Thin film deposition device

Abstract

The invention provides a thin film deposition device, and belongs to the technical field of thin film deposition. The thin film deposition device comprises a workbench, a vacuum tank, a vacuum cover, a quartz tube, an outer cover cylinder, a coil assembly, an air supply mechanism, an air exhaust mechanism, a sample table mechanism, a knocking mechanism and a lifting mechanism. The working gas can be ionized in the inductive coupling area to form plasmas, so that the working gas can generate various active species, the active species or the active species and the monomer react, a polymer film is conveniently deposited on the surface of a sample microsphere subsequently, and the film coating effect of a product is improved. The knocking mechanism is mounted on the working table, penetrates through the vacuum tank and is attached to the sample table mechanism, so that the knocking mechanism knocks the sample table mechanism, a plurality of sample microspheres placed in the sample table mechanism are vibrated, adhesion of the plurality of sample microspheres is avoided, and the detection accuracy is improved. And thus, the coating effect on the sample microspheres is improved.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of thin film deposition, and particularly relates to a thin film deposition device. BACKGROUND

[0002] In the related art, when a sample is subjected to a film plating process, the sample is usually placed in a vacuum environment, and working gas is flowed to the sample, so that a thin film is deposited on the surface of the sample.

[0003] The prior art (Chinese invention patent, authorized publication number: CN120366747B) discloses a thin film deposition device, which comprises a heating mechanism, a guide ring, an insulating ring, a lifting mechanism, a rotating mechanism and a controller. The heating mechanism comprises a heating tray for carrying and heating a substrate. The lifting mechanism is used to drive the heating tray and the guide ring to ascend for the first time of thin film deposition. The rotating mechanism is used to drive the heating tray to rotate the guide ring, so that the guide ring is placed on the insulating ring. The lifting mechanism is used to drive the heating tray to descend to separate the heating tray and the guide ring. The rotating mechanism is used to drive the heating tray to rotate. The lifting mechanism is used to drive the heating tray to ascend for the second time of thin film deposition. The relative position of the substrate and the heating tray is different between the first time of thin film deposition and the second time of thin film deposition. Only one lifting mechanism and one rotating mechanism are provided, which realizes the rotation of the heating tray and the relative rotation of the substrate and the heating tray, improves the uniformity of thin film deposition, and has a simple structure.

[0004] In the prior art, when multiple samples are subjected to film plating, the multiple samples are prone to adhesion, thereby reducing the film plating effect of the product. Moreover, the activity in the working gas flowed to the sample is single, thereby affecting the film plating effect. SUMMARY

[0005] In order to solve the problem in the prior art that when multiple samples are subjected to film plating, the multiple samples are prone to adhesion, thereby reducing the film plating effect of the product, the application provides a thin film deposition device. A knocking mechanism is installed on a workbench, the knocking mechanism penetrates through a vacuum tank, and the knocking mechanism is attached to a sample stage mechanism, so that the knocking mechanism knocks the sample stage mechanism, thereby causing multiple sample microspheres placed in the sample stage mechanism to vibrate, to avoid adhesion of the multiple sample microspheres, and to improve the film plating effect on the sample microspheres. At the same time, the working gas can be ionized in an inductive coupling area, thereby realizing generation of various active species from the working gas, and realizing reaction between the active species or between the active species and monomers, so as to deposit a polymer film on the surface of the sample microspheres in the subsequent process, and to improve the film plating effect of the product. The specific technical scheme is as follows: The film deposition device comprises a workbench, a vacuum tank, a vacuum cover, a quartz tube, an outer cover cylinder, a coil assembly, a gas supply mechanism, a gas extraction mechanism, a sample stage mechanism, a knocking mechanism and a lifting mechanism; the vacuum tank is a hollow cavity with an opening at the top, and is installed on the workbench; the vacuum cover is buckled on the top of the vacuum tank; the quartz tube is installed on the top of the vacuum cover and is in communication with the vacuum tank; the outer cover cylinder is installed on the top of the vacuum cover, and at least part of the quartz tube is located in the outer cover cylinder; the coil assembly is installed in the outer cover cylinder, and the coil assembly is arranged on the outer side of the quartz tube; the gas supply mechanism is installed on the workbench and is in communication with the top of the quartz tube; the gas extraction mechanism is installed on the workbench and is in communication with the vacuum tank; the sample stage mechanism is located in the vacuum tank and is located below the quartz tube; the knocking mechanism is installed on the workbench, passes through the vacuum tank, and is in close contact with the sample stage mechanism; the lifting mechanism is installed in the workbench and is connected with the sample stage mechanism.

[0006] In addition, the film deposition device in the above technical solution provided by the present application can also have the following additional technical features: In the above technical solution, the film deposition device further comprises a first observation window, a second observation window, a first mounting bracket, a first mounting hole, a camera assembly, a third observation window and a cold light source; the first observation window is installed on the vacuum cover; the second observation window is installed on the vacuum cover and is located on one side of the first observation window; the first mounting bracket is installed on the second observation window; the first mounting hole is in the shape of a long strip, and at least two first mounting holes are arranged in the first mounting bracket; the camera assembly is installed on the at least two first mounting holes and is opposite to the second observation window; the third observation window is installed on the vacuum cover; and the cold light source is installed in the third observation window.

[0007] In the above technical solution, the lifting mechanism comprises a second mounting bracket, a first motor bracket, a first motor body, a lead screw, a lifting plate, a support column and a light lever; the second mounting bracket is located in the workbench and is installed on the top of the workbench; the first motor bracket is installed on the bottom of the second mounting bracket; the first motor body is installed on the first motor bracket; the outer wall of the lead screw is provided with external threads, the lead screw is located in the second mounting bracket and is connected with the first motor body; the lifting plate is provided with a threaded hole, the threaded hole is provided with internal threads, the lifting plate is located in the second mounting bracket and the lead screw passes through the threaded hole of the lifting plate; the support column is installed on the lifting plate, passes through the bottom of the workbench and the vacuum tank in sequence, and is connected with the sample stage mechanism; two light levers are located in the second mounting bracket, one end of the two light levers is connected with the second mounting bracket, the other end of the two light levers is connected with the workbench, the two light levers pass through the lifting plate, and the light levers are located on both sides of the lead screw; wherein the external threads are in the internal threads, and the lead screw is located in the support column.

[0008] In the technical scheme, the lifting mechanism further comprises a switch fixing frame, a second mounting hole, two proximity switches, a shielding piece, a steel ruler and a pointer; the switch fixing frame is mounted on one side of the second mounting frame; the second mounting hole is in a strip shape, and is arranged in the switch fixing frame; the two proximity switches are mounted in the second mounting hole, and have a spacing therebetween, and the two proximity switches are electrically connected with the first motor body; the shielding piece is in an L shape, is mounted on the lifting plate, and is opposite to one of the proximity switches; the steel ruler is mounted on the other side of the second mounting frame; the pointer is mounted on the lifting plate, and is opposite to the steel ruler; and the pointer and the shielding piece are at the same height.

[0009] In the technical scheme, the sample stage mechanism comprises a mounting plate, a support frame assembly, a second motor body, a crucible body, a cushion block and a knocking plate; the mounting plate is located in the vacuum tank, and is connected with the support column; the support frame assembly is mounted on the mounting plate; the second motor body is mounted in the support frame assembly; the crucible body is located above the support frame assembly, and is connected with the second motor body; the cushion block is mounted on a side wall of the support frame assembly; the knocking plate is connected with the cushion block, and is opposite to the knocking mechanism.

[0010] In the technical scheme, the support frame assembly comprises a support frame body, two support plates, a plurality of positioning blocks, a motor plate, a positioning protrusion and a handle; the support frame body is mounted on the mounting plate; the two support plates are respectively mounted on the two sides of the top of the support frame body; the plurality of positioning blocks are arranged on the support plates, and have a spacing therebetween; the motor plate is located between the two support plates, and the second motor body is mounted at the bottom of the motor plate; the at least two positioning protrusions are respectively connected with the two sides of the motor plate, are respectively placed on the two support plates, and are located between the adjacent two positioning blocks; and the handle is connected with the motor plate.

[0011] In the technical scheme, the knocking mechanism comprises a third mounting frame, an electromagnet, a knocking rod, a guide sleeve, an adjusting nut and a spring; the third mounting frame is mounted on the workbench, and is located on one side of the vacuum tank; the electromagnet is internally provided with an iron core, and is mounted in the third mounting frame; one end of the knocking rod is connected with the iron core, and the other end of the knocking rod penetrates through the side wall of the vacuum tank, and is opposite to the knocking plate; the guide sleeve is mounted on the side wall of the vacuum tank, and is wound on the outside of the knocking rod; the adjusting nut is sleeved on the outside of the knocking rod; and the spring is wound on the outside of the knocking rod, one end of the spring is in abutment with the guide sleeve, and the other end of the spring is in abutment with the adjusting nut.

[0012] In the technical scheme, the air extraction mechanism comprises a fourth mounting frame, a molecular pump, a gas guide pipe, an electric gate valve and a vacuum pump; the fourth mounting frame is mounted in the workbench; the molecular pump is mounted on the fourth mounting frame; the gas guide pipe is mounted in the workbench and penetrates through the top of the workbench, the top of the gas guide pipe is located in the vacuum tank, and the gas guide pipe is located above the molecular pump; the electric gate valve is mounted in the workbench and located between the molecular pump and the gas guide pipe, and the electric gate valve is in contact with the output end of the molecular pump and the gas guide pipe; and the vacuum pump is mounted outside the workbench and communicates with the vacuum tank.

[0013] In the technical scheme, the air extraction mechanism further comprises a shielding net, mounting columns and a baffle; the shielding net is located in the vacuum tank and mounted on the top of the gas guide pipe; the mounting columns are mounted in the vacuum tank and arranged around the outside of the gas guide pipe; and the baffle is connected with the mounting columns and located above the gas guide pipe.

[0014] In the technical scheme, the air supply mechanism comprises a gas supply frame, flow controllers, a gas pipeline and electromagnetic cut-off valves; the gas supply frame is mounted on the workbench; the flow controllers are mounted on the gas supply frame; one end of the gas pipeline communicates with the output ends of the flow controllers, and the other end of the gas pipeline communicates with the top of the quartz tube; and the electromagnetic cut-off valves are mounted on the gas supply frame, the input ends of the flow controllers and the gas sources.

[0015] Compared with the prior art, the thin film deposition device has the following beneficial effects: 1. The coil assembly is mounted in the outer cover cylinder and arranged around the outside of the quartz tube, so that when the coil assembly is powered on, the coil assembly can form an inductive coupling region, so that when the working gas flows into the quartz tube, the working gas can be ionized in the inductive coupling region to form a plasma, thereby enabling the working gas to produce various active species and enabling the active species to react with each other or with monomers, so as to facilitate the subsequent deposition of a polymer film on the surface of the sample microspheres, thereby improving the film plating effect of the product.

[0016] 2. The camera assembly is installed in the first mounting holes by arranging a plurality of first mounting holes in the shape of a long strip in the first mounting frame, the camera assembly is installed on a plurality of first mounting holes, and the camera assembly is opposite to the second observation window, so that the first mounting frame supports the camera assembly, and the camera assembly can move in the first mounting hole to adjust the relative position of the camera assembly and the second observation window, so that the camera assembly can shoot the coating condition of the sample microspheres through the second observation window to monitor the coating condition of the sample microspheres, so as to determine whether the sample microspheres are in a normal state during the coating process, and then the staff can handle it in time when the sample microspheres are adhered, so as to ensure the coating effect of the sample microspheres.

[0017] 3. The screw is connected with the first motor body, the lifting plate is located in the second mounting frame, and the screw passes through the threaded hole of the lifting plate, so that the screw is threadedly connected with the lifting plate, so that when the first motor body drives the screw to rotate, the screw drives the lifting plate to move up and down, thereby adjusting the height of the lifting plate; the support column is installed on the lifting plate, the support column passes through the workbench and the bottom of the vacuum tank in turn, and the support column is connected with the sample table mechanism, so that when the lifting plate moves up and down, the lifting plate drives the sample table mechanism to move up and down through the support column, thereby adjusting the height of the sample table mechanism.

[0018] 4. The shielding piece is installed on the lifting plate, and the shielding piece is opposite to the proximity switch, so that the lifting plate drives the shielding piece to move up and down, so that the shielding piece can shield one proximity switch, so that the proximity switch triggers the first motor body to stop working, thereby controlling the distance of the lifting plate moving up and down. The steel ruler is installed on the other side of the second mounting frame, the pointer is installed on the lifting plate, and the pointer is opposite to the steel ruler, so that the lifting plate and the pointer move up and down synchronously, thereby measuring the height of the lifting plate through the steel ruler, and thereby accurately controlling the height of the sample table mechanism.

[0019] 5. The support frame assembly is installed on the mounting plate, the second motor body is installed in the support frame assembly, and the crucible body is connected with the second motor body, so that the support frame assembly supports the second motor body, so that the second motor body drives the crucible body to rotate, thereby realizing that when a plurality of sample microspheres are placed in the crucible body, the crucible body can drive a plurality of sample microspheres to rotate, so as to avoid the adhesion between the sample microspheres, and to improve the effect of coating the sample microspheres.

[0020] 6. The adjacent two positioning blocks position the positioning protrusions, and the positioning protrusions are placed on the support plate, so that the support frame body supports the motor plate and the second motor body through the support plate, so that the positioning protrusions are placed between the two positioning blocks to adjust the relative position of the crucible body and the quartz tube, thereby improving the applicability of the product.

[0021] 7. By installing the third mounting frame on the workbench and installing the electromagnet in the third mounting frame, the third mounting frame supports the electromagnet, so that when the electromagnet is powered on, the iron core can reciprocate in the electromagnet; one end of the knocking rod is connected with the iron core, the other end of the knocking rod penetrates through the side wall of the vacuum tank, and the other end of the knocking rod is opposite to the knocking plate, so that when the iron core reciprocates in the electromagnet, the iron core drives the knocking rod to reciprocate in the vacuum tank, thereby the knocking rod knocks the knocking plate, to avoid the adhesion of multiple sample microspheres, thereby improving the effect of coating film on the sample microspheres.

[0022] 8. First, start the vacuum pump to exhaust the air in the vacuum tank, so that the vacuum tank reaches a predetermined vacuum degree; then, start the electric gate valve to connect the molecular pump with the air guide pipe; then, start the molecular pump to exhaust the air in the vacuum tank, so that the molecular pump reaches an ultimate vacuum degree, thereby the sample microspheres can be coated in a higher vacuum environment, to improve the use experience of the product.

[0023] 9. By installing multiple mounting columns in the vacuum tank, the multiple mounting columns are arranged on the outer side of the air guide pipe, the baffle is connected with the multiple mounting columns at the same time, and the baffle is located above the air guide pipe, so that the multiple mounting columns support the baffle, thereby the baffle shields the air guide pipe, to avoid the debris in the vacuum tank from falling into the air guide pipe, thereby avoiding the debris from entering the molecular pump, to avoid damage to the molecular pump.

[0024] 10. By connecting one end of the gas path pipeline with the output ends of the three flow controllers at the same time, and connecting the other end of the gas path pipeline with the top of the quartz tube, the three flow controllers can control the flow of gas in the three gas sources into the gas path pipeline respectively, thereby improving the accuracy of the flow control of the working gas for coating film on the sample microspheres, to improve the coating film effect on the sample microspheres. BRIEF DESCRIPTION OF DRAWINGS

[0025] Figure 1 It is a perspective view of a thin film deposition device of the present application; Figure 2 It is a partial enlarged view of A of Figure 1 Figure 3 It is a partial enlarged view of B of Figure 1 Figure 4 It is a perspective view of a thin film deposition device of the present application; Figure 5 It is a partial enlarged view of C of Figure 4 Figure 6 It is a​​​Figure 4 a local enlarged view of D in FIG. 1; Figure 7 FIG. 3 is a perspective view of a third embodiment of a thin film deposition device according to the present application; Figure 8 FIG. 4 is a perspective view of a fourth embodiment of a thin film deposition device according to the present application; Figure 7 a local enlarged view of E in FIG. 4; Figure 9 a local enlarged view of F in FIG. 4; Figure 7 FIG. 5 is a perspective view of a sample stage mechanism and a knocking mechanism according to the present application; Figure 10 a local enlarged view of G in FIG. 5; Figure 11 Figure 10 a local enlarged view of H in FIG. 5; Figure 12 a local enlarged view of I in FIG. 5; Figure 10 wherein, Figures 1 to 12 Correspondence between reference numerals in the drawings and component names in the present application is as follows: 10 workbench, 11 vacuum tank, 12 vacuum cover, 13 quartz tube, 14 outer cover cylinder, 15 coil assembly, 16 gas supply mechanism, 161 gas supply frame, 162 flow controller, 163 gas path pipeline, 164 electromagnetic stop valve, 17 air extraction mechanism, 171 fourth mounting frame, 172 molecular pump, 173 air guide pipe, 174 electric gate valve, 175 vacuum pump, 176 shielding net, 177 mounting column, 178 baffle, 18 sample stage mechanism, 181 mounting plate, 182 support frame assembly, 1821 support frame body, 1822 support plate, 1823 positioning block, 1824 motor plate, 1825 positioning protrusion, 1826 handle, 183 second motor body, 184 crucible body, 185 cushion block, 186 knocking plate, 19 knocking mechanism, 191 third mounting frame, 192 electromagnet, 193 iron core, 194 knocking rod, 195 guide sleeve, 196 adjusting nut, 197 spring, 20 lifting mechanism, 201 second mounting frame, 202 first motor frame, 203 first motor body, 204 lead screw, 205 lifting plate, 206 support column, 207 light lever, 208 switch fixing frame, 209 second mounting hole, 210 proximity switch, 211 shielding sheet, 212 steel ruler, 213 pointer, 22 first observation window, 23 second observation window, 24 first mounting frame, 25 first mounting hole, 26 camera assembly, 27 third observation window, 28 cold light source. DETAILED DESCRIPTION

[0026] The present application will be further described below in conjunction with specific implementation cases and accompanying drawings. Figures 1 to 12 The present application is not limited to these embodiments.

[0027] A thin film deposition device, such as Figures 1 to 12 ​​As shown, the thin film deposition device comprises a workbench 10, a vacuum tank 11, a vacuum cover 12, a quartz tube 13, an outer cover cylinder 14, a coil assembly 15, a gas supply mechanism 16, a gas extraction mechanism 17, a sample stage mechanism 18, a knocking mechanism 19 and a lifting mechanism 20; the vacuum tank 11 is a hollow cavity with an opening at the top, the vacuum tank 11 is installed on the workbench 10; the vacuum cover 12 is buckled on the top of the vacuum tank 11; the quartz tube 13 is installed on the top of the vacuum cover 12, and the quartz tube 13 is in communication with the vacuum tank 11; the outer cover cylinder 14 is installed on the top of the vacuum cover 12, and at least part of the quartz tube 13 is located in the outer cover cylinder 14; the coil assembly 15 is installed in the outer cover cylinder 14, and the coil assembly 15 is wound outside the quartz tube 13; the gas supply mechanism 16 is installed on the workbench 10, and the gas supply mechanism 16 is in communication with the top of the quartz tube 13; the gas extraction mechanism 17 is installed on the workbench 10, and the gas extraction mechanism 17 is in communication with the vacuum tank 11; the sample stage mechanism 18 is located in the vacuum tank 11, and the sample stage mechanism 18 is located below the quartz tube 13; the knocking mechanism 19 is installed on the workbench 10, the knocking mechanism 19 passes through the vacuum tank 11, and the knocking mechanism 19 is in close contact with the sample stage mechanism 18; the lifting mechanism 20 is installed in the workbench 10, and the lifting mechanism 20 is connected with the sample stage mechanism 18.

[0028] The vacuum tank 11 is installed on the workbench 10, and the vacuum cover 12 is buckled on the top of the vacuum tank 11, so that the workbench 10 supports the vacuum tank 11, and the vacuum cover 12 seals the vacuum tank 11; the quartz tube 13 is installed on the top of the vacuum cover 12, and the quartz tube 13 is communicated with the vacuum tank 11, so that the vacuum cover 12 supports the quartz tube 13, and the quartz tube 13 is communicated with the inside of the vacuum tank 11; the outer cover cylinder 14 is installed on the top of the vacuum cover 12, and at least part of the quartz tube 13 is located in the outer cover cylinder 14, so that the outer cover cylinder 14 protects the quartz tube 13; the coil assembly 15 is installed in the outer cover cylinder 14, and the coil assembly 15 is arranged outside the quartz tube 13, so that the outer cover cylinder 14 supports the coil assembly 15, and when the coil assembly 15 is powered, the coil assembly 15 can form an inductive coupling area, so that when the working gas flows into the quartz tube 13, the working gas can be ionized in the inductive coupling area to form a plasma, and then the working gas produces various active species, and the active species reacts with each other or with monomers, so as to facilitate the subsequent deposition of the polymer film on the surface of the sample microsphere. The gas supply mechanism 16 is installed on the workbench 10, and the gas supply mechanism 16 is communicated with the top of the quartz tube 13, so that the gas supply mechanism 16 injects the working gas into the quartz tube 13, so that the working gas can be ionized in the inductive coupling area formed by the quartz tube 13 and the coil assembly 15 when the coil assembly 15 is powered; the air exhaust mechanism 17 is installed in the workbench 10, and the air exhaust mechanism 17 is communicated with the vacuum tank 11, so that the air exhaust mechanism 17 can exhaust the air in the vacuum tank 11, so as to form a vacuum state in the vacuum tank 11. The sample table mechanism 18 is located in the vacuum tank 11, and the sample table mechanism 18 is located below the quartz tube 13, so that the plurality of sample microspheres contained in the sample table mechanism 18 are in a vacuum environment during coating, so as to improve the uniformity of the subsequent coating of the sample microspheres, so that the ionized working gas can flow to the sample table mechanism 18, and then the plurality of sample microspheres contained in the sample table mechanism 18 are coated; the knocking mechanism 19 is installed on the workbench 10, the knocking mechanism 19 penetrates through the vacuum tank 11, and the knocking mechanism 19 is attached to the sample table mechanism 18, so that the knocking mechanism 19 can knock the sample table mechanism 18, so as to make the plurality of sample microspheres contained in the sample table mechanism 18 vibrate, so as to avoid the adhesion between the sample microspheres, and then improve the effect of coating the sample microspheres; the lifting mechanism 20 is installed in the workbench 10, and the lifting mechanism 20 is connected with the sample table mechanism 18, so that the lifting mechanism 20 drives the sample table mechanism 18 to move in the vacuum tank 11, so as to adjust the distance between the sample microspheres in the sample table mechanism 18 and the quartz tube 13, and then adjust the effect of coating the sample microspheres, so as to improve the use experience of the product.

[0029] In the specific use of the product, first, the plurality of sample microspheres are placed in the sample stage mechanism 18; then, the lifting mechanism 20 is started to drive the sample stage mechanism 18 to move up and down in the vacuum tank 11, so as to adjust the distance between the sample microspheres and the quartz tube 13; then, the air in the vacuum tank 11 is pumped out by the air pumping mechanism 17, so that a vacuum state is formed in the vacuum tank 11; then, the coil assembly 15 is powered on to form an inductive coupling region around the coil assembly 15; then, the working gas is injected into the quartz tube 13 by the gas supply mechanism 16, so that the working gas in the quartz tube 13 is ionized in the inductive coupling region to generate various active species, and the ionized working gas flows to the sample stage mechanism 18 to coat the plurality of sample microspheres in the sample stage mechanism 18, so that the working gas is deposited on the surface of the sample microspheres to form a polymer film; at the same time, the knocking mechanism 19 is started to knock the sample stage mechanism 18, so that the plurality of sample microspheres vibrate to avoid adhesion between the plurality of sample microspheres, thereby improving the coating effect of the sample microspheres.

[0030] With the above structure, the coil assembly 15 is installed in the outer cover cylinder 14 and wound outside the quartz tube 13, so that when the coil assembly 15 is powered on, the coil assembly 15 can form an inductive coupling region, so that when the working gas flows into the quartz tube 13, the working gas can be ionized in the inductive coupling region to form a plasma, thereby generating various active species, and the active species react with each other or with monomers, so that the polymer film is deposited on the surface of the sample microspheres in the subsequent process, thereby improving the coating effect of the product. The knocking mechanism 19 is installed on the workbench 10, passes through the vacuum tank 11, and is in close contact with the sample stage mechanism 18, so that the knocking mechanism 19 knocks the sample stage mechanism 18, thereby vibrating the plurality of sample microspheres placed in the sample stage mechanism 18 to avoid adhesion between the plurality of sample microspheres, thereby improving the coating effect of the sample microspheres.

[0031] Specifically, the radio frequency power supply is installed on the workbench 10 and is electrically connected with the coil assembly 15.

[0032] In the embodiments of the present application, as shown in Figure 2 and Figure 6As shown, the thin film deposition device further comprises a first observation window 22, a second observation window 23, a first mounting frame 24, a first mounting hole 25, a camera assembly 26, a third observation window 27 and a cold light source 28; the first observation window 22 is mounted on the vacuum cover 12; the second observation window 23 is mounted on the vacuum cover 12 and located on one side of the first observation window 22; the first mounting frame 24 is mounted on the second observation window 23; the first mounting hole 25 is in a strip shape, and at least two first mounting holes 25 are arranged in the first mounting frame 24; the camera assembly 26 is mounted on the at least two first mounting holes 25 and opposite to the second observation window 23; the third observation window 27 is mounted on the vacuum cover 12; and the cold light source 28 is mounted in the third observation window 27.

[0033] By mounting the first observation window 22 on the vacuum cover 12, the worker can observe the inside of the vacuum tank 11 through the first observation window 22, so as to observe the film coating effect of the sample microspheres; by mounting the second observation window 23 on the vacuum cover 12 and mounting the first mounting frame 24 on the second observation window 23, the vacuum cover 12 supports the second observation window 23, so that the second observation window 23 supports the first mounting frame 24. By arranging a plurality of first mounting holes 25 in a strip shape in the first mounting frame 24, mounting the camera assembly 26 on the plurality of first mounting holes 25 and making the camera assembly 26 opposite to the second observation window 23, the first mounting frame 24 supports the camera assembly 26 and the camera assembly 26 can move in the first mounting hole 25, so as to adjust the relative position of the camera assembly 26 and the second observation window 23, so that the camera assembly 26 can shoot the film coating of the sample microspheres through the second observation window 23, so as to monitor the film coating of the sample microspheres, to determine whether the sample microspheres are in a normal state during the film coating process, so as to ensure the film coating effect of the sample microspheres. By mounting the third observation window 27 on the vacuum cover 12 and mounting the cold light source 28 in the third observation window 27, the cold light source 28 can illuminate the inside of the vacuum tank 11, so as to improve the shooting effect of the camera assembly 26 on the film coating of the sample microspheres.

[0034] Specifically, the camera assembly 26 adopts a CCD video monitoring technology.

[0035] In the embodiment of the present application, as shown in Figure 9 and Figure 10As shown, the lifting mechanism 20 comprises a second mounting frame 201, a first motor frame 202, a first motor body 203, a lead screw 204, a lifting plate 205, a support column 206 and a light lever 207; the second mounting frame 201 is located in the workbench 10, and the second mounting frame 201 is installed on the top of the workbench 10; the first motor frame 202 is installed on the bottom of the second mounting frame 201; the first motor body 203 is installed on the first motor frame 202; the outer wall of the lead screw 204 is provided with external threads, the lead screw 204 is located in the second mounting frame 201, and the lead screw 204 is connected with the first motor body 203; the lifting plate 205 is provided with a threaded hole, the threaded hole is provided with internal threads, the lifting plate 205 is located in the second mounting frame 201, and the lead screw 204 passes through the threaded hole of the lifting plate 205; the support column 206 is installed on the lifting plate 205, the support column 206 passes through the bottom of the workbench 10 and the vacuum tank 11 in turn, and the support column 206 is connected with the sample stage mechanism 18; two light levers 207 are located in the second mounting frame 201, one end of the two light levers 207 is connected with the second mounting frame 201, the other end of the two light levers 207 is connected with the workbench 10, the two light levers 207 pass through the lifting plate 205, and the light lever 207 is located on both sides of the lead screw 204; wherein the external threads are in the internal threads, and the lead screw 204 is located in the support column 206.

[0036] By installing the second mounting machine on the top of the workbench 10, installing the first motor frame 202 on the bottom of the second mounting frame 201, and installing the first motor body 203 on the first motor frame 202, the workbench 10 supports the second mounting frame 201, so that the second mounting frame 201 supports the first motor body 203 through the first motor frame 202, thereby improving the stability of the first motor body 203; by connecting the lead screw 204 with the first motor body 203, locating the lifting plate 205 in the second mounting frame 201, and making the lead screw 204 pass through the threaded hole of the lifting plate 205, the lead screw 204 is threadedly connected with the lifting plate 205, so that when the first motor body 203 drives the lead screw 204 to rotate, the lead screw 204 drives the lifting plate 205 to move up and down, thereby adjusting the height of the lifting plate 205; by installing the support column 206 on the lifting plate 205, making the support column 206 pass through the bottom of the workbench 10 and the vacuum tank 11 in turn, and connecting the support column 206 with the sample table mechanism 18, when the lifting plate 205 moves up and down, the lifting plate 205 drives the sample table mechanism 18 to move up and down through the support column 206, thereby adjusting the height of the sample table mechanism 18. By connecting one end of the two light rods 207 with the second mounting frame 201, connecting the other end of the two light rods 207 with the workbench 10, and making the two light rods 207 pass through the lifting plate 205, the second mounting frame 201 and the workbench 10 cooperate to support the two light rods 207, so that the lifting plate 205 can move up and down along the two light rods 207, thereby improving the stability of the lifting plate 205 moving up and down; by locating the lead screw 204 in the support column 206, the lead screw 204 can rotate in the support column 206, thereby hiding the lead screw 204 in the support column 206, and further making the structure of the product more compact.

[0037] Specifically, a polytetrafluoroethylene guide sleeve is installed in the vacuum tank 11 and wound outside the support column 206, so that the polytetrafluoroethylene guide sleeve slidably seals the support column 206, thereby ensuring the sealing between the support column 206 and the vacuum tank 11 when the support column 206 moves up and down.

[0038] In the embodiment of the present application, as Figure 9As shown, the lifting mechanism 20 further comprises a switch fixing frame 208, a second mounting hole 209, proximity switches, a shielding piece 211, a steel ruler 212 and a pointer 213; the switch fixing frame 208 is mounted on one side of the second mounting frame 201; the second mounting hole 209 is in a strip shape, and the second mounting hole 209 is arranged in the switch fixing frame 208; two proximity switches are mounted in the second mounting hole 209, the two proximity switches are spaced apart from each other, and the two proximity switches are electrically connected with the first motor body 203; the shielding piece 211 is in an L shape, the shielding piece 211 is mounted on the lifting plate 205, and the shielding piece 211 is opposite to one proximity switch; the steel ruler 212 is mounted on the other side of the second mounting frame 201; the pointer 213 is mounted on the lifting plate 205, and the pointer 213 is opposite to the steel ruler 212; wherein the pointer 213 and the shielding piece 211 are at the same height.

[0039] By mounting the switch fixing frame 208 on one side of the second mounting frame 201, arranging the second mounting hole 209 in a strip shape in the switch fixing frame 208, and mounting two proximity switches in the second mounting hole 209, the second mounting frame 201 supports the two proximity switches, so that the proximity switches can move in the second mounting hole 209 to adjust the distance between the two proximity switches; by mounting the shielding piece 211 on the lifting plate 205 and opposite to the proximity switch, the lifting plate 205 drives the shielding piece 211 to move up and down, so that the shielding piece 211 can shield one proximity switch to make the proximity switch trigger the first motor body 203 to stop working, thereby controlling the distance of the lifting plate 205 moving up and down. By mounting the steel ruler 212 on the other side of the second mounting frame 201, mounting the pointer 213 on the lifting plate 205 and opposite to the steel ruler 212, the lifting plate 205 and the pointer 213 move up and down synchronously, so that the height of the lifting plate 205 is measured by the steel ruler 212, thereby accurately controlling the height of the sample stage mechanism 18; by making the pointer 213 and the shielding piece 211 at the same height, the worker can adjust the distance between the two proximity switches through the data pointed by the pointer 213, thereby accurately controlling the distance of the lifting plate 205 moving up and down.

[0040] In the embodiment of the present application, as shown in Figure 10 and Figure 11As shown, the sample table mechanism 18 comprises: a mounting plate 181, a support frame assembly 182, a second motor body 183, a crucible body 184, a cushion block 185 and a knocking plate 186; the mounting plate 181 is located in the vacuum tank 11, and the mounting plate 181 is connected with the support column 206; the support frame assembly 182 is installed on the mounting plate 181; the second motor body 183 is installed in the support frame assembly 182; the crucible body 184 is located above the support frame assembly 182, and the crucible body 184 is connected with the second motor body 183; the cushion block 185 is installed on a side wall of the support frame assembly 182; the knocking plate 186 is connected with the cushion block 185, and the knocking plate 186 is opposite to the knocking mechanism 19.

[0041] By locating the mounting plate 181 in the vacuum tank 11 and connecting the mounting plate 181 with the support column 206, the support column 206 can drive the mounting plate 181 to move up and down, so as to adjust the height of the mounting plate 181; by installing the support frame assembly 182 on the mounting plate 181, installing the second motor body 183 in the support frame assembly 182, and connecting the crucible body 184 with the second motor body 183, the support frame assembly 182 can support the second motor body 183, so that the second motor body 183 drives the crucible body 184 to rotate, and then when the plurality of sample microspheres are placed in the crucible body 184, the crucible body 184 can drive the plurality of sample microspheres to rotate, so as to avoid the adhesion between the sample microspheres, and improve the film coating effect of the sample microspheres. By installing the cushion block 185 on a side wall of the support frame assembly 182, connecting the knocking plate 186 with the cushion block 185, and making the knocking plate 186 opposite to the knocking mechanism 19, the support frame assembly 182 can support the knocking plate 186 through the cushion block 185, so that the knocking mechanism 19 can knock the support frame assembly 182 through the knocking plate 186, so as to increase the knocking area of the knocking mechanism 19 on the support frame assembly 182, and then improve the use experience of the product.

[0042] In the embodiment of the present application, as shown in Figure 11As shown, the support frame assembly 182 comprises a support frame body 1821, a support plate 1822, a positioning block 1823, a motor plate 1824, a positioning protrusion 1825 and a handle 1826; the support frame body 1821 is installed on the mounting plate 181; two support plates 1822 are respectively installed on both sides of the top of the support frame body 1821; a plurality of positioning blocks 1823 are arranged on the support plate 1822, and there is a spacing between adjacent two positioning blocks 1823; the motor plate 1824 is located between the two support plates 1822, and the second motor body 183 is installed at the bottom of the motor plate 1824; at least two positioning protrusions 1825 are respectively connected with both sides of the motor plate 1824, at least two positioning protrusions 1825 are respectively placed on the two support plates 1822, and the positioning protrusion 1825 is located between adjacent two positioning blocks 1823; the handle 1826 is connected with the motor plate 1824.

[0043] By installing two support plates 1822 on both sides of the top of the support frame body 1821, arranging a plurality of positioning blocks 1823 on the support plate 1822, and spacing adjacent two positioning blocks 1823, the support frame body 1821 can support the plurality of positioning blocks 1823 through the two support plates 1822; by locating the motor plate 1824 between the two support plates 1822 and installing the second motor body 183 at the bottom of the motor plate 1824, the motor plate 1824 can support the second motor body 183; by connecting a plurality of positioning protrusions 1825 with both sides of the motor plate 1824, placing a plurality of positioning protrusions 1825 on the two support plates 1822, and locating the positioning protrusion 1825 between adjacent two positioning blocks 1823, the support plate 1822 can support the motor plate 1824 through the positioning protrusion 1825, so that adjacent two positioning blocks 1823 can position the positioning protrusion 1825 and the motor plate 1824; by connecting the handle 1826 with the motor plate 1824, the staff can take the motor plate 1824, the second motor body 183 and the crucible body 184 through the handle 1826, so as to facilitate the staff to replace the sample microspheres.

[0044] With the above structure, by positioning the positioning protrusion 1825 between adjacent two positioning blocks 1823 and placing the positioning protrusion 1825 on the support plate 1822, the support frame body 1821 can support the motor plate 1824 and the second motor body 183 through the support plate 1822, so as to place the positioning protrusion 1825 between different two positioning blocks 1823 to adjust the relative position of the crucible body 184 and the quartz tube 13, thereby improving the applicability of the product.

[0045] In the embodiments of the present application, as shown in Figure 3 and Figure 10As shown, the knocking mechanism 19 comprises a third mounting frame 191, an electromagnet 192, a knocking rod 194, a guide sleeve 195, an adjusting nut 196 and a spring 197; the third mounting frame 191 is mounted on the workbench 10, and the third mounting frame 191 is located at one side of the vacuum tank 11; the electromagnet 192 is internally provided with an iron core 193, and the electromagnet 192 is mounted in the third mounting frame 191; one end of the knocking rod 194 is connected with the iron core 193, and the other end of the knocking rod 194 penetrates through the side wall of the vacuum tank 11 and is opposite to the knocking plate 186; the guide sleeve 195 is mounted on the side wall of the vacuum tank 11, and the guide sleeve 195 is arranged outside the knocking rod 194; the adjusting nut 196 is sleeved outside the knocking rod 194; and the spring 197 is arranged outside the knocking rod 194, one end of the spring 197 is in abutment with the guide sleeve 195, and the other end of the spring 197 is in abutment with the adjusting nut 196.

[0046] By mounting the third mounting frame 191 on the workbench 10 and mounting the electromagnet 192 in the third mounting frame 191, the third mounting frame 191 supports the electromagnet 192, so that when the electromagnet 192 is powered, the iron core 193 can reciprocate in the electromagnet 192; by connecting one end of the knocking rod 194 with the iron core 193, making the other end of the knocking rod 194 penetrate through the side wall of the vacuum tank 11 and opposite to the knocking plate 186, when the iron core 193 reciprocates in the electromagnet 192, the iron core 193 drives the knocking rod 194 to reciprocate in the vacuum tank 11, so that the knocking rod 194 knocks the knocking plate 186, to avoid the adhesion of multiple sample microspheres, thereby improving the effect of coating the sample microspheres. By mounting the guide sleeve 195 on the side wall of the vacuum tank 11 and arranging the guide sleeve 195 outside the knocking rod 194, the vacuum tank 11 supports the guide sleeve 195, so that the guide sleeve 195 guides the knocking rod 194, to improve the stability of the movement of the knocking rod 194; by sleeving the adjusting nut 196 outside the knocking rod 194, abutting one end of the spring 197 with the guide sleeve 195, and abutting the other end of the spring 197 with the adjusting nut 196, when the knocking rod 194 moves towards the knocking plate 186, the knocking rod 194 compresses the spring 197 through the adjusting nut 196, so that when the knocking rod 194 moves away from the knocking plate 186, the spring 197 resets and drives the knocking rod 194 to move, to improve the use experience of the product. At the same time, by sleeving the adjusting nut 196 outside the knocking rod 194, the position of the adjusting nut 196 on the knocking rod 194 is adjusted to adjust the compression force of the spring 197 by the adjusting nut 196, thereby improving the applicability of the product.

[0047] In the embodiments of the present application, as shown inFigure 7 As shown, the air extraction mechanism 17 comprises a fourth mounting frame 171, a molecular pump 172, a gas guide pipe 173, an electrically-operated gate valve 174 and a vacuum pump 175; the fourth mounting frame 171 is installed in the workbench 10; the molecular pump 172 is installed on the fourth mounting frame 171; the gas guide pipe 173 is installed in the workbench 10, the top of the gas guide pipe 173 is located in the vacuum tank 11, and the gas guide pipe 173 is located above the molecular pump 172; the electrically-operated gate valve 174 is installed in the workbench 10, the electrically-operated gate valve 174 is located between the molecular pump 172 and the gas guide pipe 173, and the electrically-operated gate valve 174 is in contact with the output end of the molecular pump 172 and the gas guide pipe 173 at the same time; the vacuum pump 175 is installed outside the workbench 10, and the vacuum pump 175 is in communication with the vacuum tank 11.

[0048] By installing the fourth mounting frame 171 in the workbench 10 and installing the molecular pump 172 on the fourth mounting frame 171, the fourth mounting frame 171 supports the molecular pump 172, thereby improving the stability of the molecular pump 172; by passing the gas guide pipe 173 through the top of the workbench 10, the top of the gas guide pipe 173 is located in the vacuum tank 11, and the gas guide pipe 173 is located above the molecular pump 172, thereby supporting the workbench 10 to support the gas guide pipe 173, so that the gas guide pipe 173 is in communication with the inside of the vacuum tank 11. By installing the electrically-operated gate valve 174 in the workbench 10, the electrically-operated gate valve 174 is located between the molecular pump 172 and the gas guide pipe 173, and the electrically-operated gate valve 174 is in contact with the output end of the molecular pump 172 and the gas guide pipe 173 at the same time, thereby supporting the workbench 10 to support the electrically-operated gate valve 174, so that the electrically-operated gate valve 174 controls the on-off of the gas guide pipe 173 and the molecular pump 172, thereby enabling the molecular pump 172 to extract air in the vacuum tank 11 through the gas guide pipe 173, so that a vacuum state is formed in the vacuum tank 11; by installing the vacuum pump 175 outside the workbench 10 and making the vacuum pump 175 in communication with the vacuum tank 11, the vacuum pump 175 can extract air in the vacuum tank 11, thereby achieving a predetermined vacuum degree in the vacuum tank 11, and facilitating the molecular pump 172 to extract air in the vacuum tank 11.

[0049] With the above structure, first, the vacuum pump 175 is started to extract air in the vacuum tank 11, so that a predetermined vacuum degree is reached in the vacuum tank 11; then, the electrically-operated gate valve 174 is started to make the molecular pump 172 in communication with the gas guide pipe 173; then, the molecular pump 172 is started to extract air in the vacuum tank 11, so that the molecular pump 172 reaches a limit vacuum degree, thereby enabling the sample microspheres to be coated in an environment with a higher vacuum degree, thereby improving the use experience of the product.

[0050] In the embodiments of the present application, as shown in Figure 10 and Figure 12 The suction mechanism 17 further comprises a shielding net 176, a plurality of mounting columns 177 and a baffle 178. The shielding net 176 is located in the vacuum tank 11 and is mounted on the top of the air guide pipe 173. The plurality of mounting columns 177 are mounted in the vacuum tank 11 and are arranged around the outer side of the air guide pipe 173. The baffle 178 is connected with the plurality of mounting columns 177 and is located above the air guide pipe 173.

[0051] The plurality of mounting columns 177 are mounted in the vacuum tank 11 and are arranged around the outer side of the air guide pipe 173. The baffle 178 is connected with the plurality of mounting columns 177 and is located above the air guide pipe 173. In this way, the plurality of mounting columns 177 support the baffle 178, so that the baffle 178 shields the air guide pipe 173, thereby preventing the impurities in the vacuum tank 11 from falling into the air guide pipe 173, and further preventing the impurities from entering the molecular pump 172, so as to avoid damage to the molecular pump 172. The shielding net 176 is mounted on the top of the air guide pipe 173, so as to prevent the impurities from entering the air guide pipe 173, further prevent the molecular pump 172 from being damaged, and improve the use experience of the product.

[0052] In the embodiments of the present application, as shown in Figure 6 The gas supply mechanism 16 comprises a gas supply frame 161, three flow controllers 162, a gas path pipeline 163 and three electromagnetic shut-off valves 164. The gas supply frame 161 is mounted on the workbench 10. The three flow controllers 162 are mounted on the gas supply frame 161. One end of the gas path pipeline 163 is connected with the output ends of the three flow controllers 162, and the other end of the gas path pipeline 163 is connected with the top of the quartz tube 13. The three electromagnetic shut-off valves 164 are mounted on the gas supply frame 161, are connected with the input ends of the three flow controllers 162 respectively, and are connected with three gas sources respectively.

[0053] By installing the gas supply rack 161 on the workbench 10, installing three flow controllers 162 on the gas supply rack 161, and installing electromagnetic cut-off valves 164 on the gas supply rack 161, the gas supply rack 161 supports the three flow controllers 162 and the three electromagnetic cut-off valves 164, thereby improving the stability of the three flow controllers 162 and the three electromagnetic cut-off valves 164; by connecting the three electromagnetic cut-off valves 164 with the three gas sources respectively, and connecting the three electromagnetic cut-off valves 164 with the input ends of the three flow controllers 162 respectively, the electromagnetic cut-off valves 164 can control whether the gas in the gas source flows into the flow controller; by connecting one end of the gas path pipeline 163 with the output ends of the three flow controllers 162 simultaneously, and connecting the other end of the gas path pipeline 163 with the top of the quartz tube 13, the three flow controllers 162 can control the flow of the gas in the three gas sources flowing into the gas path pipeline 163 respectively, thereby improving the accuracy of the flow control of the working gas for the sample microsphere film coating, and improving the film coating effect of the sample microsphere.

[0054] Specifically, the outer wall of the vacuum tank 11 is provided with a sampling port, so that the staff can replace the sample microspheres through the sampling port; the operation door is rotatably connected with the vacuum tank 11, and the operation door is attached to the sampling port, so that the operation door opens or closes the sampling port, thereby ensuring the vacuum property of the vacuum tank 11. One end of the operating rod is rotatably connected with the sampling port, and the operating rod passes through the operation door; the hand wheel is sleeved on the outside of the operating rod, and the hand wheel is attached to the operation door, so that by rotating the hand wheel, the hand wheel is pressed tightly on the sampling port through the operation door, thereby improving the sealing property between the operation door and the sampling port.

[0055] In the description of the present application, the term "a plurality of" refers to two or more, unless otherwise explicitly limited, and the terms "upper", "lower", etc. indicate the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application; the terms "connection", "installation", "fixation" and the like should be understood broadly, for example, "connection" can be fixed connection, or detachable connection, or integral connection; can be directly connected, or indirectly connected through an intermediate medium. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0056] In the description of the present application, the terms "one embodiment", "some embodiments", "certain embodiments", etc. mean that the particular feature, structure, material or characteristic being described is included in at least one embodiment or example of the present application. Such phrases in various contexts can refer to different embodiments or examples. Furthermore, the particular features, structures, materials, or characteristics can be combined in any suitable manner in one or more embodiments or examples.

[0057] The above description is merely illustrative of the application, and is not intended to limit the application. Any modifications, equivalent replacements, improvements, and the like made by those skilled in the art without departing from the spirit and principle of the application shall fall within the scope of the application.

Claims

1. A thin film deposition apparatus, characterized in that, The thin film deposition apparatus includes: Workbench; A vacuum container, which is a hollow cavity with an opening at the top, is mounted on the workbench; A vacuum cover, which is fastened to the top of the vacuum container; A quartz tube is mounted on top of the vacuum cover and is connected to the vacuum container; An outer casing is mounted on top of the vacuum cover, and at least a portion of the quartz tube is located inside the outer casing. A coil assembly, which is installed inside the outer casing and wound around the outside of the quartz tube; A gas supply mechanism is installed on the workbench and is connected to the top of the quartz tube. A vacuum pump is installed inside the workbench and is connected to the vacuum tank. A sample stage mechanism is located inside the vacuum chamber and below the quartz tube; A striking mechanism is mounted on the worktable, passes through the vacuum tank, and is in contact with the sample stage mechanism; A lifting mechanism is installed inside the workbench and is connected to the sample stage mechanism.

2. The thin film deposition apparatus according to claim 1, characterized in that, The thin film deposition apparatus further includes: A first observation window is installed on the vacuum cover; A second observation window is installed on the vacuum cover and is located on one side of the first observation window; A first mounting bracket is mounted on the second observation window; The first mounting hole is elongated, and at least two of the first mounting holes are provided in the first mounting bracket. A camera assembly, the camera assembly being mounted on at least two of the first mounting holes, and the camera assembly being opposite to the second viewing window; A third observation window is installed on the vacuum cover; A cold light source is installed inside the third observation window.

3. The thin film deposition apparatus according to claim 1, characterized in that, The lifting mechanism includes: A second mounting bracket is located inside the workbench and is mounted on the top of the workbench; A first motor frame is mounted on the bottom of a second mounting bracket; The first motor body is mounted on the first motor frame; A lead screw, the outer wall of which is provided with external threads, the lead screw is located in the second mounting bracket, and the lead screw is connected to the first motor body; A lifting plate, wherein a threaded hole is provided in the lifting plate and an internal thread is provided in the threaded hole, the lifting plate is located in the second mounting frame, and the lead screw passes through the threaded hole of the lifting plate; A support column is installed on the lifting plate, and the support column passes through the bottom of the worktable and the vacuum tank in sequence, and the support column is connected to the sample stage mechanism; Two optical bars are located inside the second mounting frame. One end of each optical bar is connected to the second mounting frame, and the other end of each optical bar is connected to the worktable. The two optical bars pass through the lifting plate and are located on both sides of the lead screw. The external thread is adapted to the internal thread, and the lead screw is located inside the support column.

4. A thin film deposition apparatus according to claim 3, characterized in that, The lifting mechanism also includes: A switch mounting bracket, which is mounted on one side of the second mounting bracket; The second mounting hole is elongated and is located inside the switch mounting bracket. Two proximity switches are installed in the second mounting hole, with a gap between them, and the two proximity switches are electrically connected to the first motor body. A shield, the shield being L-shaped, is mounted on the lifting plate and is opposite to one of the proximity switches; A steel ruler, which is mounted on the other side of the second mounting bracket; A pointer is mounted on the lifting plate and is opposite to the steel ruler; The pointer and the shield are at the same height.

5. A thin film deposition apparatus according to claim 3, characterized in that, The sample stage mechanism includes: Mounting plate, which is located inside the vacuum tank and is connected to the support column; A support frame assembly, which is mounted on the mounting plate; The second motor body is installed inside the support frame assembly; The crucible body is located above the support frame assembly and is connected to the second motor body; A pad, the pad being mounted on one side wall of the support frame assembly; A striking plate, which is connected to the pad block and is opposite to the striking mechanism.

6. A thin film deposition apparatus according to claim 5, characterized in that, The support frame assembly includes: A support frame body, which is mounted on the mounting plate; Support plates, two of which are respectively installed on both sides of the top of the support frame body; Positioning blocks, a plurality of the positioning blocks are disposed on the support plate, and there is a gap between two adjacent positioning blocks; A motor plate, the motor plate being located between the two support plates, and the second motor body being mounted on the bottom of the motor plate; The positioning protrusions are respectively connected to both sides of the motor plate, and the positioning protrusions are respectively placed on the two support plates, and the positioning protrusions are located between two adjacent positioning blocks; A handle, which is connected to the motor board.

7. A thin film deposition apparatus according to claim 5, characterized in that, The striking mechanism includes: A third mounting bracket is mounted on the workbench and is located on one side of the vacuum tank; An electromagnet, wherein an iron core is provided inside the electromagnet, and the electromagnet is installed in the third mounting bracket; A striking rod, one end of which is connected to the iron core, and the other end of which passes through the side wall of the vacuum tank and is opposite to the striking plate; A guide sleeve is installed on the side wall of the vacuum tank and is arranged around the outside of the striking rod; An adjusting nut, which is fitted onto the outside of the striking rod; A spring is wound around the outside of the striking rod, one end of the spring is in contact with the guide sleeve, and the other end of the spring is in contact with the adjusting nut.

8. A thin film deposition apparatus according to claim 1, characterized in that, The air extraction mechanism includes: A fourth mounting bracket is installed inside the workbench; A molecular pump, which is mounted on the fourth mounting bracket; A gas delivery tube is installed inside the workbench, passes through the top of the workbench, has its top located inside the vacuum tank, and is positioned above the molecular pump. An electric gate valve is installed inside the workbench, located between the molecular pump and the gas delivery pipe, and simultaneously in contact with the output end of the molecular pump and the gas delivery pipe. A vacuum pump is installed on the outside of the workbench and is connected to the vacuum tank.

9. A thin film deposition apparatus according to claim 8, characterized in that, The air extraction mechanism also includes: A shielding net is located inside the vacuum tank and is installed on top of the gas guide pipe; Mounting columns, a plurality of said mounting columns are installed inside said vacuum tank, and the plurality of said mounting columns are arranged around the outside of said gas guide tube; A baffle is connected to multiple mounting posts and is located above the air duct.

10. A thin film deposition apparatus according to claim 1, characterized in that, The gas supply mechanism includes: An air supply frame is installed on the workbench; Flow controllers, three of which are mounted on the gas supply frame; A gas pipeline, one end of which is connected to the output terminals of the three flow controllers, and the other end of which is connected to the top of the quartz tube. Three electromagnetic shut-off valves are installed on the gas supply frame. The three electromagnetic shut-off valves are respectively connected to the input terminals of the three flow controllers and are respectively connected to the three gas sources.

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