Semiconductor display panel substrate glass cleaning agent production equipment

Abstract

The utility model discloses semiconductor display panel substrate glass cleaning agent production equipment which comprises a fixing frame, the inner wall of the fixing frame is fixedly connected with a reaction kettle, the upper surface of the reaction kettle is provided with a cover plate, the upper surface of the fixing frame is fixedly connected with a support, the upper surface of the support is fixedly connected with a fixing plate, and the upper surface of the fixing plate is fixedly connected with a base plate. And the lower surface of the fixed plate is fixedly connected with a second motor. Through the structure, the device is provided with the stirring device, the height is adjusted through the electric telescopic rod, the second motor drives the electric telescopic rod to rotate to enable the stirring rod to rotate, and an internal stirring plate is driven to rotate so as to accelerate the rapid reaction of an internal cleaning agent; and the threaded rod is driven by the first motor to drive the cover plate to move upwards, so that damage to operators caused by hot air generated by internal heating is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of cleaning agent production, in particular to a cleaning agent production device for a semiconductor display panel substrate glass. Background Art

[0002] The glass substrate needs to be cleaned before use, and for this purpose a cleaning agent for the substrate glass is required. Most cleaning agent production equipment requires the cover to be opened manually when feeding, which is inconvenient to use, and most stirring is performed using a single stirring rod, and the stirring efficiency is low. Utility Model Content

[0003] The purpose of the utility model is to solve at least one of the technical problems existing in the prior art, and to provide a semiconductor display panel substrate glass cleaning agent production device, the device is provided with a stirring device, the height is adjusted by an electric telescopic rod, and the stirring rod is rotated by a second motor to drive the electric telescopic rod to rotate, and drive the internal stirring plate to rotate to accelerate the rapid reaction of the internal cleaning agent. In order to facilitate the addition of materials, the cover plate is driven upward by the first motor to drive the threaded rod to reduce the damage to the operator caused by the hot air generated by the internal heating.

[0004] The utility model also provides a semiconductor display panel substrate glass cleaning agent production device having the above-mentioned method, comprising: a fixing frame, the inner wall of the fixing frame is fixedly connected to a reaction kettle, the upper surface of the reaction kettle is provided with a cover plate, the upper surface of the fixing frame is fixedly connected to a bracket, the upper surface of the bracket is fixedly connected to a fixing plate, and the lower surface of the fixing plate is fixedly connected to a second motor;

[0005] An electric telescopic rod is provided on the lower surface of the second motor, a guide rod is fixedly connected to the lower surface of the fixed plate, the first motor is fixedly connected to the upper surface of the fixed plate, a threaded rod is provided on the lower surface of the first motor, and a heating device is fixedly connected to the bottom inner wall of the reactor.

[0006] According to the semiconductor display panel substrate glass cleaning agent production equipment, a second hole is provided on the upper surface of the fixed plate, and the inner wall of the second hole is in contact with the threaded rod.

[0007] According to the semiconductor display panel substrate glass cleaning agent production equipment, the lower surface of the guide rod is fixedly connected with a first limiter, and the upper surface of the first limiter is in contact with the cover plate.

[0008] According to the semiconductor display panel substrate glass cleaning agent production equipment, a third hole is provided on the upper surface of the cover plate, and the inner wall of the third hole is slidably connected to the guide rod.

[0009] According to the semiconductor display panel substrate glass cleaning agent production equipment, the lower surface of the threaded rod is fixedly connected with a second limiter, and the upper surface of the second limiter is in contact with the cover plate.

[0010] According to the semiconductor display panel substrate glass cleaning agent production equipment, the upper surface of the cover plate is provided with a threaded hole, and the inner wall of the threaded hole is threadedly connected to the threaded rod.

[0011] According to the semiconductor display panel substrate glass cleaning agent production equipment, the lower surface of the electric telescopic rod is fixedly connected to a stirring rod, and the inner wall of the stirring rod is fixedly connected to a stirring plate.

[0012] According to the semiconductor display panel substrate glass cleaning agent production equipment, the upper surface of the cover plate is provided with a first hole, and the inner wall of the first hole is slidably connected to the electric telescopic rod.

[0013] Additional aspects and advantages of the present invention will be given in part in the following description, and in part will become apparent from the following description, or will be learned through the practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] The utility model is further described below in conjunction with the accompanying drawings and embodiments;

[0015] Figure 1 This is the overall structure diagram of a semiconductor display panel substrate glass cleaning agent production equipment of the utility model;

[0016] Figure 2 This is a cover plate lifting structure diagram of a semiconductor display panel substrate glass cleaning agent production device of the utility model;

[0017] Figure 3 This is a diagram of a stirring device of a semiconductor display panel substrate glass cleaning agent production device of the utility model;

[0018] Figure 4 This is a diagram of a heating device for a semiconductor display panel substrate glass cleaning agent production device according to the utility model.

[0019] Legend:

[0020] 1. Fixed frame; 2. Reactor; 3. Bracket; 4. Fixed plate; 5. Electric telescopic rod; 6. Guide rod; 7. First hole; 8. First motor; 9. Threaded rod; 10. Stirring rod; 11. Stirring plate; 12. Second hole; 13. Threaded hole; 14. Third hole; 15. Cover plate; 16. Heating device; 17. First limiter; 18. Second limiter; 19. Second motor. DETAILED DESCRIPTION

[0021] This section will describe in detail the specific embodiments of the utility model. The preferred embodiments of the utility model are shown in the accompanying drawings. The purpose of the accompanying drawings is to supplement the description of the text part of the specification with graphics, so that people can intuitively and vividly understand each technical feature and the overall technical solution of the utility model, but it cannot be understood as a limitation on the protection scope of the utility model.

[0022] Reference Figure 1-4 The utility model embodiment is a semiconductor display panel substrate glass cleaning agent production device, which includes a fixed frame 1, the inner wall of the fixed frame 1 is fixedly connected to a reaction kettle 2, the upper surface of the reaction kettle 2 is provided with a cover plate 15, the upper surface of the fixed frame 1 is fixedly connected to a bracket 3, the upper surface of the bracket 3 is fixedly connected to a fixed plate 4, and the lower surface of the fixed plate 4 is fixedly connected to a second motor 19.

[0023] The lower surface of the second motor 19 is provided with an electric telescopic rod 5, the lower surface of the fixed plate 4 is fixedly connected with a guide rod 6, the upper surface of the fixed plate 4 is fixedly connected with a first motor 8, the lower surface of the first motor 8 is provided with a threaded rod 9, the bottom inner wall of the reactor 2 is fixedly connected with a heating device 16, the upper surface of the fixed plate 4 is provided with a second hole 12, the inner wall of the second hole 12 is in contact with the threaded rod 9, the lower surface of the guide rod 6 is fixedly connected with a first limiter 17, the upper surface of the first limiter 17 is in contact with the cover plate 15, and the upper surface of the cover plate 15 is provided with a A third hole 14 is provided, and the inner wall of the third hole 14 is slidably connected to the guide rod 6. The lower surface of the threaded rod 9 is fixedly connected to the second limit piece 18, and the upper surface of the second limit piece 18 contacts the cover plate 15. The upper surface of the cover plate 15 is provided with a threaded hole 13, and the inner wall of the threaded hole 13 is threadedly connected to the threaded rod 9. The lower surface of the electric telescopic rod 5 is fixedly connected to the stirring rod 10, and the inner wall of the stirring rod 10 is fixedly connected to the stirring plate 11. The upper surface of the cover plate 15 is provided with a first hole 7, and the inner wall of the first hole 7 is slidably connected to the electric telescopic rod 5.

[0024] Working principle: The first motor 8 drives the threaded rod 9 to rotate to move the cover plate 15 upward, and moves vertically under the action of the guide rod 6, the raw materials are placed in the reactor 2, the stirring rod 10 and the stirring plate 11 at the lower end of the second motor 19 are started to stir the raw materials, and the reaction rate is increased by the heating device 16 at the bottom of the reactor 2.

[0025] The embodiments of the present invention are described in detail above in conjunction with the accompanying drawings, but the present invention is not limited to the above embodiments. Various changes can be made within the knowledge scope of ordinary technicians in the technical field without departing from the purpose of the present invention.

Claims

1. A semiconductor display panel substrate glass cleaning agent production equipment, characterized in that: include: A fixed frame (1), wherein a reaction kettle (2) is fixedly connected to the inner wall of the fixed frame (1), a cover plate (15) is provided on the upper surface of the reaction kettle (2), a bracket (3) is fixedly connected to the upper surface of the fixed frame (1), a fixed plate (4) is fixedly connected to the upper surface of the bracket (3), and a second motor (19) is fixedly connected to the lower surface of the fixed plate (4); The lower surface of the second motor (19) is provided with an electric telescopic rod (5), the lower surface of the fixed plate (4) is fixedly connected to a guide rod (6), the upper surface of the fixed plate (4) is fixedly connected to a first motor (8), the lower surface of the first motor (8) is provided with a threaded rod (9), and the bottom inner wall of the reactor (2) is fixedly connected to a heating device (16).

2. The semiconductor display panel substrate glass cleaning agent production equipment according to claim 1, characterized in that: A second hole (12) is provided on the upper surface of the fixed plate (4), and the inner wall of the second hole (12) is in contact with the threaded rod (9).

3. The semiconductor display panel substrate glass cleaning agent production equipment according to claim 1, characterized in that: A first position-limiting member (17) is fixedly connected to the lower surface of the guide rod (6), and an upper surface of the first position-limiting member (17) is in contact with the cover plate (15).

4. The semiconductor display panel substrate glass cleaning agent production equipment according to claim 1, characterized in that: A third hole (14) is provided on the upper surface of the cover plate (15), and the inner wall of the third hole (14) is slidably connected to the guide rod (6).

5. The semiconductor display panel substrate glass cleaning agent production equipment according to claim 1, characterized in that: A second limiting member (18) is fixedly connected to the lower surface of the threaded rod (9), and the upper surface of the second limiting member (18) is in contact with the cover plate (15).

6. The semiconductor display panel substrate glass cleaning agent production equipment according to claim 1, characterized in that: A threaded hole (13) is provided on the upper surface of the cover plate (15), and the inner wall of the threaded hole (13) is threadedly connected to the threaded rod (9).

7. The semiconductor display panel substrate glass cleaning agent production equipment according to claim 1, characterized in that: The lower surface of the electric telescopic rod (5) is fixedly connected to a stirring rod (10), and the inner wall of the stirring rod (10) is fixedly connected to a stirring plate (11).

8. The semiconductor display panel substrate glass cleaning agent production equipment according to claim 1, characterized in that: The upper surface of the cover plate (15) is provided with a first hole (7), and the inner wall of the first hole (7) is slidably connected to the electric telescopic rod (5).

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