Linear multifunctional magnetron sputtering coating machine

By designing a linear multi-functional magnetron sputtering coating machine, which employs a linear conveying mechanism and multiple sets of magnetron sputtering target guns, the problem of coating large components has been solved, achieving efficient and precise coating results.

CN121653594APending Publication Date: 2026-03-13无锡嘉森光学科技有限公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-12-25
Publication Date
2026-03-13

AI Technical Summary

Technical Problem

Existing technologies cannot perform sputter coating on large components, especially disk-shaped components larger than 8 inches.

Method used

A linear multifunctional magnetron sputtering coating machine was designed, which includes a sample chamber and a sputtering chamber. It adopts a linear conveying mechanism and multiple sets of magnetron sputtering target guns, is equipped with an independent gas filling pipeline, and realizes sample flipping and coating through a reversing mechanism.

Benefits of technology

It achieves efficient coating of large-size samples, improves coating efficiency and accuracy, and meets the coating requirements of complex materials and processes.

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Abstract

The invention relates to the technical field of sputtering coating machines, in particular to a linear multifunctional magnetron sputtering coating machine which comprises a processing chamber and a sample plate, the processing chamber comprises a sample chamber and a sputtering chamber, and a gate valve is arranged between the sample chamber and the sputtering chamber; the linear conveying mechanism comprises a sample vehicle arranged in the processing chamber in a sliding manner, and samples are conveyed into the processing chamber or conveyed out of the processing chamber through the sample vehicle; wherein a plurality of groups of magnetron sputtering target guns are arranged in the sputtering chamber, each group of magnetron sputtering target guns is provided with two paths of gas filling pipelines which are independently controlled to work, and two paths of gas filling pipelines which are independently controlled to work are arranged in the sputtering chamber; and the reversing mechanism is mounted on the sample vehicle and is used for changing the surface of the sample plate. Through multi-target and multi-gas input, a high-difficulty coating process is realized, and the linear conveying of the sample vehicle is set, so that the coating of a large-size sample plate is realized; and secondly, the reversing mechanism is arranged on the sample vehicle, so that the sample is turned over in time after single-side coating is finished, and the coating efficiency is improved.
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Description

Technical Field

[0001] This invention relates to the field of sputtering coating machine technology, specifically to a linear multi-functional magnetron sputtering coating machine. Background Technology

[0002] Magnetron sputtering is a type of physical vapor deposition that is commonly used to coat various materials on the surfaces of various substrates, such as optical devices (lenses, filters, mirrors, etc.), semiconductor components (wafers, chips, lasers, etc.), and metal materials (tools, molds, etc.).

[0003] In the existing technology, the substrates or components that can be coated are all small sheet components, with a maximum size of no more than 8-inch disks. For larger components, there is currently no other method for sputter coating. Summary of the Invention

[0004] In view of the above-mentioned shortcomings of the prior art, the present invention provides a linear multi-functional magnetron sputtering coating machine, which can effectively solve the problem that large components cannot be sputtered and coated in the prior art.

[0005] To achieve the above objectives, the present invention provides the following technical solution: This invention provides a linear multi-functional magnetron sputtering coating machine, including a processing chamber and a sample plate, and further comprising: The processing chamber includes a sample chamber and a sputtering chamber, and a gate valve is provided between the sample chamber and the sputtering chamber; A linear conveying mechanism includes a sample carriage that is slidably disposed in a processing chamber, through which samples are conveyed into or out of the processing chamber; The sputtering chamber is equipped with multiple sets of magnetron sputtering target guns, each set of magnetron sputtering target guns is equipped with two independently controlled gas filling pipelines, and the sputtering chamber is equipped with two independently controlled gas filling pipelines. The reversing mechanism, installed on the sample carriage, is used to change the surface of the sample.

[0006] Furthermore, guide racks are provided in the sample chamber and between the slide valve and the nearest magnetron sputtering target gun. The bottom of the sample carriage is provided with a transmission gear that matches the guide rack, and the sample carriage is provided with a second drive motor that drives the transmission gear to rotate.

[0007] Furthermore, a lead screw is rotatably installed in the sputtering chamber, and a first drive motor for rotating the lead screw is provided outside the sputtering chamber. A clutch adapted to the lead screw is slidably installed in the sputtering chamber. The clutch can be separated from or connected to the sample carriage. A fourth sensor is provided in the sputtering chamber to detect whether the sample carriage has moved to the end of the lead screw that is close to the first drive motor.

[0008] Furthermore, the sputtering chamber is equipped with a first sensor and a second sensor. Both the first sensor and the second sensor are used to detect the position of the sample vehicle. When the sample vehicle is detected to enter the sputtering chamber, the gear drive method is changed to a thread drive method. When the sample vehicle is detected to leave the sputtering chamber, the thread drive method is changed to a gear drive method.

[0009] Furthermore, mechanical pumps and molecular pumps are connected to the outside of both the sample chamber and the sputtering chamber to create a vacuum in the sample chamber and the sputtering chamber.

[0010] Furthermore, a third sensor is provided in the sample chamber, and a fourth detection door is provided on the side of the sample chamber away from the sputtering chamber. When the third sensor detects that the sample cart is moving towards the sputtering chamber, the gate valve is opened; when the third sensor detects that the sample cart is moving towards the outside of the sample chamber, the fourth detection door is opened.

[0011] Furthermore, the number of magnetron sputtering target guns is four, and four sets of sensors are sequentially arranged in the sputtering chamber. Each of the four sets of sensors corresponds to a magnetron sputtering target gun. The position of the sample carriage in the sputtering chamber is detected by the sensors and fed back to the first drive motor, which drives the sample carriage to move back and forth.

[0012] Furthermore, the reversing mechanism includes two movable plates mounted on the sample vehicle. A fixing frame is fixedly installed on the bottom side wall of each of the two movable plates. A right-angle carriage is slidably installed on each of the two movable plates. A sliding clamp is slidably installed on the right-angle carriage. The sample is held by the two sets of right-angle carriages and sliding clamps.

[0013] Furthermore, the reversing mechanism also includes a slide rod mounted on a right-angle carriage. The movable plate has an installation groove, and the slide rod extends into the installation groove. A gear is slidably sleeved on the slide rod. A reversing rod is provided in the installation groove, and a rack that matches the gear is provided at the top of the reversing rod. When the gear moves to the top of the installation groove, it is displaced from the rack. When the gear moves to the bottom of the installation groove, it is aligned with the rack.

[0014] Furthermore, a first adjusting block and a second adjusting block are respectively installed on the slide rod, a first transmission block is fixedly installed on the top wall of the mounting groove, a second transmission block is fixedly installed on the bottom wall of the mounting groove, a transmission frame is slidably installed in the mounting groove, and both ends of the transmission frame pass through the inner wall of the mounting groove respectively. The transmission frame and the slide rod are rotatably connected, and guide blocks are fixedly installed at both ends of the transmission frame.

[0015] Furthermore, a cleaning plate is slidably mounted on the movable plate, a slider is mounted on the cleaning plate, and a guide groove adapted to the slider is provided on the movable plate, the guide groove being arc-shaped.

[0016] The technical solution provided by this invention has the following advantages compared with the known prior art: By using multi-target, multi-gas input, a highly complex coating process is achieved. A linear transport system for the sample cart is set up to enable coating of large-sized samples. Secondly, a reversing mechanism is installed on the sample cart so that the sample can be flipped over promptly after coating is completed on one side, thus improving coating efficiency. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a top view of the present invention; Figure 2 This is a front view of the present invention; Figure 3 This is a schematic diagram of the prototype vehicle. Figure 4 This is a schematic diagram of the reversing mechanism.

[0019] The labels in the diagram represent: 1. Sample vehicle; 2. Sample chamber; 3. Sputtering chamber; 4. Gate valve; 5. Magnetron sputtering target gun; 6. First sensor; 7. Second sensor; 8. Third sensor; 9. Fourth sensor; 10. Fifth sensor; 11. Sixth sensor; 12. Seventh sensor; 13. Eighth sensor; 14. First detection gate; 15. Second detection gate; 16. Third detection gate; 17. Fourth detection gate; 18. First drive motor ; 19. First cylinder; 20. Guide block; 21. Movable plate; 22. Fixed frame; 23. Right-angle slide; 24. First insert plate motor; 25. Sliding clamp; 26. Slide rod; 27. Transmission frame; 28. Gear; 29. ​​Second drive motor; 30. First adjusting block; 31. Second adjusting block; 32. First transmission block; 33. Second transmission block; 34. Reversing rod; 35. Guide rod; 36. Guide frame; 37. Cleaning plate; 38. Guide groove. Detailed Implementation

[0020] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative effort are within the scope of protection of the present invention.

[0021] The present invention will be further described below with reference to embodiments.

[0022] Example 1: This linear multi-functional magnetron sputtering coating machine includes a processing chamber and a sample chamber. The processing chamber comprises a sample chamber 2 and a sputtering chamber 3, and is entirely made of stainless steel. The entire machine has a high ultimate vacuum and an extremely low leakage rate. A gate valve 4 (with a first gate motor 24 driving the gate valve 4) is installed between the sample chamber 2 and the sputtering chamber 3. Mechanical pumps and molecular pumps are connected to the outside of both the sample chamber 2 and the sputtering chamber 3. The mechanical pumps and molecular pumps are used to evacuate the sample chamber 2 and the sputtering chamber 3. The sample chamber 2 can be understood as a buffer chamber, used to transport the external sample to the sputtering chamber 3 while ensuring that the vacuum environment in the sputtering chamber 3 is not significantly affected. When transporting the sample, the gate valve 4 is first closed, thus separating the sample chamber 2 and the sputtering chamber 3. The sample carriage 1 carries the sample into the sample chamber 2, then the sample chamber 2 is evacuated, and then the gate valve 4 is opened, allowing the sample carriage 1 to carry the sample into the sputtering chamber 3. The sample chamber 2 is equipped with a third sensor 8, and the sample chamber 2 is equipped with a fourth detection door 17 on the side away from the sputtering chamber 3. When the third sensor 8 detects that the sample carriage 1 is moving towards the sputtering chamber 3, the gate valve 4 is opened. When the third sensor 8 detects that the sample carriage 1 is moving towards the outside of the sample chamber 2, the fourth detection door 17 is opened.

[0023] The linear conveying mechanism includes a sample carriage 1 slidably disposed in the processing chamber, through which samples are conveyed into or out of the processing chamber. Guide racks are provided in the sample chamber 2 and between the slide valve 4 and the nearest magnetron sputtering target gun 5. A transmission gear adapted to the guide rack is provided at the bottom of the sample carriage 1, and a second drive motor 29 driving the transmission gear is provided on the sample carriage 1. A lead screw is rotatably mounted in the sputtering chamber 3, and a first drive motor 18 for channeling the lead screw rotation is provided outside the sputtering chamber 3. A clutch adapted to the lead screw is slidably mounted in the sputtering chamber 3, and the clutch can be disengaged or connected to the sample carriage 1. A fourth sensor 9 is installed in the sputtering chamber 3 to detect whether the sample carriage 1 has moved to the end of the lead screw close to the first drive motor 18. A first sensor 6 and a second sensor 7 are installed in the sputtering chamber 3. Both the first sensor 6 and the second sensor 7 are used to detect the position of the sample carriage 1. When the sample carriage 1 is detected to enter the sputtering chamber 3, the gear drive mode is changed to the screw drive mode. When the sample carriage 1 is detected to leave the sputtering chamber 3, the screw drive mode is changed back to the gear drive mode. A first cylinder 19 is installed outside the sputtering chamber 3 to drive the clutch, thereby completing the change of drive mode.

[0024] Example 2: refer to Figure 2 The sputtering chamber 3 is equipped with multiple sets of magnetron sputtering target guns 5, each with two independently controlled gas inlet lines. This configuration allows for simultaneous deposition of various complex materials and processes. The gas flow rate is controlled by a flow meter. During film deposition, the sample reciprocates at a set rate, passing over the target gun sputtering area. The thickness of the deposited film on the sample is controlled by adjusting the rate at which the sample passes over the target gun sputtering area. There are four sets of magnetron sputtering target guns 5, and four sets of sensors are sequentially installed in the sputtering chamber 3, such as... Figure 1 As shown, the four sets of sensors include a fifth sensor 10, a sixth sensor 11, a seventh sensor 12, and an eighth sensor 13. Each of the four sets of sensors corresponds to a magnetron sputtering target gun 5. The sensors detect the position of the sample carriage 1 in the sputtering chamber 3 and feed the data back to the first drive motor 18. The first drive motor 18 drives the sample carriage 1 to move back and forth, monitors the position of the sample in real time, and works in conjunction with the corresponding magnetron sputtering target gun 5 to coat the sample, thereby improving the coating accuracy.

[0025] To prevent the magnetron sputtering target guns 5 from interfering with each other, a first detection door 14, a second detection door 15, and a third detection door 16 are respectively installed in the sputtering chamber 3. The space in the sputtering chamber 3 is further divided by the detection doors, which can be understood as the function of baffles. For example, when one of the magnetron sputtering target guns 5 is performing sputtering coating, the magnetron sputtering target guns 5 on both sides of it are isolated by the corresponding detection doors.

[0026] Example 3: refer to Figure 3 The sample carriage 1 is equipped with a reversing mechanism for changing the surface of the sample. The reversing mechanism includes two movable plates 21 mounted on the sample carriage 1. A fixing bracket 22 is fixedly mounted on the bottom sidewall of each of the two movable plates 21. A right-angle slide 23 is slidably mounted on each of the two movable plates 21, and a sliding clamp 25 is slidably mounted on the right-angle slide 23. The sample is held in place by the two sets of right-angle slides 23 and sliding clamps 25. The reversing mechanism also includes a slide rod 26 mounted on the right-angle slide 23. An installation groove is provided on the movable plate 21, and the slide rod 26 extends into the installation groove. A gear 28 is slidably fitted on the slide rod 26. A reversing rod 34 is provided in the installation groove, and the top of the reversing rod 34 is connected to the gear 28. An 8-phase matching rack is provided. When the gear 28 moves to the top of the mounting groove, it is offset from the rack. When the gear 28 moves to the bottom of the mounting groove, it is aligned with the rack. A first adjusting block 30 and a second adjusting block 31 are respectively installed on the slide rod 26. A first transmission block 32 is fixedly installed on the top wall of the mounting groove, and a second transmission block 33 is fixedly installed on the bottom wall of the mounting groove. A transmission frame 27 is slidably installed in the mounting groove, and both ends of the transmission frame 27 penetrate the inner wall of the mounting groove. The transmission frame 27 and the slide rod 26 are rotatably connected. Guide blocks 20 are fixedly installed at both ends of the transmission frame 27. A guide frame 36 is set in the sputtering chamber 3. By guiding the guide rod 35, the transmission frame 27 can move up and down.

[0027] like Figure 3As shown, the sample is mounted on two fixed frames 22 and held in place by sliding clamps 25. The fixed sample is then sent into the sputtering chamber 3 for coating via the sample carriage 1. After single-sided coating is completed, the sample carriage 1 moves to drive the guide block 20 and guide frame, or is guided by the guide groove. The transmission frame 27 moves upward. When it moves closer to the top of the mounting groove, the gear 28 and rack generate transmission, driving the slide rod 26 to rotate 180 degrees (to achieve the purpose of changing the side). After the rotation is completed, it continues to move upward. The first transmission block 32 presses the first adjusting block 30, causing the gear 28 to slide along the slide rod 26. The gear 28 and rack are misaligned, so that the gear 28 will not generate transmission with the rack during the downward movement. When it moves to the bottom of the mounting groove, the second adjusting block 31 and the second transmission block 33 generate transmission, and the gear 28 translates here (in the opposite direction to the sliding direction during the upward movement). At this time, the gear 28 and rack are realigned. When the slide bar 26 moves upward again, the gear 28 and rack will re-engage. A single up-and-down slide of the slide bar 26 completes one flip, and then the other side of the sample is coated.

[0028] It is worth noting that a cleaning plate 37 is slidably installed on the movable plate 21. A slider is installed on the cleaning plate 37. A guide groove 38 adapted to the slider is opened on the movable plate 21. The guide groove 38 is arc-shaped. When the template is moved up to change the surface, the cleaning plate 37 moves up with the template. During the upward movement, the cleaning plate 37 slides along the guide groove 38. The top wall of the cleaning plate 37 is provided with a cleaning layer, which is in full contact with the bottom wall of the template. During the sliding process, the bottom wall of the template will be cleaned. When the two cleaning plates 37 are farthest apart, they are greater than the width of the template.

[0029] The above embodiments are only used to illustrate the technical solutions of the present invention, and are not intended to limit it. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions will not cause the essence of the corresponding technical solutions to deviate from the protection scope of the technical solutions of the embodiments of the present invention.

Claims

1. A linear multi-functional magnetron sputtering coating machine, comprising a processing chamber and a sample plate, characterized in that, Also includes: The processing chamber includes a sample chamber and a sputtering chamber, and a gate valve is provided between the sample chamber and the sputtering chamber; A linear conveying mechanism includes a sample carriage that is slidably disposed in a processing chamber, through which samples are conveyed into or out of the processing chamber; The sputtering chamber is equipped with multiple sets of magnetron sputtering target guns, each set of magnetron sputtering target guns is equipped with two independently controlled gas filling pipelines, and the sputtering chamber is equipped with two independently controlled gas filling pipelines. The reversing mechanism, installed on the sample carriage, is used to change the surface of the sample.

2. The linear multi-functional magnetron sputtering coating machine according to claim 1, characterized in that, Guide racks are provided in the sample chamber and between the slide valve and the nearest magnetron sputtering target gun. The bottom of the sample carriage is provided with a transmission gear that matches the guide rack, and the sample carriage is provided with a second drive motor that drives the transmission gear to rotate.

3. The linear multi-functional magnetron sputtering coating machine according to claim 2, characterized in that, A lead screw is rotatably mounted in the sputtering chamber, and a first drive motor for rotating the lead screw is provided outside the sputtering chamber. A clutch adapted to the lead screw is slidably mounted in the sputtering chamber. The clutch can be separated from or connected to the sample carriage. A fourth sensor is provided in the sputtering chamber to detect whether the sample carriage has moved to the end of the lead screw that is close to the first drive motor.

4. The linear multifunctional magnetron sputtering coating machine according to claim 3, characterized in that, The sputtering chamber is equipped with a first sensor and a second sensor. Both the first sensor and the second sensor are used to detect the position of the sample vehicle. When the sample vehicle is detected to enter the sputtering chamber, the gear drive method is changed to the thread drive method. When the sample vehicle is detected to leave the sputtering chamber, the thread drive method is changed to the gear drive method.

5. The linear multi-functional magnetron sputtering coating machine according to claim 1, characterized in that, Both the sample chamber and the sputtering chamber are externally connected to mechanical pumps and molecular pumps, which are used to evacuate the sample chamber and the sputtering chamber.

6. The linear multi-functional magnetron sputtering coating machine according to claim 1, characterized in that, The sample chamber is equipped with a third sensor, and a fourth detection door is provided on the side of the sample chamber away from the sputtering chamber. When the third sensor detects that the sample cart is moving towards the sputtering chamber, it opens the gate valve. When the third sensor detects that the sample cart is moving towards the outside of the sample chamber, it opens the fourth detection door.

7. The linear multi-functional magnetron sputtering coating machine according to claim 3, characterized in that, The number of magnetron sputtering target guns is four sets, and four sets of sensors are sequentially arranged in the sputtering chamber. Each of the four sets of sensors corresponds to a magnetron sputtering target gun. The position of the sample carriage in the sputtering chamber is detected by the sensors and fed back to the first drive motor, which drives the sample carriage to move back and forth.

8. The linear multi-functional magnetron sputtering coating machine according to claim 1, characterized in that, The reversing mechanism includes two movable plates mounted on the sample vehicle. A fixing frame is fixedly installed on the bottom side wall of each of the two movable plates. A right-angle slide is slidably installed on each of the two movable plates. A sliding clamp is slidably installed on the right-angle slide. The sample is held by the two sets of right-angle slides and sliding clamps.

9. The linear multi-functional magnetron sputtering coating machine according to claim 8, characterized in that, The reversing mechanism also includes a slide rod mounted on a right-angle carriage. The movable plate has an installation groove, and the slide rod extends into the installation groove. A gear is slidably sleeved on the slide rod. A reversing rod is provided in the installation groove, and a rack that matches the gear is provided at the top of the reversing rod. When the gear moves to the top of the installation groove, it is displaced from the rack. When the gear moves to the bottom of the installation groove, it is aligned with the rack.

10. The linear multifunctional magnetron sputtering coating machine according to claim 9, characterized in that, The slide rod is equipped with a first adjusting block and a second adjusting block respectively. A first transmission block is fixedly installed on the top wall of the mounting groove, and a second transmission block is fixedly installed on the bottom wall of the mounting groove. A transmission frame is slidably installed in the mounting groove, and both ends of the transmission frame pass through the inner wall of the mounting groove respectively. The transmission frame and the slide rod are rotatably connected, and guide blocks are fixedly installed at both ends of the transmission frame.

11. The linear multi-functional magnetron sputtering coating machine according to claim 10, characterized in that, The movable plate is slidably mounted with a cleaning plate, and a slider is mounted on the cleaning plate. The movable plate has a guide groove adapted to the slider, and the guide groove is arc-shaped.