Silicon wafer detection clamp

By introducing rotation and support mechanisms into the silicon wafer detection fixture, the problem of low detection efficiency of silicon wafers in the prior art is solved, rapid rotation and stable support of silicon wafers are achieved, and detection efficiency and stability are improved.

CN222190695UActive Publication Date: 2024-12-17上海磐盟电子材料有限公司
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Patent Information

Application Number
CN202420504068.2
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-03-15
Publication Date
2024-12-17
Estimated Expiration
2034-03-15

AI Technical Summary

Technical Problem

The existing silicon wafer detection fixture needs to be removed and turned over when observing the back of the silicon wafer, which is cumbersome and reduces the detection efficiency.

Method used

A silicon wafer detection fixture including a rotating mechanism and a support mechanism is designed. The rotating mechanism can easily rotate the silicon wafer. The support mechanism increases the stability of the silicon wafer, allowing staff to remove the silicon wafer without removing the silicon wafer. The other side can be detected.

Benefits of technology

It achieves rapid rotation and stable support for silicon wafers, improves detection efficiency and stability, and simplifies the operation process.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a silicon wafer detection clamp, and particularly relates to the technical field of silicon wafer detection clamps, which comprises a workbench, a silicon wafer is arranged at the top of the workbench, a rotating mechanism for driving the silicon wafer to rotate is arranged at the top of the workbench, and the rotating mechanism comprises two placing frames arranged at the top of the workbench. The two placement frames are located on the two sides of a silicon wafer respectively, supporting plates are fixedly arranged on the two sides of the top of the workbench, a first handle is fixedly arranged at the end, extending out of one side of each supporting plate, of the rotating shaft, and a supporting mechanism for supporting the silicon wafer is arranged on the top of the workbench. According to the utility model, the silicon wafer can be rotated through the rotating mechanism, the other side of the silicon wafer can be conveniently detected by a worker, the silicon wafer can be supported through the supporting mechanism, and the stability of the silicon wafer is improved.
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Description

Technical Field

[0001] The utility model relates to the technical field of silicon wafer detection fixtures, in particular to a silicon wafer detection fixture. Background Art

[0002] Silicon wafers are purified silicon elements, and these pure silicon are made into long silicon crystal rods, which become the material for quartz semiconductors for manufacturing integrated circuits. After processes such as photolithography, grinding, polishing, and slicing, polycrystalline silicon is melted and pulled out into single-crystal silicon crystal rods, which are then cut into thin wafers. We will hear about wafer factories of several inches. If the diameter of the silicon wafer is larger, it means that the wafer factory has better technology. In addition, there is technology that can reduce the size of transistors and wires. These two methods can produce more silicon grains on a wafer, improve quality and reduce costs. The larger the size of the wafer, the higher its production capacity. Of course, in the process of producing wafers, the yield rate is a very important condition.

[0003] For example, a silicon wafer detection fixture provided in the Chinese patent application with application number 201920332262.6 includes a base, a telescopic rod is fixedly connected to the upper end of the base, a fixed plate is fixedly connected to the upper end of the telescopic rod, a chamber is provided in the fixed plate, an opening is provided on the top surface of the chamber, a moving part is provided in the chamber, the moving part is arranged through the opening, and a clamping part is provided on one end of the moving part outside the chamber. This technical solution can effectively clamp and fix the silicon wafer body through the spring telescopic rod and the clamping block, and can provide certain buffering protection for the silicon wafer body. By turning the knob, the two movable blocks are driven to move relative to each other, and the clamping part is driven to clamp and fix silicon wafer bodies of different sizes. The operation is convenient and practical.

[0004] However, the following problems still exist in this technical solution: if it is necessary to observe the back side of the silicon wafer in this technical solution, the silicon wafer needs to be removed from the clamp, turned over, and then fixed by the clamp. This operation process is too cumbersome and wastes time, which reduces the inspection efficiency of the silicon wafer. Utility Model Content

[0005] The purpose of the utility model is to provide a silicon wafer inspection fixture, which can rotate the silicon wafer through a rotating mechanism to facilitate staff to inspect the other side of the silicon wafer, and can also support the silicon wafer through a supporting mechanism to increase the stability of the silicon wafer, so as to solve the above-mentioned deficiencies in the technology.

[0006] In order to achieve the above-mentioned purpose, the utility model provides the following technical solutions: a silicon wafer detection fixture, comprising a workbench, a silicon wafer is arranged on the top of the workbench, and a rotating mechanism for driving the silicon wafer to rotate is arranged on the top of the workbench.

[0007] Preferably, the rotating mechanism includes two placing racks arranged on the top of the workbench, the two placing racks are respectively located on both sides of the silicon wafer, support plates are fixedly provided on both sides of the top of the workbench, a rotating shaft is fixedly provided on one side of the placing rack close to the support plate, an end of the rotating shaft close to the support plate penetrates the support plate and extends out of one side of the support plate, the support plate and the rotating shaft are movably connected through a bearing, and a first handle is fixedly provided on one end of the rotating shaft extending out of one side of the support plate, which is used to drive the silicon wafer to rotate.

[0008] Preferably, a limit plate is passed through one end of the rotating shaft extending from one side of the support plate, and second mounting holes are provided at the top and bottom of the support plate near the limit plate, and a first mounting hole is provided at the bottom of the limit plate. The second mounting hole and the first mounting hole are connected to each other and the same plug rod is inserted inside for fixing the rotating shaft.

[0009] Preferably, a fixing mechanism for fixing the silicon wafer is provided on the top of the workbench, and the fixing mechanism includes a placement groove opened inside the placement rack, a fixing plate is provided inside the placement groove, a rubber pad is fixedly provided on the bottom of the fixing plate, a first threaded rod is fixedly provided on the top of the fixing plate, the top end of the first threaded rod passes through the placement rack and extends out of the top of the placement rack, the first threaded rod is connected to the placement rack by threads, a second handle is fixedly provided on the top of the first threaded rod, limit rods are fixedly provided on both sides of the top of the fixing plate, the top end of the limit rod passes through the placement rack and extends out of the top of the placement rack, so as to fix the silicon wafer.

[0010] Preferably, a supporting mechanism for supporting the silicon wafer is provided on the top of the workbench, and the supporting mechanism includes a placing plate arranged on the top of the workbench, the bottom of the silicon wafer is in contact with the top of the placing plate, a threaded cylinder is movably connected to the inside of the workbench through a bearing, a second threaded rod is fixedly provided at the bottom of the placing plate, the bottom end of the second threaded rod passes through the second threaded rod and extends out of the bottom of the workbench, the second threaded rod is connected to the threaded cylinder through threads, a worm gear is passed through the outside of the threaded cylinder, a worm is meshed with one side of the worm gear, the front end of the worm passes through the workbench and extends out of the front side of the workbench, the worm is movably connected to the workbench through a bearing, and a third handle is fixedly provided at the front end of the worm for supporting the silicon wafer.

[0011] In the above technical solution, the technical effects and advantages provided by the utility model are:

[0012] 1. Clamp the silicon wafer between the two placement racks through a fixing mechanism, and then rotate the first handle, which can drive the shaft to rotate, and the rotation of the shaft can drive the placement rack to rotate. The silicon wafer can be rotated by rotating the placement rack, which is convenient for the staff to detect the other side of the silicon wafer;

[0013] 2. Turn the third handle, the third handle can drive the worm to rotate, and use the worm gear to drive the threaded barrel to rotate. The rotation of the threaded barrel can drive the second threaded rod to move, and the second threaded rod can drive the placement plate to move up and down, pushing the placement plate to the bottom of the silicon wafer to support the silicon wafer and increase the stability of the silicon wafer. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present utility model. For ordinary technicians in this field, other drawings can also be obtained based on these drawings.

[0015] Figure 1 It is a front view of the utility model;

[0016] Figure 2 It is a bottom view of the utility model;

[0017] Figure 3 It is a structural schematic diagram of the rotating mechanism of the utility model;

[0018] Figure 4 It is a structural schematic diagram of the fixing mechanism of the utility model;

[0019] Figure 5 It is a structural schematic diagram of the support mechanism of the utility model;

[0020] Figure 6 It is a schematic diagram of the structure of the silicon wafer after flipping over according to the present invention.

[0021] Description of reference numerals:

[0022] 1 workbench, 2 silicon wafers;

[0023] 3 rotating mechanism, 301 placing frame, 302 rotating shaft, 303 first handle, 304 limiting plate, 305 first mounting hole, 306 second mounting hole, 307 plug-in rod, 308 supporting plate;

[0024] 4 fixing mechanism, 401 placement slot, 402 fixing plate, 403 first threaded rod, 404 second handle, 405 rubber pad, 406 limiting rod;

[0025] 5 supporting mechanism, 501 placing plate, 502 threaded cylinder, 503 second threaded rod, 504 worm gear, 505 worm, 506 third handle. DETAILED DESCRIPTION

[0026] In order to enable those skilled in the art to better understand the technical solution of the present invention, the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0027] The utility model provides Figure 1-6 A silicon wafer inspection fixture shown in the figure comprises a workbench 1, a silicon wafer 2 is arranged on the top of the workbench 1, a rotating mechanism 3 for driving the silicon wafer 2 to rotate is arranged on the top of the workbench 1, the rotating mechanism 3 comprises two placement racks 301 arranged on the top of the workbench 1, the two placement racks 301 are respectively located on both sides of the silicon wafer 2, support plates 308 are fixedly arranged on both sides of the top of the workbench 1, a rotating shaft 302 is fixedly arranged on one side of the placement rack 301 close to the support plate 308, an end of the rotating shaft 302 close to the support plate 308 passes through the support plate 308 and extends out of one side of the support plate 308, the support plate 308 is movably connected to the rotating shaft 302 through a bearing, and a first handle 303 is fixedly arranged on one end of the rotating shaft 302 extending out of one side of the support plate 308;

[0028] like Figure 4 As shown, a fixing mechanism 4 for fixing the silicon wafer 2 is provided on the top of the workbench 1, and the fixing mechanism 4 includes a placement groove 401 opened inside the placement rack 301, a fixing plate 402 is provided inside the placement groove 401, a rubber pad 405 is fixedly provided at the bottom of the fixing plate 402, a first threaded rod 403 is fixedly provided on the top of the fixing plate 402, the top of the first threaded rod 403 penetrates the placement rack 301 and extends out of the top of the placement rack 301, the first threaded rod 403 is connected to the placement rack 301 by threads, a second handle 404 is fixedly provided on the top of the first threaded rod 403, and limiting rods 406 are fixedly provided on both sides of the top of the fixing plate 402, and the top of the limiting rod 406 penetrates the placement rack 301 and extends out of the top of the placement rack 301;

[0029] Place both sides of the silicon wafer 2 in the two placement grooves 401 respectively, and then rotate the second handle 404, the second handle 404 can drive the first threaded rod 403 to rotate, the first threaded rod 403 drives the fixing plate 402 to move downward, the fixing plate 402 moves downward to fix the silicon wafer 2, a rubber pad 405 is provided at the bottom of the fixing plate 402, the rubber pad 405 can protect the silicon wafer 2 to prevent scratches on the silicon wafer 2, and the fixing plate 402 can also drive the limiting rod 406 to move downward while moving downward, and the limiting rod 406 can limit the fixing plate 402;

[0030] After clamping the silicon wafer 2 between the two placement racks 301, the first handle 303 is then rotated. The first handle 303 can drive the shaft 302 to rotate, and the rotation of the shaft 302 can drive the placement racks 301 to rotate. The silicon wafer 2 can be rotated by rotating the placement racks 301, making it convenient for the staff to detect the other side of the silicon wafer 2.

[0031] like Figure 3As shown, one end of the rotating shaft 302 extending from one side of the support plate 308 is penetrated by a limiting plate 304, and the top and bottom of the support plate 308 close to the limiting plate 304 are both provided with second mounting holes 306, and the bottom of the limiting plate 304 is provided with a first mounting hole 305, and the second mounting hole 306 and the first mounting hole 305 connected to each other are plugged with the same plug rod 307;

[0032] When the rotating shaft 302 rotates, it can also drive the limiting plate 304 to rotate. After the silicon wafer 2 is rotated, the connecting rod 307 is first inserted into the first mounting hole 305 on the limiting plate 304, and then inserted into the second mounting hole 306 on the supporting plate 308, so that the rotating shaft 302 can be fixed to prevent the silicon wafer 2 from rotating during the inspection process.

[0033] like Figure 5 As shown, a supporting mechanism 5 for supporting the silicon wafer 2 is provided on the top of the workbench 1, and the supporting mechanism 5 includes a placing plate 501 provided on the top of the workbench 1, and the bottom of the silicon wafer 2 is in contact with the top of the placing plate 501, and a threaded barrel 502 is movably connected to the inside of the workbench 1 through a bearing, and a second threaded rod 503 is fixedly provided at the bottom of the placing plate 501, and the bottom end of the second threaded rod 503 penetrates the second threaded rod 503 and extends out of the bottom of the workbench 1, and the second threaded rod 503 is connected to the threaded barrel 502 through threads, and a worm gear 504 is penetrated outside the threaded barrel 502, and a worm 505 is meshed with one side of the worm gear 504, and the front end of the worm 505 penetrates the workbench 1 and extends out of the front side of the workbench 1, and the worm 505 is movably connected to the workbench 1 through a bearing, and a third handle 506 is fixedly provided at the front end of the worm 505;

[0034] By turning the third handle 506, the third handle 506 can drive the worm 505 to rotate, the worm 505 can drive the worm wheel 504 to rotate, and the worm wheel 504 is used to drive the threaded barrel 502 to rotate. The rotation of the threaded barrel 502 can drive the second threaded rod 503 to move, and the second threaded rod 503 can drive the placement plate 501 to move up and down, pushing the placement plate 501 to the bottom of the silicon wafer 2 to support the silicon wafer 2 and increase the stability of the silicon wafer 2.

[0035] The above only describes some exemplary embodiments of the present invention by way of illustration. It is undoubted that those skilled in the art can modify the described embodiments in various ways without departing from the spirit and scope of the present invention. Therefore, the above drawings and descriptions are illustrative in nature and should not be construed as limiting the scope of protection of the claims of the present invention.

Claims

1. A silicon wafer inspection fixture, comprising a workbench (1), characterized in that: A silicon wafer (2) is provided on the top of the workbench (1), and a rotating mechanism (3) for driving the silicon wafer (2) to rotate is provided on the top of the workbench (1); The rotating mechanism (3) comprises two placement racks (301) arranged on the top of the workbench (1), the two placement racks (301) are respectively located on both sides of the silicon wafer (2), support plates (308) are fixedly provided on both sides of the top of the workbench (1), a rotating shaft (302) is fixedly provided on one side of the placement rack (301) close to the support plate (308), one end of the rotating shaft (302) close to the support plate (308) passes through the support plate (308) and extends out of one side of the support plate (308), the support plate (308) and the rotating shaft (302) are movably connected via a bearing, and a first handle (303) is fixedly provided on one end of the rotating shaft (302) extending out of one side of the support plate (308); A supporting mechanism (5) for supporting the silicon wafer (2) is provided on the top of the workbench (1).

2. A silicon wafer inspection fixture according to claim 1, characterized in that: One end of the rotating shaft (302) extending out of one side of the support plate (308) is penetrated by a limiting plate (304), and second mounting holes (306) are provided at the top and bottom of the support plate (308) close to the limiting plate (304), and a first mounting hole (305) is provided at the bottom of the limiting plate (304), and the same plug-in rod (307) is inserted into the interconnected second mounting hole (306) and first mounting hole (305).

3. A silicon wafer inspection fixture according to claim 1, characterized in that: The top of the workbench (1) is provided with a fixing mechanism (4) for fixing the silicon wafer (2); The fixing mechanism (4) comprises a placement groove (401) opened inside the placement rack (301), a fixing plate (402) is arranged inside the placement groove (401), a rubber pad (405) is fixedly arranged at the bottom of the fixing plate (402), a first threaded rod (403) is fixedly arranged at the top of the fixing plate (402), the top of the first threaded rod (403) passes through the placement rack (301) and extends out of the top of the placement rack (301), the first threaded rod (403) is connected to the placement rack (301) by threads, and a second handle (404) is fixedly arranged at the top of the first threaded rod (403).

4. A silicon wafer inspection fixture according to claim 3, characterized in that: Limiting rods (406) are fixedly provided on both sides of the top of the fixing plate (402), and the top ends of the limiting rods (406) penetrate the placement rack (301) and extend out of the top of the placement rack (301).

5. The silicon wafer inspection fixture according to claim 1, characterized in that: The support mechanism (5) comprises a placement plate (501) arranged on the top of the workbench (1), the bottom of the silicon wafer (2) contacts the top of the placement plate (501), the inside of the workbench (1) is movably connected with a threaded cylinder (502) via a bearing, a second threaded rod (503) is fixedly provided at the bottom of the placement plate (501), the bottom end of the second threaded rod (503) passes through the second threaded rod (503) and extends out of the bottom of the workbench (1), the second threaded rod (503) is connected to the threaded cylinder (502) via a thread, a worm wheel (504) passes through the outside of the threaded cylinder (502), a worm (505) is meshed on one side of the worm wheel (504), the front end of the worm (505) passes through the workbench (1) and extends out of the front side of the workbench (1), and the worm (505) is movably connected to the workbench (1) via a bearing.

6. The silicon wafer inspection fixture according to claim 5, characterized in that: A third handle (506) is fixedly provided at the front end of the worm (505).