A device and method for magnetron sputtering coating on the surface of plastic parts
By using a multi-directional support component to enable automatic flipping and target switching of the substrate in a vacuum environment, the production continuity problem of multi-layer composite films and double-sided coatings in existing technologies is solved, coating efficiency and film consistency are improved, and the requirements of high-precision applications are met.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- CHUZHOU JIAMEI PRECISION IND CO LTD
- Filing Date
- 2025-11-18
- Publication Date
- 2026-04-17
AI Technical Summary
Existing magnetron sputtering coating technology suffers from problems such as production continuity interruption, vacuum environment disruption, and inconsistent film properties when preparing multilayer composite films and double-sided coatings, making it difficult to meet the quality requirements of high-precision application scenarios.
A multi-directional support component is used to achieve bidirectional rotation and flipping of the substrate and target position switching. Through the design of the multi-directional support component, the substrate is automatically flipped in a vacuum environment, avoiding shutdown and vacuum breaking, and achieving continuity of double-sided multi-layer coating of the substrate and consistency of film parameters.
It improved production efficiency, shortened the coating cycle, ensured the purity and performance consistency of the film layer, and met the quality requirements of high-precision application scenarios.
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Figure CN121183300B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of magnetron sputtering coating technology, specifically to an apparatus and coating method for magnetron sputtering coating on the surface of plastic parts. Background Technology
[0002] Magnetron sputtering coating technology, with its core advantages such as strong adhesion between the film and the plastic substrate, excellent film uniformity, and high component purity, has become a key technology for the surface functionalization of plastic parts in the electronics, automotive, and home appliance industries. It is widely used to prepare wear-resistant, corrosion-resistant, conductive, or decorative films on the surface of plastic casings, such as insulating casings for electronic devices and plastic trim panels for automotive interiors, all of which rely on this technology to achieve a dual improvement in performance and appearance.
[0003] Currently, the industry has developed a mature magnetron sputtering coating solution: by evenly arranging multiple plastic substrates on a rotatable base, the continuous rotation of the base drives the substrates to pass through the magnetron sputtering target area in sequence, and single-sided coating processing of several substrates can be completed in one go, showing high production efficiency in single film layer preparation scenarios.
[0004] As downstream applications continue to upgrade their performance requirements for plastic parts, two core demands are becoming increasingly prominent, and existing technologies are showing significant limitations: On the one hand, to achieve more complex functions such as high wear resistance and high conductivity composite performance, multi-layer composite films composed of alternating layers of various materials need to be prepared on the surface of plastic parts; on the other hand, in scenarios such as automotive interiors and double-sided electronic components, both sides of the plastic part are required to have consistent composite film performance, and the thickness and composition uniformity of the two film layers must be strictly matched. When dealing with double-sided coating of multi-layer materials, existing equipment, after completing multi-layer coating on one side of the plastic part, must first stop the machine and disrupt the vacuum environment in the vacuum chamber, manually remove the substrate, flip it over for adjustment, reseal the chamber, and evacuate to the vacuum level required for coating before starting the coating process on the other side. This operation severely disrupts production continuity, significantly extends the total coating cycle of a single plastic part, and the repeated disruption and reconstruction of the vacuum environment introduces external impurities that affect the purity of the film layer. At the same time, slight differences in vacuum level and target sputtering parameters during the two coating processes can easily lead to inconsistent film layer performance on both sides of the plastic part, making it difficult to meet the quality requirements of high-precision applications. Summary of the Invention
[0005] The purpose of this invention is to provide an apparatus and a coating method for magnetron sputtering coating of plastic parts, so as to overcome the shortcomings of the prior art.
[0006] To achieve the above objectives, the present invention provides the following technical solution: an apparatus for magnetron sputtering coating of plastic parts, comprising a tank, the tank being connected to a vacuum device via a first pipe, the tank being connected to a gas source via a second pipe, and further comprising:
[0007] Rotate the rotating disc installed inside the tank;
[0008] A magnetron sputtering assembly comprising at least two magnetron sputtering targets;
[0009] A multi-directional support assembly for supporting a substrate has an initial position in which one face of the substrate corresponds to one of the magnetron sputtering targets. When the multi-directional support assembly rotates along a first direction from the initial position, one face of the substrate rotates to another magnetron sputtering target. When the multi-directional support assembly rotates along a second direction from the initial position, the substrate flips so that its second face faces the magnetron sputtering assembly.
[0010] Preferably, the first drive motor is used to drive the rotary disk to rotate.
[0011] Preferably, the multi-directional support assembly includes a support part and a flipping part. The support part includes a central column, a lower toothed seat, a vertical frame, a tension member, a rotating shaft, and a bracket. The central column is fixedly mounted on a rotating disk, the lower toothed seat is rotatably connected to the central column, the vertical frame is fixedly mounted on the lower toothed seat, the rotating shaft is rotatably connected to the bracket, and the other end of the rotating shaft is rotatably connected to the vertical frame. One end of the tension member is connected to the lower toothed seat, and the other end is connected to the rotating shaft. The bracket has two positions for supporting the substrate, and the flipping part is used to switch the substrate between the two support positions.
[0012] Preferably, the flipping part includes a semi-circular gear, a full gear, a clamp plate, a torsion spring, and a limiting block. The semi-circular gear is mounted on the central column, the full gear is mounted on the rotating shaft, the clamp plate is fixedly mounted on the rotating shaft, one end of the torsion spring is fixed on the rotating shaft, and the other end is fixed on the bracket. The limiting block is fixedly mounted on the upright frame.
[0013] Preferably, when the multi-directional support assembly rotates along the first direction from its initial position, the full gear and the semi-circular gear separate.
[0014] Preferably, when the multi-directional support assembly rotates along the second direction from the initial position, the full gear and the semi-circular gear mesh with each other. During the rotation, there are a first stage and a second stage. In the first stage, the bracket and the clamp plate rotate around the pivot. In the second stage, the bracket stops rotating and the clamp plate clamps the substrate and flips it to another support position.
[0015] Preferably, the device includes a drive assembly, which includes a lifting shaft, a rotating sleeve, a second drive motor, and a drive gear. The second drive motor is fixedly installed at the lower part of the tank body, the rotating sleeve is fixed to the output shaft of the second drive motor, the lower part of the lifting shaft is slidably inserted into the rotating sleeve, the drive gear is fixedly installed at the upper part of the lifting shaft, and the lower gear seat has teeth that are compatible with the drive gear on its exterior.
[0016] Preferably, it also includes a cylinder for driving the lifting shaft to extend or retract.
[0017] A magnetron sputtering coating method for plastic parts involves spraying a composite film onto both the upper and lower surfaces of a substrate. The composite film includes a first film and a second film, which are sprayed alternately to form a multilayer composite film structure.
[0018] Preferably, it includes the following steps:
[0019] S1, two different target materials are installed onto the magnetron sputtering target respectively, and the substrate is placed on the multi-directional support assembly 7;
[0020] S2, one of the magnetron sputtering targets is activated to form a first film on the substrate surface, the multi-directional support assembly rotates in a first direction, the other magnetron sputtering target is activated to form a second film on the surface of the first film, and the multi-directional support assembly is then reset.
[0021] S3, repeat S2 to form a multilayer composite film structure on the substrate;
[0022] S4, the multi-directional support assembly rotates along the second direction from the initial position to flip the substrate, and then the multi-directional support assembly resets.
[0023] S5, Repeat steps S2-S3 to coat the second side of the substrate;
[0024] S6. After the coating is completed, the rotating disk rotates, and the substrate supported by the next multi-directional support assembly enters the coating area.
[0025] In the above technical solution, the present invention provides an apparatus and coating method for magnetron sputtering coating of plastic parts. Through the bidirectional rotation function of the multi-directional support component, when rotating in the second direction, the substrate can be automatically flipped in the vacuum. When rotating in the first direction, the corresponding target position of the substrate can be switched. There is no need to stop the machine to break the vacuum. The double-sided multi-layer coating cycle of a single plastic part is shortened and the efficiency is greatly improved. Attached Figure Description
[0026] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in this invention. For those skilled in the art, other drawings can be obtained based on these drawings.
[0027] Figure 1 This is a schematic diagram of the overall structure of the apparatus and coating method for magnetron sputtering coating on the surface of plastic parts according to the present invention.
[0028] Figure 2 This is a cross-sectional view of an apparatus and coating method for magnetron sputtering coating on the surface of plastic parts according to the present invention.
[0029] Figure 3 This invention relates to an apparatus and method for magnetron sputtering coating of plastic parts. Figure 2 Enlarged view of point A in the middle;
[0030] Figure 4 This is a schematic diagram of the initial state of a multi-directional support component for a magnetron sputtering coating device and coating method for plastic parts according to the present invention.
[0031] Figure 5 This is a schematic diagram of a multi-directional support assembly of an apparatus and coating method for magnetron sputtering coating of plastic parts according to the present invention, after being rotated in a first direction.
[0032] Figure 6 This is a schematic diagram of a multi-directional support assembly of an apparatus and coating method for magnetron sputtering coating of plastic parts according to the present invention, rotating in the second opposite direction and at the end of the first stage.
[0033] Figure 7 This is a schematic diagram of a multi-directional support assembly of an apparatus and coating method for magnetron sputtering coating of plastic parts according to the present invention, rotating in a second direction and at the end of the second stage.
[0034] Figure 8 This is a schematic diagram of a semi-circular gear and its components, representing an apparatus and coating method for magnetron sputtering coating of plastic parts according to the present invention.
[0035] Explanation of reference numerals in the attached drawings: 1. Tank body; 2. First pipe; 3. Second pipe; 4. Magnetron sputtering assembly; 5. Rotary disk; 6. First drive motor; 7. Multi-directional support assembly; 8. Drive assembly; 9. Substrate; 71. Central column; 72. Lower gear seat; 73. Stand; 74. Tensioning component; 75. Rotating shaft; 76. Bracket; 77. Clamping plate; 78. Torsion spring; 79. Limiting block; 81. Lifting shaft; 82. Rotating sleeve; 83. Second drive motor; 84. Cylinder; 711. Semi-circular gear; 712. Full gear; 811. Drive gear. Detailed Implementation
[0036] To enable those skilled in the art to better understand the technical solution of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings.
[0037] Please see Figure 1-8 This invention provides an apparatus for magnetron sputtering coating of plastic parts, comprising a tank 1 connected to a vacuum device via a first pipe 2 and a gas source via a second pipe 3. Throughout the coating process, the tank 1 serves as a sealed coating chamber, continuously maintaining a high vacuum environment within it through the vacuum device connected to the first pipe 2 to prevent the entry of external air and impurities. Simultaneously, the tank 1 supplies sputtering gases such as argon as needed through the second pipe 3 to ensure the stability of the magnetron sputtering process. The apparatus also includes:
[0038] Rotary disk 5 is installed inside tank 1; multiple sets of multi-directional support components 7 can be mounted on rotary disk 5, each set corresponding to a substrate 9. When a single substrate 9 completes double-sided coating, rotary disk 5 rotates to send the next substrate 9 to be processed into the coating area, thus realizing continuous batch operation.
[0039] The magnetron sputtering assembly 4 includes at least two magnetron sputtering targets; in multilayer composite film sputtering, multiple materials are stacked alternately, and the multiple magnetron sputtering targets of this assembly can be pre-loaded with different target materials without having to stop midway to change the target materials;
[0040] A multi-directional support assembly 7 is used to support a substrate 9. The multi-directional support assembly 7 has an initial position in which one face of the substrate 9 corresponds to one of the magnetron sputtering targets. When the multi-directional support assembly 7 rotates along a first direction from the initial position, one face of the substrate 9 rotates to another magnetron sputtering target. When the multi-directional support assembly 7 rotates along a second direction from the initial position, the substrate 9 flips so that its second face faces the magnetron sputtering assembly 4.
[0041] In the initial position, the substrate 9 placed on the multi-directional support assembly 7 has one side corresponding to a magnetron sputtering target in the magnetron sputtering assembly 4 to prepare the first film. When the multi-directional support assembly 7 rotates along the first direction from the initial position, the coating surface of the substrate 9 is switched to another magnetron sputtering target in the magnetron sputtering assembly 4 to prepare the second film. This process does not require stopping the machine and quickly realizes the alternating superposition of the first and second films, efficiently preparing multilayer composite films and solving the problem of repeated target position adjustment and cumbersome process in the existing multilayer coating technology.
[0042] After the substrate 9 has completed multi-layer coating on one side, the multi-directional support assembly 7 rotates along the second direction from the initial position. The rotation process is divided into two stages: the first stage is that the upper part of the multi-directional support assembly 7 tilts, and the second stage is that the clamp plate 77 clamps the substrate 9 and flips it to another support position of the bracket 76, so that the second side of the substrate 9 without coating faces the magnetron sputtering assembly 4.
[0043] There is no need to stop the machine to break the vacuum and remove the substrate 9 for flipping, avoiding production interruption, shortening the coating time of the substrate 9, and the sputtering atmosphere is well protected, with no impurities introduced, ensuring that the coating parameters of the two film layers are consistent, ensuring that the thickness, composition and performance of the two film layers of the substrate 9 are highly matched, and avoiding the problem of inconsistent performance between the two film layers.
[0044] In an embodiment of the present invention, a first drive motor 6 is used to drive a rotating disk 5 to rotate. By mounting multiple sets of multi-directional support components 7 on the rotating disk 5, the first drive motor 6 can drive the rotating disk 5 to rotate a set of substrates 9 that have completed double-sided multi-layer coating from the coating area, while simultaneously sending the next set of substrates 9 to be coated into the coating area.
[0045] In the embodiments of the present invention, please refer to Figure 4-5 The multi-directional support assembly 7 includes a support part and a flipping part. The support part includes a central column 71, a lower gear seat 72, a support frame 73, a tension member 74, a rotating shaft 75, and a bracket 76. The central column 71 is fixedly mounted on the rotating disk 5. The lower gear seat 72 is rotatably connected to the central column 71. The support frame 73 is fixedly mounted on the lower gear seat 72. The rotating shaft 75 is rotatably connected to the bracket 76, and the other end of the rotating shaft 75 is rotatably connected to the support frame 73. One end of the tension member 74 is connected to the lower gear seat 72, and the other end is connected to the rotating shaft 75. The bracket 76 has two positions for supporting the substrate 9. The flipping part is used to switch the substrate 9 between the two support positions. When the multi-directional support assembly 7 rotates along the first direction from the initial position, the full gear 712 and the semi-circular gear 711 separate.
[0046] When performing composite coating on one side, firstly, in the initial position, the substrate 9 placed on the bracket 76 of the multi-directional support assembly 7 has one side corresponding to a magnetron sputtering target in the magnetron sputtering assembly 4. After the magnetron sputtering target completes the coating, when the multi-directional support assembly 7 rotates along the first direction from the initial position, the full gear 712 and the semi-circular gear 711 are in a separated state. The substrate 9 does not flip, but only its coating surface is switched to another magnetron sputtering target in the magnetron sputtering assembly 4 for coating. In this way, multi-layer coating on one side can be achieved.
[0047] In the embodiments of the present invention, please refer to Figure 6-7The flipping part includes a semi-circular gear 711, a full gear 712, a clamping plate 77, a torsion spring 78, and a limiting block 79. The semi-circular gear 711 is mounted on the central column 71, the full gear 712 is mounted on the rotating shaft 75, the clamping plate 77 is fixedly mounted on the rotating shaft 75, one end of the torsion spring 78 is fixed on the rotating shaft 75, and the other end is fixed on the bracket 76. The limiting block 79 is fixedly mounted on the upright frame 73. When the multi-directional support assembly 7 rotates along the second direction from its initial position, the full gear 712 and the semi-circular gear 711 mesh. During the rotation, there are a first stage and a second stage. In the first stage, the bracket 76 and the clamping plate 77 rotate around the rotating shaft 75. In the second stage, the bracket 76 stops rotating, and the clamping plate 77 clamps the substrate 9 and flips it to another support position.
[0048] When the substrate 9 has completed multi-layer coating on one side and needs to be flipped, the drive assembly 8 drives the lower gear seat 72 of the multi-directional support assembly 7 to rotate in the second direction from its initial position. In the first stage, when the lower gear seat 72 rotates in the second direction, it drives the fixed frame 73 to rotate synchronously. The frame 73, through the rotating shaft 75, drives the rotating shaft 75 and the full gear 712 and clamp plate 77 mounted on it to move together. Since the semi-circular gear 711 is fixed on the stationary central column 71, when the full gear 712 moves with the rotating shaft 75 to mesh with the semi-circular gear 711, the full gear 712 will be on the semi-circular gear 711. Under the constraint of the teeth of the gear 1, a rotational torque is generated around the center of the semi-circular gear 711. This torque is transmitted to the rotating shaft 75, causing the rotating shaft 75 to drive the clamp plate 77 to rotate. Simultaneously, through the action of the torsion spring 78, the bracket 76 rotates synchronously when the rotating shaft 75 rotates, rotating towards the limiting block 79 with the rotating shaft 75 itself as the center of rotation. At this time, the bracket 76 is in an inclined state, and the substrate 9 slides along the bracket 76 into the clamp plate 77 under the action of gravity. When the bracket 76 rotates with the rotating shaft 75 until it is in complete contact with the limiting block 79 fixed on the upright 73, the limiting block 79 forms a rigid block on the bracket 76, restricting the bracket 76. As rotation continues, although the bracket 76 is stopped by the limiting block 79, the lower gear seat 72 continues to rotate in the second direction, continuously providing motion power to the rotating shaft 75 through the upright 73. At the same time, the full gear 712 remains meshed with the semi-circular gear 711, continuing to generate rotational torque around the semi-circular gear 711. Under the combined action of these two forces, the rotating shaft 75 begins to rotate independently around its own axis relative to the stopped bracket 76. Since the clamping plate 77 is fixed on the rotating shaft 75, the independent rotation of the rotating shaft 75 directly drives the clamping plate 77 to rotate synchronously. During the rotation of the clamping plate 77, its clamping end will flip the substrate 9, and the clamping plate 77 will carry the substrate... Material 9 completes a 180° flip and is precisely transferred from the first support position of bracket 76 to the second support position. During this process, torsion spring 78 twists to ensure that rotating shaft 75 rotates smoothly. After clamp plate 77 flips, lower gear seat 72 rotates in the opposite direction. With full gear 712 still meshing with semi-circular gear 711, bracket 76 and clamp plate 77 will reset to the initial state, thus realizing that the substrate 9 is flipped to the second support position. At this time, the uncoated side faces upward. After reset, the pulling force of tension member 74 keeps rotating shaft 75 at the initial angle, thereby ensuring that bracket 76 is horizontal.
[0049] It enables the substrate 9 to be flipped smoothly in stages in a vacuum environment without stopping the machine to break the vacuum or manual intervention, avoiding the introduction of external impurities, ensuring the purity of the film layer, and improving production efficiency.
[0050] In an embodiment of the present invention, a drive assembly 8 is included. The drive assembly 8 includes a lifting shaft 81, a rotating sleeve 82, a second drive motor 83, and a drive gear 811. The second drive motor 83 is fixedly installed on the lower part of the tank body 1. The rotating sleeve 82 is fixed to the output shaft of the second drive motor 83. The lower part of the lifting shaft 81 is slidably inserted into the rotating sleeve 82. The drive gear 811 is fixedly installed on the upper part of the lifting shaft 81. The lower gear seat 72 is provided with teeth that are adapted to the drive gear 811.
[0051] It also includes a cylinder 84, which is used to drive the lifting shaft 81 to extend and retract.
[0052] The second drive motor 83 is started, and its output shaft drives the rotating sleeve 82 fixed on it to rotate synchronously. Since the lower part of the lifting shaft 81 is slidably inserted into the rotating sleeve 82, the two are configured to be slidable but synchronously rotating. The rotation of the rotating sleeve 82 will directly drive the lifting shaft 81 to rotate around its own axis. When the lifting shaft 81 rotates, the drive gear 811 fixed on its upper part rotates synchronously. If the drive gear 811 and the lower gear seat 72 are in a meshing state at this time, the drive gear 811 will drive the lower gear seat 72 to rotate around the central column 71 through tooth transmission. When the lower gear seat 72 rotates, it will drive the upright 73 fixed to it, and then link the rotating shaft 75, the bracket 76 and the base material 9 to rotate synchronously, and finally realize the rotation action of the multi-directional support component 7 along the first or second direction of the set direction.
[0053] When the rotating disk 5 rotates, the lifting shaft 81 is driven by the cylinder 84 to slide downward along the axis of the rotating sleeve 82, which drives the drive gear 811 to descend synchronously, so that the drive gear 811 is completely separated from the lower gear seat 72. In this way, when the rotating disk 5 rotates, the multi-directional support component 7 will not rotate on its own. It can be smoothly transferred out of the coating area with the overall rotation of the rotating disk 5, avoiding power interference. The second drive motor 83 in the drive component 8 provides directional power and the cylinder 84 controls the engagement and disengagement, so as to achieve precise power control of the multi-directional support component 7 and stable batch delivery.
[0054] In another embodiment of the present invention, a magnetron sputtering coating method for plastic parts is provided, wherein a composite film is sprayed on both the upper and lower surfaces of a substrate 9, the composite film comprising a first film and a second film, the first film and the second film being sprayed alternately to form a multilayer composite film structure.
[0055] Includes the following steps:
[0056] S1, two different target materials are installed onto the magnetron sputtering target respectively, and the substrate 9 is placed on the multi-directional support assembly 7;
[0057] S2, one of the magnetron sputtering targets is activated to form a first film on the surface of the substrate 9, the multi-directional support assembly 7 rotates in a first direction, the other magnetron sputtering target is activated to form a second film on the surface of the first film, and the multi-directional support assembly 7 is then reset.
[0058] S3, repeat S2 to form a multilayer composite film structure on substrate 9;
[0059] S4, the multi-directional support component 7 rotates along the second direction from the initial position to flip the substrate 9, and then the multi-directional support component 7 resets.
[0060] S5, repeat steps S2-S3 to coat the second side of substrate 9;
[0061] S6, after the coating is completed, the rotating disk 5 rotates, and the substrate 9 supported by the next multi-directional support assembly 7 enters the coating area.
[0062] In S2-S3, the multi-directional support component 7 rotates along the first direction to switch the magnetron sputtering target, achieving multi-layer coating without stopping the machine. In S4, the automatic flipping in the vacuum eliminates the time for vacuum breaking and reconstruction. In S6, the rotating disk 5 drives multiple sets of substrates 9 for continuous transport, avoiding waiting for batch production. The full vacuum environment avoids the introduction of impurities and improves the purity of the film layer. The same target material and parameters are used for double-sided coating. Combined with the multi-directional support component 7 for precise positioning, the problem of inconsistent performance of the two film layers is solved.
[0063] By alternating between the first and second membranes to form a multilayer composite membrane, different functional targets can be used to meet the complex performance requirements of plastic parts.
[0064] The foregoing has only described certain exemplary embodiments of the present invention by way of illustration. Undoubtedly, those skilled in the art can modify the described embodiments in various ways without departing from the spirit and scope of the present invention. Therefore, the foregoing drawings and descriptions are illustrative in nature and should not be construed as limiting the scope of protection of the claims of the present invention.
Claims
1. A device for magnetron sputtering coating of the surface of plastic parts, comprising a tank (1) connected to a vacuum device by a first pipe (2) and to a gas source by a second pipe (3), characterized in that, Also includes: Rotate the rotating disk (5) located inside the tank (1); A magnetron sputtering assembly (4) includes at least two magnetron sputtering targets; A multi-directional support assembly (7) is used to support a substrate (9). The multi-directional support assembly (7) has an initial position in which one face of the substrate (9) corresponds to one of the magnetron sputtering targets. When the multi-directional support assembly (7) rotates along a first direction from the initial position, one face of the substrate (9) rotates to another magnetron sputtering target. When the multi-directional support assembly (7) rotates along a second direction from the initial position, the substrate (9) flips so that its second face faces the magnetron sputtering assembly (4). The device also includes a first drive motor (6) for driving the rotating disk (5) to rotate; The multi-directional support assembly (7) includes a support part and a flipping part. The support part includes a central column (71), a lower tooth seat (72), a stand (73), a tension member (74), a rotating shaft (75), and a bracket (76). The central column (71) is fixedly installed on the rotating disk (5). The lower tooth seat (72) is rotatably connected to the central column (71). The stand (73) is fixedly installed on the lower tooth seat (72). The rotating shaft (75) is rotatably connected to the bracket (76). The other end of the rotating shaft (75) is rotatably connected to the stand (73). One end of the tension member (74) is connected to the lower tooth seat (72), and the other end is connected to the rotating shaft (75). The bracket (76) has two positions for supporting the substrate (9). The flipping part is used to switch the substrate (9) between the two support positions. The flipping part includes a semi-circular gear (711), a full gear (712), a clamp plate (77), a torsion spring (78), and a limiting block (79). The semi-circular gear (711) is mounted on the central column (71), the full gear (712) is mounted on the rotating shaft (75), the clamp plate (77) is fixedly mounted on the rotating shaft (75), one end of the torsion spring (78) is fixed on the rotating shaft (75), and the other end is fixed on the bracket (76). The limiting block (79) is fixedly mounted on the upright frame (73).
2. The device for magnetron sputtering coating of the surface of plastic parts according to claim 1, characterized in that, When the multi-directional support assembly (7) rotates along the first direction from its initial position, the full gear (712) and the semi-circular gear (711) separate.
3. The apparatus for magnetron sputtering coating of plastic parts according to claim 1, characterized in that, When the multi-directional support assembly (7) rotates along the second direction from the initial position, the full gear (712) and the semi-circular gear (711) mesh with each other. During the rotation, there are a first stage and a second stage. In the first stage, the bracket (76) and the clamp plate (77) rotate around the pivot (75). In the second stage, the bracket (76) stops rotating and the clamp plate (77) clamps the substrate (9) and flips it to another support position.
4. The device for magnetron sputtering coating of the surface of plastic parts according to claim 1, characterized in that, The drive assembly (8) includes a lifting shaft (81), a rotating sleeve (82), a second drive motor (83), and a drive gear (811). The second drive motor (83) is fixedly installed on the lower part of the tank body (1). The rotating sleeve (82) is fixed to the output shaft of the second drive motor (83). The lower part of the lifting shaft (81) is slidably inserted into the rotating sleeve (82). The drive gear (811) is fixedly installed on the upper part of the lifting shaft (81). The lower gear seat (72) is provided with teeth that are compatible with the drive gear (811).
5. The device for magnetron sputtering coating of the surface of plastic parts according to claim 4, characterized in that, It also includes a cylinder (84) for driving the lifting shaft (81) to extend and retract.
6. A method for magnetron sputtering coating on the surface of plastic parts, implemented based on the apparatus for magnetron sputtering coating according to any one of claims 1-5, characterized in that, The substrate (9) has a composite film sprayed on both the upper and lower surfaces. The composite film includes a first film and a second film. The first film and the second film are sprayed alternately to form a multi-layer composite film structure.
7. The method according to claim 6, wherein the plastic part is rotated at a speed of 0.1- 10 rpm. Includes the following steps: S1, two different target materials are installed on the magnetron sputtering target respectively, and the substrate (9) is placed on the multi-directional support assembly (7). S2, one of the magnetron sputtering targets is activated to form a first film on the surface of the substrate (9), the multi-directional support assembly (7) rotates in a first direction, the other magnetron sputtering target is activated to form a second film on the surface of the first film, and the multi-directional support assembly (7) is then reset; S3, repeat S2 to form a multilayer composite film structure on the substrate (9); S4, the multi-directional support assembly (7) rotates along the second direction from the initial position to flip the substrate (9), and then the multi-directional support assembly (7) resets; S5, repeat steps S2-S3 to coat the second side of the substrate (9); S6. After the coating is completed, the rotating disk (5) rotates and the substrate (9) supported by the next multi-directional support assembly (7) enters the coating area.
Citation Information
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