Hardware etching waste liquid regeneration treatment equipment

Abstract

The invention relates to hardware etching waste liquid regeneration treatment equipment in the technical field of etching waste liquid regeneration treatment, which comprises an electrolytic bath and a regeneration tank, a chlorine dissolving assembly is arranged between the electrolytic bath and the regeneration tank, a moving assembly is arranged on the electrolytic bath, a stirring assembly is arranged in the regeneration tank, and the electrolytic bath comprises a positive electrode chamber and a negative electrode chamber. A positive plate and a negative plate are arranged in the positive chamber and the negative chamber respectively, a connecting piece is arranged at the output end of the moving assembly, and the positive plate and the negative plate are provided with through grooves matched with the connecting piece. Chlorine generated by the anode chamber is mixed with the etching waste liquid through the chlorine dissolving assembly to form regeneration liquid, and the regeneration liquid is conveyed into the regeneration tank. In addition, the moving assembly drives the connecting piece to be matched with the penetrating grooves in the anode plate and the cathode plate, automatic hanging, taking and replacing of the electrode plates are achieved, and the operation efficiency and maintenance convenience of the equipment are improved. Meanwhile, the regeneration liquid in the regeneration tank is fully stirred through the stirring assembly, it is ensured that liquid components are uniform and stable, and therefore the recycling efficiency of the regeneration liquid is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of etching waste liquid regeneration treatment, and particularly relates to a hardware etching waste liquid regeneration treatment equipment. BACKGROUND

[0002] Etching is a kind of precision manufacturing process, which is widely used in hardware products, PCB circuit boards and semiconductor manufacturing fields. Through chemical reaction between etching liquid and metal surface, micron-level accurate removal of metal materials is realized. In actual production process, etching liquid will gradually lose effectiveness with the reaction, and etching waste liquid containing a large amount of heavy metal ions is generated. If the waste liquid is directly discharged without effective treatment, not only serious environmental pollution will be caused, but also valuable metal resources will be wasted. The existing etching waste liquid regeneration treatment equipment regenerates the etching waste liquid by chemical oxidation method, electrolysis method or evaporation and salt separation method, so as to realize the recycling of etching liquid and the recovery of metal resources.

[0003] Among them, the electrolysis method makes the etching waste liquid produce chemical reaction through the contact of the anode plate and the cathode plate with the etching waste liquid, so as to realize the recovery of metal ions and the regeneration of etching liquid. However, in the electrolysis process, a large amount of chlorine gas is released from the anode chamber, which constitutes a safety hazard to the surrounding environment and operating personnel. In addition, with the continuous electrolysis, the metal ions in the cathode chamber are continuously deposited on the cathode plate, which causes the surface of the cathode plate to be gradually covered by a metal layer, thereby reducing the conductivity and affecting the electrolysis efficiency. The electrode plate needs to be taken out manually for cleaning to maintain the electrolysis efficiency, which not only increases the maintenance cost, but also affects the continuous operation ability of the equipment. Therefore, the present application proposes a hardware etching waste liquid regeneration treatment equipment to solve the problems of chlorine gas emission and cathode plate. SUMMARY

[0004] The present application provides a hardware etching waste liquid regeneration treatment equipment to solve the problems mentioned in the background.

[0005] The purpose of the present application is achieved by the following way:

[0006] A hardware etching waste liquid regeneration treatment equipment, comprising an electrolytic tank and a regeneration tank, a chlorine gas dissolving assembly is arranged between the electrolytic tank and the regeneration tank, a moving assembly matched with the electrolytic tank is arranged at the upper end of the electrolytic tank, and a stirring assembly is arranged in the regeneration tank.

[0007] The electrolytic tank comprises an anode chamber and a cathode chamber, a bipolar plate is arranged between the anode chamber and the cathode chamber, and a plurality of detachable anode plates and cathode plates are arranged in the anode chamber and the cathode chamber respectively.

[0008] The input end and the output end of the chlorine gas dissolving assembly are connected with the anode chamber and the regeneration tank respectively.

[0009] The output end of the moving assembly is provided with a connecting piece matched with the anode plate and the cathode plate.

[0010] Further, the anode chamber and the cathode chamber are connected with an external liquid supply system through a first water pump, and the cathode chamber is connected with the anode chamber through a second water pump.

[0011] Further, one side of the electrolytic cell is provided with an electrically conductive strip matched with the anode chamber and the cathode chamber, and the electrically conductive strip is provided with an electrically conductive clamping block matched with the anode plate and the cathode plate.

[0012] Further, the bipolar plate comprises a fixed plate and an anode film and a cathode film arranged on both sides of the fixed plate.

[0013] Further, the anode film is a polytetrafluoroethylene microporous film, and the cathode film is an ion exchange film.

[0014] Further, the polytetrafluoroethylene microporous film is provided with a plurality of through holes, and the diameter of the through holes is 0.1-0.5um.

[0015] Further, the chlorine gas dissolving assembly comprises a centrifugal fan, a centrifugal pump and a jet device, the input ends of the centrifugal pump and the centrifugal fan are respectively connected with the anode chamber, the output ends of the centrifugal pump and the centrifugal fan are respectively connected with the input ends of the jet device, and the output end of the jet device is connected with the regeneration tank.

[0016] Further, a gas buffer tank is arranged between the jet device and the centrifugal fan, and the input end and the output end of the gas buffer tank are respectively connected with the output end and the input end of the centrifugal fan.

[0017] Further, the moving assembly comprises a support, a sliding plate and a lifting plate, the sliding plate is slidingly installed on the support through a first driving assembly, the sliding plate is provided with a second driving assembly matched with the lifting plate, and the connecting piece is arranged at the lower end of the lifting plate.

[0018] Further, the stirring assembly comprises a stirring rod, a stirring paddle and a driving motor, the stirring rod is rotatably installed in the regeneration tank, the stirring paddle is fixedly installed on the stirring rod, and the driving motor is connected with the stirring rod.

[0019] The application electrolyzes etching waste liquid in the anode chamber and the cathode chamber through the anode plate and the cathode plate, mixes the chlorine generated in the anode chamber with the etching waste liquid through the chlorine dissolving assembly, forms the regenerated liquid and delivers the regenerated liquid into the regeneration tank. In addition, the automatic hanging and replacing of the electrode plate are realized through the moving assembly, the connecting piece, the through grooves on the anode plate and the cathode plate, the operation efficiency and the maintenance convenience of the equipment are improved. Meanwhile, the regenerated liquid in the regeneration tank is fully stirred through the stirring assembly, the uniformity and stability of the liquid composition are ensured, and the recycling efficiency of the regenerated liquid is improved. BRIEF DESCRIPTION OF DRAWINGS

[0020] Figure 1 It is a first structural schematic view of the hardware etching waste liquid regeneration treatment equipment.

[0021] Figure 2 It is a second structural schematic view of the hardware etching waste liquid regeneration treatment equipment. Figure 1 It is an enlarged view of A.

[0022] Figure 3 It is a second structural schematic view of the hardware etching waste liquid regeneration treatment equipment.

[0023] Figure 4 It is an enlarged view of B. Figure 3

[0024] It is an enlarged view of C. Figure 5 Figure 3 It is an enlarged view of D.

[0025] Figure 6 Figure 3 It is a partial enlarged view of the hardware etching waste liquid regeneration treatment equipment.

[0026] Figure 7 It is a sectional view of the hardware etching waste liquid regeneration treatment equipment.

[0027] Figure 8 It is a sectional view of the hardware etching waste liquid regeneration treatment equipment.

[0028] Figure 9 It is an enlarged view of E. Figure 8

[0029] It is an enlarged view of F. Figure 10 Figure 8 It is an exploded schematic view of the bipolar plate.

[0030] Figure 11

[0031] ​​​​The reference signs in the figure are: 1-electrolytic cell, 11-anode chamber, 111-anode plate, 12-cathode chamber, 121-cathode plate, 13-bipolar plate, 131-fixing plate, 132-anode film, 133-cathode film, 14-gas collection pipeline, 15-sealing cover plate, 16-through groove, 17-first water pump, 18-second water pump, 19-conductive strip, 191-conductive clamping block, 2-regeneration tank, 3-chlorine dissolving assembly, 31-centrifugal fan, 32-centrifugal pump, 33-jet device, 331-gas inlet, 332-liquid inlet, 333-output interface, 34-gas buffer tank, 4-moving assembly, 41-connection piece, 42-bracket, 43-sliding plate, 44-lifting plate, 45-first driving assembly, 46-second driving assembly, 5-stirring assembly, 51-stirring rod, 52-stirring paddle, 53-driving motor, 6-stand. DETAILED DESCRIPTION

[0032] The application will be further described in detail below in combination with the drawings and specific embodiments.

[0033] The embodiment refers to Figure 1 - Figure 11 A hardware etching waste liquid regeneration treatment equipment, which comprises an electrolytic cell 1 and a regeneration tank 2, and a chlorine dissolving assembly 3 is arranged between the electrolytic cell 1 and the regeneration tank 2, a moving assembly 4 is arranged at the upper end of the electrolytic cell 1, a stirring assembly 5 is arranged in the regeneration tank 2, the electrolytic cell 1 comprises an anode chamber 11 and a cathode chamber 12, a bipolar plate 13 is arranged between the anode chamber 11 and the cathode chamber 12, and a plurality of detachable anode plates 111 and cathode plates 121 are arranged in the anode chamber 11 and the cathode chamber 12 respectively.

[0034] The input end and the output end of the chlorine dissolving assembly 3 are connected with the anode chamber 11 and the regeneration tank 2 respectively, a gas collection pipeline 14 is arranged on one side of the electrolytic cell 1 and connected with the anode chamber 11 and the chlorine dissolving assembly 3, a sealing cover plate 15 is arranged at the upper end of the anode chamber 11, a clamping plate is arranged at the upper end of the electrolytic cell 1 and matched with the sealing cover plate 15, clamping grooves matched with the anode plates 111 and the cathode plates 121 are arranged at the two sides of the clamping plate in a penetrating manner, and the sealing cover plate 15 is detachably installed on the clamping plate, so that the chlorine gas is prevented from leaking and the sealing cover plate 15 can be quickly detached from the clamping plate, thereby facilitating the maintenance and replacement of the anode plates 111. The clamping plate is made of transparent plastic material with corrosion resistance, so that the working state of the electrolytic cell 1 can be observed, and the stability and durability of the overall structure are ensured.

[0035] The output end of the moving assembly 4 is provided with a connecting piece 41 connected with the anode plate 111 and the cathode plate 121, and the anode plate 111 and the cathode plate 121 are provided with a through groove 16 matched with the connecting piece 41. One side of the electrolytic tank 1 is provided with a placing rack 6 matched with the anode plate 111 or the cathode plate 121, and the placing rack 6 is provided with fixed racks at intervals for placing the anode plate 111 or the cathode plate 121. The fixed racks are provided with positioning grooves matched with the anode plate 111 and the cathode plate 121, so that the anode plate 111 and the cathode plate 121 can be stably placed during replacement or maintenance. The two sides of the positioning grooves are provided with guide inclined surfaces, so that the anode plate 111 and the cathode plate 121 can be smoothly slid into the positioning grooves when placed, avoiding falling and other situations caused by misplacement or inclination.

[0036] In use, the connecting piece 41 is lifted and horizontally moved by the moving assembly 4, so that the anode plate 111 or the cathode plate 121 is taken out of the electrolytic tank 1 and placed on the fixed rack of the placing rack 6, and the new anode plate 111 or the cathode plate 121 is taken out of the fixed rack and installed into the electrolytic tank 1, realizing quick replacement of the anode plate 111 and the cathode plate 121. Then the old anode plate 111 and the cathode plate 121 are recycled, effectively improving the use efficiency and environmental performance of the equipment.

[0037] In the embodiment, the hook is used as the connecting piece 41 matched with the through groove 16. The hook is made of corrosion-resistant and high-strength composite material, which can withstand large tension and corrosion environment, and can still maintain stable performance under frequent lifting and harsh working conditions.

[0038] One side of the electrolytic tank 1 is provided with a conductive strip 19 matched with the anode chamber 11 and the cathode chamber 12, and the conductive strip 19 is provided with a conductive clamping block 191 matched with the anode plate 111 and the cathode plate 121. The conductive strip 19 is fixedly installed on one side of the electrolytic tank 1 by bolts, and the lower end of the conductive clamping block 191 is in contact with the upper end of the conductive strip 19 and is fixed by bolts, so as to ensure stable and reliable electrical connection between the anode plate 111 and the cathode plate 121 and the conductive strip 19.

[0039] The anode plate 111 and the cathode plate 121 are connected with the positive and negative poles of the power supply through the cooperation of the conductive strip 19 and the conductive clamping block 191, so as to ensure uniform distribution of current and improve electrolysis efficiency. The contact part of the conductive clamping block 191 is matched in size with the anode plate 111 and the cathode plate 121, so as to ensure stable connection and good conductivity. The conductive strip 19 is connected with the external power supply, and the on-off and current size of the power supply are controlled to realize accurate control of the electrolysis process, thereby further improving the overall operation efficiency and safety of the equipment.

[0040] The conductive strip 19 and the conductive block 191 are made of copper alloy material with high conductivity and low resistance. The surfaces of the conductive strip 19 and the conductive block 191 are subjected to special oxidation resistance and corrosion resistance treatment to ensure the stability of the conductivity during long-term use, avoid poor contact or increased resistance caused by oxidation or corrosion, and affect the electrolysis efficiency. At the same time, the selection of such materials can effectively prolong the service life of the equipment, reduce the maintenance frequency, and further improve the reliability and economy of the equipment operation.

[0041] The anode plate 111 and the cathode plate 121 are both composed of a clamping frame and an electrode sheet. The clamping frame is provided with fixing blocks on both sides matched with the clamping grooves. The inside of the clamping frame is provided with a limiting groove matched with the electrode sheet. The electrode sheet is slidably installed in the clamping frame through the limiting groove and is positionally locked by a bolt or other fixing means to ensure the stability of the electrode sheet during electrolysis.

[0042] In this embodiment, the electrolytic tank 1 is used for decomposing acidic copper chloride etching waste liquid. The anode electrode sheet is a titanium-based coated electrode sheet, which has excellent corrosion resistance and high electrocatalytic activity, ensuring efficient reaction during electrolysis and effectively prolonging the service life of the electrode and reducing the maintenance frequency. The cathode electrode sheet is a titanium plate, which has good mechanical strength and corrosion resistance while ensuring conductivity, can adapt to long-term electrolysis working environment, and thus ensures the stable progress of the cathode reaction. Through reasonable material selection and structural design of the anode plate 111 and the cathode plate 121, the electrolytic tank 1 has higher reaction efficiency and stability when treating acidic copper chloride etching waste liquid.

[0043] In use, the anode plate 111 is connected to the positive pole of the power supply through the cooperation of the conductive strip 19 and the conductive block 191, and an oxidation reaction occurs, with the chemical formula being 2Cl-→Cl2↑+2e - . Through the oxidation reaction, the chloride ions in the etching waste liquid are oxidized to generate chlorine gas. The generated chlorine gas is dissolved in the etching waste liquid through the chlorine gas dissolving assembly 3 and reacts with cuprous ions, with the chemical formula being: Cl2+2Cu + →2Cu 2+ +2Cl-, restoring the oxidation ability of the etching liquid.

[0044] The cathode plate 121 is connected to the negative pole of the power supply through the cooperation of the conductive strip 19 and the conductive block 191, and a reduction reaction occurs, with the chemical formula being Cu 2+ +2e - →Cu. Through the reduction reaction, the divalent copper ions in the etching waste liquid obtain electrons on the surface of the cathode plate 121 and are reduced to metallic copper deposited on the surface of the cathode plate 121, forming plate copper and realizing the recycling of copper resources.

[0045] The electrolytic tank 1 is provided with a sealing groove matched with the bipolar plate 13 in the tank body, and the outer side of the bipolar plate 13 is provided with a sealing strip matched with the sealing groove, so that the bipolar plate 13 and the tank body are tightly connected through the cooperation of the sealing strip and the sealing groove, thereby preventing the cross contamination of etching waste liquid between the cathode chamber 12 and the anode chamber 11, and ensuring the independence and reaction efficiency of the electrolysis process.

[0046] The bipolar plate 13 comprises a fixed plate 131, an anode film 132 and a cathode film 133 arranged on both sides of the fixed plate 131. The fixed plate 131 comprises a fixed frame and a frame, and the two sides of the fixed frame are provided with extension fixing parts matched with the clamping grooves. The fixed frame is connected and matched with the frame through the mounting plate, so as to form a stable connection structure and ensure the stable installation of the bipolar plate 13 in the electrolytic tank 1.

[0047] The frame comprises a left frame body, a right frame body and a middle frame, and a plurality of through holes are arranged on the middle frame. The anode film 132 and the cathode film 133 are respectively arranged on both sides of the middle frame, and the left frame body and the right frame body are respectively provided with a sealing rubber strip. The left frame body and the right frame body are fixedly connected with the middle frame respectively, so that the sealing rubber strip is tightly attached to the edge part of the cathode film 133 and the anode film 132. In this way, the anode film 132 and the cathode film 133 are fixed on the frame, and at the same time, the anode film 132 and the cathode film 133 are effectively sealed, preventing the etching waste liquid from seeping from the edge of the film to cause the cross mixing of the liquid between the cathode chamber 12 and the anode chamber 11, thereby further improving the independence and reaction efficiency of the electrolysis process.

[0048] The anode film 132 is a polytetrafluoroethylene microporous film, and the cathode film 133 is an ion exchange film. A plurality of through holes are arranged on the polytetrafluoroethylene microporous film, and the diameter of the through holes is 0.1-0.5 um. The small hole structure can effectively prevent the migration of copper ions and other particulate matters through physical isolation while ensuring the gas permeability of the polytetrafluoroethylene microporous film, thereby preventing the cross contamination between the cathode chamber 12 and the anode chamber 11. The ion exchange film allows the selective permeation of specific ions, so that the ion migration path in the electrolysis process is more clear, and the current efficiency is improved.

[0049] The polytetrafluoroethylene microporous film is arranged on one side of the bipolar plate 13 close to the anode chamber 11, and the ion exchange film is arranged on the other side of the bipolar plate 13 close to the cathode chamber 12. In this embodiment, the ion exchange film allows the Cl-, OH- and other anions to permeate while effectively blocking the Cu 2+ , Cu+ and other cations from migrating to the cathode chamber 12, thereby ensuring the directional migration of ions in the electrolysis process, maintaining the low copper concentration environment of the cathode chamber 12, and ensuring the purity of copper deposition. The polytetrafluoroethylene microporous film blocks the Cu + and other ions from migrating to the anode chamber 11 through physical isolation, prevents the pollution of the anode chamber 11, allows Cl- to permeate freely, and ensures the generation reaction of anode chlorine gas.

[0050] The anode chamber 11 and the cathode chamber 12 are connected with an external liquid supply system through a first water pump 17, and the cathode chamber 12 is connected with the anode chamber 11 through a second water pump 18. The etching waste liquid and the dilution liquid of the etching waste liquid in the external liquid supply system are respectively delivered to the anode chamber 11 and the cathode chamber 12 through the first water pump 17, and the copper ion concentration of the dilution liquid of the etching waste liquid needs to be lower than that of the etching waste liquid, so as to prevent Cu 2+ from reverse migration to the cathode chamber 12, resulting in repeated oxidation, reducing current efficiency, and causing hydrogen evolution to affect copper deposition efficiency. The second water pump 18 is used to deliver the electrolyzed etching waste liquid in the cathode chamber 12 to the anode chamber 11, oxidize the residual cuprous ions by anode reaction, restore the etching activity of the etching waste liquid, and realize the recycling and reuse of the etching waste liquid.

[0051] The chlorine gas dissolving assembly 3 comprises a centrifugal fan 31, a centrifugal pump 32 and a jet device 33. The input ends of the centrifugal pump 32 and the centrifugal fan 31 are respectively connected with the anode chamber 11. The output ends of the centrifugal pump 32 and the centrifugal fan 31 are respectively connected with the input ends of the jet device 33. The output end of the jet device 33 is connected with the regeneration tank 2.

[0052] The input end of the jet device 33 is provided with a gas inlet 331 and a liquid inlet 332. The output end of the jet device 33 is provided with an output interface 333. The output ends of the centrifugal pump 32 and the centrifugal fan 31 are respectively connected with the liquid inlet 332 and the gas inlet 331. The regeneration tank 2 is connected with the output interface 333.

[0053] The input end of the centrifugal fan 31 is communicated with the anode chamber 11 through a gas collecting pipe 14, so as to extract the chlorine gas generated in the anode chamber 11 to the gas inlet 331 of the jet device 33. The centrifugal pump 32 delivers the etching waste liquid in the anode chamber 11 to the liquid inlet 332 of the jet device 33, so as to fully mix and dissolve the chlorine gas and the etching waste liquid in the jet device 33, form a regeneration liquid, and deliver the regeneration liquid to the regeneration tank 2 through the output interface 333.

[0054] In the embodiment, the fluidic device 33 is a Venturi tube, which is provided with a converging section, a throat section and a diverging section. The gas inlet 331 is arranged on the side wall of the throat section, the liquid inlet 332 is arranged at the front end of the converging section, and the output interface 333 is arranged at the end of the diverging section. The converging section can accelerate the fluid and establish a low pressure area, so that the chlorine gas is more easily mixed and dissolved with the etching waste liquid in a low pressure environment. The throat section provides sufficient contact and mixing space for the chlorine gas and the etching waste liquid, further improving the dissolution efficiency. The diverging section helps to reduce the fluid velocity, increase the pressure, and make the mixed liquid more stably output to the regeneration tank 2. In addition, a check valve is arranged between the centrifugal fan 31 and the gas inlet 331 of the Venturi tube, so as to prevent the etching waste liquid from flowing back into the centrifugal fan 31 and causing corrosion or damage to the equipment.

[0055] A gas buffer tank 34 is arranged between the fluidic device 33 and the centrifugal fan 31. The input end and the output end of the gas buffer tank 34 are connected with the output end and the input end of the centrifugal fan 31 respectively. When more chlorine gas is generated by electrolysis, the excess chlorine gas can be temporarily stored in the gas buffer tank 34 through the centrifugal fan 31, so as to avoid the influence of the instantaneous high pressure of the chlorine gas on the dissolution effect, and the chlorine gas stored in the gas buffer tank 34 can be re-delivered to the fluidic device 33 through the centrifugal fan 31 when needed, further improving the utilization rate of the chlorine gas.

[0056] In addition, a connecting pipeline is arranged on the upper end of the regeneration tank 2 and communicates with the input end of the centrifugal fan 31, so as to ensure that the excess chlorine gas generated during the regeneration process can be circulated back to the fluidic device 33 or the gas buffer tank 34, avoiding environmental pollution or safety hazards caused by chlorine gas overflow.

[0057] Through the cooperation of the fluidic device 33, the gas buffer tank 34 and the centrifugal fan 31, the efficient dissolution and recycling of chlorine gas are fully realized, the zero emission of chlorine gas is realized, the resource is fully utilized, the problems of resource waste and environmental pollution existing in the traditional chlorine gas treatment mode are replaced, the operation cost of the etching process is further reduced, and the production efficiency and environmental protection level are improved.

[0058] Electric control valves are arranged between the centrifugal fan 31 and the regeneration tank 2, the gas buffer tank 34, the gas collecting pipeline 14 and the fluidic device 33. The flow direction and flow rate of the chlorine gas can be accurately controlled through the electric control valves, so that the chlorine gas is more efficiently and stably delivered.

[0059] The moving assembly 4 comprises a support 42, a sliding plate 43 and a lifting plate 44. The sliding plate 43 is slidably installed on the support 42 through a first driving assembly 45. The sliding plate 43 is provided with a second driving assembly 46 matched with the lifting plate 44. The connecting piece 41 is arranged at the lower end of the lifting plate 44.

[0060] The first driving assembly 45 comprises a gear, a rack and a driving motor 53. The gear is connected with the output shaft of the driving motor 53. The rack is fixedly installed on the support 42. The driving motor 53 is fixedly installed on the sliding plate 43. The driving of the driving motor 53 enables the gear to drive the rack, thereby driving the sliding plate 43 to slide along the support 42, so as to realize the horizontal movement adjustment.

[0061] The two sides of the sliding plate 43 are provided with sliding blocks. The two sides of the support 42 are provided with sliding rails matched with the sliding blocks. The cooperation of the sliding rails and the sliding blocks enables the sliding plate 43 to stably slide along the support 42, so as to avoid shaking or deviation during the movement, thereby improving the stability and reliability of the overall equipment operation.

[0062] The second driving assembly 46 comprises a screw rod and a rotating motor. The two sides of the sliding plate 43 are provided with support plates. The screw rod is rotatably installed on the support plates through rolling bearings. The rotating motor is installed on the sliding plate 43 through a motor base and is connected with one end of the screw rod through a shaft coupling. The two ends of the lifting plate 44 are fixedly installed with driving nuts matched with the screw rod. The driving of the rotating motor enables the screw rod to rotate, thereby driving the driving nuts to move along the screw rod, so as to drive the lifting plate 44 to vertically lift and adjust, and further drive the connecting piece 41 to lift and adjust.

[0063] In actual application, the cooperation and mutual cooperation of the first driving assembly 45 and the second driving assembly 46 enable the connecting piece 41 to accurately match and butt with the through grooves 16 on the cathode plate 121 and the anode plate 111. This process ensures that the connecting piece 41 can accurately and reliably combine with the through grooves 16 of the cathode plate 121 and the anode plate 111, so that the cathode plate 121 and the anode plate 111 can be easily and automatically suspended and disassembled. Through this ingenious design and fine process, the work efficiency is greatly improved, and the simplicity and safety of the operation process are ensured.

[0064] The stirring assembly 5 comprises a stirring rod 51, a stirring paddle 52 and a driving motor 53. The stirring rod 51 is rotatably installed in the regeneration tank 2. The stirring paddle 52 is fixedly installed on the stirring rod 51 through bolts. The driving motor 53 is arranged at one end of the regeneration tank 2 and is connected with the stirring rod 51. The upper end of the regeneration tank 2 is provided with a detachable gland. The stirring rod 51 is rotatably installed on the gland through a bearing seat and is inserted into the regeneration tank 2. The driving motor 53 is fixedly installed on the gland and is connected with the upper end of the stirring rod 51.

[0065] Through the driving of the motor 53, the stirring rod 51 drives the stirring paddle 52 to rotate, thereby fully stirring the regeneration liquid in the regeneration tank 2. This process ensures the uniformity and reaction efficiency of the regeneration liquid, thereby significantly improving the regeneration effect. One side of the regeneration tank 2 is provided with a liquid supplementing port to facilitate dilution of the regeneration liquid when needed. At the same time, a feeding port is provided on one side of the gland, which facilitates the addition of required chemical agents or materials into the regeneration tank 2.

[0066] In this embodiment, the liquid supplementing port is connected to an external water source through a pipeline, which can effectively dilute the concentration of the regeneration liquid and ensure that it is always in the best working condition. In addition, the required chemical agents or materials are added to the regeneration tank 2 through the feeding port, which fully mixes with the regeneration etching liquid in the regeneration tank 2, further improving the uniformity and reaction efficiency of the etching liquid. This design not only optimizes the regeneration process, but also ensures the efficient operation of the entire system, thereby improving the overall production efficiency and product quality.

[0067] The present application electrolyzes the etching waste liquid in the anode chamber 11 and the cathode chamber 12 through the anode plate 111 and the cathode plate 121. The chlorine gas generated in the anode chamber 11 is mixed with the etching waste liquid through the chlorine gas dissolving assembly 3 to form a regeneration liquid and is delivered into the regeneration tank 2. In addition, the moving assembly 4 drives the connecting piece 41 to cooperate with the through grooves 16 on the anode plate 111 and the cathode plate 121 to realize automatic hanging and replacing of the electrode plates, thereby improving the operation efficiency and maintenance convenience of the equipment. At the same time, the stirring assembly 5 fully stirs the regeneration liquid in the regeneration tank 2 to ensure that the liquid composition is uniform and stable, thereby improving the recycling efficiency of the regeneration liquid.

[0068] The above is only the preferred embodiment of the present application, and does not limit the present application in any form. Although the present application is disclosed as above with the preferred embodiment, it is not intended to limit the present application. Any skilled person in the art can make some changes or modifications to the above disclosed technical content without departing from the scope of the technical solution of the present application, and any equivalent embodiment with equivalent changes is equivalent to the above embodiment. Any simple modification, equivalent change and modification made to the above embodiment within the scope of the technical solution of the present application are within the scope of the technical solution of the present application.

Claims

1. A metal etching waste liquid regeneration treatment device, comprising an electrolytic cell (1) and a regeneration cell (2), characterized in that: A chlorine dissolution component (3) is provided between the electrolytic cell (1) and the regeneration tank (2). A moving component (4) that cooperates with the electrolytic cell (1) is provided at the upper end of the electrolytic cell (1). A stirring component (5) is provided inside the regeneration tank (2). The electrolytic cell (1) includes an anode chamber (11) and a cathode chamber (12). A bipolar plate (13) is provided between the anode chamber (11) and the cathode chamber (12). Several detachable anode plates (111) and cathode plates (121) are respectively provided in the anode chamber (11) and the cathode chamber (12). The input and output ends of the chlorine dissolution component (3) are connected to the anode chamber (11) and the regeneration tank (2), respectively. The output end of the moving component (4) is provided with a connector (41) for the anode plate (111) and the cathode plate (121), and the anode plate (111) and the cathode plate (121) are provided with through grooves (16) that cooperate with the connector (41).

2. The metal etching waste liquid regeneration treatment equipment according to claim 1, characterized in that: The anode chamber (11) and the cathode chamber (12) are connected to an external liquid supply system via a first water pump (17), and the cathode chamber (12) is connected to the anode chamber (11) via a second water pump (18).

3. The metal etching waste liquid regeneration treatment equipment according to claim 1, characterized in that: The electrolytic cell (1) is provided with conductive strips (19) on one side, which cooperate with the anode chamber (11) and the cathode chamber (12). The conductive strips (19) are provided with conductive blocks (191) that cooperate with the anode plate (111) and the cathode plate (121).

4. The metal etching waste liquid regeneration treatment equipment according to claim 1, characterized in that: The bipolar plate (13) includes a fixed plate (131) and an anode film (132) and a cathode film (133) disposed on both sides of the fixed plate (131).

5. The metal etching waste liquid regeneration treatment equipment according to claim 4, characterized in that: The anode membrane (132) is a polytetrafluoroethylene microporous membrane, and the cathode membrane (133) is an ion exchange membrane.

6. The metal etching waste liquid regeneration treatment equipment according to claim 5, characterized in that: The polytetrafluoroethylene microporous membrane has a plurality of through holes, the diameter of which is 0.1-0.5 μm.

7. The metal etching waste liquid regeneration treatment equipment according to claim 1, characterized in that: The chlorine dissolution assembly (3) includes a centrifugal fan (31), a centrifugal pump (32), and an ejector (33). The input ends of the centrifugal pump (32) and the centrifugal fan (31) are respectively connected to the anode chamber (11), the output ends of the centrifugal pump (32) and the centrifugal fan (31) are respectively connected to the input end of the ejector (33), and the output end of the ejector (33) is connected to the regeneration tank (2).

8. The metal etching waste liquid regeneration treatment equipment according to claim 7, characterized in that: A gas buffer tank (34) is provided between the jet injector (33) and the centrifugal fan (31), and the input and output ends of the gas buffer tank (34) are respectively connected to the output and input ends of the centrifugal fan (31).

9. The metal etching waste liquid regeneration treatment equipment according to claim 1, characterized in that: The moving component (4) includes a bracket (42), a sliding plate (43), and a lifting plate (44). The sliding plate (43) is slidably mounted on the bracket (42) via a first driving component (45). The sliding plate (43) is provided with a second driving component (46) that cooperates with the lifting plate (44). The connecting piece (41) is located at the lower end of the lifting plate (44).

10. The metal etching waste liquid regeneration treatment equipment according to claim 1, characterized in that: The stirring assembly (5) includes a stirring rod (51), a stirring paddle (52), and a drive motor (53). The stirring rod (51) is rotatably installed in the regeneration tank (2), the stirring paddle (52) is fixedly installed on the stirring rod (51), and the drive motor (53) is connected and cooperates with the stirring rod (51).

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