cleaning the aluminum plate 2 to be cleaned is provided on the outer side of the triangular support frame 1. The cleaning device flushes the surface of the aluminum plate 2 to be cleaned with high-pressure water in an S-shaped path to clean aluminum chips in the holes on the surface of the aluminum plate 2. A slide rail 12 is slidably connected to the center of the lower end surface of the triangular support frame 1, and rollers 11 are fixed on both sides of the lower end surface of the triangular support frame 1; The cleaning device includes an external fixing frame 3, and side fixing frames 4 are symmetrically fixedly connected to the front and rear sides of the external fixing frame 3. The tilt design of the side fixing frames 4 is consistent with the tilt angle of the aluminum plate 2 after being placed on the triangular support frame 1. A crossbeam body 5 is movably connected between the two side fixing frames 4. A lateral adjustment structure 7 is provided between the crossbeam body 5 and the side fixing frames 4. A cleaning structure 8 is movably connected to the outside of the crossbeam body 5. The cleaning structure 8 is driven by the lateral adjustment structure 7 to move laterally along the beam body 5 to clean the aluminum plate 2 to be cleaned; The top of the external fixator 3 is provided with a height driving structure 6, which drives the lateral adjustment structure 7, the beam body 5 and the cleaning structure 8 to adjust the height up and down; The cleaning structure 8 includes a slide 81 movably connected to the beam body 5 , a fixed block 82 fixed to the slide 81 , and a nozzle 83 and a high-pressure nozzle 85 connected and fixed to the fixed block 82 .

[0025] The crossbeam body 5 is designed in an I-shaped structure, and the slide 81 is slidably connected to the crossbeam body 5 and cannot be detached. A conveyor chain is provided on the side of the crossbeam body 5 and one of the side fixing frames 4 away from the aluminum plate 2, and cables, water pipes and air pipes are provided in the conveyor chain.

[0026] Specifically, if Figure 3 As shown, there are several nozzles 83, which are fixed on the fixed block 82 at equal distances. The outside of the nozzle 83 is connected with a rubber tube 84. The nozzle 83 is connected to the air pipe through the fixed block 82. The high-pressure nozzle 85 is connected to the water pipe. The water pipe is connected to a high-pressure water pump, and the air pipe is connected to an air compressor.

[0027] By adopting the above technical solution, the purpose of designing the rubber tube 84 here is that the thickness of different aluminum plates 2 is also different. In order to avoid the nozzle 83 accidentally touching the aluminum plate 2 and causing damage, the design of the rubber tube 84 can reduce damage without affecting cleaning. When working, water is first supplied to the high-pressure nozzle 85 through the water pipe, and the high-pressure nozzle 85 sprays water to clean the aluminum plate 2 with high-pressure spray to clean the aluminum chips in the holes on the surface of the aluminum plate 2. After cleaning is completed, the water pipe is closed, and the air pipe is enabled to transport gas to the nozzle 83 to spray high-pressure airflow on the surface of the aluminum plate 2. This can not only reduce the residual aluminum chips in the holes of the aluminum plate 2, but also the high-pressure spray gas further reduces the residual water stains on the surface of the aluminum plate 2, and accelerates the subsequent drying of the aluminum plate 2.

[0028] Specifically, if Figures 4 to 7As shown, the height driving structure 6 includes an L-shaped mounting frame 61 fixed to the top of the external fixing frame 3, and diagonal braces 65 are fixed on both sides of the mounting frame 61. The bottom of the diagonal brace 65 is connected and fixed to the external fixing frame 3. The bottom of the mounting frame 61 is fixedly connected to a transmission box 63, and a servo motor 62 fixedly connected to the mounting frame 61 is provided on one side of the transmission box 63. A connecting shaft 66 is rotatably connected to one side of the transmission box 63, and one end of the connecting shaft 66 extends to the interior of the transmission box 63. The other end of the connecting shaft 66 is fixed to the output shaft of the servo motor 62. A bevel gear 67 is fixed to one end of the connecting shaft 66 in the transmission box 1 63. A shaft 69 is rotatably connected to the transmission box 1 63. Both ends of the shaft 69 are fixedly connected to the transmission shaft 64. The transmission shaft 64 passes through the transmission box 1 63 and extends to the outside of the transmission box 1 63 and is rotatably connected to the transmission box 1 63. A bevel gear 2 68 is fixed to the outside of the shaft 1 69, and the bevel gear 1 67 is meshed with the bevel gear 2 68.

[0029] The top of the side fixing frame 4 is fixedly connected to a transmission box three 91, and the transmission box three 91 is rotatably connected to the first sprocket 9. The external transmission of the first sprocket 9 is connected to the first chain belt 92. The first sprocket 9 is fixed to one end of the transmission shaft 64, and one side of the transmission box two 71 is fixed to the first chain belt 92. The transmission structure of the transmission box two 71 and the first chain belt 92 is the same as the transmission structure of the slide 81 and the second chain belt 72.

[0030] By adopting the above technical solution, the external controller here controls the motor on the transmission box 2 71 to stop running, and then controls the motor on the transmission box 1 63 to run, and similarly drives the connecting shaft 66 to rotate through the servo motor 62, driving the bevel gear 1 67 to rotate, and under the meshing connection between the bevel gear 1 67 and the bevel gear 2 68, drives the shaft 1 69 to rotate, and then further drives the transmission shaft 64 to rotate, and the first sprocket 9 fixed at both ends of the transmission shaft 64 rotates, and then drives the first chain belt 92 to rotate, and drives the transmission box 2 71 connected to the first chain belt 92 to move downward, and then the servo motor 62 stops running at this time, and continues to control the motor on the transmission box 2 71 to run, thereby realizing the S-shaped path cleaning of the aluminum plate 2 to be cleaned by the cleaning structure 8.

[0031] Specifically, if Figure 1 and Figure 3As shown, the lateral adjustment structure 7 includes a transmission box 71 fixed at both ends of the beam body 5, the transmission box 71 is movably connected to the side fixing frame 4, the transmission box 71 is internally rotatably connected to the second sprocket 73, and movable slots 75 are provided on both sides of the connection between the transmission box 71 and the beam body 5. The second sprocket 73 in the transmission box 71 on both sides is externally connected to the second chain belt 72, and the second chain belt 72 extends through the movable slot 75 and is distributed on both sides of the beam body 5. The slide 81 is fixed to the second chain belt 72, and the upper end face of the second sprocket 73 is fixed with a shaft rod 74, and the upper end face of the transmission box 71 is fixedly connected to the motor, and the output end of the motor is fixed to the shaft rod 74.

[0032] By adopting the above technical solution, during operation, the external controller controls the start and stop of the servo motor 62 and the motor on the transmission box 2 71, as well as the speed after starting. First, the cleaning structure 8 in the initial state is located at the top of one of the side fixing frames 4, that is, at the corner of the entire triangular support frame 1. Subsequently, the motor on the transmission box 2 71 is controlled to run, and the second sprocket 73 in the transmission box 2 71 is driven to rotate through the rotation of the shaft 2 74, thereby driving the second chain belt 72 to rotate on the surface of the beam body 5, and driving the slide 81 and the fixed block 82 fixed to the second chain belt 72 to move along the surface of the beam body 5, thereby cooperating with the nozzle 83 and the rubber tube 84 to discharge water to rinse the holes on the surface of the aluminum plate 2 to be cleaned.

[0033] Working principle: The installation of the device of the present application requires the modification of the installation environment. The ground needs to be hardened and waterproofed, and a drainage channel needs to be built on the installation ground, and a filter grille needs to be installed on the drainage channel. A ground rail, that is, a slide rail 12 used in conjunction with the roller 11, etc., is fixed on the installation ground. An operation room is installed or built outside the device, and an opening for accommodating the entry and exit of the device is provided on the front side of the operation room. The purpose of this is that the aluminum plate 2 processed by the present application is heavy and generally needs to be used in conjunction with a truss lifting device. The aluminum plate 2 to be cleaned is hoisted and transported by the lifting device and then placed on the inclined placement platform of the triangular support frame 1. The bottom of the inclined placement platform of the triangular support frame 1 is provided with a placement base perpendicular to the inclined surface. Anti-wear pads need to be added to the inclined edge and base of the triangular support frame 1, such as hard foam cotton or rubber, mainly to avoid hard contact between the aluminum plate 2 and the triangular support frame 1, which causes scratches and wear of the aluminum plate 2. The cleaning device disclosed in the present application is a group. In fact, two groups can be installed, symmetrically distributed on both sides of the triangular support frame 1, and two groups of aluminum plates 2 to be cleaned can be processed at the same time; During operation, the tripod support frame 1 is manually or by building a driving device to move the tripod support frame 1 through the ground rail or slide rail 12 installed on the ground to the operating room where the displacement is installed. Then the truss lifting device lifts and transports the aluminum plate 2 to be cleaned and places it on the inclined placement area of ​​the tripod support frame 1. Then the tripod support frame 1 carries the aluminum plate 2 to be cleaned and moves back to the operating room to reset. Then the cleaning device is started to run. The cleaning device moves in an S-shaped cleaning path to spray high-pressure water flow into the holes on the surface of the aluminum plate 2 to be cleaned, flushing the aluminum chips in the holes so that the aluminum chips fall out of the holes. Then the flushing water flows down along the surface of the aluminum plate 2, carrying away the aluminum chips and dropping them to the ground. The cleaning water is filtered through the ground grille into the drain to be collected and filtered for treatment, and then the cleaning water is recycled through the water circulation treatment equipment. The fixed block 82 is connected to the external high-pressure water pump equipment through a water pipe. When working, the external controller controls the start and stop of the servo motor 62 and the motor on the transmission box 2 71, as well as the speed after starting. First, the cleaning structure 8 in the initial state is located at the top of one of the side fixing frames 4, that is, the corner of the entire triangular support frame 1. Subsequently, the motor on the transmission box 2 71 is controlled to run, and the second sprocket 73 in the transmission box 2 71 is driven to rotate through the rotation of the shaft 2 74, thereby driving the second chain belt 72 to rotate on the surface of the beam body 5, and driving the slide 81 and the fixed block 82 fixed to the second chain belt 72 to move along the surface of the beam body 5, thereby cooperating with the nozzle 83 and the rubber tube 84 to discharge water to flush the surface holes of the aluminum plate 2 to be cleaned. The design purpose of the rubber tube 84 here is because different aluminum plates 2 have different thicknesses. In order to avoid the nozzle 83 accidentally touching the aluminum plate 2 and causing damage, through The design of the rubber tube 84 can reduce damage without affecting cleaning. After the fixed block 82 in the cleaning structure 8 moves from one of the side fixing frames 4 to the other side fixing frame 4, the external controller controls the motor on the transmission box 2 71 to stop running, and then controls the motor on the transmission box 1 63 to run. Similarly, the servo motor 62 drives the connecting shaft 66 to rotate, driving the bevel gear 1 67 to rotate. Under the meshing connection between the bevel gear 1 67 and the bevel gear 2 68, the shaft 1 69 is driven to rotate, and then further drives the transmission shaft 64 to rotate. The first sprocket 9 fixed at both ends of the transmission shaft 64 rotates, and then drives the first chain belt 92 to rotate, driving the transmission box 2 71 connected to the first chain belt 92 to move downward. Then, the servo motor 62 stops running at this time and continues to control the motor on the transmission box 2 71 to run, thereby realizing the S-shaped path cleaning of the aluminum plate 2 to be cleaned by the cleaning structure 8.

[0034] During operation, water is first supplied to the high-pressure nozzle 85 through the water pipe. The high-pressure nozzle 85 sprays water to clean the aluminum plate 2 surface holes with high pressure. After the cleaning is completed, the water pipe is closed and the air pipe is enabled to transport gas to the nozzle 83 to spray high-pressure airflow on the surface of the aluminum plate 2. This can reduce the residual aluminum chips in the holes of the aluminum plate 2, and at the same time, the high-pressure spray gas further reduces the residual water stains on the surface of the aluminum plate 2, thereby accelerating the subsequent drying of the aluminum plate 2.

[0035] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the above embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A cleaning device for processing an upper electrode plate of a CVD reaction chamber, comprising a triangular support frame (1) with inclined design on both sides, an aluminum plate (2) to be cleaned is placed on the inclined surface of one side of the triangular support frame (1), and characterized in that: A cleaning device for cleaning the aluminum plate (2) to be cleaned is provided on one side of the outside of the triangular support frame (1). The cleaning device flushes the surface of the aluminum plate (2) to be cleaned with high-pressure water in an S-shaped path to clean aluminum chips in the holes on the surface of the aluminum plate (2). The cleaning device comprises an external fixing frame (3), and side fixing frames (4) are symmetrically fixedly connected to the front and rear sides of the external fixing frame (3), and the side fixing frames (4) are tilted so as to be consistent with the tilt angle of the aluminum plate (2) after being placed on the triangular support frame (1). A crossbeam body (5) is movably connected between the two side fixing frames (4), and a transverse adjustment structure (7) is provided between the crossbeam body (5) and the side fixing frames (4). A cleaning structure (8) is movably connected to the outside of the crossbeam body (5), and the cleaning structure (8) is driven by the transverse adjustment structure (7) to move laterally along the crossbeam body (5) to clean the aluminum plate (2) to be cleaned; A height driving structure (6) is provided on the top of the external fixing frame (3), and the height driving structure (6) drives the lateral adjustment structure, the beam body (5) and the cleaning structure (8) to adjust their heights up and down; The cleaning structure (8) includes a slide (81) movably connected to the crossbeam body (5), a fixed block (82) fixed to the slide (81), and a nozzle (83) and a high-pressure nozzle (85) connected to the fixed block (82).

2. The cleaning device for processing the upper electrode plate of a CVD reaction chamber according to claim 1, characterized in that: The crossbeam body (5) is designed in an I-shaped structure, the slide seat (81) is slidably connected to the crossbeam body (5) and cannot be separated, and a conveyor chain is provided on the side of the crossbeam body (5) and one of the side fixing frames (4) away from the aluminum plate (2), and the conveyor chain is provided with cables, water pipes, and air pipes.

3. The cleaning device for processing the upper electrode plate of a CVD reaction chamber according to claim 1, characterized in that: There are a plurality of nozzles (83) fixed on the fixed block (82) at equal distances, and a rubber tube (84) is sleeved on the outside of the nozzles (83).

4. The cleaning device for processing the upper electrode plate of a CVD reaction chamber according to claim 1, characterized in that: The height driving structure (6) includes an L-shaped mounting frame (61) fixed on the top of the external fixing frame (3), diagonal support frames (65) are fixed on both sides of the mounting frame (61), the bottom of the diagonal support frame (65) is connected and fixed to the external fixing frame (3), the bottom of the mounting frame (61) is fixedly connected to a transmission box (63), and a servo motor (62) fixedly connected to the mounting frame (61) is provided on one side of the transmission box (63).

5. The cleaning device for processing the upper electrode plate of a CVD reaction chamber according to claim 4, characterized in that: One side of the transmission box (63) is rotatably connected to a connecting shaft (66), one end of the connecting shaft (66) extends to the interior of the transmission box (63), and the other end of the connecting shaft (66) is fixed to the output shaft of the servo motor (62). One end of the connecting shaft (66) in the transmission box (63) is fixed with a bevel gear (67). The transmission box (63) is rotatably connected to a shaft (69), and both ends of the shaft (69) are fixedly connected to a transmission shaft (64). The transmission shaft (64) passes through the transmission box (63) and extends to the outside of the transmission box (63) and is rotatably connected to the transmission box (63). The outside of the shaft (69) is sleeved and fixed with a bevel gear (68), and the bevel gear (67) is meshed with the bevel gear (68).

6. The cleaning device for processing the upper electrode plate of a CVD reaction chamber according to claim 1, characterized in that: The lateral adjustment structure (7) includes a transmission box (71) fixed at both ends of the beam body (5), the transmission box (71) is movably connected to the side fixing frame (4), the transmission box (71) is internally rotatably connected to the second sprocket (73), and movable notches (75) are provided on both sides of the connection between the transmission box (71) and the beam body (5). The second sprockets (73) in the transmission box (71) on both sides are externally connected to the second chain belt (72), and the second chain belt (72) extends through the movable notches (75) and is distributed on both sides of the beam body (5). The slide (81) is fixed to the second chain belt (72), and the upper end surface of the second sprocket (73) is fixed to the shaft rod (74). The upper end surface of the transmission box (71) is fixedly connected to the motor, and the output end of the motor is fixed to the shaft rod (74).

7. The cleaning device for processing the upper electrode plate of a CVD reaction chamber according to claim 6, characterized in that: The top of the side fixing frame (4) is fixedly connected to a transmission box three (91), the transmission box three (91) is rotatably connected to a first sprocket (9), the external transmission of the first sprocket (9) is connected to a first chain belt (92), and the first sprocket (9) is fixed to one end of the transmission shaft (64).

8. The cleaning device for processing the upper electrode plate of a CVD reaction chamber according to claim 7, characterized in that: One side of the transmission box 2 (71) is fixed to the first chain belt (92), and the transmission structure of the transmission box 2 (71) and the first chain belt (92) is the same as the transmission structure of the slide seat (81) and the second chain belt (72).

9. The cleaning device for processing the upper electrode plate of a CVD reaction chamber according to claim 1, characterized in that: A slide rail (12) is slidably connected to the center of the lower end surface of the triangular support frame (1), and rollers (11) are fixed on both sides of the lower end surface of the triangular support frame (1).

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