Groove type structure

Abstract

The utility model discloses a groove type structure. The groove type structure comprises a main groove body, an auxiliary groove body, a circulating pipeline and a bubbling pipeline. The circulating pipeline is respectively communicated with the main tank body and the auxiliary tank body; the bubbling pipeline is arranged in the main tank body; the groove type structure further comprises a cold and hot water pipeline, at least part of the cold and hot water pipeline is located above the main groove body and communicated with the main groove body, the cold and hot water pipeline comprises a cold water pipeline and a hot water pipeline, the cold water pipeline and the hot water pipeline are respectively communicated with the main groove body, and the cold water pipeline comprises a coarse cold water supplementing pipe and a fine cold water supplementing pipe which are communicated with the main groove body. And the hot water pipeline comprises a coarse hot water supplementing pipe and a fine hot water supplementing pipe which are communicated with the main tank body. The temperature of the liquid medicine can be controlled by filling cold water and hot water through the cold water pipeline and the hot water pipeline, and the concentration of the liquid medicine can be controlled by accurately controlling the filling amount through the fine cold water supplementing pipe and the fine hot water supplementing pipe, so that the effect of the texturing process is improved.

Description

Technical Field

[0001] The present application relates to the technical field of solar process equipment, and in particular to a trough structure. Background Art

[0002] The texturing process is the first step in the wet process of solar cells. Solar cells are made of silicon wafers. During the texturing process, the chemical solution reacts with the silicon wafer. This can remove the mechanical damage layer, increase the surface area of ​​the silicon wafer, reduce the reflectivity of the silicon wafer surface, and remove oil, metal impurities, etc. The effect of the texturing process is usually judged by the thinning amount and the reflectivity after texturing. The factors affecting the effect of the texturing process mainly include the temperature of the texturing tank, the concentration of the chemical solution, the ratio, the flow rate, the idle speed, etc. The texturing tank of the existing technology cannot well control the temperature and concentration of the chemical solution, resulting in poor effect of the texturing process. Utility Model Content

[0003] In order to solve the deficiencies of the prior art, the purpose of the present application is to provide a groove structure with better texturing process effect.

[0004] To achieve the above objectives, this application adopts the following technical solutions:

[0005] A trough structure is used in a texturing process for single crystal silicon wafers. The trough structure comprises a main trough body, a sub-trough body, a circulation pipeline and a bubbling pipeline. The sub-trough body is arranged around the main trough body, the main trough body and the sub-trough body are connected, and the height of the sub-trough body is greater than that of the main trough body; the circulation pipeline is connected to the main trough body and the sub-trough body respectively; the bubbling pipeline is arranged in the main trough body; the trough structure also comprises hot and cold water pipelines, the hot and cold water pipelines are at least partially located above the main trough body and connected to the main trough body, the hot and cold water pipelines comprise a cold water pipeline and a hot water pipeline, the cold water pipeline and the hot water pipeline are respectively connected to the main trough body, the cold water pipeline comprises a coarse supplementary cold water pipe and a fine supplementary cold water pipe connected to the main trough body, and the hot water pipeline comprises a coarse supplementary hot water pipe and a fine supplementary hot water pipe connected to the main trough body.

[0006] Furthermore, the inner diameter of the coarse supplementary cold water pipe is larger than the inner diameter of the fine supplementary cold water pipe, and the inner diameter of the coarse supplementary hot water pipe is larger than the inner diameter of the fine supplementary hot water pipe.

[0007] Furthermore, the trough structure also includes a waste discharge pipeline, which is at least partially arranged below the trough structure. The waste discharge pipeline includes a main waste discharge pipeline and an auxiliary waste discharge pipeline. One end of the main waste discharge pipeline is connected to the main trough body, and the other end of the main waste discharge pipeline is connected to the outside world. The two ends of the auxiliary waste discharge pipeline are respectively connected to the auxiliary trough body and the main waste discharge pipeline.

[0008] Furthermore, the main tank body includes a main waste discharge port, and the auxiliary tank body includes an auxiliary waste discharge port. The main waste discharge port is connected to the main waste discharge pipeline, and the auxiliary waste discharge port is connected to the auxiliary waste discharge pipeline. The main waste discharge port and the auxiliary waste discharge port are both arranged below the trough structure.

[0009] Furthermore, the main waste discharge outlet includes a left waste discharge outlet and a right waste discharge outlet distributed along the left and right directions of the trough structure, and the waste discharge pipeline includes two main waste discharge pipelines, one of which is connected to the left waste discharge outlet, and the other main waste discharge pipeline is connected to the right waste discharge outlet.

[0010] Furthermore, an overflow groove is provided on the main trough body, defining a reference plane perpendicular to the up and down directions of the trough structure, the lowermost end of the main trough body coincides with the reference plane, the distance between the uppermost end of the overflow groove and the reference plane is the height of the overflow groove, the distance between the uppermost end of the auxiliary trough body and the reference plane is the height of the auxiliary trough body, the height of the overflow groove is smaller than the height of the auxiliary trough body, and an overflow port is provided at the lowermost end of the overflow trough, and the overflow port is located above the main waste discharge port.

[0011] Furthermore, the waste discharge pipeline also includes an overflow pipeline, and the overflow pipeline is at least partially located above the waste discharge pipeline. Both ends of the overflow pipeline are respectively connected to the overflow port and the main waste discharge pipeline.

[0012] Furthermore, the trough structure also includes a hanging trough plate arranged outside the auxiliary trough body and around the auxiliary trough body, and the waste discharge pipeline also includes a hanging trough plate waste discharge pipeline, the hanging trough plate waste discharge pipeline is arranged below the hanging trough plate, and the hanging trough plate waste discharge pipeline is connected to the overflow pipeline.

[0013] Furthermore, the auxiliary tank body includes a float liquid level structure for detecting liquid level information in the tank structure, and the float liquid level structure is distributed along the height direction of the tank structure.

[0014] Furthermore, the trough structure also includes a liquid level display tube, which is connected to the main waste discharge pipeline, defining a reference plane perpendicular to the up and down directions of the trough structure, the lower end of the main trough body coincides with the reference plane, the distance between the upper end of the liquid level display tube and the reference plane is the height of the liquid level display tube, the distance between the upper end of the main trough body and the reference plane is the height of the main trough body, and the height of the liquid level display tube is consistent with the height of the main trough body.

[0015] The above-mentioned trough structure is provided with cold and hot water pipelines, and cold water is added through the cold water pipeline and hot water is added through the hot water pipeline to control the temperature of the medicine solution in the trough structure. The filling amount of cold water and hot water is precisely controlled by the precise replenishment of cold water pipes and precise replenishment of hot water pipes to control the concentration of the medicine solution, thereby improving the texturing process effect of the trough structure. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 A three-dimensional diagram of a trough structure according to an embodiment of the present application;

[0017] Figure 2 A top view of a trough structure according to an embodiment of the present application;

[0018] Figure 3This is a schematic diagram of the structure of the hot and cold water pipelines and the waste pipes according to the implementation mode of the present application;

[0019] Figure 4 This is an internal structure diagram of the main tank body and the auxiliary tank body according to the implementation mode of the present application;

[0020] Figure 5 This is a schematic diagram of the connection between the main tank body and the float liquid level structure according to the implementation scheme of the present application. DETAILED DESCRIPTION

[0021] In order to enable those skilled in the art to better understand the solution of the present application, the technical solution in the specific implementation manner of the present application will be clearly and completely described below in conjunction with the drawings in the implementation manner of the present application.

[0022] like Figure 1 and Figure 2 A trough structure 100 is shown, which is used for the texturing process of single crystal silicon wafers. The trough structure 100 includes a main trough body 11, a sub-trough body 12, a circulation pipeline 14 and a bubbling pipeline 15. In order to clearly explain the technical solution of the present application, the following is also defined: Figure 1 The main tank body 11 is usually set as a square tank structure. The main tank body 11 can be filled with liquid for participating in the reaction, mainly serving as a reaction space for silicon wafers and liquid. The auxiliary tank body 12 is set around the main tank body 11. A tank cover 13 is set on the upper side of the tank structure 100 (refer to Figure 4), the tank cover 13 can prevent foreign matter from entering the main tank body 11 and contaminating the liquid medicine, and can also prevent the liquid medicine from splashing out. A plurality of guide ports 111 are provided on the upper side of the main tank body 11. When the liquid medicine in the main tank body 11 is at a high liquid level, the liquid medicine can flow into the auxiliary tank body 12 through the guide ports 111. The guide ports 111 are inclined from the main tank body 11 to the auxiliary tank body 12, and the opening of the guide ports 111 gradually increases from the main tank body 11 to the auxiliary tank body 12, so that the overflow of the liquid medicine is more uniform. Along the up and down direction of the tank structure 100, an opening is provided below the main tank body 11, and the main tank body 11 and the auxiliary tank body 12 are also connected through the opening. Generally speaking, along the up and down directions of the trough structure 100, the height of the auxiliary trough body 12 is greater than the height of the main trough body 11, so that the auxiliary trough body 12 can provide overflow buffering when the liquid medicine in the main trough body 11 is at a high liquid level state, and the auxiliary trough body 12 can also separate the main trough body 11 and the trough cover 13 to prevent the trough cover 13 from contacting the main trough body 11 and being contaminated by the liquid medicine. The circulation pipeline 14 is connected to the main tank body 11 and the auxiliary tank body 12 respectively. The circulation pipeline 14 is mainly used to circulate the liquid medicine in the tank structure 100 between the main tank body 11 and the auxiliary tank body 12 to maintain the activity and uniformity of the liquid medicine. The circulation pipeline 14 includes a water pump 141 and a heater 142. The water pump 141 can transport the liquid medicine in the auxiliary tank body 12 to the heater 142, and then transport it to the main tank body 11 after heating by the heater 142, so as to realize the circulation of the liquid medicine between the main tank body 11 and the auxiliary tank body 12. In addition, the temperature of the liquid medicine in the main tank body 11 can be increased by the heater 142 to make the temperature of the liquid medicine at a suitable reaction temperature. The bubbling pipeline 15 is at least partially arranged in the main tank body 11. The bubbling pipeline 15 includes a plurality of bubbling tubes 151 arranged at the bottom of the main tank body 11. The bubbling tubes 151 are provided with air outlets. By injecting gas into the bubbling tubes 151, the gas flows out from the air outlets to form bubbles, thereby making the drug solution in the main tank body 11 more uniform and making the contact between the drug solution and the silicon wafer more sufficient.

[0023] like Figure 3As shown, as an implementation method, the trough structure 100 also includes a hot and cold water pipeline 16, which is at least partially located above the main trough body 11 and connected to the main trough body 11. The hot and cold water pipeline 16 includes a cold water pipeline 161 and a hot water pipeline 162, both of which are connected to the main trough body 11. The cold water pipeline 161 can add cold water into the main trough body 11 to reduce the temperature of the main trough body 11; the hot water pipeline 162 can add hot water into the main trough body 11, so that the temperature of the liquid medicine can be increased again on the basis of the liquid medicine being heated by the heater 142. In the above configuration, the temperature of the liquid medicine in the main trough body 11 can be adjusted by adding cold water and hot water through the hot and cold water pipeline 16 to prevent the liquid medicine temperature from being too high or too low to affect the texturing effect of the silicon wafer. In addition, the concentration of the chemical solution in the main tank 11 can be controlled by adding water to reduce the concentration of the chemical solution, thereby preventing the chemical solution from reacting too quickly with the silicon wafer due to the high concentration of the chemical solution, thereby avoiding a decrease in the texturing effect due to the high concentration of the chemical solution.

[0024] Furthermore, the cold water pipeline 161 includes a coarse replenishing cold water pipe 1611 and a fine replenishing cold water pipe 1612, and the hot water pipeline 162 includes a coarse replenishing hot water pipe 1621 and a fine replenishing hot water pipe 1622. The coarse replenishing cold water pipe 1611 and the fine replenishing cold water pipe 1612 are both connected to the main tank body 11, and the coarse replenishing hot water pipe 1621 and the fine replenishing hot water pipe 1622 are also connected to the main tank body 11. It can be understood that the concentration of the medicine can be controlled by controlling the flow rate of the cold and hot water pipelines 16 added to the main tank body 11. Specifically, the inner diameter of the coarse supplementary cold water pipe 1611 is larger than the inner diameter of the fine supplementary cold water pipe 1612, and the inner diameter of the coarse supplementary hot water pipe 1621 is larger than the inner diameter of the fine supplementary hot water pipe 1622, so that the coarse supplementary cold water pipe 1611 and the coarse supplementary hot water pipe 1621 can increase the flow rate of cold water or hot water injected into the main tank body 11, and the fine supplementary cold water pipe 1612 and the fine supplementary hot water pipe 1622 can accurately control the amount of cold water or hot water added into the main tank body 11. Through the above arrangement, the coarse supplementary cold water pipe 1611 and the coarse supplementary hot water pipe 1621 can improve the water injection efficiency of the cold water pipeline 161 and the hot water pipeline 162, and the fine supplementary cold water pipe 1612 and the fine supplementary hot water pipe 1622 can improve the precise control of the water injection amount of the cold water pipeline 161 and the hot water pipeline 162, so as to achieve precise control of the concentration of the drug solution in the main tank body 11, and further improve the texturing effect of the silicon wafer. In addition, the concentration of the drug solution in the main tank body 11 can also be monitored by providing a concentration meter in the main tank body 11 to accurately control the concentration of the drug solution in the main tank body 11 .

[0025] Optionally, the coarse replenishment cold water pipe 1611 and the fine replenishment cold water pipe 1612 can be converged into the same pipeline and connected to the main tank body 11, thereby reducing the number of connection points between the cold and hot water pipelines 16 and the main tank body 11 and reducing the pipeline layout. Similarly, the coarse replenishment hot water pipe 1621 and the fine replenishment hot water pipe 1622 can also be connected into one pipeline and then connected to the main tank body 11; the coarse replenishment cold water pipe 1611 and the fine replenishment cold water pipe 1612 can also be connected to the main tank body 11 through independent pipelines respectively, so that the flow rates of the coarse replenishment cold water pipe 1611 and the fine replenishment cold water pipe 1612 do not affect each other, thereby improving the water injection efficiency of the cold and hot water pipelines 16. Similarly, the coarse replenishment hot water pipe 1621 and the fine replenishment hot water pipe 1622 can also be connected to the main tank body 11 through independent pipelines respectively.

[0026] like Figure 3 and Figure 4 As shown, the trough structure 100 further includes a waste discharge pipeline 17, which is used to discharge the waste liquid after the reaction in the main trough body 11 and the auxiliary trough body 12. Specifically, the waste discharge pipeline 17 is at least partially arranged below the main trough body 11, and the waste discharge pipeline 17 is arranged at the front side of the trough structure 100, combined with Figure 5 As shown, along the front-to-back direction of the trough structure 100, the bottoms of the main trough body 11 and the auxiliary trough body 12 are inclined forward, so as to facilitate the discharge of waste liquid from the waste discharge pipeline 17. More specifically, the waste discharge pipeline 17 includes a main waste discharge pipeline 171 and an auxiliary waste discharge pipeline 172, one end of the main waste discharge pipeline 171 is connected to the main trough body 11, and the other end of the main waste discharge pipeline 171 is connected to the outside, and the two ends of the auxiliary waste discharge pipeline 172 are respectively connected to the auxiliary trough body 12 and the main waste discharge pipeline 171, so that the waste liquid in the auxiliary trough body 12 is transported to the main waste discharge pipeline 171 through the auxiliary waste discharge pipeline 172 and then discharged. Further, the main tank body 11 includes a main waste outlet 112, and the auxiliary tank body 12 includes an auxiliary waste outlet 121. The main waste outlet 112 and the auxiliary waste outlet 121 are both arranged below the tank structure 100, wherein the main waste outlet 112 is arranged below the main tank body 11, and the auxiliary waste outlet 121 is arranged below the auxiliary tank body 12. The main waste outlet 112 is connected to the main waste outlet pipeline 171, and the auxiliary waste outlet 121 is connected to the auxiliary waste outlet pipeline 172. Further, the main waste outlet 112 includes a left waste outlet 1121 and a right waste outlet 1122 distributed along the left and right directions of the tank structure 100, and the main waste outlet pipeline 171 is arranged in two, and one end of the two main waste outlet pipelines 171 is respectively connected to the left waste outlet 1121 and the right waste outlet 1122. Through the above arrangement, the two pipelines can expand the flow of the waste outlet pipeline 17, thereby improving the waste discharge efficiency of the waste outlet pipeline 17.

[0027] like Figure 2 and Figure 3As shown, the trough structure 100 further includes a trough plate 18 disposed outside the auxiliary trough body 12 and disposed around the auxiliary trough body 12, and the waste discharge pipeline 17 further includes a trough plate waste discharge pipeline 174, which is disposed below the trough plate 18, and the trough plate waste discharge pipeline 174 is connected to the overflow pipeline 173. Specifically, the trough plate 18 is provided with a groove 181 disposed around the auxiliary trough body 12, and the upper end of the trough plate waste discharge pipeline 174 is provided with a trough plate waste discharge port 1741, and the groove 181 is connected to the trough plate waste discharge port 1741. Through the above arrangement, when the reaction between the silicon wafer and the drug solution is completed, the silicon wafer needs to be taken out from the trough structure 100 by a robot. During the process of taking out the silicon wafer, the hanging trough plate 18 can collect the drug solution dripping on the silicon wafer. After the drug solution gathers in the groove 181, it flows into the hanging trough plate waste outlet 1741, and is transported to the main waste outlet 171 through the hanging trough plate waste outlet pipeline 174 and then discharged, thereby preventing the drug solution from dripping during the process of taking out the silicon wafer and causing corrosion to the surrounding equipment.

[0028] like Figure 3 As shown, the trough structure 100 also includes a liquid level display tube 19, which is connected to the main waste discharge pipeline 171, defining a reference plane 101 perpendicular to the up and down direction of the trough structure 100, the lowermost end of the main tank body 11 is located on the reference plane 101, the distance between the uppermost end of the liquid level display tube 19 and the reference plane 101 is the height of the liquid level display tube 19, the distance between the uppermost end of the main tank body 11 and the reference plane 101 is the height of the main tank body 11, and the height of the liquid level display tube 19 is consistent with the height of the main tank body 11, so that the liquid level display tube 19 can reflect the current liquid level in the main tank body 11 through the principle of the communicating vessel. Through the above settings, when the staff knows through the liquid level display tube 19 that the liquid level in the trough structure 100 is too high, the liquid can be discharged through the waste discharge pipeline 17 to prevent the liquid level from overflowing from the trough structure 100 due to the high liquid level; when the liquid level display tube 19 shows that the liquid level in the trough structure 100 is too low, the staff can also replenish the liquid in time. In addition, the liquid level display tube 19 is connected to the main waste discharge pipeline 171 so that the liquid in the liquid level display tube 19 can also be discharged.

[0029] like Figure 4As shown, the main tank body 11 is provided with an overflow tank 113, the distance between the uppermost end of the overflow tank 113 and the reference plane 101 is defined as the height of the overflow tank 113, the distance between the uppermost end of the auxiliary tank body 12 and the reference plane 101 is defined as the height of the auxiliary tank body 12, and the height of the overflow tank 113 is less than the height of the auxiliary tank body 12. Specifically, the overflow tank 113 is provided with an overflow port 1131 at the lowermost end, and the overflow port 1131 is located above the main waste discharge port 112, and the waste discharge pipeline 17 further includes an overflow pipeline 173, and the overflow pipeline 173 is at least partially located above the waste discharge pipeline 17, and the two ends of the overflow pipeline 173 are respectively connected to the overflow port 1131 and the main waste discharge pipeline 171. Through the above arrangement, when the liquid level in the main tank body 11 is too high, the liquid medicine can enter the overflow tank 113 and then enter the overflow pipe 173 through the overflow port 1131, and be discharged through the main waste pipe 171, thereby preventing the liquid medicine from overflowing from the tank structure 100.

[0030] like Figure 5 As shown, a float liquid level structure 21 for detecting the change of the liquid level in the tank structure 100 is provided on one side of the auxiliary tank body 12, and at least a part of the float liquid level structure 21 is located in the auxiliary tank body 12 to detect the liquid level information. It can be understood that since the main tank body 11 and the auxiliary tank body 12 are connected, the liquid level in the auxiliary tank body 12 is consistent with the liquid level in the main tank body 11, so measuring the liquid level height in the auxiliary tank body 12 can also reflect the liquid level height in the main tank body 11. Specifically, one end of the float liquid level structure 21 is at least partially disposed in the auxiliary tank body 12, and the other end of the float liquid level structure 21 is connected to the liquid level display device 200. When the liquid level in the auxiliary tank body 12 triggers the float liquid level structure 21, the float liquid level structure 21 can send a signal to the liquid level display device 200, and display the current liquid level information on the liquid level display device 200. Further, when the float liquid level structure 21 is set to at least two, the float liquid level structure 21 is distributed along the height direction of the trough structure 100, and when the liquid level in the auxiliary tank body 12 triggers the float liquid level structure 21 located on the upper side and the lower side respectively, the liquid level display device 200 can display high liquid level and low liquid level information accordingly. It can be understood that multiple float liquid level structures 21 can also be set to display more accurate liquid level information. Through the above settings, the staff can remotely monitor the liquid level information in the trough structure 100 through the liquid level display device 200, and the float liquid level structure 21 can cooperate with the liquid level display tube 19 to provide the staff with accurate information on the liquid level in the trough structure 100, thereby avoiding the liquid level of the medicine in the main tank body 11 from overflowing due to excessive high level, or avoiding the liquid level from being too low so that the water pump 141 of the circulation pipeline 14 is dry-drawn and causes damage to the water pump 141. In the present application, the float liquid level structure 21 can be set as a float liquid level switch.

[0031] In summary, the trough structure 100 of the present application is equipped with hot and cold water pipelines 16 and waste pipes 17, so that the temperature and concentration of the medicinal solution in the trough structure 100 can be controlled by the hot and cold water pipelines 16, and the waste liquid after the reaction can be discharged in time through the waste pipe 17, thereby improving the texturing process effect of the trough structure 100.

[0032] It should be understood that those skilled in the art can make improvements or changes based on the above description, and all these improvements and changes should fall within the scope of protection of the claims attached to this application.

Claims

1. A trough structure for use in a monocrystalline silicon wafer texturing process, the trough structure comprising: Main tank; A secondary tank body, the secondary tank body is arranged around the main tank body, and the main tank body and the secondary tank body are connected; A circulation pipeline, wherein the circulation pipeline is connected to the main tank body and the auxiliary tank body respectively; A bubbling pipeline, wherein the bubbling pipeline is arranged in the main tank body; It is characterized in that The trough structure also includes hot and cold water pipelines, which are at least partially located above the main trough body and connected to the main trough body. The hot and cold water pipelines include a cold water pipeline and a hot water pipeline, which are respectively connected to the main trough body. The cold water pipeline includes a coarse supplementary cold water pipe and a fine supplementary cold water pipe connected to the main trough body, and the hot water pipeline includes a coarse supplementary hot water pipe and a fine supplementary hot water pipe connected to the main trough body.

2. The trough structure according to claim 1, characterized in that: The inner diameter of the coarse supplementary cold water pipe is larger than the inner diameter of the fine supplementary cold water pipe, and the inner diameter of the coarse supplementary hot water pipe is larger than the inner diameter of the fine supplementary hot water pipe.

3. The trough structure according to claim 1, characterized in that: The trough structure also includes a waste discharge pipeline, which is at least partially arranged below the trough structure. The waste discharge pipeline includes a main waste discharge pipeline and an auxiliary waste discharge pipeline. One end of the main waste discharge pipeline is connected to the main trough body, and the other end of the main waste discharge pipeline is connected to the outside world. Both ends of the auxiliary waste discharge pipeline are respectively connected to the auxiliary trough body and the main waste discharge pipeline.

4. The trough structure according to claim 3, characterized in that: The main tank body includes a main waste discharge port, and the auxiliary tank body includes an auxiliary waste discharge port. The main waste discharge port is connected to the main waste discharge pipeline, and the auxiliary waste discharge port is connected to the auxiliary waste discharge pipeline. The main waste discharge port and the auxiliary waste discharge port are both arranged below the tank structure.

5. The trough structure according to claim 4, characterized in that: The main waste discharge outlet includes a left waste discharge outlet and a right waste discharge outlet distributed along the left and right directions of the trough structure, and the waste discharge pipeline includes two main waste discharge pipelines, one of which is connected to the left waste discharge outlet, and the other main waste discharge pipeline is connected to the right waste discharge outlet.

6. The trough structure according to claim 4, characterized in that: An overflow groove is arranged on the main trough body, defining a reference plane perpendicular to the up and down directions of the trough structure, the lowermost end of the main trough body coincides with the reference plane, the distance between the uppermost end of the overflow groove and the reference plane is the height of the overflow groove, the distance between the uppermost end of the auxiliary trough body and the reference plane is the height of the auxiliary trough body, the height of the overflow groove is smaller than the height of the auxiliary trough body, and an overflow port is arranged at the lowermost end of the overflow trough, and the overflow port is located above the main waste discharge port.

7. The trough structure according to claim 6, characterized in that: The waste discharge pipeline further includes an overflow pipeline, wherein the overflow pipeline is at least partially located above the waste discharge pipeline, and two ends of the overflow pipeline are respectively connected to the overflow port and the main waste discharge pipeline.

8. The trough structure according to claim 7, characterized in that: The trough structure also includes a hanging trough plate arranged outside the auxiliary trough body and around the auxiliary trough body, and the waste discharge pipeline also includes a hanging trough plate waste discharge pipeline, and the hanging trough plate waste discharge pipeline is arranged below the hanging trough plate, and the hanging trough plate waste discharge pipeline is connected to the overflow pipeline.

9. The trough structure according to claim 7, characterized in that: The trough structure also includes a liquid level display tube, which is connected to the main exhaust pipe, defining a reference plane perpendicular to the up and down directions of the trough structure, the lowermost end of the main trough body coincides with the reference plane, the distance between the uppermost end of the liquid level display tube and the reference plane is the height of the liquid level display tube, the distance between the uppermost end of the main trough body and the reference plane is the height of the main trough body, and the height of the liquid level display tube is consistent with the height of the main trough body.

10. The trough structure according to claim 1, characterized in that: The auxiliary tank body includes a float liquid level structure for detecting liquid level information in the tank structure. At least part of the float liquid level structure is located in the auxiliary tank body. When the float liquid level structure is set to at least two, the float liquid level structures are distributed along the height direction of the tank structure.

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