Magnetic control deformation self-cleaning mechanism and thin film deposition equipment thereof
By utilizing an alternating magnetic field and a permanent magnet rotor vibration design, the magnetically controlled deformation self-cleaning mechanism solves the problem of difficult-to-clean deposits inside bellows, achieving more thorough cleaning and lower operating costs, and improving process quality and efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- PIOTECH (SHANGHAI) CO LTD
- Filing Date
- 2026-04-01
- Publication Date
- 2026-05-29
AI Technical Summary
In existing semiconductor thin film deposition equipment, the deposits on the inner wall of the bellows are difficult to clean, resulting in particulate matter contamination and high operating costs.
It adopts a magnetically controlled deformation self-cleaning mechanism, which uses an alternating magnetic field to act on the ferromagnetic shape memory alloy parts, causing them to undergo slight deformation to remove adhering substances. Combined with the design of permanent magnet rotor vibration and air extraction holes, it thoroughly removes particulate matter.
It reduces the frequency of bellows replacement, reduces particulate matter residue, improves process quality and efficiency, and reduces operating costs.
Smart Images

Figure CN122099009A_ABST