A controllable temperature atmosphere spin coating chamber based on a jacket and a spiral flow guide structure

Abstract

The application discloses a controllable temperature atmosphere spin coating chamber based on a jacket and a spiral flow guide structure, which comprises a synchronous chamber module, a substrate bearing table and a rotating table; the synchronous chamber module, the substrate bearing table and the rotating table are in a concentric structure; the synchronous chamber module is installed on the substrate bearing table, and the substrate bearing table is installed on the rotating table. The jacket structure made of aluminum alloy material is arranged on the side wall of the spin coating chamber, and temperature control gas is introduced to circulate in the jacket, so that the temperature of the chamber is effectively controlled, the temperature uniformity of the flow field in the chamber is ensured, and the solvent evaporation uniformity is improved. The spiral flow guide structure is arranged on the inner wall of the chamber, the airflow in the chamber is guided to rotate along a stable and regular path, the flow field disturbance caused by the square substrate is effectively weakened, the symmetry of the flow field distribution is improved, and the velocity uniformity of the flow field in the chamber is ensured. The application effectively reduces the film thickness difference in the spin coating process, and improves the film thickness uniformity.

Description

Technical Field

[0001] This invention belongs to the technical field of spin coaters and relates to a temperature-controlled atmosphere spin coater chamber based on a jacket and spiral flow guide structure, which is used to improve the temperature uniformity and flow rate uniformity of the airflow in the chamber during the spin coater process. Background Technology

[0002] Spin coating is one of the core technologies in thin film preparation, offering advantages such as simple process, fast film formation speed, high controllability of film thickness, and good film uniformity. The principle of spin coating involves dropping a solution onto a substrate surface and rotating the substrate at high speed, thereby forming a uniform film under the combined action of centrifugal force and solvent evaporation. The process includes solution distribution, spin-off, evaporation, and curing. During this process, the quality of the film is closely related to the spin coating process parameters and the atmosphere within the chamber. Spin coating is widely used in photolithography, solar cells, optical lenses, and sensors. In the manufacturing of various devices, film thickness uniformity is a key indicator of film quality and crucial for ensuring product performance and manufacturing yield. For example, in photolithography, uneven film thickness can cause exposure focusing inaccuracies, leading to linewidth variations and pattern blurring; in grating manufacturing, uneven film thickness can cause phase distortion, affecting imaging and measurement accuracy; and in sensor manufacturing, film thickness alters the refractive index, and uneven film thickness can affect sensing accuracy.

[0003] As the precision requirements of various equipment manufacturing processes increase, the requirements for the uniformity of spin-coated film thickness also become more stringent. The fabrication of high-precision devices places higher demands on film thickness uniformity, and existing spin-coating technologies are still insufficient to meet these increasingly stringent requirements. Based on the mechanism of spin-coating film formation, methods to improve film thickness uniformity can be approached from two angles: centrifugal thinning and solvent evaporation thinning. In the initial stage of spin-coating, centrifugal force and strong airflow shearing quickly smooth out film thickness differences and form a film under high-speed and uniform conditions. Solvent evaporation accompanies the entire film preparation process, and the evaporation rate is closely related to the temperature and airflow velocity within the chamber. The uniformity of evaporation determines the uniformity of the final film layer. Taking spin-coated photoresist as an example, the evaporation behavior of the solvent in the photoresist has a decisive influence on film thickness uniformity. When the temperature distribution of the airflow within the chamber is uneven, it leads to differences in the solvent evaporation rate in different areas, resulting in local film thickness fluctuations. Simultaneously, uneven airflow velocity may induce turbulence, vortices, or stagnant zones, disrupting the dynamic thinning of the liquid film during spin-coating and affecting the final film quality. Moreover, these differences in film thickness caused by uneven flow field in the chamber can easily lead to focusing errors and pattern distortion during subsequent exposure and development processes, thereby affecting the manufacturing accuracy and yield of the device.

[0004] Therefore, designing a high-performance spin coating chamber capable of improving the temperature uniformity and flow rate uniformity of the flow field in the spin coating chamber has become a key problem to be solved in the spin coating film industry. This requires that the chamber structure not only maintains the stability of the air flow rate in the chamber during the spin coating process, but also maintains the stability of the gas temperature in the chamber during the spin coating process to improve the uniformity of solvent evaporation and thus improve the uniformity of the spin coating film thickness. SUMMARY

[0005] To solve the above problems existing in the spin coating technology, the present application designs a spin coating chamber based on jacket temperature control and spiral flow guide structure which can effectively improve the stability of the temperature of the flow field in the chamber and the uniformity of the flow rate of the flow field in the chamber.

[0006] The technical scheme of the present application is as follows:

[0007] A controllable temperature atmosphere spin coating chamber based on jacket and spiral flow guide structure, comprising a synchronous chamber module, a substrate support and a rotating table; the synchronous chamber module, the substrate support and the rotating table are concentric structures; the synchronous chamber module is installed on the substrate support, and the substrate support is installed on the rotating table;

[0008] The synchronous chamber module is a jacket structure, and the material of the jacket structure is aluminum alloy material.

[0009] Further, the synchronous chamber module is composed of a jacket inner layer, a jacket middle layer and a jacket outer layer from inside to outside, and an inner and outer two-layer cavity structure is formed between the jacket inner layer and the jacket middle layer, and the jacket middle layer and the jacket outer layer; a jacket air hole is arranged at the bottom of the jacket middle layer; the jacket air hole communicates the inner and outer two-layer cavity structures; the inner layer of the cavity structure is communicated with a temperature control gas inlet; and the outer layer of the cavity structure is communicated with a temperature control gas outlet.

[0010] Further, a chamber top layer reinforcing rib is designed on the upper outer surface of the synchronous chamber module; the chamber top layer reinforcing rib has four, and the included angle between adjacent two is 90°, and is distributed in a cross structure.

[0011] A spiral flow guide structure is designed on the surface of the jacket inner layer of the synchronous chamber module facing the inside of the chamber.

[0012] Further, a buckle groove cooperating with the transmission of the substrate support is designed at the bottom of the synchronous chamber module; the buckle groove has 8; the buckle grooves are uniformly distributed in a ring shape at the bottom of the synchronous chamber module; a buckle boss cooperating with the transmission of the synchronous chamber module is designed on the substrate support; the buckle boss has 8; and the buckle bosses are uniformly distributed in a ring shape on the outer wall of the substrate support.

[0013] Further, the substrate support has a splash-proof slope; the splash-proof slope is an annular slope; the splash-proof slope is in contact with the inner wall of the synchronous chamber module; the splash-proof slope is connected with the liquid outlet; the substrate support has four annular liquid outlets; the substrate support has a cylindrical boss in the center; the cylindrical boss has a square substrate mounting platform in the center; the upper surface of the square substrate mounting platform is higher than the liquid outlet; the square substrate mounting platform has a through hole in the center for cooperating with the rotary table; the through hole has a temporary liquid storage tank inside; the temporary liquid storage tank has eight tanks; the base of the substrate support has two vertical surfaces and an inclined surface; the vertical surface and the inclined surface are respectively matched with the vertical surface and the inclined surface of the rotary table.

[0014] Further, the back of the substrate support has two groups of reinforcing ribs; the two groups of reinforcing ribs are respectively a chamber bottom annular reinforcing rib and a chamber bottom rectangular reinforcing rib; the chamber bottom annular reinforcing rib is on the outside, and the chamber bottom rectangular reinforcing rib is on the inside.

[0015] Further, the upper layer of the rotary table is a small-diameter cylinder, and the lower layer is a large-diameter cylinder; the small-diameter cylinder is connected to the lower layer large-diameter cylinder through a circular table; the rotary table has a vacuum hole in the center; the rotary table has two transmission holes, which are centrally symmetrically distributed on the bottom of the rotary table.

[0016] The beneficial effects of the present application are as follows:

[0017] The present application realizes effective regulation of the temperature in the chamber by setting an aluminum alloy material jacket structure on the side wall of the spin coating chamber and introducing temperature control gas to circulate in the jacket, thereby ensuring the temperature uniformity of the flow field inside the chamber. Thus, the solvent evaporation uniformity is improved. A stable thermal environment is provided for film thickness control in the spin coating process. The present application sets a spiral flow guide structure on the inner wall of the chamber to guide the airflow in the chamber to rotate along a stable and regular path, effectively weakening the flow field disturbance caused by the square substrate, improving the symmetry of the flow field distribution, and ensuring the velocity uniformity of the flow field inside the chamber, thereby providing a good airflow environment for film thickness control in the spin coating process. The present application realizes the simultaneous uniformity of the temperature and velocity of the gas flow field inside the chamber through the temperature control effect of the jacket structure and the rectification effect of the spiral flow guide structure, forms a stable uniform temperature and speed internal environment, effectively reduces the film thickness difference in the spin coating process, and improves the film thickness uniformity.

[0018] Figure 1 The present application is a schematic diagram (exploded view) of the overall structure;

[0019] Figure 2 (a) is a cross-sectional view of the synchronous chamber module of the present application;

[0020] Figure 2 (b) is a top view of the synchronous chamber of the present application;

[0021] Figure 3(a) is a top front view of the base support platform of the present invention;

[0022] Figure 3(b) is a top view of the back of the base support platform of the present invention;

[0023] Figure 4 This is a schematic diagram of the structure of the rotary table of the present invention;

[0024] Figure 5(a) is a schematic diagram of the connection between the synchronous chamber module and the base support platform;

[0025] Figure 5(b) is a partial enlarged view of the connection between the synchronous chamber module and the base support platform;

[0026] Figure 6 This is a cross-sectional schematic diagram showing the connection between the base, the base support platform, and the rotating platform.

[0027] In the diagram: 1-Synchronous chamber module; 2-Base; 3-Base support platform; 4-Rotating platform; 5-Rotating platform inclined surface; 6-Rotating platform vertical surface; 7-Snap-on boss; 8-Snap-on groove; 9-Top layer reinforcing rib of the chamber; 10-Temperature-controlled gas inlet; 11-Temperature-controlled gas outlet; 12-Spiral flow guide structure; 13-Inner layer of the jacket; 14-Middle layer of the jacket; 15-Ventilation hole of the jacket; 16-Outer layer of the jacket; 17-Vacuum hole; 18-Transmission hole; 19-Drainage port; 20-Temporary liquid storage tank; 21-Square base mounting platform; 22-Bottom layer annular reinforcing rib of the chamber; 23-Bottom layer rectangular reinforcing rib of the chamber; 24-Anti-splash slope. Detailed Implementation

[0028] The specific embodiments of the present invention will be further described below with reference to the accompanying drawings and technical solutions.

[0029] like Figures 1-6 As shown, a controllable temperature atmosphere spin coating chamber based on a jacket and spiral flow guiding structure includes a synchronous chamber module 1, a substrate support platform 3, and a rotating platform 4; the synchronous chamber module 1, the substrate support platform 3, and the rotating platform 4 are concentric structures; the synchronous chamber module 1 is mounted on the substrate support platform 3, and the substrate support platform 3 is mounted on the rotating platform 4.

[0030] The synchronization chamber module 1 is a jacket structure, and the material of the jacket structure is aluminum alloy.

[0031] Further, the synchronization chamber module 1 is composed of the jacket inner layer 13, the jacket middle layer 14 and the jacket outer layer 16 from inside to outside, and the inner and outer two-layer cavity structure is formed between the jacket inner layer 13 and the jacket middle layer 14, and between the jacket middle layer 14 and the jacket outer layer 16; the bottom of the jacket middle layer 14 is provided with the jacket air hole 15; the jacket air hole 15 communicates with the inner and outer two-layer cavity structure; the inner layer of the cavity structure communicates with the temperature control gas inlet 10; and the outer layer of the cavity structure communicates with the temperature control gas outlet 11.

[0032] Further, the upper outer surface of the synchronization chamber module 1 is designed with the chamber top layer reinforcing rib 9; the chamber top layer reinforcing rib 9 is four in number, and the angle between adjacent two is 90°, and the cross structure is distributed.

[0033] The surface of the jacket inner layer 13 of the synchronization chamber module 1 towards the inside of the chamber is designed with the spiral flow guide structure 12.

[0034] Further, the bottom of the synchronization chamber module 1 is designed with the buckle groove 8 cooperating with the base bearing table 3 for transmission; the buckle groove 8 is eight in number; the buckle groove 8 is uniformly distributed in a ring shape at the bottom of the synchronization chamber module 1; the base bearing table 3 is designed with the buckle boss 7 cooperating with the synchronization chamber module 1 for transmission; the buckle boss 7 is eight in number; and the buckle boss 7 is uniformly distributed in a ring shape on the outer wall of the base bearing table 3.

[0035] Further, the base bearing table 3 has the anti-splashing slope 24; the anti-splashing slope 24 is an annular slope; the anti-splashing slope 24 is in contact with the inner wall of the synchronization chamber module 1 above; the anti-splashing slope 24 is connected with the liquid discharge port 19 below; the base bearing table 3 has four annularly distributed liquid discharge ports 19; the base bearing table 3 has a cylindrical boss in the center, and the center of the cylindrical boss has a square base mounting table 21; the upper surface of the square base mounting table 21 is higher than the liquid discharge port 19; the center of the square base mounting table 21 is provided with a through hole cooperating with the rotating table 4; the through hole is internally provided with the temporary liquid storage tank 20; the temporary liquid storage tank 20 is designed with eight; the base of the base bearing table 3 has two vertical surfaces and an inclined surface, and the vertical surface and the inclined surface are respectively matched with the rotating table vertical surface 6 and the rotating table inclined surface 5.

[0036] Further, the back of the base bearing table 3 has two groups of reinforcing ribs; the two groups of reinforcing ribs are respectively the chamber bottom layer annular reinforcing rib 22 and the chamber bottom layer rectangular reinforcing rib 23; the chamber bottom layer annular reinforcing rib is on the outside, and the chamber bottom layer rectangular reinforcing rib 23 is on the inside.

[0037] Further, the upper layer of the rotating table 4 is a small-diameter cylinder, the lower layer is a large-diameter cylinder, the small-diameter cylinder is connected to the lower layer large-diameter cylinder through a circular table; the center of the rotating table 4 has a vacuum hole 17; the rotating table 4 has two transmission holes 18, which are centrally symmetrically distributed at the bottom of the rotating table 4.

[0038] The operation mode of the present application is as follows:

[0039] Before the spin coating starts, the spin coating process parameters are set according to the target film thickness, the required spin coating liquid is configured, and the film coating preparation work is completed. After the spin coating preparation work is completed, the spin coating of the thin film can be started.

[0040] Firstly, the substrate 2 is placed in the square substrate mounting table 21 of the substrate support table 3 and the vacuum pump is opened, the vacuum switch of the spin coater is turned on to firmly adsorb the substrate 2 on the rotating table 4. Next, the configured spin coating liquid is quantitatively arranged on the surface of the substrate 2. After the liquid distribution is completed, the synchronous chamber module 1 is installed on the substrate support table 3 by using the buckle structure and the temperature control gas is introduced into the jacket structure. Wait for a period of time until the temperature inside the chamber is consistent with the temperature of the temperature control gas. During this period, the solvent in the spin coating liquid volatilizes to reduce the solvent concentration gradient in the chamber, which is beneficial to the uniformity of solvent volatilization. Finally, the spin coating process parameters are set and the spin coating task can be started. The spin coating liquid is thinned under the synergistic action of centrifugal force and solvent volatilization. Under the joint action of the jacket gas flow and the spiral guide structure 12, the centrifugal thinning and volatilization thinning process tend to be more uniform. The thickness uniformity of the spin coating thin film is improved.

[0041] The above description is for the ordinary skilled person in the art to make other various corresponding changes and modifications according to the technical solutions and technical concepts of the present application, and all these changes and modifications shall belong to the protection scope of the claims of the present application.

Claims

1. A temperature-controlled atmosphere spin-coating chamber based on a double-walled jacket and helical flow guide structure, characterized in that: The application relates to a synchronous chamber module (1), a substrate carrier (3) and a rotating table (4); the synchronous chamber module (1), the substrate carrier (3) and the rotating table (4) are in a concentric structure; the synchronous chamber module (1) is installed on the substrate carrier (3), and the substrate carrier (3) is installed on the rotating table (4); The synchronous chamber module (1) is a jacket structure, and the material of the jacket structure is an aluminum alloy material; The synchronous chamber module (1) is composed of a jacket inner layer (13), a jacket middle layer (14) and a jacket outer layer (16) from inside to outside, and an inner-outer two-layer cavity structure is formed between the jacket inner layer (13) and the jacket middle layer (14) and between the jacket middle layer (14) and the jacket outer layer (16); a jacket air hole (15) is arranged at the bottom of the jacket middle layer (14); the jacket air hole (15) is connected with the inner-outer two-layer cavity structure; the inner layer of the cavity structure is connected with a temperature control gas inlet (10); the outer layer of the cavity structure is connected with a temperature control gas outlet (11); A spiral flow guide structure (12) is designed on the surface of the jacket inner layer (13) of the synchronous chamber module (1) and faces the inside of the chamber.

2. The controllable temperature atmosphere spin coating chamber based on the double-walled jacket and helical flow guide structure according to claim 1, characterized in that: A chamber top layer reinforcing rib (9) is designed on the upper outer surface of the synchronous chamber module (1); the chamber top layer reinforcing rib (9) has four reinforcing ribs, the included angle between two adjacent reinforcing ribs is 90 degrees, and the four reinforcing ribs are distributed in a cross structure.

3. The controllable temperature atmosphere spin coating chamber based on the double-walled jacket and helical flow guide structure according to claim 1, characterized in that: A buckle groove (8) for cooperation and transmission with the substrate carrier (3) is designed at the bottom of the synchronous chamber module (1); the buckle groove (8) has eight buckle grooves; the buckle grooves (8) are evenly and annularly distributed at the bottom of the synchronous chamber module (1); a buckle boss (7) for cooperation and transmission with the synchronous chamber module (1) is designed on the substrate carrier (3); the buckle boss (7) has eight buckle bosses; the buckle bosses (7) are evenly and annularly distributed on the outer wall of the substrate carrier (3).

4. The controllable temperature atmosphere spin coating chamber based on the double-walled jacket and helical flow guide structure according to claim 1, characterized in that: The substrate carrier (3) has a splash-proof inclined surface (24); the splash-proof inclined surface (24) is an annular inclined surface; the splash-proof inclined surface (24) is in contact with the inner wall of the synchronous chamber module (1) above; the splash-proof inclined surface (24) is connected with a liquid discharge port (19) below; the substrate carrier (3) has four annularly distributed liquid discharge ports (19); the substrate carrier (3) has a cylindrical boss in the center, and the center of the cylindrical boss has a square substrate mounting table (21); the upper surface of the square substrate mounting table (21) is higher than the liquid discharge port (19); the square substrate mounting table (21) has a through hole for cooperation with the rotating table (4) in the center; the inner side of the through hole has a temporary liquid storage tank (20); the temporary liquid storage tank (20) is designed with eight temporary liquid storage tanks; the base of the substrate carrier (3) has two vertical surfaces and an inclined surface, and the vertical surface and the inclined surface are respectively matched with a rotating table vertical surface (6) and a rotating table inclined surface (5).

5. The controllable temperature atmosphere spin coating chamber based on the double-walled jacket and helical flow guide structure according to claim 1, characterized in that: The back of the substrate carrier (3) has two groups of reinforcing ribs; the two groups of reinforcing ribs are a chamber bottom layer annular reinforcing rib (22) and a chamber bottom layer rectangular reinforcing rib (23); the chamber bottom layer annular reinforcing rib is on the outer side, and the chamber bottom layer rectangular reinforcing rib (23) is on the inner side.

6. The controllable temperature atmosphere spin coating chamber based on the double-walled jacket and helical flow guide structure according to claim 1, characterized in that: The upper layer of the rotating table (4) is a small-diameter cylinder, the lower layer is a large-diameter cylinder, and the small-diameter cylinder is connected to the lower layer large-diameter cylinder through a circular table; the rotating table (4) has a vacuum hole (17) in the center; the rotating table (4) has two transmission holes (18) which are centrally symmetrically distributed at the bottom of the rotating table (4).

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