Vacuum breaking device for heterojunction magnetron sputtering equipment

Abstract

The utility model discloses a vacuum breaking device for heterojunction magnetron sputtering equipment. The vacuum breaking device comprises a vacuum breaking pipeline connected into a magnetron sputtering vacuum cavity, the end, not connected into the cavity, of the air breaking pipeline is connected with an air breaking tank, the air breaking tank comprises an air inlet and an air outlet, and the air inlet of the air breaking tank is connected with a CDA air supply pipeline; an air outlet of the air breaking tank is connected with a first valve for controlling the air outlet speed of the air tank; and an air inlet of the air breaking tank is connected with a second valve for controlling the air inlet speed of the air tank. According to the device, the CDA air supply and the air tank are used for breaking air, so that the air breaking speed can be increased, the cleanness in the working chamber can be ensured, the influence of the air breaking process on the pressure in the whole CDA air supply pipeline can be avoided, false alarms are reduced, the efficient and stable operation of work is ensured, and the equipment utilization rate is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of battery production, in particular to a space-breaking device for heterojunction magnetron sputtering equipment. Background Art

[0002] The statements in this section merely provide background information related to the present disclosure and may not constitute prior art.

[0003] In the production process of silicon-based heterojunction solar cells, thin films are generally deposited on silicon wafers using vapor deposition equipment such as tubular PECVD deposition equipment or tubular HWCVD deposition equipment. During the operation of the vapor deposition equipment, the working chamber of the vapor deposition equipment needs to be adjusted to a vacuum state to assist in the coating work. When the coating is completed, the vacuum state in the working chamber needs to be released before the cell can be transported and the next operation can be carried out; therefore, the working chamber needs to be filled with air to release the vacuum state of the working chamber. This process is called breaking the vacuum.

[0004] Direct use of the atmosphere has low costs, and it is easy to remove the vacuum state by introducing the atmosphere. However, due to the very high dust prevention requirements in the production process of silicon wafer batteries, the dust in the atmosphere is often filtered by installing filter elements in the current production process, but the replacement frequency of the filter elements will increase with the increase of the air-breaking time. Even in a dust-free workshop, fine matter in the environment will still follow the atmosphere into the working chamber, causing certain pollution to the environment in the working chamber, thereby affecting the yield of the product. In addition, due to the constant atmospheric pressure, the time beat of using atmospheric air-breaking is long and difficult to control.

[0005] Compared with atmospheric air breakers, CDA air breakers have higher adjustability, and the gas used is treated clean gas with a higher degree of cleanliness. However, there is a problem of pipeline pressure fluctuation during CDA air breakers. When the pressure fluctuation in the pipeline is too large, the pressure of the entire CDA line is affected, which can easily lead to false alarms of equipment failures, thus affecting the entire production process. Utility Model Content

[0006] The purpose of the utility model is to provide a piercing device for heterojunction magnetron sputtering equipment to address the problem of large pressure fluctuations in the current CDA piercing pipeline. While ensuring the cleanliness of the environment in the working chamber, it can control the pressure fluctuations of the entire pipeline, avoid false alarms of equipment failures, and ensure stable production.

[0007] The technical solution of the utility model is as follows:

[0008] A vacuum breaking device for heterojunction magnetron sputtering equipment, comprising a vacuum breaking pipeline connected to a magnetron sputtering vacuum chamber;

[0009] The end of the air-breaking pipeline that is not connected to the cavity is connected to the air-breaking tank, and the air inlet of the air-breaking tank is connected to the CDA air supply pipeline;

[0010] The air outlet of the air-breaking tank is connected to a first valve for controlling the air outlet speed of the gas tank;

[0011] The air inlet of the air tank is connected to a second valve for controlling the air intake speed of the air tank.

[0012] Access to the gas tank can pre-store a certain amount of gas in the gas tank, and then when performing the air-breaking operation, it can avoid fluctuations in the pressure of the entire CDA gas supply pipeline by releasing only the gas stored in the gas tank, thereby maintaining a stable pressure in the CDA gas supply pipeline.

[0013] Preferably, the end of the air-breaking pipeline not connected to the cavity is also connected to an atmospheric air-breaking pipeline, so that the device can flexibly switch between atmospheric air-breaking and CDA gas tank air-breaking as needed.

[0014] According to a preferred embodiment, the air-breaking pipeline is connected to the air outlet of the air-breaking tank, and the first valve is arranged between the air-breaking pipeline and the air-breaking tank to control the speed at which the air-breaking tank transports gas into the air-breaking pipeline.

[0015] According to a preferred embodiment, the air pipes at both ends of the pressure reducing valve are respectively connected to the pipeline of the air outlet of the air-breaking tank and the pipeline at one end of the air-breaking pipeline that is not connected to the cavity through flanges.

[0016] According to a preferred embodiment, the second valve is disposed between the air inlet of the gas tank and the CDA gas supply pipeline, and is used to control the gas supply speed of the CDA gas supply pipeline to the gas tank.

[0017] According to a preferred embodiment, a muffler is provided on the second valve.

[0018] According to a preferred embodiment, the first valve and the second valve are provided with a pressure regulating valve, a pressure gauge and a pressure reducing valve.

[0019] With the help of the setting of the first valve, the staff can flexibly control the first valve according to the actual needs of the working chamber during work, control the air breaking speed of the working chamber, and avoid the excessive gas flow rate affecting the quality of the battery cells; with the help of the second valve, the air intake speed of the air breaking tank can be controlled according to the actual pressure in the CDA pipeline, thereby avoiding the CDA pipeline from affecting the pressure of the entire pipeline when transporting gas to the air breaking tank.

[0020] According to a preferred embodiment, the volume of the air-breaking tank is 1m 3 .

[0021] According to a preferred embodiment, the air-breaking tank further includes a tank body, a safety valve arranged on the top of the tank body, and a sewage outlet arranged on the bottom of the tank body.

[0022] According to a preferred embodiment, the air-breaking tank is arranged outside the working chamber of the magnetron sputtering.

[0023] According to a preferred embodiment, the air-breaking tank is also provided with a support base for stabilizing the tank body.

[0024] Compared with the existing technology, the beneficial effects of the utility model are:

[0025] 1. A device for breaking air in heterojunction magnetron sputtering equipment, which has a simple structure, is easy to maintain, and has low cost. The use of the device will not increase the cost of overall cell production;

[0026] 2. A gas-breaking device for heterojunction magnetron sputtering equipment improves work efficiency. It can increase the pressure in the gas-breaking air tank to speed up the gas flow into the working chamber, speed up the gas-breaking speed, and reduce the waiting time for gas-breaking. It also avoids false alarms and maintenance during the gas-breaking process, ensures the continuous and stable progress of the work process, and improves work efficiency.

[0027] 3. A gas-breaking device for heterojunction magnetron sputtering equipment improves product yield. It uses clean dry gas to input into the working chamber for gas-breaking, which can keep the working chamber clean, prevent pollutants in the atmosphere from entering the working chamber to affect product quality, and improve product yield. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 It is a schematic diagram of the overall structure and connection of a space-breaking device for heterojunction magnetron sputtering equipment;

[0029] Figure 2 It is an enlarged schematic diagram of a second valve of a space-breaking device used in a heterojunction magnetron sputtering device;

[0030] Figure 3 It is an enlarged schematic diagram of a first valve of a space-breaking device used in a heterojunction magnetron sputtering device;

[0031] Figure 4 This is an enlarged schematic diagram of an air-breaking tank of an air-breaking device used in a heterojunction magnetron sputtering device.

[0032] Figure numerals: 1-muffler, 2-pressure regulating valve, 3-pressure gauge, 4-pressure reducing valve, 5-flange, 6-trachea, 7-safety valve, 8-air outlet, 9-reinforcement ring, 10-support seat, 11-drain outlet, 13-tank body, 14-air inlet, 15-air breaker tank, 16-first valve, 17-second valve, 18-air breaker pipeline. DETAILED DESCRIPTION

[0033] It should be noted that relational terms such as "first" and "second" are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0034] The features and performance of the present invention are further described in detail below in conjunction with the embodiments.

[0035] Example 1

[0036] See also Figure 1-4 .

[0037] like Figure 1 and Figure 4 As shown, a rupture device for heterojunction magnetron sputtering equipment includes a rupture pipeline 18 connected to the magnetron sputtering vacuum chamber; the end of the rupture pipeline 18 not connected to the chamber is connected to the rupture air tank 15, and the air inlet 14 of the rupture air tank 15 is connected to the CDA gas supply pipeline, and the CDA gas can be input into the rupture air tank 15 through the gas supply pipeline for temporary storage. The air outlet 8 of the rupture air tank 15 is connected to a first valve 16 for controlling the air outlet speed of the gas tank; the air inlet 14 of the rupture air tank 15 is connected to a second valve 17 for controlling the air intake speed of the gas tank.

[0038] The air-breaking tank can store a certain amount of gas in advance, and when performing the air-breaking operation, it can avoid fluctuations in the pressure of the entire CDA air supply pipeline by only releasing the gas stored in the air-breaking tank, thereby maintaining the pressure of the CDA air supply pipeline stable; and the pressure in the air-breaking tank 15 can be further increased relative to the atmospheric pressure, thereby accelerating the air-breaking speed and shortening the air-breaking time; for example, 1m 3The air-breaking tank 15 can maintain the pressure in the tank body 13 at about 1.5 bar, thereby effectively reducing the time required for air breaking. The original air-breaking time required for the atmospheric air-breaking inlet / outlet chamber was 14.7S / 19s respectively. After using the device of the present application, the air-breaking time required for the inlet / outlet chamber is reduced to 3.8s / 7.9S respectively, thereby improving the overall utilization rate of the equipment and greatly enhancing the equipment's production capacity.

[0039] The structure of the present application does not require changes to the original structure of the equipment, and gas cylinders sold on the market can be used, which are easy to place and can solve work difficulties with only a relatively low cost.

[0040] According to a preferred embodiment, the air-breaking pipeline 18 is connected to the air outlet 8 of the air-breaking tank 15, and the first valve 16 is arranged between the air-breaking pipeline 18 and the air-breaking tank 15, and is used to control the speed at which the air-breaking tank 15 transports gas into the working chamber, that is, the air-breaking speed, and then flexibly adjust it according to actual needs.

[0041] Preferably, the end of the blasting pipeline 18 not connected to the cavity is also connected to an atmospheric blasting pipeline, so that the device can flexibly switch between atmospheric blasting and CDA gas tank blasting as needed.

[0042] According to a preferred embodiment, the air pipes 6 at both ends of the pressure reducing valve 4 are respectively connected to the pipeline of the air outlet 8 of the air-breaking tank 15 and the pipeline at one end of the air-breaking pipeline 18 not connected to the cavity through flanges 5.

[0043] According to a preferred embodiment, the second valve 17 is disposed between the air inlet 14 of the gas tank and the CDA gas supply pipeline, and is used to control the gas supply speed of the CDA gas supply pipeline to the gas tank.

[0044] According to a preferred embodiment, a silencer 1 is provided on the second valve 17 .

[0045] like Figure 2 and Figure 3 As shown, the first valve 16 and the second valve 17 are respectively provided with a pressure regulating valve 2, a pressure gauge 3 and a pressure reducing valve 4.

[0046] With the help of the setting of the first valve 16, the staff can flexibly control the first valve 16 according to the actual needs of the working chamber during work, control the air-breaking speed of the working chamber, speed up the air-breaking process, and avoid the impact of excessive gas flow rate on the quality of the battery cells; with the help of the second valve 17, the air intake speed of the air-breaking tank 15 can be controlled according to the actual pressure in the CDA pipeline, thereby avoiding the impact of the CDA pipeline on the pressure of the entire pipeline when transporting gas to the air-breaking tank 15.

[0047] According to a preferred embodiment, the volume of the air-breaking tank 15 is 1m 3 .

[0048] like Figure 4 As shown, the air-breaking tank 15 also includes a tank body 13, a safety valve 7 arranged on the top of the tank body 13, a sewage outlet 11 arranged on the bottom of the tank body 13, and a reinforcement ring 9 arranged on the tank body.

[0049] According to a preferred embodiment, the air-breaking tank 15 is arranged outside the magnetron sputtering working chamber.

[0050] According to a preferred embodiment, the air-breaking tank 15 is further provided with a support seat 10 for stabilizing the tank body 13 .

[0051] The above-mentioned embodiments only express the specific implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the protection scope of the present application. It should be pointed out that, for ordinary technicians in this field, several variations and improvements can be made without departing from the technical solution concept of the present application, and these all belong to the protection scope of the present application.

Claims

1. A space-breaking device for heterojunction magnetron sputtering equipment, characterized in that: It includes a vacuum-breaking pipeline (18) connected to a magnetron sputtering vacuum chamber; The end of the air-breaking pipeline (18) not connected to the cavity is connected to the air-breaking tank (15), the air-breaking tank (15) comprises an air inlet (14) and an air outlet (8), and the air inlet (14) of the air-breaking tank (15) is connected to the CDA air supply pipeline; The air outlet (8) of the air-breaking tank (15) is connected to a first valve (16) for controlling the air outlet speed of the tank; The air inlet (14) of the air-breaking tank (15) is connected to a second valve (17) for controlling the air intake speed of the tank.

2. The air-breaking device for heterojunction magnetron sputtering equipment according to claim 1, characterized in that: The air-breaking pipeline (18) is connected to the air outlet (8) of the air-breaking tank (15), and the first valve (16) is arranged between the air-breaking pipeline (18) and the air-breaking tank (15) to control the speed at which the air-breaking tank (15) transports gas into the air-breaking pipeline (18).

3. The air-breaking device for heterojunction magnetron sputtering equipment according to claim 2, characterized in that: The air pipes (6) at both ends of the first valve (16) are respectively connected to the pipeline of the air outlet (8) of the air-breaking tank (15) and the pipeline at one end of the air-breaking pipeline (18) not connected to the cavity through flanges (5).

4. The air-breaking device for heterojunction magnetron sputtering equipment according to claim 2, characterized in that: The second valve (17) is arranged between the air inlet (14) of the gas tank and the CDA gas supply pipeline, and is used to control the gas supply speed of the CDA gas supply pipeline to the gas tank.

5. The air-breaking device for heterojunction magnetron sputtering equipment according to claim 4, characterized in that: The second valve (17) is provided with a silencer (1).

6. The air-breaking device for heterojunction magnetron sputtering equipment according to claim 1, characterized in that: The first valve (16) and the second valve (17) are respectively provided with a pressure regulating valve (2), a pressure gauge (3) and a pressure reducing valve (4).

7. The air-breaking device for heterojunction magnetron sputtering equipment according to claim 1, characterized in that: The volume of the air-breaking tank (15) is 1m 3 .

8. The air-breaking device for heterojunction magnetron sputtering equipment according to claim 1, characterized in that: The air-breaking tank (15) further comprises a tank body (13), a safety valve (7) arranged at the top of the tank body (13), and a sewage outlet (11) arranged at the bottom of the tank body (13).

9. The air-breaking device for heterojunction magnetron sputtering equipment according to claim 1, characterized in that: The air-breaking tank (15) is arranged outside the working chamber of the magnetron sputtering.

10. The air-breaking device for heterojunction magnetron sputtering equipment according to claim 8, characterized in that: The air-breaking tank (15) is also provided with a support seat (10) for stabilizing the tank body (13).

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