Photonic crystal and preparation method thereof

Abstract

The invention provides a photonic crystal and a preparation method thereof, the photonic crystal comprises a first material and a second material, the first material is a main body of the photonic crystal, the first material is internally provided with bubble structures, and the bubble structures form an array; the second material is in the bubble structure. The photonic crystal has a three-dimensional array structure, the structural parameters are flexible and adjustable, and the photonic crystal has good optical performance. The method for preparing the photonic crystal is simple in manufacturing process, high in production efficiency and low in cost.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of photonic crystals, in particular to a photonic crystal and a preparation method thereof. BACKGROUND

[0002] The existing photonic crystals usually have one-dimensional or two-dimensional structures, and have the defects of simple structure, complex process and high difficulty in production.

[0003] Therefore, the photonic crystal needs to be further studied. SUMMARY

[0004] The present application aims to at least solve one of the technical problems in the prior art. To this end, the present application provides a photonic crystal and a preparation method thereof. The photonic crystal has a three-dimensional array structure, and has flexible adjustable structure parameters and good optical performance. The method for preparing the photonic crystal has simple production process, high production efficiency and low cost.

[0005] In a first aspect of the present application, a photonic crystal is provided. According to an embodiment of the present application, the photonic crystal comprises: a first material and a second material, the first material is the main body of the photonic crystal, the first material has a bubble structure inside, and the bubble structure forms an array; and the second material is in the bubble structure.

[0006] According to an embodiment of the present application, the first material is a transparent dielectric material; and the transparent dielectric material comprises at least one of quartz, glass, PMMA and PVA.

[0007] According to an embodiment of the present application, the second material comprises a laser-excited plasma gas.

[0008] According to an embodiment of the present application, the refractive index of the first material is different from the refractive index of the second material.

[0009] According to an embodiment of the present application, the shape of the bubble structure comprises at least one of a circle, an ellipse and a cylinder.

[0010] According to an embodiment of the present application, the diameter of the first material is not less than 50 nm.

[0011] According to an embodiment of the present application, the length of the bubble structure is 10 μm-50 nm.

[0012] According to an embodiment of the present application, the lateral spacing of the bubble structure is 1 μm-10 μm.

[0013] In a second aspect, the present application provides a method for preparing the photonic crystal of the first aspect. According to an embodiment of the present application, the method comprises: performing laser processing on the first material to obtain the photonic crystal; and the laser in the laser processing is obtained by exciting the second material.

[0014] According to an embodiment of the present application, the laser processing comprises at least one of laser processing, laser direct writing and laser cladding deposition.

[0015] Additional aspects and advantages of the present application will be in part apparent and in part pointed out hereinafter. BRIEF DESCRIPTION OF DRAWINGS

[0016] The above and / or additional aspects and advantages of the present application will become apparent and be readily appreciated from the following description, including the appended drawings, wherein:

[0017] Figure 1 A structural schematic diagram of a photonic crystal according to an embodiment of the present application is shown in FIG. 1;

[0018] Figure 2 A schematic diagram of the shape of a bubble inside a photonic crystal according to an embodiment of the present application is shown in FIG. 2;

[0019] Figure 3 A schematic diagram of the arrangement array structure of a bubble inside a photonic crystal according to an embodiment of the present application is shown in FIG. 3;

[0020] Main element symbol description: 1 - first material; 2 - second material. DETAILED DESCRIPTION

[0021] Embodiments of the present application are described in detail below. The embodiments described below are examples for explaining the present application and should not be understood as limiting the present application.

[0022] It should be noted that the terms "first", "second" are used only for the purpose of description and should not be understood as indicating or implying relative importance or implying that the indicated technical features are limited to one or more. Further, in the description of the present application, unless otherwise specified, the meaning of "a plurality of" is two or more.

[0023] The endpoints of the ranges and any values ​​disclosed herein are not limited to the precise ranges or values, and these ranges or values ​​should be understood to include values ​​close to these ranges or values. For numerical ranges, the endpoints of each range, the endpoints of each range and individual point values, and the individual point values ​​can be combined with each other to obtain one or more new numerical ranges, which should be considered to be specifically disclosed herein.

[0024] In this document, the terms "include" or "comprising" are open expressions, that is, including the contents specified in this application, but not excluding other contents.

[0025] As used herein, the terms "optionally," "optional," or "optionally" generally mean that the subsequently described event or circumstance may but need not occur, and that the description includes instances where the event or circumstance occurs and instances where it does not.

[0026] Photonic crystals

[0027] In the first aspect of the present application, the present application proposes a photonic crystal. According to the embodiment of the present application, referring to Figure 1 The photonic crystal includes: a first material and a second material, the first material is the main body of the photonic crystal, the interior of the first material has a bubble structure, the bubble structure forms an array; the second material is in the bubble structure.

[0028] In this way, a photonic crystal with a three-dimensional bubble array structure is constructed, which can precisely control the size, shape, spacing and arrangement of the bubbles, thereby achieving flexible regulation of the photonic crystal structure parameters, and can better meet the requirements of photonic crystal performance in different application scenarios. This, to a certain extent, solves the problems of low production efficiency, high cost and difficulty in flexible adjustment of the structure in the existing technology of photonic crystal manufacturing process.

[0029] According to an embodiment of the present application, the first material is a transparent dielectric material; the transparent dielectric material includes at least one of quartz, glass, PMMA, and PVA. Thus, the first material can be selected in a variety of ways, and the most suitable material can be selected based on actual application requirements to meet the different optical, mechanical, and chemical requirements of the photonic crystal.

[0030] According to an embodiment of the present application, the second material includes laser-excited plasma gas. Thus, the laser-excited plasma gas is used as the second material to form a bubble structure inside the photonic crystal.

[0031] According to an embodiment of the present application, the refractive index of the first material is different from the refractive index of the second material. Thus, the different refractive indices between the first and second materials are utilized to form a periodically varying refractive index distribution, thereby effectively controlling the propagation path and mode of light.

[0032] According to the embodiments of this application, reference Figure 2 The shape of the bubble structure includes at least one of a circle, an ellipse and a cylinder. Therefore, different bubble shapes will affect the propagation and refraction characteristics of light in the photonic crystal. The bubble structure can be adjusted according to actual needs to meet different optical performance requirements. Figure 3 Laser-excited plasma gas is used as the second material 2 to fill the bubble structure, and the bubble generation and gas filling process are precisely controlled by laser processing technology to form a bubble array structure inside the first material 1.

[0033] According to an embodiment of the present application, the diameter of the first material is not less than 50 nm. Therefore, reducing the diameter of the first material to as low as 50 nm can achieve structural design and functional optimization of the photonic crystal on a smaller scale.

[0034] According to some specific embodiments of the present application, the lateral spacing between the plurality of first materials may be as low as 500 nm.

[0035] According to an embodiment of the present application, the length of the bubble structure is 10 μm to 50 nm, for example, 10 μm, 50 μm, 100 μm, 1 nm, 10 nm, 20 nm, 30 nm, 40 nm, 50 nm, etc.

[0036] According to an embodiment of the present application, the lateral spacing of the bubble structures is 1 μm to 10 μm, for example, 1 μm, 2 μm, 3 μm, 4 μm, 5 μm, 6 μm, 7 μm, 8 μm, 9 μm, 10 μm, etc.

[0037] method

[0038] In its second aspect, this application proposes a method for preparing the photonic crystal described in the first aspect. According to embodiments of this application, the method comprises: laser processing the first material to obtain the photonic crystal; the laser light in the laser processing is excited by the second material. This method enables precise construction of the photonic crystal. The method is simple to operate and easy to control, effectively improving the production efficiency and quality of the photonic crystal.

[0039] According to an embodiment of the present application, the laser processing includes at least one of laser machining, laser direct writing and laser cladding deposition.

[0040] In the description of the specification, the description of the terms "one embodiment", "some embodiments", "an example", "a specific example", or "some examples" etc. means that the specific features, structures, materials or characteristics described in connection with the embodiment or example are contained in at least one embodiment or example of the present application. In the specification, the illustrative description of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any appropriate manner in any one or more embodiments or examples. In addition, the person skilled in the art can combine and combine the different embodiments or examples described in the specification and the features of the different embodiments or examples without contradiction.

[0041] Although the embodiments of the present application have been shown and described above, it is understood that the above-described embodiments are exemplary and are not to be construed as limiting the present application, and the person skilled in the art can make changes, modifications, replacements and variations to the above-described embodiments within the scope of the present application.

Claims

1. A photonic crystal, characterized in that: include: A first material and a second material, wherein the first material is the main body of the photonic crystal, and the interior of the first material has a bubble structure, and the bubble structure forms an array; The second material is in the bubble structure.

2. The photonic crystal according to claim 1, wherein: The first material is a transparent medium material; The transparent medium material includes at least one of quartz, glass, PMMA and PVA.

3. The photonic crystal according to claim 1, wherein: The second material includes a laser excited plasma gas.

4. The photonic crystal according to claim 1, wherein: The first material has a different refractive index than the second material.

5. The photonic crystal according to claim 1, wherein: The shape of the bubble structure includes at least one of a circle, an ellipse and a cylinder.

6. The photonic crystal according to claim 1, wherein: The diameter of the first material is not less than 50 nm.

7. The photonic crystal according to claim 1, wherein: The length of the bubble structure is 10 μm to 50 nm.

8. The photonic crystal according to claim 1, wherein: The lateral spacing of the bubble structures is 1 μm to 10 μm.

9. A method for preparing the photonic crystal according to any one of claims 1 to 8, characterized in that: include: The first material is subjected to laser processing to obtain the photonic crystal; the laser in the laser processing is obtained by exciting the second material.

10. The method according to claim 9, characterized in that The laser processing includes at least one of laser machining, laser direct writing and laser cladding deposition.

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